JP3605544B2 - Processing device and processing method - Google Patents

Description

[0001]
TECHNICAL FIELD OF THE INVENTION
The present invention relates to a processing apparatus and a processing method for performing a series of plural processes such as resist coating, exposure, and development on a target object such as an LCD glass substrate.
[0002]
[Prior art]
In the manufacture of a liquid crystal display (LCD), a predetermined film is formed on an LCD glass substrate, which is a substrate, and then a photoresist solution is applied to form a resist film, and the resist film is formed in accordance with a circuit pattern. A circuit pattern is formed by a so-called photolithography technique of exposing and developing.
[0003]
In this photolithography technique, a predetermined circuit pattern is formed on a resist layer of an LCD substrate, which is an object to be processed, through a series of processes of adhesion (hydrophobicization) processing, resist coating, prebaking, exposure, development, and postbaking.
[0004]
Conventionally, such processing is performed by arranging processing units for performing each processing in the order of processing, and sequentially loading substrates into the plurality of processing units to perform processing, or a processing apparatus of a so-called track transport type, or a processing for performing each processing. Units are arranged on both sides of the transport path in a manner that is conscious of the process flow, and are carried out by a so-called central transport type processing apparatus that carries in and out the object to be processed into and from each processing unit by a transport apparatus that can travel on the transport path. I have.
[0005]
By the way, in the series of processes, the developing process includes, in a track transport type processing apparatus, a processing unit for applying a developing solution, a processing unit for rinsing after applying the developing solution, and a processing unit for drying after rinsing sequentially. It is common to arrange and sequentially perform processing by these processing units.In the processing apparatus of the central transport type, for example, a developing processing unit that performs all of developing solution coating, rinsing after developing solution coating, and drying after rinsing is used. In general, three units are arranged, and an LCD substrate is loaded into any of them, and all the processing is performed by one unit.
[0006]
[Problems to be solved by the invention]
However, in the case of a truck transport type processing apparatus, when an abnormality occurs in any of the processing unit for performing the application of the developer, the processing unit for performing the rinsing after the application of the developer, and the processing unit for performing the drying after the rinsing, Processing must be stopped, and there is a problem with the safety of the device. On the other hand, the central transport type processing apparatus has a plurality of development processing units that perform all of the application of the developer, the rinsing after the application of the developer, and the drying after the rinsing. Is high, safety is high because processing can be performed by another development processing unit. However, since three development processing units for performing the full development processing are provided, there is a problem that the apparatus cost is higher than that of a track transport type processing apparatus.
[0007]
The present invention has been made in view of such circumstances, and an object of the present invention is to provide a processing apparatus and a processing method that are highly safe and can be reduced in cost.
[0008]
[Means for Solving the Problems]
In order to solve the above-described problems, the present invention firstly includes a plurality of processing units for performing a predetermined process on an object to be processed, and performs a series of processes including a plurality of processes on the object to be processed. A processing device for The plurality of processing units, The first step and the second step can be performed First Processing unit And a second processing unit for performing the second step. Has, The first Processing unit , Perform the first step and perform the second step during normal processing The second Provided is a processing apparatus that performs the first step and the second step when a processing unit is abnormal.
[0009]
A second aspect of the present invention is a processing apparatus that includes a plurality of processing units that perform a predetermined process on an object to be processed and performs a series of processes including a plurality of processes on the object to be processed. It has two processing units each capable of performing the first step and the second step. The two processing units perform the first step in one processing unit and the second step in the other processing unit during normal processing, and perform the other step when one of the processing units is abnormal. Perform the first and second steps in the processing unit A processing device characterized by the above feature.
[0010]
Thirdly, the present invention includes a plurality of processing units for performing a predetermined process on an object to be processed, and performs a series of processes including a resist coating process and a development process after exposure to the object to be processed. A processing unit for performing a development process, the processing unit having a processing unit capable of performing two processes of developer application, rinsing after application of the developer, and drying after rinsing; Provides a processing device that performs one of two processes during a normal process, and performs the two processes when a processing unit that performs another of the two processes is abnormal. I do.
[0011]
Fourth, the present invention includes a plurality of processing units for performing a predetermined process on the object to be processed, and for performing a series of processes including a resist coating process and a development process after exposure to the object to be processed. The processing apparatus includes two processing units capable of performing the same two processes of developing solution application, rinsing after application of the developing solution, and drying after rinsing as a processing unit for performing a developing process. However, the two processing units perform different ones of the two processings during the normal processing, and when one of the two processings is abnormal, the other processing unit performs the two processings. Do the processing A processing device characterized by the above feature.
[0012]
Fifthly, the present invention includes a plurality of processing units for performing a predetermined process on an object to be processed, and for performing a series of processes including a resist coating process and a development process after exposure to the object to be processed. The processing apparatus includes two processing units for performing development processing and rinsing after application of the developer and a processing unit for performing drying after rinsing. During the normal processing, the two processing units perform developer application on one side and perform rinsing after development application on the other, and when any of these two processing units is abnormal, the remaining processing units Perform developer application and rinse after developer application A processing device characterized by the above feature.
[0013]
Sixth, the present invention is a processing method for performing a series of processes including a plurality of steps on a processing target by a plurality of processing units that perform predetermined processing on the processing target, A first of the plurality of processing units Processing unit can perform the first step and the second step, and during normal processing In the first processing unit The first step While performing the second process in the second processing unit. Perform the second step The second When the processing unit is abnormal In the first processing unit There is provided a processing method characterized by performing the first step and the second step.
[0014]
Seventhly, the present invention provides a processing method for performing a series of processes including a plurality of steps on a processing target by a plurality of processing units for performing a predetermined processing on the processing target. One processing unit is capable of performing the first step and the second step, respectively. During normal processing, one processing unit performs the first step and the other processing unit performs the second step. When one of the processing units is abnormal, the other processing unit performs the first and second processing.
[0015]
Eighthly, the present invention provides a processing method for performing a series of processes including a resist coating process and a development process after exposure by a plurality of processing units for performing a predetermined process on a target object. As a processing unit for performing a developing process, a predetermined processing unit is capable of performing two processes of developing solution application, rinsing after applying the developing solution, and drying after rinsing. A processing method that performs one of the two processes during normal processing, and performs the two processes when a processing unit that performs another of the two processes is abnormal. .
[0016]
A ninth aspect of the present invention is a processing method for performing a series of processes including a resist coating process and a development process after exposure by a plurality of processing units for performing a predetermined process on a target object. The two processing units are capable of performing the same two processes of developing solution application, rinsing after application of the developing solution, and drying after rinsing, as the processing units for performing the developing process. The processing unit performs one different process of the two processes during the normal process, and when one of the two processes is abnormal, the other process unit performs the two processes. A featured processing method is provided.
[0017]
According to the present invention, the first step and the second step can be performed. First Having a processing unit, First The processing unit performs the first step and performs the second step during normal processing. Second Since the first step and the second step are performed when the processing unit is abnormal, the second step is performed. Second Even if an abnormality occurs in the processing unit, there is no need to stop the device, and the safety is high. Further, since only two processes can be performed on the processing unit, the increase in apparatus cost may be small, and the cost can be reduced. As a specific example, an apparatus having a processing unit capable of performing two processes of a developer application, a rinsing after the developer application, and a drying after the rinsing as a processing unit for performing a developing process is described. As a result, it is possible to reduce the cost by ensuring the safety of the apparatus as described above and not using a plurality of full-featured development processing units such as the conventional central conveyance type processing apparatus. Can be.
[0018]
Further, by having two processing units each capable of performing the first step and the second step, when one of the processing units is abnormal, the other processing unit performs the first and second processing. High safety because it can be performed. Further, since only two processes can be performed for two processing units, an increase in apparatus cost may be small, and cost reduction may be achieved. As a specific example, an apparatus having two processing units capable of performing the same two processes of developing solution application, rinsing after developing solution application, and drying after rinsing as a processing unit for performing a developing process, particularly Examples of the processing unit include an apparatus having two processing units for performing application of the developer and rinsing after the application of the developer and an apparatus having a processing unit for performing drying after rinsing, thereby improving the safety of the apparatus as described above. In addition, the cost can be reduced by not using a plurality of full-featured development processing units unlike the conventional central conveyance type processing apparatus.
[0019]
BEST MODE FOR CARRYING OUT THE INVENTION
Hereinafter, embodiments of the present invention will be described in detail with reference to the accompanying drawings.
FIG. 1 is a plan view showing an apparatus for coating and developing a resist on an LCD substrate according to an embodiment of the present invention.
[0020]
The resist coating / developing apparatus 100 is of a truck transport type, in which a cassette C accommodating a plurality of substrates G is placed, and a loader unit 1 for carrying in the substrates G and a resist coating / developing on the substrates G are performed. A processing unit 2 having a plurality of processing units for performing a series of processes including an interface unit 3 for transferring a substrate G to and from the exposure apparatus 40, and a cassette C are placed. And an unloader section 4 for unloading the substrate G.
[0021]
The loader unit 1 includes a transport mechanism 10 for transporting the LCD substrate G from the cassette C to the processing unit 2. The transfer mechanism 10 includes a transfer arm 12 movable on a transfer path 11, and the transfer arm 12 transfers the substrate G from the cassette C to the processing unit 2.
[0022]
The processing unit 2 has a first processing line 2a from the loader unit 1 to the interface unit 3 and a second processing line 2b from the interface unit 3 to the unloader unit 4, and each processing unit is in the order of processing. Are arranged.
[0023]
The first processing line 2a includes an ultraviolet irradiation unit (UV) 21, a cooling processing unit (COL) 22, a scrubber cleaning unit (SCR) 23, an adhesion processing unit (AD) 24, and a cooling processing unit (COL) from the loader unit 1 side. ) 25, a resist processing unit 26 integrally provided with a resist coating processing section (CT) 26a and a peripheral resist removing section (ER) 26b, a heating processing unit (HP) 27, and a cooling processing unit (COL) 28 are sequentially arranged. The substrate G is transported from the cooling processing unit (COL) 28 to the interface unit 3. Transfer mechanisms T are provided between adjacent processing units and between the cooling processing unit (COL) 28 and the interface unit 3, respectively, and the substrates are sequentially transferred to the processing units arranged by the transfer mechanisms T. Is done.
[0024]
The second processing line 2b includes developing solution applying / rinsing units (D / R) 29 and 30 capable of performing a developing solution applying and rinsing process from the interface unit 3 side, and a drying unit (DRY) for performing drying after rinsing. ) 31, a heating unit (HP) 32, and a cooling unit (COL) 33 are arranged in this order, and the substrate G is transported from the cooling unit (COL) 33 to the unloader unit 4. A transport mechanism T is provided between the interface unit 3 and the developer application / rinse unit (D / R) 29 and between adjacent processing units, and the processing units arranged by the transport mechanisms T are provided. Are sequentially transported.
[0025]
The interface unit 3 includes an extension 34 for temporarily holding the substrate G carried in from the processing unit 2, an extension 35 for temporarily holding the substrate G to be carried out to the processing unit 2, and an outside of these extensions 34 and 35. There are provided two buffer stages 36 for arranging buffer cassettes, and a transport mechanism 37 for loading and unloading the substrate G between these and the exposure device 40. The transport mechanism 37 includes a transport arm 39 movable along a transport path 38 provided along the direction in which the extensions 34 and 35 and the buffer stage 36 are arranged. Then, the substrate G is transported.
[0026]
The unloader unit 4 includes a transport mechanism 50 for transporting the LCD substrate G from the processing unit 2 to the cassette C. The transfer mechanism 50 includes a transfer arm 52 movable on a transfer path 51, and the transfer arm 52 transfers the substrate G from the processing unit 2 to the cassette C.
[0027]
In such a truck transport type processing apparatus 100, the substrate G taken out of the loader unit 1 is transported to the processing unit 2, and the processing units arranged in the processing unit 2 in the processing order perform ultraviolet irradiation processing, scrubber processing, and so on. After the cleaning process, the adhesion process, the resist coating process, the pre-bake process, and the like are performed, the wafer W is transferred to the exposure apparatus 40 via the interface unit 3 to perform the exposure process. After being carried into the processing unit 2, development processing is performed as described later, post-baking processing and the like are performed, and a series of processing is completed, it is stored in the cassette C of the unloader unit 4.
[0028]
Next, a description will be given of a developing process in the track transport type resist coating and developing apparatus.
In the present embodiment, the developer application / rinse units (D / R) 29 and 30 have almost the same structure, and as shown in FIG. A spin chuck 62 for sucking and holding the spin chuck, a motor 63 for rotating the spin chuck 62, a developing solution nozzle 64 for supplying a developing solution, and a rinsing solution nozzle 65 for supplying a rinsing solution. The developing solution nozzle 64 is movable by a driving mechanism 66. The developing solution nozzle 64 has substantially the same width as the short side of the substrate G, and has a number of developing solution discharge holes formed at the bottom thereof over the entire width. Then, the developer nozzle 64 is scanned in the long side direction of the substrate G by the driving mechanism 66 while discharging the developer from the discharge hole of the developer nozzle 64, thereby forming a developer paddle on the substrate G. The rinsing liquid nozzle 65 is movable by a driving mechanism 67. Then, at the time of rinsing, the rinsing liquid nozzle 65 is moved to the center of the substrate G by the drive mechanism 67 and the rinsing liquid is supplied while rotating the substrate G by the motor 63.
[0029]
On the other hand, as shown in FIG. 3, the drying unit (DRY) 31 includes a cup 71, a spin chuck 72 for horizontally holding the substrate G in the cup 71, and a motor 73 for rotating the spin chuck 72. No nozzles are provided. In this unit, the substrate G after rinsing is held by a spin chuck 72, and the substrate G is rotated at high speed by a motor 73 to shake off and rinse the rinse liquid. Therefore, the motor 73 can rotate at a higher speed than the motor 63.
[0030]
During normal processing, one of the two functions is selected and designated, and the developer application / rinse unit (D / R) 29 is used exclusively for developer application, and the developer application / rinse unit (D / R) is used. ) 30 is used exclusively for rinsing. Therefore, by sequentially flowing the substrate G through the units 29, 30, and 31, it is possible to realize a series of processing including application of a developer, rinsing, and drying.
[0031]
If any abnormality occurs in the developer application / rinse unit (D / R) 29, the developer application / rinse unit (D / R) 29 is skipped and the developer application / rinse unit (D / R) 29 is skipped. R) The substrate G is transported to 30 where both of the two functions can be designated for developer application and rinsing. Similarly, when an abnormality occurs in the developer coating / rinsing unit (D / R) 30, the developer coating / rinsing is performed in the developer coating / rinsing unit (D / R) 29, and then the developer coating / rinsing is performed. The unit (D / R) 30 can be skipped and transported to the drying unit (DRY) 31.
[0032]
Thus, unlike the conventional track transport type processing apparatus, two developer coating / rinsing units (D / R) 29 and 30 capable of performing both developer coating and rinsing are provided. When an abnormality occurs in one of the processing units, the other processing unit performs the two steps of the developer application and the rinsing processing. Therefore, even if an abnormality occurs in one of the processing units, the processing is continued without stopping the apparatus. The device can be highly safe.
[0033]
Further, the two processing units are merely provided with two processing functions of developer application and rinsing. These processing units can have almost the same configuration as a conventional developer application processing unit. The cost is slightly higher than that of a truck transport type processing apparatus, and a certain reduction in cost can be realized.
[0034]
The developer application / rinse unit (D / R) 29 does not need to have a full rinsing function because the developer application is performed in the normal processing. D / R) 30 Is Since the rinsing is performed in the normal processing, it is not necessary to provide the developer application function fully, and a necessary function may be provided by replacing a predetermined part when a trouble occurs. As a result, the required number of parts can be reduced, so that further cost reduction can be realized.
[0035]
Next, another embodiment of the present invention will be described.
FIG. 4 is a plan view showing an apparatus for coating and developing a resist on an LCD substrate according to another embodiment of the present invention.
[0036]
The resist coating / developing apparatus 200 is of a central transport type, and has a cassette station 101 on which a cassette C accommodating a plurality of substrates G is mounted, and a series of processes including resist coating and developing on the substrates G. A processing unit 102 having a plurality of processing units, and an interface unit 103 for transferring a substrate G between the processing unit 102 and the exposure apparatus 140 are provided. Is arranged.
[0037]
The cassette station 101 includes a transport mechanism 110 for transporting the LCD substrate G between the cassette C and the processing unit 102. Then, the cassette C is carried in and out of the cassette station 101 to the outside. The transport mechanism 110 includes a transport arm 111 that can move on a transport path 110 a provided along the direction in which the cassettes are arranged. The transport arm 111 transports the substrate G between the cassette C and the processing unit 102. Done.
[0038]
The processing section 102 is divided into a front section 102a, a middle section 102b, and a rear section 102c, each having transport paths 112, 113, and 114 at the center, and processing units disposed on both sides of these transport paths. I have. In addition, relay portions 115 and 116 are provided between them.
[0039]
The front section 102a includes a main transport device 117 movable along the transport path 112. On one side of the transport path 112, two cleaning units (SCR) 121a and 121b are disposed. On the other side of 112, a processing block 126 in which an ultraviolet irradiation unit (UV) and a cooling unit (COL) are stacked in two stages, a processing block 127 in which a heating processing unit (HP) is stacked in two stages, and a cooling unit A processing block 128 in which (COL) is stacked in two stages is arranged.
[0040]
The middle section 102b includes a main transfer device 118 that can move along the transfer path 113. On one side of the transfer path 113, a resist coating section (CT) 122a that applies a resist to the substrate G is provided. A resist processing unit 122 integrally provided with a peripheral resist removal section (ER) 122b for removing the resist at the peripheral portion of the substrate G is disposed. On the other side of the transport path 113, a heat processing unit (HP) is provided. 129, a processing block 129 in which heat treatment units (HP) and cooling units (COL) are vertically stacked, and an adhesion processing unit (AD) and cooling units (COL). Are disposed on top of each other.
[0041]
Further, the rear section 102c includes a main transport device 119 movable along the transport path 114. On one side of the transport path 114, two developer application / rinse units (D / R) 123 and 124 are provided. A single drying unit (DRY) 125 is disposed, and a processing block 132 in which a heating processing unit (HP) is stacked in two stages on the other side of the transport path 14, and both a heating processing unit (HP) Processing blocks 133 and 134 in which a cooling processing unit (COL) is vertically stacked are arranged.
[0042]
Each of the main transfer devices 117, 118, and 119 includes an X-axis drive mechanism, a Y-axis drive mechanism, and a vertical Z-axis drive mechanism in two directions in a horizontal plane, and a rotation that rotates about the Z axis. A driving mechanism is provided, and has arms 117a, 118a, and 119a that support the substrate G, respectively.
[0043]
The main transfer device 117 transfers the substrate G to and from the arm 111 of the transfer mechanism 110, and loads and unloads the substrate G to and from each processing unit of the former stage 102a. It has a function to transfer G. The main transfer device 118 transfers the substrate G to and from the relay unit 115, and loads and unloads the substrate G to and from each processing unit in the middle unit 102b, and further transfers the substrate G to and from the relay unit 116. Has the function of performing Further, the main transfer device 119 transfers the substrate G to and from the relay unit 116, and loads and unloads the substrate G to and from each processing unit in the subsequent unit 102c, and further transfers the substrate G to and from the interface unit 103. Has the function of performing In addition, the relay parts 115 and 116 also function as cooling plates.
[0044]
The interface unit 103 includes an extension 136 that temporarily holds the substrate when the substrate is transferred to and from the processing unit 102, and two buffer stages 137 provided on both sides of the buffer stage for disposing a buffer cassette. And a transport mechanism 138 for carrying in and out the substrate G between the exposure apparatus 140 and the exposure apparatus 140. The transport mechanism 138 includes a transport arm 139 that can move on a transport path 138 a provided along the direction in which the extension 136 and the buffer stage 137 are arranged. The transport arm 139 allows the substrate to be moved between the processing unit 102 and the exposure apparatus 140. G is transported.
[0045]
In such a processing apparatus 200 of the central transfer type, the substrate G taken out from the cassette station 101 is transferred to the processing section 102, and then transferred by the main transfer apparatuses 117, 118, and 119, and each of the processing sections 102 After the unit is subjected to ultraviolet irradiation treatment, scrubber cleaning treatment, adhesion treatment, resist coating treatment, pre-bake treatment, and the like, the wafer W is transferred to the exposure device 140 via the interface unit 103 to perform exposure treatment, and thereafter, After being carried into the processing unit 102 again via the interface unit 103 and subjected to a development process, a post-baking process, and the like, and a series of processes is completed, the process unit is returned to the cassette station 101 and stored in any one of the cassettes C.
[0046]
Next, a description will be given of a developing process in the central transfer type resist coating / developing apparatus 200.
In this embodiment, the developer application / rinse units (D / R) 123 and 124 have substantially the same structure, and the developer application / rinse units (D / R) in the previous embodiment shown in FIG. ) The basic configuration is the same as 29 and 30. The drying unit (DRY) 125 has the same basic configuration as the drying unit (DRY) 31 in the previous embodiment shown in FIG. However, the units 123 and 125 have a loading / unloading port for the substrate G facing the transport path 114, and a developer coating / rinsing unit (D / R) 123 inside the units. A sub-arm mechanism (not shown) that transports the substrate G to the drying unit (DRY) 125 via the (/ R) 124 is provided.
[0047]
At the time of normal processing, the substrate G is first loaded into the developer application / rinse unit (D / R) 123 by the main transport device 119, where one of the two processing functions is selected and designated, and the developer application is performed. Then, the substrate G is transported to the developer application / rinse unit (D / R) 124 by the sub-arm mechanism, where one of the two processing functions is similarly selected and designated, and rinsing is performed. The sheet is conveyed to the drying unit (DRY) by the sub-arm mechanism to be dried, and is conveyed out by the main transfer device 119. This makes it possible to realize a series of processing including application of a developer, rinsing, and drying.
[0048]
If any abnormality occurs in the developer application / rinse unit (D / R) 123, the developer application / rinse unit (D / R) 123 is skipped and the developer application / rinse unit (D / R) 123 is skipped. R) The substrate G is transported to 124, where two processes of developing solution application and rinsing can be selectively designated to perform these processes. Similarly, when an abnormality occurs in the developer coating / rinsing unit (D / R) 124, the developer coating / rinsing is performed by the developer coating / rinsing unit (D / R) 123, and then the developer coating / rinsing is performed. The unit (D / R) 124 can be skipped and transported to the drying unit (DRY) 125.
[0049]
As described above, unlike the conventional central conveyance type processing apparatus, instead of using three development processing units that continuously perform all processing of developer application, rinsing, and drying, two developer application / rinse units are used. Since the units (D / R) 123 and 124 and one drying unit (DRY) 125 are provided, the configuration of the unit can be simplified as compared with the case of the conventional central conveyance type, and the cost of the apparatus can be reduced. Can be achieved. Further, even if an abnormality occurs in one developer coating / rinsing unit (D / R), both the developer coating and rinsing can be performed by the other developer coating / rinsing unit (D / R). The safety and reliability of the apparatus are higher than those of the truck transport type processing apparatus.
[0050]
In this embodiment, similarly to the previous embodiment, the developer application / rinse unit (D / R) 123 does not need to have a full rinsing function, and the developer application / rinse unit (D / R) 124 It is not necessary to fully provide the liquid application function. Therefore, by replacing a predetermined part when a trouble occurs, further cost reduction can be realized.
[0051]
Note that, in the present embodiment, the main transport device 119 uses the loading / unloading ports formed facing the transport path 114 in all of the units 123, 124, and 125 without providing the sub-arm mechanism as described above. G may be transported. Further, in the normal processing, the substrate G is carried into one of the developer application / rinse units (D / R) 123 and 124, and the substrate G carried into either is supplied with the developer G by the carried unit. Both application and rinsing may be performed.
[0052]
Note that the present invention is not limited to the above embodiment, and various modifications are possible. For example, in the above-described embodiment, an example is shown in which two identical developer application / rinse units (D / R) are provided, but one is provided, and the other is a developer application / rinse unit. Good. Further, the drying unit (DRY) 125 may perform two steps of a rinsing process and a drying process. Further, the apparatus layout is not limited to the above embodiment, and an appropriate layout may be adopted according to the processing. Further, in the above embodiment, the case where the present invention is applied to the development processing of the resist coating / development processing apparatus has been described, but the present invention is not limited to this. Furthermore, it goes without saying that the object to be processed is not limited to the LCD substrate but can be applied to the processing of other objects to be processed such as color filters and semiconductor wafers.
[0053]
【The invention's effect】
As described above, according to the present invention, the first step and the second step can be performed. First Having a processing unit, First The processing unit performs the first step and performs the second step during normal processing. Second Since the first step and the second step are performed when the processing unit is abnormal, the second step is performed. Second Even if an abnormality occurs in the processing unit, there is no need to stop the device, and the safety is high. Further, since only two processes can be performed on the processing unit, the increase in apparatus cost may be small, and the cost can be reduced. Specifically, as a processing unit for performing a developing process, a processing unit capable of performing two processes of a developer application, a rinse after the developer application, and a drying after the rinse is provided. In addition, the cost can be reduced by not using a plurality of fully equipped development processing units such as a conventional central conveyance type processing apparatus while ensuring safety.
[0054]
Further, according to the present invention, by having two processing units each capable of performing the first step and the second step, when one of the processing units is abnormal, the other processing unit performs the first and second steps. 2 is high, so the security is high. Further, since only two processes can be performed for two processing units, an increase in apparatus cost may be small, and cost reduction may be achieved. Specifically, as a processing unit for performing a developing process, two processing units capable of performing the same two processes of developing solution application, rinsing after applying the developing solution, and drying after rinsing are provided. Therefore, it is possible to reduce the cost while securing the safety of the apparatus as described above and not using a plurality of full-featured development processing units as in the conventional central conveyance type processing apparatus. In particular, this effect can be more effectively exerted by an apparatus having two processing units for performing application of a developing solution and rinsing after application of the developing solution and a processing unit for performing drying after rinsing.
[Brief description of the drawings]
FIG. 1 is a plan view showing an apparatus for coating and developing a resist on an LCD substrate according to an embodiment of the present invention.
FIG. 2 is a schematic sectional view showing a developer application / rinse unit (D / R) mounted on the resist application / development processing apparatus of FIG. 1;
FIG. 3 is a schematic sectional view showing a drying unit (DRY) mounted on the resist coating / developing apparatus of FIG.
FIG. 4 is a plan view showing an apparatus for applying and developing resist on an LCD substrate according to another embodiment of the present invention.
[Explanation of symbols]
1 ... loader section
2,102 processing unit
3,103 ... Interface part
4 ... Unloader section
29, 30, 123, 124 ... Developer coating / rinsing unit
31,125 ... Drying unit
112, 113, 114: transport path
117, 118, 119 ... Main transport device
100,200 ... resist coating and developing equipment
G ... LCD substrate
T ... Transport mechanism

Claims (9)

A processing apparatus that includes a plurality of processing units that perform a predetermined process on an object to be processed and performs a series of processes including a plurality of processes on the object to be processed,
Wherein the plurality of processing units includes a first processing unit capable of performing the first step and the second step, and a second processing unit that performs the second step, the first processing unit A processing apparatus that performs a first step during normal processing and performs the first step and the second step when the second processing unit that performs the second step is abnormal. A processing apparatus that includes a plurality of processing units that perform a predetermined process on an object to be processed and performs a series of processes including a plurality of processes on the object to be processed,
Have a respective first and second processes two processing units capable of carrying out, the two processing units is normal process, the first step in one processing unit, and in the other processing unit A processing apparatus, wherein the second step is performed, and when one of the processing units is abnormal, the first and second steps are performed by another processing unit. A processing apparatus that includes a plurality of processing units that perform a predetermined process on an object to be processed, and performs a series of processes including a resist coating process and a development process after exposure to the object to be processed,
As a processing unit for performing a development process, the processing unit includes a processing unit capable of performing two processes of a developer application, a rinse after the developer application, and a drying after the rinse. A processing apparatus that performs one of the two processes and performs the two processes when a processing unit that performs another of the two processes is abnormal. A processing apparatus that includes a plurality of processing units that perform a predetermined process on an object to be processed, and performs a series of processes including a resist coating process and a development process after exposure to the object to be processed,
As the processing unit for performing developing treatment, a developer coating, rinsing after the development liquid coating, and the two processing units capable of performing the same two process of drying after rinsing possess,
The two processing units perform one different processing of the two processings during the normal processing, and when one of the two processings is abnormal, the other processing unit performs the two processings. A processing device characterized by performing . A processing apparatus that includes a plurality of processing units that perform a predetermined process on an object to be processed, and performs a series of processes including a resist coating process and a development process after exposure to the object to be processed,
As the processing unit for performing developing processing, and two processing unit for rinsing after developer coating and developer coating, and a processing unit for drying after rinsing possess,
At the time of normal processing, the two processing units perform developer application on one side, and perform rinsing after development application on the other side. When one of these two processing units is abnormal, the remaining processing units perform development. A processing apparatus for performing rinsing after liquid application and developer application . A processing method for performing a series of processing including a plurality of steps on the object to be processed by a plurality of processing units that perform predetermined processing on the object to be processed,
The first processing unit among the plurality of processing units is capable of performing the first step and the second step. During the normal processing, the first processing unit performs the first step and performs the second step . performing a second step in the processing unit, when the performing the second step the second processing unit is abnormal and characterized by performing the first step and the second step in the first processing unit Processing method to do. A processing method for performing a series of processing including a plurality of steps on the object to be processed by a plurality of processing units that perform predetermined processing on the object to be processed,
The predetermined two processing units can perform the first step and the second step, respectively. During normal processing, one processing unit performs the first step and the other processing unit performs the second step. A processing method, wherein when one of the processing units is abnormal, the other processing unit performs the first and second processing. A plurality of processing units for performing a predetermined process on the object, a processing method for performing a series of processing including a resist coating process and a development process after exposure to the object,
As a processing unit for performing a development process, a predetermined processing unit is capable of performing two processes of developing solution application, rinsing after application of the developing solution, and drying after rinsing, and the processing unit performs normal processing. A processing method characterized by sometimes performing one of the two processes, and performing the two processes when a processing unit performing the other process of the two processes is abnormal. A plurality of processing units for performing a predetermined process on the object, a processing method for performing a series of processing including a resist coating process and a development process after exposure to the object,
As the processing units for performing the development processing, the two processing units are capable of performing the same two processings of the application of the developer, the rinsing after the application of the developer, and the drying after the rinsing. During normal processing, one of the two processings is performed differently, and when one of the two processings is abnormal, the other processing unit performs the two processings. Processing method.

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