JP4560642B2 - Method for producing Sn-coated conductive material - Google Patents

Description

  The present invention relates to copper or copper alloy (simply referred to as a conductive material) used for connector terminals for automobiles, bus bars, terminals of electric / electronic parts, etc., and in particular, different characteristics are required at each terminal and both ends of the bus bar. It is about. More specifically, it relates to a case where low insertion force and abrasion resistance are particularly required at one end, and particularly solderability and heat resistance are required at the other end.

  A terminal to be inserted into a through hole such as a printed circuit board (PCB) or a surface-mounted terminal is pressed from a strip of copper or copper alloy coated with tin (represented as Sn in the present invention). What was shape | molded was common and was attached to the board | substrate with the Sn-Pb type solder. In addition, due to the miniaturization of parts and the like, the terminals are becoming thinner, and the area ratio of the end face exposed during pressing is increasing. Furthermore, with Pb-free, soldering with solder that does not contain Pb (referred to as Pb-free solder) is required. Sn-Ag-Cu-based solders are well known as solders that do not contain Pb. However, since the melting point is higher than that of Sn-Pb-based solders and solderability is reduced, it is difficult to attach terminals to a substrate. Yes.

As a measure for improving the solderability, there is a means of applying a thick (greater than 3 μm) Sn plating after pressing, but there is a problem that the insertion force at the time of connection with another connector increases on the other side of the terminal. . Moreover, when reflow processing is not performed after Sn plating, whiskers are likely to occur, and there is a risk of short circuit.
As another approach to Pb-free, a technique has been developed in which the tip of the terminal is pressed into a spring shape and directly fixed to the through hole. In order to ensure the heat resistance of the terminal, thick (> 3 μm) Sn plating is often applied after press working. However, since the terminal was originally designed with a very high contact pressure, the insertion force when inserting a through hole is high. The problem is too big. In order to reduce the insertion force, it is conceivable to simply reduce the thickness of Sn, but in that case, a thick oxide is likely to be formed on the surface due to changes over time, and heat resistance at the connection with the board or another connector May cause problems.

As another countermeasure, when Sn plating is performed on a base material made of brass, the Sn plating layer is made thicker than the contact portion (elastically in contact with the mating terminal fitting) at the attachment portion (soldered to the circuit board). Then, the alloying of Sn and Zn diffused from the base metal delays the time to reach the surface of the Sn plating layer to improve the soldering, and at the contact portion, the resistance of fitting / disengaging between the terminal fittings Has also been proposed (see, for example, Patent Document 1). However, this method is to form a thin Sn plating thin layer uniformly on the entire brass base material, and then again to thicken only the mounting portion to be thickened. The plating process is complicated and expensive. In addition, it is difficult to ensure sufficient solderability and heat resistance in a more severe thermal environment such as Pb-free solder mounting. This is because the base plating component (Cu or Ni) applied to prevent the diffusion of Zn diffuses to the surface layer, forming an oxide that has high electrical resistance and hinders solderability. If the thick Sn portion is set to 3 μm or more as a measure for preventing the base component from diffusing, solderability is improved, but the problem of high cost remains.
JP-A-11-2114050

For terminals inserted into the PCB, Sn plating is widely used from the viewpoint of cost, heat resistance, corrosion resistance, and solderability. Some terminals are required to have both a portion in which low insertion force is strongly required and a portion in which solderability and heat resistance are strongly required in one terminal. In the case of Sn plating, low insertion force, solderability and heat resistance are in a trade-off relationship and are problematic. If the Sn thickness is thin, the solderability and heat resistance are inferior, but the low insertion force is excellent. On the other hand, if the Sn thickness is thick, the low insertion force is inferior, but the solderability and heat resistance are excellent.
Further, when the Sn coating method is gloss Sn plating, there are problems of whisker and heat resistance. Whiskering can be greatly reduced if reflow treatment is performed after Sn plating, but it does not have sufficient heat resistance in a severe thermal environment such as an engine room of an automobile. Therefore, there is a need for a low-cost copper or copper alloy member that has both a portion that requires low insertion force and a portion that requires strong solderability and heat resistance, and is excellent in whisker resistance.

  The present invention solves the above-mentioned problem. First, a partial region of a material made of copper or a copper alloy is coated with a Sn plating thin layer having a thickness of 0.05 μm or more and less than 0.8 μm, The remaining region is covered with an integrally formed Sn plating thick layer having a thickness of 0.8 μm or more and 3 μm or less, and the Ni plating layer is formed from the material side as an underlayer of the Sn plating thin layer and the Sn plating thick layer. And a conductive material having a base layer formed of a Cu plating layer; second, the conductive material according to the first aspect, wherein the Sn plating thin layer has a thickness of 0.1 μm or more and less than 0.8 μm; The conductive material according to 1 or 2, wherein the Sn plating thick layer has a thickness of 0.8 μm or more and less than 2.0 μm; and fourth, the Ni is 0.05 μm or more and 2 μm or less in thickness from the material side. It was formed with a plating layer and a Cu plating layer having a thickness of 0.05 μm or more and 1 μm or less. The conductive material according to any one of the first to third, which is a base layer; fifth, the conductive material according to any one of the first to fourth, wherein at least the outermost surface side of the Sn plating thick layer is a melt-solidified structure; In the plating bath, the material having the base layer is used as a cathode, and an insulating shielding plate is disposed between a part of the cathode and the anode facing the cathode, and electroplating is performed. A thin region of Sn plating with a thickness of 0.05 μm or more and less than 0.8 μm is coated on a part of the area on the cathode, and a thick Sn plating layer formed integrally with a thickness of 0.8 μm or more and 3 μm or less is coated on the remaining region. A method for producing the conductive material according to any one of 1 to 5; seventh, in a plating bath, the material having the base layer is a cathode, and both surfaces of the cathode and each anode facing the both surfaces; Electroplating is performed by placing an insulating shielding plate in part between each of Thus, a Sn plating thin layer with a thickness of 0.05 μm or more and less than 0.8 μm is coated on a part of the cathode, and the Sn plating thickness formed integrally with a thickness of 0.8 μm or more and 3 μm or less on the remaining area. A method for producing a conductive material according to any one of 1 to 5 that covers a layer; eighth, a reflow treatment is performed on the thin layer and the thick layer formed by the electroplating; Ninth, the manufacturing method according to any one of 6 to 8, wherein at least one of the electroplating step and the reflow treatment step is performed on a reel-to-reel line.

  The conductive material according to the present invention is excellent as a material for electrical and electronic parts such as terminals and bus bars that require low insertion force and solderability and heat resistance at the same time depending on the part. Can be soldered, and has an excellent effect that it can be efficiently manufactured at low cost.

The present invention will be described more specifically.
A base plating layer is formed on a strip of copper or copper alloy or a chain strip formed into a desired shape. An underlayer formed from a Ni plating layer of 0.05 to 2 μm and a Cu plating layer of 0.05 to 1 μm is preferable from the material side. Sn is plated thereon, and a reflow process is performed as necessary.

  For Sn plating, an insulating shielding plate 3 is disposed at a position corresponding to a region of a material (cathode) 2 to be thinned by using a plating tank 1 whose sectional conceptual view is shown in FIG. Each is adjusted to a desired thickness. That is, in the plating bath 4 in the plating tank 1, the material 2 having the base layer is used as a cathode, and the shielding plate 3 is disposed in a part between the cathode and the anode 5 facing the cathode to perform electroplating. The Sn plating thin layer is coated on a part of the material 2 (the lower region of the material 2 in the case of FIG. 1), and the Sn is integrally formed in the remaining region (the upper region of the material 2 in the case of FIG. 1). The plating thick layer is covered, and preferably, the anode 5 is opposed to both sides of the cathode 2 and the shielding plate 3 is disposed between them. The shielding plate 3 can be perforated in order to balance the plating thickness, and can be provided with an inclination. As a result, a highly reliable plated thick layer formed by integrating the thin layer and the thick layer can be obtained.

In carrying out the method of the present invention, the material strip is first unwound from the reel-to-reel line, that is, the material reel wound with the material strip made of copper or copper alloy. After forming the film, it is efficient to perform electro Sn plating, then perform a reflow process, and take up a product reel. Furthermore, electrolytic degreasing, pickling, washing, and drying are performed as necessary for each step.
More specifically, when the electric Sn plating process is performed on the reel-to-reel line, the strip material is continuously supplied from the direction perpendicular to the paper surface in FIG. 1 and continuously in the same direction after the electric Sn plating. It can be wound up (that is, for example, the strip material is supplied from the side surface of the plating tank into the plating tank in the horizontal direction, and after plating, it is wound up from the opposite side face to the outside of the plating tank in the horizontal direction). The underplating layer forming step and the reflow treatment step can be performed continuously in the same manner. If these steps are performed continuously, all the steps can be performed at once in a reel-to-reel line.

FIG. 2 shows a conceptual cross-sectional view of a conductive material Sn-plated by the plating tank of FIG. That is, when Sn plating is performed on the material 2 having the base layer 6, a Sn plating thin layer is formed in a part (downward in FIG. 2) and a Sn plating thick layer is formed in the remaining (upward in FIG. 2).
In addition, when manufactured by the above method, the boundary between the Sn plating thin layer and the Sn plating thick layer may not be clear, and there may be a portion where the thickness changes continuously. There is no problem if the thickness is controlled.

Next, the reasons for limiting the numerical range of the present invention will be described.
(1) Thickness of Sn plating thick layer not less than 0.8 μm and not more than 3 μm If the thickness is less than 0.8 μm, the solderability is not sufficient due to the change with time. If it exceeds 3 μm, the insertion force and the wear of Sn become remarkable, and the cost is disadvantageous. Preferably it is 0.8-2 micrometers, More preferably, it is 1-2 micrometers.
(2) Thickness of Sn-plated thin layer of 0.05 μm or more and less than 0.8 μm If the thickness is less than 0.05 μm, there may be a problem in electrical reliability due to diffusion or oxidation of the material or the base component. If the thickness is 0.8 μm or more, the effect of reducing the insertion force is small. Preferably it is 0.1 micrometer or more and less than 0.8 micrometer, More preferably, it is 0.2-0.7 micrometer.
(3) About the thickness of each foundation layer It is preferable that they are 0.05 to 2 micrometer-thick Ni plating layer and 0.05 to 1 micrometer-thick Cu plating layer from the raw material side.
The Ni plating layer effectively suppresses the diffusion of copper of the raw material or Cu of the copper alloy, and also effectively suppresses the diffusion of additive elements in the copper alloy (for example, Zn or P), and the contact resistance and solderability In addition, it effectively prevents a decrease in the heat-resistant adhesion of the film. If the thickness of the Ni plating layer is less than 0.05 μm, the above-described effect cannot be obtained. If the thickness of the Ni plating layer is more than 2 μm, the bending workability deteriorates. Therefore, the thickness is preferably from 0.05 μm to 2 μm.
The Cu plating layer is preferably formed by forming a Cu—Sn alloy layer by a Sn layer coated on the surface and heat treatment (reflow treatment or the like). The thickness is preferably 0.05 to 1 μm for the purpose of improving corrosion resistance and heat resistance.

  The reason for using the Sn coating method as the method of performing the reflow process of heating and melting after electroplating is to improve the whisker resistance. The reflow process is preferably a method in which the sample is kept at a temperature of 250 to 900 ° C. for 0.1 to 180 seconds and then cooled to 100 ° C. or less by water cooling or air cooling within 120 seconds. However, when the whisker resistance is not required, the reflow process may not be performed.

  Examples of the present invention are shown below, but the technical scope of the present invention is not limited to these Examples.

The test material used was a copper alloy strip having the composition Cu-1.0 wt% Ni-0.9 wt% Sn-0.05 wt% P, Vickers hardness HV170, thickness 0.25 mm, and width 50 mm.
In the reel-to-reel continuous plating line, the surface and end face of the material were activated by electrolytic degreasing and pickling, and then various undercoat layers and Sn layers were coated. As a coating method for each layer, electroplating that is excellent in thickness control and advantageous in cost was used. The base plating is adjusted so that the entire surface is uniformly coated, and the Sn plating uses an insulating shielding plate 3 as shown in FIG. 1, and the Sn coating thickness of the lower half (part a) of the material 2 is 0.3 to 3 The thickness was adjusted so that the Sn coating thickness of the thin layer of 0.3 μm and the upper half (part b) was 0.3 to 3.3 μm. However, the test material having the same thickness on the entire surface did not use a shielding plate.

For Sn plating, the anode of the Sn plate is arranged facing each other at a distance of 50 mm from both sides of the material, and the rigid polyvinyl chloride plate is opposed to the lower portion of the material by 15 to 30 mm at a position 3 to 10 mm from the material. The shielding plate was vertically arranged, and the liquid temperature was 20 ° C. and the apparent cathode current density was 5.7 A / dm ² . The liquid surface height of the plating tank was also adjusted within a range of 1 to 5 mm from the upper end of the material to the liquid surface in order to obtain a desired plating thickness.
Ni plating was performed using a sulfamic acid Ni bath, Cu plating was performed using a copper sulfate bath, and Sn plating was performed using a tin sulfate bath. In each plating bath, no brightener was added and matte plating was performed. Moreover, after coating the Sn layer, a reflow treatment was performed in a burner furnace. The surface was melted at a furnace temperature of 400 to 600 ° C. and a residence time in the furnace of 0.1 to 20 seconds, and then cooled to 100 ° C. or less within 10 seconds using both water cooling and air cooling.
Table 1 shows the results of measurement and evaluation of the inventive material and the comparative material.

The thicknesses of the coated Ni and Sn were measured with a fluorescent X-ray film thickness measuring instrument. The thickness of the coated Cu was measured with an electrolytic film thickness meter using a specimen plated with Cu after Ni plating.
The thicknesses of the Sn thin layer and Sn thick layer were measured at 5 points every 2 mm in the range of 1 to 9 mm on both ends, and the average value was obtained.
Table 1 shows the evaluation results of the coating thickness, the low insertion force (friction coefficient) of part a, the solderability and heat resistance of part b.
For the low insertion force, the friction coefficient was measured using the apparatus shown in the schematic diagram of FIG. A smaller friction coefficient indicates a lower insertion force. The method of measuring the friction coefficient is that the surface treatment plate material (upper test piece) 8 provided with three intents having an inner radius R = 1 mm is set on the horizontal table 11 while a 15 N load is applied to the weight 10 by the weight 10. It moves on the lower plate material (lower test piece) 9 subjected to the same surface treatment at a speed of 100 mm / min, measures the frictional force with the load cell 13 via the pulley 12, and calculates the average value of the frictional force. It was calculated by dividing by the weight load (15N).

Solderability was evaluated under the test conditions shown in Table 2 after being held (aged) in the atmosphere at 155 ° C. for 16 hours.
The heat resistance was evaluated by a contact resistance value after being kept in an air atmosphere at 160 ° C. for 120 hours. The contact resistance value was measured at a test number N = 3 using a micro ohm meter under the conditions of an open voltage of 20 mV, a current of 10 mA, a 0.5 mm U-shaped gold wire probe, a maximum load of 100 gf, and no sliding. The average value was obtained. The initial value was 1.5 mΩ only for No. 5 and 1 mΩ or less for the others.

The Nos. 1, 2, and 3 of the present invention have a small friction coefficient of 0.3 or less, excellent solderability, and excellent heat resistance.
No. 4 in which the Sn coating thickness of the part b is thin is inferior in both solderability and heat resistance. This is because Cu diffused from the raw material by the aging treatment formed a thick oxide on the surface layer. Further, Nos. 6 and 7 where the Sn coating thickness of part a is thick have a friction coefficient exceeding 0.3, and the low insertion force effect is insufficient. This is because the thickness of the pure Sn layer that becomes a resistance at the time of insertion is thick. In particular, in No. 7 in which the Sn coating thickness exceeds 3 μm, the scraping of Sn was remarkable. In No. 5, since there is no underlying Cu, the underlying Ni directly forms a compound with Sn, and further Ni diffuses to the surface layer to form an oxide, which is inferior in solderability and heat resistance.

  It can be applied to applications such as automobile connector terminals and terminals for busbars and other electrical / electronic parts that require low insertion force at one end and solderability and heat resistance at the other end.

It is a section conceptual diagram of a plating tank. It is a cross-sectional conceptual diagram before and after plating of a material. It is a schematic diagram of a friction coefficient measuring device.

Explanation of symbols

1 Plating tank 2 Material (cathode)
3 Shielding plate 4 Plating bath 5 Anode 6 Underlayer 7 Sn plating layer 8 Upper test piece with indent 9 Lower test piece 10 Weight (15N)
11 Horizontal base 12 Pulley 13 Load cell

Claims (3)

Sn plating thickness in which a partial region of a material made of copper or a copper alloy is coated with a thin Sn plating layer having a thickness of 0.2 to 0.7 μm , and the remaining region is continuously formed integrally with a thickness of 1 to 2 μm. The Sn plating thin layer and the Sn plating thick layer have an underlayer formed on the entire surface with a Ni plating layer and a Cu plating layer from the material side, and at least the Sn plating A method of manufacturing a conductive material having a thick layer outermost surface side having a melt-solidified structure, firstly unrolling the material strip from the material reel wound with the material strip, uniformly plating the Ni plating layer and then Cu After performing the base plating to cover the plating layer, in the plating bath, the material having the base layer is used as a cathode, and an insulating shielding plate is disposed in a part between the cathode and the anode facing the cathode. By performing electroplating The thin region of Sn plating with a thickness of 0.2 to 0.7 μm is coated on a part of the cathode and the thick region of Sn plating with a thickness of 1-2 μm is formed on the remaining region. Then, a method of manufacturing a conductive material, in which the thin layer and the thick layer formed by electroplating are continuously subjected to a reflow process and wound on a product reel. Sn plating thickness in which a partial region of a material made of copper or a copper alloy is coated with a thin Sn plating layer having a thickness of 0.2 to 0.7 μm , and the remaining region is continuously formed integrally with a thickness of 1 to 2 μm. The Sn plating thin layer and the Sn plating thick layer have an underlayer formed on the entire surface with a Ni plating layer and a Cu plating layer from the material side, and at least the Sn plating A method of manufacturing a conductive material having a thick layer outermost surface side having a melt-solidified structure, firstly unrolling the material strip from the material reel wound with the material strip, uniformly plating the Ni plating layer and then Cu After performing the base plating for covering the plating layer, in the plating bath, the material having the base layer is used as a cathode, and insulation is provided between each part of the cathode and each anode facing the both surfaces. Electroplating with shielding plate Is performed, and a Sn plating thin layer having a thickness of 0.2 to 0.7 μm is coated on a partial region on the cathode , and the Sn plating formed continuously and integrally on the remaining region has a thickness of 1 to 2 μm. A method for producing a conductive material, comprising coating a thick layer, and subsequently reflowing the thin layer and the thick layer formed by electroplating and winding the product on a product reel. The method for producing a conductive material according to claim 1 or 2, wherein the material is a material made of a copper alloy containing Ni, Sn, and P.

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