JP2003513169A5 - - Google Patents
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- Publication number
- JP2003513169A5 JP2003513169A5 JP2001533213A JP2001533213A JP2003513169A5 JP 2003513169 A5 JP2003513169 A5 JP 2003513169A5 JP 2001533213 A JP2001533213 A JP 2001533213A JP 2001533213 A JP2001533213 A JP 2001533213A JP 2003513169 A5 JP2003513169 A5 JP 2003513169A5
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
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Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US16109499P | 1999-10-22 | 1999-10-22 | |
| US60/161,094 | 1999-10-22 | ||
| PCT/US2000/029099 WO2001031081A1 (en) | 1999-10-22 | 2000-10-20 | Method and apparatus for coating a substrate in a vacuum |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2003513169A JP2003513169A (ja) | 2003-04-08 |
| JP2003513169A5 true JP2003513169A5 (ja) | 2005-12-22 |
Family
ID=22579796
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2001533213A Pending JP2003513169A (ja) | 1999-10-22 | 2000-10-20 | 真空で基板を被覆するための方法及び装置 |
Country Status (9)
| Country | Link |
|---|---|
| EP (1) | EP1246951A4 (ja) |
| JP (1) | JP2003513169A (ja) |
| KR (1) | KR100495751B1 (ja) |
| CN (1) | CN1175126C (ja) |
| AU (1) | AU1339401A (ja) |
| CA (1) | CA2388178A1 (ja) |
| DE (1) | DE10085115T1 (ja) |
| TW (1) | TW574396B (ja) |
| WO (1) | WO2001031081A1 (ja) |
Families Citing this family (29)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TW490714B (en) | 1999-12-27 | 2002-06-11 | Semiconductor Energy Lab | Film formation apparatus and method for forming a film |
| US20020011205A1 (en) | 2000-05-02 | 2002-01-31 | Shunpei Yamazaki | Film-forming apparatus, method of cleaning the same, and method of manufacturing a light-emitting device |
| JP4704605B2 (ja) * | 2001-05-23 | 2011-06-15 | 淳二 城戸 | 連続蒸着装置、蒸着装置及び蒸着方法 |
| SG113448A1 (en) * | 2002-02-25 | 2005-08-29 | Semiconductor Energy Lab | Fabrication system and a fabrication method of a light emitting device |
| KR100473485B1 (ko) * | 2002-03-19 | 2005-03-09 | 주식회사 이노벡스 | 유기 반도체 소자 박막 제작을 위한 선형 증발원 |
| EP1369499A3 (en) | 2002-04-15 | 2004-10-20 | Semiconductor Energy Laboratory Co., Ltd. | Method of fabricating light-emitting device and apparatus for manufacturing light-emitting device |
| US6749906B2 (en) | 2002-04-25 | 2004-06-15 | Eastman Kodak Company | Thermal physical vapor deposition apparatus with detachable vapor source(s) and method |
| US20040035360A1 (en) | 2002-05-17 | 2004-02-26 | Semiconductor Energy Laboratory Co., Ltd. | Manufacturing apparatus |
| TWI277363B (en) | 2002-08-30 | 2007-03-21 | Semiconductor Energy Lab | Fabrication system, light-emitting device and fabricating method of organic compound-containing layer |
| AU2003263609A1 (en) | 2002-09-20 | 2004-04-08 | Semiconductor Energy Laboratory Co., Ltd. | Fabrication system and manufacturing method of light emitting device |
| US7211461B2 (en) | 2003-02-14 | 2007-05-01 | Semiconductor Energy Laboratory Co., Ltd. | Manufacturing apparatus |
| JP4493926B2 (ja) | 2003-04-25 | 2010-06-30 | 株式会社半導体エネルギー研究所 | 製造装置 |
| US7211454B2 (en) | 2003-07-25 | 2007-05-01 | Semiconductor Energy Laboratory Co., Ltd. | Manufacturing method of a light emitting device including moving the source of the vapor deposition parallel to the substrate |
| US8123862B2 (en) | 2003-08-15 | 2012-02-28 | Semiconductor Energy Laboratory Co., Ltd. | Deposition apparatus and manufacturing apparatus |
| JP4551996B2 (ja) * | 2003-10-09 | 2010-09-29 | グローバル・オーエルイーディー・テクノロジー・リミテッド・ライアビリティ・カンパニー | 蒸発装置 |
| US20050241585A1 (en) * | 2004-04-30 | 2005-11-03 | Eastman Kodak Company | System for vaporizing materials onto a substrate surface |
| ITMI20042279A1 (it) * | 2004-11-24 | 2005-02-24 | Getters Spa | Sistema dispensatore di metalli alcalini in grado di dispensare quantita' elevate di metalli |
| JP2006225757A (ja) * | 2005-01-21 | 2006-08-31 | Mitsubishi Heavy Ind Ltd | 真空蒸着装置 |
| KR100635496B1 (ko) * | 2005-02-25 | 2006-10-17 | 삼성에스디아이 주식회사 | 격벽을 구비하는 측면 분사형 선형 증발원 및 그 증발원을구비하는 증착장치 |
| US7433141B2 (en) | 2005-03-09 | 2008-10-07 | Tandberg Data Corporation | Data randomization for rewriting in recording/reproduction apparatus |
| JP4696710B2 (ja) * | 2005-06-15 | 2011-06-08 | ソニー株式会社 | 蒸着成膜装置および蒸着源 |
| KR100745619B1 (ko) * | 2006-04-11 | 2007-08-02 | 한국전기연구원 | 플룸 형상 제어 레이저 증착 시스템 |
| KR101108152B1 (ko) * | 2009-04-30 | 2012-01-31 | 삼성모바일디스플레이주식회사 | 증착 소스 |
| KR101094299B1 (ko) | 2009-12-17 | 2011-12-19 | 삼성모바일디스플레이주식회사 | 선형 증발원 및 이를 포함하는 증착 장치 |
| KR102077803B1 (ko) * | 2013-05-21 | 2020-02-17 | 삼성디스플레이 주식회사 | 증착원 및 유기층 증착 장치 |
| CN104178734B (zh) * | 2014-07-21 | 2016-06-15 | 京东方科技集团股份有限公司 | 蒸发镀膜装置 |
| KR102319998B1 (ko) * | 2015-01-22 | 2021-11-01 | 삼성디스플레이 주식회사 | 볼륨 가변형 도가니를 구비한 증착원 |
| KR102488260B1 (ko) * | 2016-03-07 | 2023-01-13 | 삼성디스플레이 주식회사 | 증착 장치 및 표시 장치의 제조 방법 |
| CN106148878B (zh) * | 2016-06-24 | 2018-06-08 | 中南大学 | 一种模拟高温喷镀过程的装置及其使用方法 |
Family Cites Families (24)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE970246C (de) * | 1948-10-02 | 1958-08-28 | Siemens Ag | Vorrichtung zur laufenden Bedampfung endloser Gebilde |
| GB685269A (en) * | 1951-02-02 | 1952-12-31 | Nat Res Corp | Apparatus and process for coating a substrate with a metal |
| US3746502A (en) * | 1971-12-20 | 1973-07-17 | Xerox Corp | Evaporation crucible |
| DE2436431B2 (de) * | 1974-07-29 | 1978-07-27 | Licentia Patent-Verwaltungs-Gmbh, 6000 Frankfurt | Verdampfer und Verfahren zum Herstellen von Aufdampfschichten, insbesondere aus Selen |
| US4023523A (en) * | 1975-04-23 | 1977-05-17 | Xerox Corporation | Coater hardware and method for obtaining uniform photoconductive layers on a xerographic photoreceptor |
| US4264803A (en) * | 1978-01-10 | 1981-04-28 | Union Carbide Corporation | Resistance-heated pyrolytic boron nitride coated graphite boat for metal vaporization |
| US4332838A (en) * | 1980-09-24 | 1982-06-01 | Wegrzyn James E | Particulate thin film fabrication process |
| JPS57169082A (en) * | 1981-04-08 | 1982-10-18 | Mitsubishi Heavy Ind Ltd | Continuous vacuum vapor-depositing method |
| JPS5943869A (ja) * | 1982-09-04 | 1984-03-12 | Konishiroku Photo Ind Co Ltd | 蒸着方法 |
| DE3330092A1 (de) * | 1983-08-20 | 1985-03-07 | Leybold-Heraeus GmbH, 5000 Köln | Verfahren zum einstellen der oertlichen verdampfungsleistung an verdampfern in vakuumaufdampfprozessen |
| IT1197806B (it) * | 1986-08-01 | 1988-12-06 | Metalvuoto Films Spa | Procedimento ed apparecchiatura per la realizzazione di pellicole metallizzate per condesatori elettrici e prodotti cosi' ottenuti |
| GB2211209A (en) * | 1987-10-16 | 1989-06-28 | Philips Electronic Associated | A method of forming a defect mixed oxide |
| US5182567A (en) * | 1990-10-12 | 1993-01-26 | Custom Metallizing Services, Inc. | Retrofittable vapor source for vacuum metallizing utilizing spatter reduction means |
| US5167984A (en) * | 1990-12-06 | 1992-12-01 | Xerox Corporation | Vacuum deposition process |
| DE4123342C2 (de) * | 1991-07-15 | 1999-08-19 | Leybold Ag | Reihenverdampfer für Vakuumbedampfungsanlagen |
| US5336324A (en) * | 1991-12-04 | 1994-08-09 | Emcore Corporation | Apparatus for depositing a coating on a substrate |
| DE4203632C2 (de) * | 1992-02-08 | 2003-01-23 | Applied Films Gmbh & Co Kg | Vakuumbeschichtungsanlage |
| US5803976A (en) * | 1993-11-09 | 1998-09-08 | Imperial Chemical Industries Plc | Vacuum web coating |
| US5433791A (en) * | 1994-05-26 | 1995-07-18 | Hughes Aircraft Company | MBE apparatus with photo-cracker cell |
| JPH0853763A (ja) * | 1994-06-06 | 1996-02-27 | Matsushita Electric Ind Co Ltd | 薄膜の製造方法 |
| DE4422697C1 (de) * | 1994-06-29 | 1996-01-25 | Zsw | Verdampferquelle für eine Aufdampfanlage und ihre Verwendung |
| US5709753A (en) * | 1995-10-27 | 1998-01-20 | Specialty Coating Sysetms, Inc. | Parylene deposition apparatus including a heated and cooled dimer crucible |
| GB2339800B (en) * | 1998-07-24 | 2003-04-09 | Gen Vacuum Equipment Ltd | A vacuum process for depositing zinc sulphide and other coatings on flexible moving web |
| US6082296A (en) * | 1999-09-22 | 2000-07-04 | Xerox Corporation | Thin film deposition chamber |
-
2000
- 2000-10-20 JP JP2001533213A patent/JP2003513169A/ja active Pending
- 2000-10-20 TW TW89122148A patent/TW574396B/zh not_active IP Right Cessation
- 2000-10-20 WO PCT/US2000/029099 patent/WO2001031081A1/en not_active Application Discontinuation
- 2000-10-20 DE DE10085115T patent/DE10085115T1/de not_active Withdrawn
- 2000-10-20 KR KR10-2002-7005091A patent/KR100495751B1/ko not_active IP Right Cessation
- 2000-10-20 CA CA002388178A patent/CA2388178A1/en not_active Abandoned
- 2000-10-20 AU AU13394/01A patent/AU1339401A/en not_active Abandoned
- 2000-10-20 EP EP00975328A patent/EP1246951A4/en not_active Withdrawn
- 2000-10-20 CN CNB00816326XA patent/CN1175126C/zh not_active Expired - Fee Related