[go: up one dir, main page]
More Web Proxy on the site http://driver.im/

JP2008130738A - Solid-state imaging element - Google Patents

Solid-state imaging element Download PDF

Info

Publication number
JP2008130738A
JP2008130738A JP2006312787A JP2006312787A JP2008130738A JP 2008130738 A JP2008130738 A JP 2008130738A JP 2006312787 A JP2006312787 A JP 2006312787A JP 2006312787 A JP2006312787 A JP 2006312787A JP 2008130738 A JP2008130738 A JP 2008130738A
Authority
JP
Japan
Prior art keywords
image sensor
case
sensor chip
light receiving
solid
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2006312787A
Other languages
Japanese (ja)
Inventor
Eiji Watanabe
英治 渡辺
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Corp
Original Assignee
Fujifilm Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujifilm Corp filed Critical Fujifilm Corp
Priority to JP2006312787A priority Critical patent/JP2008130738A/en
Publication of JP2008130738A publication Critical patent/JP2008130738A/en
Pending legal-status Critical Current

Links

Images

Landscapes

  • Solid State Image Pick-Up Elements (AREA)
  • Transforming Light Signals Into Electric Signals (AREA)

Abstract

<P>PROBLEM TO BE SOLVED: To improve sealing property and heat dissipation of a solid-state imaging element of a WLCSP type. <P>SOLUTION: An imaging element main body 12 stored in a case 13 is provided with an image sensor chip 16 where a light receiving part 15 is arranged, a spacer 17 fitted onto the image sensor chip 16 so that it surrounds the light receiving part 15 and cover glass 18 which is fitted on the spacer and seals the light receiving part 15. A bonding pad 21 is disposed between the image sensor chip 16 and the spacer 17. Through wiring 22 passing through the image sensor chip 16 and reaching a lower face is installed below the pad. A solder bump 24 is arranged in a position corresponding to a through wiring 22 on a lower face of the image sensor chip 16. The solder bump 24 is electrically connected to the through wiring 29 passing through the case 13 and is connected to an outer side of the lower face. A gap caused in a recess is filled with filling resin 31 and the gap is blocked. <P>COPYRIGHT: (C)2008,JPO&INPIT

Description

本発明は、ウエハレベルチップサイズパッケージ(WLCSP;wafer level chip size package)タイプの固体撮像素子に関する。   The present invention relates to a wafer level chip size package (WLCSP) type solid-state imaging device.

CCDやCMOS等の固体撮像素子を使用したデジタルカメラやビデオカメラが普及している。従来の固体撮像素子は、シリコン製のチップ上に受光部が設けられたイメージセンサチップと、このイメージセンサチップを収納するセラミックス製やプラスチック製のケースと、このケースを封止する透明なカバーガラスとからなる。ケースに収納されたイメージセンサチップは、チップ上に設けられた電極パッドとケースの接続端子との間でワイヤボンディングによって電気的に接続され、ケースの外部接続端子が実装基板に実装されることによって回路に接続される。   Digital cameras and video cameras using solid-state imaging devices such as CCDs and CMOSs have become widespread. A conventional solid-state imaging device includes an image sensor chip in which a light receiving unit is provided on a silicon chip, a ceramic or plastic case that houses the image sensor chip, and a transparent cover glass that seals the case It consists of. The image sensor chip housed in the case is electrically connected by wire bonding between the electrode pad provided on the chip and the connection terminal of the case, and the external connection terminal of the case is mounted on the mounting substrate. Connected to the circuit.

固体撮像素子は、携帯電話機や内視鏡用カメラなどの小型電子機器にも用いられているが、固体撮像素子のサイズがその外形製図に与える影響が大きいため、固体撮像素子の小型化が望まれていた。固体撮像素子を小型化するために、WLCSPを利用した固体撮像素子が発明されている(例えば、特許文献1,2参照)。   Solid-state image sensors are also used in small electronic devices such as mobile phones and endoscope cameras. However, the size of the solid-state image sensor has a large effect on the outline drawing, so it is hoped that the solid-state image sensor will be downsized. It was rare. In order to reduce the size of the solid-state imaging device, a solid-state imaging device using WLCSP has been invented (see, for example, Patent Documents 1 and 2).

WLCSPは、半導体ウエハプロセス中でパッケージングまで行うパッケージング手法である。WLCSPを使用して製造された固体撮像素子は、例えば、外部接続端子が設けられたイメージセンサチップと、このイメージセンサチップに取り付けられて受光部を封止するカバーガラスとからなり、そのサイズはベアチップと同程度となるため、ケースを利用したものと比べ、大幅な小型化が可能となる。
特開2004−031498号公報 特開2004−363380号公報
WLCSP is a packaging method for performing packaging up to a semiconductor wafer process. A solid-state imaging device manufactured using WLCSP includes, for example, an image sensor chip provided with external connection terminals and a cover glass that is attached to the image sensor chip and seals a light receiving unit. Since it is about the same as a bare chip, it can be significantly reduced in size compared to a case using a case.
JP 2004-031498 A JP 2004-363380 A

従来の固体撮像素子において、チップを収納するケースは、受光部の封止性を保つ役割を有していた。しかしながら、特許文献1に記載のWLCSPタイプの固体撮像素子はケースを備えていないので、封止性が若干損なわれており、耐湿面に問題がある。   In the conventional solid-state imaging device, the case for housing the chip has a role of maintaining the sealing performance of the light receiving unit. However, since the WLCSP type solid-state imaging device described in Patent Document 1 does not include a case, the sealing performance is slightly impaired, and there is a problem in the moisture-resistant surface.

特許文献2に記載のWLCSPタイプの固体撮像素子は、側面を樹脂で覆うことで、ある程度の封止性を保っている。しかしながら、ケースを備えておらず、封止性が十分であるともいえない。また、ウエハレベルでの封止工程の前に別途ダイシング工程が組み込まれるなど、製造工程が複雑化している。   The WLCSP type solid-state imaging device described in Patent Document 2 maintains a certain degree of sealing performance by covering the side surface with resin. However, it does not have a case and cannot be said to have sufficient sealing performance. Further, the manufacturing process is complicated, for example, a dicing process is separately incorporated before the sealing process at the wafer level.

また、メモリの大記憶容量化やロジックの多機能・高集積化に伴い消費電力が増加し、チップの発熱による温度上昇が問題となっている。チップを一定の温度以下に保たなければ、固体撮像素子は正常に動作しないからである。従来の固体撮像素子の場合、ケースに熱を移動させてチップ自体の温度上昇を軽減していた。しかしながら、特許文献1,2に記載のWLCSPタイプの固体撮像素子の場合、ケースを備えていないので、放熱が十分に行えず高温になるという問題がある。   In addition, as the memory capacity increases and the logic functions and integration increases, power consumption increases, and a rise in temperature due to heat generated by the chip is a problem. This is because the solid-state imaging device does not operate normally unless the chip is kept below a certain temperature. In the case of a conventional solid-state imaging device, heat is transferred to the case to reduce the temperature rise of the chip itself. However, in the case of the WLCSP type solid-state imaging device described in Patent Documents 1 and 2, since the case is not provided, there is a problem that heat radiation cannot be performed sufficiently and the temperature becomes high.

本発明は、上記課題を解決するためのものであり、WLCSPタイプの固体撮像素子の封止性及び放熱性を向上させることを目的とする。   SUMMARY An advantage of some aspects of the invention is to improve the sealing performance and heat dissipation of a WLCSP type solid-state imaging device.

上記目的を達成するために、本発明の固体撮像素子は、表面に受光部が設けられたチップと、受光部を取り囲むようにチップ上に設けられたスペーサと、スペーサ上に設けられ受光部を覆う透明なカバーと、チップの裏面に凸設された第1電気接続部と、からなる撮像素子本体と、撮像素子本体を収納する凹部が形成され、凹部には、収納した撮像素子の第1電気接続部と電気的に接続する第2電気接続部が設けられた、絶縁性のケースと、から構成され、撮像素子本体を収納した凹部に生じる隙間が樹脂によって塞がれていることを特徴とする。   In order to achieve the above object, a solid-state imaging device according to the present invention includes a chip provided with a light receiving portion on a surface, a spacer provided on the chip so as to surround the light receiving portion, and a light receiving portion provided on the spacer. An image pickup device body including a transparent cover to cover and a first electrical connection portion protruding from the back surface of the chip, and a recess for storing the image pickup device body are formed, and the first of the stored image pickup device is formed in the recess. An insulating case provided with a second electrical connection portion that is electrically connected to the electrical connection portion, and a gap generated in a recess housing the image sensor body is blocked by a resin And

なお、ケースは、セラミックス等の熱伝導率の高い物質からなることが好ましい。   The case is preferably made of a material having high thermal conductivity such as ceramics.

本発明の固体撮像素子によれば、受光部を有した撮像素子本体がケースの凹部に収納され、凹部に生じる隙間が樹脂によって塞がれていることより、封止性及び放熱性を向上させることができる。   According to the solid-state image pickup device of the present invention, the image pickup device body having the light receiving portion is housed in the recess of the case, and the gap generated in the recess is blocked by the resin, thereby improving the sealing performance and heat dissipation. be able to.

以下、本発明の固体撮像素子11について、図面を参照しながら説明する。固体撮像素子11は、図1に示すように、撮像素子本体12と、ケース13とから構成される。   Hereinafter, the solid-state imaging device 11 of the present invention will be described with reference to the drawings. As shown in FIG. 1, the solid-state image sensor 11 includes an image sensor body 12 and a case 13.

撮像素子本体12は、図2(A)及び図2(B)に示すように、ウエハレベルで製造された撮像素子基板14を矩形状に分割したものであり、上面中心に受光部15が設けられたイメージセンサチップ16と、受光部15を取り囲むようにイメージセンサチップ16上に取り付けられた矩形枠のスペーサ17と、このスペーサ17上に取り付けられて受光部15を封止するカバーガラス18とからなる。但し、撮像素子本体は、WLCSPタイプであれば良く、ここに挙げる実施形態(撮像素子本体12)に限定されるものではない。   As shown in FIGS. 2A and 2B, the image sensor body 12 is obtained by dividing the image sensor substrate 14 manufactured at the wafer level into a rectangular shape, and a light receiving portion 15 is provided at the center of the upper surface. An image sensor chip 16, a rectangular frame spacer 17 mounted on the image sensor chip 16 so as to surround the light receiving unit 15, and a cover glass 18 mounted on the spacer 17 and sealing the light receiving unit 15. Consists of. However, the image pickup device body may be a WLCSP type, and is not limited to the embodiment (image pickup device body 12) described here.

受光部15は、例えば、マトリクス状に配列された多数のフォトダイオードであり、フォトダイオードに蓄積された電荷を搬送する電荷結合素子(CCD)などと併せて、周知の半導体プロセスによってイメージセンサチップ16の上面に設けられている。各フォトダイオードの上には、RGBのカラーフィルタやマイクロレンズアレイ15aが積層されている。   The light receiving unit 15 is, for example, a large number of photodiodes arranged in a matrix, and together with a charge coupled device (CCD) that transports charges accumulated in the photodiodes, the image sensor chip 16 is formed by a known semiconductor process. Is provided on the upper surface of the. An RGB color filter and a microlens array 15a are stacked on each photodiode.

イメージセンサチップ16は、積層構造であるが、大きく二つに分けることができる。上層は受光部15が設けられたシリコン層19であり、下層は絶縁材料からなる絶縁層20である。絶縁層20は、シリコン層19の強度を補う効果もある。   The image sensor chip 16 has a laminated structure, but can be roughly divided into two. The upper layer is a silicon layer 19 provided with a light receiving portion 15, and the lower layer is an insulating layer 20 made of an insulating material. The insulating layer 20 also has an effect of supplementing the strength of the silicon layer 19.

イメージセンサチップ16とスペーサ17との間には、例えば、アルミニウムによって形成され、受光部15に電気的に接続された複数個のボンディングパッド21が設けられている。各ボンディングパッド21の下には、ボンディングパッド21と電気的に接続され、且つイメージセンサチップ16を貫通して下面まで達する貫通配線22が設けられている。イメージセンサチップ16と貫通配線22との間には、両者の間を絶縁する絶縁膜23が設けられている。イメージセンサチップ16の下面には、貫通配線22に対応する位置に、半球形状の半田バンプ(第1電気接続部)24が複数個設けられている。   Between the image sensor chip 16 and the spacer 17, for example, a plurality of bonding pads 21 formed of aluminum and electrically connected to the light receiving unit 15 are provided. Under each bonding pad 21, a through wiring 22 that is electrically connected to the bonding pad 21 and penetrates the image sensor chip 16 to reach the lower surface is provided. An insulating film 23 is provided between the image sensor chip 16 and the through wiring 22 to insulate between the two. A plurality of hemispherical solder bumps (first electrical connection portions) 24 are provided on the lower surface of the image sensor chip 16 at positions corresponding to the through wirings 22.

スペーサ17は、中央に矩形の開口25が形成された矩形枠であり、受光部15の外周を取り囲むようにイメージセンサチップ16の上面に接着剤26によって接合されている。スペーサ17は、例えば、シリコンなどの無機材料で形成されている。このスペーサ17によって、受光部15とカバーガラス18との間には空隙が形成され、マイクロレンズアレイ15aがカバーガラス18と干渉するのを防いでいる。   The spacer 17 is a rectangular frame in which a rectangular opening 25 is formed in the center, and is bonded to the upper surface of the image sensor chip 16 by an adhesive 26 so as to surround the outer periphery of the light receiving unit 15. The spacer 17 is made of an inorganic material such as silicon. The spacer 17 forms a gap between the light receiving unit 15 and the cover glass 18, thereby preventing the microlens array 15 a from interfering with the cover glass 18.

カバーガラス18は、開口25を塞ぐようにスペーサ17の上面に接着剤27によって接合されている。   The cover glass 18 is bonded to the upper surface of the spacer 17 with an adhesive 27 so as to close the opening 25.

ケース13は、樹脂でできており、図3に示すように、撮像素子本体12と略同じサイズ或いは一回り大きなサイズであって矩形状の凹部28が形成されている。凹部28には、撮像素子本体12がイメージセンサチップ16の下面側から収納される。ケース13の底には、収納する撮像素子本体12の半田バンプ24と対応する位置に、ケース13を貫通して下面外側に繋がる金属製の貫通配線(第2電気接続部)29が設けられている。貫通配線29は、凹部28に収納した撮像素子本体12の半田バンプ24と電気的に接続される。ケース13の下面には、貫通配線29に対応する位置に、金属製の接続端子30が複数個設けられている。   The case 13 is made of resin, and as shown in FIG. 3, a rectangular recess 28 is formed that is substantially the same size as the image pickup device body 12 or a size that is slightly larger. The image sensor body 12 is housed in the recess 28 from the lower surface side of the image sensor chip 16. At the bottom of the case 13, a metal penetrating wiring (second electrical connection portion) 29 that penetrates the case 13 and connects to the outside of the lower surface is provided at a position corresponding to the solder bump 24 of the image pickup device body 12 to be accommodated. Yes. The through wiring 29 is electrically connected to the solder bump 24 of the image pickup device body 12 housed in the recess 28. A plurality of metal connection terminals 30 are provided on the lower surface of the case 13 at positions corresponding to the through wirings 29.

図1に示すように、撮像素子本体12を収納した凹部28に生じる隙間には填塞樹脂31が注入され、隙間は塞がれている。填塞樹脂31は接着剤としても機能し、撮像素子本体12を凹部28に固定する。なお、填塞樹脂31は、常温硬化型でも熱硬化型でも構わない。填塞樹脂31により、撮像素子本体12は側面が覆われることとなり、封止性が向上する。また、撮像素子本体12がケース13に収納されており、イメージセンサチップ16(撮像素子本体12)が発する熱はケース13に移動できるので、イメージセンサチップ16自体の温度上昇を低減することができる。   As shown in FIG. 1, a filling resin 31 is injected into a gap generated in the recess 28 in which the image pickup device body 12 is housed, and the gap is closed. The filling resin 31 also functions as an adhesive, and fixes the imaging element body 12 to the recess 28. The filling resin 31 may be a room temperature curing type or a thermosetting type. The side surface of the image pickup device body 12 is covered with the filling resin 31, and the sealing performance is improved. In addition, since the image sensor main body 12 is accommodated in the case 13 and the heat generated by the image sensor chip 16 (image sensor main body 12) can move to the case 13, the temperature rise of the image sensor chip 16 itself can be reduced. .

なお、上記実施形態において、イメージセンサチップ16の下面に設けられた外部接続端子として、半球形状の半田バンプ24の場合を例に説明したが、これに限定されるのではなく、例えば、異方性導電膜、異方性導電ペーストなどであっても良い。但し、イメージセンサチップ16の下面から突出していることが条件となる。   In the above-described embodiment, the case of the hemispherical solder bump 24 as the external connection terminal provided on the lower surface of the image sensor chip 16 has been described as an example. However, the present invention is not limited to this. An electrically conductive film, an anisotropic conductive paste, or the like may be used. However, the condition is that it protrudes from the lower surface of the image sensor chip 16.

また、上記実施形態において、ケース13の材質は、樹脂である場合を例に説明したが、これに限定されるのではなく、セラミックス、その他の電気絶縁性物質であっても良い。ケース13の材質がセラミックスの場合、貫通配線29及び接続端子30は、例えば、タングステン(W)をニッケル(Ni)及び金(Au)でメッキしたものであることが望ましい。なお、ケース13の材質が熱伝導率の高い物質であっても良い。ケース13の材質が熱伝導率の高い物質であれば、固体撮像素子11は更に放熱性に優れる。   In the above embodiment, the case 13 is made of resin as an example. However, the case 13 is not limited to this, and may be ceramics or other electrically insulating materials. When the material of the case 13 is ceramic, it is desirable that the through wiring 29 and the connection terminal 30 are, for example, those obtained by plating tungsten (W) with nickel (Ni) and gold (Au). Note that the material of the case 13 may be a substance having high thermal conductivity. If the material of the case 13 is a substance having a high thermal conductivity, the solid-state imaging device 11 is further excellent in heat dissipation.

また、上記実施形態において、ケース13の底に、凹部28の内側から下面外側に繋がる貫通配線29が設けられている場合を例に説明したが、貫通配線29は、下面外側に繋がっていることに限定されるのではない。例えば、図4に示す固体撮像素子32を構成するケース33の場合が考えられる。ケース33の底には、収納する撮像素子本体12の半田バンプ24と対応する位置に、ケース33を貫通して側面外側に繋がる金属製の貫通配線(第2電気接続部)34が設けられている。貫通配線34は、凹部28に収納した撮像素子本体12の半田バンプ24と電気的に接続される。ケース33の側面には、貫通配線34に対応する位置に、接続端子35が複数個設けられている。   Moreover, in the said embodiment, although the case where the penetration wiring 29 connected to the bottom surface outer side from the inner side of the recessed part 28 was provided in the bottom of the case 13 was demonstrated to the example, the penetration wiring 29 is connected to the lower surface outer side. It is not limited to. For example, the case 33 that constitutes the solid-state imaging device 32 shown in FIG. 4 can be considered. At the bottom of the case 33, a metal through-wiring (second electrical connection portion) 34 that penetrates the case 33 and is connected to the outside of the side surface is provided at a position corresponding to the solder bump 24 of the image pickup device main body 12 to be stored. Yes. The through wiring 34 is electrically connected to the solder bump 24 of the image pickup device body 12 housed in the recess 28. A plurality of connection terminals 35 are provided on the side surface of the case 33 at positions corresponding to the through wirings 34.

固体撮像素子の横断面図である。It is a cross-sectional view of a solid-state image sensor. (A)撮像素子基板の横断面図である。(B)撮像素子本体の横断面図である。(A) It is a cross-sectional view of an image pick-up element board | substrate. (B) It is a cross-sectional view of an image pick-up element main body. 撮像素子本体とケースとの横断面図である。It is a cross-sectional view of an image sensor main body and a case. 別の形態の固体撮像素子の横断面図である。It is a cross-sectional view of the solid-state image sensor of another form.

符号の説明Explanation of symbols

11,32 固体撮像素子
12 撮像素子本体
13,33 ケース
14 撮像素子基板
15 受光部
15a マイクロレンズアレイ
16 イメージセンサチップ
17 スペーサ
18 カバーガラス
19 シリコン層
20 絶縁層
21 ボンディングパッド
22 貫通配線
23 絶縁膜
24 半田バンプ(第1電気接続部)
25 開口
26,27 接着剤
28 凹部
29,34 貫通配線(第2電気接続部)
30,35 接続端子
31 填塞樹脂
DESCRIPTION OF SYMBOLS 11, 32 Solid-state image sensor 12 Image sensor main body 13, 33 Case 14 Image sensor board | substrate 15 Light-receiving part 15a Micro lens array 16 Image sensor chip 17 Spacer 18 Cover glass 19 Silicon layer 20 Insulating layer 21 Bonding pad 22 Through-hole wiring 23 Insulating film 24 Solder bump (first electrical connection part)
25 Openings 26, 27 Adhesive 28 Recesses 29, 34 Through-wiring (second electrical connection part)
30, 35 Connection terminal 31 Filling resin

Claims (2)

表面に受光部が設けられたチップと、前記受光部を取り囲むように前記チップ上に設けられたスペーサと、前記スペーサ上に設けられ前記受光部を覆う透明なカバーと、前記チップの裏面に凸設された第1電気接続部と、からなる撮像素子本体と、
前記撮像素子本体を収納する凹部が形成され、前記凹部には、収納した前記撮像素子の前記第1電気接続部と電気的に接続する第2電気接続部が設けられた、絶縁性のケースと、から構成され、
前記撮像素子本体を収納した前記凹部に生じる隙間が樹脂によって塞がれていることを特徴とする固体撮像素子。
A chip provided with a light receiving part on the front surface, a spacer provided on the chip so as to surround the light receiving part, a transparent cover provided on the spacer and covering the light receiving part, and a back surface of the chip An image pickup device body comprising: a first electrical connection portion provided;
An insulative case in which a recess for housing the image sensor body is formed, and the second electrical connection portion electrically connected to the first electrical connection portion of the housed image sensor is provided in the recess. Consists of
A solid-state image pickup device, wherein a gap generated in the recess containing the image pickup device main body is closed by a resin.
前記ケースは、セラミックスであることを特徴とする請求項1記載の固体撮像素子。   The solid-state image pickup device according to claim 1, wherein the case is made of ceramics.
JP2006312787A 2006-11-20 2006-11-20 Solid-state imaging element Pending JP2008130738A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2006312787A JP2008130738A (en) 2006-11-20 2006-11-20 Solid-state imaging element

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2006312787A JP2008130738A (en) 2006-11-20 2006-11-20 Solid-state imaging element

Publications (1)

Publication Number Publication Date
JP2008130738A true JP2008130738A (en) 2008-06-05

Family

ID=39556289

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2006312787A Pending JP2008130738A (en) 2006-11-20 2006-11-20 Solid-state imaging element

Country Status (1)

Country Link
JP (1) JP2008130738A (en)

Cited By (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2013197501A (en) * 2012-03-22 2013-09-30 Hoya Corp Semiconductor package
WO2013179764A1 (en) * 2012-05-30 2013-12-05 オリンパス株式会社 Method for manufacturing imaging device and method for manufacturing semiconductor device
WO2013179767A1 (en) * 2012-05-30 2013-12-05 オリンパス株式会社 Method of manufacturing image pickup device and method of manufacturing semiconductor device
WO2013179765A1 (en) * 2012-05-30 2013-12-05 オリンパス株式会社 Imaging device manufacturing method and semiconductor device manufacturing method
WO2013179766A1 (en) * 2012-05-30 2013-12-05 オリンパス株式会社 Imaging device, semiconductor device, and imaging unit
WO2014174994A1 (en) * 2013-04-26 2014-10-30 オリンパス株式会社 Image pickup apparatus
JP2014216554A (en) * 2013-04-26 2014-11-17 オリンパス株式会社 Imaging device
JP2014216930A (en) * 2013-04-26 2014-11-17 オリンパス株式会社 Imaging device
US9044135B2 (en) 2011-06-16 2015-06-02 Kabushiki Kaisha Toshiba Endoscope apparatus and electronic apparatus
JP2016011836A (en) * 2014-06-27 2016-01-21 パナソニックIpマネジメント株式会社 Preparation component set, preparation, method for manufacturing preparation, image photographing device, and image photographing method
WO2016152431A1 (en) * 2015-03-24 2016-09-29 ソニー株式会社 Solid-state image capture device, method for manufacturing solid-state image capture device, and electronic equipment
JP2016197731A (en) * 2016-06-22 2016-11-24 Hoya株式会社 Semiconductor package
WO2017014072A1 (en) * 2015-07-23 2017-01-26 ソニー株式会社 Semiconductor apparatus, method for manufacturing same, and electronic device
CN109461748A (en) * 2018-11-05 2019-03-12 中芯集成电路(宁波)有限公司 A kind of encapsulating structure and packaging method of optical element
US10381399B2 (en) 2016-10-31 2019-08-13 Canon Kabushiki Kaisha Semiconductor device
US11164803B2 (en) 2018-08-30 2021-11-02 Canon Kabushiki Kaisha Unit with wiring board, module, and equipment
US11857167B2 (en) 2018-08-28 2024-01-02 Olympus Corporation Image pickup unit and endoscope

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004031498A (en) * 2002-06-24 2004-01-29 Fuji Photo Film Co Ltd Method of manufacturing solid-state image pickup device
JP2004055674A (en) * 2002-07-17 2004-02-19 Fuji Photo Film Co Ltd Semiconductor device and method of manufacturing the same
JP2005209967A (en) * 2004-01-23 2005-08-04 Sharp Corp Semiconductor device, module for optical device, and method for manufacturing the semiconductor device
JP2005252183A (en) * 2004-03-08 2005-09-15 Sony Corp Solid-state imaging device and method of manufacturing the same

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004031498A (en) * 2002-06-24 2004-01-29 Fuji Photo Film Co Ltd Method of manufacturing solid-state image pickup device
JP2004055674A (en) * 2002-07-17 2004-02-19 Fuji Photo Film Co Ltd Semiconductor device and method of manufacturing the same
JP2005209967A (en) * 2004-01-23 2005-08-04 Sharp Corp Semiconductor device, module for optical device, and method for manufacturing the semiconductor device
JP2005252183A (en) * 2004-03-08 2005-09-15 Sony Corp Solid-state imaging device and method of manufacturing the same

Cited By (31)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9044135B2 (en) 2011-06-16 2015-06-02 Kabushiki Kaisha Toshiba Endoscope apparatus and electronic apparatus
JP2013197501A (en) * 2012-03-22 2013-09-30 Hoya Corp Semiconductor package
WO2013179766A1 (en) * 2012-05-30 2013-12-05 オリンパス株式会社 Imaging device, semiconductor device, and imaging unit
US9282261B2 (en) 2012-05-30 2016-03-08 Olympus Corporation Method for producing image pickup apparatus and method for producing semiconductor apparatus
US9698195B2 (en) 2012-05-30 2017-07-04 Olympus Corporation Method for producing image pickup apparatus and method for producing semiconductor apparatus
US10249672B2 (en) 2012-05-30 2019-04-02 Olympus Corporation Image pickup apparatus, semiconductor apparatus, and image pickup unit
WO2013179765A1 (en) * 2012-05-30 2013-12-05 オリンパス株式会社 Imaging device manufacturing method and semiconductor device manufacturing method
WO2013179764A1 (en) * 2012-05-30 2013-12-05 オリンパス株式会社 Method for manufacturing imaging device and method for manufacturing semiconductor device
WO2013179767A1 (en) * 2012-05-30 2013-12-05 オリンパス株式会社 Method of manufacturing image pickup device and method of manufacturing semiconductor device
US9123618B2 (en) 2012-05-30 2015-09-01 Olympus Corporation Method for producing image pickup apparatus, and method for producing semiconductor apparatus
US9230939B2 (en) 2012-05-30 2016-01-05 Olympus Corporation Method for producing image pickup apparatus, method for producing semiconductor apparatus, and joined wafer
US9240398B2 (en) 2012-05-30 2016-01-19 Olympus Corporation Method for producing image pickup apparatus and method for producing semiconductor apparatus
JP2014216554A (en) * 2013-04-26 2014-11-17 オリンパス株式会社 Imaging device
JP2014216930A (en) * 2013-04-26 2014-11-17 オリンパス株式会社 Imaging device
WO2014174994A1 (en) * 2013-04-26 2014-10-30 オリンパス株式会社 Image pickup apparatus
US9520428B2 (en) 2013-04-26 2016-12-13 Olympus Corporation Image pickup apparatus
JP2016011836A (en) * 2014-06-27 2016-01-21 パナソニックIpマネジメント株式会社 Preparation component set, preparation, method for manufacturing preparation, image photographing device, and image photographing method
WO2016152431A1 (en) * 2015-03-24 2016-09-29 ソニー株式会社 Solid-state image capture device, method for manufacturing solid-state image capture device, and electronic equipment
US11177300B2 (en) 2015-03-24 2021-11-16 Sony Corporation Solid-state image pickup apparatus, method of manufacturing solid-state image pickup apparatus, and electronic apparatus
US20180211989A1 (en) * 2015-07-23 2018-07-26 Sony Corporation Semiconductor device, manufacturing method thereof, and electronic apparatus
JPWO2017014072A1 (en) * 2015-07-23 2018-05-10 ソニー株式会社 SEMICONDUCTOR DEVICE, ITS MANUFACTURING METHOD, AND ELECTRONIC DEVICE
WO2017014072A1 (en) * 2015-07-23 2017-01-26 ソニー株式会社 Semiconductor apparatus, method for manufacturing same, and electronic device
US10763286B2 (en) 2015-07-23 2020-09-01 Sony Corporation Semiconductor device, manufacturing method thereof, and electronic apparatus
CN107851651A (en) * 2015-07-23 2018-03-27 索尼公司 Semiconductor device, its manufacture method and electronic equipment
CN107851651B (en) * 2015-07-23 2022-07-08 索尼公司 Semiconductor device, method for manufacturing the same, and electronic apparatus
JP2016197731A (en) * 2016-06-22 2016-11-24 Hoya株式会社 Semiconductor package
US10381399B2 (en) 2016-10-31 2019-08-13 Canon Kabushiki Kaisha Semiconductor device
US11857167B2 (en) 2018-08-28 2024-01-02 Olympus Corporation Image pickup unit and endoscope
US11164803B2 (en) 2018-08-30 2021-11-02 Canon Kabushiki Kaisha Unit with wiring board, module, and equipment
CN109461748A (en) * 2018-11-05 2019-03-12 中芯集成电路(宁波)有限公司 A kind of encapsulating structure and packaging method of optical element
CN109461748B (en) * 2018-11-05 2021-12-24 中芯集成电路(宁波)有限公司 Packaging structure and packaging method of optical element

Similar Documents

Publication Publication Date Title
JP2008130738A (en) Solid-state imaging element
CN108735770B (en) Semiconductor package
US8902356B2 (en) Image sensor module having image sensor package
JP4852675B2 (en) Electronic assembly for image sensor device and method of manufacturing the same
JP5794002B2 (en) Solid-state imaging device, electronic equipment
US9455358B2 (en) Image pickup module and image pickup unit
US20080088014A1 (en) Stacked imager package
JP2005209967A (en) Semiconductor device, module for optical device, and method for manufacturing the semiconductor device
JP2006128196A (en) Semiconductor image sensor module and manufacturing method thereof
TW201110676A (en) Electronic assembly for an image sensing device, wafer level lens set
US20130292786A1 (en) Integrated optical sensor module
US9635228B2 (en) Image sensors with interconnects in cover layer
JP2012009547A (en) Solid imaging device and electronic apparatus
JP2007116560A (en) Imaging device and method of manufacturing the same
TW200950505A (en) Image sensor structure and integrated lens module thereof
US20060267168A1 (en) Hollow package and semiconductor device using the same
JP2006032561A (en) Semiconductor image sensor module
US20060138579A1 (en) Image sensor package, solid state imaging device, and fabrication methods thereof
JP2010205780A (en) Imaging unit
JP4923967B2 (en) Solid-state imaging device and electronic apparatus
JP4451182B2 (en) Solid-state imaging device
TWI573256B (en) Manufacturing method of solid-state imaging device and solid-state imaging device
JP2009111130A (en) Imaging apparatus and its manufacturing method
TWI569433B (en) Manufacturing method of solid-state imaging device and solid-state imaging device
JPH07231074A (en) Solid-state image sensing module

Legal Events

Date Code Title Description
A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20090907

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20120222

A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20120223

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20120403

A02 Decision of refusal

Free format text: JAPANESE INTERMEDIATE CODE: A02

Effective date: 20120725