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JP2007264540A - Inspection device for aperture pattern - Google Patents

Inspection device for aperture pattern Download PDF

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Publication number
JP2007264540A
JP2007264540A JP2006092946A JP2006092946A JP2007264540A JP 2007264540 A JP2007264540 A JP 2007264540A JP 2006092946 A JP2006092946 A JP 2006092946A JP 2006092946 A JP2006092946 A JP 2006092946A JP 2007264540 A JP2007264540 A JP 2007264540A
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inspection
inspected
opening pattern
light
cassette
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JP4802814B2 (en
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Masashi Gunjima
政司 郡嶋
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Toppan Inc
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Toppan Printing Co Ltd
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  • Length Measuring Devices By Optical Means (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)

Abstract

<P>PROBLEM TO BE SOLVED: To provide an inspection device for an aperture pattern which is advantageous in irradiating the entire surface area of a body to be inspected with oblique light of a shallow angle to a deep angle. <P>SOLUTION: When the body 20 to be inspected such as a photomask is mounted on a stage 34 for the inspection device, the top surface of the body 20 to be inspected is exposed above a support member 14 and the bottom surface of the body 20 to be inspected is exposed below the support member 14. Consequently, a large inspection light movable range is obtained by a light source 30 from the shallow angle to the deep angle, so inspection with a high degree of freedom can be performed during transmission/reflection measurement requiring irradiation with oblique light and the body to be inspected can be positioned at the outer peripheral margin part of a plane and at a thickness-directional section part, so inspection over the entire surface except for the outer peripheral margin part of the plane becomes possible and the body to be inspected can accurately be positioned, thereby improving reproducibility of a position. <P>COPYRIGHT: (C)2008,JPO&INPIT

Description

本発明は、開口パターンの検査装置に関する。   The present invention relates to an opening pattern inspection apparatus.

従来の周期性パターンの検査装置では、撮像カメラと同軸の透過照明や平面照明を用いて透過率画像を撮像し、各々の画像での光の強度(明るさ)を比べてムラ部と正常部とを視認する方法である。そのため、元々ムラ部と正常部との光の強度差が少ない、すなわち、コントラストが低い画像をその強度差の処理方法を工夫することで、差を拡大してムラ部の抽出し、検査を行っている。   In a conventional periodic pattern inspection device, a transmittance image is captured using transmission illumination or plane illumination coaxial with an imaging camera, and the intensity (brightness) of light in each image is compared with that of a nonuniformity portion and a normal portion. It is a method of visually recognizing. For this reason, the difference in light intensity between the uneven part and the normal part is originally small, that is, by devising an intensity difference processing method for images with low contrast, the difference is expanded and the uneven part is extracted and inspected. ing.

しかし、上記従来技術においては、格子状の周期性パターンのブラックマトリクスのムラ、特に開口部の大きいブラックマトリクスのムラの撮像において、ムラ部と正常部でのコントラストの向上が望めず、強度差の処理を工夫したとしても、元画像のコントラストが低い画像の場合の検査では、目視での官能検査方法より低い検査能力しか達成できない問題がある。なお、周期性パターンとは、一定の間隔(以下ピッチと記す)を持つスリットのパターンの集合体を称し、例えば、1本のパターンが所定ピッチで配列したストライプ状の周期性パターン、又は開口部のパターンが所定ピッチで配列したマトリクス状の周期性パターン等である。   However, in the above-described prior art, in the imaging of the black matrix unevenness of the grid-like periodic pattern, particularly the black matrix unevenness having a large opening, the contrast between the uneven portion and the normal portion cannot be improved, and the intensity difference Even if the processing is devised, there is a problem that the inspection in the case of an image with a low contrast of the original image can only achieve a lower inspection ability than the visual sensory inspection method. The periodic pattern refers to an aggregate of slit patterns having a constant interval (hereinafter referred to as a pitch). For example, a striped periodic pattern in which one pattern is arranged at a predetermined pitch, or an opening. These patterns are a matrix-like periodic pattern in which these patterns are arranged at a predetermined pitch.

一方、微細な表示、と明るい画面の電子部品の増加により、前記周期性パターンでは、微細化、又は開口部比率アップへの傾向が進んでいる。将来、更に開口部の大きいより微細形状のブラックマトリクス用の周期性パターンのムラ検査の方法及びその装置が必要となる。すなわち、従来の光の振幅による光の強度(明るさ)の強弱のみの出力では限界である。   On the other hand, due to the increase in fine display and electronic components with a bright screen, the periodic pattern tends to be miniaturized or the aperture ratio is increased. In the future, there will be a need for an inspection method and apparatus for periodic pattern irregularity inspection for a black matrix having a finer shape and a larger opening. That is, there is a limit in the conventional output with only the intensity (brightness) of the light depending on the amplitude of the light.

そこで、周期性のあるパターン、例えばブラックマトリクスムラを安定的、高精度に撮像、検出可能な、周期性パターンムラ検査装置を提供することを目的とした、撮像装置により撮像された周期性パターンのムラの検査をする検査装置において、被検査体検査面と平行な撮像側平行光学系を備え、画像を撮像する手段を具備する撮像部と、検査対象基板を載置し、位置の認知と、X軸及びY軸方向に駆動する手段を具備するXYステージと、光軸の垂直傾き方向及び前記光軸を水平回転する駆動部と、該駆動部の先端に固定した照明側平行光学系を具備する斜め透過照明部とを備え、前記撮像部及びXYステージ及び透過照明部を管理し、周期性パターンのムラの検査の工程を逐次処理する手段を具備する処理部を備えた周期性パターンのムラの検査をする検査装置であって、斜め透過光の照明を行うことで生じる、周期性パターンでの回折光を撮像することを特徴とする周期性パターンムラ検査装置が提案されている(特許文献1参照)。   In view of this, a periodic pattern unevenness imaged by an imaging device is provided for the purpose of providing a periodic pattern unevenness inspection device capable of capturing and detecting a periodic pattern, for example, black matrix unevenness stably and with high accuracy. In an inspection apparatus for inspecting unevenness, an imaging side parallel optical system parallel to the inspection object inspection surface, an imaging unit including means for imaging an image, a substrate to be inspected, a position recognition, An XY stage having means for driving in the X-axis and Y-axis directions, a vertical tilt direction of the optical axis and a drive unit for horizontally rotating the optical axis, and an illumination side parallel optical system fixed to the tip of the drive unit Of the periodic pattern including a processing unit that includes means for managing the imaging unit, the XY stage, and the transmission illumination unit, and sequentially processing the inspection process of the irregularity of the periodic pattern. There has been proposed a periodic pattern unevenness inspection apparatus that inspects diffracted light in a periodic pattern, which is an inspection apparatus that inspects a laser beam and that is generated by illuminating obliquely transmitted light (patent) Reference 1).

これらの周期性パターンを有する製品の欠陥検査装置では、被検査体の投入取り出しは人手によって行われており被検査体の一部に汚れが付着しやすいという問題がある。   In the defect inspection apparatus for products having these periodic patterns, there is a problem that the inspected object is put in and taken out by hand, and dirt easily adheres to a part of the inspected object.

フォトマスク等の被検査体の欠陥を、光の透過・反射原理を用いて測定する際に被検査体に対して垂直方向のみならず、浅い角度から深い角度の斜光を被検査体の全面域に照射する場合、従来の一般的な検査装置では図6(a)、(b)に示すように、検査光可動範囲角度が小さいという問題があった。
すなわち、Xスライドテーブル2とYスライドテーブル4が重なっている場合、照射中心位置が奥まっており照射光の検査光可動範囲は小さくなり本来の検査が十分にできない。
図6(b)では図6(a)の構成を天地反転させたものであるが、これであれば下面からの検査照射光は十分な検査光可動範囲を確保できるが、上面より照射される光角度のふり幅は図6(a)同様に不十分である。
特開平2−50208号公報(第29図)
When measuring defects such as photomasks using the light transmission / reflection principle, not only the direction perpendicular to the object to be inspected, but also oblique light from a shallow angle to a deep angle is applied to the entire surface area of the object to be inspected. As shown in FIGS. 6A and 6B, the conventional general inspection apparatus has a problem that the inspection light movable range angle is small.
That is, when the X slide table 2 and the Y slide table 4 are overlapped, the irradiation center position is deep and the inspection light movable range of the irradiation light becomes small, and the original inspection cannot be sufficiently performed.
In FIG. 6 (b), the configuration of FIG. 6 (a) is inverted upside down. In this case, the inspection irradiation light from the lower surface can ensure a sufficient inspection light movable range, but is irradiated from the upper surface. The precession width of the light angle is insufficient as in FIG.
Japanese Patent Laid-Open No. 2-50208 (FIG. 29)

本発明は、従来の技術における、前記の様な問題点を解決するためになされたものであり、その目的は、フォトマスク等の被検査体の欠陥を、光の透過・反射原理を用いて測定する際に被検査体を所望する位置に移動しながら検査する際、被検査体に対して垂直方向のみならず、浅い角度から深い角度の斜光を被検査体の全面域に照射する上で有利であり、また、異なる被検査体を検査する場合にも予め決められた条件で安定的に検査できる開口パターンの検査装置を提供することにある。   The present invention has been made in order to solve the above-described problems in the prior art, and its purpose is to detect defects in an object to be inspected such as a photomask using the principle of light transmission / reflection. When inspecting the object to be inspected while moving it to a desired position during measurement, not only in the direction perpendicular to the object to be inspected, but also to irradiate the entire area of the object to be inspected from a shallow angle to a deep angle. Further, it is an object of the present invention to provide an inspection apparatus for an opening pattern that can be stably inspected under predetermined conditions even when inspecting different inspection objects.

本発明は前記課題を解決するためになされたものであり、その請求項1記載の発明は、被検査体の開口パターンに、前記被検査体の面に対して角度を変えつつ検査光を照射し、前記被検査体で反射された反射光又は前記開口パターンを透過した透過光の少なくとも何れかを検出することで前記開口パターンを検査する検査装置であって、前記検査装置は前記被検査体を保持する検査用ステージを備え、前記検査用ステージは、水平面内で延在する第1のガイドシャフトと、前記第1のガイドシャフトに滑動可能に結合された第1のスライダーと、水平面内で前記第1のガイドシャフトと直交する方向に延在しその延在方向の端部が前記第1のスライダーに結合された第2のガイドシャフトと、前記第2のガイドシャフトに滑動可能に結合され前記被検査体を保持する支持部材とを備えることを特徴とする。   The present invention has been made to solve the above-mentioned problems, and the invention according to claim 1 irradiates the inspection pattern with the inspection light while changing the angle with respect to the surface of the inspection object. An inspection apparatus that inspects the opening pattern by detecting at least one of reflected light reflected by the object to be inspected and light transmitted through the opening pattern, wherein the inspection apparatus is the object to be inspected. An inspection stage that holds a first guide shaft extending in a horizontal plane, a first slider slidably coupled to the first guide shaft, and a horizontal plane. A second guide shaft extending in a direction perpendicular to the first guide shaft and extending in the extending direction is coupled to the first slider, and is slidably coupled to the second guide shaft. Serial characterized in that it comprises a support member for holding the object to be inspected.

また、請求項2記載の発明は、前記第1のガイドシャフトは互いに平行するように2本設けられ、前記第1のスライダーは前記2本の第1のガイドシャフトに滑動可能に結合され、前記第2のガイドシャフトは互いに平行するように2本設けられ、前記2本の第2のガイドシャフトの延在方向の両端は、前記各第1のスライダーの前記第1のガイドシャフトに沿った延在方向の両端に結合されていることを特徴とする。   According to a second aspect of the present invention, two first guide shafts are provided so as to be parallel to each other, and the first slider is slidably coupled to the two first guide shafts, Two second guide shafts are provided so as to be parallel to each other, and both ends in the extending direction of the two second guide shafts extend along the first guide shaft of each of the first sliders. It is characterized by being coupled to both ends in the present direction.

また、請求項3記載の発明は、前記支持部材は、前記第2のガイドシャフトに滑動可能に結合された第2のスライダーと、この第2のスライダーに取着される枠状のカセットホルダと、前記カセットホルダの内側に着脱可能に取着され前記被検査体の保持部が設けられたカセットとで構成されていることを特徴とする。
また、請求項4記載の発明は、前記保持部は前記カセットに設けられ中央に検査用開口が設けられるとともに、前記被検査体の外周部が載置される枠状の載置部と、前記載置部に臨ませて設けられ前記載置部に載置された前記被検査体を前記載置部に位置決めして取り付ける取り付け具とを備えていることを特徴とする。
According to a third aspect of the present invention, the support member includes a second slider slidably coupled to the second guide shaft, and a frame-shaped cassette holder attached to the second slider. The cassette holder is detachably attached to the inside of the cassette holder and is provided with a cassette provided with a holding portion for the object to be inspected.
According to a fourth aspect of the present invention, the holding unit is provided in the cassette and has an inspection opening in the center, and a frame-shaped mounting unit on which the outer peripheral portion of the object to be inspected is mounted; And an attachment that positions and attaches the object to be inspected, which is provided facing the placement portion and placed on the placement portion, to the placement portion.

本発明の検査装置用ステージとホルダーにフォトマスク等の被検査体を載置し、浅い角度から深い角度まで検査光可動範囲が大きく取れるため、斜光の照射を必要とする透過・反射測定では自由度の高い検査を行う事が可能で、被検査体の平面の外周余白部分と厚み方向の断面部で位置決めが可能なため、平面の外周余白部を除く全面の検査が容易となり、被検査体を正確に位置決め出来ることから位置の再現性も向上される。
さらに、例えば予め準備されたカセットを用いれば、6インチサイズのフォトマスク検査から7インチサイズのフォトマスク検査に変更することも可能となり、装置の汎用性が向上する。
また、被検査体をカセットに載置する際には平面外周余白部分と外周面部分だけがカセットと接触するため、被検査体を汚染することが非常に少ない。
The inspection object stage and holder of the present invention are placed on the inspection object such as a photomask, and the inspection light movable range can be increased from a shallow angle to a deep angle, so it is free for transmission and reflection measurement that requires oblique light irradiation. It is possible to perform high-grade inspection, and positioning can be performed on the outer peripheral margin part of the plane of the object to be inspected and the cross section in the thickness direction, making it easy to inspect the entire surface excluding the outer peripheral margin part of the plane. Since the position can be accurately positioned, the reproducibility of the position is improved.
Furthermore, for example, if a cassette prepared in advance is used, it is possible to change from a 6-inch size photomask inspection to a 7-inch size photomask inspection, which improves the versatility of the apparatus.
Further, when placing the object to be inspected on the cassette, since only the planar outer margin part and the outer peripheral surface part are in contact with the cassette, the object to be inspected is very rarely contaminated.

以下に図面を参照して本発明の実施の形態を説明する。
図1は本実施の形態の開口パターンの検査装置における検査光源部の照射範囲と検査画像を撮影するカメラの位置関係を示す図である。
図2(a)は本実施の形態の開口パターンの検査装置の上面図、(b)は(a)のBB線断面図である。
図3(a)は本実施の形態の開口パターンの検査装置における検査ステージ34の上面図、(b)は(a)のBB線断面図である。
図4は被検査体20の位置決めの説明図である。
図5は本実施の形態の開口パターンの検査装置における検査光源部の照射範囲を示す図である。
Embodiments of the present invention will be described below with reference to the drawings.
FIG. 1 is a diagram showing a positional relationship between an irradiation range of an inspection light source unit and a camera that captures an inspection image in the opening pattern inspection apparatus of the present embodiment.
2A is a top view of the opening pattern inspection apparatus of the present embodiment, and FIG. 2B is a cross-sectional view taken along the line BB of FIG.
3A is a top view of the inspection stage 34 in the opening pattern inspection apparatus of the present embodiment, and FIG. 3B is a sectional view taken along the line BB of FIG.
FIG. 4 is an explanatory diagram of positioning of the inspection object 20.
FIG. 5 is a diagram showing an irradiation range of the inspection light source unit in the inspection apparatus for the opening pattern of the present embodiment.

図1に示すように、検査装置100は、被検査体20の開口パターンに、光源30から被検査体20の面に対して角度を変えつつ検査光を照射し、被検査体20で反射された反射光又は開口パターンを透過した透過光の少なくとも何れかを撮像カメラ32で検出することで開口パターンを検査するものであり、被検査体20を保持する検査用ステージ34を備えている。
検査装置100は不図示の装置架台部を有し、前記装置架台部に図2に示すベース板10が固定されている。
図2に示すように、ベース板10は矩形枠状に形成され、その内側に検査ステージ34が設けられている。
検査用ステージ34は、第1のガイドシャフト11と、第1のスライダー12と、第2のガイドシャフト13と、支持部材14とを備えている。
第1のガイドシャフト11は2本設けられ、互いに平行して水平面内で延在し、それらの両端がベース板10の内側の対向する2辺に結合されている。
第1のスライダー12は2つ設けられ、2本の第1のガイドシャフト11にそれぞれ滑動可能に結合されている。
第2のガイドシャフト13は2本設けられ、互いに平行して水平面内で第1のガイドシャフト11と直交する方向に延在し、各第2のガイドシャフト13は、それらの延在方向の端部が第1のスライダー12の第1のガイドシャフト11に沿った延在方向の両端にそれぞれ結合されている。
支持部材14は、2つの第2のガイドシャフト13に滑動可能に結合され被検査体20を保持する。
支持部材14は、第2のスライダー1402と、カセットホルダ26と、カセット21とで構成されている。
第2のスライダー1402は2つ設けられ、各第2のガイドシャフト13にそれぞれ滑動可能に結合されている。
カセットホルダ26は矩形枠状に形成され、対向する2辺が2つの第2のスライダー1402に結合されている。
As shown in FIG. 1, the inspection apparatus 100 irradiates the opening pattern of the inspection object 20 with inspection light while changing the angle with respect to the surface of the inspection object 20 from the light source 30, and is reflected by the inspection object 20. The aperture pattern is inspected by detecting at least one of the reflected light or the transmitted light transmitted through the aperture pattern with the imaging camera 32, and an inspection stage 34 that holds the object 20 to be inspected is provided.
The inspection device 100 has a device base (not shown), and the base plate 10 shown in FIG. 2 is fixed to the device base.
As shown in FIG. 2, the base plate 10 is formed in a rectangular frame shape, and an inspection stage 34 is provided on the inside thereof.
The inspection stage 34 includes a first guide shaft 11, a first slider 12, a second guide shaft 13, and a support member 14.
Two first guide shafts 11 are provided, extend in parallel to each other in a horizontal plane, and both ends of the first guide shafts 11 are coupled to two opposite sides inside the base plate 10.
Two first sliders 12 are provided and slidably coupled to the two first guide shafts 11, respectively.
Two second guide shafts 13 are provided and extend in parallel to each other in a direction orthogonal to the first guide shaft 11 in a horizontal plane, and each second guide shaft 13 has an end in the extending direction thereof. The portions are respectively coupled to both ends of the first slider 12 in the extending direction along the first guide shaft 11.
The support member 14 is slidably coupled to the two second guide shafts 13 and holds the device under test 20.
The support member 14 includes a second slider 1402, a cassette holder 26, and a cassette 21.
Two second sliders 1402 are provided and slidably coupled to the respective second guide shafts 13.
The cassette holder 26 is formed in a rectangular frame shape, and two opposite sides are coupled to two second sliders 1402.

図3に示すように、カセット21は矩形枠状に形成され、カセットホルダ26の内側に着脱可能に取着される。
具体的には、カセット21がカセットホルダ26の内側に挿入された状態でカセットホルダ26の一辺に螺合されたカセット固定ネジ25を締結することでカセット固定ネジ25の先端とカセットホルダ26の内壁との間に挟持された状態で固定され、カセット固定ネジ25を緩めることでカセット21が取り外されるように構成されている。
このような構成によれば、カセットホルダ26に取り付けるカセット21を被検査体20のサイズに応じて容易に交換することができ、被検査体20のサイズに拘わらず検査を行なうことができる。例えば予め準備された被検査体カセットを用いれば、6インチサイズのフォトマスク検査から7インチサイズのフォトマスク検査に変更することも可能となり、検査装置10の汎用性を高める上で有利となる。
As shown in FIG. 3, the cassette 21 is formed in a rectangular frame shape, and is detachably attached to the inside of the cassette holder 26.
Specifically, when the cassette 21 is inserted inside the cassette holder 26, the cassette fixing screw 25 screwed to one side of the cassette holder 26 is fastened to tighten the front end of the cassette fixing screw 25 and the inner wall of the cassette holder 26. The cassette 21 is configured to be removed by loosening the cassette fixing screw 25.
According to such a configuration, the cassette 21 attached to the cassette holder 26 can be easily exchanged according to the size of the inspection object 20, and inspection can be performed regardless of the size of the inspection object 20. For example, if an inspection object cassette prepared in advance is used, it is possible to change from a 6-inch size photomask inspection to a 7-inch size photomask inspection, which is advantageous in enhancing the versatility of the inspection apparatus 10.

カセット21には被検査体20の保持部2102が設けられている。
保持部2102は、載置部36と、取り付け具38とを備えている。
載置部36はカセット21の内側に設けられ、中央に検査用開口3602が設けられるとともに、被検査体20の外周部が載置される枠状の載置面3604と、載置面3604の周囲から起立された4つの側面3606とを有している。
The cassette 21 is provided with a holding portion 2102 for the inspected object 20.
The holding unit 2102 includes a placement unit 36 and an attachment tool 38.
The placement portion 36 is provided inside the cassette 21, and an inspection opening 3602 is provided at the center, and a frame-like placement surface 3604 on which the outer peripheral portion of the inspection target 20 is placed, and a placement surface 3604. And four side surfaces 3606 erected from the periphery.

取り付け具38は、載置部36に臨ませて設けられ載置部36に載置された被検査体20を載置部36に位置決めして取り付けるものである。
取り付け具38は、載置部36の対向する2つの側面3606のうちの一方の側面3606にその延在方向に間隔をおいて設けられた突起23と、対向する2つの側面3606のうちの他方の側面3606に突起23に対向して設けられた固定カム24とで構成されている。
図5に示すように、固定カム24を所定方向に回転すると、固定カム24(24−a)のカム面が被検査体20の側面に当接して被検査体20の反対側の側面を突起23に当て付けることで被検査体20が位置決めされ固定される。
また、固定カム24を反対方向に回転すると、固定カム24(24−b)のカム面が被検査体20の側面から離間し、被検査体20の取り付けが解除される。
このような構成によれば、被検査体20に対するカセット21の接触部位は、載置面3604、突起23、固定カム24に限られている。すなわち、被検査体20をカセット21に載置する際には平面外周余白部分と外周面部分だけがカセット21と接触するため、被検査体20を汚染することが非常に少ない。
なお、被検査体20は汎用ハンドリング治具を用いてカセット21へ移載する。この際、汎用ハンドリング治具の被検査体20をチャッキングする部分が、カセット21へ移載する際に干渉しないようにカセット21には、図2(a)に示すように、予め汎用ハンドリング治具の逃げ部22が設けられている。
The mounting tool 38 is provided so as to face the mounting portion 36, and positions and attaches the inspection object 20 placed on the mounting portion 36 to the mounting portion 36.
The attachment 38 includes a protrusion 23 provided on one side surface 3606 of the two opposing side surfaces 3606 of the mounting portion 36 at a distance in the extending direction, and the other of the two opposing side surfaces 3606. And a fixed cam 24 provided on the side surface 3606 of the side surface 3606 so as to face the protrusion 23.
As shown in FIG. 5, when the fixed cam 24 is rotated in a predetermined direction, the cam surface of the fixed cam 24 (24-a) abuts on the side surface of the inspection object 20 and the opposite side surface of the inspection object 20 protrudes. The object to be inspected 20 is positioned and fixed by being applied to 23.
When the fixed cam 24 is rotated in the opposite direction, the cam surface of the fixed cam 24 (24-b) is separated from the side surface of the device under test 20, and the attachment of the device under test 20 is released.
According to such a configuration, the contact portion of the cassette 21 with the device under test 20 is limited to the placement surface 3604, the protrusion 23, and the fixed cam 24. That is, when placing the inspection object 20 on the cassette 21, only the planar outer margin part and the outer peripheral surface part are in contact with the cassette 21, so that the inspection object 20 is hardly contaminated.
The inspected object 20 is transferred to the cassette 21 using a general-purpose handling jig. At this time, as shown in FIG. 2A, the general-purpose handling jig is preliminarily placed in the cassette 21 so that the portion of the general-purpose handling jig for chucking the object 20 to be inspected does not interfere with the cassette 21. A tool escape portion 22 is provided.

また、カセット21の材質は被検査体20に対するダメージを考慮して、樹脂材やプラスチック材が好ましい。また、光を照射して測定することを考慮すると透明体は避けて出来るだけ光を遮蔽または散乱させる材料が好ましい。
同様に、固定カム24においても被検査体20に対するダメージを考慮すると、直接接触する部位は静電防止機能を持った樹脂材やプラスチック材が好ましい。
The material of the cassette 21 is preferably a resin material or a plastic material in consideration of damage to the object 20 to be inspected. In consideration of measurement by irradiating light, a material that shields or scatters light as much as possible is preferable while avoiding a transparent body.
Similarly, in the fixed cam 24, in consideration of damage to the object 20 to be inspected, a resin material or a plastic material having an antistatic function is preferable for a portion that directly contacts.

また、第1、第2のスライダー12、1402を電気的に動作させる手段を用いて所望する移動量をデジタル的に指示することも可能で、更に現在位置を把握するための手段を用いることで位置の再現性や測定の定量化も可能となる。
この場合、第1、第2のスライダー12、1402を動作させる手段としては、ボールネジとサーボモータの組み合わせや、ボールネジとステッピングモータの組み合わせが一般的で最近ではリニアアクチェーターなども動作位置決めの手段として用いることが出来る。
また、第1、第2のスライダー12、1402の現在位置を把握する手段としては、モータ内蔵のエンコーダを利用することが一般的でありそのほかとしては、光学スケールなどを用いることも出来る。
It is also possible to digitally specify a desired amount of movement using means for electrically operating the first and second sliders 12 and 1402, and further using means for grasping the current position. Position reproducibility and measurement quantification are also possible.
In this case, as a means for operating the first and second sliders 12 and 1402, a combination of a ball screw and a servo motor or a combination of a ball screw and a stepping motor is generally used. Recently, a linear actuator or the like is also used as an operation positioning means. Can be used.
In addition, as a means for grasping the current positions of the first and second sliders 12 and 1402, an encoder with a built-in motor is generally used, and in addition, an optical scale or the like can be used.

次に作用効果について説明する。
図5に示すように、検査装置用ステージ34にフォトマスク等の被検査体20を載置すると、被検査体20の上面は支持部材14の上方に露出し、被検査体20の下面は支持部材14の下方に露出した状態となる。
したがって、光源30によって浅い角度から深い角度まで検査光可動範囲が大きく取れるため、斜光の照射を必要とする透過・反射測定では自由度の高い検査を行う事が可能で、被検査体の平面の外周余白部分と厚み方向の断面部で位置決めが可能なため、平面の外周余白部を除く全面の検査が容易となり、被検査体を正確に位置決め出来ることから位置の再現性も向上される。
すなわち、従来装置では、XスライドテーブルとYスライドテーブルが重なっているため、照射中心位置が奥まっており被検査体に対する照射光の検査光可動範囲が小さなものとなっているのに対し、本実施の形態の検査装置100では、支持部材14の検査光可動範囲を大きく確保でき有利である。
Next, the function and effect will be described.
As shown in FIG. 5, when the inspection object 20 such as a photomask is placed on the inspection apparatus stage 34, the upper surface of the inspection object 20 is exposed above the support member 14, and the lower surface of the inspection object 20 is supported. It will be in the state exposed under the member 14. FIG.
Accordingly, since the inspection light movable range can be increased from a shallow angle to a deep angle by the light source 30, it is possible to perform inspection with a high degree of freedom in transmission / reflection measurement that requires oblique light irradiation. Since positioning is possible at the outer margin part and the cross section in the thickness direction, inspection of the entire surface excluding the outer peripheral margin part of the flat surface is facilitated, and the reproducibility of the position is improved because the object to be inspected can be accurately positioned.
That is, in the conventional apparatus, since the X slide table and the Y slide table overlap, the irradiation center position is deep and the inspection light movable range of the irradiation light with respect to the object to be inspected is small. The inspection apparatus 100 of this form is advantageous because it can ensure a large inspection light movable range of the support member 14.

本実施の形態の開口パターンの検査装置における検査光源部の照射範囲と検査画像を撮影するカメラの位置関係を示す図である。It is a figure which shows the positional relationship of the camera which image | photographs a test | inspection image with the irradiation range of the test | inspection light source part in the inspection apparatus of the opening pattern of this Embodiment. (a)は本実施の形態の開口パターンの検査装置の上面図、(b)は(a)のBB線断面図である。(A) is a top view of the inspection apparatus for an opening pattern of the present embodiment, and (b) is a cross-sectional view taken along the line BB of (a). (a)は本実施の形態の開口パターンの検査装置における検査ステージ34の上面図、(b)は(a)のBB線断面図である。(A) is a top view of the inspection stage 34 in the opening pattern inspection apparatus of the present embodiment, and (b) is a cross-sectional view taken along the line BB of (a). 被検査体20の位置決めの説明図である。It is explanatory drawing of positioning of the to-be-inspected object 20. FIG. 本実施の形態の開口パターンの検査装置における検査光源部の照射範囲を示す図である。It is a figure which shows the irradiation range of the test | inspection light source part in the inspection apparatus of the opening pattern of this Embodiment. (a)、(b)は従来装置の説明図である。(A), (b) is explanatory drawing of a conventional apparatus.

符号の説明Explanation of symbols

11……第1のガイドシャフト、12……第1のスライダー、13……第2のガイドシャフト、14……支持部材、34……検査用ステージ、20……被検査体、100……検査装置。
DESCRIPTION OF SYMBOLS 11 ... 1st guide shaft, 12 ... 1st slider, 13 ... 2nd guide shaft, 14 ... Support member, 34 ... Inspection stage, 20 ... Test object, 100 ... Inspection apparatus.

Claims (4)

被検査体の開口パターンに、前記被検査体の面に対して角度を変えつつ検査光を照射し、前記被検査体で反射された反射光又は前記開口パターンを透過した透過光の少なくとも何れかを検出することで前記開口パターンを検査する検査装置であって、
前記検査装置は前記被検査体を保持する検査用ステージを備え、
前記検査用ステージは、
水平面内で延在する第1のガイドシャフトと、
前記第1のガイドシャフトに滑動可能に結合された第1のスライダーと、
水平面内で前記第1のガイドシャフトと直交する方向に延在しその延在方向の端部が前記第1のスライダーに結合された第2のガイドシャフトと、
前記第2のガイドシャフトに滑動可能に結合され前記被検査体を保持する支持部材と、
を備えることを特徴とする開口パターンの検査装置。
At least one of reflected light reflected by the inspection object and transmitted light transmitted through the opening pattern is irradiated with inspection light while changing the angle with respect to the surface of the inspection object to the opening pattern of the inspection object An inspection device for inspecting the opening pattern by detecting
The inspection apparatus includes an inspection stage for holding the object to be inspected,
The inspection stage is:
A first guide shaft extending in a horizontal plane;
A first slider slidably coupled to the first guide shaft;
A second guide shaft extending in a direction perpendicular to the first guide shaft in a horizontal plane and having an end in the extending direction coupled to the first slider;
A support member that is slidably coupled to the second guide shaft and holds the object to be inspected;
An inspection apparatus for an opening pattern, comprising:
前記第1のガイドシャフトは互いに平行するように2本設けられ、前記第1のスライダーは前記2本の第1のガイドシャフトに滑動可能に結合され、
前記第2のガイドシャフトは互いに平行するように2本設けられ、前記2本の第2のガイドシャフトの延在方向の両端は、前記各第1のスライダーの前記第1のガイドシャフトに沿った延在方向の両端に結合されている、
ことを特徴とする請求項1記載の開口パターンの検査装置。
Two first guide shafts are provided in parallel to each other, and the first slider is slidably coupled to the two first guide shafts,
Two second guide shafts are provided so as to be parallel to each other, and both ends in the extending direction of the two second guide shafts are along the first guide shafts of the first sliders. Connected to both ends in the extending direction,
The opening pattern inspection apparatus according to claim 1.
前記支持部材は、前記第2のガイドシャフトに滑動可能に結合された第2のスライダーと、この第2のスライダーに取着される枠状のカセットホルダと、前記カセットホルダの内側に着脱可能に取着され前記被検査体の保持部が設けられたカセットとで構成されていることを特徴とする請求項1記載の開口パターンの検査装置。   The support member is slidably coupled to the second guide shaft, a frame-shaped cassette holder attached to the second slider, and detachably attached to the inside of the cassette holder. 2. The opening pattern inspection apparatus according to claim 1, wherein the opening pattern inspection apparatus is constituted by a cassette which is attached and provided with a holding portion for the object to be inspected. 前記保持部は前記カセットに設けられ中央に検査用開口が設けられるとともに、前記被検査体の外周部が載置される枠状の載置部と、前記載置部に臨ませて設けられ前記載置部に載置された前記被検査体を前記載置部に位置決めして取り付ける取り付け具とを備えていることを特徴とする請求項3記載の開口パターンの検査装置。
The holding portion is provided in the cassette and has an inspection opening in the center, a frame-like placement portion on which the outer peripheral portion of the object to be inspected is placed, and a front portion that faces the placement portion. 4. The opening pattern inspection apparatus according to claim 3, further comprising an attachment for positioning and attaching the object to be inspected placed on the placement portion to the placement portion.
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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2020067440A (en) * 2018-10-26 2020-04-30 株式会社トクヤマ Fixing jig

Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6433927A (en) * 1987-07-30 1989-02-03 Canon Kk Mask holder and mask conveying method using the same
JPH0250208A (en) * 1988-08-11 1990-02-20 Olympus Optical Co Ltd Placing body moving actuator
JPH0481754A (en) * 1990-07-24 1992-03-16 Fujitsu Ltd Defect confirmation device for phototool
JPH052262A (en) * 1991-06-26 1993-01-08 Hitachi Ltd Foreign body inspection device
JPH11317440A (en) * 1998-05-06 1999-11-16 Canon Inc Stage device, aligner, and manufacture of the devices
JP2000208395A (en) * 1999-01-12 2000-07-28 Toshiba Corp Method and system for inspecting substrate
JP2005147918A (en) * 2003-11-18 2005-06-09 Toppan Printing Co Ltd Periodic pattern irregularity inspection device
JP2005300884A (en) * 2004-04-12 2005-10-27 Sony Corp Mask inspection apparatus and mask inspection method

Patent Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6433927A (en) * 1987-07-30 1989-02-03 Canon Kk Mask holder and mask conveying method using the same
JPH0250208A (en) * 1988-08-11 1990-02-20 Olympus Optical Co Ltd Placing body moving actuator
JPH0481754A (en) * 1990-07-24 1992-03-16 Fujitsu Ltd Defect confirmation device for phototool
JPH052262A (en) * 1991-06-26 1993-01-08 Hitachi Ltd Foreign body inspection device
JPH11317440A (en) * 1998-05-06 1999-11-16 Canon Inc Stage device, aligner, and manufacture of the devices
JP2000208395A (en) * 1999-01-12 2000-07-28 Toshiba Corp Method and system for inspecting substrate
JP2005147918A (en) * 2003-11-18 2005-06-09 Toppan Printing Co Ltd Periodic pattern irregularity inspection device
JP2005300884A (en) * 2004-04-12 2005-10-27 Sony Corp Mask inspection apparatus and mask inspection method

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2020067440A (en) * 2018-10-26 2020-04-30 株式会社トクヤマ Fixing jig
JP7454331B2 (en) 2018-10-26 2024-03-22 株式会社トクヤマ Fixing jig

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