JP2017135428A - Semiconductor device manufacturing method and semiconductor device - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide: an SGT structure having a structure for reducing the resistance of an upper part of a columnar semiconductor layer; and a method for manufacturing the SGT structure.SOLUTION: A semiconductor device manufacturing method comprises: a first process which includes the steps of forming a fin-shaped semiconductor layer, a first insulation film around the fin-shaped semiconductor layer and a columnar semiconductor layer on the fin-shaped semiconductor layer; a second process which includes the steps of forming a gate insulation film around the columnar semiconductor layer, a gate electrode around the gate insulation film and gate wiring connected to the gate electrode; a third process which includes the steps of forming a first first-conductivity-type diffusion layer in an upper portion of the columnar semiconductor layer, and second first-conductivity-type diffusion layers in a lower portion of the columnar semiconductor layer and an upper portion of the fin-shaped semiconductor layer; and a fourth process which includes the steps of depositing a first interlayer insulation film, planarizing the first interlayer insulation film, and etching back the first interlayer insulation film to expose an upper portion of the columnar semiconductor layer, and depositing a first metal after exposing the upper portion of the columnar semiconductor layer, and forming a first sidewall composed of metal around a sidewall of the upper portion of the columnar semiconductor layer by etching.SELECTED DRAWING: Figure 1

Description

  The present invention relates to a method for manufacturing a semiconductor device and a semiconductor device.

  Semiconductor integrated circuits, in particular integrated circuits using MOS transistors, are becoming increasingly highly integrated. Along with this high integration, the MOS transistors used therein have been miniaturized to the nano region. When the miniaturization of such a MOS transistor progresses, it is difficult to suppress the leakage current, and there is a problem that the occupied area of the circuit cannot be easily reduced due to a request for securing a necessary amount of current. In order to solve such a problem, a Surrounding Gate Transistor (hereinafter referred to as “SGT”) having a structure in which a source, a gate, and a drain are arranged in a vertical direction with respect to a substrate and a gate electrode surrounds a columnar semiconductor layer is proposed. (For example, see Patent Document 1, Patent Document 2, and Patent Document 3).

  In the conventional SGT manufacturing method, a silicon pillar having a nitride hard mask formed in a columnar shape is formed, a diffusion layer under the silicon pillar is formed, a gate material is deposited, and then the gate material is planarized and etched. The insulating film sidewall is formed on the sidewalls of the silicon pillar and the nitride film hard mask. Thereafter, a resist pattern for a gate wiring is formed, the gate material is etched, the nitride film hard mask is removed, and a diffusion layer is formed on the silicon semiconductor pillar (see, for example, Patent Document 4). After that, a nitride film sidewall is formed on the silicon pillar side wall, ion implantation is performed, a diffusion layer is formed on the silicon pillar, a nitride film is deposited as a contact stopper, an oxide film is formed as an interlayer film, and contact etching is performed. ing.

  Therefore, the upper side wall of the silicon pillar is covered with the nitride film side wall, and the contact is in contact with the upper surface of the silicon pillar. When the silicon pillar diameter is reduced, the contact surface between the contact and the upper part of the silicon pillar is narrowed, and the resistance is increased.

  Further, in the conventional SGT manufacturing method, since the contact depth is different, the contact hole on the upper part of the silicon pillar and the contact hole on the planar silicon layer below the silicon pillar are formed separately (for example, Patent Document 5). reference). Since it is formed separately, the number of steps increases.

  Although formed separately, if the contact hole at the upper part of the silicon pillar is etched too much, the gate electrode may be reached, and if the etching is not sufficient, the contact between the upper part of the silicon pillar and the contact may be insulated.

  Since the contact hole on the planar silicon layer under the silicon pillar is deep, it is difficult to fill the contact hole. Moreover, it is difficult to form a deep contact hole.

Further, when the silicon pillar is thinned, the density of silicon is 5 × 10 ²² pieces / cm ³ , so that it becomes difficult for impurities to be present in the silicon pillar.

  In the planar MOS transistor, the sidewall of the LDD region is formed of polycrystalline silicon having the same conductivity type as that of the low concentration layer, and the surface carrier of the LDD region is induced by the work function difference, so that the oxide film sidewall LDD type MOS It has been shown that the impedance of the LDD region can be reduced as compared with a transistor (see, for example, Patent Document 6). The polycrystalline silicon sidewall is shown to be electrically insulated from the gate electrode. In the figure, it is shown that the polysilicon side wall and the source / drain are insulated by an interlayer insulating film.

JP-A-2-71556 Japanese Patent Laid-Open No. 2-188966 Japanese Patent Laid-Open No. 3-145761 JP 2009-182317 A JP 2012-004244 A JP 11-297984 A

  Therefore, an object of the present invention is to provide a structure of an SGT having a structure for reducing the resistance of the upper part of the columnar semiconductor layer and a method for manufacturing the SGT.

  According to the method of manufacturing a semiconductor device of the present invention, a fin-shaped semiconductor layer is formed on a semiconductor substrate, a first insulating film is formed around the fin-shaped semiconductor layer, and a columnar semiconductor layer is formed on the fin-shaped semiconductor layer. Forming a first insulating layer; a gate insulating film formed around the columnar semiconductor layer; a gate electrode formed around the gate insulating film; and a gate wiring connected to the gate electrode. A second step, forming a first first conductivity type diffusion layer above the columnar semiconductor layer, and a second first conductivity type diffusion below the columnar semiconductor layer and above the fin-like semiconductor layer; A third step of forming a layer; depositing a first interlayer insulating film; planarizing the first interlayer insulating film; performing etch back; exposing the upper portion of the columnar semiconductor layer; After exposing, deposit the first metal And having a fourth step of forming a first side wall made of metal around the upper sidewall of the columnar semiconductor layer by performing etching.

  In addition, after the fourth step, a second interlayer insulating film is deposited, the second interlayer insulating film is planarized, etched back, the upper part of the columnar semiconductor layer is exposed, and the first contact is formed. A fifth resist for forming is formed, a contact hole is formed by etching the second interlayer insulating film and the first interlayer insulating film, and a second metal is deposited by depositing a second metal. Forming a first contact on the first conductivity type diffusion layer, forming a sixth resist for forming a metal wiring, and performing a fifth step of forming the first metal wiring by etching; It is characterized by having.

  The semiconductor device of the present invention includes a fin-shaped semiconductor layer formed on a semiconductor substrate, a columnar semiconductor layer formed on the fin-shaped semiconductor layer, a gate insulating film formed around the columnar semiconductor layer, A gate electrode formed around the gate insulating film; a gate wiring connected to the gate electrode; a first first conductivity type diffusion layer formed above the columnar semiconductor layer; and the columnar semiconductor layer. And a first side wall made of a first metal formed around the upper side wall of the columnar semiconductor layer. And having.

  The semiconductor device of the present invention further includes an upper portion of the columnar semiconductor layer and a first metal wiring formed on the first sidewall.

  In the semiconductor device of the present invention, the semiconductor layer is a silicon layer.

  In the semiconductor device of the present invention, the first conductivity type diffusion layer is n-type, and the work function of the metal of the first sidewall is between 4.0 eV and 4.2 eV. And

  In the semiconductor device of the present invention, the first conductivity type diffusion layer is p-type, and the work function of the metal of the first sidewall is between 5.0 eV and 5.2 eV. And

  The first contact may be formed on the second first conductivity type diffusion layer, and the depth of the first contact may be less than the height of the columnar semiconductor layer.

  The semiconductor device of the present invention is also characterized in that the columnar semiconductor layer has the same width as the fin-shaped semiconductor layer.

  ADVANTAGE OF THE INVENTION According to this invention, the structure of SGT with the structure for reducing the resistance of columnar semiconductor layer upper part, and the manufacturing method of the SGT can be provided.

  Since the metal is in contact with the periphery of the upper sidewall of the columnar semiconductor layer, the contact area between the metal and the upper portion of the columnar semiconductor layer is increased, so that the resistance of the upper portion of the columnar semiconductor layer can be reduced.

  Further, when the semiconductor layer is a silicon layer, the work function of the metal of the first sidewall is between 4.0 eV and 4.2 eV, and is in the vicinity of the work function of n-type silicon of 4.05 eV. Since the surface carriers are induced by the work function difference, the resistance of the upper part of the columnar silicon layer can be reduced. For example, when the impurity concentration of the columnar silicon layer is low, the transistor formed of the first sidewall and the columnar silicon layer is turned on when the voltage applied to the first sidewall via the metal wiring is 0V. Will be.

  When the semiconductor layer is a silicon layer, the work function of the metal of the first sidewall is between 5.0 eV and 5.2 eV, and is in the vicinity of the work function of p-type silicon of 5.15 eV. Since the surface carriers are induced by the work function difference, the resistance of the upper part of the columnar silicon layer can be reduced. For example, when the impurity concentration of the columnar silicon layer is low, the transistor formed of the first sidewall and the columnar silicon layer is turned on when the voltage applied to the first sidewall via the metal wiring is 0V. Will be.

  In addition, since the first metal wiring and the upper portion of the columnar semiconductor layer are directly connected, the contact hole depth for the first contact can be reduced, so that the contact hole can be easily formed, and the contact hole is made of metal. Easy to fill.

  In addition, the fin-like semiconductor layer, the first insulating film, and the columnar semiconductor layer can be easily formed because they are based on a conventional FINFET manufacturing method.

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  Below, the manufacturing process for forming the structure of SGT which concerns on embodiment of this invention is demonstrated with reference to FIGS.

  First, a first step is shown in which a fin-shaped semiconductor layer is formed on a semiconductor substrate, a first insulating film is formed around the fin-shaped semiconductor layer, and a columnar semiconductor layer is formed on the fin-shaped semiconductor layer. . As shown in FIG. 2, a first resist 102 for forming a fin-like semiconductor layer is formed on a semiconductor substrate 101.

  As shown in FIG. 3, the semiconductor substrate 101 is etched to form a fin-like semiconductor layer 103. Although the fin-like semiconductor layer is formed using a resist as a mask this time, a hard mask such as an oxide film or a nitride film may be used.

  As shown in FIG. 4, the first resist 102 is removed.

  As shown in FIG. 5, a first insulating film 104 is deposited around the fin-like semiconductor layer 103. An oxide film formed by high-density plasma or an oxide film formed by low-pressure chemical vapor deposition may be used as the first insulating film.

  As shown in FIG. 6, the first insulating film 104 is etched back to expose the upper portion of the fin-shaped semiconductor layer 103. Up to this point, the manufacturing method is the same as that of the conventional fin-shaped semiconductor layer.

  As shown in FIG. 7, a second resist 105 is formed so as to be orthogonal to the fin-like semiconductor layer 103. A portion where the fin-shaped semiconductor layer 103 and the resist 105 are orthogonal to each other is a portion that becomes a columnar semiconductor layer. Since a line-shaped resist can be used, the possibility that the resist falls after patterning is low, and the process is stable.

  As shown in FIG. 8, the fin-like semiconductor layer 103 is etched. A portion where the fin-shaped semiconductor layer 103 and the second resist 105 are orthogonal to each other becomes a columnar semiconductor layer 106. Therefore, the width of the columnar semiconductor layer 106 is the same as the width of the fin-shaped semiconductor layer. A columnar semiconductor layer 106 is formed on the fin-shaped semiconductor layer 103, and a first insulating film 104 is formed around the fin-shaped semiconductor layer 103. The fin-like semiconductor layer, the first insulating film, and the columnar semiconductor layer can be easily formed because they are based on the conventional FINFET manufacturing method.

  As shown in FIG. 9, the second resist 105 is removed.

  Thus, the first step of forming the fin-shaped semiconductor layer on the semiconductor substrate, forming the first insulating film around the fin-shaped semiconductor layer, and forming the columnar semiconductor layer on the fin-shaped semiconductor layer is performed. Indicated.

  Next, a second step of forming a gate insulating film formed around the columnar semiconductor layer, a gate electrode formed around the gate insulating film, and a gate wiring connected to the gate electrode is performed. Show.

As shown in FIG. 10, a gate insulating film 107 is formed around the columnar semiconductor layer 106, and a metal film 108 and a polysilicon film 109 are formed around the gate insulating film 107.
At this time, a thin polysilicon film 109 is used. Therefore, voids can be prevented from being formed in the polysilicon film.
The metal film 108 may be any metal that is used in a semiconductor process and sets a threshold voltage of a transistor. For example, titanium nitride can be used. .
The gate insulating film 107 may be any film used in a semiconductor process. For example, an oxide film, an oxynitride film, or a high dielectric film can be used.

  As shown in FIG. 11, a third resist 110 for forming the gate wiring 111b is formed. In this embodiment, the resist height is described as being higher than that of the columnar semiconductor layer. As the gate wiring width becomes narrower, the polysilicon above the columnar semiconductor layer becomes easier to be exposed. The resist height may be lower than the columnar semiconductor layer.

  As shown in FIG. 12, the polysilicon film 109 and the metal film 108 are etched. A gate electrode 111a and a gate wiring 111b are formed. At this time, if the resist thickness at the upper part of the columnar semiconductor layer is thin or the polysilicon at the upper part of the columnar semiconductor layer is exposed, the upper part of the columnar semiconductor layer may be etched during the etching. In this case, when the columnar semiconductor layer is formed, the height may be set to the sum of a desired columnar semiconductor layer height and a height that is later removed during etching of the gate wiring. Therefore, the manufacturing process of the present invention is a self-alignment process.

  As shown in FIG. 13, the third resist 110 is stripped.

  As shown in FIG. 14, the 4th resist 112 is deposited and the polysilicon film 109 of the upper side wall of the columnar semiconductor layer 106 is exposed. It is preferable to use resist etchback. Further, a coating film such as spin-on glass may be used.

  As shown in FIG. 15, the exposed polysilicon film 109 is removed by etching. Isotropic etching is preferred.

  As shown in FIG. 16, the 4th resist 112 is peeled.

As shown in FIG. 17, the metal film 108 is removed by etching, and the metal film 108 is left on the side wall of the columnar semiconductor layer 106. Isotropic etching is preferred.
A gate electrode 111 a is formed by the metal film 108 on the sidewall of the columnar semiconductor layer 106 and the polysilicon film 109. Therefore, it becomes a self-alignment process.

  As described above, the second step of forming the gate insulating film formed around the columnar semiconductor layer, the gate electrode formed around the gate insulating film, and the gate wiring connected to the gate electrode is performed. Indicated.

  Next, a first first conductivity type diffusion layer is formed above the columnar semiconductor layer, and a second first conductivity type diffusion layer is formed below the columnar semiconductor layer and above the fin-like semiconductor layer. A third step is shown.

  As shown in FIG. 18, arsenic is implanted to form a first first conductivity type diffusion layer 114 and a second first conductivity type diffusion layer 113. In the case of pMOS, boron or boron fluoride is implanted.

  As shown in FIG. 19, an oxide film 115 is deposited and heat treatment is performed. A nitride film may be used.

  As described above, the first first conductivity type diffusion layer is formed above the columnar semiconductor layer, and the second first conductivity type diffusion layer is formed below the columnar semiconductor layer and above the fin-like semiconductor layer. A third step is shown.

  Next, a manufacturing method for forming the first silicide 118 and the second silicide 117 on the first first conductivity type diffusion layer 114 and the second first conductivity type diffusion layer 113 will be described.

  As shown in FIG. 20, the oxide film 115 is etched to form oxide film side walls 116a and 116b.

  Next, as shown in FIG. 21, metal is deposited, heat-treated, and unreacted metal is removed, so that the first first conductivity type diffusion layer 114 and the second first conductivity type diffusion layer 113 are removed. A first silicide 118, a second silicide 117, and a silicide 119 are formed on the top and the gate wiring 111b. When the upper portion of the gate electrode 111a is exposed, the silicide 120 is formed on the upper portion of the gate electrode 111a.

  Since the polysilicon film 109 is thin, the gate wiring 111b tends to have a laminated structure of the metal film 108 and the silicide 119. Since the silicide 119 and the metal film 108 are in direct contact with each other, the resistance can be reduced.

  As described above, the manufacturing method for forming the first silicide 118 and the second silicide 117 on the first first conductivity type diffusion layer 114, the second first conductivity type diffusion layer 113, and the gate wiring 111b is shown. It was.

  Next, after depositing a first interlayer insulating film, planarizing the first interlayer insulating film, performing etch back, exposing the upper part of the columnar semiconductor layer, exposing the upper part of the columnar semiconductor layer, A fourth step of forming a first side wall made of metal around the upper side wall of the columnar semiconductor layer by depositing and etching the metal is shown.

  As shown in FIG. 22, the 1st interlayer insulation film 121 is deposited and planarized.

  As shown in FIG. 23, etch back is performed to expose the upper side wall of the columnar semiconductor layer 106.

  As shown in FIG. 24, the 1st metal 122 is deposited. When the semiconductor layer is a silicon layer and the first conductivity type diffusion layer is n-type, the work function of the first metal is preferably between 4.0 eV and 4.2 eV. Since the work function of n-type silicon is in the vicinity of 4.05 eV, surface carriers are induced by the work function difference, so that the resistance at the top of the columnar silicon layer can be reduced. For example, when the impurity concentration of the columnar silicon layer is low, the transistor formed of the first sidewall and the columnar silicon layer is turned on when the voltage applied to the first sidewall via the metal wiring is 0V. Will be. For example, a compound of tantalum and titanium (TaTi) or tantalum nitride (TaN) is preferable.

  When the semiconductor layer is a silicon layer and the first conductivity type diffusion layer is p-type, the work function of the first metal is preferably between 5.0 eV and 5.2 eV. Since the work function of p-type silicon is in the vicinity of 5.15 eV, surface carriers are induced by the work function difference, so that the resistance at the top of the columnar silicon layer can be reduced. For example, when the impurity concentration of the columnar silicon layer is low, the transistor formed of the first sidewall and the columnar silicon layer is turned on when the voltage applied to the first sidewall via the metal wiring is 0V. Will be. For example, ruthenium (Ru) or titanium nitride (TiN) is preferable.

  As shown in FIG. 25, the first metal 122 is etched to form the first side wall 122 made of metal around the upper side wall of the columnar semiconductor layer 106. Since the metal is in contact with the periphery of the upper sidewall of the columnar semiconductor layer, the contact area between the metal and the upper portion of the columnar semiconductor layer is increased, so that the resistance of the upper portion of the columnar semiconductor layer can be reduced.

  As described above, after depositing the first interlayer insulating film, planarizing the first interlayer insulating film, performing etch back, exposing the upper part of the columnar semiconductor layer, exposing the upper part of the columnar semiconductor layer, A fourth step of forming a first side wall made of metal around the upper side wall of the columnar semiconductor layer by depositing and etching the metal was shown.

  Next, a second interlayer insulating film is deposited, the second interlayer insulating film is flattened, etched back, an upper portion of the columnar semiconductor layer is exposed, and a fifth contact is formed to form a first contact. A resist is formed, a contact hole is formed by etching the second interlayer insulating film and the first interlayer insulating film, and a second metal is deposited on the second first conductivity type diffusion layer. 5 shows a fifth step of forming a first metal wiring by forming a first contact, forming a sixth resist for forming a metal wiring, and performing etching.

  As shown in FIG. 26, the 2nd interlayer insulation film 123 is deposited, the 2nd interlayer insulation film 123 is planarized, etch back is performed, and the columnar semiconductor layer 106 upper part is exposed.

  As shown in FIG. 27, the 5th resist 124 for forming the contact holes 125 and 126 is formed.

  As shown in FIG. 28, the second interlayer insulating film 123 and the first interlayer insulating film 121 are etched to form contact holes 125 and 126.

  As shown in FIG. 29, the 5th resist 124 is peeled.

  As shown in FIG. 30, the 2nd metal 127 is deposited and the 1st contact 128,129 is formed. Since the first metal wiring is directly connected to the upper part of the columnar semiconductor layer, a step of forming a contact on the upper part of the columnar semiconductor layer is unnecessary. Further, since the depth of the contact hole for the first contact can be reduced, it is easy to form the contact hole, and it is easy to fill the contact hole with metal. In addition, since the upper portion of the columnar semiconductor layer 106, the upper portion of the first sidewall 122, and the second metal are in contact with each other, the resistance of the upper portion of the columnar semiconductor layer can be reduced.

  As shown in FIG. 31, sixth resists 130, 131, and 132 for forming the first metal wiring are formed.

  As shown in FIG. 32, the 2nd metal 127 is etched and the 1st metal wiring 133,134,135 is formed.

  As shown in FIG. 33, the sixth resists 130, 131, 132 are peeled off.

  As described above, the second interlayer insulating film is deposited, the second interlayer insulating film is planarized, etched back, the upper portion of the columnar semiconductor layer is exposed, and the fifth contact for forming the first contact is formed. A resist is formed, a contact hole is formed by etching the second interlayer insulating film and the first interlayer insulating film, and a second metal is deposited on the second first conductivity type diffusion layer. A fifth step of forming a first metal wiring by forming a first contact, forming a sixth resist for forming a metal wiring, and performing etching is shown.

A structure of a semiconductor device obtained by the manufacturing method is shown in FIG.
As shown in FIG. 1, the semiconductor device obtained by the above method includes a fin-shaped semiconductor layer 103 formed on a semiconductor substrate 101, a columnar semiconductor layer 106 formed on the fin-shaped semiconductor layer 103, and a columnar semiconductor layer. 106, a gate insulating film 107 formed around the gate insulating film 107, a gate electrode 111a formed around the gate insulating film 107, a gate wiring 111b connected to the gate electrode 111a, and an upper portion of the columnar semiconductor layer 106. The first first conductivity type diffusion layer 114, the second first conductivity type diffusion layer 113 formed in the lower part of the columnar semiconductor layer 106 and the upper part of the fin-like semiconductor layer 103, and the upper side wall of the columnar semiconductor layer 106 And a first sidewall 122 made of a first metal formed around the first metal.

  In addition, the semiconductor device includes an upper portion of the columnar semiconductor layer 106 and a first metal wiring formed on the first sidewall 122.

  Further, as shown in FIG. 34, the first sidewall 122 may have a laminated structure of the gate insulator 107 and the first metal 122. Since the surface carriers are induced by the work function difference, the resistance of the upper part of the columnar semiconductor layer can be reduced.

  When the semiconductor layer is a silicon layer and the first conductivity type diffusion layer is n-type, the work function of the first metal is preferably between 4.0 eV and 4.2 eV. Since the work function of n-type silicon is in the vicinity of 4.05 eV, surface carriers are induced by the work function difference, so that the resistance at the top of the columnar silicon layer can be reduced. For example, when the impurity concentration of the columnar silicon layer is low, the transistor formed of the first sidewall and the columnar silicon layer is turned on when the voltage applied to the first sidewall via the metal wiring is 0V. Will be. For example, a compound of tantalum and titanium (TaTi) or tantalum nitride (TaN) is preferable.

  When the semiconductor layer is a silicon layer and the first conductivity type diffusion layer is p-type, the work function of the first metal is preferably between 5.0 eV and 5.2 eV. Since the work function of p-type silicon is in the vicinity of 5.15 eV, surface carriers are induced by the work function difference, so that the resistance at the top of the columnar silicon layer can be reduced. For example, when the impurity concentration of the columnar silicon layer is low, the transistor formed of the first sidewall and the columnar silicon layer is turned on when the voltage applied to the first sidewall via the metal wiring is 0V. Will be. For example, ruthenium (Ru) or titanium nitride (TiN) is preferable.

  It should be noted that the present invention can be variously modified and modified without departing from the broad spirit and scope of the present invention. Further, the above-described embodiment is for explaining an example of the present invention, and does not limit the scope of the present invention.

For example, in the above embodiment, a method of manufacturing a semiconductor device in which p-type (including p ⁺ -type) and n-type (including n ⁺ -type) are opposite in conductivity type, and a semiconductor obtained thereby An apparatus is naturally included in the technical scope of the present invention.

101. Semiconductor substrate 102. First resist 103. Fin-like semiconductor layer 104. First insulating film 105. Second resist 106. Columnar semiconductor layer 107. Gate insulating film 108. Metal film 109. Polysilicon film 110. Third resist 111a. Gate electrode 111b. Gate wiring 112. Fourth resist 113. Second first conductivity type diffusion layer 114. First first conductivity type diffusion layer 115. Oxide film 116a. Oxide film side wall 116b. Oxide film side wall 117. Second silicide 118. First silicide 119. Silicide 120. Silicide 121. First interlayer insulating film 122. First metal, first sidewall 123. Second interlayer insulating film 124. Fifth resist 125. Contact hole 126. Contact hole 127. Second metal 128. First contact 129. First contact 130. Sixth resist 131. Sixth resist 132. Sixth resist 133. First metal wiring 134. First metal wiring 135. First metal wiring

Claims (7)

A columnar semiconductor layer that is part of the transistor;
A gate insulating film formed around the columnar semiconductor layer;
A gate electrode formed around the gate insulating film;
A first sidewall made of a first metal formed to surround the periphery of the upper sidewall of the columnar semiconductor layer;
Have
When viewed from above, the upper surface of the first sidewall does not overlap with the upper surface of the columnar semiconductor layer. A first metal wiring formed on the columnar semiconductor layer and on the first sidewall;
The semiconductor device according to claim 1, wherein the first metal wiring is directly connected to an upper surface of the first sidewall.   The semiconductor device according to claim 1, wherein the semiconductor layer is a silicon layer.   4. The semiconductor device according to claim 3, wherein a work function of the first metal of the first sidewall is between 4.0 eV and 4.2 eV.   The semiconductor device according to claim 3, wherein a work function of the first metal of the first sidewall is between 5.0 eV and 5.2 eV.   The semiconductor device according to claim 1, wherein an upper side wall of the columnar semiconductor layer and the first side wall are in contact with each other.   The semiconductor device according to claim 1, wherein surface carriers are induced by a work function difference between an upper portion of the columnar semiconductor layer and the first sidewall.

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