JP2021021932A5 - - Google Patents
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- JP2021021932A5 JP2021021932A5 JP2020070010A JP2020070010A JP2021021932A5 JP 2021021932 A5 JP2021021932 A5 JP 2021021932A5 JP 2020070010 A JP2020070010 A JP 2020070010A JP 2020070010 A JP2020070010 A JP 2020070010A JP 2021021932 A5 JP2021021932 A5 JP 2021021932A5
- Authority
- JP
- Japan
- Prior art keywords
- opening
- lens barrel
- optical device
- gas
- blowing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- 230000003287 optical effect Effects 0.000 claims 44
- 239000007789 gas Substances 0.000 claims 21
- 238000007664 blowing Methods 0.000 claims 14
- 239000007921 spray Substances 0.000 claims 7
- 239000000758 substrate Substances 0.000 claims 7
- 230000003749 cleanliness Effects 0.000 claims 4
- 230000007423 decrease Effects 0.000 claims 2
- 238000005507 spraying Methods 0.000 claims 2
- 239000011261 inert gas Substances 0.000 claims 1
- 238000004519 manufacturing process Methods 0.000 claims 1
- 238000000034 method Methods 0.000 claims 1
Claims (22)
前記開口の面積よりも大きい面積を有する表面を含み、前記表面が前記開口に面するように前記鏡筒に収容される光学部品と、
前記開口を取り囲むように配置され、前記表面に対して、前記鏡筒の外部の気体の清浄度よりも高い清浄度を有する気体を吹き付ける吹付部と、
を有することを特徴とする光学装置。 a lens barrel formed with an opening for passing light;
an optical component including a surface having an area larger than that of the opening, the optical component being accommodated in the lens barrel such that the surface faces the opening;
a blowing unit disposed so as to surround the opening and blowing a gas having a higher cleanliness than the gas outside the lens barrel onto the surface;
An optical device comprising:
前記開口上における前記鏡筒の外部の気体の流量が増加する場合には、前記吹付部が前記表面に吹き付ける気体の流量を増加させ、
前記開口上における前記鏡筒の外部の気体の流量が減少する場合には、前記吹付部が前記表面に吹き付ける気体の流量を減少させることを特徴とする請求項5に記載の光学装置。 The control unit
when the flow rate of the gas outside the lens barrel on the opening increases, increasing the flow rate of the gas that the spray unit blows onto the surface;
6. The optical device according to claim 5, wherein when the flow rate of the gas outside the lens barrel on the opening decreases, the flow rate of the gas that is blown onto the surface by the blowing section is reduced.
前記開口上における前記鏡筒の外部の気体の流量が増加する場合には、前記開口の端部と前記吹付部との間の距離が長くなるように、前記吹付部を前記表面に沿った方向に移動させ、
前記開口上における前記鏡筒の外部の気体の流量が減少する場合には、前記開口の端部と前記吹付部との間の距離が短くなるように、前記吹付部を前記表面に沿った方向に移動させることを特徴とする請求項9に記載の光学装置。 The first moving part is
When the flow rate of the gas outside the lens barrel on the opening increases, the blowing portion is moved along the surface so that the distance between the end of the opening and the blowing portion increases. to the
When the flow rate of the gas outside the lens barrel on the opening decreases, the blowing portion is moved along the surface so that the distance between the end of the opening and the blowing portion is shortened. 10. The optical device according to claim 9, wherein the optical device is moved to .
前記吹付部は、前記保持部材に保持されていることを特徴とする請求項1乃至14のうちいずれか1項に記載の光学装置。 further comprising a holding member provided on the lens barrel and holding the optical component;
15. The optical device according to any one of claims 1 to 14, wherein the spraying portion is held by the holding member.
前記開口の面積よりも大きい面積を有する表面を含み、前記表面が前記開口に面するように前記鏡筒に収容される光学部品と、
前記鏡筒に設けられた遮蔽部とを備えた光学装置であって、
前記鏡筒の外部の気体の清浄度よりも高い清浄度を有する気体が、前記遮蔽部と前記光学部品との間の空間を通過して前記開口に向かって流れるように、前記遮蔽部が設けられていることを特徴とする光学装置。 a lens barrel formed with an opening for passing light;
an optical component including a surface having an area larger than that of the opening, the optical component being accommodated in the lens barrel such that the surface faces the opening;
An optical device comprising a shielding portion provided in the lens barrel,
The shielding part is provided so that the gas having a higher cleanliness level than the gas outside the lens barrel flows toward the opening through the space between the shielding part and the optical component. An optical device characterized by comprising:
1/100<X/Y<1/5
を満たすことを特徴とする請求項18に記載の光学装置。 When the distance between the optical component and the shielding portion is X, and the distance between the optical component and the opening is Y,
1/100<X/Y<1/5
19. The optical device according to claim 18, wherein:
前記マスクを保持して移動するステージと、
前記マスクのパターンを前記基板に投影する投影光学系と、を有し、
前記投影光学系は、
前記マスクから射出されて前記投影光学系に入射する光を通過させる開口が形成された鏡筒と、
前記開口の面積よりも大きい面積を有する表面を含み、前記表面が前記開口に面するように前記鏡筒に収容される光学部品と、
前記開口を取り囲むように配置され、前記表面に対して、前記鏡筒の外部の気体の清浄度よりも高い清浄度を有する気体を吹き付ける吹付部と、
を含むことを特徴とする露光装置。 An exposure apparatus that exposes a substrate through a mask,
a stage that holds and moves the mask;
a projection optical system for projecting the pattern of the mask onto the substrate;
The projection optical system is
a lens barrel having an aperture through which light emitted from the mask and incident on the projection optical system passes;
an optical component including a surface having an area larger than that of the opening, the optical component being accommodated in the lens barrel such that the surface faces the opening;
a blowing unit disposed so as to surround the opening and blowing a gas having a higher cleanliness than the gas outside the lens barrel onto the surface;
An exposure apparatus comprising:
前記マスクを保持して移動するステージと、
前記マスクのパターンを前記基板に投影する投影光学系と、を有し、
前記投影光学系は、
前記マスクから射出された前記投影光学系に入射する光を通過させる開口が形成された鏡筒と、
前記開口の面積よりも大きい面積を有する表面を含み、前記表面が前記開口に面するように前記鏡筒に収容される光学部品と、
前記鏡筒に設けられた遮蔽部と、を含み、
前記鏡筒の外部の気体の清浄度よりも高い清浄度を有する気体が、前記遮蔽部と前記光学部品との間の空間を通過して前記開口に向かって流れるように、前記遮蔽部が設けられていることを特徴とする露光装置。 An exposure apparatus that exposes a substrate through a mask,
a stage that holds and moves the mask;
a projection optical system for projecting the pattern of the mask onto the substrate;
The projection optical system is
a lens barrel having an aperture through which light emitted from the mask and incident on the projection optical system passes;
an optical component including a surface having an area larger than that of the opening, the optical component being accommodated in the lens barrel such that the surface faces the opening;
and a shielding portion provided on the lens barrel,
The shielding part is provided so that the gas having a higher cleanliness level than the gas outside the lens barrel flows toward the opening through the space between the shielding part and the optical component. An exposure apparatus characterized by comprising:
露光した前記基板を現像する工程と、
現像された前記基板から物品を製造する工程と、
を有することを特徴とする物品の製造方法。 exposing a substrate using the exposure apparatus according to claim 20 or 21;
developing the exposed substrate;
producing an article from the developed substrate;
A method for manufacturing an article, comprising:
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020200086534A KR20210012917A (en) | 2019-07-25 | 2020-07-14 | Optical apparatus, exposure apparatus, and method of manufacturing article |
CN202410773083.1A CN118550164A (en) | 2019-07-25 | 2020-07-21 | Optical device, exposure device, and article manufacturing method |
CN202010704311.1A CN112286002B (en) | 2019-07-25 | 2020-07-21 | Optical device, exposure device, and article manufacturing method |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2019137081 | 2019-07-25 | ||
JP2019137081 | 2019-07-25 |
Publications (3)
Publication Number | Publication Date |
---|---|
JP2021021932A JP2021021932A (en) | 2021-02-18 |
JP2021021932A5 true JP2021021932A5 (en) | 2023-04-03 |
JP7425661B2 JP7425661B2 (en) | 2024-01-31 |
Family
ID=74573268
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2020070010A Active JP7425661B2 (en) | 2019-07-25 | 2020-04-08 | Optical device, exposure device, and article manufacturing method |
Country Status (1)
Country | Link |
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JP (1) | JP7425661B2 (en) |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH08181058A (en) * | 1994-12-27 | 1996-07-12 | Sony Corp | Projection and exposure method and projection aligner used for it |
WO1998057213A1 (en) * | 1997-06-10 | 1998-12-17 | Nikon Corporation | Optical device, method of cleaning the same, projection aligner, and method of producing the same |
JP3531914B2 (en) * | 2000-04-14 | 2004-05-31 | キヤノン株式会社 | Optical apparatus, exposure apparatus, and device manufacturing method |
JP2002328298A (en) * | 2001-05-01 | 2002-11-15 | Nikon Corp | Optical device, exposure device and method for manufacturing them |
JP3977377B2 (en) * | 2005-03-04 | 2007-09-19 | キヤノン株式会社 | Exposure apparatus and device manufacturing method |
JP2006339346A (en) * | 2005-06-01 | 2006-12-14 | Canon Inc | Exposure device |
JP2010230751A (en) * | 2009-03-26 | 2010-10-14 | Panasonic Corp | Imaging apparatus |
-
2020
- 2020-04-08 JP JP2020070010A patent/JP7425661B2/en active Active
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