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JP2971448B1 - Electrode equipment in continuous plating equipment - Google Patents

Electrode equipment in continuous plating equipment

Info

Publication number
JP2971448B1
JP2971448B1 JP17142298A JP17142298A JP2971448B1 JP 2971448 B1 JP2971448 B1 JP 2971448B1 JP 17142298 A JP17142298 A JP 17142298A JP 17142298 A JP17142298 A JP 17142298A JP 2971448 B1 JP2971448 B1 JP 2971448B1
Authority
JP
Japan
Prior art keywords
plating
power supply
supply roller
film
plated
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP17142298A
Other languages
Japanese (ja)
Other versions
JP2000001795A (en
Inventor
和夫 大場
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
SAKAE DENSHI KOGYO KK
Original Assignee
SAKAE DENSHI KOGYO KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by SAKAE DENSHI KOGYO KK filed Critical SAKAE DENSHI KOGYO KK
Priority to JP17142298A priority Critical patent/JP2971448B1/en
Priority to TW087119936A priority patent/TW438906B/en
Priority to KR1019980054160A priority patent/KR100302666B1/en
Priority to US09/209,361 priority patent/US6174418B1/en
Application granted granted Critical
Publication of JP2971448B1 publication Critical patent/JP2971448B1/en
Publication of JP2000001795A publication Critical patent/JP2000001795A/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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  • Electroplating Methods And Accessories (AREA)

Abstract

【要約】 【課題】 板状被メッキ物を縦にして移送して連続メッ
キする装置においてメッキ皮膜を均一化すること。 【解決手段】 メッキ槽内に設けたレール2上に垂直に
載置した板状被メッキ物3を移送しながらメッキする装
置において、レール2に沿って縦設した陰極棒6に給電
ローラ7を設け、この給電ローラ7の表面は対象メッキ
皮膜よりも硬い皮膜材料をもって保護皮膜8を形成し、
かつ、該給電ローラの表面に付着するメッキ層を剥離す
るための手段(9,10)を給電ローラ7の接触面に当
接してなる装置である。
An object of the present invention is to make a plating film uniform in an apparatus for vertically plating and transferring a plate-like object to be plated and performing continuous plating. SOLUTION: In an apparatus for performing plating while transferring a plate-like workpiece 3 placed vertically on a rail 2 provided in a plating tank, a power supply roller 7 is attached to a cathode rod 6 vertically provided along the rail 2. The protective film 8 is formed on the surface of the power supply roller 7 with a film material harder than the target plating film.
In addition, the device (9, 10) for peeling off the plating layer adhering to the surface of the power supply roller is in contact with the contact surface of the power supply roller 7.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、連続メッキ装置に
おいて、半導体基板等の板状被メッキ物を垂直に移送し
て連続的にメッキを施すための電極装置に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an electrode device for continuously transferring a plate-like object such as a semiconductor substrate in a continuous plating apparatus and vertically plating the same.

【0002】[0002]

【従来の技術】従来、板状の被メッキ物にメッキを施す
には、陰極に接続される枠体に複数の被メッキ物を固定
具で1個ずつ取付け、メッキ完了後に又1個ずつ取外し
ている。これは手間のかかる作業であり、メッキ作業の
効率を阻害する一因となっている。
2. Description of the Related Art Conventionally, in order to plate a plate-like object to be plated, a plurality of objects to be plated are attached one by one to a frame connected to a cathode with a fixture, and after plating is completed, one by one is removed. ing. This is a troublesome operation, and is one of the factors that hinder the efficiency of the plating operation.

【0003】そこで近年では、被メッキ物の枠体への固
定作業を避けて、被メッキ物を1枚ずつ個別に連続的に
メッキ槽中へ供給し、メッキ槽内を水平に移動させて、
連続して効率よくメッキを行う方法が提案されている。
[0003] In recent years, in order to avoid the work of fixing the plating object to the frame, in recent years, the plating objects have been supplied one by one individually and continuously into the plating tank, and the inside of the plating tank has been moved horizontally.
A method of continuously and efficiently plating has been proposed.

【0004】しかしながら、被メッキ物の大きさは大小
様々なものがあり、それらのいずれにも均等にメッキす
るためには、電極の配置、液面の調整、電流密度など、
メッキ条件を微妙に調整することがむずかしい問題とな
っている。そこで本発明者は、さきに被メッキ物を垂直
にしてメッキ槽に連続的に供給する方式を開発し、上記
の問題点の解決を図った。
[0004] However, the size of the object to be plated varies in size, and in order to plate evenly on any of them, the arrangement of electrodes, adjustment of liquid level, current density, etc.
It is difficult to finely adjust the plating conditions. Therefore, the present inventor has developed a method in which the object to be plated is vertically supplied and is continuously supplied to the plating tank, and the above-mentioned problems have been solved.

【0005】[0005]

【発明が解決しようとする課題】メッキ槽内において板
状の被メッキ物を垂直にして移送するには、例えば図2
に示すように、メッキ槽1内の中央底部に、紙面垂直方
向にのびるV字型断面のレール2に板状被メッキ物3の
下端を載せ、両面を駆動ローラを含む複数の縦型ローラ
(いずれも図示せず)で挾持しながら、駆動ローラで被
メッキ物3を移送する。4は陽極で、被メッキ物3の大
きさに応じてシリンダ5によって昇降自在に設置されて
いる。そして6は陰極棒で、7は該陰極棒6に付設した
給電ローラで、被メッキ物3に接して陰極を形成する。
この場合陰極付近に不必要なメッキ層が形成されると被
メッキ物に対するメッキ層の形成に悪影響がでる。そこ
で陰極棒6自体および給電部分以外は絶縁性皮膜処理を
して余分なメッキが付着しないようにできるが、給電ロ
ーラ7の被メッキ物に対する接触面を絶縁性皮膜処理を
することはできない。したがって、この部分にメッキ皮
膜が付着する可能性があり、この異常に付着したメッキ
皮膜が、被メッキ物表面に対する接触を不均一として、
生成メッキ皮膜を不均一なものとする問題がある。本発
明はかかる問題を解決するものである。
To vertically transfer a plate-shaped object to be plated in a plating tank, for example, as shown in FIG.
As shown in FIG. 1, a lower end of a plate-like workpiece 3 is placed on a rail 2 having a V-shaped cross section extending in a direction perpendicular to the paper, and a plurality of vertical rollers ( The object to be plated 3 is transported by a driving roller while being held by both members (not shown). Reference numeral 4 denotes an anode, which is vertically movable by a cylinder 5 according to the size of the object 3 to be plated. Reference numeral 6 denotes a cathode rod, and reference numeral 7 denotes a power supply roller attached to the cathode rod 6, which is in contact with the workpiece 3 to form a cathode.
In this case, if an unnecessary plating layer is formed near the cathode, the formation of the plating layer on the object to be plated is adversely affected. Thus, except for the cathode rod 6 itself and the power supply portion, an insulating film treatment can be performed to prevent extra plating from adhering. However, the contact surface of the power supply roller 7 with the object to be plated cannot be subjected to the insulating film treatment. Therefore, there is a possibility that the plating film adheres to this part, and the abnormally adhered plating film makes the contact with the surface of the object to be plated uneven,
There is a problem that the resulting plating film is not uniform. The present invention solves such a problem.

【0006】[0006]

【課題を解決するための手段】本発明は、メッキ槽内に
設けたレール上に垂直に載置した板状被メッキ物を移送
しながらメッキする装置において、レールに沿って縦設
した陰極棒に板状被メッキ物に接触して電流を流す給電
ローラを設け、この給電ローラの表面は対象メッキ皮膜
よりも硬い皮膜材料をもって形成し、かつ、該給電ロー
ラの表面に付着するメッキ層を剥離するための手段を給
電ローラの接触面に当接してなることを特徴とする連続
メッキ装置における電極装置である。
SUMMARY OF THE INVENTION The present invention relates to an apparatus for plating while transferring a plate-like object to be plated vertically mounted on a rail provided in a plating tank. A power supply roller is provided for flowing current in contact with the plate-like material to be plated.The surface of the power supply roller is formed of a film material that is harder than the target plating film, and the plating layer adhering to the surface of the power supply roller is peeled off. Means for contacting the contact surface of the power supply roller with the means for performing the operation.

【0007】上記の対象メッキ皮膜よりも硬い皮膜材料
は例えば硫酸銅メッキのときはニッケルメッキ膜、無電
解皮膜よりも固いリンニッケルメッキなどが良い。さら
には窒化チタン皮膜を用いることもできる。給電ローラ
の表面に付着するメッキ層を剥離するための手段として
は、ブラシ、ナイフエッジ、超硬エンプラエッジなどが
ある。エッジの場合、ローラに45°の角度で当てて不
要メッキ膜を除去する。
As the coating material harder than the target plating film, for example, a nickel plating film in the case of copper sulfate plating, a phosphor nickel plating harder than the electroless film, and the like are preferable. Further, a titanium nitride film can be used. Means for peeling off the plating layer adhering to the surface of the power supply roller include a brush, a knife edge, and a carbide engineering plastic edge. In the case of an edge, the unnecessary plating film is removed by rubbing the roller at an angle of 45 °.

【0008】[0008]

【発明の実施の形態】以下、図面に基づいて本発明の実
施例を説明する。図1はその一例で、陰極棒6に付設し
た給電ローラ7の被メッキ物との接触面は対象メッキ皮
膜例えば銅皮膜よりも硬い皮膜材料例えばニッケルメッ
キさらにその上に窒化チタンよりなる保護皮膜8を形成
する。9はブラシで給電ローラ7の接触面の適宜の位置
において、ばね10をもって押圧されている。そして給
電ローラ7の回動に伴って、その接触面に生成するメッ
キ付着物を取除く。給電ローラ7の接触面には、メッキ
層よりも硬い保護皮膜8が形成されているので、保護皮
膜8を破壊することなく、容易に付着メッキ層を除去す
ることができる。ブラシ9の取付位置は給電ローラ7が
回動して、被メッキ物3に接触する直前の箇所であると
なお良い。又、ブラシ以外にもブレードその他適宜の除
去手段を採用することができる。
Embodiments of the present invention will be described below with reference to the drawings. FIG. 1 shows an example, in which a contact surface of a power supply roller 7 attached to a cathode bar 6 with an object to be plated has a coating material harder than a target plating film such as a copper film, for example, nickel plating, and a protective film 8 made of titanium nitride thereon. To form A brush 9 is pressed by a spring 10 at an appropriate position on the contact surface of the power supply roller 7. Then, with the rotation of the power supply roller 7, the plating deposits generated on the contact surface are removed. Since the protective film 8 which is harder than the plating layer is formed on the contact surface of the power supply roller 7, the adhered plating layer can be easily removed without breaking the protective film 8. It is more preferable that the mounting position of the brush 9 is a position immediately before the power supply roller 7 rotates and comes into contact with the object 3 to be plated. In addition to the brush, a blade or other appropriate removing means can be employed.

【0009】[0009]

【発明の効果】本発明によれば、被メッキ物を縦送りし
て連続メッキをする装置において、陰極の給電ローラの
被メッキ物の接触面に保護皮膜を設けることにより、付
着するメッキ膜を除去手段によって容易に取除くことが
でき、被メッキ物表面に形成されるメッキ層が、給電ロ
ーラに付着したメッキ膜によって破壊するようなことが
なく、均一なメッキ膜を形成することができる。
According to the present invention, in an apparatus for continuously feeding an object to be plated in a longitudinal direction, by providing a protective film on a contact surface of the cathode power supply roller with the object to be plated, the adhered plating film is reduced. The plating means can be easily removed by the removing means, and the plating layer formed on the surface of the object to be plated is not broken by the plating film attached to the power supply roller, so that a uniform plating film can be formed.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明の実施例の説明図である。FIG. 1 is an explanatory diagram of an embodiment of the present invention.

【図2】縦送り式の連続メッキ装置の説明図である。FIG. 2 is an explanatory view of a vertical feeding type continuous plating apparatus.

【符号の説明】[Explanation of symbols]

2 レール 3 被メッキ物 6 陰極棒 7 給電ローラ 8 保護皮膜 9 ブラシ 10 ばね 2 Rail 3 Plated object 6 Cathode bar 7 Power supply roller 8 Protective film 9 Brush 10 Spring

───────────────────────────────────────────────────── フロントページの続き (56)参考文献 特開 平10−273799(JP,A) 特開 平4−346693(JP,A) 特開 昭63−199892(JP,A) 特開 平10−29141(JP,A) 特開 平3−104898(JP,A) 実開 平4−78272(JP,U) (58)調査した分野(Int.Cl.6,DB名) C25D 7/06,7/00 C25D 17/06,17/10 ──────────────────────────────────────────────────続 き Continuation of the front page (56) References JP-A-10-273799 (JP, A) JP-A-4-346693 (JP, A) JP-A-63-199892 (JP, A) JP-A-10-1998 29141 (JP, A) JP-A-3-104898 (JP, A) JP-A-4-78272 (JP, U) (58) Fields investigated (Int. Cl. 6 , DB name) C25D 7/06, 7 / 00 C25D 17 / 06,17 / 10

Claims (1)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】 メッキ槽内に設けたレール上に垂直に載
置した板状被メッキ物を移送しながらメッキする装置に
おいて、レールに沿って縦設した陰極棒に板状被メッキ
物に接触して電流を流す給電ローラを設け、この給電ロ
ーラの表面は対象メッキ皮膜よりも硬い皮膜材料をもっ
て形成し、かつ、該給電ローラの表面に付着するメッキ
層を剥離するための手段を給電ローラの接触面に当接し
てなることを特徴とする連続メッキ装置における電極装
置。
An apparatus for plating while transferring a plate-like object vertically placed on a rail provided in a plating tank, wherein the plate-like object is brought into contact with a cathode rod vertically provided along the rail. A power supply roller is provided for flowing current, and the surface of the power supply roller is formed of a coating material harder than the target plating film, and means for removing the plating layer adhering to the surface of the power supply roller is provided by the power supply roller. An electrode device in a continuous plating apparatus, which is in contact with a contact surface.
JP17142298A 1998-06-11 1998-06-18 Electrode equipment in continuous plating equipment Expired - Fee Related JP2971448B1 (en)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP17142298A JP2971448B1 (en) 1998-06-18 1998-06-18 Electrode equipment in continuous plating equipment
TW087119936A TW438906B (en) 1998-06-11 1998-12-02 Continuous plating apparatus
KR1019980054160A KR100302666B1 (en) 1998-06-11 1998-12-10 Continuous Plating Equipment
US09/209,361 US6174418B1 (en) 1998-06-11 1998-12-11 Continuous plating apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP17142298A JP2971448B1 (en) 1998-06-18 1998-06-18 Electrode equipment in continuous plating equipment

Publications (2)

Publication Number Publication Date
JP2971448B1 true JP2971448B1 (en) 1999-11-08
JP2000001795A JP2000001795A (en) 2000-01-07

Family

ID=15922847

Family Applications (1)

Application Number Title Priority Date Filing Date
JP17142298A Expired - Fee Related JP2971448B1 (en) 1998-06-11 1998-06-18 Electrode equipment in continuous plating equipment

Country Status (1)

Country Link
JP (1) JP2971448B1 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR102191590B1 (en) * 2019-10-04 2021-01-15 유화경 Electrode Apparatus For Plating

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR102191590B1 (en) * 2019-10-04 2021-01-15 유화경 Electrode Apparatus For Plating

Also Published As

Publication number Publication date
JP2000001795A (en) 2000-01-07

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