JP2007059510A - Lighting optical device, aligner and manufacturing method of micro device - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a lighting optical device for lighting a mask with an optimum lighting condition while balance of light is kept from a plurality of optical sources. <P>SOLUTION: The device is provided with: secondary optical source forming means 141 and 142 for forming a plurality of the secondary optical sources which are eccentric to a prescribed center based on light flux from a plurality of the optical sources 41 and 42; a capacitor optical system 200 leading light from the secondary optical source forming means to a face to be lighted; light volume measuring means 181 and 182 for measuring lighting light forming a plurality of the secondary optical sources or lighting light from a plurality of the secondary optical sources; a calculating means for calculating a correction value with respect to lighting light forming a plurality of the secondary optical sources or lighting light from a plurality of the secondary optical sources based on a measuring result of the light volume measuring means; and a correcting means for correcting a light volume in lighting light forming a plurality of the secondary optical sources or lighting light from a plurality of the secondary optical sources based on the respective correction values calculated by the calculating means. <P>COPYRIGHT: (C)2007,JPO&INPIT

Description

  The present invention relates to an illumination optical apparatus used for manufacturing a semiconductor integrated circuit, a liquid crystal display element, and the like, an exposure apparatus provided with the illumination optical apparatus, and a method of manufacturing a microdevice using the exposure apparatus.

  A liquid crystal display element, which is one of the micro devices, is usually formed by patterning a transparent thin film electrode on a glass substrate (plate) into a desired shape by a photolithography technique, and switching elements and electrodes such as TFT (Thin Film Transistor). Manufactured by forming wiring. In a manufacturing process using this photolithography technique, a projection exposure apparatus that projects and exposes a pattern, which is an original image formed on a mask, onto a plate coated with a photosensitive agent such as a photoresist via a projection optical system. It is used.

  Conventionally, after the relative alignment between the mask and the plate is performed, the pattern formed on the mask is collectively transferred to one shot area set on the plate, and the plate is moved stepwise after the transfer. A step-and-repeat type projection exposure apparatus (so-called stepper) that performs exposure of the shot area is often used.

  In recent years, a large area of a liquid crystal display element has been required, and accordingly, an expansion of an exposure area of a projection exposure apparatus used in a photolithography process is desired. In order to expand the exposure area of the projection exposure apparatus, it is necessary to enlarge the projection optical system. However, designing and manufacturing a large projection optical system in which residual aberrations are reduced as much as possible requires a large production cost. . Therefore, in order to avoid an increase in the size of the projection optical system, slit-like light having a length in the longitudinal direction set to the same extent as the effective diameter of the projection optical system on the object plane side (mask side) of the projection optical system is projected. In a state where the plate is irradiated through the optical system, the mask and the plate are scanned while being moved relative to the projection optical system, and a part of the pattern formed on the mask is sequentially set on the plate. A so-called step-and-scan type projection exposure apparatus has been devised in which transfer is performed to one shot area and the plate is moved after the transfer to perform exposure similarly to the other shot areas (see Patent Document 1).

JP-A-5-161588

  In the above-described projection exposure apparatus, the problem of defocus due to the bending that occurs in the plate occurs with an increase in the size of the plate, and modified illumination is used to increase the depth of focus. In addition, there is a projection exposure apparatus that includes a plurality of light sources and a plurality of optical systems that guide light from each light source to a mask in order to realize exposure with high throughput while avoiding an increase in the size of the exposure apparatus. In such a projection exposure apparatus, it is necessary to illuminate the mask under optimum illumination conditions while maintaining the balance of light from a plurality of light sources.

  An object of the present invention is to provide an illumination optical apparatus that illuminates a mask under an optimal illumination condition while maintaining a balance of light from a plurality of light sources, an exposure apparatus including the illumination optical apparatus, and a micro device using the exposure apparatus Is to provide a method.

  The illumination optical device according to the present invention includes a secondary light source forming unit that forms a plurality of secondary light sources that are decentered with respect to a predetermined center, based on light beams from a plurality of light sources, and light from the secondary light source forming unit. A condenser optical system that leads to the surface to be illuminated, a light amount measuring unit that measures illumination light that forms each of the plurality of secondary light sources, or each of the plurality of secondary light sources, and a measurement result of the light amount measuring unit And calculating means for calculating correction values for the illumination light respectively forming the plurality of secondary light sources or the illumination light from the plurality of secondary light sources, and calculating the correction values calculated by the calculation means. On the basis of this, it is provided with the correction means which correct | amends the light quantity in each illumination light which forms each of these secondary light sources, or each illumination light from these secondary light sources.

  According to the illumination optical device of the present invention, the plurality of secondary light sources are formed based on the measurement results of the illumination light forming the plurality of secondary light sources, respectively, or the respective illumination lights from the plurality of secondary light sources. Since the amount of light in the illumination light or each of the illumination light from the plurality of secondary light sources is corrected, the surface to be illuminated can be illuminated while maintaining the balance of the amount of illumination light from the plurality of light sources.

  The illumination optical device according to the present invention includes a secondary light source forming unit having a plurality of optical systems that form a plurality of secondary light sources that are decentered with respect to a predetermined center based on light beams from the plurality of light sources, A condenser optical system for guiding the light from the secondary light source forming means to the surface to be illuminated, and a measuring means for measuring the illumination conditions for each of the plurality of optical systems by measuring the illumination light from the plurality of secondary light sources, Based on the measurement results of the measuring means, calculation means for calculating correction values related to illumination conditions by the plurality of secondary light sources, respectively, and on the plurality of optical systems based on the correction values calculated by the calculation means Correction means for correcting illumination conditions.

  According to the illumination optical apparatus of the present invention, the illumination conditions related to the plurality of optical systems are corrected based on the results of measuring the illumination conditions related to the plurality of optical systems, while maintaining the balance of the illumination conditions in the plurality of optical systems. The illuminated surface can be illuminated.

  The microdevice manufacturing method of the present invention includes an exposure step of exposing a predetermined pattern onto a photosensitive substrate using the exposure apparatus of the present invention, and a development step of developing the photosensitive substrate exposed by the exposure step. It is characterized by including.

  According to the microdevice manufacturing method of the present invention, a good microdevice can be manufactured.

  According to the illumination optical device of the present invention, it is possible to illuminate the surface to be illuminated while maintaining the balance of the amount of illumination light from a plurality of light sources. In addition, it is possible to illuminate the surface to be illuminated while maintaining a balance of illumination conditions in the plurality of optical systems. Moreover, according to the microdevice manufacturing method of the present invention, a good microdevice can be manufactured.

  Hereinafter, a first embodiment of the present invention will be described with reference to the drawings. FIG. 1 is a view showing the schematic arrangement of the entire exposure apparatus according to the first embodiment of the present invention. As shown in FIG. 1, the exposure apparatus according to this embodiment includes an illumination optical apparatus IL for illuminating a mask (illuminated surface) M with a light beam emitted from a light source, and a pattern image of the mask M as a photosensitive material. A projection optical system PL for performing projection exposure on a flat panel display plate (photosensitive substrate) P having an outer diameter of (resist) applied larger than 500 mm is provided. In addition, that an outer diameter is larger than 500 mm means that one side or a diagonal is larger than 500 mm.

  FIG. 2 is a view showing a schematic configuration of the illumination optical device IL and the mask M provided in the exposure apparatus according to this embodiment. In the following description, the XYZ orthogonal coordinate system shown in FIG. 2 is set, and the positional relationship of each member will be described with reference to this XYZ orthogonal coordinate system. The XYZ orthogonal coordinate system is set so that the X axis and the Y axis are parallel to the plate P, and the Z axis is set in a direction orthogonal to the plate P.

  The illumination optical device IL includes four light sources (light sources 41 and 42 and two light sources not shown) and four illumination systems (illumination systems IL1 and IL2 and two illuminations not shown) that guide light from the light sources to the condenser lens 200. System). In the figure, only illumination systems IL1 and IL2 that are decentered in the X direction with respect to a predetermined center (the optical axis of the condenser lens) and only light sources 41 and 42 that supply illumination light to the illumination systems IL1 and IL2 are shown. The illustration of two illumination systems decentered in the Y direction and two light sources for supplying illumination light to the two illumination systems is omitted.

  As shown in FIG. 2, the illumination light emitted from the light source 41 is supplied to the illumination system IL1. The light source 41 is disposed at the first focal position of the elliptical mirror (concave mirror) 21 and is composed of an ultrahigh pressure mercury lamp that emits light in a wavelength region (i-line) including light having a wavelength of 365 nm. The light beam emitted from the light source 41 is reflected by the elliptical mirror 21 to be condensed at the second focal position of the elliptical mirror 21 to form a light source image. A shutter 61 is disposed at or near the second focal position of the elliptical mirror 21.

  The divergent light beam from the light source image formed at the second focal position of the elliptical mirror 21 is converted into a substantially parallel light beam by the relay lens 81 and enters the wavelength selection filter 101. The wavelength selection filter 101 transmits only a light beam in a desired wavelength region. The light beam that has passed through the wavelength selection filter 101 enters the transmittance distribution filter 121. The transmittance distribution filter 121 increases or decreases the total amount of illumination light transmitted.

  The light beam that has passed through the transmittance distribution filter 121 is incident on a fly-eye integrator (optical integrator) 141. The fly eye integrator 141 is configured by arranging a large number of positive lens elements vertically and horizontally and densely so that the central axis thereof extends along the optical axis of the illumination system IL1. Therefore, the light beam incident on the fly-eye integrator 141 is divided into wavefronts by a large number of lens elements, and a secondary light source consisting of the same number of light source images as the number of lens elements is formed on the rear focal plane (ie, in the vicinity of the exit surface). To do. That is, a substantial surface light source is formed on the rear focal plane of the fly eye integrator 141.

  Light beams from a number of secondary light sources formed on the rear focal plane of the fly eye integrator 141 are incident on the half mirror 161. The light beam reflected by the half mirror 161 enters the light amount detection device 181.

  FIG. 3 is a diagram illustrating a configuration of the light amount detection device. The light beam reflected by the half mirror 161 enters the lens 30, is converted into a substantially parallel light beam by the lens 30, and enters the half mirror 31. The light reflected by the half mirror 31 enters a sensor 32 that measures the amount of light. The light that has passed through the half mirror 31 is collected by the lens 33 and enters the sensor 34 that measures the center of gravity of the light amount.

  The sensor 32 is a sensor for detecting the amount of light at a position optically conjugate with the plate P. The sensor 32 allows the amount of light based on the optical system IL1 on the plate P to be reduced without reducing the throughput even during exposure. Can be detected. The sensor 34 is a sensor for measuring the center of gravity of the light quantity based on the optical system IL1, and the telecentricity of the optical system IL1 is calculated based on the measurement result.

  On the other hand, the light beam transmitted through the half mirror 161 enters the condenser lens 200. The light flux through the condenser lens 200 obliquely illuminates the mask M on which the pattern is formed.

  The light source 42 and the illumination system IL2 have the same configuration as the light source 41 and the illumination system IL1. That is, the illumination light emitted from the light source 42 is reflected by the elliptical mirror (concave mirror) 22 and condensed at the second focal position of the elliptical mirror 22 to form a light source image. A shutter 62 is disposed at or near the second focal position of the elliptical mirror 22. The divergent light beam from the light source image formed at the second focal position of the elliptical mirror 22 enters the fly eye integrator 142 via the relay lens 82, the wavelength selection filter 102, and the transmittance distribution filter 122.

  Light beams from a large number of secondary light sources formed on the rear focal plane of the fly eye integrator 142 are incident on the half mirror 162. The light beam reflected by the half mirror 162 enters the light amount detection device 182. On the other hand, the light beam transmitted through the half mirror 162 enters the condenser lens 200. The light flux through the condenser lens 200 obliquely illuminates the mask M on which the pattern is formed.

  In addition, two illumination systems that are decentered in the Y direction with respect to a predetermined center (not shown) and two light sources that supply illumination light to the two illumination systems also include the light sources 41 and 42 and the illumination systems IL1, It has the same configuration as IL2, detects the amount of illumination light, makes the illumination light incident on the condenser lens 200, and obliquely illuminates the mask M on which the pattern is formed by the light beam that passes through the condenser lens 200. .

  FIG. 4 is a diagram showing the fly-eye integrators 141 and 142 and the exit surfaces of two fly-eye integrators not shown in FIG. In the illumination optical device IL, four secondary light sources are formed by the illumination systems IL1 and IL2 and two illumination systems (not shown), and light from each secondary light source enters the condenser lens 200. The mask M on which the pattern is formed by the light beam passing through is illuminated obliquely.

  FIG. 5 is a view showing the relay lens 81 to the fly eye integrator 141 of the illumination system IL1. As shown in FIG. 5, the illumination system IL1 moves the driving device 51 and the fly eye integrator 141 for moving the relay lens 81 in the direction perpendicular to the optical axis of the illumination system IL1 in the optical axis direction of the illumination system IL1. The drive device 52 is provided. The driving devices 51 and 52 are controlled by the control device 500. A detection result is input from the light amount detection device 181 to the control device 500. In addition, the control device 500 outputs a control signal for controlling the power value to the light source 41.

  The control device 500 receives detection results from the light quantity detection device 182 of the illumination system IL2, and receives detection results from two light quantity detection devices of the illumination system (not shown). The control device 500 outputs a control signal for controlling the power value to the light source 42 of the illumination system IL2 and the light sources of two illumination systems (not shown). Further, the control device 500 moves the relay lens 82 of the illumination system IL2 in the direction perpendicular to the optical axis of the illumination system IL2 and the fly eye integrator 142 in the direction of the optical axis of the illumination system IL2. A control signal is output to the driving device. In addition, the driving device for moving the relay lens of two illumination systems (not shown) in the direction perpendicular to the optical axis of the illumination system and the driving device for moving the fly eye integrator in the optical axis direction of the illumination system are controlled. The signal is output.

  In this illumination optical device IL, when the detection results from the light amount detection devices 181 and 182 of the illumination systems IL1 and IL2 and the light amount detection devices of two illumination systems (not shown) are input to the control device 500, the control device 500 detects Among the results, based on the light amount detection value, the correction values for the illumination lights from the illumination systems IL1 and IL2 and the secondary light sources of the two illumination systems (not shown) are calculated, and based on the calculated correction values. The amount of light in each illumination light from the illumination systems IL1 and IL2 and secondary light sources of two illumination systems (not shown) is corrected. For example, the control device 500 outputs a control signal for controlling the power value to the light sources 41 and 42 and two light sources (not shown) based on the calculated correction values. In order to correct the amount of illumination light from the illumination systems IL1 and IL2 and the secondary light sources of two illumination systems (not shown), a transmittance distribution filter having different transmittance depending on the transmission region is provided and calculated. Based on each correction value, the amount of illumination light from each of the illumination systems IL1 and IL2 and the secondary light sources of two illumination systems (not shown) may be corrected by changing the region through which the illumination light is transmitted. Good.

  Further, in the control device 500, the illumination systems IL1, IL2 based on the value of the center of gravity of the light quantity among the detection results of the light quantity detection apparatuses 181 and 182 of the illumination systems IL1 and IL2 and the light quantity detection apparatuses of two illumination systems (not shown). And telecentricity (magnification telecentricity and tilted telecentricity), which is the illumination condition of two illumination systems (not shown), is calculated, and the magnification telecentricity and tilt for the illumination systems IL1, IL2 and two illumination systems (not shown) are calculated. A telecentricity correction value is calculated, and based on each of the calculated correction values, the magnification telecentricity and the inclined telecentricity of the illumination systems IL1 and IL2 and two illumination systems (not shown) are corrected.

  For example, the control device 500 is a drive device for moving the illumination systems IL1 and IL2 and the relay lenses of two illumination systems (not shown) in a direction perpendicular to the optical axis of the illumination system based on the calculated correction values. On the other hand, a control signal is output to correct the tilt telecentricity of each of the illumination systems IL1 and IL2 and two illumination systems (not shown). In addition, the control device 500 applies a driving device for moving the illumination systems IL1 and IL2 and the fly-eye integrator of two illumination systems (not shown) in the optical axis direction of the illumination system based on the calculated correction values. A control signal is output to correct the magnification telecentricity of each of the illumination systems IL1 and IL2 and two illumination systems (not shown).

  According to the illumination optical apparatus according to the first embodiment, the amount of light in each illumination light from the plurality of secondary light sources is corrected based on the result of measuring each illumination light from the plurality of secondary light sources. Therefore, it is possible to illuminate the surface to be illuminated while maintaining the balance of the amount of illumination light from the plurality of light sources.

  Further, in order to correct the illumination conditions related to the plurality of optical systems based on the measurement results of the illumination conditions related to the plurality of optical systems, it is possible to illuminate the surface to be illuminated while maintaining the balance of the illumination conditions in the plurality of optical systems. it can.

  Next, a second embodiment of the present invention will be described with reference to the drawings. FIG. 6 is a view showing a schematic configuration of the illumination optical apparatus IL10 and the mask M1 provided in the exposure apparatus according to the embodiment of the present invention. In the following description, the XYZ orthogonal coordinate system shown in FIG. 6 is set, and the positional relationship of each member will be described with reference to this XYZ orthogonal coordinate system. The XYZ orthogonal coordinate system is set so that the X axis and the Y axis are parallel to the plate P, and the Z axis is set in a direction orthogonal to the plate P.

  The illumination optical device IL10 includes three light sources (light sources 43, 44, and 45), partial illumination systems 71, 72, and 73 that guide light from each light source to the optical fiber bundle 70, and light emitted from the fiber bundle 70 as a condenser lens. There are four partial illumination systems (partial illumination systems 74 and 75 and two partial illumination systems not shown) led to 201. In the figure, of the four partial illumination systems, only partial illumination systems 74 and 75 decentered in the X direction with respect to a predetermined center (optical axis of the condenser lens) are shown, and two decentered in the Y direction with respect to the predetermined center. The illustration of the partial illumination system is omitted.

  The illumination light emitted from the light source 43 is reflected by the elliptical mirror 23 and condensed at the second focal position of the elliptical mirror 23 to form a light source image. A shutter 63 is disposed at or near the second focal position of the elliptical mirror 23.

  The divergent light beam from the light source image formed at the second focal position of the elliptical mirror 23 is converted into a substantially parallel light beam by the relay lens 71a and enters the wavelength selection filter 71b. The light beam that has passed through the wavelength selection filter 71b is collected by the condensing lens 71c and enters the first incident end 70a of the fiber bundle 70 having three incident ends.

  The partial illumination systems 72 and 73 have the same configuration as the partial illumination system 71. The illumination light emitted from the light source 44 and the light source 45 is incident on the second incident end 70b and the third incident end 70c of the fiber bundle 70 via the partial illumination systems 72 and 73.

  The fiber bundle 70 is a random light guide fiber that is configured by randomly bundling a large number of fiber strands, and includes three incident ends 70a, 70b, and 70c and four exit ends (exit ends 70d and 70e and 2 not shown). Two injection ends). The light incident on the incident end of the fiber bundle 70 is mixed by propagating through the inside of the fiber bundle 70, and emitted from the exit ends 70d and 70e of the fiber bundle 70 and two exit ends (not shown).

  The light beam emitted from the exit end 70d of the fiber bundle 70 enters the fly eye integrator 74c via the collimating lens 74a and the transmittance distribution filter 74b. Here, the transmittance distribution filter 74b is a filter having a different transmittance for each region through which the illumination light is transmitted. The light beam from the secondary light source formed on the rear focal plane of the fly eye integrator 74c enters the half mirror 74d. The light beam reflected by the half mirror 74d enters the light amount detection device 183. On the other hand, the light beam transmitted through the half mirror 74d enters the condenser lens 201. The light flux through the condenser lens 201 illuminates the mask M1 on which the pattern is formed obliquely.

  The light beam emitted from the exit end 70e of the fiber bundle 70 enters the fly eye integrator 75c via the collimator lens 75a and the transmittance distribution filter 75b. The light beam from the secondary light source formed on the rear focal plane of the fly eye integrator 75c enters the half mirror 75d. The light beam reflected by the half mirror 75d enters the light amount detection device 184. On the other hand, the light beam transmitted through the half mirror 75d enters the condenser lens 201. The light flux through the condenser lens 201 illuminates the mask M1 on which the pattern is formed obliquely.

  Note that light beams emitted from two exit ends (not shown) of the fiber bundle 70 enter two partial illumination systems (not shown). In the partial illumination system, the light enters the fly eye integrator via a collimating lens and a transmittance distribution filter. The light beam from the secondary light source formed on the rear focal plane of the fly eye integrator enters the half mirror. The light beam reflected by the half mirror enters the light amount detection device. Here, the light amount detection devices 183 and 184 and two light amount detection devices (not shown) have the same configuration as the light amount detection devices 181 and 182 according to the first embodiment. On the other hand, the light beam that has passed through the half mirror enters the condenser lens 201. The light flux through the condenser lens 201 illuminates the mask M1 on which the pattern is formed obliquely.

  In the illumination optical device IL10, when the detection results by the light amount detection devices 183 and 184 of the partial illumination systems 74 and 75 and the light amount detection devices of two partial illumination systems (not shown) are input to the control device (not shown), The control device calculates a correction value for each illumination light from the secondary light sources of the partial illumination systems 74 and 75 and two partial illumination systems (not shown) based on the detection value of the light amount among the detection results. Based on each correction value, the light quantity in each illumination light from the partial illumination systems 74 and 75 and secondary light sources of two illumination systems (not shown) is corrected. For example, the control device transmits light in order to correct the amount of illumination light from the partial illumination systems 74 and 75 and secondary light sources of two partial illumination systems (not shown) based on the calculated correction values. By changing the areas where the illumination light is transmitted in the rate distribution filter, the light amounts of the illumination lights from the partial illumination systems 74 and 75 and secondary light sources of two partial illumination systems (not shown) are corrected.

  Further, in the control device, the partial illumination systems 74, 184 are based on the value of the center of gravity of the light amount among the detection results of the light amount detection devices 183, 184 of the partial illumination systems 74, 75 and the light amount detection devices of two illumination systems not shown. The telecentricity (magnification telecentricity and inclination telecentricity) of 75 and two partial illumination systems (not shown) is calculated, and the magnification telecentricity and inclination for the partial illumination systems 74 and 75 and two partial illumination systems (not shown) are calculated. A telecentricity correction value is calculated, and based on the calculated correction values, magnification telecentricity and tilted telecentricity of the partial illumination systems 74 and 75 and two partial illumination systems (not shown) are corrected.

  For example, the control device drives for moving the partial illumination systems 74 and 75 and the relay lenses of two partial illumination systems (not shown) in a direction perpendicular to the optical axis of the partial illumination system based on the calculated correction values. A control signal is output to a device (not shown) to correct the tilt telecentricity of the partial illumination systems 74 and 75 and two partial illumination systems (not shown). Further, the control device drives the partial illumination systems 74 and 75 and two fly-eye integrators of two partial illumination systems (not shown) in the optical axis direction of the partial illumination systems based on the calculated correction values ( A control signal is output to (not shown), and the magnification telecentricity of each of the partial illumination systems 74 and 75 and two illumination systems (not shown) is corrected.

  According to the illumination optical apparatus according to the second embodiment, the amount of light in each illumination light from the plurality of secondary light sources is corrected based on the result of measuring each illumination light from the plurality of secondary light sources. Therefore, it is possible to illuminate the surface to be illuminated while maintaining the balance of the amount of illumination light from the plurality of light sources.

  Further, in order to correct the illumination conditions related to the plurality of optical systems based on the measurement results of the illumination conditions related to the plurality of optical systems, it is possible to illuminate the surface to be illuminated while maintaining the balance of the illumination conditions in the plurality of optical systems. it can.

  Next, a third embodiment of the present invention will be described with reference to the drawings. FIG. 7 is a view showing a schematic configuration of the illumination optical apparatus IL20 and the mask M2 provided in the exposure apparatus according to the third embodiment of the present invention. In the following description, the XYZ rectangular coordinate system shown in FIG. 7 is set, and the positional relationship of each member will be described with reference to this XYZ rectangular coordinate system. The XYZ orthogonal coordinate system is set so that the X axis and the Y axis are parallel to the plate P, and the Z axis is set in a direction orthogonal to the plate P.

  The illumination optical device IL20 includes four light sources (light sources 46 and 47 and two light sources (not shown)) and four illumination systems (illumination systems IL3 and IL4 and two illuminations (not shown) that guide light from the light sources to the condenser lens 202. System). In the figure, only illumination systems IL3 and IL4 that are decentered in the X direction with respect to a predetermined center (the optical axis of the condenser lens) and only light sources 46 and 47 that supply illumination light to the illumination systems IL3 and IL4 are shown. The illustration of two illumination systems decentered in the Y direction and two light sources for supplying illumination light to the two illumination systems is omitted.

  As shown in FIG. 7, the illumination light emitted from the light source 46 is supplied to the illumination system IL3. The light source 46 includes a light emitting diode array in which light emitting diodes (solid light sources) are arranged in an array. The light beam emitted from the light source 46 is converted into a substantially parallel light beam by the relay lens 83 and enters the wavelength selection filter 103. The wavelength selection filter 103 transmits only a light beam in a desired wavelength region. The light beam that has passed through the wavelength selection filter 103 enters a fly eye integrator (optical integrator) 143. Light beams from a number of secondary light sources formed on the rear focal plane of the fly eye integrator 143 enter the half mirror 163. The light beam reflected by the half mirror 163 enters the light amount detection device 185. On the other hand, the light beam transmitted through the half mirror 163 enters the condenser lens 202. The light flux through the condenser lens 202 obliquely illuminates the mask M2 on which the pattern is formed.

  The light source 47 and the illumination system IL4 have the same configuration as the light source 46 and the illumination system IL3. That is, the illumination light emitted from the light source 47 is incident on the fly eye integrator 144 via the relay lens 84 and the wavelength selection filter 104.

  Light beams from a number of secondary light sources formed on the rear focal plane of the fly eye integrator 144 enter the half mirror 164. The light beam reflected by the half mirror 164 enters the light amount detection device 186. On the other hand, the light beam transmitted through the half mirror 164 enters the condenser lens 202. The light flux through the condenser lens 202 obliquely illuminates the mask M2 on which the pattern is formed.

  In addition, two illumination systems that are decentered in the Y direction with respect to a predetermined center (not shown) and two light sources that supply illumination light to the two illumination systems are also a light source 46, 47 and an illumination system IL3. It has a configuration similar to that of IL4, detects the amount of illumination light, makes the illumination light incident on the condenser lens 202, and obliquely illuminates the mask M2 on which the pattern is formed by a light beam that passes through the condenser lens 202.

  In the illumination optical device IL20, when detection results from the light amount detection devices 185 and 186 of the illumination systems IL3 and IL4 and the light amount detection devices of two illumination systems (not shown) are input to the control device (not shown), the control device. Calculates the correction value for each illumination light from the secondary light sources of the illumination systems IL3 and IL4 and two illumination systems (not shown) based on the detection value of the light quantity among the detection results, and calculates each correction value Based on the above, the light quantity in each illumination light from the illumination systems IL3 and IL4 and secondary light sources of two illumination systems (not shown) is corrected. For example, the control device outputs a control signal for controlling the power value to the light sources 46 and 47 and two light sources (not shown) based on the calculated correction values. In order to correct the amount of illumination light from the illumination systems IL3 and IL4 and the secondary light sources of the two illumination systems (not shown), a transmittance distribution filter having different transmittance depending on the transmission region is provided and calculated. Based on each correction value, the amount of illumination light transmitted from the illumination systems IL3 and IL4 and the secondary light sources of two illumination systems (not shown) may be corrected by changing the region through which the illumination light is transmitted. Good.

  Further, in the control device, the illumination systems IL3, IL4 and the illumination systems IL3, IL4 and the illumination systems IL3, IL4 based on the value of the light center of gravity among the detection results of the light quantity detection devices 185, 186 of the illumination systems IL3, IL4 and the two illumination system light quantity detection devices (not shown). The telecentricity (magnification telecentricity and tilted telecentricity) of two illumination systems (not shown) is calculated to correct the magnification telecentricity and tilted telecentricity for the illumination systems IL3 and IL4 and the two illumination systems (not shown). A value is calculated, and magnification telecentricity and tilted telecentricity of the illumination systems IL3 and IL4 and two illumination systems (not shown) are corrected based on the calculated correction values.

  For example, the control device drives the illumination systems IL3 and IL4 and the two illumination system relay lenses (not shown) based on the calculated correction values in a direction perpendicular to the optical axis of the illumination system (see FIG. A control signal is output to the illumination systems IL3 and IL4 and two illumination systems (not shown) to correct the tilt telecentricity. Further, the control device drives the illumination systems IL3 and IL4 and two fly-eye integrators (not shown) based on the calculated correction values in the direction of the optical axis of the illumination system (not shown). A control signal is outputted to the illumination systems IL3 and IL4, and the magnification telecentricity of each of the two illumination systems (not shown) is corrected.

  According to the illumination optical apparatus according to the third embodiment, the amount of light in each illumination light from the plurality of secondary light sources is corrected based on the result of measuring each illumination light from the plurality of secondary light sources. Therefore, it is possible to illuminate the surface to be illuminated while maintaining the balance of the amount of illumination light from the plurality of light sources.

  Further, in order to correct the illumination conditions related to the plurality of optical systems based on the measurement results of the illumination conditions related to the plurality of optical systems, it is possible to illuminate the surface to be illuminated while maintaining the balance of the illumination conditions in the plurality of optical systems. it can.

  In each of the above-described embodiments, the illumination light is branched by a half mirror on the downstream side of each fly eye integrator, and the amount of illumination light is measured. That is, each illumination light from a plurality of secondary light sources is measured, but the illumination light may be branched by a half mirror on the upstream side of each fly eye integrator to measure the amount of illumination light. That is, the illumination light that forms each of the plurality of secondary light sources may be measured. In this case, the correction values for the illumination lights that respectively form the plurality of secondary light sources are calculated based on the measurement results, and the illumination lights that respectively form the plurality of secondary light sources based on the calculated correction values. Correct the amount of light.

  In the above-described embodiment, the telecentricity is measured as the illumination condition. However, the illumination unevenness related to the plurality of optical systems is measured by measuring the illumination light from the plurality of secondary light sources. Then, based on the measurement result, correction values related to illumination unevenness by a plurality of secondary light sources may be calculated, respectively, and illumination unevenness related to a plurality of optical systems may be corrected based on the calculated correction values.

  In an embodiment in which a plurality of light sources are used but no fiber is used, it is desirable to control the lighting operation of the plurality of light sources in synchronization with the shutter operation. For example, the control of turning on and off the plurality of light sources or the control of arbitrarily blocking the light from the plurality of light sources may be performed in synchronization with the shutter.

  In the exposure apparatus according to the above-described embodiment, the illumination optical apparatus illuminates the mask (illumination process), and the photosensitive pattern (wafer) is exposed to the transfer pattern formed on the mask using the projection optical system ( By the exposure step, a micro device (semiconductor element, imaging element, liquid crystal display element, thin film magnetic head, etc.) can be manufactured. FIG. 8 is a flowchart of an example of a method for obtaining a semiconductor device as a micro device by forming a predetermined circuit pattern on a plate or the like as a photosensitive substrate using the exposure apparatus according to the above-described embodiment. Will be described with reference to FIG.

  First, in step S301 in FIG. 8, a metal film is deposited on one lot of plates. In the next step S302, a photoresist is applied on the metal film on the one lot of plates. Next, in step S303, using the exposure apparatus according to the above-described embodiment, the image of the pattern on the reticle (mask) is sequentially applied to each shot area on the plate of the one lot via the projection optical system. Exposure transferred. Thereafter, in step S304, the photoresist on the one lot of plates is developed, and in step S305, etching is performed on the one lot of plates using the resist pattern as a mask to obtain a pattern on the mask. Corresponding circuit patterns are formed in each shot area on each plate.

  Thereafter, a device pattern such as a semiconductor element is manufactured by forming a circuit pattern of an upper layer. According to the semiconductor device manufacturing method described above, exposure is performed using the illumination optical apparatus according to the above-described embodiment, that is, the exposure apparatus including the illumination optical apparatus that can supply illumination light in a balanced manner. A semiconductor device having a fine circuit pattern can be obtained with high throughput. In steps S301 to S305, a metal is vapor-deposited on the plate, a resist is applied on the metal film, and exposure, development and etching processes are performed. Prior to these processes, the process is performed on the plate. It is needless to say that after forming a silicon oxide film, a resist may be applied on the silicon oxide film, and steps such as exposure, development, and etching may be performed.

  In the exposure apparatus according to the above-described embodiment, a liquid crystal display element as a micro device can be obtained by forming a predetermined pattern (circuit pattern, electrode pattern, etc.) on a plate (glass substrate). Hereinafter, an example of the technique at this time will be described with reference to the flowchart of FIG. Next, in FIG. 9, in the pattern formation step S401, so-called photolithography, in which the pattern of the mask is transferred and exposed to a photosensitive substrate (such as a glass substrate coated with a resist) using the exposure apparatus according to the above-described embodiment. The process is executed. By this photolithography process, a predetermined pattern including a large number of electrodes and the like is formed on the photosensitive substrate. Thereafter, the exposed substrate undergoes steps such as a developing step, an etching step, and a resist stripping step, whereby a predetermined pattern is formed on the substrate, and the process proceeds to the next color filter forming step S402.

  Next, in the color filter forming step S402, a large number of groups of three dots corresponding to R (Red), G (Green), and B (Blue) are arranged in a matrix or three of R, G, and B A color filter is formed by arranging a plurality of stripe filter sets in the horizontal scanning line direction. Then, after the color filter formation step S402, a cell assembly step S403 is executed. In the cell assembly step S403, a liquid crystal panel (liquid crystal cell) is assembled using the substrate having the predetermined pattern obtained in the pattern formation step S401, the color filter obtained in the color filter formation step S402, and the like. In the cell assembly step S403, for example, liquid crystal is injected between the substrate having the predetermined pattern obtained in the pattern formation step S401 and the color filter obtained in the color filter formation step S402, and a liquid crystal panel (liquid crystal cell ).

  Thereafter, in a module assembly step S404, components such as an electric circuit and a backlight for performing a display operation of the assembled liquid crystal panel (liquid crystal cell) are attached to complete a liquid crystal display element. According to the above-described method for manufacturing a liquid crystal display element, exposure is performed using the illumination optical apparatus according to the above-described embodiment, that is, the exposure apparatus including the illumination optical apparatus that can supply illumination light in a balanced manner. Thus, a liquid crystal display element having an extremely fine circuit pattern can be obtained with high throughput.

It is a figure which shows schematic structure of the exposure apparatus concerning 1st Embodiment. It is a figure which shows schematic structure of the illumination optical apparatus concerning 1st Embodiment. It is a figure which shows schematic structure of the light quantity detection apparatus concerning 1st Embodiment. It is a figure which shows the injection | emission surface of the fly eye integrator concerning 1st Embodiment. It is a figure which shows from the relay lens of the illumination optical apparatus concerning 1st Embodiment to a fly eye integrator. It is a figure which shows schematic structure of the illumination optical apparatus concerning 2nd Embodiment. It is a figure which shows schematic structure of the illumination optical apparatus concerning 3rd Embodiment. It is a flowchart which shows the method of manufacturing the semiconductor device as a microdevice concerning embodiment. It is a flowchart which shows the method of manufacturing the liquid crystal display element as a micro device concerning embodiment.

Explanation of symbols

41-47 ... light source, 141,142,143,144,74c, 75c ... fly eye integrator, 181-186 ... light quantity detection device, 200,201,202 ... condenser lens, IL ... illumination optical device, IL1-IL4 ... illumination System, 71-75 ... Partial illumination system, PL ... Projection optical system, M, M1, M2 ... Mask, P ... Plate

Claims (8)

Secondary light source forming means for forming a plurality of secondary light sources decentered with respect to a predetermined center based on light fluxes from the plurality of light sources;
A condenser optical system that guides light from the secondary light source forming means to an illuminated surface;
A light amount measuring means for measuring the illumination light that respectively forms the plurality of secondary light sources or the illumination light from the plurality of secondary light sources;
Calculation means for calculating a correction value for illumination light respectively forming the plurality of secondary light sources or for each illumination light from the plurality of secondary light sources based on a measurement result of the light amount measurement means;
Correction means for correcting the amount of illumination light forming each of the plurality of secondary light sources or the amount of illumination light from each of the plurality of secondary light sources based on each correction value calculated by the calculation means;
An illumination optical apparatus comprising:   2. The secondary light source forming means includes a plurality of optical systems for forming a plurality of secondary light sources decentered with respect to a predetermined center based on light beams from the plurality of light sources. Illumination optical device. Secondary light source forming means having a plurality of optical systems for forming a plurality of secondary light sources decentered with respect to a predetermined center based on light fluxes from the plurality of light sources;
A condenser optical system that guides light from the secondary light source forming means to an illuminated surface;
Measuring means for measuring each illumination light from the plurality of secondary light sources and measuring illumination conditions relating to the plurality of optical systems;
Calculation means for calculating correction values related to illumination conditions by the plurality of secondary light sources based on measurement results of the measurement means;
Correction means for correcting illumination conditions related to the plurality of optical systems based on each correction value calculated by the calculation means;
An illumination optical apparatus comprising:   4. The illumination optical apparatus according to claim 3, wherein the illumination condition includes telecentricity or illumination unevenness. In an exposure apparatus that exposes a predetermined pattern illuminated by illumination light emitted from a light source onto a photosensitive substrate via a projection optical system,
An exposure apparatus comprising the illumination optical apparatus according to any one of claims 1 to 4.   6. The exposure apparatus according to claim 5, wherein the photosensitive substrate has an outer diameter larger than 500 mm.   The exposure apparatus according to claim 5, wherein the photosensitive substrate is for a flat panel display. An exposure step of exposing a predetermined pattern on a photosensitive substrate using the exposure apparatus according to any one of claims 5 to 7,
A developing step of developing the photosensitive substrate exposed by the exposing step;
A method for manufacturing a microdevice, comprising:

Images