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JP2016068543A5
JP2016068543A5 JP2014209438A JP2014209438A JP2016068543A5 JP 2016068543 A5 JP2016068543 A5 JP 2016068543A5 JP 2014209438 A JP2014209438 A JP 2014209438A JP 2014209438 A JP2014209438 A JP 2014209438A JP 2016068543 A5 JP2016068543 A5 JP 2016068543A5
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silica sol
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woven fabric
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しかしながら、ヒドロキシラジカルを生成させる正孔を太陽光が当たらない室内で光触媒から生成させるには光触媒に紫外線を照射する必要があり、例えば、衛生マスクなど光が届かない環境では、触媒機能が発揮されないという問題がある。また、太陽光の紫外線の代わりに照明用の可視光で動作する触媒の場合には、発生した正孔が励起されて移動した電子と再結合して失われることが多く、その防止には白金などの貴金属の配合が必要なためコストが高くなるという問題もある。これらの事情から無光下で正孔を保有し機能する触媒を坦持した材料が求められている。However, it is necessary to irradiate the photocatalyst with ultraviolet rays in order to generate holes that generate hydroxy radicals from the photocatalyst in a room that is not exposed to sunlight. For example, in an environment where light does not reach such as a sanitary mask, the catalytic function is not exhibited. There is a problem. In addition, in the case of a catalyst that operates with visible light for illumination instead of the ultraviolet rays of sunlight, the generated holes are often lost by recombining with the electrons that have been excited and moved. There is also a problem that the cost is increased because it is necessary to blend a precious metal such as. Under these circumstances, there is a demand for a material carrying a catalyst that retains holes and functions even in the absence of light.

本発明者は、前記特許文献2に開示した手段についてさらに正孔の存在を電子スピン共鳴による立証や抗ウイルス性を含む詳細な研究を続けてきた。その結果、シリカゾルを基材に塗布して℃から150℃、好ましくは、℃から50℃の雰囲気温度で乾燥させた基材−シリカゾル乾燥物複合体が無光下で正孔を保有し、水分と接触するとヒドロキシラジカルを発生することを知見し、本発明を完成したものである。The present inventor has further conducted detailed studies on the means disclosed in Patent Document 2 including the existence of holes by means of electron spin resonance and antiviral properties. As a result, the substrate-silica sol dried product composite obtained by applying silica sol to the substrate and drying it at an ambient temperature of 4 ° C. to 150 ° C., preferably 4 ° C. to 50 ° C. retains holes even in the absence of light. Thus, the present invention has been completed by knowing that hydroxyl radicals are generated when it comes into contact with moisture.

上記各発明において、基材へのシリカゾルの塗布後の乾燥雰囲気温度は、〜150℃、特に、〜50℃の範囲とするのが好ましい。In the above inventions, dry atmosphere temperature after application of the silica sol to the substrate, 4 to 150 DEG ° C., particularly preferably in the range of 4 to 50 ° C..

上記各発明において、基材を織布又は不織布のいずれか又はこれらの複合物とすることができる。In each of the above inventions, the substrate can be either a woven fabric or a nonwoven fabric, or a composite thereof.

前記基材として織布又は不織布を選択する場合には、これら基材に対するシリカの付着量を、乾燥状態において、前記基材の単位表面積当たりの質量(g・m)当たり0.1〜2.1gの範囲とすることが望ましい。また、上記場合においては、シリカゾルの塗布後の乾燥雰囲気温度を〜50℃でとすることが望ましい。When selecting a woven fabric or a non- woven fabric as the base material , the amount of silica attached to the base material is 0.1-2 per mass (g · m 2 ) per unit surface area of the base material in a dry state. Desirably, the range is 1 g. In the above case, it is desirable that the drying atmosphere temperature after the application of the silica sol is 4 to 50 ° C.

前記各発明は、水と接触した際にヒドロキシラジカルを発生すること、さらに、無光下においてウイルス不活化作用を呈することにより特徴づけられる。Each invention is to generate hydroxyl radicals upon contact with water, further characterized by exhibiting a virus inactivating effect even under no light.

上記基材―シリカゾル乾燥物複合体は、質量比で、1%以上40%以下のシリカを含有する処理液を、乾燥状態で,前記基材の単位表面積当たりの質量当たりの質量(g/mThe base material-silica sol dried composite is a mass per unit mass (g / m) per unit surface area of the base material in a dry state of a treatment liquid containing 1% to 40% silica. 2 )当たり0.1〜2.1gとなるように塗布した後、4〜150℃の雰囲気温度で乾燥させること荷より製造することができる。) And then dried at an ambient temperature of 4 to 150 ° C. to produce the load.

前記基材―シリカゾル乾燥物複合体は、マスクに適用するのが好適である。この場合において、第一に、マスクを、それを構成する部材のうち、少なくとも呼気通過部分に対し、前期発明のいずれかに記載の基材シリカゾル乾燥物複合体を有してなるものとすることができる。The substrate-silica sol dried product composite is preferably applied to a mask. In this case, first, the mask shall have the dried base silica sol composite according to any of the previous inventions, at least for the breath passage portion of the members constituting the mask. Can do.

マスクには種々のタイプがあるが、特にマスクをガーゼマスクとするのが好適であり、基材がコットン系の不織布であり、かつ乾燥雰囲気温度を4〜150℃として製造した基材−シリカゾル乾燥物複合体をその呼気透過部分に装着してなるものとすることができる。 Although the mask has various types, particularly is preferable to mask and gauze mask, a nonwoven fabric base material is cotton system, and a dry atmosphere temperature to produce a four to one hundred fifty ° C. substrate - silica sol The dried product complex may be attached to the breath permeable portion .

前記基材−シリカゾル乾燥物複合体を、基材を織布又は不織布とし、空気処理装置を構成する部材のうち、少なくとも排気側又は吸気側の一方又は双方に組み込んで空気処理装置を構成することができる。The base material-silica sol dried composite is made into a woven or non-woven base material, and is incorporated into at least one of or both the exhaust side and the intake side of members constituting the air treatment device to constitute the air treatment device. Can do.

ここに、基材−シリカゾル乾燥物複合体に適用する場合の基材としては、特に制限を設ける必要がなく、例えば、比較的低温で分解する天然繊維や合成繊維からなる織布または不織布が使用可能である。Here, as a base material when applied to the base material-silica sol dried product composite, there is no particular limitation, for example, a woven fabric or a non-woven fabric made of natural fibers or synthetic fibers that decompose at a relatively low temperature is used. Is possible.

本発明において使用するシリカゾル溶液には、水を分散媒としたものと、有機溶媒を分散媒にしたものがあり、その双方が使用可能である。その濃度は、質量比で、1〜40%程度とするのがよい。濃度が低すぎる場合には、必要な乾燥物や基材―シリカゾル乾燥物を得るために必要なシリカゾル溶液量が多くなり、生産効率の低下を招く。一方、濃度が高すぎる場合は付着量を適正範囲に管理できず基材―シリカゾル乾燥物複合体の通気度が確保しにくいなどの不具合が起きる。The silica sol solution used in the present invention includes those using water as a dispersion medium and those using an organic solvent as a dispersion medium, both of which can be used. The concentration is preferably about 1 to 40% by mass ratio. If the concentration is too low, the amount of silica sol solution required to obtain the necessary dry product or substrate-silica sol dry product increases, leading to a decrease in production efficiency. On the other hand, when the concentration is too high, the amount of adhesion cannot be controlled within an appropriate range, and problems such as difficulty in ensuring the air permeability of the base material- silica sol dry matter composite occur.

乾燥温度も重要である。乾燥雰囲気温度が150℃より高いときには、本発明の特有の効果が発現しがたくなり、逆に℃未満ではシリカゾルが凍結やゲル化しやすいため、本発明の目的を達成することができない。適当な乾燥雰囲気温度は、前記シリカゾルの濃度や乾燥の際の通風条件などにも影響されるが、一般に℃以上150℃以下、好ましくは、℃以上50℃以下とすることができる。The drying temperature is also important. When the drying atmosphere temperature is higher than 150 ° C., the specific effects of the present invention are hardly expressed. Conversely, when the temperature is lower than 4 ° C., the silica sol is easily frozen or gelled, so that the object of the present invention cannot be achieved. The appropriate drying atmosphere temperature is influenced by the concentration of the silica sol and the ventilation conditions during drying, but is generally 4 ° C. or higher and 150 ° C. or lower, preferably 4 ° C. or higher and 50 ° C. or lower.

Figure 2016068543
Figure 2016068543

市販のガーゼマスク(商品名:ふんわりコットンガーゼマスク、コットンガーゼ6層、サイズ135x95mm、株式会社大創産業製)のガーゼ重なり合い部に、実施例3で作成したシリカゾル−乾燥物複合体シート(9cm×9cm)を1枚ずつ3枚挟み込み、抗ウイルス用ガーゼマスクとした。この抗ウイルス用ガーゼマスクは、ウイルス力価の低下はlog4.8すなわち、もとのウイルスの63000分の1,99.98%低減できることになる。The silica sol-dried material composite sheet (9 cm × 9) prepared in Example 3 was placed on the gauze overlapping part of a commercially available gauze mask (trade name: soft cotton gauze mask, cotton gauze 6 layers, size 135 × 95 mm, manufactured by Daiso Sangyo Co., Ltd.). 9 cm) were sandwiched one by one to obtain an antiviral gauze mask. With this antiviral gauze mask, the decrease in virus titer is log 4.8, that is, 1,99.98% of the original virus can be reduced by 1,99.98%.

Claims (10)

織布又は不織布からなる基材と、該基材上に粒径が4nm〜0.7μmのシリカゾルを塗布後、雰囲気温度が4〜150℃で乾燥してなり正孔を保有することを特徴とする基材―シリカゾル乾燥物複合体。 A base material composed of a woven fabric or a non-woven fabric, and a silica sol having a particle size of 4 nm to 0.7 μm coated on the base material, and then dried at an atmospheric temperature of 4 to 150 ° C. to hold holes. Substrate-silica sol dried product composite. シリカ粒子の粒径が8〜20nmであることを特徴とする請求項に記載の基材−シリカゾル乾燥物複合体。The base material-silica sol dried product composite according to claim 1 , wherein the silica particles have a particle size of 8 to 20 nm. 塗布後の乾燥雰囲気温度が〜50℃であることを特徴とする請求項1〜2に記載の基材−シリカゾル乾燥物複合体。The substrate-silica sol dried product composite according to claim 1 , wherein a drying atmosphere temperature after coating is 4 to 50 ° C. 3. 基材が織布、不織布である場合において、前記基材に対するシリカゾルの付着量が、乾燥状態で、前記基材の単位表面積当たりの質量(g/m)当たり0.1〜2.1gの範囲にあることを特徴とする請求項1〜3に記載の基材−シリカゾル乾燥物複合体。 When the substrate is a woven fabric or a nonwoven fabric, the amount of silica sol attached to the substrate is 0.1 to 2.1 g per mass (g / m 2 ) per unit surface area of the substrate in a dry state. The substrate-silica sol dried product composite according to claim 1, which is in a range. 基材−シリカゾル乾燥物複合体は、水と接触した際にヒドロキシラジカルを発生することを特徴とする請求項1〜記載の基材−シリカゾル乾燥物複合体。Substrate - silica sol dry matrix composite, the substrate of claim 1-4, wherein the generating hydroxyl radicals upon contact with water - sol dried matrix composite. 無光下においてウイルス不活化作用を呈することを特徴とする請求項1〜のいずれかに記載の基材−シリカゾル乾燥物複合体。The substrate-silica sol dried product complex according to any one of claims 1 to 5 , which exhibits a virus inactivating action in the absence of light. マスクを構成する部材のうち、少なくとも呼気透過部分が請求項1〜のいずれかに記載の基材−シリカゾル乾燥物複合体により構成されていることを特徴とするマスク。Of the components included in the mask, at least expiratory transmission portion substrate according to any one of claims 1 to 6 - a mask, characterized in that it is constituted by silica sol dry matrix composite. 本体がガーゼマスクであり、その呼気透過部分に対し請求項1〜記載の基材−シリカゾル乾燥物複合体を装着してなるマスク。Body is gauze mask, claim 1 substrate 6 according to the expiratory transmissive portion - mask formed by mounting a silica sol dry matrix composite. 空気処理装置を構成する部材のうち、少なくとも排気側又は吸気側の一方又は双方に基材を織布又は不織布とする請求項1〜のいずれかに記載の基材−シリカゾル乾燥物複合体をエアフィルタ・エレメントとして装着してなる空気処理装置。The base material-silica sol dry matter composite according to any one of claims 1 to 6 , wherein the base material is a woven fabric or a non-woven fabric at least on one or both of the exhaust side and the intake side among members constituting the air treatment device. An air treatment device mounted as an air filter element. 質量比で、1%以上40%以下のシリカを含有するシリカゾル処理液を基材上に付着量が、乾燥状態で、前記基材の単位表面積当たりの質量(g/m)当たり0.1〜2.1gの範囲にるように塗布した後、〜150℃の雰囲気温度で乾燥させることを特徴とする基材−シリカゾル乾燥物複合体の製造方法。The amount of silica sol treatment liquid containing 1% or more and 40% or less of silica in a mass ratio is 0.1% per mass (g / m 2 ) per unit surface area of the substrate in a dry state. after application to so that such a range of ~2.1G, substrate and wherein the drying at ambient temperature for 4 to 150 DEG ° C. - method for producing silica sol dry matrix composite.
JP2014209438A 2014-09-24 2014-09-24 Hole-bearing substrate-silica sol dried product composite and method for producing the same Active JP6342778B2 (en)

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EP3159156B1 (en) 2015-03-30 2018-08-29 Panasonic Intellectual Property Management Co., Ltd. Heat insulation sheet, electronic equipment using same, and method for manufacturing heat insulation sheet
JP2017172068A (en) * 2016-03-23 2017-09-28 入江 敏夫 Substrate-silica sol dry matter composite, application article thereof and manufacturing method thereof
JP6484771B2 (en) * 2017-04-27 2019-03-13 入江 敏夫 Substrate-silica sol dry matter composite and method for producing the same
KR20200113184A (en) * 2019-03-20 2020-10-06 선전 캉펑 인바이론먼털 테크놀로지 디벨롭먼트 컴퍼니 리미티드 Protective device, sterilization and disinfection composite sheet material and manufacturing method thereof

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JP2013126623A (en) * 2011-12-19 2013-06-27 Tokushu Muki Zairyo Kenkyusho Catalyst body holding positive hole in light irradiation non-receiving state, method for producing the same, and antiviral/antibacterial cloth

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