JP2015061265A - カスコードトランジスタ及びカスコードトランジスタの制御方法 - Google Patents
カスコードトランジスタ及びカスコードトランジスタの制御方法 Download PDFInfo
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- 238000000034 method Methods 0.000 title claims description 10
- 239000003990 capacitor Substances 0.000 claims abstract description 51
- 230000015556 catabolic process Effects 0.000 claims description 14
- 239000004065 semiconductor Substances 0.000 claims description 11
- 239000000758 substrate Substances 0.000 claims description 10
- 230000010355 oscillation Effects 0.000 claims description 9
- 230000003071 parasitic effect Effects 0.000 claims description 5
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 abstract description 8
- 229910052710 silicon Inorganic materials 0.000 abstract description 8
- 239000010703 silicon Substances 0.000 abstract description 8
- 101150040536 CDS2 gene Proteins 0.000 description 11
- 101150095530 CDS1 gene Proteins 0.000 description 10
- 238000010586 diagram Methods 0.000 description 10
- 238000004088 simulation Methods 0.000 description 10
- 230000007704 transition Effects 0.000 description 10
- 230000000694 effects Effects 0.000 description 8
- 229910052751 metal Inorganic materials 0.000 description 6
- 239000002184 metal Substances 0.000 description 6
- 230000008859 change Effects 0.000 description 4
- 238000004364 calculation method Methods 0.000 description 3
- 150000001875 compounds Chemical class 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- 229910002704 AlGaN Inorganic materials 0.000 description 1
- GYHNNYVSQQEPJS-UHFFFAOYSA-N Gallium Chemical compound [Ga] GYHNNYVSQQEPJS-UHFFFAOYSA-N 0.000 description 1
- 229910001218 Gallium arsenide Inorganic materials 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 230000002542 deteriorative effect Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000005669 field effect Effects 0.000 description 1
- 229910052733 gallium Inorganic materials 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 229910003465 moissanite Inorganic materials 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 229910052594 sapphire Inorganic materials 0.000 description 1
- 239000010980 sapphire Substances 0.000 description 1
- 238000004904 shortening Methods 0.000 description 1
- 229910010271 silicon carbide Inorganic materials 0.000 description 1
- 230000005533 two-dimensional electron gas Effects 0.000 description 1
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- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03K—PULSE TECHNIQUE
- H03K17/00—Electronic switching or gating, i.e. not by contact-making and –breaking
- H03K17/30—Modifications for providing a predetermined threshold before switching
- H03K17/302—Modifications for providing a predetermined threshold before switching in field-effect transistor switches
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- H—ELECTRICITY
- H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
- H02M—APPARATUS FOR CONVERSION BETWEEN AC AND AC, BETWEEN AC AND DC, OR BETWEEN DC AND DC, AND FOR USE WITH MAINS OR SIMILAR POWER SUPPLY SYSTEMS; CONVERSION OF DC OR AC INPUT POWER INTO SURGE OUTPUT POWER; CONTROL OR REGULATION THEREOF
- H02M3/00—Conversion of DC power input into DC power output
- H02M3/02—Conversion of DC power input into DC power output without intermediate conversion into AC
- H02M3/04—Conversion of DC power input into DC power output without intermediate conversion into AC by static converters
- H02M3/10—Conversion of DC power input into DC power output without intermediate conversion into AC by static converters using discharge tubes with control electrode or semiconductor devices with control electrode
- H02M3/145—Conversion of DC power input into DC power output without intermediate conversion into AC by static converters using discharge tubes with control electrode or semiconductor devices with control electrode using devices of a triode or transistor type requiring continuous application of a control signal
- H02M3/155—Conversion of DC power input into DC power output without intermediate conversion into AC by static converters using discharge tubes with control electrode or semiconductor devices with control electrode using devices of a triode or transistor type requiring continuous application of a control signal using semiconductor devices only
- H02M3/156—Conversion of DC power input into DC power output without intermediate conversion into AC by static converters using discharge tubes with control electrode or semiconductor devices with control electrode using devices of a triode or transistor type requiring continuous application of a control signal using semiconductor devices only with automatic control of output voltage or current, e.g. switching regulators
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- H—ELECTRICITY
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- H03F—AMPLIFIERS
- H03F1/00—Details of amplifiers with only discharge tubes, only semiconductor devices or only unspecified devices as amplifying elements
- H03F1/08—Modifications of amplifiers to reduce detrimental influences of internal impedances of amplifying elements
- H03F1/22—Modifications of amplifiers to reduce detrimental influences of internal impedances of amplifying elements by use of cascode coupling, i.e. earthed cathode or emitter stage followed by earthed grid or base stage respectively
- H03F1/223—Modifications of amplifiers to reduce detrimental influences of internal impedances of amplifying elements by use of cascode coupling, i.e. earthed cathode or emitter stage followed by earthed grid or base stage respectively with MOSFET's
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- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03K—PULSE TECHNIQUE
- H03K17/00—Electronic switching or gating, i.e. not by contact-making and –breaking
- H03K17/10—Modifications for increasing the maximum permissible switched voltage
- H03K17/102—Modifications for increasing the maximum permissible switched voltage in field-effect transistor switches
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- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03K—PULSE TECHNIQUE
- H03K17/00—Electronic switching or gating, i.e. not by contact-making and –breaking
- H03K17/16—Modifications for eliminating interference voltages or currents
- H03K17/161—Modifications for eliminating interference voltages or currents in field-effect transistor switches
- H03K17/162—Modifications for eliminating interference voltages or currents in field-effect transistor switches without feedback from the output circuit to the control circuit
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- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03K—PULSE TECHNIQUE
- H03K17/00—Electronic switching or gating, i.e. not by contact-making and –breaking
- H03K17/51—Electronic switching or gating, i.e. not by contact-making and –breaking characterised by the components used
- H03K17/56—Electronic switching or gating, i.e. not by contact-making and –breaking characterised by the components used by the use, as active elements, of semiconductor devices
- H03K17/567—Circuits characterised by the use of more than one type of semiconductor device, e.g. BIMOS, composite devices such as IGBT
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- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
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- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/42—Wire connectors; Manufacturing methods related thereto
- H01L2224/47—Structure, shape, material or disposition of the wire connectors after the connecting process
- H01L2224/48—Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
- H01L2224/481—Disposition
- H01L2224/48135—Connecting between different semiconductor or solid-state bodies, i.e. chip-to-chip
- H01L2224/48137—Connecting between different semiconductor or solid-state bodies, i.e. chip-to-chip the bodies being arranged next to each other, e.g. on a common substrate
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/42—Wire connectors; Manufacturing methods related thereto
- H01L2224/47—Structure, shape, material or disposition of the wire connectors after the connecting process
- H01L2224/48—Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
- H01L2224/481—Disposition
- H01L2224/48151—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
- H01L2224/48221—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
- H01L2224/48225—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
- H01L2224/48227—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation connecting the wire to a bond pad of the item
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/42—Wire connectors; Manufacturing methods related thereto
- H01L2224/47—Structure, shape, material or disposition of the wire connectors after the connecting process
- H01L2224/48—Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
- H01L2224/484—Connecting portions
- H01L2224/4847—Connecting portions the connecting portion on the bonding area of the semiconductor or solid-state body being a wedge bond
- H01L2224/48472—Connecting portions the connecting portion on the bonding area of the semiconductor or solid-state body being a wedge bond the other connecting portion not on the bonding area also being a wedge bond, i.e. wedge-to-wedge
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/42—Wire connectors; Manufacturing methods related thereto
- H01L2224/47—Structure, shape, material or disposition of the wire connectors after the connecting process
- H01L2224/49—Structure, shape, material or disposition of the wire connectors after the connecting process of a plurality of wire connectors
- H01L2224/491—Disposition
- H01L2224/4911—Disposition the connectors being bonded to at least one common bonding area, e.g. daisy chain
- H01L2224/49111—Disposition the connectors being bonded to at least one common bonding area, e.g. daisy chain the connectors connecting two common bonding areas, e.g. Litz or braid wires
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/10—Details of semiconductor or other solid state devices to be connected
- H01L2924/11—Device type
- H01L2924/13—Discrete devices, e.g. 3 terminal devices
- H01L2924/1304—Transistor
- H01L2924/1306—Field-effect transistor [FET]
- H01L2924/13091—Metal-Oxide-Semiconductor Field-Effect Transistor [MOSFET]
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03K—PULSE TECHNIQUE
- H03K17/00—Electronic switching or gating, i.e. not by contact-making and –breaking
- H03K17/51—Electronic switching or gating, i.e. not by contact-making and –breaking characterised by the components used
- H03K17/56—Electronic switching or gating, i.e. not by contact-making and –breaking characterised by the components used by the use, as active elements, of semiconductor devices
- H03K17/687—Electronic switching or gating, i.e. not by contact-making and –breaking characterised by the components used by the use, as active elements, of semiconductor devices the devices being field-effect transistors
- H03K2017/6875—Electronic switching or gating, i.e. not by contact-making and –breaking characterised by the components used by the use, as active elements, of semiconductor devices the devices being field-effect transistors using self-conductive, depletion FETs
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03K—PULSE TECHNIQUE
- H03K2217/00—Indexing scheme related to electronic switching or gating, i.e. not by contact-making or -breaking covered by H03K17/00
- H03K2217/0036—Means reducing energy consumption
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03K—PULSE TECHNIQUE
- H03K2217/00—Indexing scheme related to electronic switching or gating, i.e. not by contact-making or -breaking covered by H03K17/00
- H03K2217/0054—Gating switches, e.g. pass gates
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02B—CLIMATE CHANGE MITIGATION TECHNOLOGIES RELATED TO BUILDINGS, e.g. HOUSING, HOUSE APPLIANCES OR RELATED END-USER APPLICATIONS
- Y02B70/00—Technologies for an efficient end-user side electric power management and consumption
- Y02B70/10—Technologies improving the efficiency by using switched-mode power supplies [SMPS], i.e. efficient power electronics conversion e.g. power factor correction or reduction of losses in power supplies or efficient standby modes
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- Engineering & Computer Science (AREA)
- Power Engineering (AREA)
- Dc-Dc Converters (AREA)
- Electronic Switches (AREA)
- Junction Field-Effect Transistors (AREA)
- Insulated Gate Type Field-Effect Transistor (AREA)
- Amplifiers (AREA)
- Semiconductor Integrated Circuits (AREA)
- Metal-Oxide And Bipolar Metal-Oxide Semiconductor Integrated Circuits (AREA)
Abstract
Description
Cds1:第1のスイッチング素子Tr1のドレイン−ソース間容量
Cgs2:第2のスイッチング素子Tr2のゲート−ソース間容量
第2のスイッチング素子Tr2は、例えばGaN−HEMTであり、容量が大きいため、第1のスイッチング素子Tr1のドレイン−ソース間電圧Vds1は、第2のスイッチング素子Tr2のドレイン−ソース間電圧に比べて大きくなってしまう。第2のスイッチング素子Tr2は、耐圧が大きいが、スイッチング動作時では第1のスイッチング素子Tr1の方により大きな電圧がかかってしまう。
Vds2_OFF=VDD×Zds2_OFF/(Zds1_OFF+Zds2_OFF)
=VDD×(Cds1+Cgs2)/(Cds2+Cds1+Cgs2)
=400×(500p+500p)/(150p+500p+500p)
=347.8261V・・・(式2)
で求められ、第1のスイッチング素子Tr1のオフ時のドレイン−ソース間電圧Vds1_OFFは、
Vds1_OFF=VDD×Zds1_OFF/(Zds1_OFF+Zds2_OFF)
=VDD×Cds2/(Cds2+Cds1+Cgs2)
=400×150p/(150p+500p+500p)=52.1739V・・・(式3)
で求められる。ここで、
Zds1_OFF:第1のスイッチング素子Tr1のオフ時のドレイン−ソース間インピーダンス、
Zds2_OFF:第2のスイッチング素子Tr2のオフ時のドレイン−ソース間インピーダンス、とする。
Vds2_OFF=VDD×Zds2_OFF/(Zds1_OFF+Zds2_OFF)
=VDD×(Cds1+Cgs2)/(Cds2+Cds1+Cgs2+Cadd)
=400×(500p+500p+2n)/(150p+500p+500p+2n)
=350.9524V・・・(式4)
で求められ、第1のスイッチング素子Tr1のオフ時のドレイン−ソース間電圧Vds1_OFFは、
Vds1_OFF=VDD×Zds1_OFF/(Zds1_OFF+Zds2_OFF)
=VDD×Cds2/(Cds2+Cds1+Cgs2+Cadd)
=400×150p/(150p+500p+500p+2n)=19.0476V・・・(式5)
で求められる。
Tr2 第2のスイッチング素子
Cds1 第1のスイッチング素子Tr1のドレイン−ソース間容量
Cds2 第2のスイッチング素子Tr2のドレイン−ソース間容量
Cgs2 第2のスイッチング素子Tr2のゲート−ソース間容量
S1 第1のスイッチング素子Tr1のソース
D1 第1のスイッチング素子Tr1のドレイン
G1 第1のスイッチング素子Tr1のゲート
S2 第2のスイッチング素子Tr2のソース
D2 第2のスイッチング素子Tr2のドレイン
G2 第2のスイッチング素子Tr2のゲート
D_zener ツェナーダイオード
R_zener ツェナーダイオードの内部抵抗
SW、SW2、SW2、SW3、SWn スイッチ
Cadd、Cadd1、Cadd2、Cadd3、Caddn、CaddV キャパシタ
Claims (13)
- 第1のスイッチング素子と、
前記第1のスイッチング素子よりも高耐圧で、前記第1のスイッチング素子のドレインに縦続接続された第2のスイッチング素子と、
前記第1のスイッチング素子と前記第2のスイッチング素子との接続ノードと、前記第1のスイッチング素子のソースとの間に設けられ、直列接続されたスイッチとキャパシタと
を含むことを特徴とするカスコードトランジスタ。 - 前記スイッチは、外部からその開閉を制御可能とする外部接続端子を有する
ことを特徴とする請求項1に記載のカスコードトランジスタ。 - 前記外部接続端子には、前記第1のスイッチング素子のゲート信号がオフする前に、前記スイッチをオンする信号が入力され、前記接続ノードに前記キャパシタが電気的に接続される
ことを特徴とする請求項2に記載のカスコードトランジスタ。 - 前記外部接続端子には、前記第1のスイッチング素子のゲート信号がオンする前に、前記スイッチをオフする信号が入力され、前記接続ノードと前記キャパシタとは電気的に分離される
ことを特徴とする請求項2に記載のカスコードトランジスタ。 - 前記キャパシタは、該カスコードトラジスタのゲートをオンするタイミングで、該カスコードトラジスタのソースに接続される寄生インダクタンスとゲート−ソース間容量とで発振するドレイン電圧を最小となる位置に発振周期を変える容量値を有する
ことを特徴とする請求項1に記載のカスコードトランジスタ。 - 前記キャパシタは、電圧可変型容量で、容量を変えるための制御端子を有する
ことを特徴とする請求項1に記載のカスコードトランジスタ。 - 直列接続した前記キャパシタと前記スイッチを、前記接続ノードと前記第1のスイッチング素子のソースとの間に複数個並列接続する
ことを特徴とする請求項1に記載のカスコードトランジスタ。 - さらに、前記直列接続した前記キャパシタと前記スイッチを制御する回路を含む
ことを特徴とする請求項7に記載のカスコードトランジスタ。 - 前記第1のスイッチング素子は、ノーマリーオフ型のMOS−FETで、前記第2のスイッチング素子は、ノーマリーオン型のGaN−HEMTである
ことを特徴とする請求項1乃至8のいずれか一項に記載のカスコードトランジスタ。 - 第1のスイッチング素子と、
前記第1のスイッチング素子よりも高耐圧で、前記第1のスイッチング素子のドレインに縦続接続された第2のスイッチング素子と、
前記第1のスイッチング素子と前記第2のスイッチング素子との接続ノードと、前記第1のスイッチング素子のソースとの間に設けられ、直列接続されたスイッチとキャパシタと
を含むカスコードトランジスタの制御方法であって、
前記第1のスイッチング素子のゲートをオフする前に、前記スイッチをオンして、前記接続ノードに前記キャパシタを電気的に接続する
ことを特徴とするカスコードトランジスタの制御方法。 - さらに、
前記第1のスイッチング素子のゲートをオンする前に、前記スイッチをオフして、前記接続ノードと前記キャパシタを電気的に分離する
ことを特徴とする請求項10に記載のカスコードトランジスタの制御方法。 - 半導体基板上に形成された第1のスイッチング素子あるいは、前記第1のスイッチング素子よりも高耐圧で、前記第1のスイッチング素子のドレインに縦続接続され、前記半導体基板上に形成された第2のスイッチング素子と、
前記第1のスイッチング素子と前記第2のスイッチング素子との接続ノードと、前記第1のスイッチング素子のソースとの間に設けられ、前記半導体基板上で直列接続されたスイッチとキャパシタと
を含むことを特徴とする半導体素子。 - 板上に配置された第1のスイッチング素子と、
前記第1のスイッチング素子よりも高耐圧で、前記第1のスイッチング素子のドレインに縦続接続され、前記板上に配置された第2のスイッチング素子と、
前記第1のスイッチング素子と前記第2のスイッチング素子との接続ノードと、前記第1のスイッチング素子のソースとの間に設けられ、前記板上で直列接続されたスイッチとキャパシタと
を含むことを特徴とする電子部品。
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
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JP2013195286A JP6237038B2 (ja) | 2013-09-20 | 2013-09-20 | カスコードトランジスタ及びカスコードトランジスタの制御方法 |
US14/479,717 US9048837B2 (en) | 2013-09-20 | 2014-09-08 | Cascode transistor and method of controlling cascode transistor |
TW103131381A TWI514760B (zh) | 2013-09-20 | 2014-09-11 | 疊接電晶體及控制疊接電晶體之方法 |
CN201410471704.7A CN104467775B (zh) | 2013-09-20 | 2014-09-16 | 共源共栅晶体管和控制共源共栅晶体管的方法 |
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Also Published As
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JP6237038B2 (ja) | 2017-11-29 |
CN104467775B (zh) | 2018-06-15 |
US9048837B2 (en) | 2015-06-02 |
CN104467775A (zh) | 2015-03-25 |
US20150084685A1 (en) | 2015-03-26 |
TWI514760B (zh) | 2015-12-21 |
TW201521360A (zh) | 2015-06-01 |
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