JP2010287900A - Semiconductor device - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a structure of a semiconductor device ensuring flexibility design of a semiconductor element which is higher than that in conventional types, and to provide a method of manufacturing such a semiconductor device, more easily and at lower cost. <P>SOLUTION: The semiconductor device includes a semiconductor element 76, having an upper surface on which a plurality of bonding pads 74 are formed; an insulating sheet 82, bonded to a region other than that where the plurality of the bonding pads of the semiconductor element are formed; a plurality of conductor metal patterns 84 formed on the insulating sheet and electrically connected via each metal wire 92, corresponding to the plurality of the bonding pads on a one-to-one basis; a plurality of conductor posts 94 formed on the insulating sheet and electrically connected with each other, corresponding to the plurality of the conductor metal patterns on the one-to-one basis; and a sealing part 80 for exposing each upper surface of the plurality of the conductor posts and for sealing to cover the upper surface of the semiconductor element, the insulating sheet, the plurality of the conductor metal patterns, each metal wire and portions other than respective upper surface of the plurality of the conductor posts. <P>COPYRIGHT: (C)2011,JPO&INPIT

Description

  The present invention relates to a structure of a semiconductor device, in particular, a structure of a multi-chip package (MCP) in which chips are stacked and a manufacturing method thereof, and a structure of a wafer level CSP (chip size package) and a manufacturing method thereof.

  An example of a conventional semiconductor device having a structure of MCP (multi-chip package) in which chips are stacked is shown in FIG.

  FIG. 11A is a plan view of the arrangement relationship of the components of the semiconductor device as viewed from above, and shows the lower structure of the sealing portion. FIG. 11B is a cross-sectional view of a conventional device.

  According to FIGS. 11A and 11B, a first semiconductor element (first element) 504 having a plurality of bonding pads 503 on the upper surface of the substrate 500 via a first adhesive 502 is provided. It is glued. A second semiconductor element (second element) 508 including a plurality of bonding pads 507 is bonded to the upper surface of the first element 504 with a second adhesive 506 interposed therebetween. In addition, a plurality of bonding posts 510 are provided in a region other than the region where the first element 504 is mounted on the upper surface of the substrate 500. The bonding post 510 and the bonding pad 503 on the first element 504 are connected by a first wire 512 that is a fine metal wire. Further, a bonding pad 507 on the second element 508 and another bonding post 510 on the upper surface of the substrate 500 are connected by a second wire 514 which is a thin metal wire. 11B, the entire top surface of the substrate 500 is covered with the first element 504, the second element 508, the first wire 512, and the second wire 514. A sealing portion 516 is formed by sealing with a mold resin.

  Next, with regard to the structure of the conventional wafer level CSP, for example, a plurality of layers are further stacked on a semiconductor element having a plurality of bonding pads formed on the surface, and through holes formed in these layers. The bonding pad of the semiconductor element and the desired wiring pattern formed on the uppermost surface of the plurality of layers are electrically connected by the wiring metal. These laminated structures are sealed with a mold resin. Further, for example, a structure in which a conductor post is formed by being electrically connected to a desired wiring pattern on the uppermost layer and the surface of the conductor post is exposed on the mounting surface of the mold resin is well known.

  Such a wafer level CSP is manufactured by simultaneously processing a plurality of elements in a stacking process, a wiring process and a sealing process on a semiconductor element on a wafer on which a plurality of semiconductor elements are formed. Is made by. Then, CSP is obtained by dicing the wafer which completed the sealing process so that it may become an individual semiconductor element unit.

  However, the semiconductor device as shown in FIG. 11 has the following problems. That is, when the second wire 514 is connected to the bonding pad 507 of the second element 508 and the bonding post 510 on the substrate 500, depending on the position of the bonding post 510, the bonding pad 503 of the first element 504 There is a possibility that a short circuit may occur between the first wire 512 and the second wire 514 connecting the bonding post 510 on the substrate 500.

  In order to prevent such a short circuit between the first wire 512 and the second wire 514, the position of the bonding pad 503 on the first element 504 to which the first wire 512 is wired and the second wire 514 are wired. The position of the bonding pad 507 on the second element 508 to be processed must be selected so as not to be short-circuited. Therefore, the positions of the bonding pads 503 and 507 that can be wired are greatly limited. Therefore, the design freedom of the semiconductor element is reduced.

  In order to solve such problems, there has been a demand for the appearance of a semiconductor device structure in which the degree of design freedom of semiconductor elements is higher than in the past and a method for manufacturing such a device easily and inexpensively.

  Further, in the conventional wafer level CSP, a plurality of layers are stacked on the semiconductor element, and the bonding pads are rearranged on the outermost surface thereof. In this case, it is necessary to re-develop and manufacture all of the lamination process and wiring process on the semiconductor element. Therefore, this development takes time. Moreover, it is not easy to change the rearrangement.

  Therefore, the appearance of a wafer level CSP structure in which the rearrangement of bonding pads is easier than before has been desired. The advent of such a wafer level CSP manufacturing method has also been desired.

  For this reason, the inventors of the present invention have succeeded in developing a new rearrangement sheet provided in a semiconductor device in order to facilitate rearrangement of bonding pads. According to this relocation sheet, the sheet includes an insulating sheet and a conductive metal pattern formed on the insulating sheet.

  The semiconductor device according to the present invention has the following characteristics.

  That is, a semiconductor device according to the present invention includes a semiconductor element having an upper surface on which a plurality of bonding pads are formed, an insulating sheet bonded to a region other than a region where the plurality of bonding pads of the semiconductor element are formed, A plurality of conductive metal patterns formed on the insulating sheet and electrically connected to each other by metal wires in a one-to-one correspondence with the plurality of bonding pads, and a plurality of conductive metal patterns formed on the insulating sheet. A plurality of conductor posts electrically connected in a one-to-one correspondence with each other, and exposing each upper surface of the plurality of conductor posts, and an upper surface of the semiconductor element, an insulating sheet, a plurality of conductor metal patterns, each metal wire, And a sealing portion for sealing so as to cover portions other than the upper surfaces of the plurality of conductor posts.

  As a semiconductor device of the present invention, consider the case where the above-described rearrangement sheet, that is, the above-described insulating sheet having a plurality of conductive metal patterns is applied to a wafer level CSP. In the wafer level CSP, a rearrangement sheet is provided in an area where a bonding pad is not formed in a semiconductor element having a plurality of bonding pads. And, the conductive metal pattern of the rearrangement sheet is composed of, for example, the same number of rearrangement posts as the bonding pads, the same number of wire connection portions as the bonding pads, and the rewiring that connects the rearrangement posts and the wire connection portions. To do. The wire connection portion can be formed at a position where it can be easily connected to the bonding pad of the rearrangement sheet. Therefore, the bonding pad and the wire connecting portion can be easily connected by wire bonding. In addition, a conductor post is provided on the rearrangement post connected to the wire connection portion by rewiring, and the upper surface of the semiconductor element is sealed so that the upper surface of the conductor post is exposed. Thereby, the bonding pad of the semiconductor device can be easily rearranged on the conductor post exposed from the sealing portion.

  Therefore, the rearrangement of the electrode to the conductive metal pattern can be facilitated by adhering the rearrangement sheet in which the conductive metal pattern of the present invention is formed at a desired position to the base on which the electrode to be rearranged is provided. It can be carried out.

(A) is a schematic cross-sectional view of the semiconductor device of the first reference example, and (B) is a plan view seen from above. (A) is the top view seen from the sheet | seat for rearrangement of a 1st reference example, (B) is a block diagram of a cross section. (A)-(D) is a manufacturing-process figure of the sheet | seat for rearrangement of the 1st reference example. (A) is the top view seen from the sheet | seat for rearrangement of the 2nd reference example, (B) is a block diagram of a cross section. (A) is the top view seen from the sheet | seat for rearrangement of the 3rd reference example, (B) is a block diagram of a cross section. (A) is sectional drawing of the semiconductor device of 1st Embodiment, (B) is the principal part enlarged view of (A). Further, (C) is a plan view seen from above the semiconductor device. FIGS. 4A to 4D are manufacturing process diagrams of the semiconductor device according to the first embodiment. FIGS. FIGS. 8A to 8C are manufacturing process diagrams subsequent to FIG. 7 for the semiconductor device according to the first embodiment; FIGS. (A)-(D) are manufacturing process drawings with which it uses for description of the manufacturing method of the semiconductor device of the 4th reference example. FIGS. 10A to 10C are manufacturing process diagrams subsequent to FIG. 9, for use in explaining a method for manufacturing a semiconductor device according to a fourth reference example; FIGS. (A) is the plane block diagram seen from the top of the conventional semiconductor device, (B) is a cross-sectional block diagram.

  Embodiments and reference examples of the present invention will be described below with reference to the drawings. Each drawing merely schematically shows the shape, size, and arrangement relationship of each component so that the invention can be understood. Therefore, the present invention is not limited to the illustrated examples. Further, in the drawing, hatching (hatched lines) indicating a cross section is omitted except for a part for easy understanding of the drawing.

<First Reference Example>
As a first reference example of the present invention, an example in which a rearrangement sheet is provided on an MCP in which chips are stacked will be described with reference to FIGS.

  FIG. 1A is a cross-sectional view for explaining the configuration of the MCP of this reference example. FIG. 1B is a plan view of the MCP as viewed from above, and shows the arrangement relationship of the components on the lower side of the sealing portion. 2A is a plan view of the rearrangement sheet of this reference example as viewed from above, and FIG. 2B is a cross-sectional view of the rearrangement sheet.

  In FIG. 1, a semiconductor including a substrate 12, a first semiconductor element (referred to as a first element) 14, and a second semiconductor element (referred to as a second element) 16 on the substrate 12 in this order. A device (MCP) 10 is shown. A plurality of bonding posts 20 a and 20 b are formed in a region on the upper surface other than the first element formation region 18 of the substrate 12. A plurality of bonding pads 22 and 24 are also formed on the upper surfaces of the first element 14 and the second element 16, respectively. Here, the bonding pad of the first element 14 is referred to as a first pad 22, and the bonding pad of the second element 16 is referred to as a second pad 24.

  Of the plurality of bonding posts 20a and 20b, the one connected to the first pad 22 is referred to as a first pad connection post 20a, and the one connected to the second pad 24 is referred to as a second pad connection post 20b. Further, the first pad 22 connected to the bonding post 20 is referred to as a post connecting first pad 22a, and the second pad 24 connected to the bonding post 20 is referred to as a post connecting second pad 24a. Called.

  In this reference example, a rearrangement sheet 26 is interposed between the first element 14 and the second element 16. The first element 14 is fixed on the substrate 12 with the first adhesive 28, and the rearrangement sheet 26 is fixed on the first element 14 with the second adhesive 30. The second element 16 is fixed on the rearrangement sheet 26 with a third adhesive 32. For these adhesives (28, 30, 32), die bond pastes conventionally used for die bonding are used. These are composed of, for example, epoxy resin, and after dropping a liquid material on each base (substrate 12, first element 14 and rearrangement sheet 26), elements 14 and 16 or sheet 26 are mounted. Glue.

  As shown in FIG. 2, the rearrangement sheet 26 includes an insulating sheet 34 and a plurality of conductive metal patterns 36 formed on the insulating sheet 34. In this example, the conductor metal pattern 36 includes a base plating pattern 38 and a conductor metal plating pattern 40 (FIG. 2B). As shown in FIG. 1B, the conductive metal pattern 36 is formed in a region on the insulating sheet 34 exposed from the second element 16. Each conductor metal pattern 36 reaches without reaching the first pad 22 by a straight line extending from the second pad connecting post 20b toward the insulating sheet 34 (or the rearrangement sheet 26). And a region including a first position 36x that can be formed and a second position 36y that can be wire-bonded to the post-connecting second pad 24a (see FIGS. 1B and 2B). See A).

  The conductor metal pattern 36 and the second pad connecting post 20b are connected by the first relay wire 42, and the same conductor metal pattern 36 and the post connecting second pad 24a are connected by the second relay wire 44. (See FIGS. 1A and 1B.) As a result, the second pad connection post 20 b and the post connection second pad 24 a can be electrically connected through the conductor metal pattern 36.

  The first pad connection post 20a and the post connection first pad 22a are connected by a first wire 46 (see FIGS. 1A and 1B).

  The upper surface of the substrate 12 is sealed with a mold resin 48 so as to cover the first element 14, the rearrangement sheet 26, the second element 16, the first wire 46, the first relay wire 42, and the second relay wire 44. It is stopped and the sealing part 50 is formed.

  As described above, in this reference example, the rearrangement sheet 26 having the conductive metal pattern 36 is provided between the first element 14 and the second element 16 of the MCP 10. Therefore, the electrical connection between the post connection second pad 24a and the second pad connection post 20b of the second element 16 is performed by connecting the post connection second pad 24a and the conductive metal pattern 36 of the rearrangement sheet 26. This is done by connecting and connecting the same conductive metal pattern 36 and the second pad connecting post 20b.

  The conductive metal pattern 36 of the rearrangement sheet 26 is used for rearrangement from the position (second position) 36y at which the connection with the second pad 24a for post connection is easy and the second pad connection post 20b on the substrate 12. A straight line extending toward the sheet 26 is formed in a region including a position (first position) 36x that reaches the relocation sheet 26 without contacting the first bonding pad 22 on the first element 14. Has been. Therefore, the electrical connection between the post connection second pad 24a and the second pad connection post 20b can be easily performed regardless of the position of the post connection second pad 24a. For this reason, the freedom degree of design of the 2nd element 16 can be increased.

  The first relay wire 42 is used for connection between the second pad connection post 20 b and the conductor metal pattern 36, and the second relay wire is used for connection between the post connection second pad 24 a and the conductor metal pattern 36. 44 is used. The length of each of the first relay wire 42 and the second relay wire 44 is longer than the length of the metal wire used to directly connect the second pad connecting post 20b to the post connecting second pad 24a. Much shorter. Therefore, it is possible to greatly reduce the defect occurrence rate of the wires in which the wires 42 and 44 are deformed or damaged in the steps after the connecting step of the first and second relay wires 42 and 44. Therefore, the yield of MCP manufacturing can be improved.

  In addition, since the lengths of the first and second relay wires 42 and 44 are shortened in this way, the height of the wire loop can be reduced. Accordingly, the package can be thinned.

  Next, an example of a method for manufacturing the rearrangement sheet 26 used in the semiconductor device 10 of this reference example will be described with reference to FIGS.

  3 (A) to 3 (D) are explanatory views of the manufacturing process of the rearrangement sheet 26, and a plan view and a cross-sectional view of the structure of the structure in the main process during manufacturing viewed from above. It is shown in the easy-to-understand figure.

  First, a mask corresponding to the shape of a plurality of conductor metal patterns in units of one chip, which will be formed on the insulating film 34x later, is provided on the insulating film 34x.

  In this reference example, as the insulating film 34x, the position of the second element 16 and the position of the second pad 24a for post connection are formed on an insulating film 34x made of a material capable of wire bonding, for example, an epoxy resin or polyimide. A mask corresponding to the pattern shape of the conductor metal pattern 36 designed in consideration of the position and the position of the second pad connecting post 20b is provided. This mask is formed of a metal excellent in fine workability, for example, Cu (copper), and a plurality of patterns formed per chip are repeatedly formed vertically and horizontally (not shown).

  Next, a plurality of conductive metal plating patterns 40 in units of one chip are formed on the insulating film 34x using a mask.

  Therefore, in this reference example, the base plating pattern 38 is formed in the formation region of the conductive metal plating pattern 40 by using the electroless plating method using the mask (see FIG. 2B). Here, Ni (nickel) is used as the base plating pattern 38. Next, a conductive metal plating pattern 40 is formed on the underlying plating pattern 38 by electrolytic plating using the underlying plating pattern 38 as an electrode. As a material of the conductive metal plating pattern 40, a noble metal such as Au (gold), Pd (palladium), Cu (copper) or the like can be used. In this example, Au is used. Thereby, as shown in FIG. 3A, a plurality of conductive metal plating patterns 40 are formed on the insulating film 34x. FIG. 3A is a schematic plan view of the insulating film 34x as viewed from above. A region surrounded by a dotted line on the insulating film 34x is a region to be a relocation sheet in units of one chip.

  Next, after removing the mask, the insulating film 34x on which a plurality of one-chip unit conductive metal plating patterns 40 are formed is divided into one chip unit, and each of the one-chip unit conductive metal plating pattern 40 is provided. A plurality of insulating sheets 34 are formed.

  Therefore, in this example, a generally used dicing apparatus is prepared. Here, an apparatus including at least a scribe ring 52, a scribe tape 54, and a push-up mechanism component 56 is prepared. Then, the insulating film 34x on which the conductive metal plating pattern 40 is formed is fixed to the scribe ring 52 via the scribe tape 54 (FIG. 3B). Next, the insulating film 34x is divided along a cut line, that is, a line indicated by a dotted line in the insulating film 34x in FIG. 3A (FIG. 3C). 3B is a plan view of the insulating film 34x fixed to the dicing apparatus as viewed from above, and FIG. 3C is a structure immediately after the insulating film 34x is divided into individual insulating sheets 34. FIG. FIG. The insulating film 34x is divided into a plurality of rearrangement sheets 26 each including the insulating sheet 34 and the conductive metal plating pattern 40 (FIG. 3C).

  Next, the push-up pin 58 of the push-up mechanism component 56 is pushed out. Thereby, one of the rearrangement sheets 26 is pushed up. The pushed rearrangement sheet 26 is pulled up by the collet 60 (FIG. 3D).

  Thereafter, each relocation sheet 26 is bonded onto the first element 14 by a normal die bonding process (see FIGS. 1A and 1B).

  In this manner, the rearrangement sheet 26 used for the MCP 10 of FIG. 1 can be manufactured.

  As a result, the rearrangement sheet 26 can be easily manufactured using a conventional dicing apparatus, so that it is not necessary to make a new capital investment. Therefore, the manufacturing cost is also low.

<Second Reference Example>
As a second reference example, an example in which the structure of the MCP is the same as that of the first reference example but the configuration of the rearrangement sheet is different will be described with reference to FIG. FIG. 4A is a diagram schematically showing the configuration of the rearrangement sheet of this reference example, and is a plan view seen from above. FIG. 4B is a cross-sectional view of the rearrangement sheet. In FIG. 4, the same components as those in the first reference example are denoted by the same reference numerals.

  The relocation sheet 62 of this reference example includes an insulating sheet 34 and a conductive metal pattern 36 formed on the insulating sheet 34. The conductive metal pattern 36 is an electrode for wire bonding with an external electrode. The external electrodes in this example are the second pad connection post 20b on the substrate 12 and the post connection second pad 24a on the second element 16 (see FIG. 1).

  An element mounting region 64 is provided in a region on the insulating sheet 34 other than the region where the conductive metal pattern 36 is formed, and an insulating adhesive sheet 66 is formed in the element mounting region 64.

  In this example, the element mounted in the element mounting region 64 is the second element 16. Moreover, as a material of the insulating adhesive sheet 66, a material having adhesiveness by heating, particularly a material having both properties of thermoplasticity and thermosetting is preferable. For example, a composite material of an epoxy resin and a polyimide resin is preferably used. The insulating adhesive sheet 66 is provided in a semi-cured state. The semi-cured state here refers to a state in which the material of the insulating adhesive sheet is applied on the base and then cured at normal temperature (room temperature) or low temperature (40 to 50 ° C.).

  Thus, since the insulating adhesive sheet 66 is provided in advance in the element mounting region 64 of the rearrangement sheet 62, the second element 16 is placed on the rearrangement sheet 62 in manufacturing the MCP of this reference example. When bonding, the step of applying an adhesive can be omitted. In this reference example, in the step of mounting the second element 16 on the rearrangement sheet 62, the second element 16 is placed on the insulating adhesive sheet 66, and then subjected to pressure and heat treatment to perform the insulating adhesive sheet. 66 and the second element 16 are bonded.

  As a result, the processing time can be shortened by about 1 hour as compared with a series of processes for mounting and fixing the second element 16 after applying the adhesive to the rearrangement sheet 62.

  Such a rearrangement sheet 62 is manufactured using almost the same method as described in the first reference example.

  That is, first, a mask corresponding to the shape of the conductive metal pattern 36 is provided on the insulating film 34x. Next, a plurality of base plating patterns 38 and conductive metal plating patterns 40 are formed on the insulating film 34x using a mask. After removing the mask, the insulating film 34x on which the conductive metal plating pattern 40 is formed is divided (see FIG. 3).

  In this reference example, for example, an epoxy resin is selectively applied on the element formation region 64 before providing a mask on the insulating film 34x. Then, it is left to stand at ordinary temperature or cured by heating at a low temperature (40 to 50 ° C.). At this time, the curing reaction is not completely completed. This semi-cured film is referred to as an insulating adhesive sheet 66. Thereafter, a mask is provided on the insulating film 34x, and the subsequent steps are performed. Alternatively, the insulating adhesive sheet 66 may be provided in the same manner as described above after the conductive metal plating pattern 40 is formed and before the insulating film 34x is divided. Thereafter, the insulating film 34x is divided.

<Third reference example>
As a third reference example, with reference to FIG. 5, an example in which the structure of the MCP is the same as that of the first reference example but the configuration of the rearrangement sheet is different will be described. FIG. 5A is a diagram schematically showing the configuration of the rearrangement sheet of this reference example, and is a plan view seen from above. FIG. 5B is a cross-sectional view of the rearrangement sheet.

  The relocation sheet 68 of this reference example includes an insulating adhesive sheet 70 and a conductor metal pattern 36 formed on the insulating adhesive sheet 70. The conductive metal pattern 36 is an electrode for wire bonding with an external electrode. The external electrodes in this example are the second pad connection post 20b on the substrate 12 and the post connection second pad 24a on the second element 16 (see FIG. 1).

  In this example, the entire sheet on which the conductive metal pattern 36 is formed is composed of an insulating adhesive sheet 70. As the material of the insulating adhesive sheet 70, the same material as that of the insulating adhesive sheet 66 of the second reference example may be used. For example, a composite material of an epoxy resin and a polyimide resin is used. The insulating adhesive sheet 70 is provided in a semi-cured state. The semi-cured state here refers to a state in which a liquid material is cured at room temperature (room temperature) or at a low temperature (40 to 50 ° C.).

  Thus, according to the relocation sheet 68 of this reference example, the conductive adhesive pattern 70 is formed on the insulating adhesive sheet 70 using the insulating adhesive sheet 70 instead of the insulating sheet 34 of the first reference example. Has been. As a result, in manufacturing the MCP of this reference example, in the step of bonding the rearrangement sheet 68 on the first element 14 and the step of bonding the second element 16 on the rearrangement sheet 68, respectively, The step of applying can be omitted. In this reference example, after the rearrangement sheet 68 is placed on the first element 14 and the second element 16 is further placed on the rearrangement sheet 68, the first element 14 is subjected to pressurization and heat treatment. The element 14, the rearrangement sheet 68, and the second element 16 are bonded.

  As a result, processing is performed more significantly than a series of processes in which the adhesive is applied and then fixed between the first element 14 and the rearrangement sheet 68 and between the rearrangement sheet 68 and the second element 16. Time can be shortened.

  In addition, since an adhesive for bonding the first element 14 and the rearrangement sheet 68 and between the rearrangement sheet 68 and the second element 16 is unnecessary, compared to the case of using an adhesive, The entire thickness of 30-50 μmM CP can be reduced. Therefore, the semiconductor device can be thinned.

<First Embodiment>
As a first embodiment, an example in which a rearrangement sheet is provided on a wafer level CSP will be described with reference to FIGS.

  FIG. 6A is a cross-sectional view for explaining the configuration of the wafer level CSP of this embodiment. FIG. 6B is an enlarged view of a portion surrounded by a dotted line in FIG. FIG. 6C is a plan view of the wafer level CSP of this embodiment as viewed from above, and shows the positional relationship between the external connection terminals and the components below the sealing portion.

  According to FIG. 6, the semiconductor device (wafer level CSP) 72 of this embodiment has a semiconductor element 76 having a plurality of bonding pads 74 formed on the upper surface, and bonding pads 74 of the semiconductor elements 76. A rearrangement sheet 78 adhered to a region other than the region, and a sealing portion 80 that seals the upper surface of the semiconductor element 76 so as to cover the rearrangement sheet 78 (FIG. 6A).

  The rearrangement sheet 78 includes an insulating sheet 82 and a conductive metal pattern 84 electrically connected to the bonding pad 74. The insulating sheet 82 may be bonded with an adhesive on the element as described in the first reference example, or may be an insulating adhesive sheet as described in the third reference example. The conductive metal pattern 84 includes at least the same number of rearrangement posts 86 as the bonding pads 74 of the semiconductor element 76, the same number of wire connection portions 88 as the rearrangement posts 86, and the rearrangement posts 86 and the wire connection portions 88. It is comprised with the rewiring 90 to connect (FIG.6 (C)).

  The conductor metal pattern 84 may be a wiring metal pattern or may be a conductor metal plating pattern. In addition, when a conductive metal plating pattern is used, the conductive metal plating pattern may be formed via a base plating pattern, or if the adhesiveness to the insulating sheet is good, the conductive metal plating pattern is directly applied on the insulating sheet. A pattern may be formed. Further, after the pattern of the rearrangement post 86, the wire connection portion 88, and the rewiring 90 is formed on the insulating sheet 82 with a wiring metal pattern, the wire connected to the wire connection portion 88 as shown in FIG. Depending on the metal, the conductor metal plating pattern 88y may be formed on the Cu wiring pattern 84x of the wire connecting portion 88 via the base plating pattern 88x.

  Further, the wire connecting portion 88 and the bonding pad 74 are connected by a metal wire 92 (FIGS. 6A and 6B).

  A conductor post 94 is formed on the upper surface of the rearrangement post 86, and a part of the conductor post 94 is exposed from the sealing portion 80 (FIG. 6A).

  In this embodiment, for example, the connection between the wire connecting portion 88 and the bonding pad 74 is performed by the Au wire 92. Therefore, first, after a copper plating film is applied on the insulating sheet 82, a resist pattern corresponding to the shapes of the rearrangement post 86, the wire connection portion 88, and the rewiring 90 is formed on the copper plating film. Thereafter, the copper plating film is etched using the resist pattern as a mask to form a Cu wiring pattern 84x corresponding to the shape of the rearrangement post 86, the wire connection portion 88, and the rewiring 90. Thereafter, a conductor metal plating pattern 88y made of Au is formed on the Cu wiring pattern 84x of the wire connection portion 88 via the base plating pattern 88x (see FIG. 6B). Therefore, the wire connection portion 88 of this embodiment is constituted by the Cu wiring pattern 84x, the base plating pattern 88x, and the conductor metal plating pattern 88y.

  Thereby, the rearrangement sheet 78 of this embodiment is obtained.

  The connection by the Au wire 92 between the wire connection portion 88 and the bonding pad 74 on the semiconductor element 76 is performed as follows in this embodiment. That is, an Au metal sphere 96 is formed on the bonding pad 74, and a wire bond launching method is used to connect the metal sphere 96 to the wire connection portion 88 located higher than the metal sphere 96. Yes. Thereby, the height H of the wire loop can be reduced as compared with the method of performing wire bonding from the wire connection portion 88 toward the bonding pad 74 (see FIG. 6B).

  In this embodiment, a conductor post 94 made of Au is formed on the upper surface of the rearrangement post 86. A sealing portion 80 sealed with a mold resin is formed on the upper surface of the semiconductor element 76 so that the conductor post 94 and the Au wire 92 are covered. However, a part (upper surface) of the conductor post 94 is exposed from the sealing portion 80. Therefore, the thickness of the sealing portion 80 may be such a thickness that the Au wire 92 is covered, and the height of the conductor post 94 may be set in accordance with this thickness.

  In this embodiment, since the height H of the wire loop between the wire connecting portion 88 and the bonding pad 74 can be reduced (see FIG. 6B), the height of the conductor post 94 is reduced. can do. Therefore, the semiconductor device 72 can be thinned.

  For example, a solder ball 98 is provided on the upper surface of the conductor post 94 exposed from the sealing portion 80, and this solder ball 98 is used as a connection terminal to the outside. It can also be mounted and used so that the upper surface of the conductor post 94 is in contact with the member on which the electrode for connection is formed.

  As a result, according to the semiconductor device 72 of this embodiment, it is possible to change the pin assignment and wiring only by changing the conductor metal pattern 84 of the rearrangement sheet 78. Therefore, the semiconductor device 72 can flexibly respond to user requests. In addition, since only the rearrangement sheet 78 needs to be changed, it is possible to cope with a low cost.

  Further, the relocation sheet 78 and the bonding pads 74 on the element are connected by wire bonding, and the relocation of the bonding pads 74 is performed between the relocation post 86 and the wire connection portion 88 on the relocation sheet 78. Therefore, the bonding pads 74 can be rearranged more easily than in the prior art.

  The semiconductor device 72 has a structure in which a semiconductor element 76 having a known reliability and a rearrangement sheet 78 that has a simple structure and is easy to confirm the reliability are bonded to each other. Therefore, the device 72 having higher reliability than the conventional device can be realized.

  Next, an example of a method for manufacturing the semiconductor device of this embodiment will be described with reference to FIGS.

  FIG. 7A to FIG. 7D are schematic manufacturing process diagrams of the semiconductor device of this embodiment, and show cross-sectional cuts in main processes. 8A to 8C are manufacturing process diagrams subsequent to FIG. 7D.

  First, a rearrangement sheet 78 having a conductive metal pattern 84 is bonded onto an insulating sheet 82 on the upper surface of a semiconductor element 76 having a plurality of bonding pads 74 and exposed from the bonding pads 74 (FIG. 7 (A)).

  The conductive metal pattern 84 of the rearrangement sheet 78 includes a rearrangement post 86, a wire connection portion 88, and a rewiring 90 that connects the rearrangement post 86 and the wire connection portion 88 (FIG. 6C). )reference.).

  Next, the bonding pad 74 and the wire connection portion 88 in the conductor metal pattern 84 are connected by a thin metal wire 92.

  For this reason, in this embodiment, connection is performed using a wire bond launching method. That is, after a metal ball 96 made of Au is formed on the bonding pad 74, the Au wire 92 is pulled up from the metal ball 96 and bonded to the wire connection portion 88 (FIG. 7B).

  In succession to this step, the conductor post 94 is formed on the rearrangement post 86 in the conductor metal pattern 84 by stud bumps formed by wire bonding.

  For this reason, in this embodiment, stud bumps made of Au are formed as conductor posts 94 by wire bonding (FIG. 7C).

  Next, the upper surface of the semiconductor element 76 is sealed with a molding resin so as to cover the bonding pad 74, the rearrangement sheet 78, the fine metal wire 92, and the conductor post 94, thereby forming the sealing portion 80. (FIG. 7 (D)).

  Next, the surface of the sealing portion 80 is polished so that the upper surface of the conductor post 94 is exposed from the sealing portion 80.

  Therefore, in this embodiment, the polishing machine 100 is used to polish the surface of the mold resin until the upper surface of the conductor post 94 is exposed (FIGS. 8A and 8B). 8A is a cross-sectional view of the structure in the middle of polishing, and FIG. 8B is a cross-sectional view of the structure immediately after the polishing is completed.

  Thereafter, for example, a solder ball 98 is formed on the upper surface of the exposed conductor post 94 (FIG. 8C).

  According to this manufacturing method, the connection between the wire connection portion 88 and the bonding pad 74 is performed using a wire bond launching method, and then the stud as the conductor post 94 is continuously formed on the rearrangement post 86 by wire bonding. Form bumps.

  The formation of the conductor post 94 has been conventionally performed using an electrolytic plating method. Briefly, after forming a mask so that only the rearrangement post is exposed, Cu, for example, is plated on the rearrangement post by electrolytic plating. Thereafter, the mask is removed.

  Therefore, in comparison with the conventional method, in the manufacturing method of this embodiment, the step of forming the conductor post 94 can be performed using wire bonding in succession to the step of connecting the wire connection portion 88 and the bonding pad 74. . Therefore, since the mask formation and the plating film formation process are unnecessary, the manufacturing cost can be reduced as compared with the conventional case.

<Fourth Reference Example>
As a fourth reference example, an example of a method for manufacturing the semiconductor device of the first embodiment at the wafer level will be described with reference to FIGS.

  FIG. 9A to FIG. 9D are schematic process diagrams showing the manufacturing process of the wafer level CSP of this reference example. 10A to 10C are manufacturing process diagrams subsequent to FIG. 9D. Moreover, in FIG. 9 (A)-(D), the figure of the one intelligible is shown among the top view and sectional drawing which looked at the structure in the middle of manufacture from the top. 10A to 10C are plan views of the semiconductor wafer as viewed from above. 10A and 10B also show an enlarged view of the upper surface of one of a plurality of semiconductor elements on the semiconductor wafer.

  First, similarly to the first reference example, a plurality of rearrangement sheets are collectively formed. On the insulating film 82x, a mask corresponding to the shape of a plurality of one-chip conductor metal patterns 84 formed on the insulating film 82x is provided later. However, in this reference example, the insulating film 82x is an insulating adhesive film. The insulating adhesive film 82x is, for example, a film (semi-cured film) in which a curing reaction is not completed, which is obtained by curing a mixed material of a liquid epoxy resin and a polyimide resin at normal temperature or low temperature (40 to 50 ° C.). is there. The conductive metal pattern 84 is a pattern corresponding to the shape of the rearrangement post 86, the wire connection portion 88, and the rewiring 90 that connects the rearrangement post 86 and the wire connection portion 88 (see FIG. 6C). .) Next, the conductive metal pattern 84 is formed using this mask. The conductor metal pattern 84 may be formed of only a wiring metal pattern, a conductor metal plating pattern, or a wiring metal pattern and a conductor metal plating pattern partially formed on the wiring metal pattern. It may be done (FIG. 9A).

  Next, the insulating adhesive film 82x on which the conductive metal pattern 84 is formed is divided for each rearrangement sheet 78 using a general dicing apparatus.

  Therefore, in this reference example, the insulating adhesive film 82x having the conductive metal pattern 84 is fixed to the scribe ring 52 via the scribe tape 54 (FIG. 9B). Thereafter, the sheet is divided for each rearrangement sheet 78 (FIG. 9C).

  Next, the push-up pin 58 of the push-up mechanism component 56 of the dicing apparatus is pushed out. Thereby, the rearrangement sheet 78 formed by the division is pushed up. The rearranged sheet 78 pushed up is pulled up by the collet 60 (FIG. 9D). The divided rearrangement sheets 78 are sequentially pulled up using the push-up mechanism component 56 and the collet 60.

  Next, the rearrangement sheet 78 pulled up by the collet 60 is bonded onto each semiconductor element 76 of the semiconductor wafer 102. A plurality of bonding pads 74 are formed on each semiconductor element 76. A rearrangement sheet 78 is bonded to a region of the semiconductor element 76 where the bonding pad 74 is not formed (FIG. 10A).

  Next, the bonding pads 74 on the respective semiconductor elements 76 and the wire connection portions 88 of the rearrangement sheet 78 are connected by metal wires 92 by using a wire bonding launch method. Also, following this step, the conductor post 94 is formed on the rearrangement post 86 of the rearrangement sheet 78 with stud bumps formed by existing wire bonds (FIGS. 10B and 6C). reference.).

  Next, a mold resin 104 is formed on the entire top surface of the semiconductor wafer 102. As a result, the rearrangement sheet 78, the metal wires 92, and the stud bumps (conductor posts) 94 on the respective semiconductor elements 76 on the upper surface of the semiconductor wafer 102 are covered with the mold resin 104 (FIG. 10C).

  Thereafter, the upper surface of the mold resin 104 is polished using an existing polishing machine until the upper surface of the stud bump 94 is exposed. Thereafter, for example, a solder ball 98 is formed on the upper surface of the stud bump 94, and this solder ball 98 is used as an external connection electrode (see FIG. 8). Thereafter, the semiconductor wafer 102 is fixed to the scribe ring via a scribe tape using a dicing apparatus. Thereafter, each semiconductor element 72 is divided.

  Through the above steps, the semiconductor device 72 of the first embodiment is manufactured at the wafer level.

  As a result, the semiconductor devices 72 can be collectively formed in the state of the semiconductor wafer 102. Therefore, the manufacturing time can be greatly shortened, and this can be expected to greatly reduce the manufacturing cost of the semiconductor device.

  In the first to third reference examples described above, the semiconductor devices in which the semiconductor elements are stacked are not electrically connected to each other. However, the reference example is limited to such a configuration. It is not a thing. That is, for example, the semiconductor device having the structure in which the first element and the second element are electrically connected by wire-bonding the bonding pad of the first element and the bonding pad of the second element is also used in the reference example. Is of course applicable. Further, the number of stacked semiconductor elements is not limited to two, and the present invention can also be applied to a stacked device.

  As is clear from the above description, the relocation sheet described above includes an insulating sheet and a conductive metal pattern formed on the insulating sheet.

  For example, in a semiconductor device (MCP) of a type in which chips are stacked, a first element and a second element having a structure in which a first element and a second element are stacked in this order on a substrate. A repositioning sheet is interposed between the two. When the bonding post formed on the substrate and the bonding pad of the first element and the bonding pad of the second element must be connected to each other, first, the bonding post and the conductor of the rearrangement sheet A metal pattern is connected, and this conductive metal pattern is connected to the bonding pad of the second element. The bonding post and the bonding pad of the first element are wire-bonded as usual. Since the conductive metal pattern can be provided at a desired position on the rearrangement sheet, the bonding of the second element can be performed regardless of the position of the metal wire connecting the bonding pad and the bonding post of the first element. A connection between the pad and the bonding post can be made. For this reason, the rearrangement of the bonding pads of the second element can be easily performed by the rearrangement sheet of the present invention, for example, in the above example. Therefore, the design freedom of the second element can be increased.

  Further, as a usage example of the above-described rearrangement sheet, for example, a case where it is applied to a wafer level CSP is considered. In the wafer level CSP, a rearrangement sheet is provided in an area where a bonding pad is not formed in a semiconductor element having a plurality of bonding pads. And, the conductive metal pattern of the rearrangement sheet is composed of, for example, the same number of rearrangement posts as the bonding pads, the same number of wire connection portions as the bonding pads, and the rewiring that connects the rearrangement posts and the wire connection portions. To do. The wire connection portion can be formed at a position where it can be easily connected to the bonding pad of the rearrangement sheet. Therefore, the bonding pad and the wire connecting portion can be easily connected by wire bonding. In addition, a conductor post is provided on the rearrangement post connected to the wire connection portion by rewiring, and the upper surface of the semiconductor element is sealed so that the upper surface of the conductor post is exposed. Thereby, the bonding pad of the semiconductor device can be easily rearranged on the conductor post exposed from the sealing portion.

  Therefore, the rearrangement of the electrode to the conductive metal pattern can be easily performed by adhering the above-described rearrangement sheet in which the conductive metal pattern is formed at a desired position to the base on which the electrode to be rearranged is provided. be able to.

10: Semiconductor device (MCP)
12,500: Substrate 14,504: First semiconductor element (first element)
16, 508: second semiconductor element (second element)
18: First element formation region 20a: First pad connection post (bonding post)
20b: Post for connecting the second pad (bonding post)
22: first pad 22a: first pad for post connection 24: second pad 24a: second pad for post connection 26, 62, 68, 78: relocation sheet 28, 502: first adhesive 30, 506 : Second adhesive 32: third adhesive 34, 82: insulating sheet 34x, 82x: insulating film 36, 84: conductive metal pattern 36x: first position 36y: second position 38, 88x: base plating Pattern 40, 88y: Conductor metal plating pattern 42: First relay wire 44: Second relay wire 46, 512: First wire 48, 104: Mold resin 50, 80, 516: Sealing part 52: Scribe ring 54: Scribe Tape 56: Push-up mechanism component 58: Push-up pin 60: Collet 64: Element mounting area 66, 70: Insulating adhesive sheet 72: Semiconductor Location (wafer level CSP)
74, 503, 507: Bonding pad 76: Semiconductor element 84x: Cu wiring pattern 86: Relocation post 88: Wire connection portion 90: Rewiring 92: Metal wire (Au wire)
94: Conductor post (stud bump)
96: Metal ball 98: Solder ball 100: Polishing machine 102: Semiconductor wafer 510: Bonding post 514: Second wire

Claims (5)

A semiconductor element having an upper surface on which a plurality of bonding pads are formed;
An insulating sheet bonded to a region other than a region where the plurality of bonding pads of the semiconductor element are formed;
A plurality of conductive metal patterns formed on the insulating sheet and electrically connected to each other by metal wires in a one-to-one correspondence with the plurality of bonding pads;
A plurality of conductor posts formed on the insulating sheet and electrically connected to the plurality of conductor metal patterns in a one-to-one correspondence;
The top surfaces of the plurality of conductor posts are exposed, and the top surface of the semiconductor element, the insulating sheet, the plurality of conductor metal patterns, the metal wires, and the portions other than the top surfaces of the plurality of conductor posts are covered. A semiconductor device comprising a sealing portion for sealing. The semiconductor device according to claim 1,
The plurality of bonding pads are formed in a peripheral region of the insulating sheet on the upper surface of the semiconductor element so as to surround the insulating sheet. The semiconductor device according to claim 2,
The plurality of conductive metal patterns are formed extending from the peripheral side to the central side of the insulating sheet,
The plurality of conductor posts are provided in a one-to-one correspondence on the plurality of conductor metal patterns. The semiconductor device according to claim 1,
Each of the plurality of conductive metal patterns is a conductive metal plating pattern. In the semiconductor device according to any one of claims 1 to 4,
A semiconductor device, wherein a solder ball is provided on each upper surface of the plurality of conductor posts.