JP2015019112A - Liquid recovery apparatus, exposure apparatus, exposure method, and device manufacturing method - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide an exposure apparatus which suppresses outflow of liquid to outside a substrate even when abnormality such as power failure occurs.SOLUTION: An exposure apparatus exposes a substrate by projecting an image of a pattern on the substrate via a projection optical system and liquid while filling a gap between the projection optical system and the substrate by the liquid. The exposure apparatus comprises: a liquid recovery mechanism having a driving section driven by electric power supplied from a commercial power source; and an uninterruptible power source other than the commercial power source. When the commercial power source fails, electric power supply to the driving section is switched to the uninterruptible power source.

Description

The present invention relates to a liquid recovery apparatus, an exposure apparatus, an exposure method, and a device manufacturing method, and in particular, exposure that fills a space between a projection optical system and a substrate with a liquid and exposes a pattern onto the substrate through the projection optical system and the liquid. The present invention relates to an apparatus and a device manufacturing method using the exposure apparatus.
This application claims priority on Japanese Patent Application No. 2003-307771 filed on August 29, 2003 and Japanese Patent Application No. 2004-150353 filed on May 20, 2004, the contents of which are incorporated herein by reference. To do.

Semiconductor devices and liquid crystal display devices are manufactured by a so-called photolithography technique in which a pattern formed on a mask is transferred onto a photosensitive substrate. An exposure apparatus used in this photolithography process has a mask stage for supporting a mask and a substrate stage for supporting a substrate, and a mask pattern is transferred via a projection optical system while sequentially moving the mask stage and the substrate stage. It is transferred to the substrate. In recent years, in order to cope with higher integration of device patterns, higher resolution of the projection optical system is desired. The resolution of the projection optical system becomes higher as the exposure wavelength used becomes shorter and the numerical aperture of the projection optical system becomes larger. Therefore, the exposure wavelength used in the exposure apparatus is shortened year by year, and the numerical aperture of the projection optical system is also increasing. The mainstream exposure wavelength is 248 nm of the KrF excimer laser, but the 193 nm of the shorter wavelength ArF excimer laser is also being put into practical use. Also, when performing exposure, the depth of focus (DOF) is important as well as the resolution. The resolution R and the depth of focus δ are each expressed by the following equations.
R = k ₁ · λ / NA (1)
δ = ± k ₂ · λ / NA ² (2)
Here, λ is the exposure wavelength, NA is the numerical aperture of the projection optical system, and k ₁ and k ₂ are process coefficients. From the equations (1) and (2), it can be seen that the depth of focus δ becomes narrower when the exposure wavelength λ is shortened and the numerical aperture NA is increased in order to increase the resolution R.

  If the depth of focus δ becomes too narrow, it becomes difficult to match the substrate surface with the image plane of the projection optical system, and the margin during the exposure operation may be insufficient. Therefore, as a method for substantially shortening the exposure wavelength and increasing the depth of focus, for example, an immersion method disclosed in International Publication No. 99/49504 is proposed. In this immersion method, the space between the lower surface of the projection optical system and the substrate surface is filled with a liquid such as water or an organic solvent, and the wavelength of the exposure light in the liquid is 1 / n (n is the refractive index of the liquid). The resolution is improved by utilizing the fact that the ratio is usually about 1.2 to 1.6), and the depth of focus is expanded about n times.

International Publication No. 99/49504 Pamphlet

  By the way, the exposure apparatus disclosed in the above document is configured to form a liquid immersion area on the substrate by supplying and recovering the liquid using the liquid supply mechanism and the liquid recovery mechanism. When the drive of the liquid recovery mechanism stops due to an abnormality in the power supply due to the liquid etc., the liquid remaining on the substrate leaks to the outside of the substrate stage or scatters, so that the liquid is transferred to the machine parts around the substrate stage. This causes inconveniences such as rust and breakdown.

  The present invention has been made in view of such circumstances, and in the event of a power failure due to a power failure or the like, a liquid recovery apparatus, an exposure apparatus, an exposure method, and the like that can suppress the outflow and scattering of the liquid, It is another object of the present invention to provide a device manufacturing method using the exposure apparatus.

  A first exposure apparatus of the present invention is an exposure apparatus that exposes a substrate by filling a space between the projection optical system and the substrate with a liquid and projecting a pattern image onto the substrate through the projection optical system and the liquid. , A liquid recovery mechanism having a drive unit driven by power supplied from the first power source, and a second power source different from the first power source. It is characterized by switching to two power sources.

  According to the present invention, when the liquid recovery mechanism is driven by the electric power supplied from the first power source, the power supply to the liquid recovery mechanism is switched to the second power source even when the first power source is abnormal. The liquid remaining on the liquid is not left and is recovered by a liquid recovery mechanism driven by electric power supplied from the second power source. Therefore, the outflow of the liquid can be prevented, and the occurrence of inconvenience due to the outflow of the liquid can be prevented.

According to a second exposure apparatus of the present invention, there is provided a liquid recovery mechanism for recovering the liquid supplied to the substrate by the electric power supplied from the first power source in the exposure apparatus that exposes the pattern image onto the substrate by the projection optical system. And a second power source for supplying power to the liquid recovery mechanism at least when the first power source is abnormal.
According to the present invention, since the second power supply supplies power to the liquid recovery mechanism when the first power supply is abnormal, the liquid supplied to the substrate can be recovered even when the first power supply is abnormal, and the machine around the substrate can be recovered. Deterioration of components and electrical components can be prevented.

  A third exposure apparatus of the present invention is an exposure apparatus that exposes a substrate by filling a space between the projection optical system and the substrate with a liquid and projecting an image of a pattern onto the substrate through the projection optical system and the liquid. The liquid supply mechanism includes a liquid supply mechanism that supplies a liquid, and the liquid supply mechanism includes a discharge mechanism that discharges the liquid remaining in the liquid supply flow path after a power failure.

  According to the present invention, when a power failure occurs, the liquid remaining in the liquid supply flow path is discharged by the discharge mechanism. Therefore, if the discharged liquid is collected, the liquid supply mechanism then moves onto the substrate. The inconvenience that the liquid leaks can be prevented.

  According to a fourth exposure apparatus of the present invention, an exposure apparatus that exposes the substrate by filling a space between the projection optical system and the substrate with a liquid and projecting an image of a pattern onto the substrate through the projection optical system and the liquid. The liquid supply mechanism includes a liquid supply mechanism having a liquid supply flow path for supplying a liquid, and the liquid supply mechanism has a blocking portion that blocks the liquid supply flow path when an abnormality occurs.

  According to the present invention, since the blocking unit blocks the liquid supply flow path, it is possible to prevent deterioration of mechanical components and electrical components around the substrate caused by the liquid even in an abnormal state.

  A fifth exposure apparatus of the present invention is an exposure apparatus that exposes a substrate by filling a space between the projection optical system and the substrate with a liquid and projecting an image of a pattern onto the substrate through the projection optical system and the liquid. The liquid supply mechanism includes a liquid supply mechanism that supplies a liquid, and the liquid supply mechanism includes a sensor that detects the presence or absence of the liquid remaining in the liquid supply flow path at the time of a power failure.

According to the present invention, when a power failure occurs, the presence / absence of liquid remaining in the liquid supply channel can be confirmed. Therefore, if the sensor finds that liquid remains, the liquid is collected. As a result, the inconvenience of liquid leaking from the liquid supply mechanism onto the substrate can be prevented.

  The liquid recovery apparatus of the present invention is a liquid recovery apparatus having a liquid recovery mechanism that recovers the liquid supplied to the substrate by the electric power supplied from the first power supply. At least when the first power supply is abnormal, the liquid recovery mechanism is powered. A second power supply is provided.

  According to the present invention, since the second power supply supplies power to the liquid recovery mechanism when the first power supply is abnormal, the liquid supplied to the substrate can be recovered even when the first power supply is abnormal, and the machine around the substrate can be recovered. Deterioration of components and electrical components can be prevented.

  According to a first exposure method of the present invention, a liquid is supplied between a projection optical system and a substrate, and a pattern is exposed on the substrate through the projection optical system and the liquid. Recovering the liquid by the liquid recovery mechanism using the supplied power, and recovering the liquid by the liquid recovery mechanism using the power supplied from the second power source different from the first power source at least when the first power source is abnormal. And a step.

  According to the present invention, since the second power supply supplies power to the liquid recovery mechanism when the first power supply is abnormal, the liquid supplied to the substrate can be recovered even when the first power supply is abnormal, and the machine around the substrate can be recovered. Deterioration of components and electrical components can be prevented.

  A sixth exposure apparatus of the present invention includes a liquid supply mechanism having a supply path for supplying a liquid between the projection optical system and the substrate in an exposure apparatus that exposes a pattern image on the substrate by the projection optical system. A suction part having a suction path for sucking liquid is provided in the liquid supply mechanism.

  According to the present invention, since the suction unit sucks the liquid of the liquid supply mechanism through the suction path, even if an abnormality occurs in the liquid supply mechanism or the exposure apparatus main body, there is a problem such as liquid leakage from the liquid supply mechanism. Can be prevented. For this reason, the mechanical parts and electrical parts around the substrate do not deteriorate.

  The second exposure method of the present invention has a liquid supply mechanism for supplying a liquid between the projection optical system and the substrate, and in the exposure method for exposing a pattern image on the substrate by the projection optical system, the exposure processing state And a step of sucking the liquid from the liquid supply mechanism.

  According to the present invention, since the liquid is sucked from the liquid supply mechanism in accordance with the exposure processing state, inconveniences such as liquid leakage from the liquid supply mechanism can be prevented even when an abnormality occurs in the liquid supply mechanism. it can. For this reason, the mechanical parts and electrical parts around the substrate do not deteriorate.

  In addition, in order to explain the present invention in an easy-to-understand manner, the description has been made in association with the reference numerals of the drawings representing one embodiment, but it goes without saying that the present invention is not limited to the embodiment.

  According to the present invention, since the outflow of liquid can be prevented even when a power supply abnormality such as a power failure occurs, the occurrence of inconvenience due to the outflowed liquid can be prevented. Further, it is possible to prevent a problem that the liquid leaks from the liquid supply mechanism when the liquid supply is unnecessary. Therefore, the pattern can be transferred onto the substrate with high accuracy, and a device having high pattern accuracy can be manufactured.

FIG. 1 is a schematic block diagram that shows the exposure apparatus of the present embodiment. FIG. 2 is a diagram illustrating the positional relationship between the tip of the projection optical system, the liquid supply mechanism, and the liquid recovery mechanism. FIG. 3 is a diagram illustrating an arrangement example of the supply nozzle and the recovery nozzle. FIG. 4 is a schematic perspective view of the substrate stage. FIG. 5 is an enlarged cross-sectional view of a main part showing an embodiment of the second liquid recovery mechanism. FIG. 6 is a schematic block diagram showing another embodiment of the exposure apparatus of the present invention. 7A, 7B and 7C are schematic views showing an example of the exposure operation of the present invention. 8A and 8B are schematic diagrams showing the behavior of the liquid in the supply path. 9A and 9B are schematic views showing the behavior of the liquid in the supply path. FIG. 10 is a flowchart showing an example of a semiconductor device manufacturing process.

  The present invention will be described below with reference to the drawings. FIG. 1 is a schematic block diagram that shows the exposure apparatus of this embodiment.

  In FIG. 1, an exposure apparatus EX includes a mask stage MST that supports a mask M, a substrate stage PST that supports a substrate P, and an illumination optical system IL that illuminates the mask M supported by the mask stage MST with exposure light EL. A projection optical system PL that projects and exposes an image of the pattern of the mask M illuminated by the exposure light EL onto the substrate P supported by the substrate stage PST, and a control device CONT that controls the overall operation of the exposure apparatus EX. It has. Note that the chamber indicated by the dotted line in FIG. 1 houses at least the mask stage MST, the substrate stage PST, the illumination optical system IL, and the projection optical system PL, and maintains a predetermined temperature and humidity. The entire exposure apparatus EX is supplied from an electric power company and is driven by electric power from a commercial power supply (first power supply) 100 disposed outside the chamber.

  The exposure apparatus EX of the present embodiment is an immersion exposure apparatus to which an immersion method is applied in order to improve the resolution by substantially shortening the exposure wavelength and substantially increase the depth of focus. A liquid supply mechanism 10 for supplying the liquid 1 to the substrate P, and a liquid recovery mechanism 20 for recovering the liquid 1 on the substrate P. While transferring at least the pattern image of the mask M onto the substrate P, the exposure apparatus EX uses a liquid 1 supplied from the liquid supply mechanism 10 to a part on the substrate P including the projection area AR1 of the projection optical system PL ( Locally) the immersion area AR2 is formed. Specifically, the exposure apparatus EX fills the liquid 1 between the optical element 2 at the front end (end portion) of the projection optical system PL and the surface of the substrate P, and between the projection optical system PL and the substrate P. The substrate P is exposed by projecting the pattern image of the mask M onto the substrate P through the liquid 1 and the projection optical system PL.

  In the present embodiment, the exposure apparatus EX is a scanning exposure apparatus (so-called so-called exposure apparatus EX) that exposes the pattern formed on the mask M onto the substrate P while synchronously moving the mask M and the substrate P in different directions (reverse directions) in the scanning direction. A case where a scanning stepper) is used will be described as an example. In the following description, the direction that coincides with the optical axis AX of the projection optical system PL is the Z-axis direction, the synchronous movement direction (scanning direction) between the mask M and the substrate P in the plane perpendicular to the Z-axis direction is the X-axis direction, A direction (non-scanning direction) perpendicular to the Z-axis direction and the X-axis direction is defined as a Y-axis direction. Further, the rotation (inclination) directions around the X axis, Y axis, and Z axis are the θX, θY, and θZ directions, respectively. Here, the “substrate” includes a semiconductor wafer coated with a photoresist, which is a photosensitive material, and the “mask” includes a reticle on which a device pattern to be reduced and projected on the substrate is formed.

The illumination optical system IL illuminates the mask M supported by the mask stage MST with the exposure light EL, the exposure light source for emitting the exposure light EL, and the illuminance of the exposure light EL emitted from the exposure light source An optical integrator for uniforming the exposure light, a condenser lens for condensing the exposure light EL from the optical integrator, a relay lens system, a variable field stop for setting the illumination area on the mask M by the exposure light EL in a slit shape, and the like. . A predetermined illumination area on the mask M is illuminated with the exposure light EL having a uniform illuminance distribution by the illumination optical system IL. The exposure light EL emitted from the light source for exposure is, for example, far ultraviolet light (DUV) such as ultraviolet emission lines (g line, h line, i line) and KrF excimer laser light (wavelength 248 nm) emitted from a mercury lamp. Light), vacuum ultraviolet light (VUV light) such as ArF excimer laser light (wavelength 193 nm) and F ₂ laser light (wavelength 157 nm). In this embodiment, ArF excimer laser light is used.

  In the present embodiment, pure water is used for the liquid 1 supplied from the liquid supply mechanism 10. Pure water is not only ArF excimer laser light, but also far ultraviolet light (DUV light) such as ultraviolet emission lines (g-line, h-line, i-line) emitted from mercury lamps and KrF excimer laser light (wavelength 248 nm). Can also be transmitted.

  The mask stage MST supports the mask M, and can move two-dimensionally in a plane perpendicular to the optical axis AX of the projection optical system PL, that is, in the XY plane, and can be slightly rotated in the θZ direction. The mask stage MST is driven by a mask stage driving device MSTD such as a linear motor. The mask stage driving device MSTD is controlled by the control device CONT. The two-dimensional position and rotation angle of the mask M on the mask stage MST are measured in real time by a laser interferometer (not shown), and the measurement result is output to the control unit CONT. The control device CONT drives the mask stage driving device MSTD based on the measurement result of the laser interferometer, thereby positioning the mask M supported on the mask stage MST.

  The projection optical system PL projects and exposes the pattern of the mask M onto the substrate P at a predetermined projection magnification β, and is composed of a plurality of optical elements (such as lenses). These optical elements are a lens barrel PK. It is supported. In the present embodiment, the projection optical system PL is a reduced inverted system whose projection magnification β is, for example, 1/4 or 1/5. Note that the projection optical system PL may be either an equal magnification system or an enlargement system. The projection optical system PL may be not only a refraction system but also a catadioptric system or a reflection system, and may form either an inverted image or an erect image. Further, the optical element 2 is exposed from the lens barrel PK on the front end side (substrate P side) of the projection optical system PL of the present embodiment. This optical element 2 is detachably (replaceable) with respect to the lens barrel PK.

  The substrate stage PST supports the substrate P and includes a Z stage (substrate holder) 51 that holds the substrate P via a substrate holder, an XY stage 52 that supports the Z stage 51, and an XY stage 52. And a base 53. The substrate stage PST is driven by a substrate stage driving device PSTD such as a linear motor. The substrate stage driving device PSTD is controlled by the control device CONT. By driving the Z stage 51, the position (focus position) of the substrate P held by the Z stage 51 in the Z-axis direction and the positions in the θX and θY directions are controlled. Further, by driving the XY stage 52, the position of the substrate P in the XY direction (position in a direction substantially parallel to the image plane of the projection optical system PL) is controlled. That is, the Z stage 51 controls the focus position and the tilt angle of the substrate P to adjust the surface of the substrate P to the image plane of the projection optical system PL by the autofocus method and the auto leveling method. Is positioned in the X-axis direction and the Y-axis direction. Needless to say, the Z stage and the XY stage may be provided integrally.

  A movable mirror 45 is provided on the substrate stage PST (Z stage 51). A laser interferometer 46 is provided at a position facing the moving mirror 45. The two-dimensional position and rotation angle of the substrate P on the substrate stage PST are measured in real time by the laser interferometer 46, and the measurement result is output to the control device CONT. The controller CONT positions the substrate P supported by the substrate stage PST by driving the substrate stage drive device PSTD based on the measurement result of the laser interferometer 46.

  An auxiliary plate 43 is provided on the substrate stage PST (Z stage 51) so as to surround the substrate P. The auxiliary plate 43 has a flat surface that is substantially the same height as the surface of the substrate P held by the Z stage (substrate holder) 51. Even when the edge region of the substrate P is exposed, the liquid 1 can be held under the projection optical system PL by the auxiliary plate 43.

  A recovery port 61 of a second liquid recovery mechanism 60 that recovers the liquid 1 that has flowed out of the substrate P is provided outside the auxiliary plate 43 in the Z stage 51. The recovery port 61 is an annular groove formed so as to surround the auxiliary plate 43, and a liquid absorbing member 62 made of a sponge-like member, a porous body, or the like is disposed therein.

  FIG. 2 is an enlarged view showing the liquid supply mechanism 10, the liquid recovery mechanism 20, and the vicinity of the projection optical system PL tip. The liquid supply mechanism 10 supplies the liquid 1 between the projection optical system PL and the substrate P. The liquid supply unit 11 can deliver the liquid 1 and the liquid supply unit 11 via the supply pipe 15. A supply nozzle 14 connected to supply the liquid 1 delivered from the liquid supply unit 11 onto the substrate P is provided. The supply nozzle 14 is disposed close to the surface of the substrate P. The liquid supply unit 11 includes a tank that stores the liquid 1, a pressure pump, and the like, and supplies the liquid 1 onto the substrate P through the supply pipe 15 and the supply nozzle 14. The liquid supply operation of the liquid supply unit 11 is controlled by the control device CONT, and the control device CONT can control the liquid supply amount per unit time on the substrate P by the liquid supply unit 11. The liquid supply unit 11 may use a liquid supply system in a factory without being provided in the exposure apparatus.

  In the middle of the supply pipe 15, a valve (blocking portion) 13 that opens and closes the flow path of the supply pipe 15 is provided. The opening / closing operation of the valve 13 is controlled by the control device CONT.

  Note that the valve 13 in the present embodiment is a so-called mechanical shut-off of the liquid supply flow path of the supply pipe 15 when the drive source (commercial power supply 100) of the exposure apparatus EX (control apparatus CONT) stops due to, for example, a power failure. It is normally closed.

  In addition, the other end of the suction pipe 18 that connects one end of the supply pipe 15 to the third liquid recovery mechanism 17 is connected (joined) between the valve 13 and the supply nozzle 14. A valve 16 that opens and closes the flow path of the suction pipe 18 is provided in the middle of the suction pipe 18. The other end of the suction pipe 18 joins a position immediately after the valve 13 downstream in the liquid supply flow path of the supply pipe 15.

  The liquid recovery mechanism 20 recovers the liquid 1 on the substrate P supplied by the liquid supply mechanism 10, and includes a recovery nozzle 21 disposed close to the surface of the substrate P, and a recovery tube connected to the recovery nozzle 21. 24 and a vacuum system 25 connected through 24. The vacuum system 25 includes a vacuum pump, and its operation is controlled by the control device CONT. When the vacuum system 25 is driven, the liquid 1 on the substrate P is recovered through the recovery nozzle 21 together with the surrounding gas (air). As the vacuum system 25, a vacuum system in a factory where the exposure apparatus EX is disposed may be used without providing a vacuum pump in the exposure apparatus.

A gas-liquid separator 22 that separates the liquid 1 sucked from the recovery nozzle 21 and the gas is provided in the middle of the recovery pipe 24. Here, as described above, the recovery nozzle 21 recovers the surrounding gas as well as the liquid 1 on the substrate P. The gas-liquid separator 22 separates the liquid 1 and gas recovered from the recovery nozzle 21. As the gas-liquid separator 22, for example, the collected liquid and gas are circulated through a tube member having a plurality of holes, and the liquid and the gas are separated by dropping the liquid through the holes by gravity. A gravity separation system, a centrifugal separation system that separates recovered liquid and gas using centrifugal force, or the like can be employed. The vacuum system 25 sucks the gas separated by the gas-liquid separator 22.

  In the recovery tube 24, a dryer 23 that dries the gas separated by the gas-liquid separator 22 is provided between the vacuum system 25 and the gas-liquid separator 22. Even if a liquid component is mixed in the gas separated by the gas-liquid separator 22, the liquid component flows in by drying the gas with the dryer 23 and flowing the dried gas into the vacuum system 25. It is possible to prevent the occurrence of inconvenience such as failure of the vacuum system 25 due to the above. As the dryer 23, for example, a method of removing the liquid component by cooling the gas supplied from the gas-liquid separator 22 (a gas in which the liquid component is mixed) below the dew point of the liquid, or the boiling point of the liquid. A method of removing the liquid component by heating to the above can be adopted.

  On the other hand, the liquid 1 separated by the gas-liquid separator 22 is recovered by the liquid recovery unit 28 via the second recovery pipe 26. The liquid recovery unit 28 includes a tank or the like that stores the recovered liquid 1. The liquid 1 recovered by the liquid recovery unit 28 is discarded or cleaned, for example, and returned to the liquid supply unit 11 or the like for reuse.

  The liquid recovery mechanism 20 is connected to an uninterruptible voltage power supply (backup power supply) 102 that supplies electric power to the drive unit of the liquid recovery mechanism 20 in the event of a power failure of the commercial power supply 100. The uninterruptible power system (UPS: Uninterruptible Power System) is a device that supplies stable electricity using the electricity stored in the internal storage battery even when various power supply problems such as power outages and voltage fluctuations occur. . In this embodiment, in order to avoid the influence of heat generation of the non-stop voltage power source 102, the non-stop voltage power source 102 is disposed outside the chamber. In the present embodiment, when the commercial power supply 100 is blacked out, the uninterruptible voltage power supply 102 includes the power drive unit of the vacuum system 25, the power drive unit of the separator 22, and the power drive unit of the dryer 23 in the liquid recovery mechanism 20. Each is supplied with electric power. The uninterruptible voltage power supply 102 may supply power to each power drive unit together with the commercial power supply 100, or may supply power to each power drive unit in accordance with voltage fluctuations of the commercial power supply 100. Further, the uninterruptible voltage power supply 102 may be disposed inside the chamber.

  The supply pipe 15 is provided with a liquid sensor 81 for detecting whether or not the liquid 1 is present in the supply pipe 15 (whether the liquid 1 is circulating). The liquid sensor 81 is provided in the vicinity of the supply nozzle 14 in the supply pipe 15. Further, the recovery pipe 24 is provided with a liquid sensor 82 that detects whether or not the liquid 1 is present in the recovery pipe 24 (whether the liquid 1 is circulating). The liquid sensor 82 is provided in the vicinity of the recovery nozzle 21 in the recovery pipe 24. In the present embodiment, the liquid sensor 81 (82) optically detects the liquid 1. For example, the supply pipe 15 (recovery pipe 24) is made of a transparent member, and the liquid sensor 81 (82) is attached to the outside of the supply pipe 15 (recovery pipe 24). It is possible to detect whether the liquid 1 is flowing through the pipe 15 (recovery pipe 24). The liquid sensors 81 and 82 are driven by electric power supplied from the commercial power source 100. When the commercial power source 100 fails, the liquid sensors 81 and 82 are driven by electric power supplied from the uninterruptible power source 102.

  Further, the liquid recovery mechanism 20 is provided with a storage device MRY that stores various types of information related to the immersion exposure process including information about the liquid 1. As will be described later, at the time of a power failure of the commercial power supply 100, the liquid recovery mechanism 20 is driven based on the stored information of the storage device MRY.

FIG. 3 is a plan view showing the positional relationship between the liquid supply mechanism 10 and the liquid recovery mechanism 20 and the projection area AR1 of the projection optical system PL. The projection area AR1 of the projection optical system PL has a rectangular shape (slit shape) elongated in the Y-axis direction, and three supply nozzles 14A to 14C are arranged on the + X side so as to sandwich the projection area AR1 in the X-axis direction. And two recovery nozzles 21A, 21 on the -X side.
B is arranged. The supply nozzles 14 </ b> A to 14 </ b> C are connected to the liquid supply unit 11 via the supply pipe 15, and the recovery nozzles 21 </ b> A and 21 </ b> B are connected to the vacuum system 25 via the recovery pipe 24. The supply nozzles 14A ′ to 14C ′ and the recovery nozzles 21A ′ and 21B ′ are arranged so that the supply nozzles 14A to 14C and the recovery nozzles 21A and 21B are rotated by approximately 180 °. The supply nozzles 14A to 14C and the recovery nozzles 21A ′ and 21B ′ are alternately arranged in the Y-axis direction, and the supply nozzles 14A ′ to 14C ′ and the recovery nozzles 21A and 21B are alternately arranged in the Y-axis direction. 14A ′ to 14C ′ are connected to the liquid supply unit 11 via the supply pipe 15 ′, and the recovery nozzles 21A ′ and 21B ′ are connected to the vacuum system 25 via the recovery pipe 24 ′. In the middle of the supply pipe 15 ′, a valve 13 ′ is provided in the same way as the supply pipe 15, and a suction pipe 18 ′ having a valve 16 ′ connected to the third liquid recovery mechanism 17 ′ joins. doing. Further, in the middle of the recovery pipe 24 ′, a gas-liquid separator 22 ′ and a dryer 23 ′ are provided in the same manner as the recovery pipe 24.

  The shape of the nozzle described above is not particularly limited. For example, the liquid 1 may be supplied or recovered with two pairs of nozzles on the long side of the projection area AR1. In this case, in order to be able to supply and recover the liquid 1 from either the + X direction or the −X direction, the supply nozzle and the recovery nozzle may be arranged vertically. Good.

  FIG. 4 is a perspective view of the Z stage 51, and FIG. 5 is an enlarged cross-sectional view of the main part showing the second liquid recovery mechanism 60 provided on the Z stage 51. The second liquid recovery mechanism 60 recovers the liquid 1 that has flowed out of the substrate P, and has a recovery port 61 formed in an annular shape so as to surround the auxiliary plate 43 on the Z stage (substrate holder) 51. And a liquid absorbing member 62 which is disposed in the recovery port 61 and is made of a porous material such as a sponge-like member or porous ceramics. The liquid absorbing member 62 is an annular member having a predetermined width and can hold a predetermined amount of the liquid 1. The liquid absorbing member 62 arranged so as to surround the outer periphery of the auxiliary plate 43 with a predetermined width plays a role of absorbing (recovering) the liquid 1 that has not been recovered by the liquid recovery mechanism 20 and has flowed out of the auxiliary plate 43. Yes. A flow path 63 continuous with the recovery port 61 is formed inside the Z stage 51, and the bottom of the liquid absorbing member 62 disposed in the recovery port 61 is connected to the flow path 63. A plurality of liquid recovery holes 64 are provided between the substrate P on the Z stage 51 and the auxiliary plate 43. These liquid recovery holes 64 are also connected to the flow path 63.

  A plurality of protrusions 65 for supporting the back surface of the substrate P are provided on the upper surface of the Z stage (substrate holder) 51 that holds the substrate P. Each of the protrusions 65 is provided with a suction hole 66 for sucking and holding the substrate P. Each of the suction holes 66 is connected to a flow path 67 formed inside the Z stage 51.

  The flow path 63 connected to each of the recovery port 61 and the liquid recovery hole 64 is connected to one end portion of a pipe line 68 provided outside the Z stage 51. On the other hand, the other end of the pipe 68 is connected to a vacuum system 70 including a vacuum pump. A gas-liquid separator 71 is provided in the middle of the pipe 68, and a dryer 72 is provided between the gas-liquid separator 71 and the vacuum system 70. By driving the vacuum system 70, the liquid 1 is recovered from the recovery port 61 together with the surrounding gas. The gas separated by the gas-liquid separator 71 and dried by the dryer 72 flows into the vacuum system 70. On the other hand, the liquid 1 separated by the gas-liquid separator 71 flows into the liquid recovery unit 73 including a tank or the like that can store the liquid 1. The liquid 1 collected in the liquid collection unit 73 is discarded or cleaned, for example, and returned to the liquid supply unit 11 or the like for reuse.

Further, the flow path 67 connected to the suction hole 66 is connected to one end of a pipe line 69 provided outside the Z stage 51. On the other hand, the other end of the conduit 69 is connected to a vacuum system 74 including a vacuum pump provided outside the Z stage 51. By driving the vacuum system 74, the substrate P supported by the protrusion 65 is sucked and held in the suction hole 66. A gas-liquid separator 75 is provided in the middle of the pipe 69, and a dryer 76 is provided between the gas-liquid separator 75 and the vacuum system 74. The gas-liquid separator 75 is connected to a liquid recovery unit 73 including a tank or the like that can store the liquid 1. Even if the liquid 1 enters between the substrate P and the auxiliary plate 43 and goes around to the back surface side of the substrate P, the liquid is collected from the adsorption holes 66 together with the surrounding gas.

  In FIG. 4, a moving mirror 45X extending in the Y-axis direction is provided at the + X side end of the Z stage 51, and a moving mirror 45Y extending in the X-axis direction is provided at the Y-side end. Yes. The laser interferometer irradiates the movable mirrors 45X and 45Y with laser light to detect the positions of the substrate stage PST in the X-axis direction and the Y-axis direction.

  Next, a procedure for exposing the pattern of the mask M onto the substrate P using the above-described exposure apparatus EX will be described.

  After the mask M is loaded on the mask stage MST and the substrate P is loaded on the substrate stage PST, the control device CONT drives the liquid supply unit 11 of the liquid supply mechanism 10 to connect the supply pipe 15 and the supply nozzle 14. A predetermined amount of liquid 1 per unit time is supplied onto the substrate P. At this time, the liquid supply flow path of the supply pipe 15 is opened, and the flow path of the suction pipe 18 is closed by the valve 16. Further, the control device CONT drives the vacuum system 25 of the liquid recovery mechanism 20 in accordance with the supply of the liquid 1 by the liquid supply mechanism 10, and supplies a predetermined amount of the liquid 1 per unit time via the recovery nozzle 21 and the recovery pipe 24. to recover. Thereby, an immersion area AR2 of the liquid 1 is formed between the optical element 2 at the tip of the projection optical system PL and the substrate P. At this time, the entire exposure apparatus EX is driven by electric power supplied from the commercial power supply 100. Here, in order to form the liquid immersion area AR2, the control device CONT uses the liquid supply mechanism 10 and the liquid so that the liquid supply amount on the substrate P and the liquid recovery amount from the substrate P are substantially the same. Each of the collection mechanisms 20 is controlled. Then, the control unit CONT causes the exposure apparatus EX to illuminate the mask M with the exposure light EL by the illumination optical system IL, and to project an image of the pattern of the mask M onto the substrate P via the projection optical system PL and the liquid 1. Take control.

  At the time of scanning exposure, a part of the pattern image of the mask M is projected onto the projection area AR1, and the mask M moves in the −X direction (or + X direction) at the velocity V with respect to the projection optical system PL. Then, the substrate P moves in the + X direction (or -X direction) at a speed β · V (β is the projection magnification) via the substrate stage PST. Then, after the exposure of one shot area is completed, the next shot area is moved to the scanning start position by stepping the substrate P, and thereafter, the exposure process for each shot area is sequentially performed by the step-and-scan method. In the present embodiment, the liquid 1 is set to flow in the same direction as the movement direction of the substrate P in parallel with the movement direction of the substrate P. That is, when scanning exposure is performed by moving the substrate P in the scanning direction (−X direction) indicated by the arrow Xa (see FIG. 3), the supply pipe 15, the supply nozzles 14A to 14C, the recovery pipe 24, and the recovery nozzle Supply and recovery of the liquid 1 by the liquid supply mechanism 10 and the liquid recovery mechanism 20 are performed using 21A and 21B. That is, when the substrate P moves in the −X direction, the liquid 1 is supplied from the supply nozzle 14 (14A to 14C) between the projection optical system PL and the substrate P, and the recovery nozzle 21 (21A, 21B). ), The liquid 1 on the substrate P is collected together with the surrounding gas, and the liquid 1 flows in the −X direction so as to fill the space between the optical element 2 at the tip of the projection optical system PL and the substrate P. On the other hand, when scanning exposure is performed by moving the substrate P in the scanning direction (+ X direction) indicated by the arrow Xb (see FIG. 3), the supply pipe 15 ′, the supply nozzles 14A ′ to 14C ′, the recovery pipe 24 ′, The liquid 1 is supplied and recovered by the liquid supply mechanism 10 and the liquid recovery mechanism 20 using the recovery nozzles 21A ′ and 21B ′. That is, when the substrate P moves in the + X direction, the liquid 1 is supplied between the projection optical system PL and the substrate P from the supply nozzle 14 ′ (14A ′ to 14C ′), and the recovery nozzle 21 ′ ( 21A ′, 21B ′) collects the liquid 1 on the substrate P together with the surrounding gas, and the liquid 1 flows in the + X direction so as to satisfy the space between the optical element 2 at the tip of the projection optical system PL and the substrate P. . In this case, for example, the liquid 1 supplied via the supply nozzle 14 flows so as to be drawn between the optical element 2 and the substrate P as the substrate P moves in the −X direction. Even if the supply energy of the (liquid supply unit 11) is small, the liquid 1 can be easily supplied between the optical element 2 and the substrate P. Then, by switching the direction in which the liquid 1 flows according to the scanning direction, the liquid 1 is moved between the optical element 2 and the substrate P when the substrate P is scanned in either the + X direction or the −X direction. And a high resolution and a wide depth of focus can be obtained.

  While the shot area near the center of the substrate P is exposed, the liquid 1 supplied from the liquid supply mechanism 10 is recovered by the liquid recovery mechanism 20. On the other hand, as shown in FIG. 5, when the immersion area AR <b> 2 is in the vicinity of the edge area of the substrate P by performing the exposure process on the edge area of the substrate P, the auxiliary plate 43 allows the projection optical system PL to be positioned between the substrate P Although the liquid 1 can continue to be held, a part of the fluid 1 may flow out of the auxiliary plate 43. The liquid 1 that has flowed out is recovered from the recovery port 61 in which the liquid absorbing member 62 is disposed. Here, the control device CONT starts the operation of the second liquid recovery mechanism 60 together with the start of driving of the liquid supply mechanism 10 and the liquid recovery mechanism 20. Therefore, the liquid 1 recovered from the recovery port 61 is recovered through the flow path 63 and the pipe line 68 together with the surrounding air by the suction of the vacuum system 70. Further, the liquid 1 that has flowed into the gap between the substrate P and the auxiliary plate 43 is recovered through the flow path 63 and the pipe line 68 together with the surrounding air through the liquid recovery hole 64. At this time, the separator 71 separates the liquid 1 and gas recovered from the recovery port 61 and the recovery hole 64. The gas separated by the separator 71 flows into the vacuum system 70 after being dried by the dryer 72. Thereby, the inconvenience that the liquid component flows into the vacuum system 70 can be prevented. On the other hand, the liquid separated by the separator 71 is recovered by the liquid recovery unit 73.

  The liquid 1 that has flowed out of the substrate P may enter the gap between the substrate P and the auxiliary plate 43 and reach the back side of the substrate P. Then, there is a possibility that the liquid 1 entering the back side of the substrate P flows into the suction hole 66 for holding the substrate P by suction. In this case, the suction hole 66 provided in the Z stage 51 for sucking and holding the substrate P is connected to the vacuum system 74 through the flow path 67 and the pipe line 69, and in the middle of the gas-liquid separator 75. And a dryer 76 for drying the gas separated by the gas-liquid separator 75. Therefore, even if the liquid 1 flows into the suction hole 66, the inconvenience of the liquid component flowing into the vacuum system 74 can be prevented.

  By the way, in the exposure apparatus EX of this embodiment, each power drive part which comprises the exposure apparatus EX containing the liquid supply mechanism 10, the liquid collection | recovery mechanism 20, and the 2nd liquid collection | recovery mechanism 60 is the electric power supplied from the commercial power supply 100. However, when the commercial power supply 100 fails, the power supply to the drive unit of the liquid recovery mechanism 20 is switched to the uninterruptible power supply (backup power supply) 102. Hereinafter, the operation of the exposure apparatus EX when the commercial power supply 100 is interrupted will be described.

When the commercial power supply 100 fails, the uninterruptible power supply 102 switches the power supply to the liquid recovery mechanism 20 to, for example, a built-in battery and supplies power without interruption as described above. Thereafter, the uninterruptible power supply 102 starts the built-in generator in preparation for a long-time power failure, and switches the power supply to the liquid recovery mechanism 20 from the battery to the generator. At this time, the uninterruptible power supply 102 supplies power to at least the vacuum system 25, the separator 22, and the dryer 23 in the liquid recovery mechanism 20. By doing so, even if the commercial power supply 100 fails, the power supply to the liquid recovery mechanism 20 is continued, and the liquid recovery operation by the liquid recovery mechanism 20 can be maintained. The uninterruptible power supply 102 is not limited to the above-described form, and a known uninterruptible power supply can be employed. In the present embodiment, an uninterruptible power supply device is described as an example of a backup power source when the commercial power source 100 has a power failure. Of course, a backup battery is used as the backup power source, and the battery at the time of the commercial power source 100 power outage is used. You may make it switch to. In addition, a private power generation device in a factory may be used as a backup power source, and a capacitor (for example, a capacitor) may be used as a backup power source.

  Further, when the commercial power supply 100 fails, the uninterruptible power supply 102 also supplies power to the second liquid recovery mechanism 60. Specifically, the uninterruptible power supply 102 supplies power to at least the vacuum system 70, the separator 71, and the dryer 72 in the second liquid recovery mechanism 60. By doing so, even if the commercial power supply 100 is cut off when the part of the liquid immersion area AR2 of the liquid 1 is disposed on the auxiliary plate 43, for example, the liquid 1 flows out of the substrate P. The second liquid recovery mechanism 60 can recover the liquid 1 that has flowed out. Note that when the commercial power supply 100 fails, the uninterruptible power supply 102 may supply power to the vacuum system 74, the separator 75, and the dryer 76. By doing so, even if the commercial power supply 100 is out of power, the adsorption and holding of the substrate P by the Z stage 51 can be maintained, so that the position of the substrate P relative to the Z stage 51 does not occur due to the power outage. Therefore, it is possible to smoothly perform the exposure process restart operation when the exposure operation is restarted after the power failure is restored.

  By the way, when the commercial power supply 100 fails, the normally closed valve 13 provided in the supply pipe 15 of the liquid supply mechanism 10 is operated, and the liquid supply flow path of the supply pipe 15 is shut off. By doing so, there is no inconvenience that the liquid 1 leaks from the liquid supply mechanism 10 onto the substrate P after the power failure of the commercial power supply 100. Further, in the present embodiment, when the commercial power supply 100 fails, the valve 16 of the suction pipe 18 is mechanically operated to open the flow path of the suction pipe 18 and the uninterruptible power supply 102 is connected to the third liquid recovery mechanism. 17 is supplied with power. The third liquid recovery mechanism 17 has substantially the same function as the liquid recovery mechanism 20 and the second liquid recovery mechanism 60, and has a vacuum system such as a suction pump (not shown), a dryer, a separator, and a liquid recovery unit. doing. For example, when the suction pump of the third liquid recovery mechanism 17 is operated by the electric power supplied from the uninterruptible power supply 102, the liquid pipe remains on the liquid flow path and the supply nozzle 14 on the downstream side of the valve 13 in the supply pipe 15 (reserved). The liquid 1 is sucked into the suction pump 17 through the suction pipe 18. Since the suction pipe 18 is connected to a position immediately after the valve 13 downstream in the liquid supply flow path of the supply pipe 15, the suction pipe 18 is connected to the liquid supply flow path between the valve 13 and the supply nozzle 14 in the supply pipe 15. The remaining liquid 1 is sucked and collected. By doing so, the inconvenience of the liquid 1 leaking from the liquid supply mechanism 10 onto the substrate P after the power failure of the commercial power supply 100 can be further reliably prevented, and the liquid 1 can be prevented from being on the substrate stage PST or around the substrate stage PST. It is possible to prevent the occurrence of inconvenience such as scattering.

  Then, the uninterruptible power supply 102 is discharged from the liquid supply mechanism 10 (supply pipe 15) without being recovered by the liquid 1 remaining on the substrate P and the third liquid recovery mechanism 17 after the power failure of the commercial power supply 100. The supply of electric power to the liquid recovery mechanism 20 and the second liquid recovery mechanism 60 is continued until the completed liquid 1 can be recovered.

  For example, the liquid recovery mechanism 20 is driven by the electric power supplied from the uninterruptible power supply 102 based on the detection result of the liquid sensor 82 provided near the recovery nozzle 21 in the recovery pipe 24. Specifically, while the liquid sensor 82 detects the liquid 1, the liquid 1 is being collected from the substrate P (that is, the liquid 1 remains on the substrate P). The recovery mechanism 20 continues to be driven until at least the liquid sensor 82 no longer detects the liquid 1. Similarly, a configuration may be adopted in which a liquid sensor is provided in the pipes 68 and 69 of the second liquid recovery mechanism 60 and the second liquid recovery mechanism 60 is driven based on the detection result of the liquid sensor.

  Even in this case, the second liquid recovery mechanism 60 continues to drive until the liquid sensor no longer detects the liquid 1.

Further, the third liquid recovery mechanism 17 constituting the discharge mechanism may be driven based on the detection result of the liquid sensor 81 provided in the vicinity of the supply nozzle 14. For example, since the liquid 1 remains in the supply pipe 15 while the liquid sensor 81 detects the liquid 1, the third liquid recovery mechanism 17 does not detect the liquid 1 until the liquid sensor 81 detects the liquid 1. Continue driving.

  Alternatively, after the power failure of the commercial power supply 100, information on the amount of liquid discharged from the supply port of the supply nozzle 14 of the liquid supply mechanism 10 is obtained in advance by, for example, experiments or simulations, and the obtained information is stored in the storage device MRY. In addition, the liquid recovery mechanism 20, the second liquid recovery mechanism 60, and the third liquid recovery mechanism 17 may be driven based on the stored information. For example, the amount of liquid recovered by driving the third liquid recovery mechanism 17 after the liquid supply flow path of the supply pipe 15 is shut off by the valve 13 after the power failure of the commercial power supply 100 is the liquid supply flow of the supply pipe 15. It can be obtained in advance based on the volume of the road. Further, the amount of liquid remaining on the substrate P after the power failure of the commercial power supply 100 is substantially equal to the amount of liquid in the liquid immersion area AR2, for example, the distance between the optical element 2 of the projection optical system PL and the substrate P. Further, it can be obtained in advance by the area of the liquid immersion area AR2. Information on the total amount of liquid remaining on the substrate P and the amount of liquid discharged from the supply pipe 15 after the power failure of the commercial power supply 100 is stored in advance in the storage device MRY, and the liquid recovery mechanism 20 and the second liquid are stored. The recovery mechanism 60 continues at least the recovery operation until the total amount of recovered liquid reaches the total amount of liquid stored in the storage device MRY after the power failure of the commercial power supply 100.

Note that, after the power failure of the commercial power source 100, for example, the second liquid recovery mechanism 60 may increase the amount of liquid recovery compared to before the power failure. Specifically, the driving amount (driving force) of the vacuum system of the second liquid recovery mechanism 60 is increased. Since the driving of the second liquid recovery mechanism (vacuum system) becomes a vibration source, it is preferable that the driving force of the second liquid recovery mechanism is reduced or stopped during the exposure process. Since the exposure process is also stopped, the second liquid recovery mechanism 60 raises the driving force of the vacuum system under the power supplied from the uninterruptible power supply 102 to increase the outside of the substrate stage PST (at least from the recovery port 61). The leakage of the liquid 1 to the outside) can be prevented, or the spread of the leakage can be prevented.
Note that when the commercial power supply 100 is abnormal, the temperature and humidity of the chamber cannot be controlled, and the performance of the projection optical system PL may be deteriorated. For this reason, you may supply the electric power of the uninterruptible power supply 102 also to a chamber. Alternatively, an uninterruptible power supply (third power supply) different from the uninterruptible power supply 102 may be used to supply power to the chamber when the commercial power supply 100 is abnormal. In this case, the chamber may be divided into a plurality of regions, and power may be supplied to at least the chamber that houses the projection optical system PL. Thereby, the exposure apparatus EX can be moved promptly after the commercial power supply 100 is restored, and adverse effects due to the abnormality of the commercial power supply 100 can be minimized. Furthermore, the electric power of the uninterruptible power supply 102 may be supplied to a local temperature control device (not shown) that locally controls the projection optical system PL itself. In this case, power supply to the chamber by the uninterruptible power supply 102 may or may not be performed.

  Further, it is not always necessary to provide one uninterruptible power supply 102 (and another uninterruptible power supply (third power supply)) in one exposure apparatus, and it may be shared by a plurality of exposure apparatuses. Thereby, the number of uninterruptible power supplies 102 can be reduced, and the installation area of the exposure apparatus EX including the uninterruptible power supplies 102 can be reduced.

  As described above, when the liquid recovery mechanism 20 (second liquid recovery mechanism 60) is driven by the electric power supplied from the commercial power supply 100, the liquid recovery mechanisms 20, 60 even if the commercial power supply 100 fails. Since the supply of electric power to the uninterruptible power supply 102 is switched, the liquid 1 remaining on the substrate P is not left unattended and is recovered by the liquid recovery mechanisms 20 and 60 driven by the electric power supplied from the uninterruptible power supply 102. Therefore, it is possible to prevent the liquid 1 from flowing out, and to prevent the occurrence of inconvenience such as rusting or failure of mechanical parts around the substrate stage PST supporting the substrate P, or fluctuation of the environment where the substrate P is placed. Accordingly, even after the power failure of the commercial power supply 100 is restored, it is possible to prevent the occurrence of inconvenience such as a decrease in exposure accuracy due to the liquid 1 that has flowed out, and it is possible to manufacture a device having high pattern accuracy.

  Further, by providing the liquid absorbing member 62 on the substrate stage PST as the second liquid recovery mechanism 60, the liquid 1 can be reliably held (recovered) in a wide range. Further, since the vacuum system 70 is connected to the liquid absorbing member 62 via the flow path 63 and the pipe line 68, the liquid 1 absorbed by the liquid absorbing member 62 is always discharged outside the substrate stage PST. Therefore, the fluctuation of the environment where the substrate P is placed can be more reliably suppressed, and the weight fluctuation due to the liquid 1 of the substrate stage PST can be suppressed. On the other hand, the configuration may be such that the liquid 1 collected by the liquid absorbing member 62 drips to the liquid collection unit 73 side by its own weight without providing the vacuum system 70. Furthermore, without providing the vacuum system 70, the liquid recovery part 73, etc., only the liquid absorbing member 62 is disposed on the substrate stage PST, and the liquid absorbing member 62 that has absorbed the liquid 1 is periodically (eg, for each lot). It is good also as a structure exchanged. In this case, although the weight of the substrate stage PST varies depending on the liquid 1, the stage positioning accuracy can be maintained by changing the stage control parameter according to the weight of the liquid 1 collected by the liquid absorbing member 62.

  In addition, a pressure pump is provided instead of the third liquid recovery mechanism 17, and a position immediately after the downstream side of the valve 13 in the liquid supply flow path of the supply pipe 15 via the suction pipe 18 (in this case, the gas discharge pipe). A gas (air) may be allowed to flow from the nozzle toward the supply nozzle 14. By doing so, after the power failure of the commercial power supply 100, the liquid 1 remaining in the liquid flow path and the supply nozzle 14 on the downstream side of the valve 13 in the supply pipe 15 is discharged onto the substrate P. The discharged liquid may be recovered by the liquid recovery mechanism 20 or the second liquid recovery mechanism 60. Also in this case, the pressure pump can be driven based on the information stored in the storage device MRY.

  A vacuum system different from the normally used vacuum system 25 may be provided, and the uninterruptible power supply 102 may be connected to this other vacuum system. In this case, if the suction force of another vacuum system is set larger than the suction force of the vacuum system 25, the liquid 1 can be recovered in a short time.

  Next, another embodiment will be described with reference to FIG. In the following description, the same or equivalent components as those in the above-described embodiment are denoted by the same reference numerals, and the description thereof is simplified or omitted.

  In FIG. 6, the exposure apparatus EX has a liquid supply mechanism 10 having a supply pipe 15 for supplying the liquid 1 between the projection optical system PL and the substrate P, and a recovery pipe 24 for recovering the liquid on the substrate P. The liquid recovery mechanism 20 is provided. The liquid supply mechanism 10 includes a third liquid recovery mechanism 17 that constitutes a suction unit having a suction pipe 18 that can suck the liquid 1.

  The third liquid recovery mechanism 17 has substantially the same function as the liquid recovery mechanism 20 and the second liquid recovery mechanism 60, and is provided in the middle of the suction pipe 18 and a vacuum system 90 connected to one end of the suction pipe 18. The gas-liquid separator 92 and a dryer 91 for drying the gas separated by the gas-liquid separator 92 are provided. Further, the liquid 1 separated by the gas-liquid separator 92 is recovered by the liquid recovery unit 94 via the recovery pipe 93.

  The liquid supply mechanism 10 includes a switching unit 19 that switches between a supply path of the supply pipe 15 connected to the liquid supply section 11 and a suction path of the suction pipe 18 connected to the vacuum system 90. In the present embodiment, the switching unit 19 includes a solenoid valve, and each of the supply pipe 15 and the suction pipe 18 is connected to the switching unit 19.

  In the present embodiment, a tube member that forms a flow path that connects the vacuum system 90 and the switching unit 19 is referred to as a suction pipe 18, and a tube member that forms a flow path that connects the liquid supply unit 11 and the switching unit 19. Is referred to as a supply pipe 15. A tube member that forms a flow path connecting the switching unit 19 and the liquid supply port 14 </ b> A is referred to as a supply nozzle 14.

  The operation of the switching unit 19 is controlled by the control device CONT. When the switching unit 19 is connected to the supply pipe 15, the supply port 14 </ b> A of the supply nozzle 14 and the liquid supply unit 11 are connected via the supply pipe 15. At this time, the suction path of the suction pipe 18 is blocked. On the other hand, when the switching unit 19 is connected to the suction pipe 18, the supply port 14 </ b> A of the supply nozzle 14 and the vacuum system 90 of the third liquid recovery mechanism 17 are connected via the suction pipe 18. At this time, the supply path of the supply pipe 15 is blocked. Since the switching unit 19 may be a heat source, it is preferable that the switching unit 19 be provided outside the chamber apparatus that houses the exposure apparatus EX in order to prevent deterioration of exposure accuracy due to heat.

  Further, the switching unit 19 in the present embodiment sets the supply path of the supply pipe 15 when an abnormality occurs, for example, when the drive source (commercial power supply 100) of the exposure apparatus EX (control apparatus CONT) stops due to a power failure or the like. It is a so-called normal close system that mechanically cuts off using a spring or the like. In the switching unit 19 of this embodiment, when an abnormality occurs, the supply path of the supply pipe 15 is mechanically closed, and at the same time, the suction path of the suction pipe 18 is opened by connecting to the suction path of the suction pipe 18. It is like that.

  The suction pipe 18 is provided with a check valve 95. The check valve 95 is provided between the switching unit 19 and the gas-liquid separator 92 in the suction pipe 18 connecting the switching unit 19 and the vacuum system 90, and is provided at a position close to the switching unit 19. ing. The check valve 95 prevents the flow of the liquid 1 from the vacuum system 90 side to the switching unit 19 side among the liquid 1 flowing through the suction pipe 18.

  Next, the operation of the exposure apparatus EX having the above-described configuration will be described with reference to the schematic diagram shown in FIG.

  When immersion exposure is performed on the substrate P supported by the substrate stage PST, the controller CONT connects the switching unit 19 to the supply pipe 15 of the liquid supply mechanism 10 as shown in FIG. The supply unit 11 and the supply port 14 </ b> A of the supply nozzle 14 are connected via a supply pipe 15. Thus, the liquid 1 delivered from the liquid supply unit 11 is supplied onto the substrate P via the supply pipe 15, the switching unit 19, and the supply port 14 </ b> A of the supply nozzle 14, and the liquid immersion area AR <b> 2 is formed on the substrate P. Form.

  After the immersion exposure of the substrate P is completed, in order to recover the liquid 1 on the substrate P, the control device CONT stops the supply (supply) of the liquid 1 from the liquid supply unit 11 of the liquid supply mechanism 10 and the liquid. Driving of the recovery mechanism 20 and the second liquid recovery mechanism 60 is continued for a predetermined period. Further, the control device CONT drives the switching unit 19 to connect to the suction pipe 18 and closes the supply path of the supply pipe 15 and opens the suction path of the suction pipe 18. Thereby, as shown in FIG. 7B, the liquid 1 on the substrate P is recovered by the third recovery mechanism 17. As described above, when the liquid 1 is recovered after the exposure is completed, the liquid recovery operation is performed by using the liquid recovery mechanism 20, the second liquid recovery mechanism 60, and the third liquid recovery mechanism 17 together. The collection operation can be performed efficiently in a short time.

  After the liquid recovery mechanism 20, the second liquid recovery mechanism 60, and the third liquid recovery mechanism 17 are continuously driven for a predetermined period of time to recover the liquid 1 on the substrate P, the control device CONT includes the liquid recovery mechanism 20 and the first liquid recovery mechanism 20. The driving of the two liquid recovery mechanism 60 is stopped. On the other hand, even after the driving of the liquid recovery mechanism 20 and the second liquid recovery mechanism 60 is stopped, the connection of the switching unit 19 to the suction path of the suction pipe 18 is maintained, and the suction operation by the third liquid recovery mechanism 17 is continued. .

  In order to unload the substrate P from the substrate stage PST, the control device CONT moves the substrate stage PST to the unload position as shown in FIG. 7C. At this time, the switching unit 19 is connected to the suction path of the suction pipe 18, and the supply port 14 </ b> A of the supply nozzle 14 and the vacuum system 90 are connected via the suction pipe 18. Therefore, the liquid suction operation by the third liquid recovery mechanism 17 provided in the liquid supply mechanism 10 is continued when the liquid supply mechanism 10 is not supplying the liquid 1 such as after the liquid immersion exposure is completed (or before). Therefore, the liquid 1 remaining in the flow path of the supply nozzle 14 and in the vicinity of the supply port 14 </ b> A is sucked and recovered by the third liquid recovery mechanism 17. Therefore, when the liquid supply mechanism 10 does not supply the liquid 1 such as after (or before) the immersion exposure, the liquid 1 remaining in the supply nozzle 14 or the like remains on the substrate P or the substrate stage PST. Alternatively, it is possible to prevent inconvenience of leaking (dropping) to machine parts around the substrate stage PST. Therefore, it is possible to prevent the occurrence of inconvenience such as rust and failure of the machine parts around the substrate stage due to the leaked liquid.

  Here, the driving of the liquid recovery mechanism 20 and the second liquid recovery mechanism 60 is stopped after continuing for a predetermined period, but the driving may be further continued. By doing so, even if the liquid 1 drops from the supply nozzle 14 or the like, the liquid 1 can be recovered by the liquid recovery mechanism 20 or the second liquid recovery mechanism 60.

  Further, during the immersion exposure of the substrate P, when an abnormality occurs such as a power failure of the commercial power supply 100, the normally closed switching unit 19 of the liquid supply mechanism 10 is activated and the supply path of the supply pipe 15 is shut off. . By doing so, there is no inconvenience that the liquid 1 leaks from the liquid supply mechanism 10 onto the substrate P after the power failure of the commercial power supply 100. Further, when the commercial power supply 100 is interrupted, the switching unit 19 is activated and connected to the suction path of the suction pipe 18, the suction path of the suction pipe 18 is opened, and the supply port 14A of the supply nozzle 14 and the vacuum system 90 are connected. It is connected via the suction pipe 18. Further, when the commercial power source 100 is powered down, the uninterruptible power source 102 supplies power to the third liquid recovery mechanism 17. When the vacuum system 90 of the third liquid recovery mechanism 17 is activated by the electric power supplied from the uninterruptible power supply 102, the liquid 1 remaining in the supply nozzle 14 and in the vicinity of the supply port 14 </ b> A passes through the suction pipe 18. The three liquid recovery mechanism 17 is sucked into the vacuum system 90. By doing so, it is possible to more reliably prevent the inconvenience of the liquid 1 leaking from the liquid supply mechanism 10 onto the substrate P after the commercial power supply 100 is interrupted, and the liquid 1 is on the substrate stage PST or around the substrate stage PST. It is possible to prevent the occurrence of inconvenience such as scattering.

As described above, when the liquid supply mechanism 10 is not supplying the liquid 1, the third liquid recovery mechanism 17 is driven to suck the liquid 1, thereby remaining in the supply nozzle 14 of the liquid supply mechanism 10. Since the liquid 1 being sucked can be collected, leakage of the liquid 1 from the liquid supply mechanism 10 when the liquid supply is unnecessary can be prevented. Therefore, it is possible to prevent the occurrence of inconvenience such as rust and failure of mechanical parts around the substrate stage PST caused by the leaked liquid 1.
Further, when an abnormality such as a power failure occurs, the exposure becomes impossible and the liquid supply becomes unnecessary. Even in this case, the liquid 1 is sucked and recovered by the third liquid recovery mechanism 17, so that the liquid supply mechanism 10 after the power failure is recovered. Inconveniences such as leakage of the liquid 1 can be prevented.

  Further, when the check valve 95 for preventing the flow of the liquid 1 from the vacuum system 90 side to the switching unit 19 side is provided in the suction pipe 18, the vacuum system 90 becomes inoperable for some reason. In this case, it is possible to prevent the disadvantage that the sucked liquid 1 flows backward to the substrate P side. In this case, the check valve 95 is provided at a position close to the switching unit 19, and the volume of the suction path of the suction pipe 18 between the check valve 95 and the switching unit 19 is made as small as possible. Even if the inconvenience of 1 flowing backward to the substrate P occurs, the amount of the liquid 1 can be minimized.

  In the present embodiment, it has been described that the switching unit 19 operates after the liquid immersion exposure is completed or when the commercial power supply 100 is cut off. However, during the liquid immersion exposure of the substrate P, for example, the liquid recovery mechanism 20 may have some cause. When the liquid 1 on the substrate P cannot be recovered, the switching unit 19 may be operated to suck and recover the liquid 1 by the third liquid recovery mechanism 17 of the liquid supply mechanism 10. At this time, if a flow rate sensor capable of detecting the amount of liquid recovered by the liquid recovery mechanism 20 is provided, for example, in the recovery pipe 24, the operation status of the liquid recovery mechanism 20 can be grasped based on the detection result of the flow rate sensor. it can. When the control device CONT determines that the liquid recovery amount is equal to or less than a predetermined value based on the detection result of the flow sensor, the control device CONT stops the liquid supply operation by the liquid supply unit 11 of the liquid supply mechanism 10 and the switching unit 19. And the liquid 1 is sucked and recovered by the third liquid recovery mechanism 17. In this way, even when an abnormality occurs in the liquid recovery operation of the liquid recovery mechanism 20, the switching unit 19 is operated and the liquid 1 is sucked and recovered by the third liquid recovery mechanism 17 of the liquid supply mechanism 10. 1 can prevent leakage and scattering to the outside of the substrate P, and prevent the occurrence of inconvenience such as rust of machine parts and leakage of electronic equipment (driving devices such as linear motors that move the substrate stage PST and sensors such as photomal). can do.

  When an abnormality in the positional relationship between the substrate stage PST supporting the substrate P and the projection optical system PL is detected, the liquid supply by the liquid supply mechanism 10 is stopped and the liquid 1 by the third liquid recovery mechanism 17 is stopped. A suction operation may be started. Here, the abnormal positional relationship between the substrate stage PST and the projection optical system PL is a state in which the liquid 1 cannot be held under the projection optical system PL, and the positional relationship between at least one of the Z-axis direction and the XY direction. Including abnormalities.

  That is, for example, even if the operations of the liquid supply mechanism 10 and the liquid recovery mechanism 20 are normal, an abnormality occurs in the operation of the substrate stage PST, and the substrate stage PST is in the XY direction (or Z) with respect to a desired position with respect to the projection optical system PL. In a state where the immersion area AR2 of the liquid 1 cannot be satisfactorily formed between the projection optical system PL and the substrate P supported by the substrate stage PST (when the projection optical system PL is below the projection optical system PL) In a state in which the liquid 1 cannot be held. In this case, the liquid 1 may leak to the outside of the substrate P or the substrate stage PST, or the liquid 1 may be applied to the moving mirror 45 of the substrate stage PST. Then, since the liquid recovery mechanism 20 cannot recover a predetermined amount of the liquid 1, the control device CONT can detect that an abnormality has occurred based on the detection result of the flow rate sensor provided in the recovery pipe 24 or the like. . When detecting the abnormality, the control device CONT operates the switching unit 19 to stop the liquid supply operation by the liquid supply mechanism 10 and also uses the third liquid recovery mechanism 17 of the liquid supply mechanism 10 to liquid 1 Collect by suction.

  In order to detect an abnormality in the positional relationship of the substrate stage PST with respect to the projection optical system PL, the substrate stage is detected by, for example, the interferometer 46 without using the detection result of the flow sensor provided in the recovery pipe 24 of the liquid recovery mechanism 20 or the like. It is possible to detect the position of the PST in the XY direction, and detect an abnormality in the positional relationship based on the position detection result. The control device CONT compares the substrate stage position detection result by the interferometer 46 with a preset allowable value, and when the stage position detection result of the interferometer 46 exceeds the allowable value, the supply operation of the liquid 1 May be stopped or the switching unit 19 may be operated. Further, the position of the substrate P in the Z-axis direction is detected by a focus detection system that detects the position of the surface of the substrate P in the Z-axis direction, and the stage position detection result by the focus detection system is compared with a preset allowable value. When the detection result of the focus detection system exceeds the allowable value, the control device CONT may stop the supply operation of the liquid 1 or operate the switching unit 19. As described above, the control device CONT detects an abnormality in the positional relationship between the projection optical system PL and the substrate stage PST based on the detection result of the substrate stage position detection device including the interferometer 46 and the focus detection system. When detected, the liquid supply operation can be stopped, the switching unit 19 can be operated, the liquid 1 can be sucked and recovered by the third liquid recovery mechanism 17, and the like.

  In the present embodiment, the switching unit 19 has been described so as to switch between the supply pipe 15 and the suction pipe 18, but has a configuration in which it is not connected to both the supply pipe 15 and the suction pipe 18 (standby mode). May be. Here, the standby mode of the liquid supply mechanism 10 includes a mode in which neither supply nor recovery of the liquid 1 is performed.

  Incidentally, the cross-sectional area of the supply path between the supply port 14A and the switching unit 19 is determined based on the surface tension of the liquid 1 (water in this embodiment). By optimizing the cross-sectional area of the supply path based on the surface tension of the liquid 1, when the liquid supply mechanism 10 is not supplying the liquid 1, the liquid 1 leaks (drops) from the supply port 14A. Further, it can be prevented. Specifically, when the liquid 1 remains in the supply path between the supply port 14A and the switching unit 19, the cross-sectional area of the supply path is determined to the extent that the supply path is covered by the surface tension of the liquid 1. . That is, when the liquid 1 is inside the supply path set to the cross-sectional area (inner diameter) D1, the liquid 1 blocks the supply path by its surface tension as shown in the schematic diagram of FIG. If so, the pressure difference between the switching portion 19 side (vacuum system 90 side) of the supply path for the liquid 1 and the supply port 14A side becomes large, so that the liquid 1 is satisfactorily collected by suction. However, when the surface tension of the liquid (droplet) 1 is low, a situation in which the supply path cannot be blocked as shown in FIG. 8B may occur. 1 falls due to its own weight (gravity action) or the like, and is not recovered by the third liquid recovery mechanism 17 but leaks from the supply port 14A. In order to suck and collect such a liquid (droplet) 1, the suction force (drive amount) of the third liquid recovery mechanism 17 must be increased, resulting in energy loss.

  Therefore, in order to satisfactorily suck and collect such a liquid 1 by the third liquid recovery mechanism 17, the cross-sectional area of the supply path is reduced based on the surface tension of the liquid 1. FIG. 9A is a schematic diagram showing a state in which the liquid 1 is in the supply path having a cross-sectional area (inner diameter) D2 smaller than the cross-sectional area (inner diameter) D1. Even if the surface tension of the liquid 1 is low, by determining the cross-sectional area of the supply path based on the surface tension of the liquid 1, the supply path can be blocked with the liquid 1 as shown in FIG. Thereby, the liquid 1 can be sucked and recovered satisfactorily. Further, as shown in the schematic diagram of FIG. 9B, in the supply path having a small cross-sectional area D2, even if a situation in which the liquid (droplet) 1 remains, the liquid 1 has sufficient droplets. Therefore, the liquid 1 drops well without dropping due to its own weight (gravity action) and leaking from the supply port 14A, and without increasing the suction force (driving force) of the third liquid recovery mechanism 17. Can be collected by suction.

  Moreover, the occurrence of an earthquake is considered as an abnormality other than the above. In this case, a vibration detector such as an acceleration sensor is provided at the exposure apparatus main body or the installation location of the exposure apparatus main body, and the exposure operation including the liquid supply operation is stopped based on the output of the acceleration sensor. The liquid recovery operation by the liquid recovery mechanism and the temperature / humidity control by the chamber as described in the embodiment may be continued.

  In addition, as a vibration detector, you may employ | adopt the P wave detection apparatus which detects the P wave which is transmitted earliest in an earthquake wave and is felt as an initial fine tremor.

  As described above, the liquid 1 in the present embodiment is composed of pure water. Pure water has an advantage that it can be easily obtained in large quantities at a semiconductor manufacturing factory or the like, and has no adverse effect on the photoresist, optical element (lens), etc. on the substrate P. In addition, pure water has no adverse effects on the environment, and since the impurity content is extremely low, it can be expected to clean the surface of the substrate P and the surface of the optical element provided on the front end surface of the projection optical system PL. .

  Since the refractive index n of pure water (water) with respect to the exposure light EL having a wavelength of about 193 nm is approximately 1.44, when ArF excimer laser light (wavelength 193 nm) is used as the light source of the exposure light EL, the substrate P In the above, the wavelength is shortened to 1 / n, that is, about 134 nm, and a high resolution is obtained. Furthermore, since the depth of focus is enlarged by about n times, that is, about 1.44 times compared with that in the air, the projection optical system PL can be used when it is sufficient to ensure the same depth of focus as that in the air. The numerical aperture can be further increased, and the resolution is improved in this respect as well.

  In the present embodiment, the lens 2 is attached to the tip of the projection optical system PL. However, as an optical element attached to the tip of the projection optical system PL, optical characteristics of the projection optical system PL, such as aberration (spherical aberration, coma aberration) Etc.) may be used. Alternatively, it may be a plane parallel plate that can transmit the exposure light EL. Further, when the pressure between the optical element at the tip of the projection optical system and the substrate P generated by the flow of the liquid 1 is large, the optical element is not exchangeable but the optical element is not moved by the pressure. It may be firmly fixed to.

The liquid 1 of the present embodiment is water, but may be a liquid other than water. For example, when the light source of the exposure light EL is an F ₂ laser, the F ₂ laser light does not transmit water. In this case, the liquid 1 may be a fluorine-based liquid such as fluorine-based oil or perfluorinated polyether (PFPE) that can transmit the F ₂ laser beam. In addition, as the liquid 1, there are other materials that are transmissive to the exposure light EL, have a refractive index as high as possible, and are stable with respect to the photoresist applied to the projection optical system PL and the surface of the substrate P (for example, Cedar). Oil) can also be used.

  In the above-described embodiment, an exposure apparatus that locally fills the liquid between the projection optical system PL and the substrate P is employed. However, an exposure target as disclosed in Japanese Patent Laid-Open No. 6-124873 is used. An immersion exposure apparatus for moving the stage holding the substrate in the liquid tank, or a liquid tank having a predetermined depth on the stage as disclosed in Japanese Patent Laid-Open No. 10-303114, in which the substrate is formed. The present invention can also be applied to an immersion exposure apparatus that holds

The substrate P in each of the above embodiments is not only a semiconductor wafer for manufacturing a semiconductor device, but also a glass substrate for a display device, a ceramic wafer for a thin film magnetic head, or an original mask or reticle used in an exposure apparatus. (Synthetic quartz, silicon wafer) or the like is applied.
As the exposure apparatus EX, in addition to the step-and-scan type scanning exposure apparatus (scanning stepper) that scans and exposes the pattern of the mask M by moving the mask M and the substrate P synchronously, the mask M and the substrate P Can be applied to a step-and-repeat type projection exposure apparatus (stepper) in which the pattern of the mask M is collectively exposed while the substrate P is stationary and the substrate P is sequentially moved stepwise. The present invention can also be applied to a step-and-stitch type exposure apparatus that partially transfers at least two patterns on the substrate P.

  The type of the exposure apparatus EX is not limited to an exposure apparatus for manufacturing a semiconductor element that exposes a semiconductor element pattern on the substrate P, but an exposure apparatus for manufacturing a liquid crystal display element or a display, a thin film magnetic head, an image sensor (CCD). ) Or an exposure apparatus for manufacturing reticles or masks.

  Furthermore, the present invention can be applied to an exposure apparatus that forms a pattern on the substrate P by projecting spot light with a projection optical system without using the mask M.

  The present invention can also be applied to a twin stage type exposure apparatus disclosed in JP-A-10-163099, JP-A-10-214783, JP 2000-505958, and the like.

Linear motor (USP5,623,853 or USP5) for substrate stage PST and mask stage MST
, 528, 118) may be used, either an air levitation type using an air bearing or a magnetic levitation type using Lorentz force or reactance force. Each stage PST, MST may be a type that moves along a guide, or may be a guideless type that does not have a guide.

  As a driving mechanism for each stage PST, MST, a planar motor that drives each stage PST, MST by electromagnetic force with a magnet unit having a two-dimensionally arranged magnet and an armature unit having a two-dimensionally arranged coil facing each other is provided. It may be used. In this case, either one of the magnet unit and the armature unit may be connected to the stages PST and MST, and the other of the magnet unit and the armature unit may be provided on the moving surface side of the stages PST and MST.

  As described in JP-A-8-166475 (USP 5,528,118), the reaction force generated by the movement of the substrate stage PST is not transmitted to the projection optical system PL, but mechanically using a frame member. You may escape to the floor (ground). The reaction force generated by the movement of the mask stage MST is not transmitted to the projection optical system PL by using a frame member as described in JP-A-8-330224 (USS / N 08 / 416,558). You may mechanically escape to the floor (ground).

Instead of fixing the movable mirror 45 to the substrate stage, for example, a reflecting surface obtained by mirror processing the end surface (side surface) of the Z stage (substrate holder) 51 may be used. Further, although the auxiliary plate 43 is a convex portion, when the substrate holder is embedded in the Z stage 51, it may be a concave portion. Further, the substrate holder may be separate from the Z stage 51. The substrate holder may be a pin chuck type.

  In addition, a normal close valve may be provided in the recovery pipe of the liquid recovery mechanism 20 so that power is supplied to at least the vacuum system 70 of the vacuum systems 70 and 74 by a backup power source in the event of a power failure.

  As described above, the exposure apparatus EX according to the present embodiment maintains various mechanical subsystems including the respective constituent elements recited in the claims of the present application so as to maintain predetermined mechanical accuracy, electrical accuracy, and optical accuracy. Manufactured by assembling. In order to ensure these various accuracies, before and after assembly, various optical systems are adjusted to achieve optical accuracy, various mechanical systems are adjusted to achieve mechanical accuracy, and various electrical systems are Adjustments are made to achieve electrical accuracy. The assembly process from the various subsystems to the exposure apparatus includes mechanical connection, electrical circuit wiring connection, pneumatic circuit piping connection and the like between the various subsystems. Needless to say, there is an assembly process for each subsystem before the assembly process from the various subsystems to the exposure apparatus. When the assembly process of the various subsystems to the exposure apparatus is completed, comprehensive adjustment is performed to ensure various accuracies as the entire exposure apparatus. The exposure apparatus is preferably manufactured in a clean room where the temperature, cleanliness, etc. are controlled.

  As shown in FIG. 10, a microdevice such as a semiconductor device includes a step 201 for designing a function / performance of the microdevice, a step 202 for producing a mask (reticle) based on the design step, and a substrate as a substrate of the device. Manufacturing step 203, substrate processing step 204 for exposing the mask pattern onto the substrate by the exposure apparatus EX of the above-described embodiment, device assembly step (including dicing process, bonding process, packaging process) 205, inspection step 206, etc. It is manufactured after.

As mentioned above, although preferable embodiment of this invention was described, this invention is not limited to each said embodiment. Additions, omissions, substitutions, and other modifications can be made without departing from the spirit of the present invention. The present invention is not limited by the above description, but only by the scope of the appended claims.

  The present invention is an exposure apparatus that exposes a pattern image onto a substrate by a projection optical system, and a liquid recovery mechanism that recovers the liquid supplied to the substrate by power supplied from a first power source, and at least the above The present invention relates to an exposure apparatus including a second power source that supplies power to the liquid recovery mechanism when a first power source is abnormal.

  According to the present invention, since the outflow of liquid can be prevented even when a power supply abnormality such as a power failure occurs, the occurrence of inconvenience due to the outflowed liquid can be prevented. Further, it is possible to prevent a problem that the liquid leaks from the liquid supply mechanism when the liquid supply is unnecessary. Therefore, the pattern can be transferred onto the substrate with high accuracy, and a device having high pattern accuracy can be manufactured.

  DESCRIPTION OF SYMBOLS 1 ... Liquid, 10 ... Liquid supply mechanism, 13 ... Valve (blocking part), 15 ... Supply pipe (supply path), 17 ... 3rd liquid collection | recovery mechanism (suction part), 18 ... Suction pipe (suction path), 19 ... Switching unit, 20 ... liquid recovery mechanism, 25 ... vacuum system, 60 ... second liquid recovery mechanism, 70, 74 ... vacuum system, 81, 82 ... liquid sensor, 95 ... check valve, 100 ... commercial power source (first power source) ), 102: Uninterruptible power supply (second power supply), CONT ... Control device, EX ... Exposure device, MRY ... Storage device, P ... Substrate, PL ... Projection optical system

Claims (31)

An exposure apparatus that exposes the substrate by filling a space between the projection optical system and the substrate with a liquid and projecting an image of a pattern onto the substrate through the projection optical system and the liquid,
A liquid recovery mechanism having a drive unit driven by power supplied from the first power source;
A second power source different from the first power source,
An exposure apparatus in which the power supply to the drive unit is switched to the second power source when the first power source fails. An exposure apparatus that exposes a pattern image on a substrate by a projection optical system,
A liquid recovery mechanism for recovering the liquid supplied to the substrate by electric power supplied from a first power source;
An exposure apparatus comprising: a second power source that supplies power to the liquid recovery mechanism when the first power source is abnormal. The exposure apparatus according to claim 1 or 2, wherein the liquid recovery mechanism includes a vacuum system,
The second power source is an exposure apparatus that supplies electric power to the vacuum system driving unit.   2. The exposure apparatus according to claim 1, wherein the liquid recovery mechanism recovers the liquid on the substrate.   3. The exposure apparatus according to claim 1, wherein the liquid recovery mechanism recovers the liquid that has flowed out of the substrate.   3. The exposure apparatus according to claim 1, wherein the second power source continues to supply power until at least the liquid can be recovered. 3. The exposure apparatus according to claim 1, further comprising a liquid sensor that is provided in the liquid recovery mechanism and is driven by electric power supplied from the second power source to detect liquid.
An exposure apparatus in which the liquid recovery mechanism is driven based on a detection result of the liquid sensor. The exposure apparatus according to claim 1, further comprising a liquid supply mechanism that supplies a liquid,
An exposure apparatus in which the liquid recovery mechanism is driven based on information on the amount of liquid discharged from the liquid supply port of the liquid supply mechanism after a power failure. The exposure apparatus according to claim 1, further comprising a liquid supply mechanism that supplies a liquid,
The liquid supply mechanism is an exposure apparatus having a blocking portion that blocks a liquid supply flow path during a power failure.   The exposure apparatus according to claim 9, wherein the liquid supply mechanism includes a discharge mechanism that discharges the liquid remaining in the liquid supply flow path after a power failure. The exposure apparatus according to claim 1, further comprising a liquid supply mechanism that supplies a liquid,
The liquid supply mechanism is an exposure apparatus having a discharge mechanism for discharging the liquid remaining in the liquid supply flow path. The exposure apparatus according to claim 1, further comprising a chamber that houses at least the projection optical system,
An exposure apparatus in which at least one of the first power source and the second power source is disposed outside the chamber.   13. The exposure apparatus according to claim 12, wherein electric power is supplied to the chamber by the second power source.   13. The exposure apparatus according to claim 12, wherein electric power is supplied to the chamber by a third power source different from the first power source and the second power source. An exposure apparatus that exposes the substrate by filling a space between the projection optical system and the substrate with a liquid and projecting an image of a pattern onto the substrate through the projection optical system and the liquid,
A liquid supply mechanism for supplying liquid;
The liquid supply mechanism is an exposure apparatus having a discharge mechanism for discharging the liquid remaining in the liquid supply channel after a power failure. An exposure apparatus that exposes the substrate by filling a space between the projection optical system and the substrate with a liquid and projecting an image of a pattern onto the substrate through the projection optical system and the liquid,
A liquid supply mechanism having a liquid supply channel for supplying the liquid;
The exposure apparatus according to claim 1, wherein the liquid supply mechanism includes a blocking unit that blocks the liquid supply channel when an abnormality occurs. An exposure apparatus that exposes the substrate by filling a space between the projection optical system and the substrate with a liquid and projecting an image of a pattern onto the substrate through the projection optical system and the liquid,
A liquid supply mechanism for supplying liquid;
The liquid supply mechanism is an exposure apparatus having a sensor that detects the presence or absence of liquid remaining in the liquid supply flow path during a power failure. A liquid recovery apparatus including a liquid recovery mechanism for recovering a liquid supplied to a substrate with electric power supplied from a first power source,
A liquid recovery apparatus comprising a second power source for supplying power to the liquid recovery mechanism at least when the first power source is abnormal.   19. The liquid recovery apparatus according to claim 18, wherein the second power source supplies power to the liquid recovery mechanism together with the first power source.   19. The liquid recovery apparatus according to claim 18, wherein the second power source supplies electric power to the liquid recovery mechanism in accordance with a voltage fluctuation of the first power source. An exposure method for supplying a liquid between a projection optical system and a substrate, and exposing a pattern to the substrate through the projection optical system and the liquid,
Recovering the liquid by a liquid recovery mechanism using electric power supplied from a first power source;
And a step of recovering the liquid by the liquid recovery mechanism using power supplied from a second power source different from the first power source when the first power source is abnormal. The exposure method according to claim 21, wherein a plurality of the liquid recovery mechanisms are provided.
An exposure method in which the second power source supplies power to the plurality of liquid recovery mechanisms. An exposure apparatus that exposes a pattern image on a substrate by a projection optical system,
An exposure apparatus comprising a liquid supply mechanism having a supply path for supplying a liquid between the projection optical system and the substrate, and having a suction portion having a suction path for sucking the liquid in the liquid supply mechanism. 24. The exposure apparatus according to claim 23, further comprising a switching unit that switches between the supply path and the suction path.   25. The exposure apparatus according to claim 24, wherein the switching unit is connected to the suction path when the exposure apparatus is abnormal.   24. The exposure apparatus according to claim 23, wherein a check valve is provided in the suction path.   24. The exposure apparatus according to claim 23, wherein a cross-sectional area of the supply path is determined based on a surface tension of the liquid. An exposure method having a liquid supply mechanism for supplying a liquid between a projection optical system and a substrate, and exposing a pattern image on the substrate by the projection optical system;
An exposure method including a step of sucking the liquid from the liquid supply mechanism in accordance with a processing state of the exposure.   30. The exposure method according to claim 28, wherein the liquid is sucked from the liquid supply mechanism when the liquid supply mechanism is not supplying the liquid.   29. The exposure method according to claim 28, wherein the liquid is sucked from the liquid supply mechanism when an abnormality occurs in the exposure process.   A device manufacturing method using the exposure apparatus according to any one of claims 1, 2, 15, 16, 17, and 23.

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