JP4882476B2 - 半導体装置及びその製造方法 - Google Patents
半導体装置及びその製造方法 Download PDFInfo
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- JP4882476B2 JP4882476B2 JP2006112904A JP2006112904A JP4882476B2 JP 4882476 B2 JP4882476 B2 JP 4882476B2 JP 2006112904 A JP2006112904 A JP 2006112904A JP 2006112904 A JP2006112904 A JP 2006112904A JP 4882476 B2 JP4882476 B2 JP 4882476B2
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- 239000004065 semiconductor Substances 0.000 title claims abstract description 76
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 14
- 239000000853 adhesive Substances 0.000 claims abstract description 65
- 230000001070 adhesive effect Effects 0.000 claims abstract description 65
- 239000004020 conductor Substances 0.000 claims abstract description 59
- 229920005989 resin Polymers 0.000 claims abstract description 31
- 239000011347 resin Substances 0.000 claims abstract description 31
- 239000000463 material Substances 0.000 claims abstract description 22
- 238000000034 method Methods 0.000 claims description 18
- 239000000758 substrate Substances 0.000 claims description 9
- 239000000919 ceramic Substances 0.000 claims description 5
- 230000006866 deterioration Effects 0.000 abstract 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 12
- 229910052751 metal Inorganic materials 0.000 description 10
- 239000002184 metal Substances 0.000 description 10
- 239000010931 gold Substances 0.000 description 9
- 229910052737 gold Inorganic materials 0.000 description 8
- 238000007789 sealing Methods 0.000 description 6
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 5
- 229910052802 copper Inorganic materials 0.000 description 5
- 239000010949 copper Substances 0.000 description 5
- 239000003822 epoxy resin Substances 0.000 description 5
- 229920000647 polyepoxide Polymers 0.000 description 5
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 4
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 4
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 4
- 229910045601 alloy Inorganic materials 0.000 description 4
- 239000000956 alloy Substances 0.000 description 4
- 229910052782 aluminium Inorganic materials 0.000 description 4
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 4
- 150000002739 metals Chemical class 0.000 description 4
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 4
- 229910052709 silver Inorganic materials 0.000 description 4
- 239000004332 silver Substances 0.000 description 4
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 229910052742 iron Inorganic materials 0.000 description 2
- 239000004973 liquid crystal related substance Substances 0.000 description 2
- 229910052759 nickel Inorganic materials 0.000 description 2
- 229910052697 platinum Inorganic materials 0.000 description 2
- 229920001187 thermosetting polymer Polymers 0.000 description 2
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 2
- 229910052721 tungsten Inorganic materials 0.000 description 2
- 239000010937 tungsten Substances 0.000 description 2
- 239000004925 Acrylic resin Substances 0.000 description 1
- 229920000178 Acrylic resin Polymers 0.000 description 1
- 229910000906 Bronze Inorganic materials 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 239000004593 Epoxy Substances 0.000 description 1
- 229910001030 Iron–nickel alloy Inorganic materials 0.000 description 1
- 239000010974 bronze Substances 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- KUNSUQLRTQLHQQ-UHFFFAOYSA-N copper tin Chemical compound [Cu].[Sn] KUNSUQLRTQLHQQ-UHFFFAOYSA-N 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 150000003949 imides Chemical class 0.000 description 1
- CNQCVBJFEGMYDW-UHFFFAOYSA-N lawrencium atom Chemical compound [Lr] CNQCVBJFEGMYDW-UHFFFAOYSA-N 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 230000007261 regionalization Effects 0.000 description 1
- 229920002050 silicone resin Polymers 0.000 description 1
- 230000008646 thermal stress Effects 0.000 description 1
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- H01L2224/45138—Material with a principal constituent of the material being a metal or a metalloid, e.g. boron (B), silicon (Si), germanium (Ge), arsenic (As), antimony (Sb), tellurium (Te) and polonium (Po), and alloys thereof the principal constituent melting at a temperature of greater than or equal to 950°C and less than 1550°C
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- H01L2224/4848—Connecting portions connected to auxiliary connecting means on the bonding areas, e.g. pre-ball, wedge-on-ball, ball-on-ball between the wire connector and the bonding area being a pre-ball (i.e. a ball formed by capillary bonding) the connecting portion being a wedge bond, i.e. wedge on pre-ball outside the semiconductor or solid-state body
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Description
以下、本発明の実施の形態の各構成について詳述する。
本形態における導電体は、樹脂にインサート成型されたリードフレームや、基材に設けられた導体配線である。
本形態におけるバンプは、導電体と導電性ワイヤとを接続できる金属で形成されていれば良い。よって、使用するワイヤや導電体と合金を形成することができるものであれば、その材料は特に限定されない。例えば、金、銅、白金、アルミニウム等の金属及びそれらの合金等である。
本形態における接着材には、熱硬化性樹脂などを挙げることができる。熱硬化性樹脂としては、エポキシ樹脂、シリコーン樹脂、アクリル樹脂、イミド樹脂などが挙げられる。また、ダイボンドすると共に電気的接続を行うには、Agペースト、カーボンペーストなどを用いることができる。
本形態における導電性ワイヤは、導体配線とのオーミック性、機械的接続性、電気伝導性及び熱伝導性がよいものが求められる。熱伝導度としては0.01cal/(s)(cm2)(℃/cm)以上が好ましく、より好ましくは0.5cal/(s)(cm2)(℃/cm)以上である。また、作業性などを考慮して導電性ワイヤの直径は、好ましくは、Φ10μm以上、Φ45μm以下である。このような導電性ワイヤとして具体的には、金、銅、白金、アルミニウム等の金属及びそれらの合金を用いた導電性ワイヤが挙げられる。このような導電性ワイヤは、導電体に形成させたワイヤボンディング領域や導電体に形成したバンプと、半導体素子の電極と、をワイヤボンディング機器によって容易に接続させることができる。
この実施例の半導体装置は、図2に示すように、表面実装型の半導体発光装置であり、パンプを設けた導電体202上に半導体発光素子203が載置されている。
この実施例の半導体発光装置は、図3に示したように、基材の開口部内に半導体素子と保護素子を実装した表面実装型の半導体発光装置である。
103、203、303 半導体発光素子
105、205 金ワイヤ
108 キャピラリ
109、209、309 バンプ
110、210、310 接着材
113 窪み
201 絶縁性基板
211、311 透光性樹脂
312 パッケージ
314 ツェナーダイオード
315 接着材
Claims (7)
- 絶縁性基板の上に導電体が形成されてなる、または凹状のセラミックパッケージの開口部内に導電体が形成されてなる半導体装置の製造方法であって、
導電体にバンプを設ける第1の工程と、
前記第1の工程の後、前記導電体の前記バンプが配置された側の前記導電体に、樹脂を含む素子固定用の接着材を載置し、さらに接着材の上に素子を配置する第2の工程と、
前記バンプに導電性ワイヤを接続する第3の工程と、
を含むことを特徴とする半導体装置の製造方法。 - 前記第2の工程は、前記バンプの一部に前記接着材を配置させる工程を含み、前記導電性ワイヤはバンプの接着材から露出された部位に接続する請求項1に記載の半導体装置の製造方法。
- 前記第2の工程は、前記素子にて前記接着材を加圧し、前記接着材を前記バンプの一部に延在させる工程を含む請求項2に記載の半導体装置の製造方法。
- 前記第3の工程は、前記バンプと前記素子とを前記導電性ワイヤにより接続する工程を含む請求項1から3のいずれか一項に記載の半導体装置の製造方法。
- さらに前記接着材の少なくとも一部と前記素子とを樹脂で被覆する工程を含む請求項1から4のいずれか一項に記載の半導体装置の製造方法。
- 絶縁性基板の上に導電体が形成されてなる、または凹状のセラミックパッケージの開口部内に導電体が形成されてなる半導体装置であって、
導電体と、
前記導電体に設けられたバンプと、
前記導電体に載置される素子を固定するための接着材と、
前記接着材の上に配置された素子と、
前記バンプに接続される導電性ワイヤと、を備え、
前記バンプは、前記接着材より上方で前記導電性ワイヤと接続されていることを特徴とする半導体装置。 - 前記接着材の少なくとも一部と前記素子とを樹脂で被覆した請求項6に記載の半導体装置。
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JPS5664483A (en) * | 1979-10-30 | 1981-06-01 | Toshiba Corp | Led device |
JPS6167970A (ja) * | 1984-09-11 | 1986-04-08 | Oki Electric Ind Co Ltd | 部品の取り付け構造 |
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JP2002314138A (ja) * | 2001-04-09 | 2002-10-25 | Toshiba Corp | 発光装置 |
JP3913090B2 (ja) * | 2002-02-28 | 2007-05-09 | ローム株式会社 | 発光ダイオードランプ |
US20050116235A1 (en) * | 2003-12-02 | 2005-06-02 | Schultz John C. | Illumination assembly |
JP4144553B2 (ja) * | 2004-04-07 | 2008-09-03 | 松下電器産業株式会社 | 半導体装置の製造方法 |
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