JP2023538735A - 有機発光ダイオードの蒸着装置 - Google Patents
有機発光ダイオードの蒸着装置 Download PDFInfo
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- JP2023538735A JP2023538735A JP2023512308A JP2023512308A JP2023538735A JP 2023538735 A JP2023538735 A JP 2023538735A JP 2023512308 A JP2023512308 A JP 2023512308A JP 2023512308 A JP2023512308 A JP 2023512308A JP 2023538735 A JP2023538735 A JP 2023538735A
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- light emitting
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- emitting diode
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- 238000007740 vapor deposition Methods 0.000 title claims description 8
- 230000008021 deposition Effects 0.000 claims abstract description 68
- 239000000463 material Substances 0.000 claims abstract description 45
- 238000010438 heat treatment Methods 0.000 claims description 31
- 230000006835 compression Effects 0.000 claims description 5
- 238000007906 compression Methods 0.000 claims description 5
- 230000002040 relaxant effect Effects 0.000 claims description 2
- 238000011156 evaluation Methods 0.000 abstract description 5
- 238000000151 deposition Methods 0.000 description 52
- 238000000034 method Methods 0.000 description 13
- 239000000758 substrate Substances 0.000 description 8
- 239000002994 raw material Substances 0.000 description 6
- 239000010409 thin film Substances 0.000 description 6
- 238000012423 maintenance Methods 0.000 description 5
- 239000000126 substance Substances 0.000 description 5
- 230000008020 evaporation Effects 0.000 description 4
- 238000001704 evaporation Methods 0.000 description 4
- 238000006243 chemical reaction Methods 0.000 description 2
- 239000010408 film Substances 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 239000011368 organic material Substances 0.000 description 2
- 239000004020 conductor Substances 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 238000002347 injection Methods 0.000 description 1
- 239000007924 injection Substances 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 238000002207 thermal evaporation Methods 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
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Classifications
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/243—Crucibles for source material
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01B—BOILING; BOILING APPARATUS ; EVAPORATION; EVAPORATION APPARATUS
- B01B1/00—Boiling; Boiling apparatus for physical or chemical purposes ; Evaporation in general
- B01B1/005—Evaporation for physical or chemical purposes; Evaporation apparatus therefor, e.g. evaporation of liquids for gas phase reactions
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/12—Organic material
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/246—Replenishment of source material
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/26—Vacuum evaporation by resistance or inductive heating of the source
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/54—Controlling or regulating the coating process
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
- H10K71/70—Testing, e.g. accelerated lifetime tests
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
- H10K71/811—Controlling the atmosphere during processing
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
- H10K71/10—Deposition of organic active material
- H10K71/16—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering
- H10K71/164—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering using vacuum deposition
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Manufacturing & Machinery (AREA)
- Physical Vapour Deposition (AREA)
- Electroluminescent Light Sources (AREA)
Abstract
Description
有機薄膜は、低分子有機物質を含む坩堝を取り囲む熱線に電流を流して加熱し、坩堝に伝達された熱が坩堝内の有機物質の温度を上昇させ、有機物質の温度が上昇するにつれて、有機物質が気体の形で坩堝を出て基板に蒸着される方式で主に作られる。このような熱蒸着法による有機薄膜の作製にはOLED蒸着器が用いられてきた。
10 ・・・メインチャンバー
20 ・・・補助チャンバー
21 ・・・ロード部
21a ・・・ロード部2段
21b ・・・ロード部1段
22 ・・・ゲートバルブ
23 ・・・開閉部
24 ・・・真空部
25 ・・・真空弁
30 ・・・加熱部
40 ・・・ベローズ
Claims (10)
- 物質を蒸着および評価するメインチャンバー;
前記メインチャンバーと連結され、蒸着しようとする蒸着物質がローディングされる補助チャンバー;および
前記補助チャンバーにローディングされた前記蒸着物質を加熱する加熱部;
を含む、有機発光ダイオードの蒸着装置。 - 前記補助チャンバーと前記加熱部を連結するベローズ(bellows)を含む、請求項1に記載の有機発光ダイオードの蒸着装置。
- 前記補助チャンバーは、
前記蒸着物質を前記メインチャンバーのセルにローディングさせるロード部を含む、請求項1または2に記載の有機発光ダイオードの蒸着装置。 - 前記ロード部は、
前記蒸着物質の移動を制御するゲートバルブをさらに含む、請求項3に記載の有機発光ダイオードの蒸着装置。 - 前記補助チャンバーの内部を真空状態にする真空部をさらに含む、請求項1から4のいずれか一項に記載の有機発光ダイオードの蒸着装置。
- 前記補助チャンバーは、
前記メインチャンバーの下部に位置するものである、請求項1から5のいずれか一項に記載の有機発光ダイオードの蒸着装置。 - 前記補助チャンバーは、
前記蒸着物質のローディングおよびアンローディングのために一側に開閉部を含む、請求項1から6のいずれか一項に記載の有機発光ダイオードの蒸着装置。 - 前記開閉部は、
前記補助チャンバー内部の雰囲気を維持するための圧縮部材をさらに含む、 請求項7に記載の有機発光ダイオードの蒸着装置。 - 前記補助チャンバーおよび前記加熱部は、
移動が可能である、請求項1から8のいずれか一項に記載の有機発光ダイオードの蒸着装置。 - 前記ベローズを圧縮および弛緩するモータをさらに含む、請求項2に記載の有機発光ダイオードの蒸着装置。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR10-2020-0154758 | 2020-11-18 | ||
KR1020200154758A KR20220067947A (ko) | 2020-11-18 | 2020-11-18 | 유기발광다이오드의 증착장치 |
PCT/KR2021/016862 WO2022108326A1 (ko) | 2020-11-18 | 2021-11-17 | 유기발광다이오드의 증착장치 |
Publications (1)
Publication Number | Publication Date |
---|---|
JP2023538735A true JP2023538735A (ja) | 2023-09-11 |
Family
ID=81709358
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2023512308A Pending JP2023538735A (ja) | 2020-11-18 | 2021-11-17 | 有機発光ダイオードの蒸着装置 |
Country Status (7)
Country | Link |
---|---|
US (1) | US20230329076A1 (ja) |
EP (1) | EP4190937A4 (ja) |
JP (1) | JP2023538735A (ja) |
KR (1) | KR20220067947A (ja) |
CN (1) | CN115968413A (ja) |
TW (1) | TWI792687B (ja) |
WO (1) | WO2022108326A1 (ja) |
Family Cites Families (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3452617B2 (ja) * | 1993-12-10 | 2003-09-29 | 真空冶金株式会社 | ガスデポジション装置 |
JP4436664B2 (ja) * | 2003-12-24 | 2010-03-24 | 日立造船株式会社 | 蒸着装置 |
KR100958778B1 (ko) * | 2004-10-22 | 2010-05-18 | 황창훈 | 유기 박막 증착 공정용 증발원 연속 공급장치 |
EP2168643A1 (en) * | 2008-09-29 | 2010-03-31 | Applied Materials, Inc. | Evaporator for organic materials |
JP5298189B2 (ja) * | 2009-12-18 | 2013-09-25 | 平田機工株式会社 | 真空蒸着方法及び装置 |
TWI564427B (zh) * | 2009-12-18 | 2017-01-01 | 財團法人工業技術研究院 | 聚對二甲苯薄膜的形成方法 |
CN105874095A (zh) * | 2013-12-06 | 2016-08-17 | 应用材料公司 | 沉积装置、沉积设备及其操作方法 |
KR20160133589A (ko) | 2015-05-12 | 2016-11-23 | 주식회사 파인에바 | 선형 증발 증착 장치 |
KR102107288B1 (ko) * | 2017-01-02 | 2020-05-06 | 황창훈 | 프레임드 대면적 면증발원 장치 |
DE102017003516A1 (de) * | 2017-04-11 | 2018-10-11 | Creaphys Gmbh | Beschichtungsvorrichtung und Verfahren zur reaktiven Dampfphasenabscheidung unter Vakuum auf einem Substrat |
KR102310236B1 (ko) * | 2018-10-23 | 2021-10-08 | 어플라이드 머티어리얼스, 인코포레이티드 | 도가니 자동교체를 위한 증발소스 및 이를 포함하는 증발 증착 시스템 |
-
2020
- 2020-11-18 KR KR1020200154758A patent/KR20220067947A/ko active Search and Examination
-
2021
- 2021-11-17 JP JP2023512308A patent/JP2023538735A/ja active Pending
- 2021-11-17 US US18/023,590 patent/US20230329076A1/en active Pending
- 2021-11-17 TW TW110142802A patent/TWI792687B/zh active
- 2021-11-17 WO PCT/KR2021/016862 patent/WO2022108326A1/ko unknown
- 2021-11-17 EP EP21895094.7A patent/EP4190937A4/en active Pending
- 2021-11-17 CN CN202180051514.8A patent/CN115968413A/zh active Pending
Also Published As
Publication number | Publication date |
---|---|
WO2022108326A1 (ko) | 2022-05-27 |
KR20220067947A (ko) | 2022-05-25 |
TWI792687B (zh) | 2023-02-11 |
EP4190937A1 (en) | 2023-06-07 |
EP4190937A4 (en) | 2023-12-27 |
TW202230853A (zh) | 2022-08-01 |
CN115968413A (zh) | 2023-04-14 |
US20230329076A1 (en) | 2023-10-12 |
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