JP2008170301A - Electrostatic chuck type sample fixing tool, cutting device for observation surface exposure, and surface layer physical property analyzer - Google Patents
Electrostatic chuck type sample fixing tool, cutting device for observation surface exposure, and surface layer physical property analyzer Download PDFInfo
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- JP2008170301A JP2008170301A JP2007004200A JP2007004200A JP2008170301A JP 2008170301 A JP2008170301 A JP 2008170301A JP 2007004200 A JP2007004200 A JP 2007004200A JP 2007004200 A JP2007004200 A JP 2007004200A JP 2008170301 A JP2008170301 A JP 2008170301A
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Abstract
Description
本発明は、静電チャック式試料固定治具、観察面露出用切削装置および表層物性解析装置に関し、さらに詳しくは、ごく薄い試料の表層の物性解析を好適に行うことを可能にする静電チャック式試料固定治具、観察面露出用切削装置および表層物性解析装置に関する。 The present invention relates to an electrostatic chuck type sample fixing jig, a cutting device for exposing an observation surface, and a surface layer property analyzing apparatus, and more particularly, an electrostatic chuck capable of suitably performing a surface property analysis of a very thin sample. The present invention relates to a type specimen fixing jig, a cutting device for exposing an observation surface, and a surface layer property analyzing apparatus.
従来、塗装膜を持つ試料の表面を切刃で切削し、切削結果に基づいて塗装膜の剪断強度および剥離強度を測定する表面物性解析装置が知られている(例えば、特許文献1参照。)。また、試料を保持するための試料固定治具が知られている(例えば、特許文献2参照。)。
また、徐々に切込みが深くなるように斜めに切削した面(例えば表面から0.5μmの深さまでが均一に顕れるように切削した面)を、赤外分析やTOF−SIMSのような機器分析などで解析し、表層の深さ方向の物性変化を分析する方法が知られている(例えば、非特許文献1参照。)。
他方、半導体ウエハーなどを静電力により吸着保持する静電チャックが知られている(例えば、特許文献3参照。)。
In addition, an instrumental analysis such as infrared analysis or TOF-SIMS is performed on a surface that is cut obliquely so that the depth of cut gradually increases (for example, a surface that is cut so that a depth of 0.5 μm from the surface appears uniformly). And analyzing the change in physical properties in the depth direction of the surface layer is known (for example, see Non-Patent Document 1).
On the other hand, an electrostatic chuck that holds a semiconductor wafer or the like by electrostatic force is known (for example, see Patent Document 3).
従来の表面物性解析装置では、試料台の試料固定面に試料を押え付けて固定したり、試料固定面に穿設した微細孔から試料を真空吸引して固定したりしている。
しかし、15μm程度の極く薄い高分子フィルムのような試料の場合は、押え付けると試料が破損し、真空吸引すると試料が波打って切削できなくなるなどの問題点があった。
In a conventional surface physical property analyzer, a sample is pressed and fixed to a sample fixing surface of a sample table, or a sample is fixed by vacuum suction from a fine hole formed in the sample fixing surface.
However, in the case of a sample such as a very thin polymer film having a thickness of about 15 μm, there is a problem that the sample is damaged when pressed, and the sample cannot be cut due to undulation when vacuumed.
これに対して、従来の静電チャックを表面物性解析装置の試料固定手段として利用することが考えられる。
しかし、従来の静電チャックでは、15μm程度の極く薄い高分子フィルムのような試料を保持すると、吸着面の凹凸により試料面に凹凸が発生し、表面から内部に向けて徐々に切込みが深くなるように斜めに切削できなくなり、表層の深さ方向の分析に誤差を生じやすくなる。
On the other hand, it is conceivable to use a conventional electrostatic chuck as a sample fixing means of the surface property analyzing apparatus.
However, in the conventional electrostatic chuck, when a sample such as a very thin polymer film of about 15 μm is held, the sample surface is uneven due to the unevenness of the adsorption surface, and the depth of cut gradually increases from the surface toward the inside. Therefore, it becomes impossible to cut obliquely, and an error is likely to occur in the analysis in the depth direction of the surface layer.
そこで、本発明の目的は、ごく薄い試料の表層の物性解析を好適に行うことを可能にする静電チャック式試料固定治具、観察面露出用切削装置および表層物性解析装置を提供することにある。 Accordingly, an object of the present invention is to provide an electrostatic chuck type sample fixing jig, a cutting device for exposing an observation surface, and a surface layer property analyzing apparatus that can suitably perform surface property analysis of a very thin sample. is there.
第1の観点では、本発明は、表面粗さ(Rmax)が5μm以下の試料固定面と、前記試料固定面に静電チャックにより試料を吸着固定する静電吸着手段とを具備したことを特徴とする静電チャック式試料固定治具を提供する。
上記第1の観点による静電チャック式試料固定治具では、表面粗さ(Rmax)が5μm以下である試料固定面に静電チャックにより試料を吸着固定する。これにより、15μm程度の極く薄い高分子フィルムのような試料の場合でも、破損せずに試料を平坦な状態で固定できる。従って、ごく薄い試料を、表面から一定の深さで切削したり、徐々に切込みが深くなるように斜めに切削することが可能になる。
In a first aspect, the present invention includes a sample fixing surface having a surface roughness (Rmax) of 5 μm or less, and electrostatic adsorption means for adsorbing and fixing the sample to the sample fixing surface by an electrostatic chuck. An electrostatic chuck type sample fixing jig is provided.
In the electrostatic chuck type sample fixing jig according to the first aspect, the sample is attracted and fixed to the sample fixing surface having a surface roughness (Rmax) of 5 μm or less by the electrostatic chuck. Thereby, even in the case of a sample such as a very thin polymer film of about 15 μm, the sample can be fixed in a flat state without being damaged. Therefore, it is possible to cut a very thin sample at a certain depth from the surface, or obliquely so that the depth of cut gradually increases.
第2の観点では、本発明は、前記第1の観点の静電チャック式試料固定治具と、前記試料固定面に固定された試料の表面から切刃を用いて切削する切削手段とを具備したことを特徴とする観察面露出用切削装置を提供する。
上記第2の観点による観察面露出用切削装置では、表面粗さ(Rmax)が5μm以下である試料固定面に静電チャックにより試料を吸着固定し、切刃を用いて切削する。これにより、15μm程度の極く薄い高分子フィルムのような試料の場合でも、破損せずに試料を平坦な状態で固定でき、表面から一定の深さで切削したり、徐々に切込みが深くなるように斜めに切削することが出来る。
In a second aspect, the present invention comprises the electrostatic chuck type sample fixing jig of the first aspect and a cutting means for cutting from the surface of the sample fixed to the sample fixing surface using a cutting blade. An observation surface exposure cutting device is provided.
In the observation surface exposure cutting apparatus according to the second aspect, the sample is attracted and fixed to the sample fixing surface having a surface roughness (Rmax) of 5 μm or less by an electrostatic chuck, and cutting is performed using a cutting blade. As a result, even in the case of a sample such as a very thin polymer film of about 15 μm, the sample can be fixed in a flat state without being damaged, and can be cut at a certain depth from the surface or gradually deepened. Can be cut diagonally.
第3の観点では、本発明は、前記第2の観点の観察面露出用切削装置と、切削結果を基に物性解析を行う解析手段とを具備したことを特徴とする表層物性解析装置を提供する。
上記第3の観点による表層物性解析装置では、表面粗さ(Rmax)が5μm以下である試料固定面に静電チャックにより試料を吸着固定し、切刃を用いて切削し、切削結果を基に物性解析を行う。これにより、15μm程度の極く薄い高分子フィルムのような試料の場合でも、破損せずに試料を平坦な状態で固定でき、表面から一定の深さで切削したり、徐々に切込みが深くなるように斜めに切削でき、表面から一定の深さの面の物性や、表層の深さ方向の物性変化を分析できる。
In a third aspect, the present invention provides a surface layer physical property analyzing apparatus comprising the observation surface exposure cutting device of the second aspect and an analysis means for performing physical property analysis based on the cutting result. To do.
In the surface layer physical property analyzer according to the third aspect, the sample is attracted and fixed by an electrostatic chuck to a sample fixing surface having a surface roughness (Rmax) of 5 μm or less, and cutting is performed using a cutting blade. Perform physical property analysis. As a result, even in the case of a sample such as a very thin polymer film of about 15 μm, the sample can be fixed in a flat state without being damaged, and can be cut at a certain depth from the surface or gradually deepened. Thus, it is possible to analyze the physical properties of a surface having a certain depth from the surface and the physical property changes in the depth direction of the surface layer.
本発明の静電チャック式試料固定治具、観察面露出用切削装置および表層物性解析装置によれば、15μm程度の極く薄い高分子フィルムのような極く薄い試料の表層を好適に切削し、表層の物性解析を好適に行うことが可能になる。 According to the electrostatic chuck type sample fixing jig, the observation surface exposure cutting device, and the surface layer physical property analysis device of the present invention, the surface layer of a very thin sample such as a very thin polymer film of about 15 μm is suitably cut. Thus, the physical property analysis of the surface layer can be suitably performed.
以下、図に示す実施の形態により本発明をさらに詳細に説明する。なお、これにより本発明が限定されるものではない。 Hereinafter, the present invention will be described in more detail with reference to embodiments shown in the drawings. Note that the present invention is not limited thereby.
図1は、実施例1に係る表層物性解析装置100を示す要部斜視図である。
この表層物性解析装置100は、表面粗さ(Rmax)が5μm以下である試料固定面1aに静電チャックにより試料Pを吸着固定する静電チャック式試料固定治具1と、表層物性解析装置本体2とを具備している。
FIG. 1 is a perspective view of a main part showing a surface layer physical property analyzing apparatus 100 according to the first embodiment.
The surface layer physical property analyzing apparatus 100 includes an electrostatic chuck type
図2に示すように、静電チャック式試料固定治具1は、基台10と、電源15から電圧を供給されて静電力を発生する電極部11と、電極部11の上面側に設けられた保護層12と、保護層12の上面側に設けられたハードコート層13とを有している。
As shown in FIG. 2, the electrostatic chuck type
保護層12は、例えばエポキシ樹脂である。 The protective layer 12 is, for example, an epoxy resin.
ハードコート層13は、例えばアトミクス社製のアトムコンポプリッドHCSやアトムコンポプリッドHUV−628Aである。
例えばエポキシ樹脂の保護層12には凹凸があるため、保護層12の上面に前述のようなハイブリッド樹脂塗料をバーコーターにてコーティングし、室温で3時間置き、硬化させる。これにより、試料固定面1aの表面粗さ(Rmax)を5μm以下にすることが出来る。
The hard coat layer 13 is, for example, Atom Compound HCS or Atom Compound HUV-628A manufactured by Atomics.
For example, since the epoxy resin protective layer 12 has irregularities, the above-described hybrid resin paint is coated on the upper surface of the protective layer 12 with a bar coater, and is allowed to cure at room temperature for 3 hours. Thereby, the surface roughness (Rmax) of the sample fixing surface 1a can be reduced to 5 μm or less.
表層物性解析装置本体2は、従来公知の構成であり(例えば特許文献1に記載の構成)、試料固定面1aに固定された試料Pの表面から切刃2aを用いて切削する切削部と、その切削結果を基に物性解析を行う解析部とを有している。
The surface layer physical property analyzing apparatus
実施例1の表層物性解析装置100によれば次の効果が得られる。
(1)15μm程度の極く薄い高分子フィルムのような極く薄い試料Pでも、静電チャック式試料固定治具1により破損せずに平坦な状態で固定できる。
(2)15μm程度の極く薄い高分子フィルムのような極く薄い試料Pでも、表面から一定の深さで切削したり、徐々に切込みが深くなるように斜めに切削できる。
(3)15μm程度の極く薄い高分子フィルムのような極く薄い試料Pでも、表面から一定の深さの面の物性や、表層の深さ方向の物性変化を分析できる。
According to the surface layer property analyzing apparatus 100 of the first embodiment, the following effects can be obtained.
(1) Even a very thin sample P such as a very thin polymer film of about 15 μm can be fixed in a flat state without being damaged by the electrostatic chuck type
(2) Even a very thin sample P such as a very thin polymer film of about 15 μm can be cut at a certain depth from the surface or can be cut obliquely so that the depth of cut gradually increases.
(3) Even with a very thin sample P such as a very thin polymer film of about 15 μm, it is possible to analyze physical properties of a surface having a certain depth from the surface and changes in physical properties in the depth direction of the surface layer.
エポキシ樹脂の保護層12の表面に機械的研磨を施して表面粗さ(Rmax)を5μm以下にしてもよい。この場合、ハードコート層13は設けてもよいし、省略してもよい。 The surface of the protective layer 12 made of epoxy resin may be mechanically polished so that the surface roughness (Rmax) is 5 μm or less. In this case, the hard coat layer 13 may be provided or omitted.
例えば厚さ15μmのポリエチレンフィルムのような極く薄い試料の表層の物性解析を行うのに利用できる。 For example, it can be used to analyze the physical properties of the surface layer of a very thin sample such as a polyethylene film having a thickness of 15 μm.
1 静電チャック式試料固定治具
1a 試料固定面
2 表層物性解析装置本体
2a 切刃
100 表面物性解析装置
P 試料
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Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
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CN103674833A (en) * | 2013-11-29 | 2014-03-26 | 西南交通大学 | Simple shearing test method and device for rock-concrete cement face |
KR101806486B1 (en) | 2016-04-26 | 2018-01-10 | 주식회사 인포웍스 | Method and computer readable recording medium for preparing surface and interfacial sample of thin layer materials |
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Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN103674833A (en) * | 2013-11-29 | 2014-03-26 | 西南交通大学 | Simple shearing test method and device for rock-concrete cement face |
KR101806486B1 (en) | 2016-04-26 | 2018-01-10 | 주식회사 인포웍스 | Method and computer readable recording medium for preparing surface and interfacial sample of thin layer materials |
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