JP2023068643A - Diimmonium compound and use thereof - Google Patents
Diimmonium compound and use thereof Download PDFInfo
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- 150000001875 compounds Chemical class 0.000 title claims abstract description 56
- 239000011342 resin composition Substances 0.000 claims abstract description 21
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims abstract description 8
- 229920005989 resin Polymers 0.000 claims description 33
- 239000011347 resin Substances 0.000 claims description 33
- 239000004417 polycarbonate Substances 0.000 claims description 6
- 229920000515 polycarbonate Polymers 0.000 claims description 6
- 238000002844 melting Methods 0.000 claims description 4
- 230000008018 melting Effects 0.000 claims description 4
- 239000000975 dye Substances 0.000 description 39
- -1 phthalocyanine compound Chemical class 0.000 description 33
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 31
- 230000000052 comparative effect Effects 0.000 description 21
- 238000010521 absorption reaction Methods 0.000 description 16
- 238000000034 method Methods 0.000 description 16
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 15
- 239000010408 film Substances 0.000 description 15
- 229910052709 silver Inorganic materials 0.000 description 15
- 239000004332 silver Substances 0.000 description 15
- 239000011521 glass Substances 0.000 description 13
- 230000008033 biological extinction Effects 0.000 description 12
- 230000003287 optical effect Effects 0.000 description 9
- 239000002244 precipitate Substances 0.000 description 9
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 9
- KWYHDKDOAIKMQN-UHFFFAOYSA-N N,N,N',N'-tetramethylethylenediamine Chemical compound CN(C)CCN(C)C KWYHDKDOAIKMQN-UHFFFAOYSA-N 0.000 description 8
- 239000000706 filtrate Substances 0.000 description 8
- 238000003384 imaging method Methods 0.000 description 8
- 239000002904 solvent Substances 0.000 description 8
- 239000000203 mixture Substances 0.000 description 7
- 238000001914 filtration Methods 0.000 description 6
- 239000000758 substrate Substances 0.000 description 6
- 229920001187 thermosetting polymer Polymers 0.000 description 6
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 4
- 239000002253 acid Substances 0.000 description 4
- CEIPQQODRKXDSB-UHFFFAOYSA-N ethyl 3-(6-hydroxynaphthalen-2-yl)-1H-indazole-5-carboximidate dihydrochloride Chemical compound Cl.Cl.C1=C(O)C=CC2=CC(C3=NNC4=CC=C(C=C43)C(=N)OCC)=CC=C21 CEIPQQODRKXDSB-UHFFFAOYSA-N 0.000 description 4
- 238000010438 heat treatment Methods 0.000 description 4
- 239000000463 material Substances 0.000 description 4
- 239000003973 paint Substances 0.000 description 4
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- WEVYAHXRMPXWCK-UHFFFAOYSA-N Acetonitrile Chemical compound CC#N WEVYAHXRMPXWCK-UHFFFAOYSA-N 0.000 description 3
- BTBUEUYNUDRHOZ-UHFFFAOYSA-N Borate Chemical compound [O-]B([O-])[O-] BTBUEUYNUDRHOZ-UHFFFAOYSA-N 0.000 description 3
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 239000000853 adhesive Substances 0.000 description 3
- 230000001070 adhesive effect Effects 0.000 description 3
- 150000001450 anions Chemical group 0.000 description 3
- 230000000903 blocking effect Effects 0.000 description 3
- 239000011248 coating agent Substances 0.000 description 3
- 238000000576 coating method Methods 0.000 description 3
- 229920001577 copolymer Polymers 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 238000000465 moulding Methods 0.000 description 3
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 3
- 239000003960 organic solvent Substances 0.000 description 3
- NFHFRUOZVGFOOS-UHFFFAOYSA-N palladium;triphenylphosphane Chemical compound [Pd].C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 NFHFRUOZVGFOOS-UHFFFAOYSA-N 0.000 description 3
- 239000000047 product Substances 0.000 description 3
- 238000002834 transmittance Methods 0.000 description 3
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 3
- BQCIDUSAKPWEOX-UHFFFAOYSA-N 1,1-Difluoroethene Chemical compound FC(F)=C BQCIDUSAKPWEOX-UHFFFAOYSA-N 0.000 description 2
- GVNSFLFOZIYBPH-UHFFFAOYSA-N 1-n,1-n-dibutyl-4-n-[4-[4-(dibutylamino)-n-[4-(dibutylamino)phenyl]anilino]phenyl]-4-n-[4-(dibutylamino)phenyl]benzene-1,4-diamine Chemical compound C1=CC(N(CCCC)CCCC)=CC=C1N(C=1C=CC(=CC=1)N(C=1C=CC(=CC=1)N(CCCC)CCCC)C=1C=CC(=CC=1)N(CCCC)CCCC)C1=CC=C(N(CCCC)CCCC)C=C1 GVNSFLFOZIYBPH-UHFFFAOYSA-N 0.000 description 2
- DQFMPTUTAAIXAN-UHFFFAOYSA-N 4,4-dimethyl-1h-imidazol-5-one Chemical compound CC1(C)NC=NC1=O DQFMPTUTAAIXAN-UHFFFAOYSA-N 0.000 description 2
- CEASIDDAJACXTG-UHFFFAOYSA-N 4-n-[4-[4-(diethylamino)-n-[4-(diethylamino)phenyl]anilino]phenyl]-4-n-[4-(diethylamino)phenyl]-1-n,1-n-diethylbenzene-1,4-diamine Chemical compound C1=CC(N(CC)CC)=CC=C1N(C=1C=CC(=CC=1)N(C=1C=CC(=CC=1)N(CC)CC)C=1C=CC(=CC=1)N(CC)CC)C1=CC=C(N(CC)CC)C=C1 CEASIDDAJACXTG-UHFFFAOYSA-N 0.000 description 2
- ADFIXLXZRXVKDE-UHFFFAOYSA-N 4-n-[4-[4-(dimethylamino)-n-[4-(dimethylamino)phenyl]anilino]phenyl]-4-n-[4-(dimethylamino)phenyl]-1-n,1-n-dimethylbenzene-1,4-diamine Chemical compound C1=CC(N(C)C)=CC=C1N(C=1C=CC(=CC=1)N(C=1C=CC(=CC=1)N(C)C)C=1C=CC(=CC=1)N(C)C)C1=CC=C(N(C)C)C=C1 ADFIXLXZRXVKDE-UHFFFAOYSA-N 0.000 description 2
- INGVZLYSYVSTRR-UHFFFAOYSA-N 4-n-[4-[4-[bis(2-methylpropyl)amino]-n-[4-[bis(2-methylpropyl)amino]phenyl]anilino]phenyl]-4-n-[4-[bis(2-methylpropyl)amino]phenyl]-1-n,1-n-bis(2-methylpropyl)benzene-1,4-diamine Chemical compound C1=CC(N(CC(C)C)CC(C)C)=CC=C1N(C=1C=CC(=CC=1)N(C=1C=CC(=CC=1)N(CC(C)C)CC(C)C)C=1C=CC(=CC=1)N(CC(C)C)CC(C)C)C1=CC=C(N(CC(C)C)CC(C)C)C=C1 INGVZLYSYVSTRR-UHFFFAOYSA-N 0.000 description 2
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 2
- 239000004925 Acrylic resin Substances 0.000 description 2
- 229920000178 Acrylic resin Polymers 0.000 description 2
- 229920002845 Poly(methacrylic acid) Chemical class 0.000 description 2
- 229920002125 Sokalan® Polymers 0.000 description 2
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 2
- 239000011230 binding agent Substances 0.000 description 2
- DBDNZCBRIPTLJF-UHFFFAOYSA-N boron(1-) monohydride Chemical compound [BH-] DBDNZCBRIPTLJF-UHFFFAOYSA-N 0.000 description 2
- 125000002091 cationic group Chemical group 0.000 description 2
- 150000001768 cations Chemical group 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 238000001723 curing Methods 0.000 description 2
- 239000003822 epoxy resin Substances 0.000 description 2
- 150000002148 esters Chemical class 0.000 description 2
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 2
- 239000005340 laminated glass Substances 0.000 description 2
- 238000010030 laminating Methods 0.000 description 2
- 229920002037 poly(vinyl butyral) polymer Polymers 0.000 description 2
- 239000004584 polyacrylic acid Substances 0.000 description 2
- 229920000647 polyepoxide Polymers 0.000 description 2
- 229920000728 polyester Polymers 0.000 description 2
- 229920001225 polyester resin Polymers 0.000 description 2
- 239000004645 polyester resin Substances 0.000 description 2
- 239000002952 polymeric resin Substances 0.000 description 2
- 239000000843 powder Substances 0.000 description 2
- 230000035945 sensitivity Effects 0.000 description 2
- 230000003595 spectral effect Effects 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 229920003002 synthetic resin Polymers 0.000 description 2
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 1
- CBCKQZAAMUWICA-UHFFFAOYSA-N 1,4-phenylenediamine Chemical compound NC1=CC=C(N)C=C1 CBCKQZAAMUWICA-UHFFFAOYSA-N 0.000 description 1
- FCYVWWWTHPPJII-UHFFFAOYSA-N 2-methylidenepropanedinitrile Chemical compound N#CC(=C)C#N FCYVWWWTHPPJII-UHFFFAOYSA-N 0.000 description 1
- CZGCEKJOLUNIFY-UHFFFAOYSA-N 4-Chloronitrobenzene Chemical compound [O-][N+](=O)C1=CC=C(Cl)C=C1 CZGCEKJOLUNIFY-UHFFFAOYSA-N 0.000 description 1
- XFXPMWWXUTWYJX-UHFFFAOYSA-N Cyanide Chemical compound N#[C-] XFXPMWWXUTWYJX-UHFFFAOYSA-N 0.000 description 1
- JOYRKODLDBILNP-UHFFFAOYSA-N Ethyl urethane Chemical compound CCOC(N)=O JOYRKODLDBILNP-UHFFFAOYSA-N 0.000 description 1
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 description 1
- NTIZESTWPVYFNL-UHFFFAOYSA-N Methyl isobutyl ketone Chemical compound CC(C)CC(C)=O NTIZESTWPVYFNL-UHFFFAOYSA-N 0.000 description 1
- UIHCLUNTQKBZGK-UHFFFAOYSA-N Methyl isobutyl ketone Natural products CCC(C)C(C)=O UIHCLUNTQKBZGK-UHFFFAOYSA-N 0.000 description 1
- 229920002292 Nylon 6 Polymers 0.000 description 1
- 229920002302 Nylon 6,6 Polymers 0.000 description 1
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 1
- 239000002033 PVDF binder Substances 0.000 description 1
- 239000004419 Panlite Substances 0.000 description 1
- 229930040373 Paraformaldehyde Natural products 0.000 description 1
- 239000004952 Polyamide Substances 0.000 description 1
- 239000004698 Polyethylene Substances 0.000 description 1
- 239000004642 Polyimide Substances 0.000 description 1
- 239000004793 Polystyrene Substances 0.000 description 1
- 239000004372 Polyvinyl alcohol Substances 0.000 description 1
- 229920001328 Polyvinylidene chloride Polymers 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 238000006887 Ullmann reaction Methods 0.000 description 1
- 239000006096 absorbing agent Substances 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 150000001338 aliphatic hydrocarbons Chemical class 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 1
- RWCCWEUUXYIKHB-UHFFFAOYSA-N benzophenone Chemical compound C=1C=CC=CC=1C(=O)C1=CC=CC=C1 RWCCWEUUXYIKHB-UHFFFAOYSA-N 0.000 description 1
- 239000012965 benzophenone Substances 0.000 description 1
- QRUDEWIWKLJBPS-UHFFFAOYSA-N benzotriazole Chemical compound C1=CC=C2N[N][N]C2=C1 QRUDEWIWKLJBPS-UHFFFAOYSA-N 0.000 description 1
- 239000012964 benzotriazole Substances 0.000 description 1
- 229910052796 boron Inorganic materials 0.000 description 1
- DQXBYHZEEUGOBF-UHFFFAOYSA-N but-3-enoic acid;ethene Chemical compound C=C.OC(=O)CC=C DQXBYHZEEUGOBF-UHFFFAOYSA-N 0.000 description 1
- 238000005266 casting Methods 0.000 description 1
- 239000012461 cellulose resin Substances 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 239000003086 colorant Substances 0.000 description 1
- 230000000295 complement effect Effects 0.000 description 1
- 150000004696 coordination complex Chemical class 0.000 description 1
- 150000004662 dithiols Chemical class 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- RTZKZFJDLAIYFH-UHFFFAOYSA-N ether Substances CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 1
- 229920001038 ethylene copolymer Polymers 0.000 description 1
- 239000005038 ethylene vinyl acetate Substances 0.000 description 1
- 238000001125 extrusion Methods 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 150000002222 fluorine compounds Chemical class 0.000 description 1
- 150000002366 halogen compounds Chemical class 0.000 description 1
- 238000013007 heat curing Methods 0.000 description 1
- 229910001385 heavy metal Inorganic materials 0.000 description 1
- 238000004898 kneading Methods 0.000 description 1
- 239000000155 melt Substances 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- UFWIBTONFRDIAS-UHFFFAOYSA-N naphthalene-acid Natural products C1=CC=CC2=CC=CC=C21 UFWIBTONFRDIAS-UHFFFAOYSA-N 0.000 description 1
- 239000005365 phosphate glass Substances 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 239000000049 pigment Substances 0.000 description 1
- 239000004014 plasticizer Substances 0.000 description 1
- 239000002798 polar solvent Substances 0.000 description 1
- 229920001200 poly(ethylene-vinyl acetate) Polymers 0.000 description 1
- 229920003050 poly-cycloolefin Polymers 0.000 description 1
- 229920002239 polyacrylonitrile Polymers 0.000 description 1
- 229920002647 polyamide Polymers 0.000 description 1
- 229920001230 polyarylate Polymers 0.000 description 1
- 229920005668 polycarbonate resin Polymers 0.000 description 1
- 239000004431 polycarbonate resin Substances 0.000 description 1
- 229920000570 polyether Polymers 0.000 description 1
- 229920000573 polyethylene Polymers 0.000 description 1
- 229920000139 polyethylene terephthalate Polymers 0.000 description 1
- 239000005020 polyethylene terephthalate Substances 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- 229920001228 polyisocyanate Polymers 0.000 description 1
- 239000005056 polyisocyanate Substances 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 229920006324 polyoxymethylene Polymers 0.000 description 1
- 229920001184 polypeptide Polymers 0.000 description 1
- 229920002223 polystyrene Polymers 0.000 description 1
- 229920001343 polytetrafluoroethylene Polymers 0.000 description 1
- 239000004810 polytetrafluoroethylene Substances 0.000 description 1
- 239000004814 polyurethane Substances 0.000 description 1
- 229920002635 polyurethane Polymers 0.000 description 1
- 229920002689 polyvinyl acetate Polymers 0.000 description 1
- 239000011118 polyvinyl acetate Substances 0.000 description 1
- 229920002451 polyvinyl alcohol Polymers 0.000 description 1
- 229920000915 polyvinyl chloride Polymers 0.000 description 1
- 239000004800 polyvinyl chloride Substances 0.000 description 1
- 229920002620 polyvinyl fluoride Polymers 0.000 description 1
- 229920000131 polyvinylidene Polymers 0.000 description 1
- 239000005033 polyvinylidene chloride Substances 0.000 description 1
- 229920002981 polyvinylidene fluoride Polymers 0.000 description 1
- 102000004196 processed proteins & peptides Human genes 0.000 description 1
- 108090000765 processed proteins & peptides Proteins 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 125000001424 substituent group Chemical group 0.000 description 1
- 239000013589 supplement Substances 0.000 description 1
- 230000002194 synthesizing effect Effects 0.000 description 1
- BFKJFAAPBSQJPD-UHFFFAOYSA-N tetrafluoroethene Chemical group FC(F)=C(F)F BFKJFAAPBSQJPD-UHFFFAOYSA-N 0.000 description 1
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
- 229920002803 thermoplastic polyurethane Polymers 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
- 239000013585 weight reducing agent Substances 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
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- Optical Filters (AREA)
- Compositions Of Macromolecular Compounds (AREA)
Abstract
Description
本発明は赤外領域に吸収を有するジイモニウム化合物及びその用途に関し、特に耐熱性に優れるジイモニウム化合物及びそれを含有する熱硬化性樹脂組成物による樹脂層を積層することにより得られる近赤外線カットフィルタ(光学フィルタ)に関する。 The present invention relates to a dimonium compound having absorption in the infrared region and its use, and in particular, a near-infrared cut filter obtained by laminating a resin layer of a diimonium compound having excellent heat resistance and a thermosetting resin composition containing it ( optical filters).
デジタルカメラ等に使用されているCCD(Charge Coupled Device)やCMOS(Complementary Metal Oxide Semiconductor)等の撮像素子は、可視域~1100nm付近の近赤外域に渡る分光感度を有しており、これに対して人間の目は400~700nm付近の波長の光を感じることができる。よって撮像素子と人間の目では分光感度に大きな差があるため、撮像素子の前面に近赤外域の光を吸収する近赤外線カットフィルタを備えて、人間の目の視感度に補正することが必要である。 Image pickup devices such as CCD (Charge Coupled Device) and CMOS (Complementary Metal Oxide Semiconductor) used in digital cameras have spectral sensitivity ranging from the visible region to the near-infrared region around 1100 nm. Human eyes can perceive light with wavelengths around 400 to 700 nm. Therefore, since there is a large difference in spectral sensitivity between the image sensor and the human eye, it is necessary to equip the front surface of the image sensor with a near-infrared cut filter that absorbs light in the near-infrared region to correct the visibility of the human eye. is.
撮像素子に用いられる近赤外線カットフィルタとしては、リン酸塩系ガラスにCuOを添加したガラスフィルタが知られている。しかしながら、この近赤外線吸収能を有するガラスは非常に高価である。また、ガラスであるために加工性に問題があり、光学特性の設計の自由度も狭く、球面への対応も煩雑である。さらにガラスの厚みを薄くするには限界があり、撮像光学系に組み込む際にはスペースの確保や軽量化に問題がある。 A glass filter obtained by adding CuO to phosphate glass is known as a near-infrared cut filter used in an imaging device. However, this near-infrared absorbing glass is very expensive. In addition, since it is glass, there is a problem with workability, the degree of freedom in designing optical characteristics is narrow, and it is complicated to deal with spherical surfaces. Furthermore, there is a limit to how thin the thickness of the glass can be, and there are problems in securing space and weight reduction when incorporating it into an imaging optical system.
そこで、近赤外線吸収色素を含有する樹脂組成物を撮像素子表面あるいはフィルタ基材表面にコートすることで、薄膜化や球面等への成形が可能な近赤外線カットフィルタを作製する技術開発が行われている。近赤外線吸収色素として、具体的には、ジイモニウム化合物系色素、クロモン型スクアリリウム化合物系色素、フタロシアニン化合物系色素、ナフタレン化合物系色素等が知られている。 Therefore, technology has been developed to produce a near-infrared cut filter that can be formed into a thin film or a spherical surface by coating a resin composition containing a near-infrared absorbing dye on the surface of an image sensor or a filter base material. ing. As near-infrared absorption dyes, specifically, diimmonium compound dyes, chromone-type squarylium compound dyes, phthalocyanine compound dyes, naphthalene compound dyes, and the like are known.
ジイモニウム化合物は、カチオン部分の末端基やアニオン部分の化学構造を変更することでその耐熱性や耐湿熱性、溶媒への溶解性、樹脂基材への分散性等の物性が変化することが知られている。しかし、従来知られているジイモニウム化合物ではその耐熱性が不十分であり、樹脂組成物と混合及び加工成形した際に熱劣化を生じ得るため、近赤外線カットフィルタの薄膜化、ひいては撮像素子のさらなる小型軽薄化のネックとなっている。
このような背景から近年、近赤外線の吸収波長領域が広く、耐熱性に優れたジイモニウム化合物並びにそれを用いた近赤外線カットフィルタ、及びそれを作製するための樹脂組成物の開発が強く求められている。
Diimmonium compounds are known to change their physical properties such as heat resistance, resistance to moist heat, solubility in solvents, and dispersibility in resin substrates by changing the chemical structure of the terminal group of the cation moiety and the anion moiety. ing. However, conventionally known diimmonium compounds have insufficient heat resistance and can be thermally deteriorated when mixed with a resin composition and processed and molded. It is a bottleneck for miniaturization and lightness.
Against this background, in recent years, there has been a strong demand for the development of a dimonium compound that has a wide near-infrared absorption wavelength range and excellent heat resistance, a near-infrared cut filter using the same, and a resin composition for producing it. there is
特許文献1には、近赤外線吸収能を有するジイモニウム化合物として、ジイモニウムカチオンとテトラキス(ペンタフルオロフェニル)ホウ素アニオン2個からなる塩であるジイモニウム塩化合物が開示されている。 Patent Document 1 discloses a diimonium salt compound, which is a salt composed of a diimonium cation and two tetrakis(pentafluorophenyl)boron anions, as a diimonium compound having near-infrared absorption ability.
本発明は高耐熱性を有するジイモニウム化合物及びそれを含有する樹脂組成物の提供を目的とする。また、それを用いて作製される広範囲の近赤外線吸収能かつ高耐熱性を有する近赤外線カットフィルタの提供を目的とする。 An object of the present invention is to provide a diimmonium compound having high heat resistance and a resin composition containing the same. Another object of the present invention is to provide a near-infrared cut filter having a wide range of near-infrared absorbing power and high heat resistance, which is produced using the same.
本発明者等は鋭意検討の結果、後述の特定化学構造を有するジイモニウム化合物が極めて耐熱性に優れ、当該ジイモニウム化合物を含有する熱硬化性樹脂組成物から得られた樹脂層を積層することによって、前記課題を解決する近赤外線カットフィルタの製造に資することを見出し、本発明を完成させた。 As a result of extensive studies, the present inventors have found that a diimmonium compound having a specific chemical structure described later has extremely excellent heat resistance, and by laminating a resin layer obtained from a thermosetting resin composition containing the diimmonium compound, The inventors have found that it contributes to the production of a near-infrared cut filter that solves the above problems, and completed the present invention.
すなわち本発明は以下の(イ)~(へ)に示すものである。 That is, the present invention provides the following (a) to (f).
(イ):下記式(1)で示されるジイモニウム化合物。 (a): Diimmonium compounds represented by the following formula (1).
式(1)中、R1~R8の少なくとも1個はメチル基である。 In formula (1), at least one of R 1 to R 8 is a methyl group.
(ロ):式(1)中のR1~R8がメチル基である(イ)に記載のジイモニウム化合物。 (b): The diimmonium compound according to (a), wherein R 1 to R 8 in formula (1) are methyl groups.
(ハ):上記(イ)又は(ロ)に記載されたジイモニウム化合物を含有することを特徴とする樹脂組成物。 (c): A resin composition characterized by containing the diimmonium compound described in (a) or (b) above.
(二):さらにポリカーボネートを含有する(ハ)に記載の樹脂組成物。 (2): The resin composition according to (3), which further contains polycarbonate.
(ホ):上記(イ)又は(ロ)に記載されたジイモニウム化合物を含有する樹脂層を少なくとも積層してなることを特徴とする近赤外線カットフィルタ。 (E): A near-infrared cut filter comprising at least a laminate of resin layers containing the diimmonium compound described in (A) or (B) above.
(ヘ):融点が250℃以上である(イ)に記載のジイモニウム化合物。 (f): The diimmonium compound according to (a), which has a melting point of 250° C. or higher.
本発明のジイモニウム化合物は、近赤外線吸収色素として耐熱性に優れ、長期間にわたって近赤外線吸収能力が低下することなく、かつ、樹脂基材との分散・加工性に優れ、広範囲の近赤外線吸収能を有するという特徴がある。また化合物自体が重金属を含有しないので環境に対する問題がない。 The diimmonium compound of the present invention has excellent heat resistance as a near-infrared absorbing dye, does not deteriorate in near-infrared absorbing ability over a long period of time, and has excellent dispersibility and workability with a resin substrate, and has a wide range of near-infrared absorbing ability. is characterized by having Moreover, since the compound itself does not contain heavy metals, there is no environmental problem.
従って、本発明のジイモニウム化合物を近赤外線吸収色素として含有させた樹脂組成物は、撮像素子に用いられる光学フィルタ(近赤外線カットフィルタ)に好適に用いることができる。 Therefore, the resin composition containing the diimmonium compound of the present invention as a near-infrared absorbing dye can be suitably used for optical filters (near-infrared cut filters) used in imaging devices.
本発明のジイモニウム化合物は、下記一般式(1)で表される化合物である。 The dimonium compound of the present invention is a compound represented by the following general formula (1).
式(1)中、R1~R8の少なくとも1個はメチル基である。このうち、式(1)において、R1~R8が全てメチル基であるものが、耐熱性及び近赤外線吸収能力の点で更に好ましい。 In formula (1), at least one of R 1 to R 8 is a methyl group. Among these, those in which all of R 1 to R 8 in formula (1) are methyl groups are more preferable from the viewpoint of heat resistance and near-infrared absorption capability.
本発明の式(1)で表されるジイモニウム化合物は、公知の方法で得ることができる。即ち、p-フェニレンジアミンと1-クロロ-4-ニトロベンゼンをウルマン反応させて得られた生成物を還元することにより得られる下記式(2)、 The diimmonium compound represented by Formula (1) of the present invention can be obtained by a known method. That is, the following formula (2) obtained by reducing the product obtained by the Ullmann reaction of p-phenylenediamine and 1-chloro-4-nitrobenzene,
で表される化合物を有機溶媒中、好ましくはDMF(ジメチルホルムアミド)、DMI(ジメチルイミダゾリノン)又はNMP(N-メチルピロリドン)等の水溶性極性溶媒中、30~160℃、好ましくは50~140℃で、所望のR1~R8に対応するハロゲン化化合物(例えば、R1~R8がメチル基のときはCH3Br)と反応させて、全ての置換基(R1~R8)が同一である下記式(3)の化合物(以下、全置換体と記す)を得ることができる。 in an organic solvent, preferably in a water-soluble polar solvent such as DMF (dimethylformamide), DMI (dimethylimidazolinone) or NMP (N-methylpyrrolidone), at 30 to 160 ° C., preferably at 50 to 140 ° C., with a halogenated compound corresponding to the desired R 1 to R 8 (eg, CH 3 Br when R 1 to R 8 are methyl groups) to remove all substituents (R 1 to R 8 ). are the same (hereinafter referred to as a fully substituted compound) of the following formula (3).
本発明のジイモニウム化合物の合成方法としては、公知の方法によりジイモニウム化合物を調製した後、そのアニオン部分をテトラキス(ペンタフルオロフェニル)ホウ酸と交換すればよい。 As a method for synthesizing the diimmonium compound of the present invention, after preparing the diimmonium compound by a known method, the anion portion thereof may be replaced with tetrakis(pentafluorophenyl)boric acid.
より具体的には、例えば、国際公開公報WO2006/082945に記載の方法に従って調製されたテトラキス(ペンタフルオロフェニル)ホウ酸をアニオン成分とし、これに銀を作用させてテトラキス(ペンタフルオロフェニル)ホウ酸銀と、上記一般式(3)で表されるイモニウム化合物を、N-メチル-2-ピロリドン、ジメチルホルムアミド(以下、「DMF」と略記する)、アセトニトリル等の有機溶媒中、温度30~150℃で反応させ、析出した銀を濾別した後、水、酢酸エチルまたはヘキサン等の溶媒を加え、生じた沈殿を濾過することにより、本発明のジイモニウム化合物を得ることができる。 More specifically, for example, tetrakis(pentafluorophenyl)boric acid prepared according to the method described in International Publication WO2006/082945 is used as an anion component, and silver is allowed to act thereon to produce tetrakis(pentafluorophenyl)boric acid. Silver and the imonium compound represented by the general formula (3) are treated in an organic solvent such as N-methyl-2-pyrrolidone, dimethylformamide (hereinafter abbreviated as "DMF"), acetonitrile, etc. at a temperature of 30 to 150°C. and after filtering off the precipitated silver, a solvent such as water, ethyl acetate or hexane is added, and the resulting precipitate is filtered to obtain the diimmonium compound of the present invention.
このようにして得られた本発明のジイモニウム塩化合物は、近赤外線吸収色素として有用なものであるが、これを利用し、キャスト法や溶融押し出し法等の公知の方法により、近赤外線吸収能を有する樹脂組成物を作製することができる。 The diimmonium salt compound of the present invention thus obtained is useful as a near-infrared absorbing dye. It is possible to produce a resin composition having
このうちキャスト法は、本発明のジイモニウム化合物(近赤外線吸収色素)を、高分子樹脂及び溶剤を混合させた溶液中に、溶解または分散させた後、ポリエステルやポリカーボネート等の透明なフィルム、パネルまたはガラス基板上に当該溶液を塗布、乾燥させてフィルム状に成膜させる方法である。 Among these methods, the casting method involves dissolving or dispersing the diimmonium compound (near-infrared absorbing dye) of the present invention in a solution in which a polymer resin and a solvent are mixed, and then forming a transparent film, panel, or film such as polyester or polycarbonate. In this method, the solution is applied onto a glass substrate and dried to form a film.
上記樹脂としては、透明な樹脂が用いられ、例えば、アクリル系樹脂、ポリエステル系樹脂、ポリカーボネート、ウレタン系樹脂、セルロース系樹脂、ポリイソシアナート、ポリアリレート、エポキシ系樹脂等があげられる。 As the resin, a transparent resin is used, and examples thereof include acrylic resins, polyester resins, polycarbonates, urethane resins, cellulose resins, polyisocyanates, polyarylates, and epoxy resins.
また、上記溶媒としては、樹脂を溶解することが可能であれば特に限定はされないが、例えば、メチルエチルケトン、メチルイソブチルケトン、トルエン、キシレン、テトラヒドロフラン、1,4-ジオキサン等の有機溶剤またはこれらを混合させた溶媒を用いることができる。 The solvent is not particularly limited as long as it can dissolve the resin. Examples include organic solvents such as methyl ethyl ketone, methyl isobutyl ketone, toluene, xylene, tetrahydrofuran, and 1,4-dioxane, or mixtures thereof. Any solvent can be used.
一方、溶融押し出し法は、本発明のジイモニウム化合物を高分子樹脂中に、溶融、混練させた後、押し出し成型によりパネル状に成型させるものである。本発明のジイモニウム化合物は高耐熱性を有するため、高温での溶融、混錬をすることができる。 On the other hand, in the melt extrusion method, the dimonium compound of the present invention is melted and kneaded in a polymer resin, and then extruded into a panel shape. Since the dimonium compound of the present invention has high heat resistance, it can be melted and kneaded at high temperatures.
上記樹脂としては、透明な樹脂が用いられ、例えば、アクリル系樹脂、ポリエステル系樹脂、ポリカーボネート等が挙げられる。 As the resin, a transparent resin is used, and examples thereof include acrylic resins, polyester resins, and polycarbonate.
本発明のジイモニウム化合物は、近赤外線吸収色素としてこれを単独で用いるか、あるいは、波長850nm付近の近赤外線遮断性能を補うため、フタロシアニン類やジチオール系金属錯体等の公知色素を添加させて用いることができる。また、耐光性を向上させるためにベンゾフェノン系やベンゾトリアゾール系等の紫外線吸収色素を添加させて用いてもよい。さらに、必要に応じて、可視光領域に吸収を持つ公知色素を添加させて、色調を調えてもよい。 The diimmonium compound of the present invention can be used alone as a near-infrared absorbing dye, or can be used by adding a known dye such as phthalocyanines or a dithiol-based metal complex to supplement near-infrared blocking performance at a wavelength of around 850 nm. can be done. Moreover, in order to improve the light resistance, a benzophenone-based or benzotriazole-based ultraviolet absorbing dye may be added and used. Furthermore, if necessary, a known dye having absorption in the visible light region may be added to adjust the color tone.
本発明において、ジイモニウム化合物の融点とは、熱重量-示差熱分析装置(TG-DTA)(例えば、NEXTA STA300(日立ハイテクサイエンス社製)に準ずる装置)を用い、アルミニウム製のオープパンにジイモニウム化合物約5mgを計量し、ジイモニウム化合物を10℃/分の速度で昇温した時の融解ピークを記録し、ジイモニウム化合物の融解ピークの最大値に対する温度(℃)である。 In the present invention, the melting point of the diimmonium compound is measured using a thermogravimetric-differential thermal analyzer (TG-DTA) (for example, an apparatus according to NEXTA STA300 (manufactured by Hitachi High-Tech Science)), and the diimonium compound is placed in an aluminum open pan. 5 mg was weighed and the melting peak was recorded when the temperature of the diimmonium compound was increased at a rate of 10°C/min.
本発明の近赤外線カットフィルタ(光学フィルタ)は、基材上に設けたものでも、又、基材自体であってもよい。基材としては、一般に光学フィルタに使用できるものであれば特に制限されないが、通常、ガラス若しくは樹脂製の基材が使用される。層の厚みは通常0.05μm~10mm程度であるが、近赤外線カット率等の目的に応じて適宜決定される。また、CCDやCMOS等の撮像素子自体を基材とすることもできる。 The near-infrared cut filter (optical filter) of the present invention may be provided on a substrate or may be the substrate itself. The base material is not particularly limited as long as it can be used in general optical filters, but a base material made of glass or resin is usually used. The thickness of the layer is usually about 0.05 μm to 10 mm, but it is appropriately determined according to the purpose such as near-infrared cut rate. Also, an imaging element such as a CCD or CMOS may be used as the base material.
本発明の近赤外線カットフィルタに用いられる近赤外線吸収色素の含有率も、目的とする近赤外線カット率に応じて適宜決定される。用いられる樹脂製の基材としては、例えば、ポリエチレン、ポリシクロアルカン、ポリシクロオレフィン、ポリスチレン、ポリアクリル酸、ポリアクリル酸エステル、ポリ酢酸ビニル、ポリアクリロニトリル、ポリ塩化ビニル、ポリフッ化ビニル等のビニル化合物、及びそれらのビニル化合物の付加重合体、ポリメタクリル酸、ポリメタクリル酸エステル、ポリ塩化ビニリデン、ポリフッ化ビニリデン、ポリシアン化ビニリデン、フッ化ビニリデン/トリフルオロエチレン共重合体、フッ化ビニリデン/テトラフルオロエチレン共重合体、シアン化ビニリデン/酢酸ビニル共重合体等のビニル化合物又はフッ素系化合物の共重合体、ポリトリフルオロエチレン、ポリテトラフルオロエチレン、ポリヘキサフルオロプロピレン等のフッ素を含む樹脂、ナイロン6、ナイロン66等のポリアミド、ポリイミド、ポリウレタン、ポリペプチド、ポリエチレンテレフタレート等のポリエステル、ポリカーボネート、ポリオキシメチレン等のポリエーテル、エポキシ樹脂、ポリビニルアルコール、ポリビニルブチラール等が挙げられる。 The content of the near-infrared absorbing dye used in the near-infrared cut filter of the present invention is also appropriately determined according to the desired near-infrared cut rate. Examples of resin substrates to be used include polyethylene, polycycloalkane, polycycloolefin, polystyrene, polyacrylic acid, polyacrylic acid ester, polyvinyl acetate, polyacrylonitrile, polyvinyl chloride, polyvinyl fluoride, and other vinyls. compounds, and addition polymers of their vinyl compounds, polymethacrylic acid, polymethacrylic acid esters, polyvinylidene chloride, polyvinylidene fluoride, polyvinylidene cyanide, vinylidene fluoride/trifluoroethylene copolymer, vinylidene fluoride/tetrafluoro Ethylene copolymers, vinyl compounds such as vinylidene cyanide/vinyl acetate copolymers or copolymers of fluorine compounds, resins containing fluorine such as polytrifluoroethylene, polytetrafluoroethylene, polyhexafluoropropylene, etc., nylon 6 , polyamides such as nylon 66, polyimides, polyurethanes, polypeptides, polyesters such as polyethylene terephthalate, polycarbonates, polyethers such as polyoxymethylene, epoxy resins, polyvinyl alcohol and polyvinyl butyral.
本発明の近赤外線カットフィルタ(光学フィルタ)を作製する方法は特に制限されるものではなく、それ自身公知の方法が利用でき、例えば、1)熱硬化性樹脂と硬化剤、近赤外線吸収色素から構成される熱硬化性樹脂組成物とし、成型後、加熱硬化して樹脂板又はフィルムを作製する方法、2)近赤外線吸収色素を含有する塗料を作製し、樹脂組成物とし、透明樹脂板、透明フィルム、透明ガラス板、又は撮像素子にコーティングする方法、3)近赤外線吸収色素及び樹脂(接着剤)を含有させた組成物(本発明の熱硬化性樹脂組成物)を作製し、合わせ樹脂板、合わせ樹脂フィルム、又は合わせガラス板を作製する方法、等である。 The method for producing the near-infrared cut filter (optical filter) of the present invention is not particularly limited, and a method known per se can be used. A method of producing a resin plate or film by forming a thermosetting resin composition, molding and then heat curing to produce a resin plate or film, 2) preparing a paint containing a near-infrared absorbing dye, forming a resin composition, forming a transparent resin plate, 3) A method of coating a transparent film, a transparent glass plate, or an imaging device; a method of making a plate, a laminated resin film, or a laminated glass plate;
1)の方法は、熱硬化性樹脂と硬化剤、近赤外線吸収色素からなる熱硬化性樹脂組成物を作製し、型内に注入、加熱反応させて硬化させるか、又は、金型に流し込んで型内で硬い製品となるまで加熱反応させて成形する方法が挙げられる。用いられる組成によって加工温度、フィルム化(樹脂板化)条件等が多少異なるが、通常100~200℃で30分~5時間程度の硬化条件が適用される。近赤外線吸収色素の添加量は、作製する樹脂板又はフィルムの厚み、吸収強度、可視光透過率等によって異なるが、通常、基材樹脂の1質量部に対して0.01~30質量%程度、好ましくは0.01~15質量%程度使用される。 In the method of 1), a thermosetting resin composition consisting of a thermosetting resin, a curing agent, and a near-infrared absorbing dye is prepared, injected into a mold, and cured by heat reaction, or poured into a mold. A method of molding by heating and reacting in a mold until it becomes a hard product can be mentioned. Although the processing temperature, film forming (resin board forming) conditions and the like differ slightly depending on the composition used, curing conditions of about 100 to 200° C. for about 30 minutes to 5 hours are usually applied. The amount of the near-infrared absorbing dye added varies depending on the thickness, absorption intensity, visible light transmittance, etc. of the resin plate or film to be produced, but is usually about 0.01 to 30% by mass with respect to 1 part by mass of the base resin. , preferably about 0.01 to 15% by mass.
2)の方法は、近赤外線吸収色素をバインダー樹脂に溶解、もしくは分散させることで塗料化する方法であり、塗料化する際に溶媒を用いることもできる。溶媒としては、ハロゲン化合物、アルコール化合物、ケトン化合物、エステル化合物、脂肪族炭化水素化合物、芳香族炭化水素化合物、エーテル化合物、又は、それらを混合し溶媒として用いることができる。近赤外線吸収色素の濃度は、作製するコーティングの厚み、吸収強度、可視光透過率によって異なるが、バインダー樹脂1質量部に対して通常0.01~30質量%程度である。このようにして得られた塗料を透明樹脂板、透明フィルム、透明ガラス板、又は撮像素子等の上にスピンコーター、バーコーター、ロールコーター、グラビアコーター、オフセットコーター、スプレー等でコーティングして近赤外線カットフィルタ、又はそれを具備した撮像素子を得ることができる。 Method 2) is a method of dissolving or dispersing a near-infrared absorbing colorant in a binder resin to form a paint, and a solvent can also be used when forming the paint. As the solvent, a halogen compound, an alcohol compound, a ketone compound, an ester compound, an aliphatic hydrocarbon compound, an aromatic hydrocarbon compound, an ether compound, or a mixture thereof can be used as a solvent. The concentration of the near-infrared absorbing dye varies depending on the thickness, absorption intensity, and visible light transmittance of the coating to be produced, but is usually about 0.01 to 30% by mass with respect to 1 part by mass of the binder resin. The paint thus obtained is coated on a transparent resin plate, transparent film, transparent glass plate, imaging device, or the like using a spin coater, bar coater, roll coater, gravure coater, offset coater, spray, or the like, and near-infrared rays are emitted. It is possible to obtain a cut filter or an imaging device equipped with it.
3)の方法は、シリコン系、ウレタン系、アクリル系等の樹脂化合物用の、ポリビニルブチラール接着剤、エチレン-酢酸ビニル系接着剤等の合わせガラス用のそれ自身公知の透明接着剤に、近赤外線吸収色素を0.1~30質量%程度添加した熱硬化性樹脂組成物を用い、透明な樹脂板同士、樹脂板と樹脂フィルム、樹脂板とガラス、樹脂フィルム同士、樹脂フィルムとガラス、ガラス同士を接着することにより近赤外線カットフィルタを作製する。尚、それぞれの方法で混練・混合の際、紫外線吸収剤、可塑剤等の樹脂成形に用いる通常の添加剤を加えてもよい。 In the method 3), near-infrared rays are applied to known transparent adhesives for laminated glass such as polyvinyl butyral adhesives and ethylene-vinyl acetate adhesives for resin compounds such as silicon, urethane, and acrylic. Using a thermosetting resin composition to which about 0.1 to 30% by mass of absorbing dye is added, transparent resin plates, resin plate and resin film, resin plate and glass, resin film and resin film, glass and glass A near-infrared cut filter is produced by bonding. Incidentally, during kneading and mixing in each method, ordinary additives used in resin molding such as ultraviolet absorbers and plasticizers may be added.
以下に実施例を用いて、本発明を更に詳細に説明するが、本発明はこれら実施例に何ら限定されるものではない。なお、実施例中、「質量%」は単に「%」と、「重量部」は単に「部」と略記する。 EXAMPLES The present invention will be described in more detail below using Examples, but the present invention is not limited to these Examples. In the examples, "% by mass" is simply abbreviated as "%", and "parts by weight" is simply abbreviated as "parts".
実施例1
(1)DMF100部に、テトラキス(ペンタフルオロフェニル)ホウ酸銀31.9部及びN,N,N’,N’-テトラキス(p-ジメチルアミノフェニル)-p-フェニレンジアミン11.8部を加え、60℃で3時間反応させ、生成した銀を濾別した。次いで、当該濾液に水315部を添加し、生成した沈殿を濾過後、乾燥させて、テトラキス(ペンタフルオロフェニル)ホウ酸N,N,N’,N’-テトラキス(p-ジメチルアミノフェニル)-p-フェニレンジイモニウム33.3部を得た。このものは近赤外線吸収色素であり、最大吸収波長(以下、「λmax」と略記する。)が1046nm、モル吸光係数が93000[L・mol-1・cm-1]であった。
(2)得られた色素を190℃、210℃、230℃の各温度にてそれぞれ加熱した場合の耐熱性を評価した。具体的には、アセトンに当該色素粉末を溶解し、10~20mg/Lの濃度に調整した溶液を準備した。この溶液を分光光度計で測定し、波長1000nmにおける初期(加熱前)のモル吸光係数を測定した。
各温度下にて当該色素粉末を60分静置した後、同様に調整した溶液のモル吸光係数を測定し、加熱後のモル吸光係数の初期(加熱前)のモル吸光係数に対する百分率を色素残存率として評価した。この結果を表1に示す。
Example 1
(1) To 100 parts of DMF, 31.9 parts of silver tetrakis(pentafluorophenyl)borate and 11.8 parts of N,N,N',N'-tetrakis(p-dimethylaminophenyl)-p-phenylenediamine are added. , and 60° C. for 3 hours, and the produced silver was filtered off. Next, 315 parts of water is added to the filtrate, and the formed precipitate is filtered and dried to give N,N,N',N'-tetrakis(p-dimethylaminophenyl)-tetrakis(pentafluorophenyl)borate. 33.3 parts of p-phenylenediimonium are obtained. This was a near-infrared absorbing dye, and had a maximum absorption wavelength (hereinafter abbreviated as "λmax") of 1046 nm and a molar extinction coefficient of 93000 [L·mol −1 ·cm −1 ].
(2) Heat resistance was evaluated when the dye obtained was heated at temperatures of 190°C, 210°C and 230°C. Specifically, the pigment powder was dissolved in acetone to prepare a solution adjusted to a concentration of 10 to 20 mg/L. This solution was measured with a spectrophotometer to measure the initial (before heating) molar extinction coefficient at a wavelength of 1000 nm.
After the dye powder was allowed to stand at each temperature for 60 minutes, the molar extinction coefficient of the solution prepared in the same manner was measured, and the percentage of the molar extinction coefficient after heating to the initial molar extinction coefficient (before heating) was calculated. evaluated as a rate. The results are shown in Table 1.
比較例1
DMF100部に、テトラキス(ペンタフルオロフェニル)ホウ酸銀20.3部及びN,N,N’,N’-テトラキス(p-ジイソブチルアミノフェニル)-p-フェニレンジアミン11.8部を加え、60℃で3時間反応させ、生成した銀を濾別した。次いで、当該濾液に水200部を添加し、生成した沈殿を濾過後、乾燥させて、テトラキス(ペンタフルオロフェニル)ホウ酸N,N,N’,N’-テトラキス(p-ジイソブチルアミノフェニル)-p-フェニレンジイモニウム24.8部を得た。このものは近赤外線吸収色素であり、最大吸収波長(以下、「λmax」と略記する。)が1077nm、モル吸光係数が105000[L・mol-1・cm-1]であった。
得られた色素について実施例1と同様に評価した。この結果を表1に示す。
Comparative example 1
20.3 parts of silver tetrakis(pentafluorophenyl)borate and 11.8 parts of N,N,N',N'-tetrakis(p-diisobutylaminophenyl)-p-phenylenediamine were added to 100 parts of DMF, and the temperature was 60°C. for 3 hours, and the silver produced was filtered off. Next, 200 parts of water is added to the filtrate, and the formed precipitate is filtered and dried to give N,N,N',N'-tetrakis(p-diisobutylaminophenyl)-tetrakis(pentafluorophenyl)borate. 24.8 parts of p-phenylenediimonium were obtained. This was a near-infrared absorbing dye, and had a maximum absorption wavelength (hereinafter abbreviated as "λmax") of 1077 nm and a molar extinction coefficient of 105000 [L·mol −1 ·cm −1 ].
The dye obtained was evaluated in the same manner as in Example 1. The results are shown in Table 1.
比較例2
DMF157.5部に、ビス(トリフルオロメタンスルホン)イミド酸銀15.7部及びN,N,N’,N’-テトラキス(p-ジメチルアミノフェニル)-p-フェニレンジアミン11.8部を加え、60℃で3時間反応させ、生成した銀を濾別した。次いで、当該濾液に水315部を添加し、生成した沈殿を濾過後、乾燥させて、ビス(トリフルオロメタンスルホン)イミド酸N,N,N’,N’-テトラキス(p-ジメチルアミノフェニル)-p-フェニレンジイモニウム19.2部を得た。このものは近赤外線吸収色素であり、最大吸収波長(以下、「λmax」と略記する。)が1046nm、モル吸光係数が93000[L・mol-1・cm-1]であった。
得られた色素について実施例1と同様に評価した。この結果を表1に示す。
Comparative example 2
To 157.5 parts of DMF, 15.7 parts of silver bis(trifluoromethanesulfone)imidate and 11.8 parts of N,N,N',N'-tetrakis(p-dimethylaminophenyl)-p-phenylenediamine are added, The reaction was carried out at 60° C. for 3 hours, and the produced silver was separated by filtration. Next, 315 parts of water is added to the filtrate, and the formed precipitate is filtered and dried to obtain bis(trifluoromethanesulfone)imidic acid N,N,N',N'-tetrakis(p-dimethylaminophenyl)- 19.2 parts of p-phenylenediimonium are obtained. This was a near-infrared absorbing dye, and had a maximum absorption wavelength (hereinafter abbreviated as "λmax") of 1046 nm and a molar extinction coefficient of 93000 [L·mol −1 ·cm −1 ].
The dye obtained was evaluated in the same manner as in Example 1. The results are shown in Table 1.
比較例3
DMF100部に、ビス(トリフルオロメタンスルホン)イミド酸銀10部及びN,N,N’,N’-テトラキス(p-ジイソブチルアミノフェニル)-p-フェニレンジアミン11.8部を加え、60℃で3時間反応させ、生成した銀を濾別した。次いで、当該濾液に水200部を添加し、生成した沈殿を濾過後、乾燥させて、ビス(トリフルオロメタンスルホン)イミド酸N,N,N’,N’-テトラキス(p-ジイソブチルアミノフェニル)-p-フェニレンジイモニウム15.7部を得た。このものは近赤外線吸収色素であり、最大吸収波長(以下、「λmax」と略記する。)が1077nm、モル吸光係数が105000[L・mol-1・cm-1]であった。
得られた色素について実施例1と同様に評価した。この結果を表1に示す。
Comparative example 3
10 parts of silver bis(trifluoromethanesulfone)imidate and 11.8 parts of N,N,N',N'-tetrakis(p-diisobutylaminophenyl)-p-phenylenediamine were added to 100 parts of DMF, and the mixture was stirred at 60°C for 3 hours. After reacting for some time, the silver produced was separated by filtration. Next, 200 parts of water is added to the filtrate, and the formed precipitate is filtered and dried to obtain bis(trifluoromethanesulfone)imidic acid N,N,N',N'-tetrakis(p-diisobutylaminophenyl)- 15.7 parts of p-phenylenediimonium are obtained. This was a near-infrared absorbing dye, and had a maximum absorption wavelength (hereinafter abbreviated as "λmax") of 1077 nm and a molar extinction coefficient of 105000 [L·mol −1 ·cm −1 ].
The dye obtained was evaluated in the same manner as in Example 1. The results are shown in Table 1.
比較例4
DMF100部に、テトラキス(ペンタフルオロフェニル)ホウ酸銀20.3部及びN,N,N’,N’-テトラキス(p-ジブチルアミノフェニル)-p-フェニレンジアミン11.8部を加え、60℃で3時間反応させ、生成した銀を濾別した。次いで、当該濾液に水200部を添加し、生成した沈殿を濾過後、乾燥させて、テトラキス(ペンタフルオロフェニル)ホウ酸N,N,N’,N’-テトラキス(p-ジブチルアミノフェニル)-p-フェニレンジイモニウム24.8部を得た。このものは近赤外線吸収色素であり、最大吸収波長(以下、「λmax」と略記する。)が1072nm、モル吸光係数が102000[L・mol-1・cm-1]であった。
得られた色素について実施例1と同様に耐熱性を評価した。この結果を表1に示す。
Comparative example 4
20.3 parts of silver tetrakis(pentafluorophenyl)borate and 11.8 parts of N,N,N',N'-tetrakis(p-dibutylaminophenyl)-p-phenylenediamine were added to 100 parts of DMF, and the temperature was 60°C. for 3 hours, and the silver produced was filtered off. Next, 200 parts of water is added to the filtrate, and the formed precipitate is filtered and dried to give N,N,N',N'-tetrakis(p-dibutylaminophenyl)-tetrakis(pentafluorophenyl)borate. 24.8 parts of p-phenylenediimonium were obtained. This was a near-infrared absorbing dye, and had a maximum absorption wavelength (hereinafter abbreviated as "λmax") of 1072 nm and a molar extinction coefficient of 102000 [L·mol −1 ·cm −1 ].
The heat resistance of the obtained dye was evaluated in the same manner as in Example 1. The results are shown in Table 1.
比較例5
DMF100部に、ビス(トリフルオロメタンスルホン)イミド酸銀10部及びN,N,N’,N’-テトラキス(p-ジブチルアミノフェニル)-p-フェニレンジアミン11.8部を加え、60℃で3時間反応させ、生成した銀を濾別した。次いで、当該濾液に水200部を添加し、生成した沈殿を濾過後、乾燥させて、ビス(トリフルオロメタンスルホン)イミド酸N,N,N’,N’-テトラキス(p-ジブチルアミノフェニル)-p-フェニレンジイモニウム15.7部を得た。このものは近赤外線吸収色素であり、最大吸収波長(以下、「λmax」と略記する。)が1072nm、モル吸光係数が102000[L・mol-1・cm-1]であった。
得られた色素について実施例1と同様に耐熱性を評価した。この結果を表1に示す。
Comparative example 5
10 parts of silver bis(trifluoromethanesulfone)imidate and 11.8 parts of N,N,N',N'-tetrakis(p-dibutylaminophenyl)-p-phenylenediamine were added to 100 parts of DMF, and the mixture was stirred at 60°C for 3 hours. After reacting for some time, the silver produced was separated by filtration. Then, 200 parts of water is added to the filtrate, and the formed precipitate is filtered and dried to obtain bis(trifluoromethanesulfone)imidic acid N,N,N',N'-tetrakis(p-dibutylaminophenyl)- 15.7 parts of p-phenylenediimonium are obtained. This was a near-infrared absorbing dye, and had a maximum absorption wavelength (hereinafter abbreviated as "λmax") of 1072 nm and a molar extinction coefficient of 102000 [L·mol −1 ·cm −1 ].
The heat resistance of the obtained dye was evaluated in the same manner as in Example 1. The results are shown in Table 1.
比較例6
DMF132部に、テトラキス(ペンタフルオロフェニル)ホウ酸銀26.8部及びN,N,N’,N’-テトラキス(p-ジエチルアミノフェニル)-p-フェニレンジアミン11.8部を加え、60℃で3時間反応させ、生成した銀を濾別した。次いで、当該濾液に水264部を添加し、生成した沈殿を濾過後、乾燥させて、テトラキス(ペンタフルオロフェニル)ホウ酸N,N,N’,N’-テトラキス(p-ジエチルアミノフェニル)-p-フェニレンジイモニウム29.6部を得た。このものは近赤外線吸収色素であり、最大吸収波長(以下、「λmax」と略記する。)が1057nm、モル吸光係数が99700[L・mol-1・cm-1]であった。
得られた色素について実施例1と同様に耐熱性を評価した。この結果を表1に示す。
Comparative example 6
26.8 parts of silver tetrakis(pentafluorophenyl)borate and 11.8 parts of N,N,N',N'-tetrakis(p-diethylaminophenyl)-p-phenylenediamine were added to 132 parts of DMF, and the mixture was stirred at 60°C. After reacting for 3 hours, the produced silver was separated by filtration. Next, 264 parts of water is added to the filtrate, and the formed precipitate is filtered and dried to give N,N,N',N'-tetrakis(p-diethylaminophenyl)-p tetrakis(pentafluorophenyl)borate. - 29.6 parts of phenylenediimonium are obtained. This was a near-infrared absorbing dye, and had a maximum absorption wavelength (hereinafter abbreviated as "λmax") of 1057 nm and a molar extinction coefficient of 99700 [L·mol −1 ·cm −1 ].
The heat resistance of the obtained dye was evaluated in the same manner as in Example 1. The results are shown in Table 1.
比較例7
DMF132部に、ビス(トリフルオロメタンスルホン)イミド酸銀13.2部及びN,N,N’,N’-テトラキス(p-ジエチルアミノフェニル)-p-フェニレンジアミン11.8部を加え、60℃で3時間反応させ、生成した銀を濾別した。次いで、当該濾液に水264部を添加し、生成した沈殿を濾過後、乾燥させて、ビス(トリフルオロメタンスルホン)イミド酸N,N,N’,N’-テトラキス(p-ジエチルアミノフェニル)-p-フェニレンジイモニウム17.7部を得た。このものは近赤外線吸収色素であり、最大吸収波長(以下、「λmax」と略記する。)が1057nm、モル吸光係数が99700[L・mol-1・cm-1]であった。
得られた色素について実施例1と同様に耐熱性を評価した。この結果を表1に示す。
Comparative example 7
To 132 parts of DMF, 13.2 parts of silver bis(trifluoromethanesulfone)imidate and 11.8 parts of N,N,N',N'-tetrakis(p-diethylaminophenyl)-p-phenylenediamine were added, and the mixture was stirred at 60°C. After reacting for 3 hours, the produced silver was separated by filtration. Then, 264 parts of water is added to the filtrate, and the formed precipitate is filtered and dried to obtain bis(trifluoromethanesulfone)imidic acid N,N,N',N'-tetrakis(p-diethylaminophenyl)-p. - 17.7 parts of phenylenediimonium are obtained. This was a near-infrared absorbing dye, and had a maximum absorption wavelength (hereinafter abbreviated as "λmax") of 1057 nm and a molar extinction coefficient of 99700 [L·mol −1 ·cm −1 ].
The heat resistance of the obtained dye was evaluated in the same manner as in Example 1. The results are shown in Table 1.
表1中、「カチオンの末端基」は、式(1)のR1~R8が該当の末端基であることを示し、「TEPB」は、テトラキス(ペンタフルオロフェニル)ホウ素アニオンを示し、「TFSI」は、ビス(トリフルオロメタンスルホニル)イミドアニオンを示す。 In Table 1, "cationic terminal group" indicates that R 1 to R 8 in formula (1) are corresponding terminal groups, "TEPB" indicates a tetrakis(pentafluorophenyl)boron anion, and "TFSI" denotes the bis(trifluoromethanesulfonyl)imide anion.
上記のとおり、本発明の実施例のジイモニウム化合物は、高耐熱性を有する。 As described above, the diimmonium compounds of the examples of the present invention have high heat resistance.
実施例2
実施例1で得られたジイモニウム化合物0.5部とポリカーボネート樹脂(パンライトL-1250Y、帝人(株)製)99.5部を二軸混練機(ラボプラストミル、東洋精機製作所(株)製)の供給口に投入し、温度260℃で溶融混錬して樹脂組成部を得た。得られた樹脂組成物を、熱プレス機を用いて温度230℃でプレスして、厚さ0.25mmの赤外線カットフィルタを得た。
Example 2
0.5 parts of the dimonium compound obtained in Example 1 and 99.5 parts of a polycarbonate resin (Panlite L-1250Y, manufactured by Teijin Limited) were mixed with a twin-screw kneader (Laboplastomill, manufactured by Toyo Seiki Seisakusho Co., Ltd.). ) and melt-kneaded at a temperature of 260° C. to obtain a resin composition part. The obtained resin composition was pressed at a temperature of 230° C. using a hot press to obtain an infrared cut filter with a thickness of 0.25 mm.
比較例8
実施例1のジイモニウム化合物を、比較例1に代えた以外は実施例2と同様にして、赤外線カットフィルタを得た。
Comparative example 8
An infrared cut filter was obtained in the same manner as in Example 2, except that the dimonium compound of Example 1 was replaced with Comparative Example 1.
比較例9
実施例1のジイモニウム化合物を、比較例2に代えた以外は実施例2と同様にして、赤外線カットフィルタを得た。
Comparative example 9
An infrared cut filter was obtained in the same manner as in Example 2, except that the dimonium compound of Example 1 was replaced with Comparative Example 2.
比較例10
実施例1のジイモニウム化合物を、比較例3に代えた以外は実施例2と同様にして、赤外線カットフィルタを得た。
Comparative example 10
An infrared cut filter was obtained in the same manner as in Example 2 except that the dimonium compound of Example 1 was replaced with Comparative Example 3.
比較例11
実施例1のジイモニウム化合物を、比較例4に代えた以外は実施例2と同様にして、赤外線カットフィルタを得た。
Comparative example 11
An infrared cut filter was obtained in the same manner as in Example 2, except that the dimonium compound of Example 1 was replaced with Comparative Example 4.
比較例12
実施例1のジイモニウム化合物を、比較例5に代えた以外は実施例2と同様にして、赤外線カットフィルタを得た。
Comparative example 12
An infrared cut filter was obtained in the same manner as in Example 2 except that the dimonium compound of Example 1 was replaced with Comparative Example 5.
比較例13
実施例1のジイモニウム化合物を、比較例6に代えた以外は実施例2と同様にして、赤外線カットフィルタを得た。
Comparative example 13
An infrared cut filter was obtained in the same manner as in Example 2 except that the dimonium compound of Example 1 was replaced with Comparative Example 6.
比較例14
実施例1のジイモニウム化合物を、比較例7に代えた以外は実施例2と同様にして、赤外線カットフィルタを得た。
Comparative example 14
An infrared cut filter was obtained in the same manner as in Example 2, except that the dimonium compound of Example 1 was replaced with Comparative Example 7.
得られた赤外線カットフィルタの波長1000nm、および500nmの透過率を分光光度計で測定した結果を表2に示す。 Table 2 shows the results of measuring the transmittance of the obtained infrared cut filter at wavelengths of 1000 nm and 500 nm with a spectrophotometer.
表2中、「カチオンの末端基」は、式(1)のR1~R8が該当の末端基であることを示し、「TEPB」は、テトラキス(ペンタフルオロフェニル)ホウ素アニオンを示し、「TFSI」は、ビス(トリフルオロメタンスルホニル)イミドアニオンを示す。 In Table 2, "cationic terminal group" indicates that R 1 to R 8 in formula (1) are the corresponding terminal groups, "TEPB" indicates a tetrakis(pentafluorophenyl)boron anion, and "TFSI" denotes the bis(trifluoromethanesulfonyl)imide anion.
上記のとおり、本発明の実施例の近赤外線カットフィルタは、広範囲の近赤外線吸収能及び高耐熱性を有する。 As described above, the near-infrared cut filter of the example of the present invention has a wide range of near-infrared absorbing power and high heat resistance.
本発明のジイモニウム化合物を含有した近赤外線吸収能を有する樹脂組成物は種々の用途に用いることができ、例えばPDP用近赤外線遮断フィルタ、自動車ガラス用ないし建材ガラス用近赤外線遮断フィルタ等に好適に用いることができる。更に、本発明の近赤外線吸収色素は、従来の用途である、CD-R、DVD-R等の光記録媒体用の色素またはクエンチャーとしても用いることができる。 The resin composition having a near-infrared absorbing ability containing the dimonium compound of the present invention can be used in various applications, and is suitable for, for example, a near-infrared blocking filter for PDP, a near-infrared blocking filter for automobile glass or building glass, and the like. can be used. Furthermore, the near-infrared absorbing dye of the present invention can also be used as a dye or quencher for conventional optical recording media such as CD-R and DVD-R.
本発明の近赤外線カットフィルタは、撮像素子用途やディスプレイの前面板に限らず、近赤外線をカットする必要があるフィルタフィルム、例えば、断熱フィルム、光学製品、サングラス等にも使用することが出来る。
The near-infrared cut filter of the present invention can be used not only for imaging devices and front panels of displays, but also for filter films that need to cut near-infrared rays, such as heat-insulating films, optical products, and sunglasses.
Claims (6)
The diimmonium compound according to claim 1, which has a melting point of 250°C or higher.
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