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JP2005232195A - Thermosetting resin composition and its cured coating film - Google Patents

Thermosetting resin composition and its cured coating film Download PDF

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Publication number
JP2005232195A
JP2005232195A JP2004029859A JP2004029859A JP2005232195A JP 2005232195 A JP2005232195 A JP 2005232195A JP 2004029859 A JP2004029859 A JP 2004029859A JP 2004029859 A JP2004029859 A JP 2004029859A JP 2005232195 A JP2005232195 A JP 2005232195A
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resin composition
group
thermosetting resin
acid
compound
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Inventor
Hiromitsu Morino
博満 森野
Tadahiro Miyoshi
忠大 三由
Shiyuuko Yamashita
周子 山下
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Taiyo Holdings Co Ltd
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Taiyo Ink Mfg Co Ltd
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Priority to JP2004029859A priority Critical patent/JP2005232195A/en
Priority to TW094103086A priority patent/TW200536886A/en
Priority to CNB2005100052863A priority patent/CN100457809C/en
Priority to KR1020050010410A priority patent/KR20060041704A/en
Publication of JP2005232195A publication Critical patent/JP2005232195A/en
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    • AHUMAN NECESSITIES
    • A61MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61LMETHODS OR APPARATUS FOR STERILISING MATERIALS OR OBJECTS IN GENERAL; DISINFECTION, STERILISATION OR DEODORISATION OF AIR; CHEMICAL ASPECTS OF BANDAGES, DRESSINGS, ABSORBENT PADS OR SURGICAL ARTICLES; MATERIALS FOR BANDAGES, DRESSINGS, ABSORBENT PADS OR SURGICAL ARTICLES
    • A61L15/00Chemical aspects of, or use of materials for, bandages, dressings or absorbent pads
    • A61L15/16Bandages, dressings or absorbent pads for physiological fluids such as urine or blood, e.g. sanitary towels, tampons
    • A61L15/18Bandages, dressings or absorbent pads for physiological fluids such as urine or blood, e.g. sanitary towels, tampons containing inorganic materials
    • AHUMAN NECESSITIES
    • A61MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61LMETHODS OR APPARATUS FOR STERILISING MATERIALS OR OBJECTS IN GENERAL; DISINFECTION, STERILISATION OR DEODORISATION OF AIR; CHEMICAL ASPECTS OF BANDAGES, DRESSINGS, ABSORBENT PADS OR SURGICAL ARTICLES; MATERIALS FOR BANDAGES, DRESSINGS, ABSORBENT PADS OR SURGICAL ARTICLES
    • A61L15/00Chemical aspects of, or use of materials for, bandages, dressings or absorbent pads
    • A61L15/16Bandages, dressings or absorbent pads for physiological fluids such as urine or blood, e.g. sanitary towels, tampons
    • A61L15/20Bandages, dressings or absorbent pads for physiological fluids such as urine or blood, e.g. sanitary towels, tampons containing organic materials
    • AHUMAN NECESSITIES
    • A61MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61LMETHODS OR APPARATUS FOR STERILISING MATERIALS OR OBJECTS IN GENERAL; DISINFECTION, STERILISATION OR DEODORISATION OF AIR; CHEMICAL ASPECTS OF BANDAGES, DRESSINGS, ABSORBENT PADS OR SURGICAL ARTICLES; MATERIALS FOR BANDAGES, DRESSINGS, ABSORBENT PADS OR SURGICAL ARTICLES
    • A61L15/00Chemical aspects of, or use of materials for, bandages, dressings or absorbent pads
    • A61L15/16Bandages, dressings or absorbent pads for physiological fluids such as urine or blood, e.g. sanitary towels, tampons
    • A61L15/42Use of materials characterised by their function or physical properties
    • A61L15/46Deodorants or malodour counteractants, e.g. to inhibit the formation of ammonia or bacteria
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B82NANOTECHNOLOGY
    • B82YSPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y30/00Nanotechnology for materials or surface science, e.g. nanocomposites
    • AHUMAN NECESSITIES
    • A61MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61FFILTERS IMPLANTABLE INTO BLOOD VESSELS; PROSTHESES; DEVICES PROVIDING PATENCY TO, OR PREVENTING COLLAPSING OF, TUBULAR STRUCTURES OF THE BODY, e.g. STENTS; ORTHOPAEDIC, NURSING OR CONTRACEPTIVE DEVICES; FOMENTATION; TREATMENT OR PROTECTION OF EYES OR EARS; BANDAGES, DRESSINGS OR ABSORBENT PADS; FIRST-AID KITS
    • A61F13/00Bandages or dressings; Absorbent pads
    • A61F13/15Absorbent pads, e.g. sanitary towels, swabs or tampons for external or internal application to the body; Supporting or fastening means therefor; Tampon applicators
    • A61F13/84Accessories, not otherwise provided for, for absorbent pads
    • A61F13/8405Additives, e.g. for odour, disinfectant or pH control
    • A61F2013/8408Additives, e.g. for odour, disinfectant or pH control with odour control
    • A61F2013/8414Additives, e.g. for odour, disinfectant or pH control with odour control with anti-microbic
    • AHUMAN NECESSITIES
    • A61MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61LMETHODS OR APPARATUS FOR STERILISING MATERIALS OR OBJECTS IN GENERAL; DISINFECTION, STERILISATION OR DEODORISATION OF AIR; CHEMICAL ASPECTS OF BANDAGES, DRESSINGS, ABSORBENT PADS OR SURGICAL ARTICLES; MATERIALS FOR BANDAGES, DRESSINGS, ABSORBENT PADS OR SURGICAL ARTICLES
    • A61L2300/00Biologically active materials used in bandages, wound dressings, absorbent pads or medical devices
    • A61L2300/10Biologically active materials used in bandages, wound dressings, absorbent pads or medical devices containing or releasing inorganic materials
    • A61L2300/102Metals or metal compounds, e.g. salts such as bicarbonates, carbonates, oxides, zeolites, silicates
    • A61L2300/104Silver, e.g. silver sulfadiazine
    • AHUMAN NECESSITIES
    • A61MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61LMETHODS OR APPARATUS FOR STERILISING MATERIALS OR OBJECTS IN GENERAL; DISINFECTION, STERILISATION OR DEODORISATION OF AIR; CHEMICAL ASPECTS OF BANDAGES, DRESSINGS, ABSORBENT PADS OR SURGICAL ARTICLES; MATERIALS FOR BANDAGES, DRESSINGS, ABSORBENT PADS OR SURGICAL ARTICLES
    • A61L2300/00Biologically active materials used in bandages, wound dressings, absorbent pads or medical devices
    • A61L2300/20Biologically active materials used in bandages, wound dressings, absorbent pads or medical devices containing or releasing organic materials
    • A61L2300/30Compounds of undetermined constitution extracted from natural sources, e.g. Aloe Vera
    • AHUMAN NECESSITIES
    • A61MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61LMETHODS OR APPARATUS FOR STERILISING MATERIALS OR OBJECTS IN GENERAL; DISINFECTION, STERILISATION OR DEODORISATION OF AIR; CHEMICAL ASPECTS OF BANDAGES, DRESSINGS, ABSORBENT PADS OR SURGICAL ARTICLES; MATERIALS FOR BANDAGES, DRESSINGS, ABSORBENT PADS OR SURGICAL ARTICLES
    • A61L2300/00Biologically active materials used in bandages, wound dressings, absorbent pads or medical devices
    • A61L2300/60Biologically active materials used in bandages, wound dressings, absorbent pads or medical devices characterised by a special physical form
    • A61L2300/62Encapsulated active agents, e.g. emulsified droplets
    • A61L2300/622Microcapsules
    • AHUMAN NECESSITIES
    • A61MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61LMETHODS OR APPARATUS FOR STERILISING MATERIALS OR OBJECTS IN GENERAL; DISINFECTION, STERILISATION OR DEODORISATION OF AIR; CHEMICAL ASPECTS OF BANDAGES, DRESSINGS, ABSORBENT PADS OR SURGICAL ARTICLES; MATERIALS FOR BANDAGES, DRESSINGS, ABSORBENT PADS OR SURGICAL ARTICLES
    • A61L2300/00Biologically active materials used in bandages, wound dressings, absorbent pads or medical devices
    • A61L2300/60Biologically active materials used in bandages, wound dressings, absorbent pads or medical devices characterised by a special physical form
    • A61L2300/62Encapsulated active agents, e.g. emulsified droplets
    • A61L2300/624Nanocapsules

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  • General Physics & Mathematics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Epoxy Resins (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Non-Metallic Protective Coatings For Printed Circuits (AREA)
  • Compositions Of Macromolecular Compounds (AREA)

Abstract

<P>PROBLEM TO BE SOLVED: To provide a thermosetting resin composition which reduces hydrolyzing properties useful as a solder resist used in manufacturing printed-wiring boards and a marking ink, excels in heat resistance, chemical resistance, adhesion, electrical insulation properties and the like, is halogen-free, and has stabilized flame retardance, furthermore a thermosetting resin composition which excels in folding resistance suitably used in a semiconductor carrier tape and a solder resist for flexible printed-wiring boards and reduces warpage after curing, and its cured coating film. <P>SOLUTION: The thermosetting resin composition comprises (A) a carboxyl group-containing unsaturated polyester resin having one or more carboxyl groups and an ethylenically unsaturated group in one molecule, (B) a resin having two or more epoxy groups in one molecule, (C) an amine based active hydrogen compound, and (D) a phosphoric acid amide compound represented by formula (I). <P>COPYRIGHT: (C)2005,JPO&NCIPI

Description

本発明は、プリント配線板の製造に有用なハロゲンフリーで難燃性を有する熱硬化性樹脂組成物に関する。更に詳しくは、プリント配線板に用いられるソルダーレジストやマーキングインキとして有用な加水分解性が低く、はんだ耐熱性、耐薬品性、密着性、電気絶縁性等に優れ、かつハロゲンフリーで安定した難燃性を有する熱硬化性樹脂組成物、さらにTAB(Tape Automated Bonding )、CSP(Chip Size Package)、TCP(Tape Carrier Package)に用いられる半導体キャリアテープやCOF(Chip on Film)等のフレキシブルプリント配線板のソルダーレジストに好適に用いられる耐折性に優れ、硬化後の反りが少ない熱硬化性樹脂組成物、及びその硬化塗膜に関する。   The present invention relates to a halogen-free and flame-retardant thermosetting resin composition useful for the production of printed wiring boards. More specifically, it has low hydrolyzability useful as a solder resist and marking ink for printed wiring boards, has excellent solder heat resistance, chemical resistance, adhesion, electrical insulation, etc., and is halogen-free and stable flame retardant. Thermosetting resin composition, flexible printed wiring boards such as semiconductor carrier tape and COF (Chip on Film) used for TAB (Tape Automated Bonding), CSP (Chip Size Package), and TCP (Tape Carrier Package) The present invention relates to a thermosetting resin composition that is excellent in folding resistance and is less warped after curing, and a cured coating film thereof.

プリント配線板の製造に用いられるソルダーレジストは、はんだ付け工程時、無関係な配線を保護するだけで無く、めっき処理時のめっきレジストとして使用される場合もあり、さらにはんだ付け後の配線の保護膜も兼ねているため、はんだ付け時の耐熱性、めっき処理時の耐薬品性、はんだ付け後の絶縁信頼性等が必要とされる。又、TAB(Tape Automated Bonding )、CSP(Chip Size Package)、TCP(Tape Carrier Package)に用いられる半導体キャリアテープやCOF(Chip on Film)等のフレキシブルプリント配線板のソルダーレジストには、さらに、耐折性に優れ、硬化後の反りが少ない硬化塗膜であることが必要とされている。
又、電池駆動の機器以外に用いられるプリント配線板等には、難燃性も必要とされている。更に、このような難燃化の手法としては、最近、樹脂や有機材料に含まれるハロゲン化合物が焼却灰中のダイオキシン等の原因となる可能性があることから、ハロゲンフリーによる難燃性付与が要求されている。
Solder resist used in the production of printed wiring boards not only protects irrelevant wiring during the soldering process, but may also be used as plating resist during plating processing. Therefore, heat resistance during soldering, chemical resistance during plating, insulation reliability after soldering, etc. are required. In addition, the solder resist of flexible printed wiring boards such as semiconductor carrier tape and COF (Chip on Film) used in TAB (Tape Automated Bonding), CSP (Chip Size Package), and TCP (Tape Carrier Package) is further resistant to resistance. It is required to be a cured coating film that has excellent foldability and little warpage after curing.
Further, printed wiring boards and the like used for devices other than battery-driven devices are also required to be flame retardant. Furthermore, as a method of making such flame retardant, since halogen compounds contained in resins and organic materials may cause dioxins in the incinerated ash, flame resistance imparting by halogen-free is recently provided. It is requested.

このようなソルダーレジストやマーキングインキとしては、例えば、液状エポキシ樹脂、体質顔料、着色顔料、溶剤、及びイミダゾール誘導体からなる組成物(特許文献1参照。)や、アクリル酸またはメタクリル酸とスチレン等の共重合物と、エポキシ樹脂からなる組成物(特許文献2参照。)が提案されているが、耐めっき性等が不十分であった。また、これらを半導体キャリアテープやフレキシブルプリント配線板に用いた場合、耐折性が不十分であり、硬化後の反りも大きいという問題があった。
さらに、このような熱硬化性樹脂組成物を難燃化する一般的な方法としては、臭素化エポキシ樹脂などのハロゲン化合物を配合する方法、リン酸エステルを難燃剤として配合する方法、及び赤燐を配合する方法などがある。しかし、ハロゲンフリー化が叫ばれている現在、臭素化エポキシ樹脂などのハロゲン化合物を配合する方法は、避けられている。また、リン酸エステルを配合する方法は、プリント配線板製造時のめっき処理等で、リン酸エステルが加水分解し、電気絶縁性や電気腐食性などの塗膜特性を低下させるという問題があり、さらに赤燐を配合する方法は、赤燐による着色などの外観不良やソルダーレジスト組成物の貯蔵時に消防法等の規制を受けるという問題がある。
Examples of such a solder resist and marking ink include a composition comprising a liquid epoxy resin, an extender pigment, a color pigment, a solvent, and an imidazole derivative (see Patent Document 1), acrylic acid or methacrylic acid and styrene, etc. A composition comprising a copolymer and an epoxy resin (see Patent Document 2) has been proposed, but the plating resistance and the like were insufficient. Moreover, when these were used for a semiconductor carrier tape or a flexible printed wiring board, there existed a problem that bending resistance was inadequate and the curvature after hardening was also large.
Furthermore, as a general method for flame retarding such a thermosetting resin composition, a method of blending a halogen compound such as a brominated epoxy resin, a method of blending a phosphate ester as a flame retardant, and red phosphorus And the like. However, at the present time that halogen-free products are being sought, methods of blending halogen compounds such as brominated epoxy resins are avoided. In addition, the method of blending phosphoric acid ester has a problem that the phosphoric acid ester is hydrolyzed by plating treatment at the time of manufacturing a printed wiring board, and the coating properties such as electric insulation and electric corrosiveness are lowered. Further, the method of blending red phosphorus has problems such as poor appearance such as coloring with red phosphorus, and regulations such as the Fire Service Act when the solder resist composition is stored.

フレキシブルプリント配線板用のソルダーレジストとしては、カバーレイフィルムと呼ばれるポリイミドフィルムをパターンに合わせた金型で打ち抜いた後、接着剤を用いて貼り付けるタイプや、可撓性を有する被膜を形成する紫外線硬化型、熱硬化型のソルダーレジストインキ又は液状ポリイミドインキをスクリーン印刷により塗布するタイプや、可撓性を有する被膜を形成する液状フォトソルダーレジストインキのタイプがある。
しかしながら、カバーレイフィルムでは、ハロゲンフリーによる難燃化は可能であるが、銅箔との追随性に問題があるため、高精度なパターンを形成することが出来ないという問題がある。一方、紫外線硬化型ソルダーレジストインキ及び液状フォトソルダーレジストインキでは、基材のポリイミドとの密着性が悪く、充分な可撓性が得られないとい問題がある。また、ソルダーレジストインキの硬化収縮及び硬化後の冷却収縮が大きいため反りが生じてしまい、問題となっている。さらに液状ポリイミドインキとして可溶性芳香族ポリイミドを用いた組成物が提案されている(特許文献3参照)が、高価であることと、印刷時に滲みが生じてしまい、充分な作業性が得られず、問題となっている。
特開昭50−6408号公報(特許請求の範囲) 特開平4−239070号公報(特許請求の範囲) 特公平5−75032号公報(特許請求の範囲)
As a solder resist for flexible printed wiring boards, a type of film that has a flexible film, or a type that is bonded using an adhesive after punching a polyimide film called a coverlay film with a mold that matches the pattern, is used. There are a type in which a curable or thermosetting type solder resist ink or liquid polyimide ink is applied by screen printing, and a liquid photo solder resist ink type in which a flexible film is formed.
However, the cover lay film can be made flame-retardant by halogen-free, but has a problem in that it cannot form a highly accurate pattern because it has a problem of following with the copper foil. On the other hand, the ultraviolet curable solder resist ink and the liquid photo solder resist ink have a problem that the adhesiveness with the polyimide of the base material is poor and sufficient flexibility cannot be obtained. Further, since the curing shrinkage of the solder resist ink and the cooling shrinkage after curing are large, warping occurs, which is a problem. Furthermore, a composition using a soluble aromatic polyimide as a liquid polyimide ink has been proposed (see Patent Document 3), but it is expensive and bleeding occurs during printing, so that sufficient workability cannot be obtained. It is a problem.
JP-A-50-6408 (Claims) JP-A-4-239070 (Claims) Japanese Patent Publication No. 5-75032 (Claims)

本発明は、従来技術が抱える上記問題点を解決するためになされたものであり、その主たる目的は、プリント配線板製造に用いられるソルダーレジストやマーキングインキとして有用な加水分解性が低く、はんだ耐熱性、耐薬品性、密着性、電気絶縁性等に優れ、かつハロゲンフリーで安定した難燃性を有する熱硬化性樹脂組成物、さらに半導体キャリアテープやフレキシブルプリント配線板用ソルダーレジストに好適に用いられる耐折性に優れ、硬化後の反りが少ない熱硬化性樹脂組成物を提供することにある。
また本発明の他の目的は、上記熱硬化性樹脂記組成物を、加熱により硬化させて得られる加水分解性が低く、はんだ耐熱性、耐薬品性、密着性、電気絶縁性等に優れ、かつハロゲンフリーで安定した難燃性を有する硬化塗膜を提供することにある。
The present invention has been made in order to solve the above-mentioned problems of the prior art, and its main purpose is low hydrolyzability useful as solder resist and marking ink used in printed wiring board production, and solder heat resistance. Suitable for thermosetting resin composition with excellent flame resistance, chemical resistance, adhesion, electrical insulation, etc., halogen-free and stable flame retardancy, and solder resist for semiconductor carrier tape and flexible printed wiring board An object of the present invention is to provide a thermosetting resin composition having excellent folding resistance and less warping after curing.
Another object of the present invention is that the above thermosetting resin composition is low in hydrolyzability obtained by curing by heating, excellent in solder heat resistance, chemical resistance, adhesion, electrical insulation, etc. Another object of the present invention is to provide a cured coating film which is halogen-free and has stable flame retardancy.

発明者らは、上記目的を達成するために鋭意研究した結果、(A)一分子中に1個以上のカルボキシル基及びエチレン性不飽和基を有するカルボキシル基含有不飽和ポリエステル樹脂、
(B)一分子中に2個以上のエポキシ基を有する樹脂、
(C)アミン系活性水素化合物、
及び(D)下記一般式(I)で表わされるリン酸アミド化合物
As a result of intensive studies to achieve the above object, the inventors have (A) a carboxyl group-containing unsaturated polyester resin having one or more carboxyl groups and ethylenically unsaturated groups in one molecule,
(B) a resin having two or more epoxy groups in one molecule;
(C) an amine-based active hydrogen compound,
And (D) a phosphoric acid amide compound represented by the following general formula (I)

Figure 2005232195

(式中、R,Rは、同一又は異なるもので、水素原子又は炭素数1〜4のアルキル基を示す。)

を含有する熱硬化性樹脂組成物が、加水分解性が低く、はんだ耐熱性、耐薬品性、密着性、電気絶縁性等に優れ、かつハロゲンフリーで安定した難燃性を有することを見出し、さらに、上記カルボキシル基含有不飽和ポリエステル樹脂(A)として、特定の線状の多官能エポキシ化合物(a)と、不飽和モノカルボン酸(b)との反応物に、飽和及び/又は不飽和多塩基酸無水物(c)を反応させて得られる樹脂を用いた組成物が、耐折性に優れ、硬化後の反りが少ない硬化塗膜が得られることを見出し、本発明を完成するに至った。
Figure 2005232195

(In formula, R < 1 >, R < 2 > is the same or different, and shows a hydrogen atom or a C1-C4 alkyl group.)

Has been found that the thermosetting resin composition containing is low in hydrolyzability, excellent in solder heat resistance, chemical resistance, adhesion, electrical insulation, etc., and has halogen-free and stable flame retardancy, Furthermore, as the carboxyl group-containing unsaturated polyester resin (A), a reaction product of a specific linear polyfunctional epoxy compound (a) and an unsaturated monocarboxylic acid (b) may be saturated and / or unsaturated polyvalent. It has been found that a composition using a resin obtained by reacting a basic acid anhydride (c) can provide a cured coating film that has excellent folding resistance and little warpage after curing, and has completed the present invention. It was.

即ち、本発明者らは、カルボキシル基含有不飽和ポリエステル樹脂(A)のカルボキシル基と、一分子中に2個以上のエポキシ基を有する樹脂(B)のエポキシ基との付加反応と、カルボキシル基含有不飽和ポリエステル樹脂(A)のエチレン性不飽和基とアミン系活性水素化合物(C)の活性水素のマイケル付加反応を利用した架橋形態を取ることにより、加水分解性が低く、はんだ耐熱性、耐薬品性、密着性、電気絶縁性等に優れた樹脂組成物になり、さらに上記一般式(I)で表わされるリン酸アミド化合物(D)を配合することにより、加水分解性が低く、ハロゲンフリーで安定した難燃性を付与できることを見出した。さらにまた、上記カルボキシル基含有不飽和ポリエステル樹脂(A)として、後述の線状の多官能エポキシ化合物(a)と不飽和モノカルボン酸(b)との反応物に、飽和及び/又は不飽和多塩基酸無水物(c)を反応させて得られる樹脂を用いることにより、耐折性に優れ、硬化後の反りが少ない硬化塗膜が得られることを見出し、本発明を完成するに至った。   That is, the present inventors carried out an addition reaction between a carboxyl group of a carboxyl group-containing unsaturated polyester resin (A) and an epoxy group of a resin (B) having two or more epoxy groups in one molecule, and a carboxyl group. By taking a crosslinked form using the Michael addition reaction of the ethylenically unsaturated group of the contained unsaturated polyester resin (A) and the active hydrogen of the amine-based active hydrogen compound (C), the hydrolyzability is low, the solder heat resistance, It becomes a resin composition excellent in chemical resistance, adhesion, electrical insulation, etc., and further, by blending the phosphoric acid amide compound (D) represented by the above general formula (I), the hydrolyzability is low, and halogen It has been found that free and stable flame retardancy can be imparted. Furthermore, as the carboxyl group-containing unsaturated polyester resin (A), a reaction product of a linear polyfunctional epoxy compound (a) and an unsaturated monocarboxylic acid (b) described later may be saturated and / or unsaturated polyvalent. It has been found that by using a resin obtained by reacting the basic acid anhydride (c), a cured coating film having excellent folding resistance and less warping after curing can be obtained, and the present invention has been completed.

本発明の熱硬化性樹脂組成物を用いることにより、ダイオキシン等の環境破壊物質を発生することの無いハロゲンフリーで安定した難燃性を有し、かつ加水分解性が低く、はんだ耐熱性、耐薬品性、密着性、電気絶縁性等に優れるプリント配線板用ソルダーレジストやマーキングインキが提供され、信頼性の高いプリント配線板を安価に製造することができる。さらに、特定のカルボキシル基含有不飽和ポリエステル樹脂(A)を用いることにより、TAB、CSP、TCPに用いられる半導体キャリアテープや、COF等のフレキシブルプリント配線板に好適に用いられる耐折性に優れ、反りの少ない硬化塗膜を有する信頼性の高いフレキシブルプリント配線板を安価に提供することができる。   By using the thermosetting resin composition of the present invention, it has halogen-free and stable flame retardancy that does not generate environmentally destructive substances such as dioxins, has low hydrolyzability, solder heat resistance, A solder resist for printed wiring boards and marking ink that are excellent in chemical properties, adhesion, electrical insulation, etc. are provided, and a highly reliable printed wiring board can be manufactured at low cost. Furthermore, by using a specific carboxyl group-containing unsaturated polyester resin (A), it is excellent in folding resistance suitably used for a semiconductor carrier tape used for TAB, CSP, TCP, and a flexible printed wiring board such as COF, A highly reliable flexible printed wiring board having a cured coating film with less warping can be provided at low cost.

本発明の第一の態様として、(A)一分子中に1個以上のカルボキシル基及びエチレン性不飽和基を有するカルボキシル基含有不飽和ポリエステル樹脂、
(B)一分子中に2個以上のエポキシ基を有する樹脂、
(C)アミン系活性水素化合物、
及び(D)下記一般式(I)で表わされるリン酸アミド化合物
As a first aspect of the present invention, (A) a carboxyl group-containing unsaturated polyester resin having one or more carboxyl groups and ethylenically unsaturated groups in one molecule,
(B) a resin having two or more epoxy groups in one molecule;
(C) an amine-based active hydrogen compound,
And (D) a phosphoric acid amide compound represented by the following general formula (I)

Figure 2005232195

(式中、R,Rは、同一又は異なるもので、水素原子又は炭素数1〜4のアルキル基を示す。)

を含有することを特徴とする熱硬化性樹脂組成物が提供される。また、本発明の好ましい態様として、前記カルボキシル基含有不飽和ポリエステル樹脂(A)が、下記一般式(II)、下記一般式(III)、及び下記一般式(V)で表わされるエポキシ化合物からなる群から選ばれる少なくとも1種の多官能エポキシ化合物(a)



Figure 2005232195

(In formula, R < 1 >, R < 2 > is the same or different, and shows a hydrogen atom or a C1-C4 alkyl group.)

The thermosetting resin composition characterized by containing is provided. As a preferred embodiment of the present invention, the carboxyl group-containing unsaturated polyester resin (A) is composed of an epoxy compound represented by the following general formula (II), the following general formula (III), and the following general formula (V). At least one polyfunctional epoxy compound (a) selected from the group



Figure 2005232195


(式中、R,Rは水素原子又はメチル基を示し、Rは水素原子又はグリシジル基を示し、nは1〜50の値を示す。)
Figure 2005232195


(Wherein, R 3, R 4 represents a hydrogen atom or a methyl group, R 5 represents a hydrogen atom or a glycidyl radical, n denotes a value of 1-50.)

Figure 2005232195

(式中、Mは下記一般式(IV)で表わされる基を示し、Rは脂肪族又は芳香族多官能カルボン酸の残基を示し、mは1〜50の値を示す。)
Figure 2005232195

(In the formula, M represents a group represented by the following general formula (IV), R 6 represents an aliphatic or aromatic polyfunctional carboxylic acid residue, and m represents a value of 1 to 50.)

Figure 2005232195


(式中、R,Rは2価のシクロヘキサン環及び/又はベンゼン環を示し、R,R10は水素原子又はメチル基を示し、R11は水素原子又はグリシジル基を示し、kは0〜25の値を示す。)
Figure 2005232195


(Wherein R 7 and R 8 represent a divalent cyclohexane ring and / or a benzene ring, R 9 and R 10 represent a hydrogen atom or a methyl group, R 11 represents a hydrogen atom or a glycidyl group, and k represents Shows values from 0 to 25.)

Figure 2005232195

(式中、XとYは互いに異なる2価の芳香環を示し、Gはグリシジル基及び/又は水素原子を示し、pは1〜20の整数を示す。)

と、不飽和モノカルボン酸(b)との反応物に、飽和及び/又は不飽和多塩基酸無水物(c)を反応させて得られる樹脂であることを特徴とする熱硬化性樹脂組成物が提供される。
さらに、他の態様としては、上記熱硬化性樹脂組成物を、加熱により硬化させて得られる硬化塗膜が提供される。
Figure 2005232195

(In the formula, X and Y represent different divalent aromatic rings, G represents a glycidyl group and / or a hydrogen atom, and p represents an integer of 1 to 20.)

And a resin obtained by reacting a reaction product of the unsaturated monocarboxylic acid (b) with a saturated and / or unsaturated polybasic acid anhydride (c). Is provided.
Furthermore, as another aspect, a cured coating film obtained by curing the thermosetting resin composition by heating is provided.

以下、本発明の熱硬化性樹脂組成物の各構成成分について詳細に説明する。
まず、本発明に用いられる一分子中に1個以上のカルボキシル基及びエチレン性不飽和基を有するカルボキシル基含有不飽和ポリエステル樹脂(A)としては、分子中にカルボキシル基及びエチレン性不飽和基を有していれば、特定のものに限定されるものではないが、特に以下に列挙するような樹脂(オリゴマー及びポリマーのいずれでもよい)を好適に使用できる。
Hereinafter, each component of the thermosetting resin composition of the present invention will be described in detail.
First, as the carboxyl group-containing unsaturated polyester resin (A) having at least one carboxyl group and ethylenically unsaturated group in one molecule used in the present invention, a carboxyl group and an ethylenically unsaturated group are contained in the molecule. If it has, it will not be limited to a specific thing, but especially resin (any of an oligomer and a polymer) as enumerated below can be used conveniently.

(1)不飽和カルボン酸と不飽和二重結合を有する化合物の共重合体に、グリシジルメタクリレートやアクリル酸クロライドなどを用いてエチレン性不飽和基をペンダントとして得られるカルボキシル基含有不飽和ポリエステル樹脂、
(2)一分子中にエポキシ基と不飽和二重結合を有する化合物と不飽和二重結合を有する化合物の共重合体に、不飽和モノカルボン酸を反応させ、生成した第二級の水酸基に飽和又は不飽和多塩基酸無水物を反応させて得られるカルボキシル基含有不飽和ポリエステル樹脂、
(3)不飽和二重結合を有する酸無水物と、それ以外の不飽和二重結合を有する化合物の共重合体に、一分子中に水酸基と不飽和二重結合を有する化合物を反応させて得られるカルボキシル基含有不飽和ポリエステル樹脂、
(4)多官能エポキシ化合物と不飽和モノカルボン酸を反応させ、生成した水酸基に飽和又は不飽和多塩基酸無水物を反応させて得られるカルボキシル基含有不飽和ポリエステル樹脂、
(5)水酸基含有ポリマーに飽和又は不飽和多塩基酸無水物を反応させた後、生成したカルボン酸の一部に、一分子中にエポキシ基と不飽和二重結合を有する化合物を反応させて得られる水酸基及びカルボキシル基含有不飽和ポリエステル樹脂、
(6)多官能エポキシ化合物、不飽和モノカルボン酸、及び一分子中に少なくとも1個のアルコール性水酸基とエポキシ基と反応するアルコール性水酸基以外の1個の反応性基を有する化合物との反応生成物に、飽和又は不飽和多塩基酸無水物を反応させて得られるカルボキシル基含有不飽和ポリエステル樹脂、及び
(7)一分子中に少なくとも2個のオキセタン環を有する多官能オキセタン化合物に不飽和モノカルボン酸を反応させ、得られた変性オキセタン樹脂中の1級水酸基に対して飽和又は不飽和多塩基酸無水物を反応させて得られるカルボキシル基含有不飽和ポリエステル樹脂などが挙げられる。
これらの中でも、多官能エポキシ化合物から誘導される(4)のカルボキシル基含有不飽和ポリエステル樹脂が、密着性等が良好で好ましい。
(1) A carboxyl group-containing unsaturated polyester resin obtained by using an ethylenically unsaturated group as a pendant using glycidyl methacrylate or acrylic acid chloride as a copolymer of an unsaturated carboxylic acid and a compound having an unsaturated double bond,
(2) An unsaturated monocarboxylic acid is reacted with a copolymer of a compound having an epoxy group and an unsaturated double bond in one molecule and a compound having an unsaturated double bond. A carboxyl group-containing unsaturated polyester resin obtained by reacting a saturated or unsaturated polybasic acid anhydride,
(3) A compound having an unsaturated double bond and a copolymer having a compound having an unsaturated double bond are reacted with a compound having a hydroxyl group and an unsaturated double bond in one molecule. Carboxyl group-containing unsaturated polyester resin obtained,
(4) a carboxyl group-containing unsaturated polyester resin obtained by reacting a polyfunctional epoxy compound with an unsaturated monocarboxylic acid and reacting the generated hydroxyl group with a saturated or unsaturated polybasic acid anhydride,
(5) After reacting a hydroxyl group-containing polymer with a saturated or unsaturated polybasic acid anhydride, a compound having an epoxy group and an unsaturated double bond in one molecule is reacted with a part of the produced carboxylic acid. Hydroxyl group and carboxyl group-containing unsaturated polyester resin obtained,
(6) Reaction product of a polyfunctional epoxy compound, an unsaturated monocarboxylic acid, and a compound having at least one alcoholic hydroxyl group in one molecule and one reactive group other than the alcoholic hydroxyl group that reacts with the epoxy group A carboxyl group-containing unsaturated polyester resin obtained by reacting a product with a saturated or unsaturated polybasic acid anhydride, and (7) a polyfunctional oxetane compound having at least two oxetane rings in one molecule. Examples thereof include a carboxyl group-containing unsaturated polyester resin obtained by reacting a carboxylic acid and reacting a saturated or unsaturated polybasic acid anhydride with a primary hydroxyl group in the resulting modified oxetane resin.
Among these, the carboxyl group-containing unsaturated polyester resin (4) derived from a polyfunctional epoxy compound is preferable because of good adhesion and the like.

更に、前記(4)のカルボキシル基含有不飽和ポリエステル樹脂の製造に用いられる多官能エポキシ化合物として、以下に列挙するような線状の多官能エポキシ化合物(a)を用いることにより、TAB、CSP、TCPに用いられる半導体キャリアテープや、COF等のフレキシブルプリント配線板に好適に用いられる耐折性に優れ、反りの少ない熱硬化性樹脂組成物、及び硬化塗膜を提供することができる。   Furthermore, by using the linear polyfunctional epoxy compound (a) as listed below as the polyfunctional epoxy compound used for the production of the carboxyl group-containing unsaturated polyester resin of (4), TAB, CSP, It is possible to provide a thermosetting resin composition having excellent bending resistance and less warpage, and a cured coating film suitably used for a semiconductor carrier tape used for TCP and a flexible printed wiring board such as COF.

即ち、前記カルボキシル基含有不飽和ポリエステル樹脂(A)が、下記一般式(II)、下記一般式(III)、及び下記一般式(V)で表わされるエポキシ化合物からなる群から選ばれる少なくとも1種の多官能エポキシ化合物(a)   That is, the carboxyl group-containing unsaturated polyester resin (A) is at least one selected from the group consisting of epoxy compounds represented by the following general formula (II), the following general formula (III), and the following general formula (V). Polyfunctional epoxy compound (a)

Figure 2005232195

(式中、R,Rは水素原子又はメチル基を示し、Rは水素原子又はグリシジル基を示し、nは1〜50の値を示す。)
Figure 2005232195

(Wherein, R 3, R 4 represents a hydrogen atom or a methyl group, R 5 represents a hydrogen atom or a glycidyl radical, n denotes a value of 1-50.)

Figure 2005232195

(式中、Mは下記一般式(IV)で表わされる基を示し、Rは脂肪族又は芳香族多官能カルボン酸の残基を示し、mは1〜50の値を示す。)
Figure 2005232195

(In the formula, M represents a group represented by the following general formula (IV), R 6 represents an aliphatic or aromatic polyfunctional carboxylic acid residue, and m represents a value of 1 to 50.)

Figure 2005232195

(式中、R,Rは2価のシクロヘキサン環及び/又はベンゼン環を示し、R,R10は水素原子又はメチル基を示し、R11は水素原子又はグリシジル基を示し、kは0〜25の値を示す。)
Figure 2005232195

(Wherein R 7 and R 8 represent a divalent cyclohexane ring and / or a benzene ring, R 9 and R 10 represent a hydrogen atom or a methyl group, R 11 represents a hydrogen atom or a glycidyl group, and k represents Shows values from 0 to 25.)

Figure 2005232195

(式中、XとYは互いに異なる2価の芳香環を示し、Gはグリシジル基及び/又は水素原子を示し、pは1〜20の整数を示す。)

と、不飽和モノカルボン酸(b)との反応物に、飽和及び/又は不飽和多塩基酸無水物(c)を反応させて得られる樹脂である。
Figure 2005232195

(In the formula, X and Y represent different divalent aromatic rings, G represents a glycidyl group and / or a hydrogen atom, and p represents an integer of 1 to 20.)

And a reaction product of the unsaturated monocarboxylic acid (b) with a saturated and / or unsaturated polybasic acid anhydride (c).

前記一般式(II)で表わされる多官能エポキシ化合物(a)は、一般式(II)中のRが全て水素原子であり、nの値が1〜50であるビスフェノールF型又はビスフェノールA型2官能エポキシ化合物をジメチルスルホキシドなどの非プロトン性極性溶媒等に溶解し、後述するようなエピハロヒドリンとアルカリ金属水酸化物を反応させることにより、多官能化したビスフェノール骨格の樹脂である。
一般式(II)のnの値が、1未満の場合、指触乾燥性、ドライフィルム化する時の造膜性や耐クラック性が低下するので好ましくない。一方、nが50を超えた場合、粘性が上がり、印刷性が低下したり、固形分濃度が低下し十分な膜厚が得られ難くなるので好ましくない。
The polyfunctional epoxy compound (a) represented by the general formula (II) is a bisphenol F type or bisphenol A type in which all R 5 in the general formula (II) are hydrogen atoms and the value of n is 1 to 50. It is a polyfunctionalized bisphenol skeleton resin by dissolving a bifunctional epoxy compound in an aprotic polar solvent such as dimethyl sulfoxide and reacting an epihalohydrin and an alkali metal hydroxide as described later.
When the value of n in the general formula (II) is less than 1, it is not preferable because the dryness to the touch, the film forming property when forming a dry film and the crack resistance are deteriorated. On the other hand, when n exceeds 50, viscosity is increased, printability is lowered, solid content concentration is lowered, and it is difficult to obtain a sufficient film thickness, which is not preferable.

前記エピハロヒドリンとしては、例えば、エピクロルヒドリン、エピブロムヒドリン、エピヨードヒドリン、β−メチルエピクロルヒドリン、β−メチルエピブロムヒドリン、β−メチルエピヨードヒドリンなどが用いられる。また、エピハロヒドリンの付加量は、平均50%以上が好ましく、より好ましくは、80%以上である。エピハロヒドリンの付加量が50%未満の場合、マイケル付加による架橋密度が低下し、耐水性などの塗膜特性が低下するので好ましくない。   Examples of the epihalohydrin include epichlorohydrin, epibromohydrin, epiiodohydrin, β-methylepichlorohydrin, β-methylepibromhydrin, β-methylepiiodohydrin, and the like. The addition amount of epihalohydrin is preferably 50% or more on average, more preferably 80% or more. When the added amount of epihalohydrin is less than 50%, the crosslink density due to Michael addition decreases, and the coating properties such as water resistance decrease, which is not preferable.

また、アルカリ金属水酸化物としては、苛性ソーダ、苛性カリ、水酸化リチウム、水酸化カルシウムなどが使用でき、特に苛性ソーダが好ましい。このアルカリ金属水酸化物の使用量は、前記末端エポキシ基の線状エポキシ化合物におけるエポキシ化したいアルコール性水酸基1モルに対して、0.5〜2モルとすることが好ましい。   Further, as the alkali metal hydroxide, caustic soda, caustic potash, lithium hydroxide, calcium hydroxide and the like can be used, and caustic soda is particularly preferable. The amount of the alkali metal hydroxide used is preferably 0.5 to 2 mol with respect to 1 mol of the alcoholic hydroxyl group to be epoxidized in the linear epoxy compound of the terminal epoxy group.

上記エピハロヒドリンの付加反応の温度は、20〜100℃が好ましい。付加反応の温度が、20℃未満であると反応が遅くなり、長時間の反応が必要となり、一方、反応温度が、100℃を超えると副反応が多く起こるので好ましくない。   The temperature of the epihalohydrin addition reaction is preferably 20 to 100 ° C. If the temperature of the addition reaction is less than 20 ° C., the reaction becomes slow and a long reaction is required. On the other hand, if the reaction temperature exceeds 100 ° C., many side reactions occur.

前記一般式(III)で表わされる多官能エポキシ化合物(a)は、ビスフェノールA型及び/又はビスフェノールF型2官能エポキシ化合物と、(d)一分子中に少なくとも2つのカルボキシル基を有する化合物とを原料として、後述するような公知のエステル化触媒を用いて、交互に重合させることによって得られる末端エポキシ基の線状エポキシ化合物を、前記一般式(II)で表わされる多官能エポキシ化合物(a)と同様に、ジメチルスルホキシドなどの非プロトン性極性溶媒等に溶解し、エピハロヒドリンとアルカリ金属水酸化物を反応させることにより、多官能化したものである。
一般式(III)のmの値が、1未満の場合、指触乾燥性、ドライフィルム化する時の造膜性や耐クラック性が低下するので好ましくない。一方、mが50を超えた場合、粘性が上がり、印刷性が低下したり、固形分濃度が低下し十分な膜厚が得られ難くなるので好ましくない。また、エピハロヒドリンの付加量は、平均50%以上が好ましく、より好ましくは、80%以上である。エピハロヒドリンの付加量が50%未満の場合、マイケル付加による架橋密度が低下し、耐水性などの塗膜特性が低下するので好ましくない。
The polyfunctional epoxy compound (a) represented by the general formula (III) comprises a bisphenol A type and / or bisphenol F type bifunctional epoxy compound, and (d) a compound having at least two carboxyl groups in one molecule. As a raw material, a linear epoxy compound having a terminal epoxy group obtained by alternately polymerizing using a known esterification catalyst as described later, a polyfunctional epoxy compound (a) represented by the general formula (II) In the same manner as above, it is dissolved in an aprotic polar solvent such as dimethyl sulfoxide and the like, and is polyfunctionalized by reacting an epihalohydrin and an alkali metal hydroxide.
When the value of m in the general formula (III) is less than 1, it is not preferable because the dryness to the touch, the film forming property and the crack resistance when forming a dry film are lowered. On the other hand, when m exceeds 50, viscosity is increased, printability is lowered, solid content concentration is lowered, and it becomes difficult to obtain a sufficient film thickness. Moreover, the addition amount of epihalohydrin is preferably 50% or more on average, and more preferably 80% or more. When the added amount of epihalohydrin is less than 50%, the crosslink density due to Michael addition decreases, and the coating properties such as water resistance decrease, which is not preferable.

上記一分子中に少なくとも2つのカルボキシル基を有する化合物(d)としては、例えば、1,4−シクロヘキサンジカルボン酸、テトラヒドロフタル酸、ヘキサヒドロフタル酸、ヘキサヒドロイソフタル酸、ヘキサヒドロテレフタル酸、フタル酸、イソフタル酸、テレフタル酸、コハク酸、アジピン酸、ムコン酸、スベリン酸、セバシン酸、2−ヒドロキシ−2−メチルコハク酸と無水フタル酸の付加物などが挙げられるが、柔軟性付与の面から、1,4−シクロヘキサンジカルボン酸、テトラヒドロフタル酸、ヘキサヒドロフタル酸、ヘキサヒドロイソフタル酸、ヘキサヒドロテレフタル酸、アジピン酸、ムコン酸、スベリン酸、セバシン酸など脂肪族又は脂環式のジカルボン酸化合物が特に好ましい。これらを単独で又は2種以上を組み合わせて使用することができる。   Examples of the compound (d) having at least two carboxyl groups in one molecule include 1,4-cyclohexanedicarboxylic acid, tetrahydrophthalic acid, hexahydrophthalic acid, hexahydroisophthalic acid, hexahydroterephthalic acid, and phthalic acid. , Isophthalic acid, terephthalic acid, succinic acid, adipic acid, muconic acid, suberic acid, sebacic acid, 2-hydroxy-2-methylsuccinic acid and phthalic anhydride adduct, etc. Aliphatic or cycloaliphatic dicarboxylic acid compounds such as 1,4-cyclohexanedicarboxylic acid, tetrahydrophthalic acid, hexahydrophthalic acid, hexahydroisophthalic acid, hexahydroterephthalic acid, adipic acid, muconic acid, suberic acid, and sebacic acid Particularly preferred. These can be used alone or in combination of two or more.

また、前記エステル化触媒としては、エポキシ基とカルボキシル基が定量的に反応させることができるホスフィン類、アルカリ金属化合物、アミン類などが挙げられる。具体的には、トリブチルホスフィン、トリフェニルホスフィン等のトリアルキルもしくはトリアリールホスフィン又はこれらと酸化物との塩類などホスフィン類;ナトリウム、リチウム、カリウム等のアルカリ金属の水酸化物、ハロゲン化物、アルコラート、アミドなど;トリエタノールアミン、N,N−ジメチルピペラジン、トリエチルアミン、トリ−n−プロピルアミン、ヘキサメチレンテトラミン、ピリジン、テトラメチルアンモニウムブロマイドなどの脂肪族又は芳香族の第一級、第二級、第三級、第四級アミン類などが挙げられ、これらを単独で又は2種以上を組み合わせて用いることができる。
これらの触媒の使用量は、ビスフェノールA型及び/又はビスフェノールF型2官能エポキシ化合物のエポキシ基1モル(1当量)に対して、0.1〜25モル%の割合であることが望ましく、さらに好ましくは0.5〜20モル%の割合であり、より好ましくは1〜15モル%の割合である。この理由は、触媒の使用量が0.1モル%よりも少ない割合の場合、反応に時間がかかり経済的でなく、一方、25モル%を超える場合、逆に反応が早いため制御し難くなるので好ましくない。
Examples of the esterification catalyst include phosphines, alkali metal compounds, amines and the like that can quantitatively react an epoxy group and a carboxyl group. Specifically, phosphines such as trialkylphosphine and triarylphosphine such as tributylphosphine and triphenylphosphine or salts thereof with oxides; hydroxides of alkali metals such as sodium, lithium and potassium, halides, alcoholates, Amides, etc .; aliphatic or aromatic primary, secondary, primary such as triethanolamine, N, N-dimethylpiperazine, triethylamine, tri-n-propylamine, hexamethylenetetramine, pyridine, tetramethylammonium bromide A tertiary, a quaternary amine, etc. are mentioned, These can be used individually or in combination of 2 or more types.
The amount of these catalysts used is desirably 0.1 to 25 mol% with respect to 1 mol (1 equivalent) of the epoxy group of the bisphenol A type and / or bisphenol F type bifunctional epoxy compound. Preferably it is a ratio of 0.5-20 mol%, More preferably, it is a ratio of 1-15 mol%. The reason for this is that when the amount of the catalyst used is less than 0.1 mol%, the reaction takes time and is not economical. On the other hand, when it exceeds 25 mol%, the reaction is fast and difficult to control. Therefore, it is not preferable.

前記一般式(V)で表わされる多官能エポキシ化合物(a)は、一分子中に2個のグリシジル基を有する芳香族エポキシ化合物(以下、二官能芳香族エポキシ化合物という)と、一分子中に2個のフェノール性水酸基を有する二官能フェノール化合物とを原料として、後述するような公知のエーテル化触媒を用い、溶媒中又は無溶媒下、交互に重合させることによって得られる末端エポキシ基の線状エポキシ化合物を、前記一般式(II)で表わされる多官能エポキシ化合物(a)と同様に、ジメチルスルホキシドなどの非プロトン性極性溶媒などに溶解し、エピハロヒドリンとアルカリ金属水酸化物を反応させることにより、多官能化したものである。   The polyfunctional epoxy compound (a) represented by the general formula (V) includes an aromatic epoxy compound having two glycidyl groups in one molecule (hereinafter referred to as a bifunctional aromatic epoxy compound), and one molecule. Using a bifunctional phenolic compound having two phenolic hydroxyl groups as a raw material, using a known etherification catalyst as described later, a linear form of a terminal epoxy group obtained by alternately polymerizing in a solvent or in the absence of a solvent By dissolving an epoxy compound in an aprotic polar solvent such as dimethyl sulfoxide, and reacting an epihalohydrin and an alkali metal hydroxide in the same manner as the polyfunctional epoxy compound (a) represented by the general formula (II). Is polyfunctionalized.

前記二官能芳香族エポキシ化合物としては、下記式(VI)〜(IX)で示されるような芳香環を有するビフェノール型ジグリシジルエーテル、ビキシレノール型ジグリシジルエーテル、ビスフェノール型ジグリシジルエーテル、ナフタレン型ジグリシジルエーテル等の少なくとも1種の二官能芳香族エポキシ化合物が用いられる。このような二官能芳香族エポキシ化合物を、二官能フェノール化合物との交互共重合体における一方のモノマー成分とすることにより、硬化物の強度、耐熱性、電気絶縁性等に優れたエポキシ化合物が得られる。
Examples of the bifunctional aromatic epoxy compound include biphenol-type diglycidyl ether, bixylenol-type diglycidyl ether, bisphenol-type diglycidyl ether, naphthalene-type dithiol having an aromatic ring represented by the following formulas (VI) to (IX). At least one bifunctional aromatic epoxy compound such as glycidyl ether is used. By using such a bifunctional aromatic epoxy compound as one monomer component in an alternating copolymer with a bifunctional phenol compound, an epoxy compound excellent in the strength, heat resistance, electrical insulation, etc. of the cured product is obtained. It is done.

Figure 2005232195


(式中、R12、R13、R14、R15は同一の又は互いに異なる、水素原子又は炭素数1〜4のアルキル基を示し、R16、R17、R18、R19は同一の又は互いに異なる、水素原子、炭素数1〜4のアルキル基又はハロゲン原子を示し、R20、R21は同一の又は互いに異なる、水素原子、メチル基又はハロゲン化メチル基を示す。)
Figure 2005232195


(In the formula, R 12 , R 13 , R 14 , and R 15 are the same or different and represent a hydrogen atom or an alkyl group having 1 to 4 carbon atoms, and R 16 , R 17 , R 18 , and R 19 are the same. Or a different hydrogen atom, an alkyl group having 1 to 4 carbon atoms or a halogen atom, and R 20 and R 21 represent the same or different hydrogen atom, methyl group or halogenated methyl group.

前記ビフェノール型、ビキシレノール型、ビスフェノール型又はナフタレン型のジグリシジルエーテルとしては、例えばビフェノール化合物、ビキシレノール化合物、ビスフェノール化合物又はジヒドロキシナフタレンとエピクロルヒドリンとの反応から製造されるものを使用することができる。また、市販のエポキシ化合物も使用することができ、例えば、ビフェノール型ジグリシジルエーテルとしてはジャパンエポキシレジン(株)製の商品名「エピコートYL−6056」等、ビキシレノール型ジグリシジルエーテルとしてはジャパンエポキシレジン(株)製の商品名「エピコートYX−4000」等、ビスフェノール型ジグリシジルエーテルとしては旭チバ(株)製の商品名「アラルダイト#260」、「アラルダイト#6071」等のビスフェノールA型エポキシ化合物、或いは大日本インキ化学工業(株)製の商品名「エピクロン830S」等のビスフェノールF型エポキシ化合物、或いは大日本インキ化学工業(株)製の商品名「エピクロンEXA1514」等のビスフェノールS型エポキシ化合物、ナフタレン型ジグリシジルエーテルとしては大日本インキ化学工業(株)製の商品名「エピクロンHP−4032(D)」等を挙げることができ、これらを単独で又は2種類以上を組み合わせて使用することができる。   As the biphenol type, bixylenol type, bisphenol type or naphthalene type diglycidyl ether, for example, a biphenol compound, a bixylenol compound, a bisphenol compound, or one produced from a reaction of dihydroxynaphthalene and epichlorohydrin can be used. Commercially available epoxy compounds can also be used. For example, as the biphenol type diglycidyl ether, trade name “Epicoat YL-6056” manufactured by Japan Epoxy Resin Co., Ltd., and as the bixylenol type diglycidyl ether, Japan Epoxy Bisphenol A type epoxy compounds such as “Araldite # 260” and “Araldite # 6071” manufactured by Asahi Chiba Co., Ltd. as bisphenol-type diglycidyl ether, such as “Epicoat YX-4000” manufactured by Resin Co., Ltd. Or a bisphenol F type epoxy compound such as “Epicron 830S” manufactured by Dainippon Ink & Chemicals, Inc. or a bisphenol S type epoxy compound such as “Epicron EXA1514” manufactured by Dainippon Ink and Chemicals, Inc. , Naphthalene type jigli The Jill ether can be exemplified by Dainippon Ink & trade name "Epiclon HP-4032 (D)" or the like, may be used singly or in combinations of two or more.

前記一般式(V)で表わされる多官能エポキシ化合物(a)の原料となる二官能フェノール化合物としては、その構造に特徴があり、耐熱性を高くするために芳香環を有し、対称構造或いは剛直な構造を有したものを使用することができる。このような化合物としては、例えば1,4−ジヒドロキシナフタレン、1,5−ジヒドロキシナフタレン、1,6−ジヒドロキシナフタレン、2,6−ジヒドロキシナフタレン、2,7−ジヒドロキシナフタレン、2,8−ジヒドロキシナフタレン等のジヒドロキシナフタレン誘導体、ビキシレノール、ビフェノール等のビフェノール誘導体、ビスフェノールA、ビスフェノールF、ビスフェノールS、アルキル基置換ビスフェノール等のビスフェノール誘導体、ハイドロキノン、メチルハイドロキノン、トリメチルハイドロキノン等のハイドロキノン誘導体等を挙げることができ、これらを単独で又は2種類以上を組み合わせて使用することができる。   The bifunctional phenol compound used as the raw material for the polyfunctional epoxy compound (a) represented by the general formula (V) has a characteristic structure, has an aromatic ring to increase heat resistance, and has a symmetrical structure or Those having a rigid structure can be used. Examples of such compounds include 1,4-dihydroxynaphthalene, 1,5-dihydroxynaphthalene, 1,6-dihydroxynaphthalene, 2,6-dihydroxynaphthalene, 2,7-dihydroxynaphthalene, 2,8-dihydroxynaphthalene and the like. Dihydroxynaphthalene derivatives, biphenol derivatives such as bixylenol and biphenol, bisphenol derivatives such as bisphenol A, bisphenol F, bisphenol S and alkyl group-substituted bisphenol, hydroquinone derivatives such as hydroquinone, methylhydroquinone and trimethylhydroquinone, etc. These can be used alone or in combination of two or more.

二官能芳香族エポキシ化合物と二官能フェノール化合物との反応に使用されるエーテル化触媒としては、グリシジル基とフェノール性水酸基が定量的に反応させることができるホスフィン類、アルカリ金属化合物、アミン類を単独で又は併用して用いるのが好ましい。これ以外の触媒は、グリシジル基とフェノール性水酸基との反応で生成するアルコール性の水酸基と反応し、ゲル化するので好ましくない。ホスフィン類としては、トリブチルホスフィン、トリフェニルホスフィン等のトリアルキルもしくはトリアリールホスフィン又はこれらと酸化物との塩類などが挙げられる。アルカリ金属化合物としては、ナトリウム、リチウム、カリウム等のアルカリ金属の水酸化物、ハロゲン化物、アルコラート、アミドなどが挙げられ、これらを単独で又は2種以上を組み合わせて用いることができる。アミン類としては、脂肪族又は芳香族の第一級、第二級、第三級、第四級アミン類などが挙げられ、これらを単独で又は2種類以上を組み合わせて用いることができる。アミン類の具体例としては、トリエタノールアミン、N,N−ジメチルピペラジン、トリエチルアミン、トリ−n−プロピルアミン、ヘキサメチレンテトラミン、ピリジン、テトラメチルアンモニウムブロマイドなどが挙げられる。   The etherification catalyst used for the reaction between the bifunctional aromatic epoxy compound and the bifunctional phenol compound is a phosphine, an alkali metal compound or an amine that can react quantitatively with a glycidyl group and a phenolic hydroxyl group. Or in combination. Other catalysts are not preferable because they react with an alcoholic hydroxyl group produced by the reaction between a glycidyl group and a phenolic hydroxyl group to form a gel. Examples of phosphines include trialkyl phosphines such as tributyl phosphine and triphenyl phosphine, and salts of these with oxides. Examples of the alkali metal compound include hydroxides, halides, alcoholates, amides, and the like of alkali metals such as sodium, lithium and potassium, and these can be used alone or in combination of two or more. Examples of the amines include aliphatic or aromatic primary, secondary, tertiary, and quaternary amines, and these can be used alone or in combination of two or more. Specific examples of amines include triethanolamine, N, N-dimethylpiperazine, triethylamine, tri-n-propylamine, hexamethylenetetramine, pyridine, tetramethylammonium bromide and the like.

これらのエーテル化触媒は、二官能芳香族エポキシ化合物及び二官能フェノール化合物の仕込み量100質量部に対して、0.001〜1質量部、好ましくは0.01〜1質量部の範囲で用いることが好ましい。この理由は、触媒の使用量が0.001質量部未満では、反応に時間がかかり経済的でなく、一方、1質量部を超えるものについては逆に反応が早いため制御がし難くなるので好ましくない。このような触媒の存在下、二官能芳香族エポキシ樹脂化合物と二官能フェノール化合物との反応は、不活性ガス気流中或いは空気中で前記触媒下、約130〜180℃の温度範囲で反応させることが好ましい。   These etherification catalysts are used in the range of 0.001 to 1 part by mass, preferably 0.01 to 1 part by mass, with respect to 100 parts by mass of the charged amount of the bifunctional aromatic epoxy compound and the bifunctional phenol compound. Is preferred. The reason for this is that if the amount of the catalyst used is less than 0.001 part by mass, the reaction takes time and is not economical. On the other hand, if it exceeds 1 part by mass, the reaction is fast and difficult to control. Absent. In the presence of such a catalyst, the reaction between the bifunctional aromatic epoxy resin compound and the bifunctional phenol compound is carried out in an inert gas stream or in the air in the temperature range of about 130 to 180 ° C. under the catalyst. Is preferred.

以上のような線状の多官能エポキシ化合物(a)と反応させる前記不飽和モノカルボン酸(b)としては、アクリル酸、メタアクリル酸、ケイ皮酸、クロトン酸、ソルビン酸、α−シアノケイ皮酸、β−スチリルアクリル酸などの他、ヒドロキシエチル(メタ)アクリレート、ヒドロキシプロピル(メタ)アクリレート、ヒドロキシブチル(メタ)アクリレート、トリメチロールプロパンジ(メタ)アクリレート、ペンタエリスリトールトリ(メタ)アクリレート、ジペンタエリスリトールペンタ(メタ)アクリレート、フェニルグリシジル(メタ)アクリレート、(メタ)アクリル酸カプロラクトン付加物など水酸基含有アクリレートの不飽和二塩基酸無水物付加物などが挙げられる。不飽和モノカルボン酸(b)の中でも特に好ましいのは、アクリル酸及びメタアクリル酸である。これら不飽和モノカルボン酸は、単独で又は2種以上を組み合わせて用いることができる。なお、ここで「(メタ)アクリレート」とは、アクリレートとメタアクリレートを総称する用語であり、他の類似の表現についても同様である。   Examples of the unsaturated monocarboxylic acid (b) to be reacted with the linear polyfunctional epoxy compound (a) as described above include acrylic acid, methacrylic acid, cinnamic acid, crotonic acid, sorbic acid, and α-cyanocinnamic acid. In addition to acid, β-styrylacrylic acid, etc., hydroxyethyl (meth) acrylate, hydroxypropyl (meth) acrylate, hydroxybutyl (meth) acrylate, trimethylolpropane di (meth) acrylate, pentaerythritol tri (meth) acrylate, di Examples thereof include unsaturated dibasic acid anhydride adducts of hydroxyl group-containing acrylates such as pentaerythritol penta (meth) acrylate, phenylglycidyl (meth) acrylate, and (meth) acrylic acid caprolactone adduct. Among the unsaturated monocarboxylic acids (b), acrylic acid and methacrylic acid are particularly preferable. These unsaturated monocarboxylic acids can be used alone or in combination of two or more. Here, “(meth) acrylate” is a term that collectively refers to acrylate and methacrylate, and the same applies to other similar expressions.

これらの不飽和モノカルボン酸(b)の付加量は、前記多官能エポキシ化合物(a)のエポキシ基1.0当量あたり、0.8〜1.3当量で、好ましくは0.95〜1.05当量である。不飽和モノカルボン酸(b)の付加量が、0.8当量未満の場合、未反応のエポキシ基が、この後付加する飽和及び/又は不飽和多塩基酸無水物(c)から得られるカルボキシル基と反応し、保存安定性を低下させたり、ゲル化する原因となるので、好ましくない。一方、付加量が、1.3当量を超えた場合、不飽和モノカルボン酸に起因する臭気が強くなり、又過剰の不飽和モノカルボン酸が、熱硬化時ガス化して、銅箔等を腐食させるので、好ましくない。   The addition amount of these unsaturated monocarboxylic acids (b) is 0.8 to 1.3 equivalents, preferably 0.95 to 1.0 per 1.0 equivalent of the epoxy group of the polyfunctional epoxy compound (a). 05 equivalents. When the addition amount of the unsaturated monocarboxylic acid (b) is less than 0.8 equivalent, the unreacted epoxy group is a carboxyl obtained from the saturated and / or unsaturated polybasic acid anhydride (c) to be added thereafter. This is not preferable because it reacts with a group to reduce storage stability or cause gelation. On the other hand, when the added amount exceeds 1.3 equivalents, the odor caused by the unsaturated monocarboxylic acid becomes strong, and excess unsaturated monocarboxylic acid gasifies during thermosetting, corroding copper foil and the like. This is not preferable.

また、前記飽和及び/又は不飽和多塩基酸無水物(c)としては、メチルテトラヒドロ無水フタル酸、テトラヒドロ無水フタル酸、ヘキサヒドロ無水フタル酸、メチルヘキサヒドロ無水フタル酸、無水ナジック酸、3,6−エンドメチレンテトラヒドロ無水フタル酸、メチルエンドメチレンテトラヒドロ無水フタル酸、テトラブロモ無水フタル酸等の脂環式二塩基酸無水物;無水コハク酸、無水マレイン酸、無水イタコン酸、オクテニル無水コハク酸、ペンタドデセニル無水コハク酸、無水フタル酸、無水トリメリット酸等の脂肪族又は芳香族の二塩基酸又は三塩基酸無水物、あるいはビフェニルテトラカルボン酸二無水物、ジフェニルエーテルテトラカルボン酸二無水物、ブタンテトラカルボン酸二無水物、シクロペンタンテトラカルボン酸二無水物、無水ピロメリット酸、ベンゾフェノンテトラカルボン酸二無水物等の脂肪族又は芳香族四塩基酸二無水物が挙げられ、これらの1種又は2種以上を使用することができる。これらの中でも、脂環式二塩基酸無水物が特に好ましい。   Examples of the saturated and / or unsaturated polybasic acid anhydride (c) include methyltetrahydrophthalic anhydride, tetrahydrophthalic anhydride, hexahydrophthalic anhydride, methylhexahydrophthalic anhydride, nadic anhydride, 3, 6 -Alicyclic dibasic acid anhydrides such as endomethylenetetrahydrophthalic anhydride, methylendomethylenetetrahydrophthalic anhydride, tetrabromophthalic anhydride; succinic anhydride, maleic anhydride, itaconic anhydride, octenyl succinic anhydride, pentadodecenyl anhydride Aliphatic or aromatic dibasic acid or tribasic acid anhydride such as succinic acid, phthalic anhydride, trimellitic anhydride, biphenyltetracarboxylic dianhydride, diphenyl ether tetracarboxylic dianhydride, butanetetracarboxylic acid Dianhydride, cyclopentanetetracarboxylic Dianhydride, pyromellitic acid anhydride, an aliphatic or aromatic tetracarboxylic acid dianhydride such as benzophenone tetracarboxylic acid dianhydride and the like, can be used one or two or more of these. Among these, alicyclic dibasic acid anhydrides are particularly preferable.

これら飽和及び/又は不飽和多塩基酸無水物(c)の使用量は、得られるカルボキシル基含有不飽和ポリエステル樹脂(A)の酸価が、30〜200mgKOH/g、好ましくは50〜120mgKOH/gの範囲内となるような付加量とすることが望ましい。カルボキシル基含有不飽和ポリエステル樹脂(A)の酸価が、30mgKOH/g未満の場合、オキシラン環との反応による架橋密度が低下し、はんだ耐熱性等の塗膜特性が低下するので好ましくない。一方、200mgKOH/gを超えた場合、オキシラン環との反応による架橋密度が上がり、硬くなり、柔軟性が低下するので好ましくない。   The amount of the saturated and / or unsaturated polybasic acid anhydride (c) used is such that the resulting carboxyl group-containing unsaturated polyester resin (A) has an acid value of 30 to 200 mgKOH / g, preferably 50 to 120 mgKOH / g. It is desirable that the added amount be in the range of. When the acid value of the carboxyl group-containing unsaturated polyester resin (A) is less than 30 mgKOH / g, the crosslinking density due to the reaction with the oxirane ring is lowered, and the coating film properties such as solder heat resistance are lowered. On the other hand, if it exceeds 200 mgKOH / g, the crosslinking density due to the reaction with the oxirane ring is increased, it becomes hard, and the flexibility is lowered, which is not preferable.

前記1分子中に2個以上のエポキシ基を有する樹脂(B)としては、ビスフェノールA型、水添ビスフェノールA型、ビスフェノールF型、ビスフェノールS型、フェノールノボラック型、クレゾールノボラック型、ビスフェノールAのノボラック型、ビフェノール型、ビキシレノール型、トリスフェノールメタン型等のグリシジルエーテル類;ジグリシジルフタレート等のグリシジルエステル類;トリグリシジルイソシアヌレートやテトラグリシジルメタキシリレンジアミン等のグリシジルアミン類;3,4−エポキシシクロヘキセニルメチル−3’,4’−エポキシシクロヘキセンカルボキシレート等の脂環式エポキシ樹脂類;エポキシ化ポリブタジエン等の公知慣用のエポキシ樹脂を単独で又は2種以上組み合わせて用いることができる。これらの中で特に好ましいものとしては、有機溶剤等に難溶性であるトリグリシジルイソシアヌレート(構造異性体として、α体とβ体があるが、β体が特に好ましい。)や、可撓性付与効果の大きいエポキシ化ポリブタジエンなどが挙げられる。これらのエポキシ樹脂の配合割合は、前記カルボキシル基含有不飽和ポリエステル樹脂(A)のカルボキシル基1当量に対して、0.6〜2.0当量であることが、硬化塗膜の耐めっき性、はんだ耐熱性などの特性面から好ましい。   Examples of the resin (B) having two or more epoxy groups in one molecule include bisphenol A type, hydrogenated bisphenol A type, bisphenol F type, bisphenol S type, phenol novolak type, cresol novolak type, and bisphenol A novolak. Type, biphenol type, bixylenol type, trisphenolmethane type glycidyl ethers; diglycidyl phthalate and other glycidyl esters; triglycidyl isocyanurate and tetraglycidyl metaxylylenediamine and other glycidyl amines; 3,4-epoxy Cyclohexenylmethyl-3 ′, 4′-epoxycyclohexenecarboxylate and other alicyclic epoxy resins; known and commonly used epoxy resins such as epoxidized polybutadiene can be used alone or in combination of two or more. . Of these, particularly preferred are triglycidyl isocyanurates (there are α and β isomers as structural isomers, although β isomers are particularly preferred), which are hardly soluble in organic solvents, and the like. Examples thereof include epoxidized polybutadiene having a large effect. The compounding ratio of these epoxy resins is 0.6 to 2.0 equivalents with respect to 1 equivalent of carboxyl groups of the carboxyl group-containing unsaturated polyester resin (A), It is preferable in terms of characteristics such as solder heat resistance.

次に、前記アミン系活性水素化合物(C)としては、熱硬化時に、カルボキシル基含有不飽和ポリエステル樹脂(A)のエチレン性不飽和基にマイケル付加する化合物であり、一般的にエポキシ樹脂の潜在性アミン系硬化剤として用いられているものが使用できる。具体的には、ジシアンジアミド;メラミン、ビニルトリアジン、アセトグアナミン、ベンゾグアナミンなどのグアナミン類;アジピン酸ジヒドラジド、イソフタル酸ジヒドラジド等の有機酸ヒドラジド類などが挙げられる。これらの中で、ジシアンジアミド及びメラミンが、銅箔の防錆効果もあり、特に好ましい。これらは、単独又は2種類以上を混合して用いても良い。
これらアミン系活性水素化合物(C)の配合量は、前記カルボキシル基含有不飽和ポリエステル樹脂(A)のエチレン性不飽和基1当量に対し、アミン系活性水素化合物(C)の活性水素が1当量となることが好ましいが、これらのアミン系活性水素化合物は、前記
1分子中に2個以上のエポキシ基を有する樹脂(B)と反応したり、銅箔とキレートを作るため、組成物中に、0.1〜10質量%、好ましくは0.2〜5質量%配合する。
Next, the amine-based active hydrogen compound (C) is a compound that is Michael-added to the ethylenically unsaturated group of the carboxyl group-containing unsaturated polyester resin (A) at the time of thermosetting. What is used as a basic amine hardening agent can be used. Specific examples include dicyandiamide; guanamines such as melamine, vinyltriazine, acetoguanamine, and benzoguanamine; organic acid hydrazides such as adipic acid dihydrazide and isophthalic acid dihydrazide. Among these, dicyandiamide and melamine are particularly preferable because they also have a rust preventive effect on the copper foil. You may use these individually or in mixture of 2 or more types.
The compounding amount of these amine-based active hydrogen compounds (C) is 1 equivalent of active hydrogen of amine-based active hydrogen compound (C) with respect to 1 equivalent of ethylenically unsaturated groups of the carboxyl group-containing unsaturated polyester resin (A). It is preferable that these amine-based active hydrogen compounds react with the resin (B) having two or more epoxy groups in one molecule or form a chelate with copper foil. 0.1 to 10% by mass, preferably 0.2 to 5% by mass.

本発明のハロゲンフリーで難燃性を有する熱硬化性樹脂組成物の特徴である下記一般式(I)で表わされるリン酸アミド(D)は、
The phosphoric acid amide (D) represented by the following general formula (I), which is a feature of the halogen-free and flame-retardant thermosetting resin composition of the present invention,

Figure 2005232195

(式中、R,Rは、同一又は異なるもので、水素原子又は炭素数1〜4のアルキル基を示す。)

ジフェニルホスフィニルクロリド、ジフェニルホスフィニルブロミド、ジ−3,5−キシレニルホスフィニルクロリドなどフェニル基、又はその芳香環の水素原子1〜2個が炭素数1〜4のアルキル基に置換されたジフェニルホスフィニルハライド類と、ピペラジンをジクロロエタンなどの非水系有機溶剤に溶解し、トリエチルアミンなどの塩基触媒を加えることにより、合成することができる。例えば、ジフェニルホスフィニルクロライドとピペラジンから、誘導される上記一般式(I)のR及びRが、水素原子であるN,N’−ビス(ジフェノキシフォスフィニル)ピペラジンは、リン原子を約11質量%、窒素原子を約5質量%含んでおり、融点は、約186.7℃である。市販品としては、四国化成社製のSP−703がある。
Figure 2005232195

(In formula, R < 1 >, R < 2 > is the same or different, and shows a hydrogen atom or a C1-C4 alkyl group.)

A phenyl group such as diphenylphosphinyl chloride, diphenylphosphinyl bromide, di-3,5-xylenylphosphinyl chloride, or 1 to 2 hydrogen atoms of the aromatic ring is an alkyl group having 1 to 4 carbon atoms. It can be synthesized by dissolving substituted diphenylphosphinyl halides and piperazine in a non-aqueous organic solvent such as dichloroethane and adding a base catalyst such as triethylamine. For example, N, N′-bis (diphenoxyphosphinyl) piperazine in which R 1 and R 2 of the above general formula (I) derived from diphenylphosphinyl chloride and piperazine are hydrogen atoms is a phosphorus atom About 11% by mass, about 5% by mass of nitrogen atoms, and the melting point is about 186.7 ° C. As a commercial item, there is SP-703 manufactured by Shikoku Kasei Co., Ltd.

この様にして得られた上記一般式(I)で表わされるリン酸アミド化合物(D)は、リン酸エステル類に比べ、加水分解性が極めて低く、プリント配線板製造時のめっき処理等のアルカリ又は酸による化学処理やその後の加熱処理でも加水分解することなく、安定した難燃性と、電気絶縁性を維持することができる。
又融点も高いため、熱硬化時に溶け出し、銅箔等を汚染するということも無い。更に、分子中に窒素原子を含んでいることから、燃焼時にホスファゼン環等を形成し、リン酸エステルに比べ、難燃性付与効果も高いという特徴を有している。
上記一般式(I)で表わされるリン酸アミド(D)の配合量としては、本発明の熱硬化性樹脂組成物中に5〜50質量%、好ましくは10〜40質量%、より好ましくは20〜40質量%である。リン酸アミドの配合量が、5質量%未満の場合、リン原子の含有率が低く、他の難燃剤と併用しても、充分な難燃性が得られないので好ましくない。一方、リン酸アミドの配合量が50質量%を超えた場合、塗膜強度が低下するので好ましくない。
The phosphoric acid amide compound (D) represented by the above general formula (I) thus obtained has extremely low hydrolyzability as compared with the phosphoric acid esters, and is an alkali such as a plating treatment when producing a printed wiring board. Alternatively, stable flame retardancy and electrical insulation can be maintained without hydrolysis even by chemical treatment with acid or subsequent heat treatment.
Moreover, since melting | fusing point is also high, it does not melt | dissolve at the time of thermosetting and does not contaminate copper foil etc. Further, since the molecule contains a nitrogen atom, a phosphazene ring or the like is formed at the time of combustion, and the flame retardancy imparting effect is higher than that of the phosphate ester.
As a compounding quantity of the phosphoric acid amide (D) represented by the said general formula (I), 5-50 mass% in the thermosetting resin composition of this invention, Preferably it is 10-40 mass%, More preferably, it is 20 -40 mass%. When the amount of phosphoric acid amide is less than 5% by mass, the phosphorus atom content is low, and even when used in combination with other flame retardants, sufficient flame retardancy cannot be obtained, such being undesirable. On the other hand, when the blending amount of phosphoric acid amide exceeds 50% by mass, the coating film strength decreases, which is not preferable.

また本発明の熱硬化性樹脂組成物には、必要に応じて、密着性、硬度、耐熱性等の特性を上げる目的で、硫酸バリウム、タルク、シリカ、クレー、水酸化アルミニウム等の公知慣用の無機充填剤を配合でき、その配合量は組成物中に、60質量%以下が適当であり、好ましくは5〜40質量%の割合である。無機充填剤の配合量が上記割合を越えると、硬化塗膜の耐屈曲性及び耐折性が低下し、好ましくない。さらに、必要に応じて公知慣用の着色顔料(例えば、酸化チタン、カーボン、フタロシアニンブルー、フタロシアニングリーン、ジスアゾイエロー等)、熱重合禁止剤、増粘剤、消泡剤、レベリング剤、シランカップリング剤等を添加できる。
また、難燃性をさらに上げるために、ホスファゼン化合物など、加水分解性の少ないリン含有化合物を配合することもできる。
In addition, the thermosetting resin composition of the present invention, if necessary, for the purpose of improving properties such as adhesion, hardness, heat resistance, etc., known and commonly used materials such as barium sulfate, talc, silica, clay, aluminum hydroxide and the like. An inorganic filler can be blended, and the blending amount thereof is suitably 60% by mass or less, preferably 5 to 40% by mass in the composition. If the blending amount of the inorganic filler exceeds the above ratio, the bending resistance and folding resistance of the cured coating film are lowered, which is not preferable. Further, if necessary, known and commonly used color pigments (eg, titanium oxide, carbon, phthalocyanine blue, phthalocyanine green, disazo yellow, etc.), thermal polymerization inhibitors, thickeners, antifoaming agents, leveling agents, silane coupling agents Etc. can be added.
In order to further increase the flame retardancy, a phosphorus-containing compound having a low hydrolyzability, such as a phosphazene compound, can be blended.

以上のような組成を有する熱硬化性樹脂組成物は、回路形成されたプリント配線板やテープキャリアパッケージにスクリーン印刷法により塗布し、例えば120〜180℃の温度に加熱して熱硬化させることにより、基材に対する密着性、耐めっき性、はんだ耐熱性、電気絶縁性等に優れた硬化塗膜が形成される。   The thermosetting resin composition having the composition as described above is applied to a printed wiring board or a tape carrier package on which a circuit is formed by a screen printing method, for example, by heating to a temperature of 120 to 180 ° C. and thermosetting it. A cured coating film excellent in adhesion to the substrate, plating resistance, solder heat resistance, electrical insulation, and the like is formed.

以下に実施例及び比較例を示して本発明について具体的に説明するが、本発明が下記実施例に限定されるものでないことはもとよりである。なお、以下において「部」及び「%」とあるのは、特に断りのない限り全て質量基準である。   EXAMPLES Hereinafter, the present invention will be described in detail with reference to examples and comparative examples, but the present invention is not limited to the following examples. In the following, “parts” and “%” are based on mass unless otherwise specified.

〈カルボキシル基含有不飽和ポリエステル樹脂(A)の合成例1〉
温度計、撹拌器、滴下ロート、及び還流冷却器を備えたフラスコに、クレゾールノボラック型エポキシ樹脂(エピクロンN−680、大日本インキ化学工業社製、エポキシ当量=210)210部とカルビトールアセテート109.7部を量り取り、加熱溶解した。次に、重合禁止剤としてハイドロキノン0.1部と、反応触媒としてトリフェニルホスフィン2.0部を加えた。この混合物を95〜105℃に加熱し、アクリル酸72部を徐々に滴下し、酸価が3.0mgKOH/g以下になるまで、約16時間反応させた。この反応生成物を、80〜90℃まで冷却し、テトラヒドロフタル酸無水物76.1部を加え、赤外吸光分析により、酸無水物の吸収ピーク(1780cm−1)が無くなるまで、約6時間反応させた。この反応液に、出光石油化学社製の芳香族系溶剤イプゾール#150 109.7部を加え、希釈した後、取り出した。このようにして得られたカルボキシル基含有不飽和ポリエステル樹脂(A)ワニスは、不揮発分62%、固形物の酸価78mgKOH/gであった。以下、この反応溶液をA−1ワニスと称す。
<Synthesis example 1 of carboxyl group-containing unsaturated polyester resin (A)>
In a flask equipped with a thermometer, a stirrer, a dropping funnel, and a reflux condenser, 210 parts of cresol novolac type epoxy resin (Epiclon N-680, manufactured by Dainippon Ink and Chemicals, epoxy equivalent = 210) and carbitol acetate 109 .7 parts were weighed and dissolved by heating. Next, 0.1 part of hydroquinone as a polymerization inhibitor and 2.0 parts of triphenylphosphine as a reaction catalyst were added. This mixture was heated to 95 to 105 ° C., 72 parts of acrylic acid was gradually added dropwise, and the mixture was reacted for about 16 hours until the acid value became 3.0 mgKOH / g or less. The reaction product was cooled to 80 to 90 ° C., 76.1 parts of tetrahydrophthalic anhydride was added, and about 6 hours until the absorption peak of acid anhydride (1780 cm −1 ) disappeared by infrared absorption analysis. Reacted. To this reaction solution, 109.7 parts of the aromatic solvent ipsol # 150 manufactured by Idemitsu Petrochemical Co., Ltd. was added, diluted, and taken out. The carboxyl group-containing unsaturated polyester resin (A) varnish thus obtained had a nonvolatile content of 62% and a solid acid value of 78 mgKOH / g. Hereinafter, this reaction solution is referred to as A-1 varnish.

〈カルボキシル基含有不飽和ポリエステル樹脂(A)の合成例2〉
撹拌装置、冷却管及び温度計を備えたフラスコに、ビスフェノールF型エポキシ樹脂(エポキシ当量=950、軟化点85℃、平均重合度n=6.2)380部とエピクロルヒドリン925部を仕込み、ジメチルスルホキシド462.5部に溶解させた後、攪拌下70℃で純度98.5%水酸化ナトリウム60.9部(1.5モル)を100分かけて添加した。添加後さらに70℃で3時間反応を行った。反応終了後、水250部を加え水洗を行った。油水分離後、油層よりジメチルスルホキシドの大半及び過剰の未反応エピクロルヒドリンを減圧下に蒸留回収し、残留した複製塩とジメチルスルホキシドを含む反応生成物をメチルイソブチルケトン750部に溶解させ、更に30%水酸化ナトリウム水溶液10部を加え、70℃で1時間反応させた。反応終了後、水200部で2回水洗を行った。油水分離後、油層よりチルイソブチルケトンを蒸留回収して、エポキシ当量=310、軟化点69℃のエポキシ樹脂(a)を得た。得られた前記一般式(II)で表わされる多官能エポキシ化合物(a)は、エポキシ当量から計算すると、前記出発物質ビスフェノールF型エポキシ樹脂におけるアルコール性水酸基6.2個のうち約5個がエポキシ化されたものであった。この多官能エポキシ化合物(a)310部及びカルビトールアセテート313.2部を攪拌機及び還流冷却器の付いた四つ口フラスコに仕込み、90℃で加熱・攪拌し、溶解した。得られた溶液を一旦60℃まで冷却し、アクリル酸72部、メチルハイドロキノン0.5部、トリフェニルホスフィン2部を加え、100℃に加熱し、約60時間反応させ、酸価が0.2mgKOH/gの反応物を得た。これにテトラヒドロフタル酸無水物140部を加え、90℃に加熱し、固形分酸価が100mgKOH/gになるまで反応を行ない、カルボキシル基含有不飽和ポリエステル光硬化性樹脂(A)を62.5%含有する溶液を得た。以下、この溶液をA−2ワニスと称す。
<Synthesis example 2 of carboxyl group-containing unsaturated polyester resin (A)>
A flask equipped with a stirrer, a condenser and a thermometer was charged with 380 parts of bisphenol F type epoxy resin (epoxy equivalent = 950, softening point 85 ° C., average polymerization degree n = 6.2) and 925 parts of epichlorohydrin, and dimethyl sulfoxide. After dissolving in 462.5 parts, 60.9 parts (1.5 mol) of 98.5% pure sodium hydroxide was added over 100 minutes at 70 ° C. with stirring. After the addition, the reaction was further carried out at 70 ° C. for 3 hours. After completion of the reaction, 250 parts of water was added and washed with water. After the oil / water separation, most of the dimethyl sulfoxide and excess unreacted epichlorohydrin were recovered from the oil layer by distillation under reduced pressure, and the reaction product containing the remaining replication salt and dimethyl sulfoxide was dissolved in 750 parts of methyl isobutyl ketone, and further 30% water. 10 parts of an aqueous sodium oxide solution was added and reacted at 70 ° C. for 1 hour. After completion of the reaction, washing was performed twice with 200 parts of water. After oil-water separation, til isobutyl ketone was recovered by distillation from the oil layer to obtain an epoxy resin (a) having an epoxy equivalent of 310 and a softening point of 69 ° C. When the obtained polyfunctional epoxy compound (a) represented by the general formula (II) is calculated from the epoxy equivalent, about 5 out of 6.2 alcoholic hydroxyl groups in the starting material bisphenol F type epoxy resin are epoxy. It was made. 310 parts of this polyfunctional epoxy compound (a) and 313.2 parts of carbitol acetate were charged into a four-necked flask equipped with a stirrer and a reflux condenser, and heated and stirred at 90 ° C. to dissolve. The obtained solution is once cooled to 60 ° C., 72 parts of acrylic acid, 0.5 part of methylhydroquinone and 2 parts of triphenylphosphine are added, heated to 100 ° C., reacted for about 60 hours, and the acid value is 0.2 mg KOH. / G of reaction product was obtained. To this was added 140 parts of tetrahydrophthalic anhydride, heated to 90 ° C., and reacted until the solid content acid value reached 100 mgKOH / g. 62.5 of carboxyl group-containing unsaturated polyester photocurable resin (A) was obtained. % Solution was obtained. Hereinafter, this solution is referred to as A-2 varnish.

〈カルボキシル基含有不飽和ポリエステル樹脂(A)の合成例3〉
ガス導入管、撹拌装置、冷却管及び温度計を備えたフラスコに、1,4−シクロヘキサンジカルボン酸172部とエポキシ当量=176の水素添加ビスフェノールAジグリシジルエーテル(ジャパンエポキシレジン社製、「YX8000」)880部を仕込み、窒素雰囲気下にて、100℃で撹拌した。その後、トリフェニルホスフィン0.65部を添加し、フラスコ内の温度を150℃まで昇温し、温度を150℃で保持しながら、約90分間反応させ、エポキシ当量438g/当量の線状のエポキシ化合物を得た。
次に、フラスコ内の温度を70℃以下まで冷却し、エピクロルヒドリン780部、ジメチルスルホキシド635部を加え、撹拌下70℃まで昇温し保持した。その後、純度96%水酸化ナトリウム150部を90分間かけて分割添加した後、さらに3時間反応させた。反応終了後、過剰のエピクロルヒドリン及びジメチルスルホキシドの大半を120℃、50mmHgの減圧下にて蒸留し、副生塩とジメチルスルホキシドを含む反応生成物をメチルイソブチルケトンに溶解させ水洗した。その後、油層よりメチルイソブチルケトンを蒸留回収して、エポキシ当量=247の前記一般式(III)で表わされる多官能エポキシ化合物(a)を得た。
次に、上記多官能エポキシ化合物(a)494部を、撹拌装置、冷却管及び温度計を備えたフラスコに入れ、カルビトールアセテート563.5部を加え、加熱溶解し、メチルハイドロキノン0.46部と、トリフェニルホスフィン1.38部を加え、95〜105℃に加熱し、アクリル酸350部を徐々に滴下し、20時間反応させた。この反応生成物を、80〜90℃まで冷却し、テトラヒドロフタル酸無水物300部を加え、8時間反応させた。反応は、電位差滴定による反応液の酸価、全酸価測定を行ない、得られる付加率にて追跡し、反応率95%以上を終点とする。
このようにして得られたカルボキシル基含有不飽和ポリエステル樹脂(A)ワニスは、不揮発分67%、固形物の酸価89.2mgKOH/gであった。以下、このカルボキシル基含有不飽和ポリエステル樹脂(A)ワニスを、A−3ワニスと称す。
<Synthesis example 3 of carboxyl group-containing unsaturated polyester resin (A)>
In a flask equipped with a gas introduction tube, a stirrer, a cooling tube and a thermometer, 172 parts of 1,4-cyclohexanedicarboxylic acid and epoxide equivalent = 176 hydrogenated bisphenol A diglycidyl ether (manufactured by Japan Epoxy Resin, “YX8000”) ) 880 parts were charged and stirred at 100 ° C. under a nitrogen atmosphere. Thereafter, 0.65 part of triphenylphosphine was added, the temperature in the flask was raised to 150 ° C., and the reaction was continued for about 90 minutes while maintaining the temperature at 150 ° C., and a linear epoxy having an epoxy equivalent of 438 g / equivalent was obtained. A compound was obtained.
Next, the temperature in the flask was cooled to 70 ° C. or lower, 780 parts of epichlorohydrin and 635 parts of dimethyl sulfoxide were added, and the temperature was raised to 70 ° C. with stirring and held. Thereafter, 150 parts of 96% pure sodium hydroxide was added in portions over 90 minutes, followed by further reaction for 3 hours. After completion of the reaction, most of the excess epichlorohydrin and dimethyl sulfoxide were distilled under reduced pressure of 120 ° C. and 50 mmHg, and the reaction product containing by-product salt and dimethyl sulfoxide was dissolved in methyl isobutyl ketone and washed with water. Thereafter, methyl isobutyl ketone was recovered from the oil layer by distillation to obtain a polyfunctional epoxy compound (a) represented by the general formula (III) having an epoxy equivalent of 247.
Next, 494 parts of the polyfunctional epoxy compound (a) is put into a flask equipped with a stirrer, a condenser tube and a thermometer, and 563.5 parts of carbitol acetate is added, dissolved by heating, and 0.46 part of methyl hydroquinone. And 1.38 parts of triphenylphosphine were added and heated to 95 to 105 ° C., 350 parts of acrylic acid was gradually added dropwise and reacted for 20 hours. The reaction product was cooled to 80 to 90 ° C., 300 parts of tetrahydrophthalic anhydride was added and reacted for 8 hours. In the reaction, the acid value and total acid value of the reaction solution are measured by potentiometric titration, followed by the addition rate obtained, and the reaction rate is 95% or more as the end point.
The carboxyl group-containing unsaturated polyester resin (A) varnish thus obtained had a nonvolatile content of 67% and a solid acid value of 89.2 mgKOH / g. Hereinafter, this carboxyl group-containing unsaturated polyester resin (A) varnish is referred to as A-3 varnish.

〈カルボキシル基含有不飽和ポリエステル樹脂(A)の合成例4〉
ガス導入管、撹拌装置、冷却管及び温度計を備えたフラスコに1,5−ジヒドロキシナフタレン203部とビスフェノールA型エポキシ樹脂のエピクロン−840(大日本インキ化学社製、エポキシ当量180)1097部を仕込み、窒素雰囲気下にて、撹拌下120℃で溶解させる。その後、トリフェニルホスフィン0.65部を添加し、フラスコ内の温度を150℃まで昇温し、温度を150℃で保持しながら、約90分間反応させ、エポキシ当量=365の2官能エポキシ化合物を得た。
次にフラスコ内の温度を70℃以下まで冷却し、エピクロルヒドリン2058部、ジメチルスルホキシド1690部を加え、撹拌下70℃まで昇温し保持する。その後、96%水酸化ナトリウム122部を90分間かけて分割添加する。添加後、さらに3時間反応させる。反応終了後、過剰のエピクロルヒドリン及びジメチルスルホキシドの大半を120℃、50mmHgの減圧下にて蒸留し、副生塩とジメチルスルホキシドを含む反応生成物をメチルイソブチルケトンに溶解させ水洗する。その後、油層よりメチルイソブチルケトンを蒸留回収して、エポキシ当量=275の前記一般式(V)で表わされる多官能エポキシ化合物(a)を得た。得られた多官能エポキシ化合物(a)は、エポキシ当量から計算すると、前記2官能エポキシ化合物におけるアルコ−ル性水酸基1.71個のうち約0.82個がエポキシ化されている。従って、アルコ−ル性水酸基のエポキシ化率は48%である。次に、多官能エポキシ化合物(a)347部を撹拌装置、冷却管及び温度計を備えたフラスコに入れ、カルビトールアセテート401部を加え、加熱溶解し、メチルハイドロキノン0.46部と、トリフェニルホスフィン1.38部を加え、95〜105℃に加熱し、アクリル酸91部を徐々に滴下し、16時間反応させた。この反応生成物を、80〜90℃まで冷却し、テトラヒドロフタル酸無水物163部を加え、8時間反応させた。反応は、電位差滴定による反応液の酸価、全酸価測定を行ない、得られる付加率にて追跡し、反応率95%以上を終点とする。このようにして得られたカルボキシル基含有不飽和ポリエステル樹脂(A)ワニスは、不揮発分60%、固形物の酸価100mgKOH/gであった。以下、この反応溶液をA−4ワニスと称す。
<Synthesis example 4 of carboxyl group-containing unsaturated polyester resin (A)>
In a flask equipped with a gas introduction tube, a stirrer, a cooling tube and a thermometer, 203 parts of 1,5-dihydroxynaphthalene and 1097 parts of Epicron-840 of bisphenol A type epoxy resin (Dainippon Ink Chemical Co., Ltd., epoxy equivalent 180) Charge and dissolve at 120 ° C. under stirring in a nitrogen atmosphere. Thereafter, 0.65 part of triphenylphosphine was added, the temperature in the flask was raised to 150 ° C., and the reaction was allowed to proceed for about 90 minutes while maintaining the temperature at 150 ° C. to obtain a bifunctional epoxy compound having an epoxy equivalent of 365. Obtained.
Next, the temperature in the flask is cooled to 70 ° C. or lower, 2058 parts of epichlorohydrin and 1690 parts of dimethyl sulfoxide are added, and the temperature is raised to 70 ° C. with stirring and maintained. Thereafter, 122 parts of 96% sodium hydroxide are added in portions over 90 minutes. After the addition, the reaction is further continued for 3 hours. After completion of the reaction, most of the excess epichlorohydrin and dimethyl sulfoxide are distilled at 120 ° C. under reduced pressure of 50 mmHg, and the reaction product containing the by-product salt and dimethyl sulfoxide is dissolved in methyl isobutyl ketone and washed with water. Thereafter, methyl isobutyl ketone was recovered from the oil layer by distillation to obtain a polyfunctional epoxy compound (a) represented by the general formula (V) having an epoxy equivalent of 275. When the obtained polyfunctional epoxy compound (a) is calculated from the epoxy equivalent, about 0.82 of 1.71 alcoholic hydroxyl groups in the bifunctional epoxy compound are epoxidized. Therefore, the epoxidation rate of the alcoholic hydroxyl group is 48%. Next, 347 parts of the polyfunctional epoxy compound (a) is put into a flask equipped with a stirrer, a condenser tube and a thermometer, 401 parts of carbitol acetate is added, and heated to dissolve, 0.46 parts of methylhydroquinone and triphenyl are added. 1.38 parts of phosphine was added and heated to 95 to 105 ° C., 91 parts of acrylic acid was gradually added dropwise and reacted for 16 hours. The reaction product was cooled to 80 to 90 ° C., 163 parts of tetrahydrophthalic anhydride was added, and the reaction was allowed to proceed for 8 hours. In the reaction, the acid value and total acid value of the reaction solution are measured by potentiometric titration, followed by the addition rate obtained, and the reaction rate is 95% or more as the end point. The carboxyl group-containing unsaturated polyester resin (A) varnish thus obtained had a nonvolatile content of 60% and a solid acid value of 100 mgKOH / g. Hereinafter, this reaction solution is referred to as A-4 varnish.

〈実施例1〜4及び比較例1〜2〉
前記合成例得られた各ワニスを用いた表1に示す配合成分を、3本ロールミルで混練し、熱硬化性樹脂組成物を得た。各熱硬化性樹脂組成物の評価結果を、表2に示す。

















<Examples 1-4 and Comparative Examples 1-2>
The compounding component shown in Table 1 using each varnish obtained in the synthesis example was kneaded with a three-roll mill to obtain a thermosetting resin composition. The evaluation results of each thermosetting resin composition are shown in Table 2.

















Figure 2005232195
Figure 2005232195













Figure 2005232195

なお、上記表2中の性能試験の方法は、以下の通りである。
Figure 2005232195

The performance test method in Table 2 is as follows.

性能評価:
(1)難燃性
日立化成製のノンハロゲンの難燃性基板RO−67G(0.2mmt材)に、片面20μmずつスクリーン印刷で全面塗布し、熱風循環式乾燥炉で150℃,30分間、熱硬化した。この試験片をUL94燃焼性試験に準じて、燃焼時間を測定した。
○:UL V−0相当
(試験片5本を、それぞれ2回着火した時の合計燃焼時間が、50秒以下)
△:UL V−1相当
(試験片5本を、それぞれ2回着火した時の合計燃焼時間が、50〜250秒)
×:自己消火性なし
(試験片5本を、それぞれ2回着火した時の合計燃焼時間が、250秒以上)
Performance evaluation:
(1) Flame Retardant A non-halogen flame retardant substrate RO-67G (0.2 mmt material) manufactured by Hitachi Chemical Co., Ltd. was coated on the entire surface by screen printing at 20 μm on one side and heated at 150 ° C. for 30 minutes in a hot air circulation drying oven. Cured. The test piece was measured for burning time according to the UL94 flammability test.
○: UL V-0 equivalent
(The total combustion time when 5 test pieces are ignited twice each is 50 seconds or less)
(Triangle | delta): UL V-1 equivalent (The total combustion time when each of five test pieces is ignited twice is 50 to 250 seconds)
X: No self-extinguishing (total burning time when igniting 5 test pieces twice each is 250 seconds or more)

(2)はんだ耐熱性
回路形成されたプリント配線板に、上記各熱硬化性樹脂組成物を、硬化塗膜が約20μmとなるようにパターン印刷し、150℃で30分間硬化させた。得られた硬化塗膜にロジン系フラックスを塗布し、260℃のはんだ槽に10秒間浸漬し、硬化塗膜の状態を以下の基準で評価した。
○:硬化塗膜にふくれ、剥がれ、変色がないもの
△:硬化塗膜に若干ふくれ、剥がれ、変色があるもの
×:硬化塗膜にふくれ、剥がれ、変色があるもの
(2) Solder heat resistance Each thermosetting resin composition was pattern-printed on a printed wiring board on which a circuit was formed so that the cured coating film had a thickness of about 20 μm, and cured at 150 ° C. for 30 minutes. A rosin-based flux was applied to the obtained cured coating film and immersed in a solder bath at 260 ° C. for 10 seconds, and the state of the cured coating film was evaluated according to the following criteria.
○: The cured coating has no blistering, peeling or discoloration
Δ: Slightly blistered, peeled, or discolored on the cured coating film
X: The cured coating has blistering, peeling, or discoloration

(3)耐酸性
上記と同様にして得られた基板を、50℃の10vol%の硫酸水溶液に、30分間浸漬し、水洗後、セロハン粘着テープによるピールテストを行い、レジストの剥がれ・変色について評価した。
○:全く変化が認められないもの
△:ほんの僅か変化したもの
×:塗膜に、剥がれがあるもの
(3) Acid resistance The substrate obtained in the same manner as above was immersed in a 10 vol% sulfuric acid aqueous solution at 50 ° C. for 30 minutes, washed with water, and then subjected to a peel test using a cellophane adhesive tape to evaluate the peeling and discoloration of the resist. did.
○: No change at all △: Slightly changed ×: The film has peeling

(4)耐アルカリ性
上記の耐酸性と同様に、得られた基板を、50℃の10wt%の水酸化ナトリウム溶液に、30分間浸漬し、水洗後、セロハン粘着テープによるピールテストを行い、レジストの剥がれ・変色について評価した。
○:全く変化が認められないもの
△:ほんの僅か変化したもの
×:塗膜に、剥がれがあるもの
(4) Alkali resistance In the same manner as the above acid resistance, the obtained substrate was immersed in a 10 wt% sodium hydroxide solution at 50 ° C. for 30 minutes, washed with water, and then subjected to a peel test using a cellophane adhesive tape. The peeling / discoloration was evaluated.
○: No change at all △: Slightly changed ×: The film has peeling

(5)耐折性
上記実施例2〜4の各熱硬化性樹脂組成物を、それぞれカプトン材(厚さ50μm)上にスクリーン印刷で全面印刷し、150℃で30分間硬化させた(乾燥膜厚20μm)。 得られた硬化膜を外側にして180゜折り曲げ、以下の基準で評価した。
○:硬化膜にクラックがないもの
△:硬化膜に若干クラックがあるもの
×:硬化膜にクラックがあるもの
(5) Folding resistance Each of the thermosetting resin compositions of Examples 2 to 4 above was printed on the entire surface of a Kapton material (thickness 50 μm) by screen printing and cured at 150 ° C. for 30 minutes (dry film). Thickness 20 μm). The obtained cured film was bent 180 ° outside and evaluated according to the following criteria.
○: The cured film has no cracks △: The cured film has some cracks ×: The cured film has cracks

(6)反り
上記実施例2〜4の各熱硬化性樹脂組成物を、それぞれカプトン材(150×110mm、厚さ25μm)上にスクリーン印刷で全面印刷し、150℃で30分間硬化させた(乾燥膜厚20μm)。冷却後、得られた硬化塗膜の反りを以下の基準で評価した。
○:反りがないもの
△:若干反りがあるもの
×:反りがあるもの
(6) Warpage Each of the thermosetting resin compositions of Examples 2 to 4 was screen-printed on a Kapton material (150 × 110 mm, thickness 25 μm) and cured at 150 ° C. for 30 minutes ( Dry film thickness 20 μm). After cooling, the warpage of the obtained cured coating film was evaluated according to the following criteria.
○: No warpage
Δ: Slightly warped
×: Warping

表2に示す結果から明らかな如く、本発明の熱硬化性樹脂組成物から得られた硬化塗膜は、ノンハロゲンで、比較例3のハロゲン含有エポキシ樹脂を使用した硬化物と同様の難燃性を有し、耐酸性、耐アルカリ性などの耐薬品性に優れた特性を有している。これに対して、一般式(I)で表わされるリン酸アミド化合物を配合していない比較例1は、難燃性が得られず、一方、汎用のリン酸エステル系難燃剤であるリン酸トリフェニルを配合した比較例2は、難燃性を示しているが、耐酸性、耐アルカリ性が劣っていた。





As is apparent from the results shown in Table 2, the cured coating film obtained from the thermosetting resin composition of the present invention is non-halogen and has the same flame retardancy as the cured product using the halogen-containing epoxy resin of Comparative Example 3. And has excellent chemical resistance such as acid resistance and alkali resistance. On the other hand, in Comparative Example 1 in which the phosphoric acid amide compound represented by the general formula (I) is not blended, flame retardancy cannot be obtained, while the phosphoric acid tribasic phosphoric acid flame retardant is triphosphate. Although the comparative example 2 which mix | blended phenyl showed the flame retardance, acid resistance and alkali resistance were inferior.





Claims (6)

(A)一分子中に1個以上のカルボキシル基及びエチレン性不飽和基を有するカルボキシル基含有不飽和ポリエステル樹脂、
(B)一分子中に2個以上のエポキシ基を有する樹脂、
(C)アミン系活性水素化合物、
及び(D)下記一般式(I)で表わされるリン酸アミド化合物

Figure 2005232195

(式中、R,Rは、同一又は異なるもので、水素原子又は炭素数1〜4のアルキル基を示す。)

を含有することを特徴とする熱硬化性樹脂組成物。
(A) a carboxyl group-containing unsaturated polyester resin having one or more carboxyl groups and ethylenically unsaturated groups in one molecule;
(B) a resin having two or more epoxy groups in one molecule;
(C) an amine-based active hydrogen compound,
And (D) a phosphoric acid amide compound represented by the following general formula (I)

Figure 2005232195

(In formula, R < 1 >, R < 2 > is the same or different, and shows a hydrogen atom or a C1-C4 alkyl group.)

A thermosetting resin composition comprising:
前記カルボキシル基含有不飽和ポリエステル樹脂(A)が、下記一般式(II)、下記一般式(III)、及び下記一般式(V)で表わされるエポキシ化合物からなる群から選ばれる少なくとも1種の多官能エポキシ化合物(a)

Figure 2005232195


(式中、R,Rは水素原子又はメチル基を示し、Rは水素原子又はグリシジル基を示し、nは1〜50の値を示す。)

Figure 2005232195

(式中、Mは下記一般式(IV)で表わされる基を示し、Rは脂肪族又は芳香族多官能カルボン酸の残基を示し、mは1〜50の値を示す。)



Figure 2005232195


(式中、R,Rは2価のシクロヘキサン環及び/又はベンゼン環を示し、R,R10は水素原子又はメチル基を示し、R11は水素原子又はグリシジル基を示し、kは0〜25の値を示す。)

Figure 2005232195

(式中、XとYは互いに異なる2価の芳香環を示し、Gはグリシジル基及び/又は水素原子を示し、pは1〜20の整数を示す。)

と、不飽和モノカルボン酸(b)との反応物に、飽和及び/又は不飽和多塩基酸無水物(c)を反応させて得られる樹脂であることを特徴とする請求項1に記載の熱硬化性樹脂組成物。
The carboxyl group-containing unsaturated polyester resin (A) is at least one selected from the group consisting of the following general formula (II), the following general formula (III), and the epoxy compound represented by the following general formula (V). Functional epoxy compound (a)

Figure 2005232195


(Wherein, R 3, R 4 represents a hydrogen atom or a methyl group, R 5 represents a hydrogen atom or a glycidyl radical, n denotes a value of 1-50.)

Figure 2005232195

(In the formula, M represents a group represented by the following general formula (IV), R 6 represents an aliphatic or aromatic polyfunctional carboxylic acid residue, and m represents a value of 1 to 50.)



Figure 2005232195


(Wherein R 7 and R 8 represent a divalent cyclohexane ring and / or a benzene ring, R 9 and R 10 represent a hydrogen atom or a methyl group, R 11 represents a hydrogen atom or a glycidyl group, and k represents Shows values from 0 to 25.)

Figure 2005232195

(In the formula, X and Y represent different divalent aromatic rings, G represents a glycidyl group and / or a hydrogen atom, and p represents an integer of 1 to 20.)

The resin obtained by reacting a saturated and / or unsaturated polybasic acid anhydride (c) with a reaction product of a monocarboxylic acid (b) and an unsaturated monocarboxylic acid (b). Thermosetting resin composition.
前記一分子中に2個以上のエポキシ基を有する樹脂(B)が、エポキシ化ポリブタジエンを含む樹脂であることを特徴とする請求項1又は2に記載の熱硬化性樹脂組成物。 The thermosetting resin composition according to claim 1 or 2, wherein the resin (B) having two or more epoxy groups in one molecule is a resin containing epoxidized polybutadiene. 前記アミン系活性水素化合物(C)が、メラミン及び/又はジシアンジアミドであることを特徴とする請求項1乃至3のいずれか一項に記載の熱硬化性樹脂組成物。 The thermosetting resin composition according to any one of claims 1 to 3, wherein the amine-based active hydrogen compound (C) is melamine and / or dicyandiamide. 前記リン酸アミド化合物(D)が、組成物中に5〜50質量%含むことを特徴とする請求項1乃至4のいずれか一項に記載の熱硬化性樹脂組成物。 The thermosetting resin composition according to any one of claims 1 to 4, wherein the phosphoric acid amide compound (D) is contained in the composition in an amount of 5 to 50% by mass. 前記請求項1乃至5のいずれか一項に記載の熱硬化性樹脂組成物を加熱により硬化させて得られる硬化塗膜。


A cured coating film obtained by curing the thermosetting resin composition according to any one of claims 1 to 5 by heating.


JP2004029859A 2004-02-05 2004-02-05 Thermosetting resin composition and its cured coating film Withdrawn JP2005232195A (en)

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JP2005298613A (en) * 2004-04-09 2005-10-27 Taiyo Ink Mfg Ltd Thermosetting resin composition and its cured film
JPWO2007061037A1 (en) * 2005-11-25 2009-05-07 日立化成工業株式会社 Liquid resin composition for electronic components and electronic component device
US20090248289A1 (en) * 2008-03-07 2009-10-01 Denso Corporation Apparatus for providing guidance route
US7666573B2 (en) 2005-07-14 2010-02-23 Mitsui Chemicals, Inc. Positive photosensitive resin composition and method for forming pattern
JP2010077322A (en) * 2008-09-26 2010-04-08 Fujifilm Corp Composition for forming plated layer, production method for metal pattern material and metal pattern material obtained thereby, and production method for surface metal film material and surface metal film material obtained thereby

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TW200728379A (en) * 2005-09-06 2007-08-01 Taiyo Ink Mfg Co Ltd Resin composition, cured product of the same, and printed circuit board made of the same
CN104808436B (en) * 2014-01-27 2017-11-24 太阳油墨(苏州)有限公司 Alkali development-type photosensitive resin composition, dry film and solidfied material and printed circuit board (PCB)

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JPS6021629B2 (en) * 1977-06-09 1985-05-28 ソニー株式会社 adhesive composition
US6090891A (en) * 1997-05-30 2000-07-18 Ciba Specialty Chemicals Corp. Carboxyl-containing polymer(s) with (2-oxo-1,3-dioxolan-4-yl)methyl groups-containing compound(s)

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Publication number Priority date Publication date Assignee Title
JP2005298613A (en) * 2004-04-09 2005-10-27 Taiyo Ink Mfg Ltd Thermosetting resin composition and its cured film
US7666573B2 (en) 2005-07-14 2010-02-23 Mitsui Chemicals, Inc. Positive photosensitive resin composition and method for forming pattern
JPWO2007061037A1 (en) * 2005-11-25 2009-05-07 日立化成工業株式会社 Liquid resin composition for electronic components and electronic component device
JP4775374B2 (en) * 2005-11-25 2011-09-21 日立化成工業株式会社 Liquid resin composition for electronic components and electronic component device
US8232355B2 (en) 2005-11-25 2012-07-31 Hitachi Chemical Co., Ltd. Liquid resin composition for electronic components and electronic component device
US20090248289A1 (en) * 2008-03-07 2009-10-01 Denso Corporation Apparatus for providing guidance route
JP2010077322A (en) * 2008-09-26 2010-04-08 Fujifilm Corp Composition for forming plated layer, production method for metal pattern material and metal pattern material obtained thereby, and production method for surface metal film material and surface metal film material obtained thereby

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