JP3312993B2 - Adhesive surface peeling jig for light wave interference measurement - Google Patents

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a jig for separating a contact surface between a block gauge and a reference block, which is used after the size of the block gauge is determined by light wave interference measurement.

[0002]

BACKGROUND ART It is stipulated in JISB7506 that the dimension measurement of a block gauge is basically determined by light wave interference measurement. According to this JISB7506, both the measurement surface of the block gauge and a reference block having a reference plane to which the block gauge is closely attached (ringed) are irradiated with light,
The distance between the measurement surface and the reference plane is measured as the block gauge size using the light reflected from the measurement surface and the reference plane of these block gauges. Here, the measurement surface and the reference plane act as interference surfaces during measurement.
After the dimension measurement of the block gauge is completed, the block gauge is peeled off from the reference plane. Conventionally, both are separated by forcibly pulling a block gauge held by a vice away from a reference plane.

[0003]

Since the flatness between the block gauge and the reference plane is high, the adhesion between the block gauge and the reference plane is large, and the separation between the block gauge and the reference block is a difficult operation. In particular, for short block gauges with dimensions of 5 mm or less,
The peeling operation is extremely difficult. Conventionally, a vise or the like is used to perform such a difficult peeling operation, so that there is a problem that the block gauge is damaged.

The present invention has been made in view of such circumstances, and an object of the present invention is to provide an adhesive surface for light wave interference measurement capable of easily separating a block gauge from a reference plane without damaging the block gauge. An object of the present invention is to provide a peeling jig. Another object of the present invention is to provide a jig for peeling off a contact surface for light wave interference measurement, in which a reference block is not damaged, in addition to the above objects.

[0005]

SUMMARY OF THE INVENTION The present invention achieves the above object by applying pressure to a reference block to apply distortion to the reference block, and furthermore, allowing relative movement of the reference block and the block gauge within a reference plane. Is what you do. Specifically, the contact surface peeling jig for light wave interference measurement of the present invention is a contact surface peeling jig for peeling a block gauge used for light wave interference measurement and a reference block in which the block gauge is closely adhered to a reference plane. A reference block holding means for holding the reference block, a reference block pressing means for pressing the reference block, a block gauge holding means for holding the block gauge, the block gauge holding means and the reference block holding A moving mechanism provided on at least one of the means for relatively moving the block gauge and the reference block within the reference plane.

Here, the reference block pressurizing means may include a micrometer head or a piezoelectric element, and the moving mechanism may include a micrometer head or a piezoelectric element. The micrometer head may be provided on the reference block holding unit, and the reference block holding unit may have a structure including a stopper mechanism for restricting movement of the reference block in the block gauge pressing direction. The stopper mechanism is disposed between the stopper block and the stopper block and the reference block, and is movable perpendicular to the axial direction of the spindle of the micrometer head and in the same plane as the reference plane. A reference block holding member may be provided, and a guide may be formed on the reference block holding member so as to coincide with a side surface of the reference block. The block gauge holding means may have a tapered portion having a tapered portion, and an operating plate whose leading end presses the block gauge in the vicinity of the reference plane.

[0007]

[Function] After the worker manually brings the block gauge into close contact with the reference plane of the reference block, light wave interference measurement of the block gauge dimensions is performed in accordance with JISB7506. After the light wave interference measurement is completed, the block gauge is peeled off from the reference plane by using a contact surface peeling jig. Therefore, first, the moving mechanism is operated while the reference block is distorted by the reference block pressing means. By the reference block pressurizing means,
Since the reference plane is distorted, relative displacement between the block gauge and the reference block is easily performed in the reference plane, and the block gauge is easily separated from the reference plane.

[0008]

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS Preferred embodiments of a jig for peeling an adhesive surface for measuring a light wave interference having a block gauge size according to the present invention will be described below.
This will be described in detail with reference to the accompanying drawings. Here, in each embodiment, the same or similar components are denoted by the same reference numerals and description thereof will be omitted. FIG. 1 is a front view showing a contact surface peeling jig according to the first embodiment, FIG. 2 is a plan view thereof, and FIG. 3 is a sectional view taken along line III-III in FIG. In FIGS. 1 and 2, a jig for separating a contact surface includes a reference block holding means 2 for holding a cylindrical reference block 1 and a block gauge holding means for holding a block gauge 3 disposed on the reference block 1. 4, a moving mechanism 5 provided on the reference block holding means 2 and a reference block pressing means 2
The reference block holding means 2, the block gauge holding means 4, and the moving mechanism 5 also have the function of an interference surface correction jig. The moving mechanism 5 includes a micrometer head, and the micrometer head has a scaled main body 5A.
And a spindle 5B, and the block gauge 3 is shown in FIG.
It is a structure to press to the middle and left. Reference block 1
Is made of a substantially transparent material such as synthetic quartz, and its upper end surface is a reference plane 1A having a high flatness. The block gauge 3 is in close contact (ringing) with the reference plane 1A. The block gauge 3 is formed in a rectangular parallelepiped from a material different from the reference block 1, such as steel or ceramic. The surface of the block gauge 3 facing the reference plane 1A and the surface opposite to this surface are defined as measurement surfaces 3A, and the distance between the measurement surfaces 3A is defined as the block gauge size. Also, when measuring the light wave interference of the block gauge dimensions specified in JISB7506,
The reference plane 1A and the measurement plane 3A function as an interference plane.

The reference block holding means 2 includes a flat base block 6, a base plate substrate 7 provided on the base block 6 and supporting a lower end surface of the reference block 1, and a block of the reference block 1. A stopper mechanism 8 for regulating movement in the gauge pressing direction,
A holding block 9 fixed to one end of the base block 6 and having the moving mechanism 5 attached thereto. The base plate substrate 7 has a hole 7A formed in the center thereof, and the inner diameter of the hole 7A is smaller than the outer diameter of the reference block 1 (see FIG. 3). The stopper mechanism 8 includes a stopper block 10 fixed to the other end of the base block 6, and a reference block holding member 11 disposed between the stopper block 10 and the reference block 1. The block holding member 11 is movable in a direction perpendicular to the axial direction of the spindle 5B of the moving mechanism 5 in the same plane as the reference plane 1A. An arcuate guide 11A is formed on the upper part of the reference block holding member 11 so as to coincide with the circumferential side surface of the reference block 1.

The block gauge holding means 4 includes a substantially plate-shaped operating plate 12 for pressing the block gauge 3, an operating plate guide 14 attached to lower surfaces on both sides of the operating plate 12 by bolts 13, and an operating plate guide. A handle 16 attached by bolts 15 to the upper surface of the central part of the
And an anvil 18 with which the tip of the spindle 5B of the moving mechanism 5 abuts, via an anvil fixing plate 17, so that it can advance and retreat along the axis of the spindle 5B. I have. As shown in FIG. 3, a gate-shaped shape that straddles the reference block 1 is formed from the two operation plate guides 14 and the operation plate 12, and the lower end surface of the operation plate guide 14 contacts the upper surface of the base block 6. The lower surface of the operation plate 12 is in contact with the reference plane 1A of the reference block 1. The handle 16
Is formed in a ladder shape from a heat-insulating material, for example, Duracon (trade name), and has a structure that does not easily transmit the body temperature of the worker to the reference block 1 and the block gauge 3.
The handle 16 also functions as a weight for urging the operation plate 12 toward the reference block. Here, a reference block movement restricting member 19 for restricting the movement of the reference block 1 on the block gauge side from the operation plate 12, the operation plate guide 14 and the handle 16, in other words, preventing the reference block 1 from floating is provided. It is configured.

As shown in FIG. 2, a window 12A is formed at the center of the operating plate 12 to avoid interference with the block gauge 3 on the reference block 1. Is formed with a tapered portion 12B having substantially the same width as the short side direction of the block gauge 3.
The width direction of the tapered portion 12B is orthogonal to the axis direction of the spindle 5B of the micrometer head 5, and the center in the width direction coincides with the axis line of the spindle 5B.
FIG. 4 shows a sectional structure of the operation plate 12. FIG.
In the above, the tapered portion 12B has a tapered shape, and the tip thereof is configured to press the short side surface of the block gauge 3 near the reference plane 1A. The height of the micrometer head 5 is adjusted so that the axial direction of the spindle 5B is located above the reference plane 1A.

The reference block pressing means 21 is provided with a micrometer head 22 provided below the moving mechanism 5.
And a pressure block 23 arranged between the micrometer head 22 and the reference block 1. The micrometer head 22 includes a main body 22A having a scale and a spindle 22B,
The structure is such that the reference block 1 is pressed to the left side in FIG. 1 (the same as the pressing direction of the moving mechanism 5). The pressure block 23 is attached to a block main body 24 that contacts the circumferential side surface of the reference block 1, and is attached to a side portion of the block main body 24 via an anvil fixing plate 25 and a spindle 22 B of the micrometer head 22. And an anvil 26 with which the distal end abuts.
And pressurize the reference block 1.

Next, a method for performing light wave interference measurement of a block gauge size will be described. First, an operator manually brings one measurement surface 3A of the block gauge 3 into close contact with the reference plane 1A of the reference block 1. The state of adhesion between the measurement surface 3A of the block gauge 3 and the reference plane 1A is confirmed by visual observation from the back surface of the reference block 1. These measurement surfaces 3
Block gauge 3 due to the close contact work between A and reference plane 1A
Since the body temperature of the worker is transmitted to the reference block 1, the temperature is brought close to room temperature (around 20 ° C.) for a certain period of time. After a lapse of a predetermined time after the temperature break-in, the block size is measured. Before the measurement, the measurement surface 3A and the reference plane 1A, which are interference surfaces, are corrected.

A temperature change occurs due to temperature break-in or the like, and thermal stress distortion occurs in the block gauge 3 and the reference block 1. Although the flatness of the measurement surface 3A and the reference plane 1A deteriorates due to the thermal stress distortion, an interference surface correction jig is used to recover the deterioration. First, by operating the moving mechanism 5 and the micrometer head 22 of the reference block pressing means 21, the spindles 5B and 22B are fully retracted, and the reference block 1 in a state where the block gauge 3 is in close contact with the reference plane 1A. Is disposed on the base plate substrate 7 of the reference block holding means 2. Thereafter, the reference block 1 is covered with the block gauge holding means 4, and the block gauge 3 is positioned in the window 12 A of the operation plate 12 of the holding means 4. At this time, the block gauge 3 is arranged such that the tip of the tapered portion 12B of the operation plate 12 abuts on the short side surface thereof.

In this state, the moving mechanism 5 is operated to move the spindle 5B forward. Then, after the spindle 5B contacts the anvil 18, the operating plate 12 is advanced.
By the advance of the operation plate 12, the tip of the tapered portion 12B presses the short side surface of the block gauge 3. When the block gauge 3 is pressed, the reference block 1 also attempts to move in the same direction. However, since the side surface of the reference block 1 is held by the stopper mechanism 8 of the reference block holding means 2, The movement of the reference block 1 in the block gauge pressing direction is restricted. The side of the reference block 1 is pressed by the spindle 22B so that the micrometer head 22 of the reference block pressing means 21 is not operated, or the reference plane 1A is not distorted by the operation. Here, as shown in FIG. 5, when the center P of the reference block 1 is displaced from above the axis L of the spindle 5B, the reference block holding member 11 of the stopper mechanism 8 is orthogonal to the axis direction of the spindle 5B. The guide 11A moves in the direction to match the reference block 1.

As the spindle 5B advances, the block gauge 3 and the reference block 1 are relatively displaced from each other while maintaining the close contact state in the reference plane 1A. The distortion is released, and the reference plane 1A and the measurement plane 3A which are the interference planes
Is corrected. Here, the distance by which the block gauge 3 and the reference block 1 are relatively moved by the micrometer head 5 is 0.05 to 0.1 mm. If it exceeds 0.1 mm, the close contact between the two may be released and proper measurement of the block gauge dimensions may not be performed. The advance of the spindle 5B of the micrometer head 5 is performed while reading the scale of the main body 5A.

When the flatness between the reference plane 1A and the measurement surface 3A of the block gauge 3 is corrected, the moving mechanism 5 is operated to move the spindle 5B backward. Further, the block gauge holding means 4 is removed, and the reference block 1 on which the block gauge 3 is in close contact is taken out from the reference block holding means 2. The close contact state between the block gauge 3 taken out from the reference block holding means 2 and the reference plane 1A of the reference block 1 is confirmed. Thereafter, in accordance with JISB7506, both the measurement surface 3A of the block gauge 3 and the reference plane 1A to which the block gauge 3 is adhered are irradiated with light, and the light reflected from the measurement surface 3A and the reference plane 1A is used. The distance between the measurement surface 3A and the reference plane 1A is measured as a block gauge dimension.

After the light wave interference measurement according to JISB7506 is completed, the block gauge is peeled off from the reference plane. Therefore, the moving mechanism 5 and the reference block pressing means 21
By operating the micrometer head 22, the spindles 5B and 22B are fully retracted, and the reference block 1 in a state where the block gauge 3 is in close contact with the reference plane 1A is placed on the base plate substrate 7 of the reference block holding means 2. Deploy. Thereafter, the reference block 1 is again covered with the block gauge holding means 4, and the operating plate 1 of the holding means 4 is used.
The block gauge 3 is positioned in the second window 12A.

In this state, the reference block pressing means 2
By operating the micrometer head 22 of the first
Advance 2B. The operation of the micrometer head 22 is performed while reading the scale of the main body 22A. When the center P of the reference block 1 is displaced from the axis L of the spindle 5B, as described above, the reference block holding member 1
1 is moved in a direction orthogonal to the axial direction of the spindle 5B so that the guide 11A coincides with the reference block 1. When the spindle 22B is advanced, this spindle 22B
After contacting the anvil 26 of the pressure block 23,
The entire pressure block 23 is advanced. This allows
The reference block 1 is pressurized between the pressure block 23 and the block mechanism 8, and the reference plane 1A is distorted. In this state, the moving mechanism 5 is operated to advance the spindle 5B. Then, the spindle 5B advances the operation plate 12, and the advance of the operation plate 12 causes the taper portion 12 to move forward.
The tip of B presses the side surface of the block gauge 3. As a result, the block gauge 3 and the reference block 1 are relatively displaced in the reference plane 1A, and the block gauge 3 is separated from the reference plane 1A.

Therefore, according to this embodiment, the reference block holding means 2 for holding the reference block 1, the reference block pressing means 21 for pressing the reference block 1, and the block gauge holding means for holding the block gauge 3 4 and a moving mechanism 5 provided in the reference block holding means 2 for relatively moving the block gauge 3 and the reference block 1 within the reference plane 1A to constitute a jig for peeling off the contact surface for light wave interference measurement. Therefore, it is not necessary to forcibly separate the block gauge 3 from the block gauge reference plane sandwiched by a vice or the like, so that the block gauge 3 and the reference plane 1A can be easily separated without damaging the block gauge 3. In this embodiment, the reference block pressurizing means 2
1 is configured to include the micrometer head 22. Therefore, if the spindle 22B is advanced while reading the scale of the micrometer head 22, it is possible to prevent the excessive pressing force from acting on the reference block 1. Therefore, it is possible to prevent the reference block 1 from being damaged.

Furthermore, since the moving mechanism 5 is a micrometer head, the block gauge 3 can be reliably peeled off from the reference plane 1A by moving the spindle 5B forward while reading the scale of the micrometer head 5. The reference block holding means 2 includes a stopper mechanism 8 for restricting the movement of the reference block 1 in the block gauge pressing direction.
A stopper block 10, a reference disposed between the stopper block 10 and the reference block 1 and perpendicular to the spindle axis direction of the micrometer head 22 and movable in the same plane as the reference plane 1 </ b> A. Since the guide 11A is formed on the reference block holding member 11 so as to coincide with the side surface of the reference block 1, the center P of the reference block 1 is positioned above the axis L of the spindle 5B. Even if the reference block holding member 1 of the stopper mechanism 8 is displaced,
By moving the guide 1 in the direction orthogonal to the axis of the spindle 5B and aligning the guide 11A with the reference block 1, the block gauge 3 and the reference plane 1A can be reliably separated.

Further, the block gauge holding means 4 has a tapered portion 12B which is tapered, and the tip of the tapered portion 12B is formed on the reference plane 1 of the block gauge 3.
Since the structure provided with the operating plate 12 that presses the vicinity of A, a force for relatively moving the block gauge 3 and the reference block 1 is applied to the vicinity of the reference plane 1A to separate the block gauge 3 and the reference plane 1A. In this case, the reference plane 1A is not damaged. That is, assuming that the pressing position of the block gauge 3 is a position away from the reference plane 1A, for example, the upper portion of the block gauge 3, pressing the block gauge 3 causes the lower side of the block gauge 3 opposite to the pressing position. A downward (reference plane side) force acts on the edge of the portion, and there is a possibility that the reference plane 1A may be damaged. However, in this embodiment, a force pressing the block gauge 3 is applied to the vicinity of the reference plane 1A. Block gauge 3
The downward force does not act on the lower edge of the.

Further, in this embodiment, since the interference surface correction jig is constituted by including the reference block holding means 2, the block gauge holding means 4, and the moving mechanism 5, the block gauge 3 is provided before the light wave interference measurement. Even if thermal stress distortion occurs in the reference block 1, the thermal stress distortion is released by relatively moving the block gauge 3 and the reference block 1 while maintaining the close contact state, thereby recovering the deterioration of the flatness. To accurately measure the block gauge dimensions. Further, since the handle 16 of the block gauge holding means 4 is formed of a heat insulating member, the body temperature of the worker is hardly transmitted to the block gauge 3 and the reference block 1 via the handle 16.

Next, a second embodiment of the present invention will be described with reference to FIGS.
It will be described based on. In the second embodiment, mainly the configuration of the moving mechanism and the reference block pressing means is different from that of the first embodiment, but other configurations are substantially the same as those of the first embodiment. FIG. 6 shows the whole of the second embodiment, and FIG. 7 shows a main part of the second embodiment. In these figures, the block gauge holding means 30 is composed of the operation plate 12, the operation plate guide 14, and the handle 16. A piezoelectric element 31 as a moving mechanism is mounted on the operation plate 12 via a piezoelectric element mounting plate 32. The reference block pressing means 33 includes the block main body 24 and a piezoelectric element 35 mounted on the block main body 24 via a piezoelectric element mounting plate 34. The reference block holding means 2 includes the base block 6, the base plate substrate 7, the stopper mechanism 8, the holding block 9, and micrometer heads 36 and 37 attached to the holding block 9, respectively. The micrometer heads 36 and 37 have a structure including main bodies 36A and 37A and spindles 36B and 37B. The spindle 36B can contact the piezoelectric element 31, and the spindle 37B contacts the piezoelectric element 35. It is possible.

The piezoelectric elements 31 and 35 have a general structure, and their vibration directions are the same as those of the spindles 36B and 37B.
The piezoelectric element mounting plate 32,
34. The piezoelectric element 31 is configured to receive an applied voltage signal from a control unit 38,
The piezoelectric element 35 is adapted to receive an applied voltage signal from the control means 39. FIG. 8 shows the waveform of the applied voltage signal sent from the control means 38 to the piezoelectric element 31.
As shown in FIG. 8 (A), the control means 38 applies a single rectangular wave applied voltage signal, or as shown in FIG.
A plurality of applied voltage signals having a rectangular waveform or an applied voltage signal that increases stepwise with time as shown in FIG. 8C are sent to the piezoelectric element 31. A constant DC voltage signal is applied to the piezoelectric element 35 from the control unit 39.

According to the second embodiment having such a configuration, the following effects can be obtained in addition to the effects of the first embodiment. That is, since the moving mechanism includes the piezoelectric element 31, the pressing force on the block gauge 3 is rapidly increased or increased stepwise to separate the reference plane 1 </ b> A from the block gauge 3. Work can be performed reliably. In addition, during the work of separating the reference plane 1A and the block gauge 3, the relative movement distance between the block gauge 3 and the reference block 1 can be reduced, so that damage to the close contact surface between the reference plane 1A and the block gauge 3 is prevented. Can be smaller.
Further, the reference block pressing means 33 is provided with the piezoelectric element 3.
Therefore, the block gauge 3 and the reference plane 1A can be easily separated from each other by applying a small amount of pressure to the reference block 1.

Although the present invention has been described with reference to preferred embodiments, the present invention is not limited to these embodiments, and various improvements and design changes may be made without departing from the spirit of the present invention. Of course, it is possible. For example, in the first embodiment, the moving mechanism 5 is a micrometer head. However, in the present invention, a screw or a ball screw may be used instead of the micrometer head if the reference plane 1A and the block gauge 3 can be relatively moved. Etc. may be used. Furthermore, although the reference block pressing means 21 is configured to include the micrometer head 22, a screw or a ball screw or the like may be used instead of the micrometer head 22,
Alternatively, a pressing means for pressing the reference block 1 from a vise may be configured. Further, the moving mechanism 5 is provided on the reference block holding means 2, and the stopper mechanism 8 of the reference block holding means 2 restricts the movement of the reference block 1 in the block gauge pressing direction. 3 is fixed and the reference block 1 is moved by providing a moving mechanism in the reference block holding means 2, or a moving mechanism is provided in both the reference block holding means 2 and the block gauge holding means 4 so that the block gauge 3 and the reference A configuration in which the block 1 and the block 1 are moved in directions facing each other may be employed.

Further, although the stopper mechanism 8 is constituted by the stopper block 10 and the reference block holding member 11, in the present invention, the stopper mechanism 8 may be constituted only by the stopper block 10. In addition, the operation plate 12 includes:
The tapered portion 12B has a tapered portion 12B, and the tip of the tapered portion 12B is
Although the structure in which the vicinity of A is pressed is adopted, the portion for pressing the block gauge 3 does not necessarily need to be the tip of the tapered portion 12B. For example, the operating plate 12 is formed from a flat plate,
A configuration in which the block gauge 3 is pressed by the vertical end face of the flat plate may be used.

Further, in the embodiment, the reference block movement restricting member 19 includes the operating plate 12, the operating plate guide 14 and the handle 1, which are constituent members of the block gauge holding means 4.
6, the reference block movement restricting member is not limited to this configuration. For example, the reference block movement restricting member is configured to include a hook that locks the reference plane 1A of the reference block 1, and the hook is a reference block holding unit 2.
May be fixed to the base block 6. Further, the handle 16 of the block gauge holding means 4 does not necessarily need to be formed from a heat insulating material. Further, the reference block 1 may have a shape other than a cylinder such as a prism. Also, reference block 1 and block gauge 3
May be the same material.

[0030]

As described above, according to the present invention,
A reference block holding unit for holding a reference block, a reference block pressurizing unit for pressing the reference block, a block gauge holding unit for holding a block gauge, and at least one of the block gauge holding unit and the reference block holding unit. And a moving mechanism for relatively moving the block gauge and the reference block within the reference plane to form a jig for peeling off the contact surface for light wave interference measurement. There is no need to forcibly separate the block gauge from the block gauge, and therefore, the block gauge and the reference plane can be easily separated without damaging the block gauge. In the present invention, if the reference block pressurizing means includes a micrometer head, an excessive pressing force acts on the reference block by advancing the spindle while reading the scale of the micrometer head. This can be avoided, and damage to the reference block can be prevented.

In the present invention, if the reference block pressing means includes a piezoelectric element, the work of separating the reference plane from the block gauge can be reliably performed. Further, if the moving mechanism is a micrometer head, the block gauge can be reliably separated from the reference plane by advancing the spindle while reading the scale of the micrometer head. Further, if the moving mechanism is a piezoelectric element, the relative movement distance between the block gauge and the reference block can be reduced, so that damage to the contact surface between the reference plane and the block gauge can be reduced. Further, the micrometer head is provided in the reference block holding means,
The reference block holding means includes a stopper mechanism for restricting movement of the reference block in the block gauge pressing direction, and the stopper mechanism is disposed between the stopper block and the stopper block and the reference block. A reference block holding member orthogonal to the axial direction of the spindle of the micrometer head and movable in the same plane as the reference plane; and forming a guide on the reference block holding member that coincides with a side surface of the reference block. Then, even if the center of the reference block is displaced from above the axis of the spindle, the reference block holding member of the stopper mechanism is moved in a direction orthogonal to the axis direction of the spindle to align the guide with the reference block. Thereby, the block gauge and the reference plane can be reliably separated.

If the block gauge holding means has a tapered tapered portion and an operation plate for pressing the tip of the tapered portion near the reference plane of the block gauge, the block gauge and the reference plane are provided. No damage occurs on the reference plane when exfoliating.

[Brief description of the drawings]

FIG. 1 is a front view showing a contact surface peeling jig according to a first embodiment of the present invention.

FIG. 2 is a plan view of FIG. 1;

FIG. 3 is a sectional view taken along the line III-III in FIG. 1;

FIG. 4 is a longitudinal sectional view showing a main part of the first embodiment.

FIG. 5 is a view similar to FIG. 2, showing the operation of the block mechanism.

FIG. 6 is a view similar to FIG. 2 showing a contact surface peeling jig according to a second embodiment of the present invention.

FIG. 7 is a view similar to FIG. 4, showing a main part of the second embodiment.

FIG. 8 is a graph showing a waveform of an applied voltage signal sent to a piezoelectric element.

[Explanation of symbols]

DESCRIPTION OF SYMBOLS 1 Reference block 1A Reference plane 2 Reference block holding means 3 Block gauge 3A Measurement surface 4 Block gauge holding means 5 Micrometer head as a moving mechanism 5B Spindle 8 Stopper mechanism 10 Stopper block 11 Reference block holding member 11A Guide 12 Operating plate 12B Taper Part 21 Reference block pressing means 22 Micrometer head constituting reference block pressing means 31 Piezoelectric element as moving mechanism 33 Reference block pressing means 35 Piezoelectric element forming reference block pressing means

──────────────────────────────────────────────────続 き Continuing on the front page (72) Inventor Hu Naoya 1-2-1-1, Sakado, Takatsu-ku, Kawasaki, Kanagawa Prefecture Mitutoyo Co., Ltd. (72) Akira Inagaki 1-2-1-1, Sakado, Takatsu-ku, Kawasaki, Kanagawa Stock (56) References JP-A-5-126972 (JP, A) JP-A-5-226214 (JP, A) (58) Fields investigated (Int. Cl. ⁷ , DB name) G01B 9/00 -11/30 102 G01B 3/00-5/30 G01B 21/00-21/32

Claims (5)

(57) [Claims] 1. A jig for separating a block gauge used for light wave interference measurement and a reference block in which the block gauge is in close contact with a reference plane, the reference block holding means holding the reference block. Reference block pressing means for pressing the reference block, block gauge holding means for holding the block gauge, and the block gauge and the reference block provided on at least one of the block gauge holding means and the reference block holding means. And a moving mechanism for relatively moving the contact surface within the reference plane. 2. The light wave interference measuring jig according to claim 1, wherein at least one of the reference block pressing means and the moving mechanism is provided with a micrometer head. Close contact jig for interference measurement. 3. The light wave interference measuring jig according to claim 1, wherein at least one of the reference block pressing means and the moving mechanism is provided with a piezoelectric element. A jig for peeling the contact surface for measurement. 4. The jig according to claim 2, wherein said micrometer head is provided on said reference block holding means, and said reference block holding means is provided in a direction in which said reference block is pressed by a block gauge. A stopper mechanism for restricting the movement of the micrometer head. The stopper mechanism is disposed between the stopper block and the reference block, and is orthogonal to the axial direction of the spindle of the micrometer head and the reference plane. A reference block holding member movable in the same plane as the reference block holding member, and a guide coinciding with a side surface of the reference block is formed on the reference block holding member. Peeling jig. 5. A jig for separating an adhesive surface for light wave interference measurement according to claim 1, wherein said block gauge holding means has a tapered tapered portion, and a tip of said tapered portion is formed of said block gauge. A contact surface peeling jig for light wave interference measurement, comprising an operating plate for pressing the vicinity of the reference plane.