JP4792286B2 - Photopolymerizable compound for photosensitive resin composition, photosensitive resin composition, and light scattering film - Google Patents

Description

The present invention relates to a photopolymerizable compound for a photosensitive resin composition , a photosensitive resin composition containing the photopolymerizable compound for a photosensitive resin composition, and a liquid crystal display formed using the photosensitive resin composition. The present invention relates to a light scattering film for an apparatus.

  The liquid crystal display device displays an image by controlling the polarization direction of incident light using the alignment state of the liquid crystal. This liquid crystal display device can be roughly classified into three types, a transmission type, a reflection type, and a semi-transmission type, depending on the presence or absence of a light source.

  The transmissive liquid crystal display device is a liquid crystal display device in which a light source is disposed on the back surface or side surface of a back electrode substrate and screen display is performed by light emitted from the light source. The reflective liquid crystal is a liquid crystal display device that does not incorporate a light source and performs display using light incident from the front of the device. Furthermore, in recent years, a transflective liquid crystal display device having both functions of a transmissive liquid crystal display device and a reflective liquid crystal display device has been proposed.

  A reflective liquid crystal display device or a transflective liquid crystal display device uses room light or natural light incident from the front as a light source. For this reason, these liquid crystal display devices are intended to widen the viewer's display recognition angle, that is, the viewing angle, anywhere in the display device, and the reflective electrode that reflects light incident on the surface of the back electrode substrate from the front. It has a structure having a light scattering function of scattering emitted light.

  As a structure having a light scattering function, a structure in which a light scattering film is provided on the surface of the observer side electrode substrate, or a structure in which unevenness is provided on the reflective electrode surface on the surface of the back electrode substrate has been put into practical use. However, the structure in which the light scattering film is provided on the surface of the observer side electrode substrate has the following problems.

  (1) Due to backscattering, the light use efficiency is inferior and the screen display is dark.

  (2) Since light is scattered through the thickness of the observer side electrode substrate, the distance from scattering until passing through the color filter is long, and the scattered light transmitted through the color filter is mixed, so the resolution is high. There is a disadvantage of being inferior.

  On the other hand, the structure in which the reflective electrode surface on the surface of the back electrode substrate has irregularities has the advantage of excellent light utilization efficiency because there is no loss of light except that incident light is partially absorbed by the reflective electrode. is there.

  However, in order to form irregularities on the surface of the reflective electrode, it is necessary to use a processing process such as a photolithography method, which makes the manufacturing process complicated, and has disadvantages such as a decrease in yield and an increase in manufacturing cost.

  As described above, in consideration of the defects of the structure having the light scattering function, the light scattering film is disposed in the space (hereinafter referred to as the inside of the cell) sandwiched between the two electrode substrates of the back electrode substrate and the observer side electrode substrate. Proposed structures have been proposed. A transflective liquid crystal display device having such a structure is shown in FIG.

  The transflective liquid crystal display device shown in FIG. 2 is configured by sandwiching a liquid crystal layer 23 between an observer-side electrode substrate 21 and a back-side electrode substrate 22. The observer side electrode substrate 21 includes a transparent substrate 24, a color filter 25, a light scattering film 26, and a transparent electrode 27. The color filter 25 includes a transmission part 28 and a reflection part 29, and the light scattering film 26 is formed by dispersing transparent particles 31 in a transparent resin 30.

  As shown in FIG. 2, the light scattering film 26 is provided between the color filter 25 and the transparent electrode 27, that is, in the cell.

  The light scattering film 26 has a configuration in which transparent particles 31 are dispersed in a continuous layer that is a transparent resin 30, and a light scattering effect is obtained by a difference in refractive index between the continuous layer and the particles. By using this structure, it is not necessary to form irregularities on the reflective electrode surface, which is advantageous in terms of the yield of panel manufacturing, and light is scattered inside the cell. Compared to the case where it is arranged outside the cell. There is an advantage that a reflection type liquid crystal display device in which the resolution is not lowered can be obtained.

  However, since the space in which the light scattering film can be disposed is narrow in the cell, the light scattering film needs to be a thin film and have sufficient scattering properties as compared with other methods. Further, since the surface of the light scattering film directly affects the alignment of the liquid crystal layer, sufficient flatness is required. Furthermore, it is necessary to pattern the light scattering film in order to provide it at a required position in the cell. In order to solve these problems, a technique as disclosed in Patent Document 1 has been proposed.

However, in order for the light scattering film to have sufficient patternability, it is necessary that the transparent resin 30 includes a polymerizable unsaturated substrate necessary for patterning, and the transparent resin 30 includes the polymerizable unsaturated substrate. When it is included, a sufficient refractive index difference cannot be obtained between the particles and the continuous layer due to the influence thereof, and a sufficient light scattering property cannot be obtained. In particular, when the light scattering film is a thin film, sufficient light scattering properties cannot be obtained.
JP 2003-222711 A

The present invention has been made in view of the above-described problems. The present invention provides a photosensitive composition that exhibits sufficient scattering properties with a thin film, has good flatness, and can be selectively patterned on necessary portions. rESIN cOMPOSITION fOR photopolymerizable compound, the photosensitive resin composition for photopolymerizable compound photosensitive composition comprising, an object to provide a light scattering film formed from the photosensitive resin composition.

1st aspect of this invention provides the photopolymerizable compound for photosensitive resin compositions characterized by having the structure represented by following formula (1).

(In the formula, R ¹ represents hydrogen or a methyl group, R ² represents an organic group having 6 to 15 carbon atoms including an alkyl group having 2 to 12 carbon atoms or a urethane group, and R ³ represents 1 carbon atom. -6 represents an organic group, n represents an integer of 1 to 2, and m represents an integer of 1 to 5.)
A second aspect of the present invention is characterized in that it contains the photopolymerizable compound for a photosensitive resin composition , an alkali-soluble transparent resin, a photopolymerizable initiator, and a light scattering agent. A photosensitive resin composition is provided.
In the following description, the photopolymerizable compound for photosensitive resin composition will be simply referred to as a photosensitive resin substrate.

  Furthermore, the 3rd form of this invention provides the light-scattering film | membrane formed using the said photosensitive resin composition.

  According to the present invention, it is possible to provide a photosensitive composition that has sufficient flatness and scattering properties with a thin film and can be selectively patterned on a necessary portion. Further, from the photosensitive composition A light scattering film to be formed can be provided.

  The best mode for carrying out the invention will be described below.

  FIG. 1 is a cross-sectional view showing a transflective liquid crystal display device using a photosensitive composition according to an embodiment of the present invention. The transflective liquid crystal display device shown in FIG. 1 is configured by sandwiching a liquid crystal layer 3 between an observer side electrode substrate 1 and a back side electrode substrate 2. The observer side electrode substrate 1 includes a transparent substrate 4, a color filter 5, a light scattering film 6, and a transparent electrode 7. The color filter 5 includes a transmission part 8 and a reflection part 9, and the light scattering film 6 is formed by dispersing transparent particles 11 in a transparent resin 10.

  Hereinafter, the photosensitive composition composition for light scattering films according to an embodiment of the present invention, which constitutes the transparent resin 10 of the light scattering film 6, will be specifically described.

  The photosensitive composition for light-scattering films which concerns on one Embodiment of this invention contains the base material for photosensitive resins, alkali-soluble transparent resin, a photopolymerization initiator, and a light-scattering agent. Hereinafter, each component will be described.

Photosensitive resin substrate The photosensitive resin substrate having the structure represented by the above formula (1) is a compound having an isocyanate group and an unsaturated group after adding acrylic acid to an epoxy resin having a fluorene skeleton. Further, it can be obtained by adding a compound having a mercapto group and a carboxylic acid group.

  Examples of the epoxy resin having a fluorene skeleton include fluorenediglycidyl ether. From the viewpoint of increasing the reactivity between the fluoric acid glycidyl ether and acrylic acid, it is preferable that acrylic acid is 1.5 to 2.5 times mol per mol of fluoric acid glycidyl ether. It is more preferably 8 to 2.2 times mole.

  The reaction temperature is preferably 80 ° C. to 130 ° C., more preferably 90 ° C. to 110 ° C. from the viewpoints of reactivity and stability.

  As a measure for preventing polymerization of unsaturated groups due to heat in the reaction, for example, polymerization prevention of 4-methoxyphenol, 1,4-hydroquinone, 1,4-benzoquinone, di-tert-butylparacresol, etc. An agent can be used and these can be used individually or in mixture of 2 or more types.

  The blending amount of these polymerization inhibitors is, for example, 0 mol% to 10 mol%, preferably 0 mol% to 2 mol% with respect to acrylic acid. Or you may utilize the well-known fact which blows air in a reaction liquid and prevents superposition | polymerization by the heat | fever of an unsaturated group.

  In the reaction, for example, phosphorus compounds such as triphenylphosphine, amines such as triethylamine, pyridine, dimethylbenzylamine, and catalysts such as quaternary salts thereof can be used. Usually, the amount of the catalyst is preferably about 0.1 mol% to 30 mol% with respect to 1 mol of acrylic acid.

  If necessary, the reaction solvent may be a solvent having no active hydrogen such as a hydroxyl group or an amino group, for example, ethers such as tetrahydrofuran, glycols such as diethylene glycol dimethyl ether, diethylene glycol diethyl ether, or diethylene glycol methyl ethyl ether. Cellulose esters such as ethers and methyl cellosolve acetate, propylene glycol monomethyl ether acetate, acetic acid-3-methoxybutyl, acetates and the like can be used. Aromatic hydrocarbons, ketones, esters and the like may be used.

  As a means for monitoring the reaction, for example, acid value titration can be used. The acid value titration may be used until the acid value disappears.

  In this way, an acrylic acid adduct of an epoxy resin having a fluorene skeleton is obtained.

  Next, a compound having an isocyanate group and an unsaturated group is added to an acrylic acid adduct of an epoxy resin having a fluorene skeleton. As a compound having an isocyanate group and an unsaturated group, a (meth) acryloyl group bonded to an isocyanate group via an alkyl group having 2 to 12 carbon atoms, or an organic group having 6 to 15 carbon atoms including a urethane group. Can be used. Specifically, 2-methacryloyloxyethyl isocyanate (“Karenz MOI” manufactured by Showa Denko), 2-acryloyloxyethyl isocyanate (“Karenz AOI” manufactured by Showa Denko), or isophorone per 1 mol of hydroxyl group of pentaerythritol triacrylate. Examples include compounds obtained by reacting 1 mol of diisocyanate.

  As a reaction ratio, from the viewpoint of enhancing the reactivity of both, 0.2 to 2.5 times mol of a compound having an isocyanate group and an unsaturated group with respect to 1 mol of an acrylic acid adduct of an epoxy resin having a fluorene skeleton. Is preferably used, and more preferably 1.0 to 2.0 moles. When the ratio of the compound having an isocyanate group and an unsaturated group is more than the above range, the compound having an unreacted isocyanate group and an unsaturated group remains in the reaction solution, which causes a decrease in purity.

  The reaction temperature is preferably 30 ° C. to 120 ° C., more preferably 40 ° C. to 80 ° C., from the viewpoints of reactivity and stability.

As a means for monitoring the reaction, for example, an infrared absorption spectrum can be used, and the reaction may be performed until the peak due to the isocyanate group at 2280 cm ⁻¹ disappears from the infrared absorption spectrum.

  In this way, a resin having an unsaturated group in the fluorene skeleton is obtained.

  Next, a compound having a mercapto group and a carboxylic acid group is added to a resin having an unsaturated group in the fluorene skeleton. Examples of the compound having a mercapto group and a carboxylic acid group include mercaptoacetic acid, 2-mercaptopropionic acid, 3-mercaptopropionic acid, o-mercaptobenzoic acid, 2-mercaptonicotinic acid, mercaptosuccinic acid and the like.

  The reaction ratio is preferably 0.5 to 50 parts by weight, preferably 1 to 20 parts by weight of the compound having a mercapto group and a carboxylic acid group with respect to 100 parts by weight of the resin from the viewpoint of developability and chemical resistance. The acid value converted to the solid content of the resin is preferably from 5 to 150 mg-KOH / g, more preferably from 10 to 80 mg-KOH / g, from the viewpoints of developability and chemical resistance.

  The reaction temperature is preferably from 30 to 100 ° C, more preferably from 40 to 80 ° C, from the viewpoints of reactivity and stability.

  As a means for monitoring the reaction, for example, an iodometric titration method can be used. The iodometry titration method may be used until the mercapto group content disappears.

Alkali-soluble transparent resin Alkali-soluble transparent resin that can be used in the photosensitive resin composition for light scattering film according to an embodiment of the present invention includes alkyl acrylate, cyclic acrylate, cyclic methacrylate, and hydroxyethyl ethyl acrylate. An acrylic transparent resin composed of an acrylic monomer such as hydroxyethyl methacrylate and a radical polymerizable monomer having an ethylenically unsaturated group, and an epoxy acrylate transparent resin having a fluorene skeleton can be used. However, it is not limited to the above resin. Moreover, you may mix 2 or more types as needed. The refractive index of the alkali-soluble transparent resin is not particularly limited, but may be 1.50 or more, more preferably 1.57 or more.

Photopolymerization initiator Examples of the photopolymerization initiator that can be used in the photosensitive resin composition for a light scattering film according to an embodiment of the present invention include 4-phenoxydichloroacetophenone, 4-t-butyl-dichloroacetophenone, Diethoxyacetophenone, 1- (4-isopropylphenyl) -2-hydroxy-2-methylpropan-1-one, 1-hydroxycyclohexyl phenyl ketone, 2-benzyl-2-dimethylamino-1- (4-morpholinophenyl) Acetophenone photopolymerization initiators such as butane-1-one, benzoin photopolymerization initiators such as benzoin, benzoin methyl ether, benzoin ethyl ether, benzoin isopropyl ether, and benzyldimethyl ketal, benzophenone, benzoylbenzoic acid, benzoylbenzoic acid Methyl Benzophenone photopolymerization initiators such as 4-phenylbenzophenone, hydroxybenzophenone, acrylated benzophenone, 4-benzoyl-4′-methyldiphenyl sulfide, thioxanthone, 2-chlorothioxanthone, 2-methylthioxanthone, isopropylthioxan Son, 2,4-diisopropylthioxanthone and other thioxanthone photopolymerization initiators, 2,4,6-trichloro-s-triazine, 2-phenyl-4,6-bis (trichloromethyl) -s-triazine, 2 -(P-methoxyphenyl) -4,6-bis (trichloromethyl) -s-triazine, 2- (p-tolyl) -4,6-bis (trichloromethyl) -s-triazine, 2-piperonyl-4 , 6-Bis (trichloromethyl) -s-triazine, 2,4-bis (Trichloromethyl) -6-styryl s-triazine, 2- (naphth-1-yl) -4,6-bis (trichloromethyl) -s-triazine, 2- (4-methoxy-naphth-1-yl)- Triazines such as 4,6-bis (trichloromethyl) -s-triazine, 2,4-trichloromethyl- (piperonyl) -6-triazine, 2,4-trichloromethyl (4′-methoxystyryl) -6-triazine Examples include photopolymerization initiators, carbazole photopolymerization initiators, and imidazole photopolymerization initiators. The said photoinitiator is used individually by 1 type or in mixture of 2 or more types.

 The photosensitive resin composition for light scattering films according to one embodiment of the present invention may contain a sensitizer. Examples of the sensitizer include α-acyloxy ester, acylphosphine oxide, methylphenylglyoxylate, benzyl, 9,10-phenanthrenequinone, camphorquinone, ethylanthraquinone, 4,4′-diethyliso Examples include phthalophenone, 3,3 ′, 4,4′-tetra (t-butylperoxycarbonyl) benzophenone, 4,4′-diethylaminobenzophenone, and the like. The above sensitizers are used alone or in combination of two or more.

Light scattering agent There is no problem as long as the light scattering agent contained in the photosensitive resin composition for a light scattering film according to an embodiment of the present invention has heat and chemical resistance. In addition to organic substances such as silicon resin, melamine resin, acrylic resin, and fluorine-based acrylate resin, inorganic substances such as amorphous silica and aluminum oxide, and composites of organic and inorganic substances can be used.

Other Components The photosensitive resin composition for a light scattering film according to one embodiment of the present invention preferably contains a solvent in order to form a uniform light scattering film. Examples of the solvent include cyclohexanone, ethyl cellosolve acetate, butyl cellosolve acetate, 1-methoxy-2-propyl acetate, diethylene glycol dimethyl ether, ethylbenzene, ethylene glycol diethyl ether, xylene, ethyl cellosolve, methyl-n amyl ketone, propylene glycol monomethyl ether, propylene glycol. Examples thereof include monomethyl ether acetate, toluene, methyl ethyl ketone, ethyl acetate, methanol, ethanol, isopropyl alcohol, butanol, isobutyl ketone, and petroleum solvents, and these can be used alone or in combination.

  The photosensitive resin composition for light scattering film according to an embodiment of the present invention includes a chain transfer agent, a surfactant, and a silane coupling agent for the purpose of improving coating properties, improving sensitivity, and improving adhesion. Such additives may be added.

  The photosensitive resin composition for a light scattering film according to an embodiment of the present invention can be produced by mixing the components and dispersing them using various dispersing devices such as a shaker, a desper, a sand mill, and an attritor. . It is preferable to remove coarse particles of 5 μm or more and mixed dust from the light scattering film composition by means of a sintered filter, a membrane filter or the like.

EXAMPLES Specific examples of the present invention are shown below, but the present invention is not limited to the following examples.

(Synthesis Example 1)
In a 2 L four-necked flask equipped with a stirrer, thermometer, cooling tube, and blowing tube, 466 g of bisphenol full orange glycidyl ether (manufactured by Osaka Gas, epoxy equivalent 233), 144 g of acrylic acid (manufactured by Osaka Organic Chemical Industry), propylene glycol 986 g of monomethyl ether acetate, 2 g of dimethylbenzylamine, and 0.1 g of di-tert-butylparacresol were charged and reacted at 100 ° C. for 20 hours. The progress of the reaction was monitored by acid value titration, and the reaction was continued until the acid value disappeared.

Next, 310 g of methacryloyloxyethyl isocyanate (“Karenz MOI” manufactured by Showa Denko KK) was charged and reacted at 50 ° C. for 20 hours. The progress of the reaction was monitored by infrared absorption spectrum, and the reaction was continued until the peak due to the isocyanate group at 2280 cm ⁻¹ disappeared.

  Next, 66 g of mercaptosuccinic acid was charged and reacted at 50 ° C. for 20 hours. The progress of the reaction was monitored by iodometric titration, and the reaction was continued until the mercapto group content disappeared.

  As a result, the obtained substrate solution for a photosensitive resin had a solid content concentration of 50%, a theoretical double bond equivalent of 277, an acid value (in terms of solid content) of 50, and a refractive index of 1.59.

(Synthesis Example 2)
In a 2 L four-necked flask equipped with a stirrer, thermometer, cooling tube, and blowing tube, 466 g of bisphenol full orange glycidyl ether (manufactured by Osaka Gas, epoxy equivalent 233), 144 g of acrylic acid (manufactured by Osaka Organic Chemical Industry), propylene glycol monomethyl 972 g of ether acetate, 2 g of dimethylbenzylamine, and 0.1 g of di-tert-butylparacresol were charged and reacted at 100 ° C. for 20 hours. The progress of the reaction was monitored by acid value titration, and the reaction was continued until the acid value disappeared.

Next, 282 g of acryloyloxyethyl isocyanate (“Karenz AOI” manufactured by Showa Denko) was charged and reacted at 50 ° C. for 20 hours. The progress of the reaction was monitored by infrared absorption spectrum, and the reaction was continued until the peak due to the isocyanate group at 2280 cm ⁻¹ disappeared.

  Next, 80 g of mercaptoacetic acid was charged and reacted at 50 ° C. for 20 hours. The progress of the reaction was monitored by iodometric titration, and the reaction was continued until the mercapto group content disappeared.

  As a result, the obtained base solution for a photosensitive resin had a solid content concentration of 50%, a theoretical double bond equivalent 331 of the base material, an acid value (in terms of solid content) of 50, and a refractive index of 1.59.

Example 1
Components of the composition shown below including the photosensitive resin substrate (C) obtained in Synthesis Example 1 were sufficiently mixed to prepare a photosensitive resin composition.

A: 10 weight of fluorinated acrylic particles having an average particle size of 1.5 μm
B: 20 parts by weight of phenylmaleimide resin having a glycidyl group
C: 20 parts by weight of photosensitive resin substrate obtained in Synthesis Example 1
D: Photopolymerization initiator (manufactured by Ciba Specialty Chemicals, trade name “Irgacure 907” 0.5 part by weight
E: 120 parts by weight of organic solvent Next, after dropping the photosensitive resin composition thus obtained onto the glass substrate, the glass substrate was rotated at a rotational speed of 1000 rpm for 5 seconds with a spinner, and 90 Pre-baking was performed on a hot plate at 2 ° C. for 2 minutes to obtain a coating film having a coating thickness of 2.5 μm. Then, it heated for 30 minutes at 230 degreeC in oven, the coating film was hardened, and the 2.0-micrometer-thick light-scattering film | membrane was obtained.

Example 2
A photosensitive resin composition was prepared in the same manner as in Example 1 except that the photosensitive resin substrate obtained in Synthesis Example 2 was used, and a light scattering film was obtained.

Comparative Example A photosensitive resin composition was prepared by sufficiently mixing components having the composition shown below.

A: 10 parts by weight of fluorinated acrylic particles having an average particle size of 2.0 μm
B: 20 parts by weight of phenylmaleimide resin having a glycidyl group
C: Dipentaerythritol penta and hexaacrylate (“Aronix M-402” manufactured by Toagosei Co., Ltd.) 20 parts by weight
D: Photopolymerization initiator (manufactured by Ciba Specialty Chemicals, trade name “Irgacure 907” 0.5 part by weight
E: 120 parts by weight of organic solvent Next, a light scattering film was obtained in the same manner as in Example 1 using the photosensitive resin composition thus obtained.

  The light scattering film evaluation method is as follows.

  That is, the scattering degree of the light scattering film was evaluated by measuring the haze value. The equipment used was HAZEMETER HM-150 (Murakami Color Research Laboratory). The results are shown in Table 1 below.

  The flatness of the light scattering film was evaluated by the surface roughness (Ra). The surface roughness was measured with Dektak 3030 (manufactured by Nippon Vacuum Technology). The results are shown in Table 1 below.

  The patterning property was evaluated according to the following procedure.

That is, after dropping the photosensitive resin composition onto the glass substrate, the glass substrate was rotated at a rotation speed of 1000 rpm for 5 seconds with a spinner, prebaked on a hot plate at 90 ° C. for 2 minutes, and coated. A coating film having a thickness of 2.5 μm was obtained. Thereafter, this coating film was exposed through a predetermined mask at an exposure amount of 200 mJ / cm ² (i-line), developed with an alkali developer, washed with pure water, and striped 50 μm, space 50 μm. The possibility of pattern formation was evaluated. The results are shown in Table 1 below.

  From the results of Table 1, the light scattering film obtained using the photosensitive resin composition (Synthesis Examples 1 and 2) containing the resin base material represented by the formula (1) has a thin film thickness of about 2 μm. Also, it was brighter than the light scattering film according to the comparative example and exhibited white display characteristics. Furthermore, the surface flatness is sufficiently flatter than the light scattering film according to the comparative example because sufficient scattering properties can be obtained even if the particle size is smaller than the scattering particles contained in the light scattering film according to the comparative example. It was possible to achieve a level of roughness that does not affect the display characteristics of the liquid crystal. Further, the patterning property was the same level as that of the light scattering film according to the comparative example.

Sectional drawing of a transflective liquid crystal display device provided with the light-scattering film obtained using the photosensitive resin composition which concerns on one Embodiment of this invention. Sectional drawing which shows an example of the conventional transflective liquid crystal display device.

Explanation of symbols

  1, 21 ... observer side electrode substrate, 2.22 ... back side electrode substrate, 3, 23 ... liquid crystal layer, 4, 24 ... transparent substrate, 5, 25 ... color filter, 6, 26 ... Light scattering film, 7, 27 ... Transparent electrode, 8, 28 ... Transmission part, 9, 20 ... Reflection part, 10, 30 ... Transparent resin, 11, 31, ..Transparent particles.

Claims (3)

The photopolymerizable compound for photosensitive resin compositions characterized by having a structure represented by following formula (1).

(In the formula, R ¹ represents hydrogen or a methyl group, R ² represents an organic group having 6 to 15 carbon atoms including an alkyl group having 2 to 12 carbon atoms or a urethane group, and R ³ represents 1 carbon atom. -6 represents an organic group, n represents an integer of 1 to 2, and m represents an integer of 1 to 5.) 2. A photosensitive resin composition comprising the photopolymerizable compound for a photosensitive resin composition according to claim 1, an alkali-soluble transparent resin, a photopolymerizable initiator, and a light scattering agent. .   A light scattering film formed using the photosensitive resin composition according to claim 2.

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