JP4602911B2 - 希土類系テープ状酸化物超電導体 - Google Patents
希土類系テープ状酸化物超電導体 Download PDFInfo
- Publication number
- JP4602911B2 JP4602911B2 JP2006005831A JP2006005831A JP4602911B2 JP 4602911 B2 JP4602911 B2 JP 4602911B2 JP 2006005831 A JP2006005831 A JP 2006005831A JP 2006005831 A JP2006005831 A JP 2006005831A JP 4602911 B2 JP4602911 B2 JP 4602911B2
- Authority
- JP
- Japan
- Prior art keywords
- intermediate layer
- rare earth
- tape
- oxide superconductor
- substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 239000002887 superconductor Substances 0.000 title claims description 24
- 229910052761 rare earth metal Inorganic materials 0.000 title claims description 18
- 150000002910 rare earth metals Chemical class 0.000 title claims description 18
- 239000000758 substrate Substances 0.000 claims description 41
- 238000000034 method Methods 0.000 claims description 35
- 229910052751 metal Inorganic materials 0.000 claims description 27
- 239000002184 metal Substances 0.000 claims description 26
- 229910045601 alloy Inorganic materials 0.000 claims description 16
- 239000000956 alloy Substances 0.000 claims description 16
- 238000010438 heat treatment Methods 0.000 claims description 15
- 239000011259 mixed solution Substances 0.000 claims description 15
- 229910052684 Cerium Inorganic materials 0.000 claims description 11
- 239000003960 organic solvent Substances 0.000 claims description 10
- 229910052688 Gadolinium Inorganic materials 0.000 claims description 9
- 229910052802 copper Inorganic materials 0.000 claims description 9
- 229910052759 nickel Inorganic materials 0.000 claims description 9
- -1 organic acid salt Chemical class 0.000 claims description 8
- 229910052726 zirconium Inorganic materials 0.000 claims description 8
- 229910052772 Samarium Inorganic materials 0.000 claims description 7
- 238000001354 calcination Methods 0.000 claims description 7
- 238000000151 deposition Methods 0.000 claims description 6
- YPIFGDQKSSMYHQ-UHFFFAOYSA-M 7,7-dimethyloctanoate Chemical compound CC(C)(C)CCCCCC([O-])=O YPIFGDQKSSMYHQ-UHFFFAOYSA-M 0.000 claims description 3
- 125000005609 naphthenate group Chemical group 0.000 claims description 3
- WWZKQHOCKIZLMA-UHFFFAOYSA-N octanoic acid Chemical compound CCCCCCCC(O)=O WWZKQHOCKIZLMA-UHFFFAOYSA-N 0.000 claims description 3
- 238000004544 sputter deposition Methods 0.000 claims description 3
- 238000005229 chemical vapour deposition Methods 0.000 claims description 2
- 229910052804 chromium Inorganic materials 0.000 claims description 2
- 229910052750 molybdenum Inorganic materials 0.000 claims description 2
- 229910052715 tantalum Inorganic materials 0.000 claims description 2
- 229910052718 tin Inorganic materials 0.000 claims description 2
- 229910052721 tungsten Inorganic materials 0.000 claims description 2
- 229910052720 vanadium Inorganic materials 0.000 claims description 2
- 229910052725 zinc Inorganic materials 0.000 claims description 2
- 150000002902 organometallic compounds Chemical class 0.000 claims 1
- 229910052719 titanium Inorganic materials 0.000 claims 1
- 239000010408 film Substances 0.000 description 28
- 238000000576 coating method Methods 0.000 description 11
- 239000013078 crystal Substances 0.000 description 8
- 239000011248 coating agent Substances 0.000 description 7
- 150000002736 metal compounds Chemical class 0.000 description 6
- 238000005498 polishing Methods 0.000 description 5
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 4
- 230000000052 comparative effect Effects 0.000 description 4
- 238000009792 diffusion process Methods 0.000 description 4
- 238000007735 ion beam assisted deposition Methods 0.000 description 4
- 239000002994 raw material Substances 0.000 description 4
- 230000003746 surface roughness Effects 0.000 description 4
- 239000000654 additive Substances 0.000 description 3
- 230000000996 additive effect Effects 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 3
- 230000008021 deposition Effects 0.000 description 3
- 229910001080 W alloy Inorganic materials 0.000 description 2
- 238000005097 cold rolling Methods 0.000 description 2
- 238000005137 deposition process Methods 0.000 description 2
- 238000003618 dip coating Methods 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- 229910052757 nitrogen Inorganic materials 0.000 description 2
- 238000005096 rolling process Methods 0.000 description 2
- 230000006641 stabilisation Effects 0.000 description 2
- 238000011105 stabilization Methods 0.000 description 2
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- 229910000990 Ni alloy Inorganic materials 0.000 description 1
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 1
- 229910052788 barium Inorganic materials 0.000 description 1
- 229910052797 bismuth Inorganic materials 0.000 description 1
- JCXGWMGPZLAOME-UHFFFAOYSA-N bismuth atom Chemical compound [Bi] JCXGWMGPZLAOME-UHFFFAOYSA-N 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 238000011437 continuous method Methods 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 230000000593 degrading effect Effects 0.000 description 1
- 238000011038 discontinuous diafiltration by volume reduction Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 229910000856 hastalloy Inorganic materials 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 230000001771 impaired effect Effects 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 229910010272 inorganic material Inorganic materials 0.000 description 1
- 239000011147 inorganic material Substances 0.000 description 1
- 238000011835 investigation Methods 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 239000012071 phase Substances 0.000 description 1
- 238000000197 pyrolysis Methods 0.000 description 1
- 230000009257 reactivity Effects 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 239000006104 solid solution Substances 0.000 description 1
- 239000000243 solution Substances 0.000 description 1
- 238000004528 spin coating Methods 0.000 description 1
- 230000000087 stabilizing effect Effects 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 238000005482 strain hardening Methods 0.000 description 1
- 238000010301 surface-oxidation reaction Methods 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
- 239000012808 vapor phase Substances 0.000 description 1
- 229910052727 yttrium Inorganic materials 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N60/00—Superconducting devices
- H10N60/01—Manufacture or treatment
- H10N60/0268—Manufacture or treatment of devices comprising copper oxide
- H10N60/0296—Processes for depositing or forming copper oxide superconductor layers
- H10N60/0576—Processes for depositing or forming copper oxide superconductor layers characterised by the substrate
- H10N60/0632—Intermediate layers, e.g. for growth control
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Superconductors And Manufacturing Methods Therefor (AREA)
- Superconductor Devices And Manufacturing Methods Thereof (AREA)
- Inorganic Compounds Of Heavy Metals (AREA)
Description
図1は、本発明の希土類系テープ状酸化物超電導体のテープの軸方向に垂直な断面を示したもので、希土類系テープ状酸化物超電導体10は、冷間圧延によりNi―W合金を所定の厚さに成形した後、900〜1300℃の温度で配向化熱処理を施して2軸配向させたテープ状基板1の表面に、Ce、GdまたはSmから選択された1種類の元素およびZrを含む各金属有機酸塩または有機金属化合物を有機溶媒中に溶解した混合溶液を塗布後仮焼する工程を複数回繰り返して形成した5nm以下の表面平滑性を有するA2Zr2O7からなる第1中間層2、この第1中間層2の上にパルス蒸着法により形成されたCeO2膜からなる第2中間層3、MOD法により形成されたYBCO超電導層4およびこのYBCO超電導層の上にAg安定化層5が成膜された構造を有する。
金属含有量および塗布回数を変え、他は上記実施例と同様の方法により第1中間層を形成し、以後実施例と同様の方法により第2中間層およびYBCO超電導膜を成膜し、液体窒素中でJc値を測定した。
2 A2Zr2O7からなる第1中間層
3 CeO2膜からなる第2中間層
4 YBCO超電導層
5 Ag安定化層
10 希土類系テープ状酸化物超電導体
Claims (6)
- NiまたはNi基合金あるいはCuまたはCu基合金に冷間加工後、加熱処理を施して形成した2軸配向性を有する基板上にCe、GdまたはSmから選択された1種類の元素およびZrを含む各金属有機酸塩または有機金属化合物を有機溶媒中に金属元素量で0.08〜0.5mol/l溶解した混合溶液を塗布後仮焼する工程を複数回繰り返して形成されたA 2 Zr 2 O 7 (ここでAは、Ce、GdまたはSmから選択された1種類の元素を示す。)からなる第1中間層と、CeO2膜またはCe−Gd−O膜からなる第2中間層および酸化物超電導層を順次形成したことを特徴とする希土類系テープ状酸化物超電導体。
- 混合溶液は、この中間層を構成する各元素を含むオクチル酸塩、ナフテン酸塩またはネオデカン酸塩の混合溶液の塗布後、熱処理を施すことにより形成されることを特徴とする請求項1記載の希土類系テープ状酸化物超電導体。
- 金属元素量は、0.1〜0.3mol/lであることを特徴とする請求項1記載の希土類系テープ状酸化物超電導体。
- 第2中間層は、MOD法、パルスレーザー蒸着法、スパッタ法またはCVD法のいずれかの方法により成膜された層からなることを特徴とする請求項1乃至3いずれか1項記載の希土類系テープ状酸化物超電導体。
- Ni基合金あるいはCu基合金は、NiまたはCuにW、Sn、Zn、Mo、Cr、V、TaまたはTiの中から選択されたいずれか1種以上の元素を0.1〜15at%添加した合金からなることを特徴とする請求項1乃至4いずれか1項記載の希土類系テープ状酸化物超電導体。
- 2軸配向した基板は、900〜1300℃の温度範囲で熱処理が施されたものであることを特徴とする請求項1乃至5いずれか1項記載の希土類系テープ状酸化物超電導体。
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2006005831A JP4602911B2 (ja) | 2006-01-13 | 2006-01-13 | 希土類系テープ状酸化物超電導体 |
US12/087,337 US7662749B2 (en) | 2006-01-13 | 2007-01-10 | Rare earth-containing tape-shaped oxide superconductor |
EP07706486A EP1973122A4 (en) | 2006-01-13 | 2007-01-10 | CONICAL OXIDE SUPERCONDUCTOR CONTAINING RARE EARTHS |
PCT/JP2007/050139 WO2007080876A1 (ja) | 2006-01-13 | 2007-01-10 | 希土類系テープ状酸化物超電導体 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2006005831A JP4602911B2 (ja) | 2006-01-13 | 2006-01-13 | 希土類系テープ状酸化物超電導体 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2007188756A JP2007188756A (ja) | 2007-07-26 |
JP4602911B2 true JP4602911B2 (ja) | 2010-12-22 |
Family
ID=38256281
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2006005831A Expired - Fee Related JP4602911B2 (ja) | 2006-01-13 | 2006-01-13 | 希土類系テープ状酸化物超電導体 |
Country Status (4)
Country | Link |
---|---|
US (1) | US7662749B2 (ja) |
EP (1) | EP1973122A4 (ja) |
JP (1) | JP4602911B2 (ja) |
WO (1) | WO2007080876A1 (ja) |
Families Citing this family (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP5096422B2 (ja) * | 2009-07-10 | 2012-12-12 | 住友電気工業株式会社 | 基板および超電導線材の製造方法 |
JP5356134B2 (ja) | 2009-07-10 | 2013-12-04 | 住友電気工業株式会社 | 基板、基板の製造方法、超電導線材および超電導線材の製造方法 |
JP5380250B2 (ja) * | 2009-10-29 | 2014-01-08 | 公益財団法人国際超電導産業技術研究センター | 希土類系酸化物超電導線材及びその製造方法 |
JP5503252B2 (ja) * | 2009-10-29 | 2014-05-28 | 公益財団法人国際超電導産業技術研究センター | 希土類系酸化物超電導線材 |
EP2343745A1 (en) * | 2010-01-07 | 2011-07-13 | Nexans | Coated conductor with improved grain orientation |
JP5690524B2 (ja) * | 2010-08-10 | 2015-03-25 | 昭和電線ケーブルシステム株式会社 | Re系酸化物超電導線材及びその製造方法 |
JP2012221922A (ja) * | 2011-04-14 | 2012-11-12 | Sumitomo Electric Ind Ltd | 酸化物超電導薄膜層形成用の原料溶液、酸化物超電導薄膜層および酸化物超電導薄膜線材 |
US20150279519A1 (en) * | 2012-06-27 | 2015-10-01 | Furukawa Electric Co., Ltd. | Superconducting wire |
CN104625069A (zh) * | 2015-01-23 | 2015-05-20 | 上海大学 | Ni基合金复合基带及其制备方法 |
CN107475557A (zh) * | 2015-12-29 | 2017-12-15 | 刘雷 | 一种高导电率高韧性的铜合金电缆导线及其制备方法 |
Citations (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2002203439A (ja) * | 2000-10-31 | 2002-07-19 | Internatl Superconductivity Technology Center | テープ状酸化物超電導体 |
JP2004171841A (ja) * | 2002-11-18 | 2004-06-17 | Showa Electric Wire & Cable Co Ltd | 希土類系テープ状酸化物超電導体及びその製造方法 |
WO2004100182A1 (ja) * | 2003-05-07 | 2004-11-18 | International Superconductivity Technology Center, The Juridical Foundation | 希土類系酸化物超電導体及びその製造方法 |
JP2004335718A (ja) * | 2003-05-07 | 2004-11-25 | Internatl Superconductivity Technology Center | テープ状酸化物超電導線の製造方法及びその製造装置 |
WO2005008687A1 (ja) * | 2003-07-17 | 2005-01-27 | Fuji Electric Systems Co., Ltd. | 超電導線材及びそれを用いた超電導コイル |
JP2005056591A (ja) * | 2003-08-04 | 2005-03-03 | Sumitomo Electric Ind Ltd | 薄膜超電導線材及びその製造方法 |
WO2005088653A1 (ja) * | 2004-03-12 | 2005-09-22 | International Superconductivity Technology Center, The Juridical Foundation | 希土類系酸化物超電導体及びその製造方法 |
JP2005314784A (ja) * | 2004-03-31 | 2005-11-10 | Fujikura Ltd | 多結晶配向中間薄膜とその製造方法及び酸化物超電導導体とその製造方法 |
JP2007115561A (ja) * | 2005-10-21 | 2007-05-10 | Internatl Superconductivity Technology Center | 希土類系テープ状酸化物超電導体及びその製造方法 |
Family Cites Families (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2670391B2 (ja) | 1991-04-30 | 1997-10-29 | 株式会社フジクラ | 多結晶薄膜の製造装置 |
JP2721595B2 (ja) | 1991-04-30 | 1998-03-04 | 株式会社フジクラ | 多結晶薄膜の製造方法 |
US6270908B1 (en) * | 1997-09-02 | 2001-08-07 | Ut-Battelle, Llc | Rare earth zirconium oxide buffer layers on metal substrates |
EP1178129B1 (en) * | 1999-11-29 | 2010-12-15 | Fujikura Ltd. | Polycrystalline thin film and method for preparation thereof, and superconducting oxide and method for preparation thereof |
JP4446596B2 (ja) | 2000-12-27 | 2010-04-07 | 京セラ株式会社 | 光モジュールの製造方法 |
JP2005056741A (ja) | 2003-08-06 | 2005-03-03 | Sumitomo Electric Ind Ltd | 薄膜超電導線材およびその製造方法 |
JP2005276465A (ja) | 2004-03-23 | 2005-10-06 | Sumitomo Electric Ind Ltd | 超電導線材 |
US7261776B2 (en) * | 2004-03-30 | 2007-08-28 | American Superconductor Corporation | Deposition of buffer layers on textured metal surfaces |
DE102004038030B4 (de) * | 2004-08-05 | 2007-10-25 | Trithor Gmbh | Verfahren zur Herstellung eines Hochtemperatur-Supraleiters |
-
2006
- 2006-01-13 JP JP2006005831A patent/JP4602911B2/ja not_active Expired - Fee Related
-
2007
- 2007-01-10 EP EP07706486A patent/EP1973122A4/en not_active Withdrawn
- 2007-01-10 US US12/087,337 patent/US7662749B2/en not_active Expired - Fee Related
- 2007-01-10 WO PCT/JP2007/050139 patent/WO2007080876A1/ja active Application Filing
Patent Citations (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2002203439A (ja) * | 2000-10-31 | 2002-07-19 | Internatl Superconductivity Technology Center | テープ状酸化物超電導体 |
JP2004171841A (ja) * | 2002-11-18 | 2004-06-17 | Showa Electric Wire & Cable Co Ltd | 希土類系テープ状酸化物超電導体及びその製造方法 |
WO2004100182A1 (ja) * | 2003-05-07 | 2004-11-18 | International Superconductivity Technology Center, The Juridical Foundation | 希土類系酸化物超電導体及びその製造方法 |
JP2004335718A (ja) * | 2003-05-07 | 2004-11-25 | Internatl Superconductivity Technology Center | テープ状酸化物超電導線の製造方法及びその製造装置 |
WO2005008687A1 (ja) * | 2003-07-17 | 2005-01-27 | Fuji Electric Systems Co., Ltd. | 超電導線材及びそれを用いた超電導コイル |
JP2005056591A (ja) * | 2003-08-04 | 2005-03-03 | Sumitomo Electric Ind Ltd | 薄膜超電導線材及びその製造方法 |
WO2005088653A1 (ja) * | 2004-03-12 | 2005-09-22 | International Superconductivity Technology Center, The Juridical Foundation | 希土類系酸化物超電導体及びその製造方法 |
JP2005314784A (ja) * | 2004-03-31 | 2005-11-10 | Fujikura Ltd | 多結晶配向中間薄膜とその製造方法及び酸化物超電導導体とその製造方法 |
JP2007115561A (ja) * | 2005-10-21 | 2007-05-10 | Internatl Superconductivity Technology Center | 希土類系テープ状酸化物超電導体及びその製造方法 |
Also Published As
Publication number | Publication date |
---|---|
US20090069187A1 (en) | 2009-03-12 |
JP2007188756A (ja) | 2007-07-26 |
US7662749B2 (en) | 2010-02-16 |
EP1973122A1 (en) | 2008-09-24 |
EP1973122A4 (en) | 2012-07-18 |
WO2007080876A1 (ja) | 2007-07-19 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP4602911B2 (ja) | 希土類系テープ状酸化物超電導体 | |
US7781376B2 (en) | High temperature superconducting wires and coils | |
JP4268645B2 (ja) | 希土類系テープ状酸化物超電導体及びそれに用いる複合基板 | |
JP4713012B2 (ja) | テープ状酸化物超電導体 | |
EP2234121A1 (en) | Re-based oxide superconducting rod material and process for producing the re-based oxide superconducting rod material | |
JP5244337B2 (ja) | テープ状酸化物超電導体 | |
JP6219278B2 (ja) | 超電導線 | |
US11488746B2 (en) | Superconductor with improved flux pinning at low temperatures | |
JP5513154B2 (ja) | 酸化物超電導線材及び酸化物超電導線材の製造方法 | |
JP5757718B2 (ja) | 酸化物超電導線材の製造方法 | |
JP4800740B2 (ja) | 希土類系テープ状酸化物超電導体及びその製造方法 | |
JP4411265B2 (ja) | 希土類系テープ状酸化物超電導体及びその製造方法 | |
JP2002150855A (ja) | 酸化物超電導線材およびその製造方法 | |
JP6104757B2 (ja) | 酸化物超電導線材及びその製造方法 | |
JPWO2005088653A1 (ja) | 希土類系酸化物超電導体及びその製造方法 | |
JP5939995B2 (ja) | 超電導線材及び超電導線材の製造方法 | |
JP5503252B2 (ja) | 希土類系酸化物超電導線材 | |
WO2013015328A1 (ja) | 超電導薄膜用基材、超電導薄膜及び超電導薄膜の製造方法 | |
JP6262304B2 (ja) | 酸化物超電導線材の製造方法 | |
JP2019125436A (ja) | 酸化物超電導線材 | |
JP2010086666A (ja) | 酸化物超電導線材及びその製造方法 | |
JP2016143516A (ja) | 酸化物超電導線材及びその製造方法 | |
JP2012204190A (ja) | 酸化物超電導薄膜 | |
JP2015210981A (ja) | 酸化物超電導線材の製造方法 | |
JP2009289667A (ja) | 酸化物超電導線材 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20100316 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20100514 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20100622 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20100811 |
|
TRDD | Decision of grant or rejection written | ||
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20100907 |
|
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 |
|
A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20100930 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20131008 Year of fee payment: 3 |
|
R150 | Certificate of patent or registration of utility model |
Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20131008 Year of fee payment: 3 |
|
S533 | Written request for registration of change of name |
Free format text: JAPANESE INTERMEDIATE CODE: R313533 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20131008 Year of fee payment: 3 |
|
R350 | Written notification of registration of transfer |
Free format text: JAPANESE INTERMEDIATE CODE: R350 |
|
S531 | Written request for registration of change of domicile |
Free format text: JAPANESE INTERMEDIATE CODE: R313531 |
|
R350 | Written notification of registration of transfer |
Free format text: JAPANESE INTERMEDIATE CODE: R350 |
|
S111 | Request for change of ownership or part of ownership |
Free format text: JAPANESE INTERMEDIATE CODE: R313117 |
|
S531 | Written request for registration of change of domicile |
Free format text: JAPANESE INTERMEDIATE CODE: R313531 |
|
R350 | Written notification of registration of transfer |
Free format text: JAPANESE INTERMEDIATE CODE: R350 |
|
LAPS | Cancellation because of no payment of annual fees |