JP4007303B2 - Substrate rubbing method and rubbing apparatus - Google Patents

Description

  The present invention relates to a substrate rubbing method and a rubbing apparatus, and more particularly to a method and an apparatus for rubbing a surface of a substrate for forming a liquid crystal electro-optic element.

  Liquid crystal electro-optical elements are actively used in various application fields such as liquid crystal display devices. In many cases, liquid crystal is sandwiched between two substrates, and the optical state of the liquid crystal is electrically changed. It has a structure to control to. Here, the surface of the substrate may be subjected to a rubbing process for controlling so that liquid crystal molecules are aligned in a predetermined direction and exhibit directivity when in contact with the liquid crystal.

  The rubbing treatment is usually performed by forming an alignment film such as polyimide or polyvinyl alcohol on a substrate and rubbing the surface of the alignment film with a cloth or the like in a predetermined direction. On the surface of the rubbed alignment film, a large number of fine scratches are formed so as to extend in a predetermined direction, and the liquid crystal molecules are aligned in the extending direction of the scratches.

  FIG. 15 is a schematic view of an apparatus for performing the rubbing process. As shown in this figure, the rubbing apparatus is provided with an introduction surface 10 for introducing a substrate in advance, and a plurality of transport rollers 11 are arranged in parallel along the introduction surface 10. The transport rollers 11 are rotationally driven so as to transport the substrate 20 to the right side in the drawing by driving means (not shown).

  A rubbing roller 21 is pivotally supported above the introduction surface 10, and the rubbing roller 21 is rotated clockwise by a driving means (not shown). On the peripheral surface of the rubbing roller 21, a cloth material 22 is attached. The cloth material 22 is woven with fibers such as nylon and rayon, and a large number of minute hair feet are densely formed on the surface.

  In the rubbing treatment, a substrate 20 made of a glass substrate or the like having an alignment film formed on the surface thereof is conveyed from the left side to the right side by the conveyance roller 11 and the alignment film is formed by the cloth material 22 adhered on the peripheral surface of the rubbing roller 21. Is done by rubbing. The rubbing roller 21 rubs the surface of the substrate 20 while being pressed against the substrate 20 by a pressure applying mechanism (not shown) with a predetermined pressure.

  By the way, when the rubbing treatment is performed as described above, the alignment film is scraped from the surface of the substrate 20 by rubbing with the cloth material 22 to generate fine dust, and from the surface of the cloth material 22 the cloth material Fine dust such as particles due to the shaving of 22 is generated, and these dusts adhere to the surface of the cloth material 22 and also to the surface of the substrate 20. Since the adhesion of dust to the cloth material 22 affects the rubbing state in the subsequent rubbing process, and the adhesion of dust to the substrate 20 affects the surface state of the substrate 20, both have a display quality such as a liquid crystal display device. It causes deterioration.

  The dust attached to the substrate 20 is removed in a cleaning step after the rubbing step. However, it is difficult to completely remove the dust by the cleaning, and the rubbing state is caused by the adhesion of the dust to the cloth material 22. If an effect occurs, it cannot be recovered by washing.

  In addition, in general, the manufacturing process of a liquid crystal display device requires a very precise control of cleanliness. In the rubbing process, dust is dispersed in and around the rubbing device. Therefore, there is a problem that the rubbing process and the cleaning process must be performed in a special environment separated from the other manufacturing processes so that the manufacturing process is not affected by the decrease in cleanness.

  The present invention has been made to solve such a problem, and prevents various influences caused by dust generated by rubbing treatment and can easily manufacture a high-quality liquid crystal electro-optical element. An object is to provide a rubbing method and apparatus.

In order to achieve such an object, a substrate rubbing method according to the present invention is a substrate rubbing method in which a substrate used in a liquid crystal electro-optical element is rubbed by a rubbing roller that rotates with respect to the substrate. The suction nozzle is arranged so that the peripheral portion of the rubbing roller is in contact with the bristle portion of the rubbing roller, and at least the portion of the peripheral portion of the suction port that is in contact with the bristle foot portion of the rubbing roller is formed of a non-conductive material And a rubbing process while sucking dust generated from at least one of the substrate and the rubbing roller.
The substrate rubbing method according to the present invention is a substrate rubbing method in which a substrate used for a liquid crystal electro-optical element is rubbed by a rubbing roller that rotates with respect to the substrate, and a peripheral portion of a suction port is formed by the rubbing roller. A step of performing a rubbing process while sucking dust generated from at least one of the substrate and the rubbing roller using a suction means having a suction nozzle arranged so as to be in contact with the bristle portion; The suction port includes a comb portion that contacts a bristle portion of the rubbing roller.
The substrate rubbing method according to the present invention is characterized in that the tip of the comb portion is substantially flush with the peripheral portion of the suction port.
The substrate rubbing method according to the present invention is a substrate rubbing method in which the surface of a substrate used in a liquid crystal electro-optical element is rubbed with a rubbing treatment member, and dust generated from at least one of the substrate and the rubbing treatment member is removed. A rubbing process is performed while sucking.

  According to this means, dust generated when the substrate surface is rubbed with a rubbing treatment member is sucked, so that dust is prevented from being deposited on the substrate surface or adhering to the rubbing treatment member. The display quality of the liquid crystal electro-optical element can be improved.

  The substrate rubbing method according to the present invention is characterized in that, in the present invention, the suction is performed in the dust generation part.

  According to this means, since the dust is sucked in the dust generating part, the dust is not scattered in the surrounding environment, and the cleanliness management in the manufacturing process is facilitated.

A substrate rubbing apparatus according to the present invention rotates with respect to a substrate used for a liquid crystal electro-optic element, and a rubbing roller for rubbing the substrate, and relatively moving the substrate and the rubbing roller to move the substrate. A drive unit that drives the rubbing roller to rub, and a suction unit that sucks dust generated from at least one of the substrate and the rubbing roller. The suction unit includes a suction nozzle having a suction port. The suction nozzle is arranged so that the peripheral edge portion of the suction port contacts the bristle foot portion of the rubbing roller, and the suction nozzle is at least a portion of the peripheral edge portion of the suction port that contacts the bristle foot portion of the rubbing roller. Is formed of a non-conductive material.
A substrate rubbing apparatus according to the present invention rotates with respect to a substrate used for a liquid crystal electro-optic element, and a rubbing roller for rubbing the substrate, and relatively moving the substrate and the rubbing roller to move the substrate. A drive unit that drives the rubbing roller to rub, and a suction unit that sucks dust generated from at least one of the substrate and the rubbing roller. The suction unit includes a suction nozzle having a suction port. The peripheral edge of the suction port is disposed so as to be in contact with the bristle portion of the rubbing roller, and the suction port includes a comb portion that is in contact with the bristle portion of the rubbing roller.
The substrate rubbing apparatus according to the present invention is characterized in that a tip of the comb portion is substantially flush with a peripheral portion of the suction port.
A substrate rubbing apparatus according to the present invention includes a rubbing treatment member for rubbing the surface of a substrate used in a liquid crystal electro-optical element, and the substrate and the rubbing treatment member are relatively operated to rub the surface of the substrate. A substrate rubbing apparatus including a driving unit that is driven so as to be rubbed by a processing member includes a suction unit that sucks dust generated from at least one of the substrate and the rubbing processing member.

  According to this means, as in the present invention, dust is prevented from accumulating on the substrate surface or adhering to the rubbing member, so that the display quality of the liquid crystal electro-optical element can be improved.

  The rubbing apparatus according to the present invention is characterized in that, in the present invention, the suction means includes a suction member having a suction port opened toward a contact portion between the substrate and the rubbing processing member.

  According to this means, the contact portion between the substrate and the rubbing treatment member corresponds to the dust generation portion, so that the dust is not scattered in the surrounding environment as in the present invention, and the cleanliness management in the manufacturing process is also possible. It becomes easy.

  In the substrate rubbing apparatus according to the present invention, in the above-described present invention, the rubbing treatment member is a rubbing roller that rotates with respect to the substrate, and the suction port faces a contact portion between the substrate and the rubbing roller. It is characterized by opening.

  According to this means, the rubbing process can be performed by a rubbing roller having a simple structure, and the contact portion between the substrate and the rubbing roller is always at a fixed position with respect to the rubbing roller, so that the suction member can be easily arranged. can do.

  In the substrate rubbing apparatus according to the present invention, in the above-described present invention, the suction member is shaped so as to be squeezed toward a contact portion between the substrate and the rubbing roller, and the suction port is formed at a tip portion thereof. It is characterized by.

  According to this means, since the suction member is formed in a shape squeezed toward the tip, the suction port can be disposed at a position closer to the contact portion between the substrate and the rubbing roller, and the suction port is squeezed. The suction force can be increased by being formed at the tip.

  The substrate rubbing apparatus according to the present invention is the substrate rubbing device according to the present invention, wherein the suction member includes a plurality of suction paths divided in the axial direction of the rubbing roller, and the suction port is formed at a tip portion of the suction path. It is characterized by being.

  According to this means, since the suction port is provided at the tip of each of the divided suction paths, the suction force at the suction port can be increased and the dust is reliably sucked in the axial direction of the rubbing roller. be able to.

  The substrate rubbing apparatus according to the present invention is characterized in that, in the above-described present invention, the suction member is formed so as to surround the rubbing roller, and includes a suction port facing a peripheral surface portion of the rubbing roller. To do.

  According to this means, the dust adhering to the rubbing roller can be more reliably removed, and the suction member is formed so as to surround the rubbing roller, thereby reducing the size of the apparatus. it can.

  In the substrate rubbing apparatus according to the present invention, in the present invention, spraying means for spraying fluid to the rubbing processing member or the substrate is provided, and the spraying position of the spraying means is set in the vicinity of the suction port. Features.

  According to this means, the dust can be sucked from the suction port of the suction member after the fluid is sprayed on the rubbing treatment member or the substrate by the spraying means and the dust is separated from the rubbing treatment member or the substrate. It is possible to more reliably remove dust that is present.

  In the substrate rubbing apparatus according to the present invention, in the present invention, the rubbing treatment member is a rubbing roller that rotates with respect to the substrate, and the suction means has a peripheral edge portion of the suction port at the bristles of the rubbing roller. A suction nozzle disposed on the outer periphery of the rubbing roller while being in contact with the foot is provided.

  According to this means, since the peripheral portion of the suction port of the suction nozzle is in contact with the bristle portion of the rubbing roller, the dust adhering to the outer peripheral portion of the rubbing roller is powerful before the outer peripheral portion contacts the substrate. As a result, the substrate can be rubbed while the outer peripheral portion of the rubbing roller is always clean, and dust can be prevented from adhering to the substrate.

  In the substrate rubbing apparatus according to the present invention, in the present invention, the rubbing treatment member is a rubbing roller that rotates with respect to the substrate, and the suction means has a peripheral edge portion of the suction port at the bristles of the rubbing roller. A suction nozzle disposed on an outer peripheral portion of the rubbing roller in contact with the foot, and a suction member having a suction port opened toward a contact portion between the substrate and the rubbing processing member. Features.

  According to this means, the dust adhering to the outer peripheral portion of the rubbing roller can be removed by suction with a strong suction force before the outer peripheral portion contacts the substrate, as in the present invention. It is possible to rub the substrate with a clean part at all times, preventing dust from adhering to the substrate, and also from the suction port of the suction member at the contact part between the substrate and the rubbing treatment member Since the collected dust is sucked and removed, it is possible to prevent the dust from being scattered in the surrounding environment and to suppress the dust from being deposited on the substrate surface or adhering to the rubbing treatment member. As a result, the display quality of the liquid crystal electro-optical element can be further improved, and the management of the degree of cleanliness in the manufacturing process can be further facilitated.

  In the substrate rubbing apparatus according to the present invention, in the above-described present invention, the suction nozzle is disposed so as to be movable toward and away from the outer peripheral portion of the rubbing roller, and the surface of the substrate is further rubbed by the rubbing treatment member. Drive means for moving the suction nozzle closer to the outer peripheral portion of the rubbing roller when moving, and moving the suction nozzle away from the outer peripheral portion of the rubbing roller when not rubbing.

  According to this means, when the surface of the substrate is not rubbed by the rubbing roller, the suction nozzle is spaced apart from the outer peripheral portion of the rubbing roller, and the peripheral portion of the suction port of the suction nozzle and the bristle portion of the rubbing roller Therefore, it is possible to reduce the thermal effect due to the contact between the peripheral edge portion and the bristle foot portion and the deterioration of the rubbing roller due to the contact.

  In the substrate rubbing device according to the present invention, in the present invention, the peripheral edge portion of the suction port of the suction nozzle is in the range from the tip of the hair foot portion to ½ of the length of the hair foot portion. It is in contact with the foot.

  According to this means, while ensuring the contact of the peripheral portion of the suction port of the suction nozzle to the bristle portion of the rubbing roller, the contact of the peripheral portion of the suction port to the background of the rubbing roller is surely avoided. The background can be prevented from being scraped off by the peripheral edge of the suction port.

  The substrate rubbing apparatus according to the present invention is characterized in that, in the above-mentioned present invention, a comb portion that contacts the bristle portion of the rubbing roller is provided in the suction port of the suction nozzle.

  According to this means, it is possible to increase the dust suction effect from the suction port by knocking out dust adhering to the bristles while aligning the bristles of the rubbing roller with the comb.

  In the substrate rubbing apparatus according to the present invention, in the above-described present invention, the suction nozzle is formed of a non-conductive material at least a portion of the peripheral edge of the suction port that contacts the bristle foot portion of the rubbing roller. Features.

  According to this means, when the peripheral edge portion of the suction nozzle and the bristle foot portion of the rubbing roller are in contact with each other over a long period of time and the peripheral edge is shaved, the fallen shavings are removed from the substrate surface. Even if the liquid crystal is sealed and commercialized in a state of adhering to the surface, the shavings are non-conductive material, so that a short circuit during product use can be prevented.

  The substrate rubbing apparatus according to the present invention is characterized in that, in the present invention, the nonconductive material is glass or quartz.

  According to this means, as in the case of the present invention, even when liquid crystal is sealed and commercialized in a state in which the suction chip shavings adhere to the substrate surface, a short circuit during use can be prevented, and In addition to improving the durability of the peripheral edge of the suction port that contacts the hair foot, the peripheral edge can be easily made into a mirror surface.

  As described above, the present invention has the following effects.

  In the present invention, dust generated when the substrate surface is rubbed with a rubbing treatment member is sucked, so that it is possible to prevent dust from being deposited on the substrate surface or adhering to the rubbing treatment member. The effect that the display quality of the electro-optic element can be improved is obtained.

  In the present invention, in addition to the above-mentioned present invention, dust suction is performed in the dust generating part, so that dust is not scattered in the surrounding environment, and the cleanliness management in the manufacturing process is easily performed. The effect that it can be obtained.

  In the present invention, in addition to the present invention, the rubbing process can be performed by a rubbing roller having a simple structure, and the contact portion between the substrate and the rubbing roller is always at a fixed position with respect to the rubbing roller. The effect that the members can be easily arranged is obtained.

  In the present invention, in addition to the above-described present invention, the suction member is formed in a shape that is narrowed toward the tip, so that the suction port can be disposed at a position closer to the contact portion between the substrate and the rubbing roller. The suction force can be increased by forming the suction port at the narrowed tip.

  In the present invention, in addition to the above-described present invention, the suction port is provided at the tip of each of the divided suction paths, so that the suction force at the suction port can be increased and the axial direction of the rubbing roller can be reliably increased. In addition, the effect that dust can be sucked is obtained.

  In the present invention, in addition to the present invention, dust attached to the rubbing roller can be removed more reliably, and the suction member is formed so as to surround the rubbing roller, thereby reducing the size of the apparatus. The effect that it can achieve is obtained.

  In the present invention, in addition to the above-described present invention, since the dust can be sucked from the suction port of the suction member after the fluid is sprayed on the rubbing processing member or the substrate by the spraying means to separate the dust, the rubbing processing member Or the effect that the dust adhering to a board | substrate can be removed more reliably is acquired.

  In the present invention, in addition to the above-mentioned present invention, since the peripheral portion of the suction port of the suction nozzle is in contact with the bristle portion of the rubbing roller, the outer peripheral portion contacts the substrate with the dust adhering to the outer peripheral portion of the rubbing roller. Can be removed by suction with a strong suction force, and as a result, it becomes possible to rub the substrate with the outer periphery of the rubbing roller in a clean state at all times, thereby preventing dust from adhering to the substrate The effect that it can be obtained.

  In the present invention, in addition to the present invention, dust adhered to the outer peripheral portion of the rubbing roller can be removed by suction with a strong suction force before the outer peripheral portion contacts the substrate, so that the rubbing is always clean. It becomes possible to rub the substrate at the outer peripheral portion of the roller, preventing dust from adhering to the substrate, and dust generated at the contact portion between the substrate and the rubbing treatment member from the suction port of the suction member. Since it is removed by suction, dust can be prevented from being scattered in the surrounding environment. As a result, the display quality of the liquid crystal electro-optical element can be further improved, and the management of cleanliness in the manufacturing process is further improved. The effect that it can be made easy is acquired.

  In the present invention, in addition to the above-described present invention, when the surface of the substrate is not rubbed by the rubbing roller, the suction nozzle is spaced from the outer peripheral portion of the rubbing roller, and the peripheral portion of the suction port of the suction nozzle and the rubbing roller Since there is no contact with the hair feet, there is an effect that it is possible to reduce the thermal influence caused by the contact between the peripheral edge and the hair feet and the deterioration of the rubbing roller due to the contact.

  In the present invention, in addition to the present invention described above, the contact of the rubbing roller at the periphery of the suction port to the background of the rubbing roller is ensured while ensuring the contact of the periphery of the suction port of the suction nozzle to the hair feet of the rubbing roller. Thus, the effect is obtained that the background can be prevented from being scraped off by the peripheral edge of the suction port.

  In the present invention, in addition to the above-described present invention, the comb portion can align the hair of the rubbing roller, and the dust attached to the hair foot can be knocked out to enhance the dust suction effect from the suction port. An effect is obtained.

  In the present invention, in addition to the above-mentioned present invention, the peripheral portion of the suction port of the suction nozzle and the bristle portion of the rubbing roller come into contact with each other over a long period of time, so that the peripheral portion is dropped by any chance. Even if liquid crystal is sealed and commercialized while the shavings adhere to the substrate surface, the shavings are non-conductive materials, so that an effect of reliably preventing short-circuiting during product use can be obtained. .

  In the present invention, in addition to the above-described present invention, it is possible to improve the durability of the peripheral portion of the suction port that contacts the bristle portion, and to obtain an effect that the peripheral portion can be easily made into a mirror surface shape. It is done.

  Next, embodiments according to the present invention will be described with reference to the accompanying drawings.

  First, a TFT liquid crystal panel will be described with reference to FIGS. As shown in FIG. 12, a sealing material 101 is provided on the TFT array substrate 20 along its edge, and in parallel with the inner side, for example, a light shielding property made of the same or different material as the black matrix 109. The peripheral parting 102 is provided. A data line driving circuit 103 and a mounting terminal 104 are provided along one side of the TFT array substrate 20 in a region outside the sealing material 101, and the scanning line driving circuit 105 extends along two sides adjacent to the one side. Is provided. Further, a plurality of wirings 106 are provided on the remaining side of the TFT array substrate 20 to connect between the scanning line driving circuits 105 provided on both sides of the screen display area. Further, silver points 107 made of a conductive material for providing electrical continuity between the TFT array substrate 20 and the counter substrate 108 are provided at the four corners of the sealing material 101. As shown in FIG. 13, the counter substrate 108 having substantially the same outline as the sealing material 101 shown in FIG. 12 is fixed to the TFT array substrate 20 via the sealing material 101.

  The data line driving circuit 103 and the scanning line driving circuit 105 are electrically connected to a data line as a source electrode and a scanning line as a gate electrode (both not shown) via wirings. The data line driving circuit 103 is supplied with an image signal converted into a format that can be displayed immediately from a control circuit (not shown), and the scanning line driving circuit 105 sequentially sends gate voltages to the scanning lines in a pulse manner. At the same time, the data line driving circuit 103 sends a signal voltage corresponding to the image signal to the data line (source electrode). Particularly in this embodiment, since the TFT 111 is a p-Si (polysilicon) type TFT, it is possible to form the data line driving circuit 103 and the scanning line driving circuit 105 in the same process when the TFT 111 is formed. This is advantageous in manufacturing.

  Referring to FIG. 14, an example of the assembly process of the TFT liquid crystal panel will be briefly described. After receiving and cleaning the TFT array substrate (element substrate) 20 and the counter substrate 108, polyimide, An alignment film such as polyvinyl alcohol is formed, and then the surface of the alignment film is rubbed with a cloth material 22 such as rayon or nylon and then washed. Next, the above-described sealing material 101 is formed on the TFT array substrate 20 side by screen printing or the like, and a silver spot 107 as a conductive material is applied.

  Next, the two substrates 20 and 108 are bonded together via the sealing material 101, and after alignment such as a cell gap, the substrates 20 and 108 are pressure-bonded by applying a certain pressure. Next, when the sealing material 101 has photo-curing property, it is cured by irradiating light, and after the curing, the liquid crystal 112 is injected between the substrates 20 and 108, and after the injection is completed, the injection port is sealed. Sealed with material 110. Next, after performing cleaning, a predetermined inspection is performed, and those that pass are provided for mounting.

  Here, in this embodiment, the rubbing process for both the substrates 20 and 108 is performed as follows. In the following first to ninth embodiments, only the TFT array substrate 20 (hereinafter simply referred to as the substrate 20) will be described as an example. However, the present invention is not limited to this. Further, in each embodiment, as a rubbing treatment member for rubbing the surface of the substrate 20, a rubbing roller 21 that rotates with respect to the substrate 20 is taken as an example, and further overlaps with the conventional example (FIG. 15). The same reference numerals are assigned to the parts to be described, and the description thereof is omitted.

  FIG. 1 is a schematic explanatory view for explaining a first embodiment of a rubbing method and a rubbing apparatus according to the present invention.

  Part of the alignment film or bristles (particles) of the cloth material (rubbing cloth) 22 is generated as dust from the contact portion between the substrate 20 and the rubbing roller 21. When the transport direction of the substrate 20 and the rotation direction of the rubbing roller 21 are employed as described above, a large amount of dust is generated on the left side in the drawing with respect to the contact portion between the substrate 20 and the rubbing roller 21.

  In this embodiment, a suction member 23 having a suction port 23a disposed on the upper left side of the contact portion is provided, and dust generated at the contact portion is sucked from the suction port 23a and discharged out of the system. The suction member 23 may be a member that forcibly sucks air by a suction fan (not shown). However, when the exhaust port is provided in a clean room, it is necessary to provide a high-density filter or the like. It is preferable to provide it. Here, the suction port 23 a has a shape extending in the axial direction of the rubbing roller 21, and has an opening position arranged substantially parallel to the contact portion between the substrate 20 and the rubbing roller 21.

  In this embodiment, dust sucked up by the rubbing roller 21 is sucked and discharged by sucking air from the suction port 23a, so that dust can be prevented from being scattered in the surrounding environment. It is possible to prevent dust from accumulating on the cloth material 22 and the surface of the substrate 20 and having an adverse effect. Also, dust once adhering to the surface of the substrate 20 and the cloth material 22 is also separated and sucked to some extent by the suction force because the suction port 23a is provided facing the surface of the substrate 20 and the surface of the cloth material 22. The

  FIG. 2 is a schematic explanatory diagram for explaining a second embodiment according to the present invention.

  In this embodiment, as in the first embodiment, a suction port 24a is formed at the tip of the suction member 24, and dust is sucked from the suction port 24a. 2 is different in that a distal end portion 24b formed as a constricted shape on at least the longitudinal section shown in FIG. 2 is provided, and a suction port 24a is formed at the foremost end thereof.

  In this embodiment, since the tip end portion 24b of the suction member 24 is narrowed, the suction port 24a is disposed in a portion closer to the contact portion (that is, the dust generation portion) between the substrate 20 and the rubbing roller 21. In addition, since the suction port 24a is formed at the narrowed tip, the suction force can be increased, dust can be sucked more reliably, and dust can be more strongly applied to the surfaces of the substrate 20 and the cloth material 22. Can be separated from.

  Here, the suction member 24 may be connected to the same suction fan or the like as in the first embodiment, but in particular, exerts a strong suction force when connected to an exhaust system connected to a vacuum pump or the like. be able to.

  In this embodiment, the suction port 24 a is opened toward the surface of the substrate 20 rather than the surface of the rubbing roller 21, so that dust accumulated on the surface of the substrate 20 can be more reliably sucked.

  FIG. 3 is a schematic perspective view showing the structure of the third embodiment according to the present invention.

  In this embodiment, a suction member 25 substantially the same as that of the second embodiment is provided. A narrowed tip portion 25b is formed near the tip of the suction member, and a suction port 25a opened at the forefront of the tip portion 25b is formed. The connecting pipe 25c provided at the upper end of the suction member 25 is connected to an exhaust system (not shown).

  In this embodiment, the suction port 25a formed at the tip of the tip portion 25b is slightly open toward the peripheral surface side of the rubbing roller 21, and sucks dust generated at the contact portion between the substrate 20 and the cloth material 22. At the same time, it is configured to mainly suck dust adhering to the surface of the cloth material 22.

  FIG. 4 shows a fourth embodiment according to the present invention.

  In this embodiment, the suction member 26 is divided into a plurality of divided suction portions 26 d arranged in parallel in the axial direction of the rubbing roller 21. Near the tip of each divided suction part 26d, a tip part 26b having a narrowed shape is formed in the same manner as in the second and third embodiments, and a suction port 26a having an opening part is formed at the tip thereof. . The connection pipe 26c is for connection to an exhaust system (not shown).

  In this embodiment, by dividing the suction port 26a, the opening area of the suction port 26a is reduced as a whole, and the suction force at each suction port 26a is increased. As a result, it is possible to enhance not only the dust just rolled up in the atmosphere but also the dust adhering to the surface of the substrate 20 and the surface of the cloth material 22 and the ability to suck and remove.

  FIG. 5 is a schematic perspective view showing the overall structure of the fifth embodiment according to the present invention.

  In this embodiment, a suction member 27 formed in a cylindrical shape having a notch is provided so as to substantially completely surround the peripheral surface of the rubbing roller 21. The suction member 27 is attached to suction ports 27 a and 27 b located on the front side and the rear side in the moving direction of the substrate 20 with respect to the contact portion between the substrate 20 and the rubbing roller 21, and the peripheral surface of the rubbing roller 21. A suction port 27c facing the cloth material 22 is provided.

  Here, the suction port 27c facing the peripheral surface of the rubbing roller 21 may have a structure in which the entire surface facing the peripheral surface of the rubbing roller 21 is opened, or a structure in which a large number of fine suction ports are dispersedly arranged. It may be. The connection pipe 27d constitutes a connection part to an exhaust system (not shown). According to this embodiment, since suction is performed from almost the entire peripheral surface of the rubbing roller 21 in addition to the front and rear of the contact portion between the substrate 20 and the rubbing roller 21, dust can be reliably captured. In particular, dust can be effectively removed from the cloth material 22. In this embodiment, since the suction member 27 is disposed so as to surround the rubbing roller 21, the suction member does not protrude away from the rubbing roller 21, and thus the entire apparatus can be reduced in size. .

  FIG. 6 is a schematic perspective view showing the overall configuration of the sixth embodiment according to the present invention, and FIG. 7 is an enlarged sectional view showing the vicinity of the suction port of this embodiment.

  In this embodiment, the suction port 28a of the suction member 28 is disposed on one side of the contact portion between the substrate 20 and the rubbing roller 21, and air is supplied to the peripheral surface of the rubbing roller 21 in the vicinity of the suction port 28a. The spraying port 29a of the spraying member 29 for spraying is arrange | positioned.

  The suction port 28a is formed at the tip of the suction member 28 whose tip side is slightly squeezed in the same manner as in each of the above embodiments, sucks dust generated from the contact portion, and is formed on the cloth member 22 on the peripheral surface of the rubbing roller 21. It is configured so that the adhering dust can also be sucked.

  Simplified ionization electrodes 29b and 29c are installed inside the blowing member 29, and a high-frequency voltage is applied between the ionization electrodes 29b and 29c to supply air from an air compressor or the like (not shown). The air sent from the apparatus is ionized. The ionized air is blown from the blowing port 29 a to the surface of the cloth material 22, and the adhering dust is separated from the cloth material 22. The dust separated from the cloth material 22 is sucked and discharged from the suction port 28a.

  Airflow control plates 31 and 32 are disposed on both sides of the suction member 28 and the spray member 29 (both front and rear sides in the rotational direction of the rubbing roller 21). These airflow control plates 31 and 32 are for efficiently discharging air blown from the blowing member 29 from the suction port 28a without spreading it around. These air flow control plates 31 and 32 can prevent dust that is not sucked into the suction member 28 from being scattered around.

  The spray member 29 is provided with an ionization electrode, and air is ionized and sprayed to promote separation of dust. However, a certain amount of dust can be separated by the spraying force without providing ionizing means for air.

  What is sprayed by the spraying means is not limited to air, and various other fluids such as inert gas and pure water can be used as long as they do not affect the object to be processed.

  It is most effective to provide the spraying means and the suction means on the contact portion between the substrate 20 and the rubbing roller 21, which is a dust generation part, but also on the surface of the rubbing roller 21, It is preferable to provide them integrally or separately for each application site so as to act on the substrate surface after the rubbing treatment.

  In each of the embodiments described above, the rubbing process in which the surface of the substrate 20 is rubbed with the cloth material 22 adhered to the rubbing roller 21 has been described. However, the rubbing process with other various rubbing treatment members has been described. Of course, the present invention can be widely applied to the rubbing method and apparatus performed by the above method.

  FIG. 8 is a schematic explanatory view for explaining a seventh embodiment according to the present invention, and FIG. 9 is a schematic sectional view partially enlarged from FIG.

  In this embodiment, a suction nozzle 50 having a suction port 50a disposed above the right side of the contact portion between the substrate 20 and the rubbing roller 21 is provided, and dust adhering to the cloth material 22 of the rubbing roller 21 is sucked from the suction port 50a. Are discharged outside the system. The suction nozzle 50 may be, for example, a device that forcibly sucks air by a vacuum pump (not shown). However, when the exhaust port is provided in a clean room, it is necessary to provide a high-density filter or the like. Is preferably provided outside the room.

  The suction port 50 a includes a slit-like opening that extends along the axial direction of the rubbing roller 21 and is disposed substantially parallel to the contact portion between the substrate 20 and the rubbing roller 21. Further, a non-conductive material layer 51 such as quartz or glass is coated on the peripheral edge of the suction port 50a.

  The suction nozzle 50 is arranged so as to be movable toward and away from the outer peripheral portion of the rubbing roller 21, and is moved toward and away from the outer peripheral portion of the rubbing roller 21 by driving means (not shown). Specifically, when the surface of the substrate 20 is rubbed by the rubbing roller 21, the driving means moves the suction nozzle 50 closer to the outer peripheral portion of the rubbing roller 21, and when not rubbing, the suction nozzle 50 is moved to the outer periphery of the rubbing roller 21. Move away from the part.

  Here, when the suction nozzle 50 moves closer to the rubbing roller 21, the peripheral edge portion (non-conductive material layer 51) of the suction port 50 a of the suction nozzle 50 is brought into contact with the bristle feet 22 a of the cloth member 22 of the rubbing roller 21. The movement of the suction nozzle 50 is stopped at the contact position. In this case, as shown in FIG. 9, when the position of the peripheral edge of the suction port 50a contacting the hair foot 22a is L, the length of the hair foot 22a of the cloth material 22 is the tip of the hair foot 22a. It is preferable that the movement of the suction nozzle 50 is stopped within a range from the portion to L / 2.

  In this embodiment, during rubbing, the peripheral portion of the suction port 50a of the suction nozzle 50 is disposed in contact with the bristle portion 22a of the cross member 22 on the outer peripheral portion of the rubbing roller 21, and therefore adheres to the cross member 22. The dust thus collected is removed by suction with a strong suction force before the cloth material 22 contacts the substrate 20. As a result, before the cloth material 22 comes into contact with the substrate 20, the cloth material 22 is always in a clean state, and the substrate 20 can be rubbed in this state, and adhesion of dust to the substrate 20 is good. Is prevented.

  Further, by positioning the peripheral edge of the suction port 50a of the suction nozzle 50 within the range from the tip of the hair foot 22a to 1/2 of the length L of the hair foot 22a, the peripheral edge of the suction port 50a Inadvertent contact of the cloth material 22 with the ground is avoided, so that the contact of the peripheral edge of the suction port 50a with the hair feet 22a is maintained and a strong suction force is maintained. It is possible to reliably prevent the background from being scraped off by the peripheral edge of the suction port 50a and falling onto the substrate 20.

  Further, when the surface of the substrate 20 is not rubbed by the rubbing roller 21, the suction nozzle 50 is disposed away from the outer peripheral portion of the rubbing roller 21, and the peripheral portion of the suction port 50a of the suction nozzle 50 and the bristle portion 22a Therefore, it is possible to reduce the thermal effect due to the contact (friction) between the peripheral edge portion and the bristle foot portion 22a and the deterioration of the rubbing roller 21 due to the contact. As a result, the life of the rubbing roller 21 is improved. be able to.

  Furthermore, since the non-conductive material layer 51 is disposed at the peripheral portion of the suction port 50a, the peripheral portion of the suction port 50a and the bristle portion 22a come into contact with each other over a long period of time, and the peripheral portion is scraped by any chance. In this case, even if the fallen shavings adhere to the surface of the substrate 20 and the liquid crystal is sealed and commercialized, the shavings are non-conductive materials, so that short-circuiting during product use is surely prevented. be able to. In this case, by configuring the non-conductive material layer 51 with quartz or glass, it is possible to improve the durability of the peripheral portion of the suction port 50a and to easily form a mirror surface portion on the peripheral portion. .

  In this embodiment, the suction nozzle 50 is arranged on the upper right side of the contact portion between the substrate 20 and the rubbing roller 21 and the suction port 50a is in contact with the hair feet 22a of the cloth material 22. However, the suction nozzle 50 is arranged on the upper left side of the contact portion between the substrate 20 and the rubbing roller 21 or on the upper center of the drawing so that the suction port 50a is in contact with the bristle portion 22a of the cloth member 22. Also good.

  FIG. 10 is a schematic explanatory diagram for explaining an eighth embodiment according to the present invention.

  This embodiment has the same configuration as that of the seventh embodiment except that the comb portion 60 is arranged in the suction port 50a of the suction nozzle 50 of the seventh embodiment. The same reference numerals are given and the description thereof is omitted, and the differences will be described.

  A comb portion 60 is attached to the suction port 50a of the suction nozzle 50 so as to come into contact with the bristle portion 22a of the cloth material 22, and the comb portion 60 extends along the axial direction of the rubbing roller 21 like the suction port 50a. In addition, it is disposed substantially parallel to the contact portion between the substrate 20 and the rubbing roller 21, and the tip is substantially flush with the peripheral edge of the suction port 50a.

  In this embodiment, at the time of rubbing, the hair portions 22a are aligned by the comb portion 60 provided in the suction port 50a, and the comb portion 60 knocks out dust adhering to the hair foot portion 22a from the suction port 50a. The dust suction effect can be enhanced. Since other functions and effects are the same as those of the above-described seventh embodiment, description thereof is omitted.

  FIG. 11 is a schematic explanatory diagram for explaining a ninth embodiment according to the present invention.

  In this embodiment, the suction member 23 of the first embodiment (see FIG. 1) is disposed above the left side of the contact portion between the substrate 20 and the rubbing roller 21 (the side on which much dust is generated) and the seventh embodiment. The suction nozzle 50 (see FIGS. 8 and 9) is arranged on the upper right side of the contact portion in the figure. In addition, since the suction member 23 and the suction nozzle 50 have been described in the first embodiment and the seventh embodiment, respectively, overlapping portions are denoted by the same reference numerals and description thereof is omitted.

  In this embodiment, during rubbing, the dust wound up by the rubbing roller 21 is sucked and discharged from the suction port 23a of the suction member 23, so that dust can be prevented from being scattered in the surrounding environment. In addition, dust can be prevented from accumulating on the surfaces of the cloth material 22 and the substrate 20 and adversely affecting the dust. Further, once the dust has once adhered to the surfaces of the substrate 20 and the cloth material 22, By being provided facing the surface of the cloth material 22, the cloth material 22 is brought into contact with the substrate 20 by the suction nozzle 50, and the dust adhered to the cloth material 22 by the suction nozzle 50. Since it is sucked and removed with a strong suction force before being rubbed, the outer periphery of the rubbing roller 21 is always kept clean and the substrate 20 is rubbed. It is possible to prevent adhesion of dust to the substrate 20 by preparative becomes possible. As a result, it is possible to further improve the quality of the TFT and to eliminate the environmental partition between the rubbing process and the cleaning process and other manufacturing processes, which were necessary in the past, for the management of the cleanliness in the manufacturing process. Became. Since the other operational effects are the same as those of the seventh embodiment, the description thereof is omitted.

It is a schematic sectional drawing for demonstrating 1st Embodiment which concerns on this invention. It is a schematic sectional drawing for demonstrating 2nd Embodiment which concerns on this invention. It is a schematic perspective view for demonstrating 3rd Embodiment which concerns on this invention. It is a schematic perspective view for demonstrating 4th Embodiment which concerns on this invention. It is a schematic perspective view for demonstrating 5th Embodiment which concerns on this invention. It is a schematic perspective view for demonstrating 6th Embodiment which concerns on this invention. It is an expanded sectional view showing the structure of a 6th embodiment. It is a schematic sectional drawing for demonstrating 7th Embodiment which concerns on this invention. It is the schematic sectional drawing which expanded the outer peripheral part of the rubbing roller partially. It is a schematic sectional drawing for demonstrating 8th Embodiment which concerns on this invention. It is a schematic sectional drawing for demonstrating 9th Embodiment which concerns on this invention. It is a schematic perspective plan view of TFT. It is the HH 'sectional view taken on the line of FIG. It is a flowchart for demonstrating the assembly process of a liquid crystal display device. It is a schematic sectional drawing for demonstrating the condition of the conventional rubbing process.

Explanation of symbols

11 Conveying roller 20 Substrate 21 Rubbing roller 22 Cross member 22a Bare feet 23, 24, 25, 26, 27, 28 Suction members 23a, 24a, 25a, 26a, 27a, 28a Suction port 29 Blowing member 29a Blowing ports 29b, 29c Ionization electrode 50 Suction nozzle 50a Suction port 51 Non-conductive material 60 Comb L Length of hair foot

Claims (9)

In a substrate rubbing method in which a substrate used for a liquid crystal electro-optical element is rubbed by a rubbing roller rotating with respect to the substrate,
While sucking dust generated from at least one of the substrate and the rubbing roller using suction means having a suction nozzle arranged so that the peripheral edge of the suction port is in contact with the bristle portion of the rubbing roller Having a process of rubbing,
The suction port includes a comb portion that comes into contact with the bristle portion of the rubbing roller ,
The method of rubbing a substrate, wherein the comb portion has a tip portion substantially flush with a peripheral portion of the suction port . Oite to claim 1,
In the step of performing the rubbing treatment, the suction unit further includes a suction member having a suction port opened toward a contact portion between the substrate and the rubbing roller, and using the suction unit, A rubbing method for a substrate, wherein a rubbing process is performed while sucking dust generated from at least one of the substrate and the rubbing roller. Oite to claim 1 or 2,
The suction nozzle is disposed so as to be movable toward and away from the outer peripheral portion of the rubbing roller, and when the rubbing treatment member rubs the surface of the substrate, the suction nozzle is placed on the outer peripheral portion of the rubbing roller. A substrate rubbing method, comprising driving means for moving the suction nozzle away from the outer peripheral portion of the rubbing roller when moved closer and not rubbed. In any one of Claims 1 thru | or 3 ,
In the step of performing the rubbing process, the peripheral portion of the suction port of the suction nozzle is in contact with the hair foot portion in a range from the tip of the hair foot portion to ½ of the length of the hair foot portion. A method for rubbing a substrate, comprising: Method for manufacturing a liquid crystal electro-optical element, characterized in that rubbed alignment film by rubbing method as in any one of claims 1 to 4. A rubbing roller that rotates relative to the substrate used for the liquid crystal electro-optic element and rubs the substrate;
Driving means for relatively moving the substrate and the rubbing roller to drive the substrate to be rubbed by the rubbing roller;
Suction means for sucking dust generated from at least one of the substrate and the rubbing roller;
The suction means has a suction nozzle having a suction port, and is arranged so that a peripheral edge portion of the suction port is in contact with a bristle portion of the rubbing roller;
The suction port includes a comb portion that comes into contact with the bristle portion of the rubbing roller ,
The comb rubbing apparatus according to claim 1, wherein a tip of the comb portion is substantially flush with a peripheral portion of the suction port . In claim 6 ,
The substrate rubbing apparatus, wherein the suction means further includes a suction member having a suction port opened toward a contact portion between the substrate and the rubbing processing member. 8. The suction nozzle according to claim 6 , wherein the suction nozzle is disposed so as to be able to move toward and away from the outer peripheral portion of the rubbing roller, and the suction nozzle is moved when the surface of the substrate is rubbed by the rubbing processing member. A substrate rubbing apparatus comprising driving means for moving the suction nozzle closer to the outer peripheral portion of the rubbing roller and moving the suction nozzle away from the outer peripheral portion of the rubbing roller when not rubbing. 9. The peripheral portion of the suction port of the suction nozzle according to claim 6 , wherein the peripheral edge portion of the suction nozzle extends from the tip of the hair foot portion to ½ of the length of the hair foot portion. A substrate rubbing apparatus, wherein the substrate is in contact.

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