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JP5032516B2 - Air pollutant removal device - Google Patents

Air pollutant removal device Download PDF

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JP5032516B2
JP5032516B2 JP2009018877A JP2009018877A JP5032516B2 JP 5032516 B2 JP5032516 B2 JP 5032516B2 JP 2009018877 A JP2009018877 A JP 2009018877A JP 2009018877 A JP2009018877 A JP 2009018877A JP 5032516 B2 JP5032516 B2 JP 5032516B2
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JP2010172834A (en
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亮 佐原
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Shinryo Corp
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Description

本発明は、処理対象の空気と循環する吸収液とを気液接触させることにより空気中に含まれる汚染物質を吸収液中に溶解させて除去するための空気中汚染物質の除去装置に関するものである。   The present invention relates to an apparatus for removing air pollutants for dissolving and removing contaminants contained in air by bringing gas to liquid contact with the air to be treated and a circulating absorption liquid. is there.

近年、半導体工場や液晶工場のクリーンルーム内の製造環境において、空気中に含まれる粒子状汚染物質だけでなく、分子状汚染物質(AMCs:Airborne Molecular Contaminants)が製品の歩留まり、性能、信頼性の低下に影響を及ぼすことが報告されている。そのため、非常に清浄なクリーンルーム内環境が要求されており、粒子状汚染物質に加えてAMCsも管理する必要が生じている。   In recent years, in the manufacturing environment of semiconductor factories and liquid crystal factories, not only particulate pollutants contained in the air but also molecular pollutants (AMCs: Airborne Molecular Contaminants) have deteriorated product yield, performance, and reliability. Has been reported to affect Therefore, a very clean environment in the clean room is required, and it is necessary to manage AMCs in addition to particulate pollutants.

このAMCsを空気中から除去する技術の1つとして、気液接触式の空気中汚染物質の除去装置(エアワッシャ)が知られており、この除去装置(エアワッシャ)は処理対象の空気と吸収液とを気液接触させて、空気中に含まれるアンモニアや二酸化硫黄等の水溶性成分を吸収液中に溶解させて除去する装置であり、半導体工場や液晶工場の外調機等に設置されている。   As one of the technologies for removing AMCs from the air, a gas-liquid contact type air pollutant removal device (air washer) is known. This removal device (air washer) absorbs air to be treated and absorbs it. It is a device that removes water-soluble components such as ammonia and sulfur dioxide contained in the air by dissolving them in the absorbing liquid by bringing them into gas-liquid contact. It is installed in external controllers of semiconductor factories and liquid crystal factories. ing.

従来のこの種の空気中汚染物質の除去装置としては、例えば、図2に示すように、常時補給水を最下流側のメディア1に直接供給すると共に、循環ポンプ2により水槽3から上流側のメディア4へ順次給水する常時給水方式の除去装置5が公知である(例えば、特許文献1参照)。   As a conventional device for removing this type of air pollutant, for example, as shown in FIG. 2, always supply makeup water is supplied directly to the most downstream medium 1, and upstream of the water tank 3 by a circulation pump 2. A continuous water supply type removal device 5 that sequentially supplies water to the medium 4 is known (see, for example, Patent Document 1).

また、従来の別のタイプの除去装置としては、図3に示すように、水槽7内の吸収液の導電率を導電率計9によって検出し、導電率計9が検出した導電率が所定の管理値の範囲から外れた時に電磁弁10を開放して水槽7に補給水を供給する導電率制御方式の除去装置12が公知である。   As another conventional type of removal device, as shown in FIG. 3, the conductivity of the absorbing liquid in the water tank 7 is detected by a conductivity meter 9, and the conductivity detected by the conductivity meter 9 is a predetermined value. A conductivity control type removal device 12 that opens the solenoid valve 10 and supplies makeup water to the water tank 7 when it is out of the range of the control value is known.

さらに、従来の別のタイプの除去装置としては、図4に示すように、水槽14内の吸収液のpH値をpH計16によって検出し、pH計16が検出したpH値が所定の管理値の範囲から外れた時に電磁弁17を開放して水槽14に補給水を供給したり、或いは、図5に示すように、水槽20内の吸収液のpH値をpH計22によって検出し、pH計22が検出したpH値が所定の管理値の範囲から外れないようにイオン除去装置23によって陽イオン又は陰イオンを選択的に除去したりするpH制御方式の除去装置18,25が公知である(例えば、特許文献2,3,4参照)。   Furthermore, as another type of conventional removal device, as shown in FIG. 4, the pH value of the absorbent in the water tank 14 is detected by a pH meter 16, and the pH value detected by the pH meter 16 is a predetermined control value. When the electromagnetic valve 17 is deviated from the above range, the replenishing water is supplied to the water tank 14 or the pH value of the absorbing liquid in the water tank 20 is detected by a pH meter 22 as shown in FIG. There are known pH control type removal devices 18 and 25 that selectively remove cations or anions by an ion removal device 23 so that the pH value detected by the meter 22 does not fall outside the range of a predetermined control value. (For example, see Patent Documents 2, 3, and 4).

特開2000−317248号公報JP 2000-317248 A 特開2004−230385号公報JP 2004-230385 A 特開2002−239331号公報JP 2002-239331 A 特開2000−79319号公報JP 2000-79319 A

しかしながら、上記した従来の常時給水方式の除去装置5の場合には、補給水を常時供給しなければならないため、補給水量が多くなり、ランニングコストが高くなるといった問題があった。   However, in the case of the conventional continuous water supply type removal device 5 described above, there is a problem that the amount of makeup water increases and running cost increases because the makeup water must be constantly supplied.

また、上記した従来の導電率制御方式の除去装置12の場合には、空気中の酸性成分とアルカリ性成分の比率が等しければ問題ないが、例えば、化石燃料の消費量が増大する冬期に二酸化硫黄等の濃度が増加したり、或いは工場の排ガス処理装置から排出されたガスが風向きによって室内に取り入れる外気に混入したりすることにより、吸収液のpHが酸性又はアルカリ性のいずれか一方に偏り、除去装置12の酸性成分又はアルカリ成分の除去性能が低下してしまうといった問題があった。   In the case of the conventional conductivity control type removal device 12 described above, there is no problem as long as the ratio of the acidic component and the alkaline component in the air is equal. For example, sulfur dioxide in winter when the consumption of fossil fuel increases. The concentration of the solution increases, or the gas discharged from the factory exhaust gas treatment device is mixed into the outside air taken into the room depending on the wind direction, so that the pH of the absorbing solution is biased to either acidic or alkaline and is removed. There existed a problem that the removal performance of the acidic component of the apparatus 12 or an alkaline component will fall.

また、上記した従来のpH制御方式の除去装置のうち、図4に示す除去装置18の場合には、吸収液のpH値が管理値の範囲を外れない限り補給水が供給されないため、吸収液中に含まれる水溶性成分の濃度が高くなり、導電率が上昇し続け、アンモニアなどの水溶性成分が再飛散し、除去性能が低下するといった問題があった。また、吸収液の飛散によって、エリミネータ15等にスケールが発生し、メンテナンス頻度が増加するといった問題もあった。さらに、補給水に緩衝液や酸・アルカリ溶液を使用すると、それ自体が空気の汚染源になるといった問題や、一般水(例えば、上水、工業用水等)を使用するとスケールを発生し易くなるといった問題もあった。   Among the conventional pH control type removal devices described above, in the case of the removal device 18 shown in FIG. 4, the makeup water is not supplied unless the pH value of the absorption liquid is out of the control value range. There is a problem that the concentration of the water-soluble component contained therein becomes high, the conductivity continues to rise, the water-soluble component such as ammonia is re-scattered, and the removal performance is lowered. Further, there is a problem that the scale of the eliminator 15 is generated due to the scattering of the absorbing liquid, and the maintenance frequency increases. Furthermore, if buffer solution or acid / alkaline solution is used as make-up water, it becomes a pollution source of air itself, and if general water (for example, clean water, industrial water, etc.) is used, scale is likely to be generated. There was also a problem.

さらにまた、上記した従来のpH制御方式の除去装置のうち、図5に示す除去装置25の場合には、上記した図4の除去装置18の場合の諸問題に加えて、イオン交換樹脂や電気分解を利用したイオン除去装置を使用しているため、部品交換等のメンテナンスが不可欠となり、メンテナンスコストが高くなるといった問題もあった。   Furthermore, among the above-described conventional pH control type removal devices, in the case of the removal device 25 shown in FIG. 5, in addition to the problems in the case of the removal device 18 shown in FIG. Since an ion removing device using decomposition is used, maintenance such as replacement of parts becomes indispensable, and there is a problem that maintenance cost becomes high.

さらに、上記した従来の導電率制御方式の除去装置12では、pH値が4.9以下又は6.3以上になると水溶性成分の除去性能が格段に低下し、pH値によっては除去性能が30%以下になることがある一方、上記した従来のpH制御方式の除去装置18,25では、導電率が30μS/cm以上になると水溶性成分の除去性能が格段に低下し、導電率の値によっては除去性能が30%以下になることもあった。そのため、最先端の半導体工場や液晶工場では、クリーンルーム内のAMCsを極低濃度にするために、外調機内のエアワッシャの下流側に設置されることがあるケミカルフィルタへの負荷が増大し、ケミカルフィルタの交換頻度が多くなり、ランニングコストが高くなるいといった問題もあった。   Further, in the above-described conventional conductivity control type removal device 12, when the pH value is 4.9 or less or 6.3 or more, the removal performance of the water-soluble component is remarkably lowered, and depending on the pH value, the removal performance is 30. On the other hand, in the above-described conventional pH control type removal devices 18 and 25, when the conductivity is 30 μS / cm or more, the removal performance of the water-soluble component is remarkably lowered, and depending on the value of conductivity. May have a removal performance of 30% or less. Therefore, in the most advanced semiconductor factories and liquid crystal factories, in order to make AMCs in the clean room extremely low, the load on the chemical filter that may be installed downstream of the air washer in the external air conditioner increases. There was also a problem that the replacement frequency of the chemical filter increased and the running cost increased.

本発明は、上記した課題を解決すべくなされたものであり、吸収液のpH値と導電率を同時に管理することにより、空気中の水溶性成分の除去性能を常に高く維持すると共に、スケールによるエリミネータ等のメンテナンス頻度やケミカルフィルタの交換頻度を削減し、大幅なコストダウンを図ることのできる空気中汚染物質の除去装置を提供することを目的とするものである。   The present invention has been made to solve the above-described problems, and by simultaneously managing the pH value and conductivity of the absorbing liquid, the removal performance of water-soluble components in the air is constantly maintained at a high level, and depending on the scale. It is an object of the present invention to provide an air pollutant removal device that can reduce the frequency of maintenance of an eliminator and the like and the frequency of replacement of a chemical filter and can greatly reduce the cost.

上記した目的を達成するため、本発明は、処理対象の空気と循環する吸収液とを気液接触させることにより前記空気中に含まれる汚染物質を前記吸収液中に溶解させて除去するための空気中汚染物質の除去装置であって、前記吸収液のpH値を検出するpH値検出手段と、前記吸収液の導電率を検出する導電率検出手段と、前記pH値検出手段が検出したpH値と前記導電率検出手段が検出した導電率の少なくともいずれか一方の値が所定の管理値の範囲から外れた時に前記吸収液に清浄な吸収液を補給する吸収液補給手段とを備えていることを特徴とする。   In order to achieve the above-described object, the present invention is to dissolve and remove contaminants contained in the air by bringing the air to be treated and the circulating absorbing liquid into gas-liquid contact with each other. A device for removing contaminants in the air, the pH value detecting means for detecting the pH value of the absorbing liquid, the conductivity detecting means for detecting the conductivity of the absorbing liquid, and the pH detected by the pH value detecting means. An absorption liquid replenishing means for replenishing the absorbent with a clean absorption liquid when at least one of the value and the conductivity detected by the conductivity detection means is out of a predetermined control value range. It is characterized by that.

本発明に係る空気中汚染物質の除去装置において、前記pH値の管理値の範囲はpH4.9〜6.3であり、前記導電率の管理値の範囲は30μS/cm以下であるのが好ましい。   In the air pollutant removal apparatus according to the present invention, the control value range of the pH value is preferably pH 4.9 to 6.3, and the control value range of the conductivity is preferably 30 μS / cm or less. .

また、空気中汚染物質の除去装置において、前記吸収液補給手段が補給する清浄な吸収液は純水であるのが好ましい。   In the apparatus for removing pollutants in the air, it is preferable that the clean absorption liquid supplied by the absorption liquid supply means is pure water.

本発明によれば、吸収液のpH値と導電率を同時に管理することにより、季節や地域等の条件を問わず、空気中の水溶性成分の除去性能を常に高く維持することができるため、半導体工場や液晶工場等のクリーンルームに要求される製造環境を容易且つ確実に作り出すことができる。また、外調機内のエアワッシャの下流側にケミカルフィルタが設置される場合、ケミカルフィルタの交換頻度が削減し、大幅なコストダウンを図ることができる。   According to the present invention, by simultaneously managing the pH value and conductivity of the absorption liquid, it is possible to always maintain the removal performance of water-soluble components in the air, regardless of the conditions such as seasons and regions, The manufacturing environment required for clean rooms such as semiconductor factories and liquid crystal factories can be created easily and reliably. Moreover, when a chemical filter is installed on the downstream side of the air washer in the external air conditioner, the frequency of replacing the chemical filter can be reduced, and the cost can be greatly reduced.

また、吸収液の補給量は吸収液のpH値又は導電率が所定の管理値の範囲から外れた時のみ補給されるため、吸収液の補給量を最小限に抑制することができる。   Further, since the replenishment amount of the absorbing liquid is replenished only when the pH value or conductivity of the absorbing liquid is out of the predetermined control value range, the replenishing amount of the absorbing liquid can be minimized.

さらに、吸収液の飛散によるスケールの発生を防止することができるため、メンテナンス頻度を削減することができる。   Furthermore, since the occurrence of scale due to the scattering of the absorbing liquid can be prevented, the maintenance frequency can be reduced.

さらにまた、補給する吸収液に純水を使用した場合には、吸収液が汚染源となることがないため、メンテナンスの頻度をさらに削減することが可能となる。   Furthermore, when pure water is used as the absorbing liquid to be replenished, since the absorbing liquid does not become a contamination source, the frequency of maintenance can be further reduced.

本発明の実施の形態に係る空気中汚染物質の除去装置を示す系統図である。It is a systematic diagram which shows the removal apparatus of the air pollutant which concerns on embodiment of this invention. 従来の常時給水方式の除去装置を示す系統図である。It is a systematic diagram which shows the removal apparatus of the conventional regular water supply system. 従来の導電率制御方式の除去装置を示す系統図である。It is a systematic diagram which shows the removal apparatus of the conventional conductivity control system. 従来のpH制御方式の除去装置を示す系統図である。It is a systematic diagram which shows the removal apparatus of the conventional pH control system. 従来のpH制御方式の別の除去装置を示す系統図である。It is a systematic diagram which shows another removal apparatus of the conventional pH control system.

以下、図面を参照しつつ、本発明の実施の形態に係る空気中汚染物質の除去装置について説明する。ここで、図1は本発明の実施の形態に係る空気中汚染物質の除去装置を示す系統図である。   Hereinafter, an air pollutant removing apparatus according to an embodiment of the present invention will be described with reference to the drawings. Here, FIG. 1 is a system diagram showing an air pollutant removing apparatus according to an embodiment of the present invention.

本実施の形態に係る空気中汚染物質の除去装置30は、処理対象の空気と循環する吸収液とを気液接触させるための気液接触手段40と、吸収液を貯留するための吸収液貯留手段50と、気液接触手段40と吸収液貯留手段50との間で吸収液を循環させるための吸収液循環手段60と、吸収液のpH値を検出するためのpH値検出手段70と、吸収液の導電率を検出するための導電率検出手段80と、pH値検出手段70が検出したpH値と導電率検出手段80が検出した導電率の少なくともいずれか一方の値が所定の管理値の範囲から外れた時に吸収液に清浄な吸収液を補給するための吸収液補給手段90とを備えて構成されている。   The air pollutant removal device 30 according to the present embodiment includes a gas-liquid contact means 40 for bringing the air to be processed and the circulating absorbing liquid into gas-liquid contact with each other, and an absorbing liquid storage for storing the absorbing liquid. Means 50, absorption liquid circulation means 60 for circulating the absorption liquid between the gas-liquid contact means 40 and the absorption liquid storage means 50, pH value detection means 70 for detecting the pH value of the absorption liquid, Conductivity detection means 80 for detecting the conductivity of the absorption liquid, and at least one of the pH value detected by the pH value detection means 70 and the conductivity detected by the conductivity detection means 80 is a predetermined management value. And an absorption liquid replenishing means 90 for replenishing the absorption liquid with a clean absorption liquid when it is out of the range.

気液接触手段40は、処理対象の空気が流通するチャンバー41内に設けられ、空気の流れ方向(図1中の左から右に向う矢印方向)に対して直交するようにメディア42が複数段(図1では2段)に渡って並設されることにより構成されている。各メディア42は、例えばポリエステルやセラミック等の親水性又は吸水性を有する材料から成り、上方から吸収液が滴下されることにより表面に液膜が形成されるようになっている。なお、気液接触手段40は、空気と吸収液とが効率良く気液接触する構成を有していれば、この構成に限定されるものではなく、例えば、従来のエアワッシャにおいて一般に使用されているように、スプレーノズルから吸収液を噴霧し、飛散した吸収液のミストをエリミネータで回収するように構成する等、各種変更が可能である。   The gas-liquid contact means 40 is provided in a chamber 41 through which air to be processed flows, and a plurality of media 42 are arranged so as to be orthogonal to the air flow direction (arrow direction from left to right in FIG. 1). It is configured by being arranged in parallel (two stages in FIG. 1). Each medium 42 is made of a hydrophilic or water-absorbing material such as polyester or ceramic, and a liquid film is formed on the surface when the absorbing liquid is dropped from above. The gas-liquid contact means 40 is not limited to this configuration as long as it has a configuration in which the air and the absorbing liquid are in efficient gas-liquid contact. For example, the gas-liquid contact means 40 is generally used in a conventional air washer. As described above, various modifications are possible, such as spraying the absorbing liquid from the spray nozzle and collecting the scattered mist of the absorbing liquid with an eliminator.

吸収液貯留手段50は、各メディア42の下方に配置された水槽51を備えており、この水槽51には、ボールタップ52を備えた加湿用給水配管53と、オーバーフロー配管54と、バルブ55を備えた排水配管56とが接続されている。この場合、加湿用給水配管53を介して給水される加湿用給水には純水が使用されるのが好ましい。   The absorption liquid storage means 50 includes a water tank 51 disposed below each medium 42, and the water tank 51 includes a humidification water supply pipe 53 including a ball tap 52, an overflow pipe 54, and a valve 55. The drainage pipe 56 is connected. In this case, it is preferable that pure water is used for the humidifying water supply supplied through the humidifying water supply pipe 53.

吸収液循環手段60は、水槽51からメディア42の上方まで配設される吸収液循環用メイン配管61と、メイン配管61の途中に設けられる循環ポンプ62と、メイン配管61から分岐されて各メディア42に向かう分岐配管63と、各分岐配管63の途中に設けられる流量計64とを備えている。   The absorption liquid circulation means 60 is divided from the water tank 51 to the upper part of the medium 42 for the absorption liquid circulation, the circulation pump 62 provided in the middle of the main pipe 61, and the main pipe 61 to be branched from each medium. A branch pipe 63 directed to 42 and a flow meter 64 provided in the middle of each branch pipe 63 are provided.

pH値検出手段70は、吸収液循環用メイン配管61の途中に分岐接続されるpH計71を備えており、pH計71はpH指示器72を介して後述する電磁弁92に電気的に接続されている。そして、この場合、pH値の管理値はpH4.9〜6.3の範囲に設定されるのが好ましい。   The pH value detection means 70 includes a pH meter 71 that is branched and connected in the middle of the main pipe 61 for circulating the absorbing liquid, and the pH meter 71 is electrically connected to an electromagnetic valve 92 described later via a pH indicator 72. Has been. In this case, the control value of the pH value is preferably set in the range of pH 4.9 to 6.3.

導電率検出手段80は、吸収液循環用メイン配管61の途中に分岐接続される導電率計81を備えており、導電率計81は導電率指示器82を介して電磁弁92に電気的に接続されている。そして、この場合、導電率の管理値は30μS/cm以下の範囲に設定されるのが好ましい。   The conductivity detecting means 80 is provided with a conductivity meter 81 that is branched and connected in the middle of the main pipe 61 for circulating the absorbing liquid. The conductivity meter 81 is electrically connected to the electromagnetic valve 92 via the conductivity indicator 82. It is connected. In this case, the conductivity management value is preferably set in a range of 30 μS / cm or less.

吸収液補給手段90は、図示を省略する給水源から水槽51まで配設される補給水配管91を備えており、補給水配管91には電磁弁92及び流量計93が接続されている。この場合、補給水配管91を介して補給される吸収液には純水が使用されるのが好ましい。   The absorbing liquid replenishing means 90 includes a replenishing water pipe 91 disposed from a water supply source (not shown) to the water tank 51, and an electromagnetic valve 92 and a flow meter 93 are connected to the replenishing water pipe 91. In this case, it is preferable to use pure water as the absorbing liquid to be replenished via the replenishing water pipe 91.

次に、図面を参照しつつ、上記した構成を備えた空気中汚染物質の除去装置30の作用について説明する。   Next, the operation of the air pollutant removing device 30 having the above-described configuration will be described with reference to the drawings.

循環ポンプ62の駆動により水槽51内の吸収液が汲み上げられ、メイン配管61及び各分岐配管63を通って上方から各メディア42に吸収液が滴下され、各メディア42の表面に液膜が形成される。そして、このように表面に液膜が形成されたメディア42を、チャンバー41の内部に導入された処理対象の空気が通過すると、空気と吸収液とが気液接触し、空気が加湿されると共に、空気中に含まれるアンモニアや二酸化硫黄等の水溶性成分が吸収液中に溶解されて除去される。その後、水溶性成分が除去されて清浄化された空気はクリーンルーム内に供給される一方、水溶性成分が溶解された吸収液は水槽51に滴下されて戻される。   The absorption liquid in the water tank 51 is pumped up by the driving of the circulation pump 62, and the absorption liquid is dropped onto each medium 42 from above through the main pipe 61 and each branch pipe 63, and a liquid film is formed on the surface of each medium 42. The When the air to be processed introduced into the chamber 41 passes through the medium 42 having the liquid film formed on the surface in this way, the air and the absorbing liquid come into gas-liquid contact, and the air is humidified. Water-soluble components such as ammonia and sulfur dioxide contained in the air are dissolved and removed in the absorbing solution. Thereafter, the air purified by removing the water-soluble component is supplied into the clean room, while the absorbing solution in which the water-soluble component is dissolved is dropped into the water tank 51 and returned.

このように吸収液が循環している間、常時、pH計71によりメイン配管61中の吸収液のpH値が検出されていると共に、導電率計81によりメイン配管61中の吸収液の導電率が検出されている。そして、前記吸収液のpH値が所定の管理値の範囲(pH4.9〜6.3)を外れているとpH指示器72によって判断された場合、或いは、前記吸収液の導電率が所定の管理値の範囲(30μS/cm以下)を外れていると導電率指示器82によって判断された場合のいずれかの場合には、電磁弁92が開放され、清浄な吸収液が前記給水源から補給配管91を通って水槽51内に供給される。このとき、供給される吸収液量は流量計93によって調整される。   Thus, while the absorption liquid is circulating, the pH value of the absorption liquid in the main pipe 61 is always detected by the pH meter 71 and the conductivity of the absorption liquid in the main pipe 61 is detected by the conductivity meter 81. Has been detected. When the pH indicator 72 determines that the pH value of the absorbing liquid is out of a predetermined control value range (pH 4.9 to 6.3), or the conductivity of the absorbing liquid is a predetermined value. In any case where the conductivity indicator 82 determines that the control value is out of the range (30 μS / cm or less), the electromagnetic valve 92 is opened, and clean absorption liquid is replenished from the water supply source. The water is supplied into the water tank 51 through the pipe 91. At this time, the amount of absorbed liquid supplied is adjusted by the flow meter 93.

また、水槽51内の液面レベルが加湿によって所定レベルより低下した場合には、ボールタップ52が作動し、加湿用給水管53を通って水槽51内に給水される。一方、この時、水槽51の液面レベルが所定レベルを超えた場合には、水槽51内の吸収液はオーバーフロー配管54を通って外部に排出される。   Further, when the liquid level in the water tank 51 falls below a predetermined level due to humidification, the ball tap 52 is activated and water is supplied into the water tank 51 through the humidifying water supply pipe 53. On the other hand, if the liquid level in the water tank 51 exceeds a predetermined level at this time, the absorbing liquid in the water tank 51 is discharged to the outside through the overflow pipe 54.

上記した実施の形態に係る空気中汚染物質の除去装置30によれば、季節や地域を問わず、空気中の水溶性成分の除去性能を常に高く維持することができ、従来の除去装置と比較して、除去性能を最大で2倍以上向上させることができる。これにより、清浄度の高い空気をクリーンルーム内に供給することができ、半導体工場や液晶工場等のクリーンルームに要求される製造環境を容易且つ確実に作り出すことができる。その結果、製品の歩留まり、信頼性、及び性能を高めることができる。また、吸収液の飛散によって、エリミネータ等にスケールが発生することがなく、メンテナンス頻度を削減することができる。 さらに、最先端の半導体工場や液晶工場のクリーンルーム内ではAMCsを極低濃度にするために、外調機内のエアワッシャの下流側にケミカルフィルタが設置されることがあるが、除去装置30によれば、ケミカルフィルタへの負荷を大幅に軽減することができ、ケミカルフィルタの長寿命化を図ることが可能となる。また、ケミカルフィルタ下流側の濃度も低減できる。   According to the air pollutant removal device 30 according to the above-described embodiment, the removal performance of water-soluble components in the air can always be maintained high regardless of the season or region, and compared with the conventional removal device. Thus, the removal performance can be improved up to twice or more. Thereby, highly clean air can be supplied into the clean room, and a manufacturing environment required for a clean room such as a semiconductor factory or a liquid crystal factory can be created easily and reliably. As a result, product yield, reliability, and performance can be improved. Further, the scale of the eliminator or the like does not occur due to the scattering of the absorbing liquid, and the maintenance frequency can be reduced. Furthermore, chemical filters may be installed on the downstream side of the air washer in the external air conditioner in order to make AMCs extremely low in the clean rooms of the most advanced semiconductor factories and liquid crystal factories. As a result, the load on the chemical filter can be greatly reduced, and the lifetime of the chemical filter can be extended. Further, the concentration on the downstream side of the chemical filter can also be reduced.

なお、上記した実施の形態に係る空気中汚染物質の除去装置30では、pH計71や導電率計81を吸収液循環用メイン配管61の途中に分岐して接続しているが、これは単なる例示に過ぎず、pH計71や導電率計81は、水槽51の外面に取り付ける等、吸収液のpH値や導電率を適切に測定できる位置であればどこに取り付けてもよい。   In the air pollutant removal device 30 according to the above-described embodiment, the pH meter 71 and the conductivity meter 81 are branched and connected in the middle of the main pipe 61 for circulating the absorbing liquid. For example, the pH meter 71 and the conductivity meter 81 may be attached anywhere as long as the pH value and the conductivity of the absorbent can be appropriately measured, such as being attached to the outer surface of the water tank 51.

また、補給水配管91の末端の設置位置についても、上記した水槽51に限定されるものではなく、例えば、最下流のメディアの42の上方に設置してもよく、この場合には、吸収液のpH値又は導電率が所定の管理値の範囲から外れたと判断された場合に直ちに清浄な吸収液をメディア42に供給することができるため、制御応答性を高めることができる。   In addition, the installation position of the end of the makeup water pipe 91 is not limited to the water tank 51 described above, and may be installed, for example, above the most downstream medium 42. Since it is possible to immediately supply a clean absorbent to the medium 42 when it is determined that the pH value or the electrical conductivity is out of the range of the predetermined control value, the control responsiveness can be improved.

さらに、上記した実施の形態において、排水管56のバルブ55を電磁弁に変更することにより、吸収液のpH値又は導電率が所定の管理値の範囲から外れたと判断された場合に、補給水用の電磁弁92に対応させて排水管56の電磁弁を自動で開放させて水槽51内の吸収液を強制的に所定量外部に排出させるようにしてもよい。   Further, in the above-described embodiment, when the valve 55 of the drain pipe 56 is changed to a solenoid valve, the makeup water is determined when it is determined that the pH value or conductivity of the absorbing liquid is out of the predetermined control value range. It is also possible to automatically open the electromagnetic valve of the drain pipe 56 in correspondence with the electromagnetic valve 92 for use, and forcibly discharge the absorbing liquid in the water tank 51 to the outside.

さらにまた、この場合に、吸収液のpH値又は導電率が所定の管理値の範囲から外れた程度の大小に応じて、排水管56の前記電磁弁や補給水用の電磁弁92の開放時間の長さを変更可能なように構成することもできる。   Furthermore, in this case, the opening time of the electromagnetic valve of the drain pipe 56 and the electromagnetic valve 92 for make-up water according to the magnitude of the degree to which the pH value or conductivity of the absorbing liquid deviates from the predetermined control value range. It is also possible to configure so that the length of each can be changed.

30 空気中汚染物質の除去装置
70 pH値検出手段
80 導電率検出手段
90 吸収液補給手段
DESCRIPTION OF SYMBOLS 30 Air pollutant removal apparatus 70 pH value detection means 80 Conductivity detection means 90 Absorption liquid replenishment means

Claims (2)

処理対象の空気と循環する吸収液とを気液接触させることにより前記空気中に含まれるアンモニアや二酸化硫黄を含む汚染物質を前記吸収液中に溶解させて除去するための空気中汚染物質の除去装置であって、
前記吸収液のpH値を検出するpH値検出手段と、
前記吸収液の導電率を検出する導電率検出手段と、
前記pH値検出手段が検出したpH値が管理値であるpH4.9〜6.3の範囲を外れた場合、或いは、前記導電率検出手段が検出した導電率が管理値である30μS/cm以下の範囲を外れた場合、のいずれかの場合に前記吸収液に清浄な吸収液を補給する吸収液補給手段と、
を備えていることを特徴とする空気中汚染物質の除去装置。
Removal of air pollutants for dissolving and removing pollutants including ammonia and sulfur dioxide contained in the air by bringing gas to liquid contact with the air to be treated and the circulating absorption liquid. A device,
PH value detection means for detecting the pH value of the absorbing solution;
Conductivity detecting means for detecting the conductivity of the absorbing liquid;
When the pH value detected by the pH value detection means is out of the range of pH 4.9 to 6.3, which is a management value, or the conductivity detected by the conductivity detection means is a management value of 30 μS / cm or less Absorbing liquid replenishing means for replenishing the absorbing liquid with a clean absorbing liquid in any of the cases,
A device for removing pollutants in the air, comprising:
前記pH値検出手段が検出した吸収液のpH値又は前記導電率検出手段が検出した導電率が前記管理値の範囲を外れた程度の大小に応じて、前記吸収液補給手段から補給する吸収液の量を変更する請求項1に記載の空気中汚染物質の除去装置。
Absorbing liquid to be replenished from the absorbing liquid replenishing means according to the pH value of the absorbing liquid detected by the pH value detecting means or the degree of the degree that the conductivity detected by the conductivity detecting means is out of the management value range The apparatus for removing air pollutants according to claim 1, wherein the amount of the air pollutant is changed.
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US8316890B2 (en) 2008-11-11 2012-11-27 Aptargroup, Inc. Port closure system with hydraulic hammer resistance

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