JP2018049199A5 - - Google Patents

Claims (13)

In a local wet etching apparatus for manufacturing a photomask substrate by locally processing the main surface of a glass substrate with a wet etching solution,
Substrate support means for supporting the glass substrate;
Wet etching means disposed on the lower side of the glass substrate so as to face the main surface of the glass substrate supported by the substrate supporting means;
Relative movement means for relatively moving the substrate support means and the wet etching means,
The wet etching means has an opening for supplying the wet etching solution to the main surface of the glass substrate on the upper surface, and at least a surface of the opening facing the main surface of the glass substrate is in contact with the wet etching solution. A local wet etching apparatus comprising a wet etching tank made of a material having liquid repellency and a rinsing tank.   The local wet etching apparatus according to claim 1, wherein the wet etching tank includes a collecting unit that collects a wet etching solution that has flowed out from an upper surface of the opening.   The local wet etching apparatus according to claim 1, wherein the material constituting the opening is polytetrafluoroethylene.   The edge part of the said opening part has predetermined | prescribed thickness, and is provided with the inclined surface where the height of the innermost periphery of the said edge part is lower than the height of an outermost periphery. The local wet etching apparatus as described in any one.   The local wet etching apparatus according to any one of claims 1 to 4, wherein the shape of the opening is rectangular in plan view. 5. The local wet etching apparatus according to claim 4 , wherein the inclined surface is provided in a direction in which the substrate support means and the wet etching means move horizontally.   The opening is provided with a flow path through which the wet etching solution flows toward the lower surface of the opening in a direction perpendicular to a direction in which the substrate support means and the wet etching means move horizontally. The local wet etching apparatus according to claim 5 or 6.   The local wet etching apparatus according to any one of claims 1 to 7, wherein a plurality of the wet etching tanks are arranged in a direction perpendicular to a direction of horizontal movement with respect to the substrate support means.   The local wet etching apparatus according to any one of claims 1 to 8, wherein the relative movement unit includes a vertical movement unit that moves the wet etching unit in a vertical direction.   The local wet etching apparatus according to claim 9, wherein the vertical movement unit includes an isolation unit that isolates the wet etching solution and a corrosive gas generated by the wet etching solution.   The local wet etching apparatus according to claim 1, wherein the relative movement unit includes a horizontal movement unit that moves the substrate support unit in a horizontal direction. Using the local wet etching apparatus according to any one of claims 1 to 11,
Placing the glass substrate on the substrate support means;
Using the relative movement means, set the wet etching means in a predetermined place of the glass substrate to perform local wet etching,
A method for manufacturing a substrate for a photomask, comprising performing local wet etching on a predetermined location of the glass substrate. In the method of manufacturing a photomask substrate, a local wet etching is performed by bringing a wet etching solution into contact with a part of the main surface of the glass substrate to manufacture a photomask substrate.
Holding the glass substrate so that the main surface of the glass substrate that performs the local wet etching is downward,
A wet etching bath having a opening and at least a surface facing the main surface of the glass substrate of the opening is made of a material having liquid repellency with respect to the wet etching solution, and a rinse bath is prepared. ,
Holding the wet etching solution on the upper surface of the opening of the wet etching bath;
After the wet etching means is brought into contact with the main surface of the glass substrate by bringing the wet etching means close to the main surface of the glass substrate, local wet etching is performed, and then remains on the main surface of the glass substrate by a rinse bath. A method for producing a photomask substrate, comprising removing a wet etching solution.