JP4757664B2 - マイクロ波供給源装置 - Google Patents
マイクロ波供給源装置 Download PDFInfo
- Publication number
- JP4757664B2 JP4757664B2 JP2006061147A JP2006061147A JP4757664B2 JP 4757664 B2 JP4757664 B2 JP 4757664B2 JP 2006061147 A JP2006061147 A JP 2006061147A JP 2006061147 A JP2006061147 A JP 2006061147A JP 4757664 B2 JP4757664 B2 JP 4757664B2
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- JP
- Japan
- Prior art keywords
- microwave
- amplifier
- power
- resonator
- thermal noise
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J65/00—Lamps without any electrode inside the vessel; Lamps with at least one main electrode outside the vessel
- H01J65/04—Lamps in which a gas filling is excited to luminesce by an external electromagnetic field or by external corpuscular radiation, e.g. for indicating plasma display panels
- H01J65/042—Lamps in which a gas filling is excited to luminesce by an external electromagnetic field or by external corpuscular radiation, e.g. for indicating plasma display panels by an external electromagnetic field
- H01J65/044—Lamps in which a gas filling is excited to luminesce by an external electromagnetic field or by external corpuscular radiation, e.g. for indicating plasma display panels by an external electromagnetic field the field being produced by a separate microwave unit
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- Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Circuit Arrangements For Discharge Lamps (AREA)
- Control Of Amplification And Gain Control (AREA)
Description
P=K×T×B ……(1)
なお、Kはボルツマン定数(=1.38×10−23[J/K])、Tは絶対温度の単位での抵抗体3の温度[K]、Bは周波数帯域幅[Hz]である。
Q[W]=10×log10(Q×1000)[dBm]
=10×log10Q+30[dBm] ……(2)
従って、定常状態において可変ゲインアンプ5から出力されるマイクロ波電力(可変ゲインアンプ5に入力される熱雑音電力を130dBの増幅率で増幅したものと、20dBの雑音指数で可変ゲインアンプ5において発生する熱雑音電力との総和)の強度、すなわち、パワーアンプ7に入力されるマイクロ波電力は、本例では、−108.35[dBm]+(130[dB]+20[dB])=41.65[dBm](=14.62[W])となる。
Claims (2)
- 熱雑音電力を発生する抵抗体と、該抵抗体で発生した熱雑音電力が入力され、該熱雑音電力のうちの所定のマイクロ波周波数帯域の熱雑音電力を抽出するフィルタ手段と、増幅率を可変的に制御可能であり、前記フィルタ手段で抽出された熱雑音電力であるマイクロ波電力を増幅する第1の増幅器と、該第1の増幅器が出力するマイクロ波電力の強度を検出し、その検出した強度に応じて、前記第1の増幅器が出力するマイクロ波電力が所定の一定強度になるように該第1の増幅器の増幅率を制御する制御手段と、該第1の増幅器が出力するマイクロ波電力を所定の増幅率で増幅し、その増幅してなるマイクロ波電力を外部に供給すべきマイクロ波電力として出力する第2の増幅器とを備え、前記抵抗体を、前記第1の増幅器および第2の増幅器のうちの第2の増幅器に該第2の増幅器で発生する熱を受けるように装着したことを特徴とするマイクロ波発生源装置。
- マイクロ波を共振させる共振器の内部空間に、発光物質を封入した発光セルを収容し、該共振器の内部空間で共振するマイクロ波のエネルギーによって前記発光セル内の発光物質を励起して発光させるマイクロ波放電ランプを、前記第2の増幅器が出力するマイクロ波電力の供給対象とし、前記所定のマイクロ波周波数帯域が、前記マイクロ波放電ランプの共振器の共振周波数の変動範囲を含む周波数帯域に設定されていることを特徴とする請求項1記載のマイクロ波発生源装置。
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2006061147A JP4757664B2 (ja) | 2006-03-07 | 2006-03-07 | マイクロ波供給源装置 |
US11/679,495 US8022342B2 (en) | 2006-03-07 | 2007-02-27 | Microwave source system |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2006061147A JP4757664B2 (ja) | 2006-03-07 | 2006-03-07 | マイクロ波供給源装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2007243423A JP2007243423A (ja) | 2007-09-20 |
JP4757664B2 true JP4757664B2 (ja) | 2011-08-24 |
Family
ID=38477881
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2006061147A Expired - Fee Related JP4757664B2 (ja) | 2006-03-07 | 2006-03-07 | マイクロ波供給源装置 |
Country Status (2)
Country | Link |
---|---|
US (1) | US8022342B2 (ja) |
JP (1) | JP4757664B2 (ja) |
Families Citing this family (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
ES2335635B2 (es) * | 2008-02-04 | 2011-01-17 | Universidad Politecnica De Valencia | Metodo para la monitorizacion no invasiva del curado de un material plastico termoestable mediante el uso de microondas y dispositivo microondas para la aplicacion de dicho metodo. |
US10470256B2 (en) * | 2013-04-16 | 2019-11-05 | Applied Materials, Inc. | Method and apparatus for controlled broadband microwave heating |
JP5665914B2 (ja) * | 2013-05-13 | 2015-02-04 | 株式会社東芝 | 磁気共鳴測定装置 |
CN105757714B (zh) * | 2016-04-13 | 2018-01-23 | 南京腾亚精工科技有限公司 | 一种燃气动力工具高压发生电路 |
CN106128934A (zh) * | 2016-08-12 | 2016-11-16 | 安徽中杰信息科技有限公司 | 无极紫外线灯 |
CN110892789B (zh) * | 2017-07-04 | 2022-06-07 | 松下电器产业株式会社 | 微波处理装置 |
KR101880747B1 (ko) * | 2017-08-30 | 2018-07-20 | 주식회사 말타니 | 초고주파 방전 램프 |
JP7448262B2 (ja) * | 2021-04-02 | 2024-03-12 | 北京航天雷特机電工程有限公司 | マイクロ波発生回路及びマイクロ波発生装置 |
CN118399910B (zh) * | 2024-06-24 | 2024-09-10 | 深圳市君威科技有限公司 | 微波放大器设备的自动功率控制方法 |
Family Cites Families (17)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4063132A (en) * | 1976-08-04 | 1977-12-13 | Gte Laboratories Inc. | DC powered microwave discharge in an electrodeless light source |
JPS5648094A (en) * | 1979-09-25 | 1981-05-01 | Masaki Yoshimura | High frequency light emitting drive unit |
US4514706A (en) * | 1982-09-24 | 1985-04-30 | Rockwell International Corporation | Second or higher order PLL with increased low and medium frequency gain |
US4642526A (en) * | 1984-09-14 | 1987-02-10 | Angstrom Robotics & Technologies, Inc. | Fluorescent object recognition system having self-modulated light source |
JPH03117948A (ja) * | 1989-09-29 | 1991-05-20 | Sharp Corp | 自動ダイヤル装置 |
JPH05121944A (ja) * | 1991-10-30 | 1993-05-18 | Nec Eng Ltd | 雑音信号生成方式 |
JPH09168768A (ja) * | 1995-12-20 | 1997-06-30 | Fujitsu General Ltd | 盗聴防止装置 |
JPH09260036A (ja) * | 1996-03-22 | 1997-10-03 | Sanyo Seiko Kk | 加熱装置 |
US5723951A (en) * | 1996-06-26 | 1998-03-03 | Osram Sylvania Inc. | Method of hot restarting a high intensity discharge lamp |
EP0944952B1 (en) * | 1996-12-03 | 2009-01-07 | Raytheon Company | Variable microwave cold/warm noise source |
JPH10322137A (ja) * | 1997-05-20 | 1998-12-04 | Matsushita Electric Ind Co Ltd | プリディストーション型歪補償回路付送信装置 |
JP2980576B2 (ja) * | 1997-09-12 | 1999-11-22 | 株式会社東芝 | 物理乱数発生装置及び方法並びに物理乱数記録媒体 |
JP3480822B2 (ja) * | 1999-11-02 | 2003-12-22 | 斎藤 威 | 熱雑音ランダムパルス発生装置及び乱数生成装置 |
JP2003249197A (ja) * | 2002-02-25 | 2003-09-05 | Matsushita Electric Works Ltd | マイクロ波無電極放電ランプ点灯装置 |
TW200512713A (en) * | 2003-09-16 | 2005-04-01 | Beyond Innovation Tech Co Ltd | PWM illumination control circuit with low visual noise |
TWI291311B (en) * | 2003-12-08 | 2007-12-11 | Beyond Innovation Tech Co Ltd | PWM illumination control circuit with low visual noise for LED |
KR100575666B1 (ko) * | 2003-12-13 | 2006-05-03 | 엘지전자 주식회사 | 플라즈마 램프 시스템 |
-
2006
- 2006-03-07 JP JP2006061147A patent/JP4757664B2/ja not_active Expired - Fee Related
-
2007
- 2007-02-27 US US11/679,495 patent/US8022342B2/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
US8022342B2 (en) | 2011-09-20 |
JP2007243423A (ja) | 2007-09-20 |
US20070210052A1 (en) | 2007-09-13 |
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