JP2020537643A - 高分子アニオン伝導膜 - Google Patents
高分子アニオン伝導膜 Download PDFInfo
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- JP2020537643A JP2020537643A JP2020520125A JP2020520125A JP2020537643A JP 2020537643 A JP2020537643 A JP 2020537643A JP 2020520125 A JP2020520125 A JP 2020520125A JP 2020520125 A JP2020520125 A JP 2020520125A JP 2020537643 A JP2020537643 A JP 2020537643A
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- 229920000642 polymer Polymers 0.000 title claims abstract description 64
- 150000001450 anions Chemical class 0.000 title description 4
- 150000001875 compounds Chemical class 0.000 claims abstract description 108
- 238000000034 method Methods 0.000 claims abstract description 47
- 239000012528 membrane Substances 0.000 claims description 46
- -1 difluoro compound Chemical class 0.000 claims description 21
- 125000000217 alkyl group Chemical group 0.000 claims description 14
- 229910052757 nitrogen Inorganic materials 0.000 claims description 13
- 125000000129 anionic group Chemical group 0.000 claims description 12
- 239000003153 chemical reaction reagent Substances 0.000 claims description 9
- 239000000047 product Substances 0.000 claims description 7
- 150000002009 diols Chemical class 0.000 claims description 5
- 125000004432 carbon atom Chemical group C* 0.000 claims description 4
- 238000002848 electrochemical method Methods 0.000 claims description 4
- 230000002152 alkylating effect Effects 0.000 claims description 3
- 230000011987 methylation Effects 0.000 claims description 3
- 238000007069 methylation reaction Methods 0.000 claims description 3
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 claims description 2
- 229910052799 carbon Inorganic materials 0.000 claims description 2
- 239000007795 chemical reaction product Substances 0.000 claims description 2
- 238000000909 electrodialysis Methods 0.000 claims description 2
- 238000005868 electrolysis reaction Methods 0.000 claims description 2
- 239000000446 fuel Substances 0.000 claims description 2
- 230000001035 methylating effect Effects 0.000 claims description 2
- 125000004430 oxygen atom Chemical group O* 0.000 claims description 2
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims description 2
- 229910000077 silane Inorganic materials 0.000 claims description 2
- 238000006692 trifluoromethylation reaction Methods 0.000 claims description 2
- RAXXELZNTBOGNW-UHFFFAOYSA-N imidazole Natural products C1=CNC=N1 RAXXELZNTBOGNW-UHFFFAOYSA-N 0.000 abstract description 6
- RAXXELZNTBOGNW-UHFFFAOYSA-O Imidazolium Chemical compound C1=C[NH+]=CN1 RAXXELZNTBOGNW-UHFFFAOYSA-O 0.000 abstract description 2
- 238000010586 diagram Methods 0.000 abstract 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 52
- 239000000243 solution Substances 0.000 description 27
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 22
- 238000006243 chemical reaction Methods 0.000 description 21
- 239000000203 mixture Substances 0.000 description 20
- 239000011541 reaction mixture Substances 0.000 description 17
- 150000003254 radicals Chemical class 0.000 description 15
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 description 14
- 238000010438 heat treatment Methods 0.000 description 13
- QIGBRXMKCJKVMJ-UHFFFAOYSA-N Hydroquinone Chemical compound OC1=CC=C(O)C=C1 QIGBRXMKCJKVMJ-UHFFFAOYSA-N 0.000 description 12
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 12
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 12
- 238000003756 stirring Methods 0.000 description 11
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 10
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 9
- 239000008367 deionised water Substances 0.000 description 9
- 229910021641 deionized water Inorganic materials 0.000 description 9
- 238000001816 cooling Methods 0.000 description 8
- 239000011521 glass Substances 0.000 description 8
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 7
- INQOMBQAUSQDDS-UHFFFAOYSA-N iodomethane Chemical compound IC INQOMBQAUSQDDS-UHFFFAOYSA-N 0.000 description 7
- 238000005259 measurement Methods 0.000 description 7
- 125000005010 perfluoroalkyl group Chemical group 0.000 description 7
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 6
- OKJPEAGHQZHRQV-UHFFFAOYSA-N Triiodomethane Natural products IC(I)I OKJPEAGHQZHRQV-UHFFFAOYSA-N 0.000 description 6
- 230000015572 biosynthetic process Effects 0.000 description 6
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 6
- 125000004108 n-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 6
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 6
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 6
- GETQZCLCWQTVFV-UHFFFAOYSA-N trimethylamine Chemical compound CN(C)C GETQZCLCWQTVFV-UHFFFAOYSA-N 0.000 description 6
- HYZJCKYKOHLVJF-UHFFFAOYSA-N 1H-benzimidazole Chemical compound C1=CC=C2NC=NC2=C1 HYZJCKYKOHLVJF-UHFFFAOYSA-N 0.000 description 5
- 238000004519 manufacturing process Methods 0.000 description 5
- 239000007787 solid Substances 0.000 description 5
- LSQARZALBDFYQZ-UHFFFAOYSA-N 4,4'-difluorobenzophenone Chemical compound C1=CC(F)=CC=C1C(=O)C1=CC=C(F)C=C1 LSQARZALBDFYQZ-UHFFFAOYSA-N 0.000 description 4
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 4
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 4
- 238000013019 agitation Methods 0.000 description 4
- IEJIGPNLZYLLBP-UHFFFAOYSA-N dimethyl carbonate Chemical compound COC(=O)OC IEJIGPNLZYLLBP-UHFFFAOYSA-N 0.000 description 4
- UQEAIHBTYFGYIE-UHFFFAOYSA-N hexamethyldisiloxane Chemical compound C[Si](C)(C)O[Si](C)(C)C UQEAIHBTYFGYIE-UHFFFAOYSA-N 0.000 description 4
- 239000003014 ion exchange membrane Substances 0.000 description 4
- 229920001343 polytetrafluoroethylene Polymers 0.000 description 4
- 239000004810 polytetrafluoroethylene Substances 0.000 description 4
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
- VHUUQVKOLVNVRT-UHFFFAOYSA-N Ammonium hydroxide Chemical compound [NH4+].[OH-] VHUUQVKOLVNVRT-UHFFFAOYSA-N 0.000 description 3
- WZKSXHQDXQKIQJ-UHFFFAOYSA-N F[C](F)F Chemical compound F[C](F)F WZKSXHQDXQKIQJ-UHFFFAOYSA-N 0.000 description 3
- 238000010521 absorption reaction Methods 0.000 description 3
- 235000011114 ammonium hydroxide Nutrition 0.000 description 3
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 3
- 238000009835 boiling Methods 0.000 description 3
- 239000011248 coating agent Substances 0.000 description 3
- 238000000576 coating method Methods 0.000 description 3
- 238000001035 drying Methods 0.000 description 3
- 239000012065 filter cake Substances 0.000 description 3
- 239000000706 filtrate Substances 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 238000010992 reflux Methods 0.000 description 3
- 238000003786 synthesis reaction Methods 0.000 description 3
- RQGURHMTNSNBQX-UHFFFAOYSA-M 1,3-dimethylbenzimidazol-3-ium;iodide Chemical compound [I-].C1=CC=C2N(C)C=[N+](C)C2=C1 RQGURHMTNSNBQX-UHFFFAOYSA-M 0.000 description 2
- USBRLAVIAWFOTR-UHFFFAOYSA-N 2-(2,6-difluorophenyl)-1-methylbenzimidazole Chemical compound CN1C(=NC2=C1C=CC=C2)C1=C(C=CC=C1F)F USBRLAVIAWFOTR-UHFFFAOYSA-N 0.000 description 2
- YWYGLNVKXUQJPI-UHFFFAOYSA-N 3-fluoro-2-(1-methylbenzimidazol-2-yl)phenol Chemical compound Cn1c(nc2ccccc12)-c1c(O)cccc1F YWYGLNVKXUQJPI-UHFFFAOYSA-N 0.000 description 2
- NLXLAEXVIDQMFP-UHFFFAOYSA-N Ammonium chloride Substances [NH4+].[Cl-] NLXLAEXVIDQMFP-UHFFFAOYSA-N 0.000 description 2
- AFVFQIVMOAPDHO-UHFFFAOYSA-N Methanesulfonic acid Chemical compound CS(O)(=O)=O AFVFQIVMOAPDHO-UHFFFAOYSA-N 0.000 description 2
- 229920000557 Nafion® Polymers 0.000 description 2
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical group CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 2
- 239000008186 active pharmaceutical agent Substances 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- 239000007864 aqueous solution Substances 0.000 description 2
- 125000003118 aryl group Chemical group 0.000 description 2
- 229920001400 block copolymer Polymers 0.000 description 2
- 229910052801 chlorine Inorganic materials 0.000 description 2
- 239000000460 chlorine Substances 0.000 description 2
- 229920001940 conductive polymer Polymers 0.000 description 2
- NBIIXXVUZAFLBC-UHFFFAOYSA-M dihydrogenphosphate Chemical compound OP(O)([O-])=O NBIIXXVUZAFLBC-UHFFFAOYSA-M 0.000 description 2
- VAYGXNSJCAHWJZ-UHFFFAOYSA-N dimethyl sulfate Chemical compound COS(=O)(=O)OC VAYGXNSJCAHWJZ-UHFFFAOYSA-N 0.000 description 2
- 239000007789 gas Substances 0.000 description 2
- 125000004404 heteroalkyl group Chemical group 0.000 description 2
- 239000011261 inert gas Substances 0.000 description 2
- 238000005342 ion exchange Methods 0.000 description 2
- 150000002500 ions Chemical class 0.000 description 2
- 238000006384 oligomerization reaction Methods 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- 238000006116 polymerization reaction Methods 0.000 description 2
- 238000005956 quaternization reaction Methods 0.000 description 2
- 239000002904 solvent Substances 0.000 description 2
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 2
- 125000002023 trifluoromethyl group Chemical group FC(F)(F)* 0.000 description 2
- 0 *c1c2[n]c(-c3c(*)c(*)c(*)c(*)c3O*)nc2c(*)c(*)c1* Chemical compound *c1c2[n]c(-c3c(*)c(*)c(*)c(*)c3O*)nc2c(*)c(*)c1* 0.000 description 1
- NSGXIBWMJZWTPY-UHFFFAOYSA-N 1,1,1,3,3,3-hexafluoropropane Chemical compound FC(F)(F)CC(F)(F)F NSGXIBWMJZWTPY-UHFFFAOYSA-N 0.000 description 1
- GEYOCULIXLDCMW-UHFFFAOYSA-N 1,2-phenylenediamine Chemical compound NC1=CC=CC=C1N GEYOCULIXLDCMW-UHFFFAOYSA-N 0.000 description 1
- RFQLSYQGPDPQQW-UHFFFAOYSA-N 1,3-dimethyl-2-(2,4,6-trimethylphenyl)benzimidazol-3-ium Chemical compound CC1=CC(C)=CC(C)=C1C1=[N+](C)C2=CC=CC=C2N1C RFQLSYQGPDPQQW-UHFFFAOYSA-N 0.000 description 1
- ONOTYLMNTZNAQZ-UHFFFAOYSA-N 2,6-difluorobenzoic acid Chemical compound OC(=O)C1=C(F)C=CC=C1F ONOTYLMNTZNAQZ-UHFFFAOYSA-N 0.000 description 1
- LEJASIAHMIEQGC-UHFFFAOYSA-N 2-(2,4,6-trimethylphenyl)-1h-benzimidazole Chemical compound CC1=CC(C)=CC(C)=C1C1=NC2=CC=CC=C2N1 LEJASIAHMIEQGC-UHFFFAOYSA-N 0.000 description 1
- DWYHDSLIWMUSOO-UHFFFAOYSA-N 2-phenyl-1h-benzimidazole Chemical compound C1=CC=CC=C1C1=NC2=CC=CC=C2N1 DWYHDSLIWMUSOO-UHFFFAOYSA-N 0.000 description 1
- QCQCHGYLTSGIGX-GHXANHINSA-N 4-[[(3ar,5ar,5br,7ar,9s,11ar,11br,13as)-5a,5b,8,8,11a-pentamethyl-3a-[(5-methylpyridine-3-carbonyl)amino]-2-oxo-1-propan-2-yl-4,5,6,7,7a,9,10,11,11b,12,13,13a-dodecahydro-3h-cyclopenta[a]chrysen-9-yl]oxy]-2,2-dimethyl-4-oxobutanoic acid Chemical compound N([C@@]12CC[C@@]3(C)[C@]4(C)CC[C@H]5C(C)(C)[C@@H](OC(=O)CC(C)(C)C(O)=O)CC[C@]5(C)[C@H]4CC[C@@H]3C1=C(C(C2)=O)C(C)C)C(=O)C1=CN=CC(C)=C1 QCQCHGYLTSGIGX-GHXANHINSA-N 0.000 description 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 1
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical group [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 1
- WYQPLTPSGFELIB-JTQPXKBDSA-N Difluprednate Chemical compound C1([C@@H](F)C2)=CC(=O)C=C[C@]1(C)[C@]1(F)[C@@H]2[C@@H]2CC[C@@](C(=O)COC(C)=O)(OC(=O)CCC)[C@@]2(C)C[C@@H]1O WYQPLTPSGFELIB-JTQPXKBDSA-N 0.000 description 1
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 description 1
- 229920001774 Perfluoroether Polymers 0.000 description 1
- 229920000388 Polyphosphate Polymers 0.000 description 1
- 125000003545 alkoxy group Chemical group 0.000 description 1
- HSFWRNGVRCDJHI-UHFFFAOYSA-N alpha-acetylene Natural products C#C HSFWRNGVRCDJHI-UHFFFAOYSA-N 0.000 description 1
- 239000000908 ammonium hydroxide Substances 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- 125000003710 aryl alkyl group Chemical group 0.000 description 1
- 239000012298 atmosphere Substances 0.000 description 1
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 1
- 229910052794 bromium Inorganic materials 0.000 description 1
- 150000001721 carbon Chemical group 0.000 description 1
- 150000001768 cations Chemical class 0.000 description 1
- 239000012043 crude product Substances 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 238000002242 deionisation method Methods 0.000 description 1
- 125000002534 ethynyl group Chemical group [H]C#C* 0.000 description 1
- 238000011049 filling Methods 0.000 description 1
- 238000001914 filtration Methods 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 229920002313 fluoropolymer Polymers 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- 125000005843 halogen group Chemical group 0.000 description 1
- 150000002367 halogens Chemical class 0.000 description 1
- 125000001072 heteroaryl group Chemical group 0.000 description 1
- 238000004128 high performance liquid chromatography Methods 0.000 description 1
- 125000001183 hydrocarbyl group Chemical group 0.000 description 1
- XMBWDFGMSWQBCA-UHFFFAOYSA-N hydrogen iodide Chemical compound I XMBWDFGMSWQBCA-UHFFFAOYSA-N 0.000 description 1
- 238000001566 impedance spectroscopy Methods 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- WFKAJVHLWXSISD-UHFFFAOYSA-N isobutyramide Chemical compound CC(C)C(N)=O WFKAJVHLWXSISD-UHFFFAOYSA-N 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 229940098779 methanesulfonic acid Drugs 0.000 description 1
- WCYWZMWISLQXQU-UHFFFAOYSA-N methyl Chemical compound [CH3] WCYWZMWISLQXQU-UHFFFAOYSA-N 0.000 description 1
- 239000000178 monomer Substances 0.000 description 1
- 230000000877 morphologic effect Effects 0.000 description 1
- 239000012299 nitrogen atmosphere Substances 0.000 description 1
- 229940078552 o-xylene Drugs 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 229920002492 poly(sulfone) Polymers 0.000 description 1
- 229920006267 polyester film Polymers 0.000 description 1
- 239000001205 polyphosphate Substances 0.000 description 1
- 235000011176 polyphosphates Nutrition 0.000 description 1
- 229920000137 polyphosphoric acid Polymers 0.000 description 1
- 239000002244 precipitate Substances 0.000 description 1
- 238000010926 purge Methods 0.000 description 1
- 238000000746 purification Methods 0.000 description 1
- 239000012264 purified product Substances 0.000 description 1
- 230000035484 reaction time Effects 0.000 description 1
- 238000001953 recrystallisation Methods 0.000 description 1
- 230000000630 rising effect Effects 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
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- 238000003860 storage Methods 0.000 description 1
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- HXJUTPCZVOIRIF-UHFFFAOYSA-N sulfolane Chemical compound O=S1(=O)CCCC1 HXJUTPCZVOIRIF-UHFFFAOYSA-N 0.000 description 1
- 238000010998 test method Methods 0.000 description 1
- 238000012719 thermal polymerization Methods 0.000 description 1
- 239000013638 trimer Substances 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
- ORGHESHFQPYLAO-UHFFFAOYSA-N vinyl radical Chemical compound C=[CH] ORGHESHFQPYLAO-UHFFFAOYSA-N 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F295/00—Macromolecular compounds obtained by polymerisation using successively different catalyst types without deactivating the intermediate polymer
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J41/00—Anion exchange; Use of material as anion exchangers; Treatment of material for improving the anion exchange properties
- B01J41/08—Use of material as anion exchangers; Treatment of material for improving the anion exchange properties
- B01J41/12—Macromolecular compounds
- B01J41/13—Macromolecular compounds obtained otherwise than by reactions only involving unsaturated carbon-to-carbon bonds
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D235/00—Heterocyclic compounds containing 1,3-diazole or hydrogenated 1,3-diazole rings, condensed with other rings
- C07D235/02—Heterocyclic compounds containing 1,3-diazole or hydrogenated 1,3-diazole rings, condensed with other rings condensed with carbocyclic rings or ring systems
- C07D235/04—Benzimidazoles; Hydrogenated benzimidazoles
- C07D235/18—Benzimidazoles; Hydrogenated benzimidazoles with aryl radicals directly attached in position 2
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G65/00—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule
- C08G65/34—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from hydroxy compounds or their metallic derivatives
- C08G65/38—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from hydroxy compounds or their metallic derivatives derived from phenols
- C08G65/40—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from hydroxy compounds or their metallic derivatives derived from phenols from phenols (I) and other compounds (II), e.g. OH-Ar-OH + X-Ar-X, where X is halogen atom, i.e. leaving group
- C08G65/4006—(I) or (II) containing elements other than carbon, oxygen, hydrogen or halogen as leaving group (X)
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G65/00—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule
- C08G65/34—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from hydroxy compounds or their metallic derivatives
- C08G65/38—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from hydroxy compounds or their metallic derivatives derived from phenols
- C08G65/40—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from hydroxy compounds or their metallic derivatives derived from phenols from phenols (I) and other compounds (II), e.g. OH-Ar-OH + X-Ar-X, where X is halogen atom, i.e. leaving group
- C08G65/4012—Other compound (II) containing a ketone group, e.g. X-Ar-C(=O)-Ar-X for polyetherketones
- C08G65/4031—(I) or (II) containing nitrogen
- C08G65/4037—(I) or (II) containing nitrogen in ring structure, e.g. pyridine group
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J5/00—Manufacture of articles or shaped materials containing macromolecular substances
- C08J5/20—Manufacture of shaped structures of ion-exchange resins
- C08J5/22—Films, membranes or diaphragms
- C08J5/2206—Films, membranes or diaphragms based on organic and/or inorganic macromolecular compounds
- C08J5/2218—Synthetic macromolecular compounds
- C08J5/2256—Synthetic macromolecular compounds based on macromolecular compounds obtained by reactions other than those involving carbon-to-carbon bonds, e.g. obtained by polycondensation
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
- C25B13/00—Diaphragms; Spacing elements
- C25B13/04—Diaphragms; Spacing elements characterised by the material
- C25B13/08—Diaphragms; Spacing elements characterised by the material based on organic materials
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E60/00—Enabling technologies; Technologies with a potential or indirect contribution to GHG emissions mitigation
- Y02E60/30—Hydrogen technology
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Abstract
Description
先行技術は、以下の式(Ia)および(Ib)に相当する分子および/または分子単位が存在する様々なポリマーも開示している。
R1、R2、R3、およびR4は、同じまたは異なっており、かつ、−H、任意の所望の基、またはポリマーラジカルであり、
R5およびR11は、同じまたは異なっており、かつ、メチル、トリフルオロメチル、アルキル、ペルフルオロアルキル、ヘテロアルキル、アリール、アラルキル、もしくは、ポリマーラジカルであるか、または基ではなく、
R6およびR10は、同じまたは異なっており、かつ、メチル、トリフルオロメチル、アルキル、ペルフルオロアルキル、ヘテロアルキル、アルコキシ、ペルフルオロアルコキシ、ハロゲン、アリール、ヘテロアリール、またはポリマーラジカルであり、
R7、R8、およびR9は、同じまたは異なっており、かつ、−H、任意の所望の基、またはポリマーラジカルである。
欧州特許第0126231B1号には、式(Ia)または(Ib)で表される単位が存在している分子またはポリマーが記載されており、前記式中、
R1、R2、R3、およびR4は、−Hであり、
R5およびR11は、同じまたは異なっており、かつ、−H、1〜10個の炭素原子を有するヒドロカルビルラジカル、または2〜10個の炭素原子を有するカルボキシアルキルラジカル、好ましくは、メチル、エチル、ベンジル、またはカルボキシメチルラジカルであり、
R8は、ビニルラジカルまたはポリマーラジカルであり、
R6、R7、R9、およびR10は、同じまたは異なっており、かつ、−Hまたは1〜4個の炭素原子を有するヒドロカルビル基、好ましくは、−H、メチル、またはエチルラジカルである。
本発明は、化合物、好ましくはオリゴマーまたはポリマー、より好ましくは式(Ia)または(Ib)で表される少なくとも1つの単位を含むポリマーを提供する。
R5およびR11は、同じまたは異なっており、かつ、アルキルまたはペルフルオロアルキル、好ましくはメチル、エチル、プロピル、イソプロピル、n−ブチル、t−ブチル、またはトリフルオロメチルラジカル、より好ましくはメチルラジカルであり、
R6およびR10は、同じまたは異なっており、かつ、オリゴマーまたはポリマーラジカルであり、R6およびR10は、好ましくはポリマーラジカルであり、
R7、R8、およびR9は、同じまたは異なっており、かつ、−Hまたは任意の所望の基であり、好ましくは、−Hである、ことを特徴とする。
本発明による好ましい化合物は、式(IVa)、(IVb)、(IVc)、(IVd)、(IVe)、および(IVf)で表される化合物であり、
本発明による特に好ましい化合物は、式(Va)および(Vb)で表される化合物であり、
実施例
実施例1:2−(2’6’−ジフルオロフェニル)ベンゾイミダゾール(DFP−BI)の合成
実施例2:MeDFP−BIへのDFP−BIのメチル化
実施例3:MeDFP−BIのオリゴマー化
実施例4:重合
実施例5:ポリマーの後処理
実施例6:1−メチル−2−(2’,6’−ジフルオロフェニル)ベンゾイミダゾール(1-methyl-2-(2’,6'-difluorophenyl)benzimidazole:MeDFP−BI)の合成
粗収量:660g
実施例7:1−メチル−2−(2’−ヒドロキシ−6’−フルオロフェニル)ベンゾイミダゾール(1-methyl-2-(2'-hydroxy-6'-fluorophenyl)benzimidazole:MeHyFP−BI)の合成
留分1:431g。高速液体クロマトグラフィー(High Performance Liquid Chromatography:HPLC)により極めてクリーンであることを確認。
留分2:40.5g。淡いピンク色。恐らく不純物が含まれる。
実施例8:実施例6のMeDFP−BIおよびMeHyFP−BIの三量体形成によるマクロマーの生成
実施例9:ヒドロキノンを用いた実施例7のマクロマーのオリゴマー化によるオリゴマー生成
実施例10:実施例9のオリゴマーの重合化によるブロックコポリマーの生成
実施例11:ヨードメタンによるポリマーの四級化
実施例12:硫酸ジメチルによるポリマーの四級化
実施例13:膜の製造
実施例14:膜のイオン交換
実施例15:膜のイオン伝導率の測定
σ=L/(Rmembrane *A) (1)
前記式中、Lは、Ptワイヤ間の距離(5mm)を表し、Aは、2本の外部Ptワイヤ間にある膜サンプルの面積を表す。
実施例16:膜の吸水率の測定
WA=(mwet−mdry)/mdry *100% (2)
前記式中、mwetは、膨張後のサンプルの質量を表し、mdryは、サンプルの乾燥質量を表す。
実施例17:膜の膨張特性の測定
DS=(xwet−xdry)/xdry *100% (3)
前記式中、xwetは、膨張後のサンプルの長さ、幅、または厚さを表し、xdryは、サンプルの乾燥長、乾燥幅、または乾燥厚を表す。
実施例18:膜の機械的耐久性の測定
ε=Δl/l (4)
前記式中、Δlは、サンプルの伸び(mm)を表し、lは、自由行程長を表す。自由行程長Iを10mmとし、εが0.1%の場合、伸びは0.01mmであることが分かる。力センサは、定義した伸び率に必要な張力を検出する。試験の結果を表1に示す。
・膜2を、実施例10に記載したポリマーから製造し、その後、四級化した。
・FAA3は、FUMATECH BWT社の市販のアニオン伝導膜である。
・ナフィオンN−115は、Chemours社(米国)の市販のカチオン伝導膜である。
・寸法安定度1のデータは、膜厚の変化に基づく。
・イオン伝導率2のデータは、60℃で測定した、OH形態の膜の伝導率に基づく。
・イオン伝導率3のデータは、60℃で測定した、H+形態の膜の伝導率に基づく。
・ナフィオン(H+形態)以外の全ての膜の機械的耐久性4について、60℃、OH形態で試験を行った。
Claims (17)
- 前記化合物は、前記式(Ia)または(Ib)、好ましくは前記式(Ib)で表される少なくとも2つの単位を有するオリゴマーまたはポリマーであることを特徴とする、請求項1に記載の化合物。
- R6およびR10は、ポリマーラジカルであることを特徴とする、請求項1または2に記載の化合物。
- R6またはR10のラジカルのうち少なくとも1つは、酸素原子を介して前記環炭素原子に結合するオリゴマーまたはポリマーラジカルであることを特徴とする、請求項1〜3の少なくともいずれか1項に記載の化合物。
- 前記化合物はポリマー化合物であり、ポリマーラジカルR6およびR10は、式(IIa)および/または(IIb)および/または(IIIa)および/または(IIIb)で表される1つ以上の単位を有し、
請求項1〜4のいずれか1項に記載の化合物。 - 請求項1〜8のいずれか1項に記載の化合物を調製する方法であって、式(X)で表される化合物であって、
ステップを含む、方法。 - 請求項1で定義したとおりの前記式(Ia)で表される化合物をシランと反応させて、前記式(Ia)で表される化合物であって、前記式中、R10またはR6は、−OHであり、以下、式(Ia’)で表される化合物と称する化合物を得る方法ステップを含むことを特徴とする、請求項9に記載の方法。
- 前記式(Ia)で表される化合物を前記式(Ia’)で表される少なくとも1つの化合物と反応させて、式(Ia’’)で表されるオリゴマーを得る方法ステップを含むことを特徴とする、請求項10に記載の方法。
- 請求項1で定義したとおりの前記式(Ia)で表される化合物または請求項11で定義したとおりの前記式(Ia’’)で表される化合物をジオールと反応させる方法ステップを含むことを特徴とする、請求項9〜11のいずれか1項に記載の方法。
- 請求項11に記載の前記方法ステップにおいて得た前記製品を、アルキル化試薬、好ましくはメチル化試薬と反応させることを特徴とする、請求項13に記載の方法。
- アニオン伝導膜を製造するための、アニオン伝導膜としての請求項1〜8のいずれか1項に記載のポリマーの使用。
- 電気化学法、好ましくは電気分解、電気透析、および燃料電池技術から選択される電気化学法において使用する成分を製造するための、または、アニオン伝導膜としての、請求項1〜8のいずれか1項に記載のポリマーの使用。
- 請求項1〜8のいずれか1項に記載のポリマーを含むことを特徴とする、電解槽。
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