JP2895570B2 - Electrical connection member and electric circuit member - Google Patents
Electrical connection member and electric circuit memberInfo
- Publication number
- JP2895570B2 JP2895570B2 JP2121496A JP12149690A JP2895570B2 JP 2895570 B2 JP2895570 B2 JP 2895570B2 JP 2121496 A JP2121496 A JP 2121496A JP 12149690 A JP12149690 A JP 12149690A JP 2895570 B2 JP2895570 B2 JP 2895570B2
- Authority
- JP
- Japan
- Prior art keywords
- electric circuit
- adhesive layer
- conductive adhesive
- conductive
- exposed
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/80—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
- H01L2224/81—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a bump connector
- H01L2224/811—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a bump connector the bump connector being supplied to the parts to be connected in the bonding apparatus
- H01L2224/81101—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a bump connector the bump connector being supplied to the parts to be connected in the bonding apparatus as prepeg comprising a bump connector, e.g. provided in an insulating plate member
Landscapes
- Multi-Conductor Connections (AREA)
- Connections Effected By Soldering, Adhesion, Or Permanent Deformation (AREA)
- Coupling Device And Connection With Printed Circuit (AREA)
- Structures For Mounting Electric Components On Printed Circuit Boards (AREA)
- Combinations Of Printed Boards (AREA)
- Wire Bonding (AREA)
Description
【発明の詳細な説明】 [産業上の利用分野] 本発明は電気的接続部材および電気回路部材に関し、
特に電気的接続部材および電気回路部品が電気的接続部
材を介して基体に接続されてなる電気回路部材に関す
る。The present invention relates to an electric connection member and an electric circuit member,
In particular, the present invention relates to an electric circuit member in which an electric connection member and an electric circuit component are connected to a base via the electric connection member.
[背景の技術] 従来は框体、回路基板等の基体と電気回路部品との接
続はコネクター方法、圧着端子方法、はんだ付け方法、
ワイヤボンディング方法、TAB(テイプ オウトメイテ
エド ボンディング:Tape Automated Bonding)方法、C
CB(コントロールド コラァプスド ボンディング:Con
trolled collapsed Bonding)方法、異方性導電膜を用
いる方法等が公知である。ところが、これらの方法にお
いては、隣接する接続部同士が接触しないようにする為
の最小ピッチが比較的大きい為、接続部同士のピッチに
小さいものが要求される場合には対応できないという問
題があった。更に、このような方法では配線が長くなる
為に抵抗値の増大、浮遊容量の増大を招くために電気的
特性上問題があった。特に高周波電気回路では顕著であ
った。[Background Art] Conventionally, connection between a base such as a frame body and a circuit board and an electric circuit component is performed by a connector method, a crimp terminal method, a soldering method,
Wire bonding method, TAB (Tape Automated Bonding) method, C
CB (Controlled collapsed bonding: Con
Methods such as a controlled collapsed bonding method and a method using an anisotropic conductive film are known. However, these methods have a problem that the minimum pitch for preventing adjacent connecting portions from contacting each other is relatively large, so that it is impossible to cope with a case where a small pitch between connecting portions is required. Was. Further, such a method has a problem in terms of electrical characteristics because the length of the wiring is increased and the resistance value is increased, and the stray capacitance is increased. This was particularly noticeable in high-frequency electric circuits.
このような問題点を解決すべく、絶縁保持体中に複数
の導電部材を相互に絶縁して保持させた構成をなす電気
的接続部材、又は絶縁保持体の内部及び/又は保持体面
上で配線されており、接続導電部材の両端が前記保持体
の両面に保持体の面と同一もしくは突出して露出してい
る構成をなす電気的接続部材を用いて電気回路部品同士
を電気的に接続する方法が提案されている(特開昭63−
222437号公報、特開昭63−224235号公報等)。In order to solve such a problem, an electric connection member having a configuration in which a plurality of conductive members are mutually insulated and held in an insulating holder, or wiring is provided inside the insulating holder and / or on the surface of the holder. A method of electrically connecting electric circuit components to each other using an electric connection member having a configuration in which both ends of a connecting conductive member are exposed on both surfaces of the holding member so as to be the same as or protrude from the surface of the holding member. (Japanese Patent Laid-Open No. 63-63)
222437, JP-A-63-224235, etc.).
第6図(a),(b)は、このような1つの電気的接
続部材を用いた電気回路部品間の電気的接続を示す模式
図であり、図中1は電気的接続部材、2,3は接続すべき
電気回路部品を示す。電気的接続部材1は、金属又は合
金からなる複数の棒状の導電部材4を、各々の導電部材
4同士を電気的に絶縁して、電気的絶縁材料からなる薄
板上の保持体5中に保持した構成をなし、導電部材4の
両端を各々バンプ8及び9として電気回路部品2及び3
側に突出してある(第6図(a)参照)。FIGS. 6 (a) and 6 (b) are schematic diagrams showing electrical connections between electric circuit components using such one electrical connection member, wherein 1 is an electrical connection member, Reference numeral 3 denotes an electric circuit component to be connected. The electrical connection member 1 holds a plurality of rod-shaped conductive members 4 made of a metal or an alloy in a holding body 5 on a thin plate made of an electrically insulating material by electrically insulating the conductive members 4 from each other. The electrical circuit components 2 and 3 are formed by setting both ends of the conductive member 4 as bumps 8 and 9, respectively.
Side (see FIG. 6 (a)).
そして、一方の電気回路部品2の接続部6と導電部材
4のバンプ8とを、また、他方の電気回路部品3の接続
部7と導電部材4のバンプ9とを各々例えば熱圧着、超
音波加熱法等によって金属化および/又は合金化する事
により接続し、電気回路部品2,3同士を電気的に接続す
る(第6図(b)参照)。Then, the connection portion 6 of the one electric circuit component 2 and the bump 8 of the conductive member 4 and the connection portion 7 of the other electric circuit component 3 and the bump 9 of the conductive member 4 are each bonded by, for example, thermocompression bonding or ultrasonic wave. The electrical circuit components 2 and 3 are electrically connected by metallization and / or alloying by a heating method or the like (see FIG. 6 (b)).
ところで上記電気的接続部材1を製造する方法とし
て、第7図(a)〜(e)に示す方法が提案されてい
る。この方法は、まず、導電材製の銅箔10上に前記保持
体5となる感光性樹脂11を塗布する(第7図(a)参
照)。次に、後工程で前記導電部材4を埋設する所定の
位置を露光、現像することにより、感光性樹脂11に穴12
を形成して銅箔10を露出させる。次いで、温度を上げて
感光性樹脂11を硬化させる(第7図(b)参照)。そし
て穴12内の近傍の銅箔10のエッチングを行ない穴12の下
部に凹部13を形成する(第7図(c)参照)。By the way, as a method of manufacturing the electrical connection member 1, a method shown in FIGS. 7A to 7E has been proposed. In this method, first, a photosensitive resin 11 serving as the holder 5 is applied on a copper foil 10 made of a conductive material (see FIG. 7A). Next, by exposing and developing a predetermined position for embedding the conductive member 4 in a later step, a hole 12 is formed in the photosensitive resin 11.
Is formed to expose the copper foil 10. Next, the temperature is increased to cure the photosensitive resin 11 (see FIG. 7B). Then, the copper foil 10 in the vicinity of the hole 12 is etched to form a recess 13 below the hole 12 (see FIG. 7C).
その後、銅箔10に対する金等のめっき処理を行なう事
により、凹部13及び穴12内に導電部材4を充填してい
き、凹部13内に前記バンプ9を形成し、また感光性樹脂
11の上面にバンプ8を形成する(第7図(d)参照)。Thereafter, the conductive member 4 is filled in the recesses 13 and the holes 12 by plating the copper foil 10 with gold or the like, and the bumps 9 are formed in the recesses 13.
The bumps 8 are formed on the upper surface of the substrate 11 (see FIG. 7D).
その後、銅箔10を金属エッチングによって除去する事
により、前記電気的接続部材1が完成する(第7図
(e)参照)。Thereafter, the electrical connection member 1 is completed by removing the copper foil 10 by metal etching (see FIG. 7 (e)).
[発明が解決しようとする課題] しかしながら、上記の第6図に示す様な熱圧着、超音
波加熱法等によって金属化および/又は合金化する事に
より、電気回路部品の接続部と導電部材のバンプとを接
続する方法では、接続時に電気回路部品が熱に曝される
ため低耐熱性のものでは接続できないという問題があ
る。[Problems to be Solved by the Invention] However, metallization and / or alloying by thermocompression bonding, ultrasonic heating, or the like as shown in FIG. The method of connecting the bumps has a problem that the electric circuit components are exposed to heat during the connection, so that connection cannot be made with a material having low heat resistance.
ところで、高温加熱によらず比較的低温の接着により
電気的接続を図る方法が既に公知になっている(特開昭
63−151031号公報)。この方法は紫外線硬化樹脂が塗布
された回路基板の電極とバンプ付き半導体素子の電極と
を位置決め、圧着し、紫外線を照射して樹脂の硬化収縮
を利用することにより電気的接続を行なうが、この方法
では樹脂の配合が難しく、所望の樹脂を得るのに技術的
な課題が多い。By the way, a method of making electrical connection by bonding at a relatively low temperature without heating at a high temperature has already been known (Japanese Patent Application Laid-Open No.
No. 63-151031). In this method, the electrodes of the circuit board coated with the ultraviolet curable resin and the electrodes of the semiconductor element with bumps are positioned and pressed, and the electrical connection is made by irradiating ultraviolet rays and utilizing the curing shrinkage of the resin. In the method, it is difficult to mix the resin, and there are many technical problems to obtain a desired resin.
また、接続部に樹脂が含有され易いために接続抵抗値
が大きくなったり、熱膨張係数の差が大きくなるために
品質上の問題が生じたりする。In addition, the connection portion is likely to contain the resin, so that the connection resistance value is increased, and the difference in thermal expansion coefficient is increased, thereby causing a quality problem.
さらに、隣接する接続部間に樹脂が存在するため熱膨
張係数の差が大きいために、剥れが生じたり、クラック
が生じ易すかったりする等の品質上の問題が生じたりす
る。Further, since there is a resin between adjacent connection portions, a difference in thermal expansion coefficient is large, so that quality problems such as peeling and cracks are likely to occur.
本発明は、かかる事情に鑑みてなされたものであり、
接続部に比較的容易な方法で形成された導電性接着層を
有する電気的接続部材を用いることにより、低温で容易
に電気回路部品同士を接続することが可能な電気的接続
部材および電気回路部材を提供することを目的とする。The present invention has been made in view of such circumstances,
An electric connection member and an electric circuit member that can easily connect electric circuit components at a low temperature by using an electric connection member having a conductive adhesive layer formed by a relatively easy method at a connection portion. The purpose is to provide.
[課題を解決するための手段] 即ち、本発明は、電気的絶縁材からなる保持体と、該
保持体に相互に絶縁状態に装備され露出した複数の導電
部材とを有し、該露出した保持体の両方の面の導電部材
上に、超微粒金属粉体又は金属化されたセラミック粉体
の一方又は両方を含有する接着性樹脂溶液から電気泳動
法によって共析形成された導電性接着層を有し、該導電
性接着層が前記保持体の面と同一かもしくは突出して露
出していることを特徴とする電気的接続部材である。[Means for Solving the Problems] That is, the present invention includes a holder made of an electrically insulating material, and a plurality of conductive members which are mounted on the holder in a mutually insulated state and are exposed. A conductive adhesive layer formed on the conductive members on both surfaces of the holder by electrophoresis from an adhesive resin solution containing one or both of ultrafine metal powder or metalized ceramic powder by electrophoresis. Wherein the conductive adhesive layer is the same as or protrudes from the surface of the holder and is exposed.
また、本発明は、電気的絶縁材からなる保持体と、該
保持体に相互に絶縁状態に装備され露出した複数の導電
部材とを有し、該露出した保持体の両方の面の導電部材
上に超微粒金属粉体又は金属化されたセラミック粉体の
一方又は両方を含有する接着性樹脂溶液から電気泳動法
によって共析形成された導電性接着層を有し、該導電性
接着層が前記保持体の面と同一かもしくは突出している
電気的接続部材と、 少なくとも1以上の接続部を有し、該接続部において
前記電気的接続部材の保持体の一方の面において露出し
ている導電性接着層のうちの少なくとも1つの一端が接
着により電気的に接続されている少なくとも1以上の電
気回路部品と、 少なくとも1以上の接続部を有し、該接続部において
前記電気的接続部材の保持体の他方の面において露出し
ている導電性接着層のうちの少なくとも1つの一端が接
着により電気的に接続されている少なくとも1以上の電
気回路部品と を有することを特徴とする電気回路部材である。Further, the present invention has a holding member made of an electrically insulating material, and a plurality of exposed conductive members provided in the holding member in a mutually insulated state, and a conductive member on both surfaces of the exposed holding member. A conductive adhesive layer formed on the top by an electrophoretic method from an adhesive resin solution containing one or both of ultrafine metal powder or metallized ceramic powder, and the conductive adhesive layer is An electrical connection member that is the same as or protrudes from the surface of the holding member; and at least one or more connection portions, wherein the conductive portion is exposed on one surface of the holding member of the electrical connection member at the connection portion. At least one end of at least one of the conductive adhesive layers is electrically connected by bonding, and at least one or more connection parts, and the connection part holds the electric connection member. On the other side of the body At least one end of the conductive adhesive layer exposed by There are an electric circuit member, characterized in that it comprises at least one or more electrical circuit components are electrically connected by bonding.
以下、本発明を詳細に説明する。 Hereinafter, the present invention will be described in detail.
本発明の電気的接続部材は、電気的絶縁材からなる保
持体と、該保持体に相互に絶縁状態に装備され露出した
複数の導電部材とを有する電気的接続部材からなり、前
記露出した保持体の両方の面の導電部材上に、超微粒金
属粉体又は金属化されたセラミック粉体の一方又は両方
を含有する接着性樹脂溶液から電気泳動法によって共析
形成された導電性接着層を有し、前記導電性接着層が前
記保持体の面と同一かもしくは突出して露出した構成か
らなるものである。The electrical connection member according to the present invention includes an electrical connection member having a holder made of an electrically insulating material, and a plurality of conductive members that are mounted on the holder in a mutually insulated state and are exposed. On the conductive members on both sides of the body, a conductive adhesive layer formed by codeposition from an adhesive resin solution containing one or both of ultrafine metal powder or metalized ceramic powder by electrophoresis. And the conductive adhesive layer is configured to be the same as or protrude from the surface of the holder and exposed.
この導電性接着層は通常固体状であるが、本発明はこ
れに限定されず、例えば加熱されてゲル状或いはゾル状
になったものなどを用いる場合も含む。This conductive adhesive layer is usually in a solid state, but the present invention is not limited to this. For example, a case in which a layer which is heated to a gel state or a sol state is used.
また、電気的接続部材の導電部材に形成される導電性
接着層に含有される超微粒金属粉体の平均粒径は0.01〜
2μm、および金属化されたセラミック粉体の平均粒径
は0.1〜5μmの範囲が望ましい。また、導電性接着層
に含有される超微粒金属粉体又は金属化されたセラミッ
ク粉体の一方又は両方の含有量は30〜80wt%の範囲が望
ましい。The average particle size of the ultrafine metal powder contained in the conductive adhesive layer formed on the conductive member of the electrical connection member is 0.01 to
The average particle size of 2 μm and the metalized ceramic powder is preferably in the range of 0.1 to 5 μm. The content of one or both of the ultrafine metal powder and the metalized ceramic powder contained in the conductive adhesive layer is preferably in the range of 30 to 80 wt%.
次に、本発明の電気回路部材は、上記の電気的接続部
材と、少なくとも1以上の接続部を有し、該接続部にお
いて前記電気的接続部材の保持体の一方の面において露
出している導電性接着層のうちの少なくとも1つの一端
が接着により電気的に接続されている少なくとも1以上
の電気回路部品と、少なくとも1以上の接続部を有し、
該接続部において前記電気的接続部材の保持体の他方の
面において露出している導電性接着層のうち少なくとも
1つの一端が接着により電気的に接続されている少なく
とも1以上の電気回路部品とを有するものである。Next, an electric circuit member of the present invention has the above-described electric connection member and at least one or more connection portions, and the connection portion is exposed on one surface of a holder of the electric connection member. At least one end of at least one of the conductive adhesive layers has at least one or more electric circuit components electrically connected by bonding, and at least one or more connection parts,
At least one end of at least one of the conductive adhesive layers exposed on the other surface of the holder of the electrical connection member at the connection portion is connected to at least one or more electric circuit components electrically connected by bonding. Have
すなわち、上記の電気的接続部材を用いて、一方の電
気回路部品の接続部と電気的接続部材の導電性接着層と
を接着により電気的に接続し、他方の電気回路部品の接
続部と電気的接続部材の導電性接着層とを接着により電
気的に接続してなる電気回路部材である。That is, using the above-mentioned electric connection member, the connection portion of one electric circuit component and the conductive adhesive layer of the electric connection member are electrically connected by bonding, and the connection portion of the other electric circuit component is electrically connected to the connection portion of the other electric circuit component. This is an electric circuit member formed by electrically connecting the conductive connection layer of the electrical connection member to the conductive adhesive layer by adhesion.
この本発明の電気回路部材は、低耐熱性の電気回路部
品を比較的低温の接着により接続することができるの
で、接続が容易であるとともに、電気回路部品の選択の
範囲が広がり応用範囲が広くなる。Since the electric circuit member of the present invention can connect low-heat-resistant electric circuit components by bonding at a relatively low temperature, the connection is easy, and the selection range of the electric circuit components is widened and the application range is wide. Become.
また接続部のみを接続するので熱膨張係数の相違によ
る品質上の問題が回避できるので、品質特性の良い電気
回路部材が得られる。In addition, since only the connection portion is connected, a quality problem due to a difference in thermal expansion coefficient can be avoided, and an electric circuit member having good quality characteristics can be obtained.
さらに、本発明の電気回路部材は、電気回路部品の接
続部が、超微粒金属粉体又は金属化されたセラミック粉
体の一方又は両方を含有した接着性樹脂溶液から電気泳
動法によって共析形成された導電性接着層を有する接続
部を少なくとも1個以上有し、該接続部において、電気
的接続部材の保持体の一方の面において露出している導
電性接着層を有する導電部材のうちの少なくとも1つの
一端が接着により電気的に接続されていることが好まし
い。Further, in the electric circuit member according to the present invention, the connection portion of the electric circuit component is formed by an electrophoretic method from an adhesive resin solution containing one or both of ultrafine metal powder or metalized ceramic powder. Of the conductive member having the conductive adhesive layer exposed at one surface of the holder of the electrical connection member, at least one connection portion having the conductive adhesive layer formed. Preferably, at least one end is electrically connected by bonding.
また、電気回路部材の少なくとも1以上の電気回路部
品の接続部を有する面とは反対の面の少なくとも一部分
の金属表面上に、超微粒金属粉体又は金属化されたセラ
ミック粉体の一方又は両方を含有する接着性樹脂溶液か
ら電気泳動法によって共析形成された導電性接着層を設
けることにより、静電シールド性の優れた電気回路部材
を得ることが可能となる。Further, at least one of the ultrafine metal powder and the metalized ceramic powder is provided on at least a part of the metal surface opposite to the surface having the connection portion of at least one or more electric circuit components of the electric circuit member. By providing a conductive adhesive layer formed by codeposition from an adhesive resin solution containing the same, an electric circuit member having excellent electrostatic shielding properties can be obtained.
また、本発明の電気回路部材に用いられる電気回路部
品としては、例えば框体、樹脂回路基板、金属回路基
板、セラミック回路基板、リードフレーム、半導体素子
等の電気回路部品であることが好ましい。The electric circuit components used in the electric circuit member of the present invention are preferably, for example, electric circuit components such as a frame, a resin circuit board, a metal circuit board, a ceramic circuit board, a lead frame, and a semiconductor element.
[実施例] 以下、実施例を示し本発明をさらに具体的に説明す
る。[Example] Hereinafter, the present invention will be described more specifically with reference to examples.
実施例1 第1図(a),(b)は本発明の電気回路部材の一実
施例を示す模式図である。同図は、電気回路部品間に、
両方の面に導電性接着層を有する電気的接続部材を介し
て電気的接続をしている状態を示し、第1図(a)は接
続前の状態を示し、第1図(b)は接続後の状態を示
す。図中、1は電気的接続部材、3は電気回路部品(回
路基板)、2は電気回路部品(半導体素子)を示す。Embodiment 1 FIGS. 1 (a) and 1 (b) are schematic views showing an embodiment of an electric circuit member of the present invention. The figure shows the
FIG. 1 (a) shows a state before the connection, and FIG. 1 (b) shows a state before the connection, through an electric connection member having a conductive adhesive layer on both surfaces. Show the later state. In the drawing, reference numeral 1 denotes an electric connection member, 3 denotes an electric circuit component (circuit board), and 2 denotes an electric circuit component (semiconductor element).
ここで第2図(a)〜(g)に基づき電気的接続部材
の製造方法を説明する。Here, a method for manufacturing the electrical connection member will be described with reference to FIGS. 2 (a) to 2 (g).
第2図(a)〜(c)までは、従来の電気的接続部材
の製造方法と同じ工程をとる。2 (a) to 2 (c), the same steps as those of the conventional method for manufacturing an electrical connection member are performed.
すなわち、まず、基体たる銅板10aを準備し、銅板10a
上に接着補助剤をスピンナを用いて塗布後、感光性樹脂
であるネガ型のポリイミド樹脂11aをスピンナを用いて
塗布した後、プリベイクを行う(第2図(a)参照)。
ここで、溶剤の飛散と樹脂自身の硬化とに伴う膜厚の減
少を考慮して、塗布するポリイミド樹脂11aの膜厚は、
製造される保持体の所望の膜厚よりも厚くしておく。That is, first, a copper plate 10a as a base is prepared, and the copper plate 10a
After applying an adhesion aid using a spinner, a negative polyimide resin 11a, which is a photosensitive resin, is applied using a spinner and then prebaked (see FIG. 2 (a)).
Here, the thickness of the polyimide resin 11a to be applied is considered in consideration of the decrease in the thickness due to the scattering of the solvent and the curing of the resin itself,
It is made thicker than the desired film thickness of the holder to be manufactured.
次いで、所定パターンを有するフォトマスク(図示せ
ず)を介して光をポリイミド樹脂11aに照射した(露光
した)後、現像を行う。この際、照射する光のエネルギ
ー密度は100〜10,000mJ/cm2に設定し、現像時間は4〜3
0分とする。本実施例では、露光された部分にはポリイ
ミド樹脂11aが残存し、露光されない部分は現像処理に
よりポリイミド樹脂11aが除去されて、直径10〜20μm
程度の穴12が形成される。その後、温度を上げてポリイ
ミド樹脂11aの硬化を行う(第2図(b)参照)。Next, the polyimide resin 11a is irradiated (exposed) with light through a photomask (not shown) having a predetermined pattern, and then developed. At this time, the energy density of the irradiated light is set to 100 to 10,000 mJ / cm 2 , and the developing time is set to 4 to 3 mJ / cm 2.
0 minutes. In the present embodiment, the polyimide resin 11a remains in the exposed part, and the polyimide resin 11a is removed by a development process in the unexposed part, and the diameter is 10 to 20 μm.
About 12 holes 12 are formed. Thereafter, the temperature is raised to cure the polyimide resin 11a (see FIG. 2 (b)).
ところで、適正な露光条件および現像条件に設定した
場合においても、穴12の銅板10aの表面にポリイミド樹
脂11aの残渣(図示していない)が残る場合がある。こ
のような場合には、乾式エッチングを施して、銅板10a
を完全に露出させる。乾式エッチングとしては、例えば
O2プラズマエッチングを採用でき、この際のエッチング
条件の一例を示すと次のようである。By the way, even when proper exposure conditions and development conditions are set, a residue (not shown) of the polyimide resin 11a may remain on the surface of the copper plate 10a in the hole 12. In such a case, dry etching is applied to the copper plate 10a.
Completely exposed. As dry etching, for example,
O 2 plasma etching can be adopted, and an example of the etching conditions at this time is as follows.
高周波電力:200〜400W,O2流量:200SCCM 圧力:1Torr,エッチング時間:5〜10分 次に、このような処理がなされた銅板10aをエッチン
グ液中に浸漬させてエッチングを行う。穴12の近傍の銅
板10aの一部がエッチングされて除去され、穴12に連通
する凹部13が銅板10aに形成される(第2図(c)参
照)。High-frequency power: 200 to 400 W, O 2 flow rate: 200 SCCM Pressure: 1 Torr, etching time: 5 to 10 minutes Next, the copper plate 10a thus treated is immersed in an etching solution to perform etching. A part of the copper plate 10a near the hole 12 is removed by etching, and a concave portion 13 communicating with the hole 12 is formed in the copper plate 10a (see FIG. 2 (c)).
次に、銅板10aを共通電極として導電性接着層14を設
ける。導電性接着層14の膜厚はポリイミド樹脂に埋設さ
れない程度に薄く形成する。導電性接着層14を形成する
工程を下記に示す。Next, the conductive adhesive layer 14 is provided using the copper plate 10a as a common electrode. The thickness of the conductive adhesive layer 14 is so small that it is not embedded in the polyimide resin. The step of forming the conductive adhesive layer 14 will be described below.
ポリエステル系樹脂(商品名FINETEX ES525、大日本
インキ化学社製)60重量部とポリエステル系樹脂(商品
名FINETEX 525、大日本インキ化学社製)40重量部、さ
らに架橋剤(商品名PERMASTAT R−5、大日本インキ化
学社製)5重量部、触媒(商品名Cat PA−20、大日本イ
ンキ化学社製)2.5重量部の割合で混合し、さらに平均
粒径0.02μmの銅粉体30重量部と平均粒径1μmのアル
ミナの表面にニッケルめっきを0.2μmの厚さに施した
粉体20重量部を混合し、ボールミルにて30時間分散した
後、脱塩水にて15wt%に希釈し、25℃、pH8.5の条件で
基材を陽極とし、対極にステンレス板を用いて、印加電
圧100V、処理時間1〜2分の電着処理を行った。その
後、50℃、10分間加熱して導電性接着層14を形成した
(第2図(d)参照)。60 parts by weight of a polyester resin (trade name: FINETEX ES525, manufactured by Dainippon Ink and Chemicals), 40 parts by weight of a polyester resin (trade name: FINETEX 525, manufactured by Dainippon Ink and Chemicals), and a crosslinking agent (trade name: PERMASTAT R-5) 5 parts by weight, manufactured by Dainippon Ink and Chemicals, 2.5 parts by weight of a catalyst (trade name: Cat PA-20, manufactured by Dainippon Ink and Chemicals, Inc.), and further 30 parts by weight of copper powder having an average particle size of 0.02 μm And 20 parts by weight of a powder obtained by applying nickel plating on the surface of alumina having an average particle diameter of 1 μm to a thickness of 0.2 μm, dispersing the mixture in a ball mill for 30 hours, diluting the mixture with demineralized water to 15 wt%, Electrodeposition treatment was performed at an applied voltage of 100 V and a treatment time of 1 to 2 minutes using a substrate as an anode and a counter electrode as a counter electrode under conditions of ° C. and pH 8.5. Thereafter, the conductive adhesive layer 14 was formed by heating at 50 ° C. for 10 minutes (see FIG. 2D).
次に、銅板10aを共通電極として用いた金メッキによ
り、凹部13,穴12に導電材料たる金4aをポリイミド樹脂1
1aの面より凸にして埋設する(第2図(e)参照)。Next, gold 4a, which is a conductive material, was applied to the polyimide resin 1 in the recesses 13 and holes 12 by gold plating using the copper plate 10a as a common electrode.
It is embedded so as to protrude from the surface 1a (see FIG. 2 (e)).
次に、銅板10aを共通電極として上記と同様の方法に
より、金4aの上に導電性接着層14を形成した(第2図
(f)参照)。導電性接着層14の厚さは1〜100μmが
好ましい。Next, a conductive adhesive layer 14 was formed on the gold 4a in the same manner as described above using the copper plate 10a as a common electrode (see FIG. 2 (f)). The thickness of the conductive adhesive layer 14 is preferably 1 to 100 μm.
最後に、銅は除去するが金4aおよび導電性接着層14は
除去しないようなエッチャントを用いた金属エッチング
により、銅板10aを除去して、第2図(g)に示すよう
な電気的接続部材1を製造した。Finally, the copper plate 10a is removed by metal etching using an etchant that removes copper but does not remove the gold 4a and the conductive adhesive layer 14, and the electrical connection member as shown in FIG. 2 (g). 1 was produced.
本実施例においては、電気的接続部材1における導電
部材は金4aおよび導電性接着層14であり、保持体はポリ
イミド樹脂11aである。In this embodiment, the conductive members of the electrical connection member 1 are gold 4a and the conductive adhesive layer 14, and the holder is a polyimide resin 11a.
乾式エッチングとしては、上述したようなO2プラズマ
エッチングの他に、電子サイクロトロン共鳴(ERC)プ
ラズマエッチング、またはエキシマレーザ光の照射によ
るレーザエッチングなどを採用してもよい。As the dry etching, electron cyclotron resonance (ERC) plasma etching, laser etching by irradiation of excimer laser light, or the like may be employed in addition to the above-described O 2 plasma etching.
また、上記の例では、金めっきはポリイミド樹脂11a
の面より凸になる様に、導電性接着層14の形成条件と金
めっき条件を決定したが、金めっきがポリイミド樹脂11
aの面より凹になるようにしてもよい。In the above example, the gold plating is a polyimide resin 11a.
The conditions for forming the conductive adhesive layer 14 and the gold plating conditions were determined so as to be more convex than the surface of the polyimide resin 11.
You may make it concave rather than the surface of a.
なお、本実施例では金めっきにより金(導電部材)を
充填する例を示したが、他の方法、例えば蒸着によって
行ってもよい。Note that, in this embodiment, an example in which gold (conductive member) is filled by gold plating has been described, but another method, for example, vapor deposition may be used.
実施例では、導電部材の材料として金を使用したが、
実施例で用いられた金(Au)の他に、Cu,Ag,Be,Ca,Mg,M
o,Ni,W,Fe,Ti,In,Ta,Zn,Al,Sn,Pb−Sn等の金属または合
金等も使用できる。導電部材は、一種の金属及び合金か
ら形成されていてもよいし、数種類の金属及び合金を混
合して形成されていてもよい。また、金属材料に有機材
料または無機材料の一方あるいは両方を含有せしめた材
料でもよい。なお導電部材の断面形状は、円形,四角形
その他の形状とすることができるが、応力の過度の集中
を避けるためには角がない形状が望ましい。また、導電
部材は保持体中に垂直に配置する必要はなく、保持体の
一方の面側から保持体の他方の面側に斜行していてもよ
い。In the example, gold was used as the material of the conductive member,
In addition to gold (Au) used in the examples, Cu, Ag, Be, Ca, Mg, M
Metals or alloys such as o, Ni, W, Fe, Ti, In, Ta, Zn, Al, Sn, and Pb-Sn can also be used. The conductive member may be formed from one kind of metal and alloy, or may be formed by mixing several kinds of metal and alloy. Further, a material in which one or both of an organic material and an inorganic material are contained in a metal material may be used. The cross-sectional shape of the conductive member can be circular, square, or any other shape, but it is desirable that the conductive member has no corners in order to avoid excessive concentration of stress. Further, the conductive member does not need to be arranged vertically in the holder, and may be inclined from one surface of the holder to the other surface of the holder.
感光性樹脂として、ポリイミド樹脂を用いたが特に限
定されることはない。感光性樹脂には他の公知の材料を
含有させてもよく、その含有させる材料、および添加方
法は公知の方法で良い。Although a polyimide resin was used as the photosensitive resin, it is not particularly limited. The photosensitive resin may contain other known materials, and the materials to be contained and the adding method may be known methods.
さらに、導電性接着層に用いる樹脂はポリエステル系
の他アクリル系,エポキシ系,ポリアミド系,アクリル
・メラミン系,ポリアクリル酸系等の樹脂をベースにし
てもよい。Further, the resin used for the conductive adhesive layer may be based on resin such as acrylic, epoxy, polyamide, acrylic / melamine, polyacrylic acid, etc. in addition to polyester.
超微粒金属粉体には、銅に限らずAu,Ag,Al,Be,Ca,Mg,
Mo,Fe,Ni,Co,Mn,W,Cr,Nb,Zr,Ti,Ta,Zn,Sn,Pb−Sn等が挙
げられる。Ultrafine metal powders are not limited to copper, but include Au, Ag, Al, Be, Ca, Mg,
Mo, Fe, Ni, Co, Mn, W, Cr, Nb, Zr, Ti, Ta, Zn, Sn, Pb-Sn and the like.
また、セラミック粉体は、SiO2,B2O3,Al2O3,Na2O,K
2O,CaO,ZnO,BaO,PbO,Sb2O3,As2O3,La2O3,ZrO2,P2O5,TiO
2,MgO,SiC,BeO,BP,BN,AlN,B4C,TaC,TiB2,CrB2,TiN,Si3N
4,Ta2O5等のセラミック,ダイヤモンド,ガラス,カー
ボン,ボロン等が挙げられる。In addition, the ceramic powder is SiO 2 , B 2 O 3 , Al 2 O 3 , Na 2 O, K
2 O, CaO, ZnO, BaO, PbO, Sb 2 O 3 , As 2 O 3 , La 2 O 3 , ZrO 2 , P 2 O 5 , TiO
2, MgO, SiC, BeO, BP, BN, AlN, B 4 C, TaC, TiB 2, CrB 2, TiN, Si 3 N
4 , ceramics such as Ta 2 O 5 , diamond, glass, carbon, boron and the like.
金属化されたセラミック粉体は、上記セラミックス粉
体上に金属材料を付着したものが用いられる。金属材料
を付着する方法はめっき等の湿式でもよいし、または蒸
着,スパッタリング等の乾式方法でもよい。As the metalized ceramic powder, a ceramic powder obtained by attaching a metal material to the above ceramic powder is used. The method for attaching the metal material may be a wet method such as plating or a dry method such as vapor deposition or sputtering.
また、電気的接続部材の導電部材に形成される導電性
接着層に含有される超微粒金属粉体の平均粒径は0.01〜
2μm、好ましくは0.05〜1.5μm、および金属化され
たセラミック粉体の平均粒径は0.1〜5μm、好ましく
は1.5〜4μmの範囲が望ましい。導電性接着層には、
超微粒金属粉体又は金属化されたセラミック粉体の一方
又は両方が含有されるが、その含有量は通常30〜80wt
%、好ましくは35〜45wt%の範囲が望ましい。The average particle size of the ultrafine metal powder contained in the conductive adhesive layer formed on the conductive member of the electrical connection member is 0.01 to
2 μm, preferably 0.05 to 1.5 μm, and the average particle size of the metallized ceramic powder is in the range of 0.1 to 5 μm, preferably 1.5 to 4 μm. In the conductive adhesive layer,
One or both of ultra-fine metal powder or metallized ceramic powder is contained, but the content is usually 30 to 80 wt.
%, Preferably in the range of 35 to 45% by weight.
超微粒金属粉体および金属化されたセラミック粉体の
両方が含有される場合には、超微粒金属粉体100重量部
に対して金属化されたセラミック粉体20〜80重量部の割
合に配合した混合粉体が好ましい。When both the ultrafine metal powder and the metallized ceramic powder are contained, the metallized ceramic powder is blended in a ratio of 20 to 80 parts by weight with respect to 100 parts by weight of the ultrafine metal powder. Mixed powders are preferred.
次に、本発明の電気的接続部材の製造方法の他の方法
を、第4図(a)〜(h)に示す工程図に基づいて説明
する。Next, another method for manufacturing the electrical connection member of the present invention will be described with reference to the process charts shown in FIGS. 4 (a) to 4 (h).
第4図(a),(b)は、第2図と同様の工程で行な
われる。次に、銅板10aを第2図の場合よりも薄く、わ
ずかにエッチングする(第4図(c)参照)。4 (a) and 4 (b) are performed in the same steps as those in FIG. Next, the copper plate 10a is thinner and slightly etched than in the case of FIG. 2 (see FIG. 4 (c)).
その後、第2図(e),(f)のようにポリイミド樹
脂11a面よりわずかに凸になるように金めっきをし(第
4図(d)参照)、その後導電性接着層14を設ける(第
4図(e)参照)。次に、導電性接着層14と露出してい
るポリイミド樹脂11a上に蒸着で金属4bを形成する(第
4図(f)参照)。この金属4bがのちに共通電極とな
る。その後、銅板10aをエッチングにより除去し、金属4
bを共通電極とし、金属4bとは反対側の金4aに導電性接
着層14を設ける(第4図(g)参照)。その後、共通電
極として用いた金属4bを除去し電気的接続部材1を得る
(第4図(h)参照)。Thereafter, as shown in FIGS. 2 (e) and 2 (f), gold plating is performed so as to be slightly convex from the surface of the polyimide resin 11a (see FIG. 4 (d)), and then a conductive adhesive layer 14 is provided (see FIG. 4 (d)). (See FIG. 4 (e)). Next, a metal 4b is formed by vapor deposition on the conductive adhesive layer 14 and the exposed polyimide resin 11a (see FIG. 4 (f)). This metal 4b will later become a common electrode. Thereafter, the copper plate 10a is removed by etching, and metal 4
b is used as a common electrode, and a conductive adhesive layer 14 is provided on the gold 4a opposite to the metal 4b (see FIG. 4 (g)). Thereafter, the metal 4b used as the common electrode is removed to obtain the electrical connection member 1 (see FIG. 4 (h)).
なお、共通電極を設ける工程は銅板10aを除去した後
の工程で設けても良い。The step of providing the common electrode may be performed after the copper plate 10a is removed.
次に、第1図(a),(b)の電気回路部材におい
て、電気的接続部材1は第2図または第4図に示す様
に、金および導電性接着層からなる複数の導電部材4を
各々の導電部材4同志を、ポリイミドからなる保持体5
中に備えて電気的に絶縁させて構成されており、導電部
材4の一端の導電性接着層14を形成したバンプ8を電気
回路部品2側に露出させ、また導電部材4の他端の導電
性接着層14を形成したバンプ9を回路基板3側に露出さ
せている(第1図(a)参照))。Next, in the electric circuit members shown in FIGS. 1 (a) and 1 (b), as shown in FIG. 2 or FIG. 4, the electric connection member 1 has a plurality of conductive members 4 made of gold and a conductive adhesive layer. Is replaced with a conductive member 4 made of polyimide.
The bump 8 having the conductive adhesive layer 14 formed at one end of the conductive member 4 is exposed to the electrical circuit component 2 side, and the conductive member 4 is electrically insulated at the other end of the conductive member 4. The bump 9 on which the adhesive layer 14 is formed is exposed on the circuit board 3 side (see FIG. 1A).
そして、電気回路部品2のパッシベーション膜16に覆
われていない接続部15と、電気回路部品2側に露出した
導電部材4の導電性接着層14を形成したバンプ8とを接
着により電気的に接続する。また、電気回路部品3の接
続部17と、電気回路部品3側に露出した導電部材4の導
電性接着層14を形成したバンプ9とを接着により接続し
電気的接続を図る(第1図(b)参照)。電気回路部品
2の接続部15と、電気回路部品2側に露出した導電部材
4の導電性接着層との接続温度、および電気回路部品3
の接続部17と、電気回路部品3側に露出した導電部材4
の導電性接着層との接続温度は、180℃以下の低温で接
続可能であり、良好な接続が得られた。Then, the connection portion 15 of the electric circuit component 2 that is not covered with the passivation film 16 is electrically connected to the bump 8 having the conductive adhesive layer 14 of the conductive member 4 exposed to the electric circuit component 2 by bonding. I do. In addition, the connection portion 17 of the electric circuit component 3 and the bump 9 on which the conductive adhesive layer 14 of the conductive member 4 exposed to the electric circuit component 3 is formed are connected by bonding to achieve electrical connection (FIG. 1 ( b)). The connection temperature between the connection portion 15 of the electric circuit component 2 and the conductive adhesive layer of the conductive member 4 exposed on the electric circuit component 2 side;
And the conductive member 4 exposed on the side of the electric circuit component 3
Can be connected at a low temperature of 180 ° C. or less, and a good connection was obtained.
なお、接続の場合、電気回路部品2と電気回路部品3
との位置決めは必要であるが、電気的接続部材1の導電
部材4のピッチが電気回路部品2の接続部15および電気
回路部品3の接続部17のピッチより小さいために電気的
接続部材1の位置決めは粗略で良い。In the case of connection, the electric circuit component 2 and the electric circuit component 3
However, since the pitch of the conductive member 4 of the electric connection member 1 is smaller than the pitch of the connection portion 15 of the electric circuit component 2 and the pitch of the connection portion 17 of the electric circuit component 3, the electric connection member 1 The positioning may be rough.
また、本実施例では、電気的接続部材1と電気回路部
品2を接続してから、電気的接続部材1と電気回路部品
3を接続したが、その順序は逆であっても同時でもよ
い。In this embodiment, the electrical connection member 1 and the electrical circuit component 2 are connected, and then the electrical connection member 1 and the electrical circuit component 3 are connected. However, the order may be reversed or simultaneous.
実施例2 第3図(a),(b)は本発明の電気回路部材の他の
実施例を示す模式図である。同図は、実施例1の電気回
路部品3の銅箔からなる接続部17と電気回路部品2の接
続部15上に、実施例1の電気的接続部材の導電性接着層
を設けた方法と同じ方法で導電性接着層14aを設けたも
のであり、その他は実施例1と同様の構成からなるもの
である。この電気回路部材においては、電気回路部品2,
3に反りがあっても良好な接続が得られる。Embodiment 2 FIGS. 3 (a) and 3 (b) are schematic views showing another embodiment of the electric circuit member of the present invention. The figure shows a method in which a conductive adhesive layer of an electrical connection member of the first embodiment is provided on a connection portion 17 made of copper foil of the electrical circuit component 3 of the first embodiment and a connection portion 15 of the electrical circuit component 2. The conductive adhesive layer 14a is provided by the same method, and the other configuration is the same as that of the first embodiment. In this electric circuit member, electric circuit components 2,
Good connection can be obtained even if 3 is warped.
実施例3 第5図(a),(b)は本発明の電気回路部材のさら
に他の実施例を示す模式図である。同図は、実施例1の
電気回路部品3の銅箔からなる接続部17が設けられた面
とは反対側の面に、実施例1の電気的接続部材の導電性
接着層を設けた方法と同じ方法で導電性接着層14bを設
けたものであり、その他は実施例1と同様の構成からな
るものである。この電気回路部材においては、実施例1
と同様に良好な接続が可能となり、さらに反対面に導電
性接着層を設けることにより静電シールド効果が良い電
気回路部材が得られた。Embodiment 3 FIGS. 5 (a) and 5 (b) are schematic views showing still another embodiment of the electric circuit member of the present invention. The figure shows a method in which a conductive adhesive layer of the electrical connection member of the first embodiment is provided on the surface of the electric circuit component 3 of the first embodiment opposite to the surface on which the connection portion 17 made of copper foil is provided. A conductive adhesive layer 14b is provided in the same manner as described above, and the other configuration is the same as that of the first embodiment. In this electric circuit member, Embodiment 1
In the same manner as described above, good connection was possible, and an electric circuit member having a good electrostatic shielding effect was obtained by providing a conductive adhesive layer on the opposite surface.
[発明の効果] 以上説明した様に、本発明の電気的接続部材を用いた
電気回路部材にあっては、従来よりも狭ピッチ,多ピン
接合が可能なため高密度な電気回路部材を得ることがで
きる。また、導電部材の配線長が短くできるため、低抵
抗配線となり、発熱も少なく、また浮遊容量も減少する
ので、信号の遅れが少ない等の電気特性が向上するた
め、電気特性が良い電気回路部材が得らる。ことに高周
波回路の場合にこの効果が大きい。[Effects of the Invention] As described above, in an electric circuit member using the electric connection member of the present invention, a high-density electric circuit member can be obtained because a narrower pitch and more pins can be joined than in the past. be able to. Also, since the wiring length of the conductive member can be shortened, the wiring becomes low-resistance wiring, heat generation is reduced, and stray capacitance is reduced. Therefore, electric characteristics such as signal delay are improved, and electric characteristics are good. Is obtained. This effect is particularly large in the case of a high-frequency circuit.
また、本発明は、導電部材上に、超微粒金属粉体又は
金属化されたセラミック粉体の一方又は両方を含有する
接着性樹脂溶液から電気泳動法によって共析形成された
導電性接着層を設けているので、接続にあっては、接着
による電気的接続が行なわれるので、比較的低耐熱性の
電気回路部品でも用いることが可能で、しかも容易に接
続ができるため応用範囲が広い部品および装置が得られ
る。さらに、接続部のみを接続するので信頼性の高い良
品質な電気回路部材が得られる。Further, the present invention provides a conductive adhesive layer formed on a conductive member by electrophoresis from an adhesive resin solution containing one or both of ultrafine metal powder or metallized ceramic powder by electrophoresis. Since it is provided, in connection, electrical connection by adhesion is performed, so that it is possible to use even relatively low heat-resistant electric circuit parts, and since it can be easily connected, parts having a wide range of application and A device is obtained. Furthermore, since only the connection portion is connected, a highly reliable and high-quality electric circuit member can be obtained.
また、本発明においては、少なくとも1以上の電気回
路部品の接続部を有する面とは反対の面の金属表面上
に、前記導電性接着層を設けているので、静電シールド
効果の良い電気回路部材が得られ、電気回路部材から外
界へ、或いは外界から電気回路部材へ入る電磁気ノイズ
を比較的遮断し易いため非常に良好な電気回路部材が得
られる。Further, in the present invention, since the conductive adhesive layer is provided on a metal surface opposite to a surface having a connection portion of at least one or more electric circuit components, an electric circuit having a good electrostatic shielding effect is provided. A member is obtained, and electromagnetic noise entering the electric circuit member from the electric circuit member to the outside or from the outside is relatively easily blocked, so that a very good electric circuit member can be obtained.
第1図(a),(b)、第3図(a),(b)および第
5図(a),(b)は各々本発明の電気回路部材の実施
例を示す模式図であり、各図の(a)の接続前の状態、
(b)は接続後の状態を示す。第2図(a)〜(g)は
本発明の電気的接続部材の製造方法の一例を示す工程
図、第4図(a)〜(h)は本発明の電気的接続部材の
製造方法の他の例を示す工程図、第6図(a),(b)
は従来例の電気回路部材を示す模式図であり、(a)は
接続前の状態、(b)は接続後の状態を示す。第7図
(a)〜(e)は従来例の電気的接続部材の製造方法の
一例を示す工程図である。 1……電気的接続部材、2,3……電気回路部品 4……導電部材、4a……金 4b……金属、5……保持体 6,7,15,17……接続部 8,9……バンプ、10……銅箔 10a……銅板、11……感光性樹脂 11a……ポリイミド樹脂、12……穴 13……凹部 14,14a,14b……導電性接着層 16……パッシベーション膜FIGS. 1 (a) and (b), FIGS. 3 (a) and (b) and FIGS. 5 (a) and (b) are schematic views each showing an embodiment of the electric circuit member of the present invention. The state before connection in (a) of each figure,
(B) shows the state after connection. 2 (a) to 2 (g) are process diagrams showing an example of the method for manufacturing an electrical connection member of the present invention, and FIGS. 4 (a) to 4 (h) are diagrams of a method for manufacturing an electrical connection member according to the present invention. Process drawings showing another example, FIGS. 6 (a) and (b)
FIGS. 3A and 3B are schematic diagrams showing a conventional electric circuit member, wherein FIG. 3A shows a state before connection and FIG. 3B shows a state after connection. 7 (a) to 7 (e) are process diagrams showing an example of a method of manufacturing a conventional electrical connection member. 1 ... electric connection member, 2,3 ... electric circuit component 4 ... conductive member, 4a ... gold 4b ... metal, 5 ... holding body 6,7,15,17 ... connection part 8,9 ...... Bump, 10 Copper foil 10a Copper plate, 11 Photosensitive resin 11a Polyimide resin, 12 Hole 13 Concavity 14, 14a, 14b Conductive adhesive layer 16 Passivation film
───────────────────────────────────────────────────── フロントページの続き (58)調査した分野(Int.Cl.6,DB名) H01R 11/01 H01R 4/04 H05K 3/36 ──────────────────────────────────────────────────続 き Continued on the front page (58) Fields surveyed (Int.Cl. 6 , DB name) H01R 11/01 H01R 4/04 H05K 3/36
Claims (7)
に相互に絶縁状態に装備され露出した複数の導電部材と
を有し、該露出した保持体の両方の面の導電部材上に、
超微粒金属粉体又は金属化されたセラミック粉体の一方
又は両方を含有する接着性樹脂溶液から電気泳動法によ
って共析形成された導電性接着層を有し、該導電性接着
層が前記保持体の面と同一かもしくは突出して露出して
いることを特徴とする電気的接続部材。1. A holding member made of an electrically insulating material, and a plurality of exposed conductive members mounted on the holding member in a mutually insulated state, and the conductive members on both surfaces of the exposed holding member are provided. To
A conductive adhesive layer formed by electrophoresis from an adhesive resin solution containing one or both of ultrafine metal powder or metallized ceramic powder, wherein the conductive adhesive layer holds the conductive adhesive layer. An electrical connection member, which is the same as or protrudes from a body surface and is exposed.
粉体の平均粒径は0.01〜2μmおよび金属化されたセラ
ミック粉体の平均粒径は0.1〜5μmであり、かつ導電
性接着層に含有される超微粒金属粉体又は金属化された
セラミック粉体の一方又は両方の含有量は30〜80wt%で
ある請求項1に記載の電気的接続部材。2. The method according to claim 1, wherein the average particle size of the ultrafine metal powder contained in the conductive adhesive layer is 0.01 to 2 μm and the average particle size of the metallized ceramic powder is 0.1 to 5 μm. The electrical connection member according to claim 1, wherein the content of one or both of the ultrafine metal powder and the metalized ceramic powder contained in the layer is 30 to 80 wt%.
に相互に絶縁状態に装備され露出した複数の導電部材と
を有し、該露出した保持体の両方の面の導電部材上に超
微粒金属粉体又は金属化されたセラミック粉体の一方又
は両方を含有する接着性樹脂溶液から電気泳動法によっ
て共析形成された導電性接着層を有し、該導電性接着層
が前記保持体の面と同一かもしくは突出している電気的
接続部材と、 少なくとも1以上の接続部を有し、該接続部において前
記電気的接続部材の保持体の一方の面において露出して
いる導電性接着層のうちの少なくとも1つの一端が接着
により電気的に接続されている少なくとも1以上の電気
回路部品と、 少なくとも1以上の接続部を有し、該接続部において前
記電気的接続部材の保持体の他方の面において露出して
いる導電性接着層のうちの少なくとも1つの一端が接着
により電気的に接続されている少なくとも1以上の電気
回路部品と を有することを特徴とする電気回路部材。3. A holding member made of an electrically insulating material, and a plurality of exposed conductive members provided on the holding member so as to be insulated from each other, and a conductive member on both surfaces of the exposed holding member is provided. Having a conductive adhesive layer formed by electrophoresis from an adhesive resin solution containing one or both of ultrafine metal powder or metallized ceramic powder, wherein the conductive adhesive layer is An electrical connection member that is the same as or protrudes from the surface of the holding body; and at least one or more connection portions, and the conductive portion is exposed on one surface of the holding body of the electrical connection member at the connection portion. At least one end of at least one of the adhesive layers is electrically connected by adhesion, and at least one or more electric circuit components; and at least one or more connection parts, and a holder for the electric connection member at the connection parts On the other side of Electrical circuit member at least one end and having at least one or more electrical circuit components are electrically connected by bonding of the exposed portion of the conductive adhesive layer.
又は金属化されたセラミック粉体の一方又は両方を含有
した接着性樹脂溶液から電気泳動法によって共析形成さ
れた導電性接着層を有する接続部を少なくとも1個以上
有し、該接続部において、電気的接続部材の保持体の一
方の面において露出している導電性接着層を有する導電
部材のうちの少なくとも1つの一端が接着により電気的
に接続されている請求項3に記載の電気回路部材。4. A conductive adhesive formed by electrophoresis from an adhesive resin solution containing one or both of an ultrafine metal powder and a metalized ceramic powder, wherein a connection portion of an electric circuit component is formed. At least one connection part having a layer, at which one end of at least one of the conductive members having the conductive adhesive layer exposed on one surface of the holder of the electrical connection member is provided. The electric circuit member according to claim 3, wherein the electric circuit member is electrically connected by bonding.
続部を有する面とは反対の面の少なくとも一部分の金属
表面上に、超微粒金属粉体又は金属化されたセラミック
粉体の一方又は両方を含有する接着性樹脂溶液から電気
泳動法によって共析形成された導電性接着層を有する請
求項3または4に記載の電気回路部材。5. An ultrafine metal powder and / or a metallized ceramic powder on at least a part of the metal surface of the at least one electric circuit component opposite to the surface having the connection portion. 5. The electric circuit member according to claim 3, further comprising a conductive adhesive layer formed by codeposition from an adhesive resin solution containing:
粉体の平均粒径は0.01〜2μmおよび金属化されたセラ
ミック粉体の平均粒径は0.1〜5μmであり、かつ導電
性接着層に含有される超微粒金属粉体又は金属化された
セラミック粉体の一方又は両方の含有量は30〜80wt%で
ある請求項3乃至5のいずれかの項に記載の電気回路部
材。6. An ultrafine metal powder contained in the conductive adhesive layer has an average particle size of 0.01 to 2 μm, and the metalized ceramic powder has an average particle size of 0.1 to 5 μm. The electric circuit member according to any one of claims 3 to 5, wherein the content of one or both of the ultrafine metal powder and the metalized ceramic powder contained in the layer is 30 to 80 wt%.
回路基板、セラミック回路基板、リードフレーム及び半
導体素子から選択される少なくとも一つである請求項3
乃至6のいずれかの項に記載の電気回路部材。7. The electric circuit component is at least one selected from a frame, a resin circuit board, a metal circuit board, a ceramic circuit board, a lead frame, and a semiconductor element.
7. The electric circuit member according to any one of items 6 to 6.
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2121496A JP2895570B2 (en) | 1990-05-11 | 1990-05-11 | Electrical connection member and electric circuit member |
US07/810,444 US5174766A (en) | 1990-05-11 | 1991-12-19 | Electrical connecting member and electric circuit member |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2121496A JP2895570B2 (en) | 1990-05-11 | 1990-05-11 | Electrical connection member and electric circuit member |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH0419972A JPH0419972A (en) | 1992-01-23 |
JP2895570B2 true JP2895570B2 (en) | 1999-05-24 |
Family
ID=14812616
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2121496A Expired - Fee Related JP2895570B2 (en) | 1990-05-11 | 1990-05-11 | Electrical connection member and electric circuit member |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP2895570B2 (en) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5454161A (en) * | 1993-04-29 | 1995-10-03 | Fujitsu Limited | Through hole interconnect substrate fabrication process |
WO2019065118A1 (en) * | 2017-09-29 | 2019-04-04 | 富士フイルム株式会社 | Semiconductor device manufacturing method and joint member |
JP2020174115A (en) * | 2019-04-10 | 2020-10-22 | 株式会社フジクラ | Multilayer circuit board |
-
1990
- 1990-05-11 JP JP2121496A patent/JP2895570B2/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
JPH0419972A (en) | 1992-01-23 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US5174766A (en) | Electrical connecting member and electric circuit member | |
TWI358973B (en) | ||
TW200301554A (en) | Method of producing multilayered circuit board for semiconductor device | |
JPH0249385A (en) | Manufacture of electric connection member | |
TW200303604A (en) | Semiconductor device and method of manufacturing the same | |
TW200428608A (en) | Semiconductor device and manufacturing method thereof | |
TW200908823A (en) | Circuit assembly including a metal core substrate and process for preparing the same | |
JPH01235170A (en) | Micro i/o pin and its manufacture | |
JPH06132474A (en) | Semiconductor device | |
JP2895569B2 (en) | Electrical connection member and electric circuit member | |
JP2895570B2 (en) | Electrical connection member and electric circuit member | |
JP2895568B2 (en) | Electric circuit members | |
JP3513983B2 (en) | Manufacturing method of chip carrier | |
JP3675407B2 (en) | Electronic equipment | |
JPH06169051A (en) | Lead frame and manufacture thereof and semiconductor package | |
JP4520665B2 (en) | Printed wiring board, manufacturing method thereof, and component mounting structure | |
WO2021104095A1 (en) | Implantable medical device and manufacturing method therefor | |
JP2961221B2 (en) | Electrical connection members | |
WO2003002786A1 (en) | Electroplating method and printed wiring board manufacturing method | |
JPH06204290A (en) | Manufacture of circuit board and connection method between the electric connection member and electric circuit part | |
JP3027171B2 (en) | Electric circuit members | |
JP2002176267A (en) | Electronic parts, circuit device, manufacturing method therefor and semiconductor device | |
JP3582111B2 (en) | Manufacturing method of printed wiring board | |
JP2796872B2 (en) | Manufacturing method of electrical connection member | |
JPH09129777A (en) | Board for mounting semiconductor element, semiconductor device, and transfer original plate |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
LAPS | Cancellation because of no payment of annual fees |