JP2010243796A - Pellicle glue removing device and method for the same - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a pellicle glue removing device capable of removing glue that remains after pellicle is removed from a photomask, in a state where a mask pattern is protected, and to provide a method for the device. <P>SOLUTION: The pellicle glue removing device comprises a cover that covers a mask pattern inside the glue that remains in the section of a photomask from which pellicle is removed, means for supplying fluid in the cover, and means for applying cleaning liquid to the glue, and the pellicle glue removing device is configured such that the cleaning liquid does not infiltrate the cover by the fluid pressure. <P>COPYRIGHT: (C)2011,JPO&INPIT

Description

  The present invention relates to a pellicle glue removing apparatus and method for removing glue remaining after removing a pellicle from a photomask.

  A photomask is an original plate for producing an internal circuit of an electronic component by optical transfer, and a circuit pattern is drawn with chromium or the like on a transparent substrate such as quartz glass. This is used when, for example, a wafer coated with a photoresist is exposed in a semiconductor element manufacturing process.

  The pellicle is a dust-proof cover that is attached to the photomask. A protective film is applied to the surface of the frame that surrounds the mask pattern, and sticking to the photomask with adhesive glue allows foreign matter to adhere to the mask pattern. To prevent.

  When using a photomask, the pellicle is removed, but part of the glue remains on the photomask, so it is necessary to clean and completely remove it when reusing the photomask. .

  As described in Patent Document 1, a photomask cleaning method for immersing a photomask in which adhesive material residual traces remain in a cleaning liquid to remove the adhesive material residual traces, and an invention of a cleaning liquid used therefor are also disclosed. Yes.

  However, since the invention described in Patent Document 1 immerses the photomask in which the adhesive material residual trace remains in the cleaning liquid, not only the adhesive material residual trace is removed but also the mask pattern may be damaged by the cleaning liquid. .

  Accordingly, an object of the present invention is to provide a pellicle / glue removing apparatus and method that can remove the glue remaining after the pellicle is removed from the photomask while the mask pattern is protected.

  In order to solve the above problems, the present invention provides a cover for covering a mask pattern on the inside of a glue remaining on a pellicle mark of a photomask, a means for feeding fluid into the cover, and applying a cleaning liquid to the glue. The pellicle glue removing device is configured such that the cleaning liquid does not enter the cover due to fluid pressure.

  In the present invention, the cover is covered on the mask pattern and the fluid is continuously fed, and the intrusion of the cleaning liquid by the fluid pressure is prevented, so that the glue remaining on the photomask can be removed without damaging the mask pattern.

It is a figure which shows the photomask used as the washing | cleaning target of this invention. It is a figure which shows the state which peeled off the pellicle from the photomask used as the washing | cleaning object of this invention. 1 is a perspective view of a pellicle glue removing apparatus according to Embodiment 1 of the present invention. FIG. It is a figure which shows the condition which removes a glue with the removal apparatus of the pellicle glue based on Example 1 of this invention. It is sectional drawing of the removal apparatus of the pellicle glue which concerns on Example 1 of this invention. It is a perspective view of the removal apparatus of the pellicle glue which concerns on Example 2 of this invention. It is sectional drawing of the removal apparatus of the pellicle glue which concerns on Example 2 of this invention. It is a top view of the removal apparatus of the pellicle glue which concerns on Example 3 of this invention. It is a front view of the removal apparatus of the pellicle glue which concerns on Example 3 of this invention. It is a side view of the removal apparatus of the pellicle glue which concerns on Example 3 of this invention.

  In the present invention, the pellicle / glue removing apparatus according to the first embodiment includes a cover that covers the inside of the glue remaining on the pellicle mark of the photomask so as to cover the mask pattern, a means for feeding fluid into the cover, and the glue In this case, the cleaning liquid does not enter the cover due to fluid pressure.

  Further, the pellicle / glue removing apparatus according to the second embodiment is characterized in that the cover of the pellicle / glue removing apparatus according to the first embodiment is doubled, and the cleaning liquid is caused to flow through the gap to be guided to the glue.

  The pellicle / glue removing apparatus according to the third embodiment is characterized in that the pellicle / glue removing apparatus according to the first embodiment includes a brush for scrubbing the glue while applying the cleaning liquid.

  Further, the pellicle / glue removal method uses a pellicle / glue removal apparatus according to any one of the first to third embodiments to remove the glue remaining on the pellicle mark of the photomask from the cleaning liquid by fluid pressure. The mask pattern is protected.

  FIG. 1 is a view showing a photomask to be cleaned according to the present invention. FIG. 2 is a view showing a state in which the pellicle is peeled off from the photomask to be cleaned according to the present invention.

  A pellicle 3 for protecting the mask pattern 2a is attached to the surface of the photomask 2 on which the mask pattern 2a is formed. The pellicle 3 is a frame 3 a with a protective film 3 b stretched, and is adhered to the photomask 2 with glue 4.

  When the pellicle 3 is peeled off from the photomask 2, the glue 4 remains around the mask pattern 2 a and at the bonding position of the frame 3 a, so the glue 4 on the photomask 2 is removed using a cleaning solution 5 or the like.

  The glue 4 is a thermoplastic adhesive material and becomes soft when heat is applied. By warming the photomask 2 and cooling the pellicle 3, the glue 4 remaining on the pellicle 3 side can be increased and the glue 4 remaining on the photomask 2 side can be decreased.

  FIG. 3 is a perspective view of the pellicle glue removing apparatus according to Embodiment 1 of the present invention. FIG. 4 is a diagram illustrating a situation in which the glue is removed by the pellicle / glue removal apparatus according to the first embodiment of the present invention. FIG. 5 is a cross-sectional view of the pellicle glue removing apparatus according to Embodiment 1 of the present invention.

  The photomask 2 from which the pellicle 3 has been removed has the mask pattern 2a formed on it, the surface to which the glue 4 is attached facing upward, and the four corners are fixed horizontally with a holder 9, etc. A glue removing device 1 is installed.

  The pellicle / glue removal apparatus 1 includes a cover 6 and a tube 8. The cover 6 is provided with a fluid inlet 7 as a means for sending a fluid 7 a into the cover 6, and the cleaning liquid 5 is applied to the glue 4 in the tube 8. A plurality of jet outlets 8a are provided as means.

  The cover 6 is formed by molding a resin or the like into a box shape with an open bottom surface, and covers the mask pattern 2 a on the inside of the glue 4 remaining on the pellicle 3 trace of the photomask 2. A pipe for supplying the fluid 7 a can be attached to the fluid inlet 7 formed in the upper surface and can be injected into the cover 6.

  Note that the edge of the lower surface of the cover 6 is maintained so as to be between the mask pattern 2a and the glue 4 in all four directions. Further, the cover 6 does not need to be in close contact by simply being placed on the photomask 2, and may be present if it is a slight gap.

  The tube 8 is a tube through which the cleaning liquid 5 flows, and is attached horizontally to the side surface of the cover 6. A plurality of outlets 8a for discharging the cleaning liquid 5 downward are opened, a pipe for supplying the cleaning liquid 5 is connected to one end, and a pipe for discharging the extra cleaning liquid 5 is connected to the other end.

  3 and 4, the tube 8 is installed on only one of the side surfaces of the cover 6. However, since the glue 4 is attached so as to surround the outside of the cover 6, the tube 8 is attached to each side surface. You may install and you may arrange | position so that a side may go around.

  In a state in which the fluid 7 a is injected from the fluid inlet 7 and filled in the cover 6, the cleaning liquid 5 is caused to flow through the tube 8 and sprayed to the glue 4 on the photomask 2 from the outlet 8 a. The peeled glue 4 is flowed out of the photomask 2 together with the cleaning liquid 5.

  If the injection of the fluid 7a is continued, the fluid 7a in the cover 6 leaks out from the gap between the edges, so that the cleaning liquid 5 is pushed away by the fluid pressure. A pressure necessary to prevent the cleaning liquid 5 applied to the glue 4 from entering the cover 6 is applied to the fluid 7a.

  Since the fluid 7a is in contact with the mask pattern 2a of the photomask 2, it may be used as long as it does not damage the mask pattern 2a. A liquid such as pure water can be used in addition to a gas such as nitrogen or clean air.

  A sulfuric acid-based liquid or the like is used for the cleaning liquid 5, but xylene or toluene may be effective depending on the components of the glue 4. That is, the one that can remove the glue 4 as cleanly as possible is used.

  Since there is no possibility of the cleaning liquid 5 coming into contact with the mask pattern 2a, the cleaning liquid 5 that can effectively remove the glue 4 can be used regardless of whether or not the mask pattern 2a is damaged.

  FIG. 6 is a perspective view of a pellicle glue removing apparatus according to Embodiment 2 of the present invention. FIG. 7 is a cross-sectional view of a pellicle glue removing apparatus according to Embodiment 2 of the present invention.

  The pellicle / glue removal apparatus 1a includes a cover 6 and a cover 10 and the like. The cover 6 is provided with a fluid inlet 7 as a means for sending a fluid 7a into the cover 6, and the cover 10 is supplied with a cleaning solution 5 on the glue 4. A liquid inlet 10a and a liquid outlet 10b are provided as means.

  The cover 10 has a shape that is slightly larger than the cover 6, and secures a gap between the cover 6 and the cover 10 when the cover 10 is put on the cover 6. In addition, since the center of the upper surface is made open so that the fluid inlet 7 of the cover 6 is taken out, a gap is formed from the upper surface end to the side surface.

  On the upper surface of the cover 10, a liquid inlet 10a for sending the cleaning liquid 5 to the gap is opened, and a pipe for supplying the cleaning liquid 5 is connected. A plurality of liquid inlets 10a may be provided. Further, the edge of the lower surface of the cover 10 is made higher than the edge of the cover 6, and the liquid discharge port 10b is opened as an outlet of the gap.

  Since the edge of the cover 6 is placed inside the glue 4, the cleaning liquid 5 flowing through the gap is applied to the glue 4 and flows out of the photomask 2 from the liquid discharge port 10 b together with the peeled glue 4.

  By adopting a double structure of the cover 6 and the cover 10, the flow path of the cleaning liquid 5 can be formed in the gap between them, and the cleaning liquid 5 can be grouped by molding the same material without arranging the tube 8 or the like. It becomes possible to guide to the position of 4.

  FIG. 8 is a plan view of a pellicle glue removing apparatus according to Embodiment 3 of the present invention. FIG. 9 is a front view of a pellicle glue removing apparatus according to Embodiment 3 of the present invention. FIG. 10 is a side view of a pellicle glue removing apparatus according to Embodiment 3 of the present invention.

  The pellicle / glue removal apparatus 1b includes means for scrubbing with the brush 14 or the brush 14a while applying the cleaning liquid 5. The brush 14 and the brush 14a are moved along the glue 4 using a driving device such as an actuator.

  First, since the cleaning liquid 5 applied to the glue 4 flows out of the photomask 2, a container 17 for temporarily storing the used cleaning liquid 5 is prepared, and a drain 17b for discharging the stored cleaning liquid 5 is also attached.

  A stage 17a for placing the photomask 2 in the container 17 is installed, and the photomask 2 is placed horizontally with the mask pattern 2a facing upward while being lifted from the stage 17a using the holder 9.

  The cover 6 that covers the photomask 2 is suspended from the support base 16 via the lifting shaft 16a and is held above the photomask 2 in a state that it can be vertically moved up and down by the lifting shaft 16a.

  Since the lifting shaft 16 a extends upward from the center of the upper surface of the cover 6, the fluid inlets 7 are opened at the four corners of the upper surface of the cover 6, and pipes for supplying the fluid 7 a into the cover 6 are connected to the fluid inlets 7. .

  A rail 12, rail 12a, rail 12b, and rail 12c are laid on the outside of the container 17 along the side wall of the container 17, and the rail 12 has a transfer table 11, the rail 12a has a transfer table 11a, and the rail 12b has a transfer table. A transfer table 11c is installed on the rail 11c and the rail 12c.

  That is, the transfer table 11 can slide on the rail 12, the transfer table 11a can slide on the rail 12a, the transfer table 11b can slide on the rail 12b, and the transfer table 11c. Can slide on the rail 12c.

  A slide arm 13 that can move in the vertical direction extends horizontally from the transfer table 11 and the transfer table 11b, and a slide arm 13a that can move in the vertical direction from the transfer table 11a and the transfer table 11c. Extends horizontally.

  A brush 14 is provided at the tip of the slide arm 13 and nozzles 15 on both sides thereof, and the cleaning liquid 5 is sprayed from the nozzles 15 on both sides toward the central brush 14. The brush 14 has a size that can clean the glue 4.

  A brush 14 and a brush 14a are provided at the tip of the slide arm 13a, and nozzles 15 are provided on both sides of the brush 14 and both sides of the brush 14a. The brush 14a has a large size that can clean the vicinity of the end of the photomask 2 including the glue 4.

  A motor is provided on the upper part of the brush 14, and the brush 14 can be rotated electrically. Similarly, a motor is provided on the upper part of the brush 14a, and the brush 14a can be rotated electrically. Each nozzle 15 is connected to a pipe for supplying the cleaning liquid 5.

  When cleaning is started, the cover 6 is lowered by the elevating shaft 16a, is put on the photomask 2 so as to cover the mask pattern 2a, and the fluid 7a is supplied from the fluid inlet 7 to fill the cover 6.

  The glue 4 can be washed by adjusting the height of the brush 14 or the brush 14a with the slide arm 13 or the slide arm 13a and horizontally moving the transfer bases 11 to 11c along the rails 12 to 12c.

  Although the four glues 4 can be removed by the transfer tables 11 to 11c, the slide arm 13 and the slide arm 13a may cross each other, so the transfer tables 11 and 11b and the transfer tables 11a and 11c have different heights. It is desirable to be able to dive.

  In place of the means for scrubbing with the brushes 14 and 14a while applying the cleaning solution 5, the glue 4 is peeled off by irradiating a laser, the glue 4 dissolved with the cleaning solution 5 is wiped off with a cloth, or the glue 4 is scraped off with water pressure. It is also possible to adopt means for dropping.

  Examples of lasers used include YAG (yttrium, aluminum, garnet) solid laser, CO2 (carbon dioxide) gas laser, KrF (krypton fluoride) gas laser, ArF (argon fluoride) gas laser, and semiconductor laser. .

  In the method using the pellicle / glue removing apparatus according to any one of the first to third embodiments, the mask pattern can be protected from the cleaning liquid by the fluid pressure when removing the glue remaining on the pellicle mark of the photomask.

DESCRIPTION OF SYMBOLS 1 Pellicle glue removal apparatus 1a Pellicle glue removal apparatus 1b Pellicle glue removal apparatus 2 Photomask 2a Mask pattern 3 Pellicle 3a Frame 3b Protective film 4 Glue 5 Cleaning liquid 6 Cover 7 Fluid inlet 7a Fluid 8 Tube 8a Jet Exit 9 Holder 10 Cover 10a Liquid inlet 10b Liquid outlet 11 Transfer base 11a Transfer base 11b Transfer base 11c Transfer base 12 Rail 12a Rail 12b Rail 12c Rail 13 Slide arm 13a Slide arm 14 Brush 14a Brush 15 Nozzle 16 Support base 16a Elevating shaft 17 Container 17a Stage 17b Drain

JP 2002-131890 A

Claims (4)

  A cover that covers the inner surface of the glue remaining on the pellicle mark of the photomask so as to cover the mask pattern, a means for sending a fluid into the cover, and a means for applying a cleaning liquid to the glue. For removing pellicle glue, characterized in that it does not penetrate.   2. The pellicle glue removing apparatus according to claim 1, wherein the cover is doubled and the cleaning liquid is introduced into the gap to guide the glue to the glue.   2. The pellicle glue removing apparatus according to claim 1, further comprising a brush for scraping off the glue while applying the cleaning liquid.   The pellicle / glue removing device according to any one of claims 1 to 3, wherein when the glue remaining on the pellicle mark of the photomask is removed, the mask pattern is protected from the cleaning liquid by fluid pressure. A method for removing pellicle glue.

Images