JP2003270627A - Transflective liquid crystal device and electronic device using the same - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a constitution which gives display of high quality regardless of disorder of orientation of liquid crystal molecules in a boundary portion between a transmissive display region and a reflective display region in a multi- gap type liquid crystal device and an electronic device using the same. <P>SOLUTION: A liquid crystal device 1 includes a transparent first substrate 10 with a first transparent electrode 11 formed on the surface thereof, a transparent second substrate 20 with a second transparent electrode 21 formed thereon, and a liquid crystal layer 50. A light reflecting layer 4 defining a reflective display region 31 and a transmissive display region 32 is formed on each pixel region. A layer-thickness adjusting layer 6 where a region corresponding to the transmissive display region 32 constitutes an opening 61 is formed on the upper layer side of the light reflecting layer 4. In the layer-thickness adjusting layer 6, the boundary portion between the reflective display region 31 and the transmissive display region 32 constitutes an inclined surface 60, and a light shielding film 9 is two-dimensionally superimposed on the boundary portion. <P>COPYRIGHT: (C)2003,JPO

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a semi-transmissive / reflective liquid crystal device. More specifically, the present invention relates to a multi-gap type liquid crystal device in which the thickness of the liquid crystal layer is changed to an appropriate value between the transmissive display area and the reflective display area within one pixel.

[0002]

2. Description of the Related Art Among various liquid crystal devices, those capable of displaying an image in both transmissive mode and reflective mode are semi-transmissive.
It is called a reflective liquid crystal device and is used in every scene.

In this semi-transmissive / reflective liquid crystal device, FIG.
As shown in (A), (B), and (C), a transparent first substrate 10 having a first transparent electrode 11 formed on the surface thereof, and a first
Transparent second substrate 20 having a second transparent electrode 21 formed on the side facing the electrode 11 of the first substrate 10, the second substrate 20, and the second substrate 20.
And a liquid crystal layer 5 of TN (twisted nematic) mode held between the substrate 20 and the substrate 20. Further, on the first substrate 10, a light reflection layer 4 constituting a reflection display area 31 is formed in the pixel area 3 where the first transparent electrode 11 and the second transparent electrode 21 face each other. The remaining area where 4 is not formed is a transmissive display area 32. Polarizing plates 41 and 42 are arranged on the outer surfaces of the first substrate 10 and the second substrate 20, respectively, and the backlight device 7 is arranged to face the polarizing plate 41.

In the liquid crystal device 1 having such a structure, of the light emitted from the backlight device 7, the transmissive display region 3 is included.
The light incident on 2 enters the liquid crystal layer 5 from the side of the first substrate 10 and is modulated by the liquid crystal layer 5 as shown by an arrow L1, and then transmitted display light from the side of the second substrate 20. And is displayed as an image (transmission mode).

Of the external light incident from the second substrate 20 side, the light incident on the reflective display area 31 is indicated by the arrow L2.
As shown by, the light reaches the reflection layer 4 through the liquid crystal layer 5, is reflected by the reflection layer 4, and is emitted again as reflection display light from the second substrate 20 side through the liquid crystal layer 5 to display an image. Display (reflection mode).

Here, on the first substrate 10, a reflective display color filter 81 and a transmissive display color filter 82 are provided in each of the reflective display area 31 and the transmissive display area 32.
Is formed, color display is possible.

When such a light modulation is performed, when the twist angle of the liquid crystal is set to be small, the change in the polarization state is caused by the product of the refractive index difference Δn and the layer thickness d of the liquid crystal layer 5 (retardation Δn · d). ), The display with good visibility can be performed by optimizing this value. However, in the semi-transmissive / reflective liquid crystal device 1, the transmissive display light passes through the liquid crystal layer 5 only once and is emitted, whereas the reflective display light passes through the liquid crystal layer 5 twice. Therefore, in both the transmitted display light and the reflected display light,
It is difficult to optimize the retardation Δn · d. Therefore, when the layer thickness d of the liquid crystal layer 5 is set so that the display in the reflective mode has good visibility, the display in the transmissive mode is sacrificed. On the contrary, when the layer thickness d of the liquid crystal layer 5 is set so that the display in the transmissive mode has good visibility, the display in the reflective mode is sacrificed.

Therefore, Japanese Patent Laid-Open No. 11-242226 discloses a structure in which the layer thickness d of the liquid crystal layer in the reflective display area 31 is made smaller than the layer thickness d of the liquid crystal layer 5 in the transmissive display area 32. Such a configuration is called a multi-gap type, and for example, FIGS.
(C) As shown in FIG. 5, the lower layer side of the first transparent electrode 11,
In addition, it can be realized by the layer thickness adjusting layer 6 on the upper layer side of the light reflection layer 4, the region corresponding to the transmissive display region 32 being an opening. That is, in the transmissive display region 32, the layer thickness d of the liquid crystal layer 5 is larger than that in the reflective display region 31 by the film thickness of the layer thickness adjusting layer 6, and therefore, for both the transmissive display light and the reflective display light. It is possible to optimize the retardation Δn · d. Here, in order to adjust the layer thickness d of the liquid crystal layer 5 with the layer thickness adjusting layer 6, it is necessary to form the layer thickness adjusting layer 6 thickly. To form such a thick layer, a photosensitive resin or the like is used. To be

[0009]

However, when the layer thickness adjusting layer 6 is formed of the photosensitive resin layer, a photolithography technique is used, which is caused by exposure accuracy at that time or side etching at the time of development. Then, the layer thickness adjusting layer 6
Becomes an obliquely upward slope 60 at the boundary between the reflective display area 31 and the transmissive display area 32. As a result, in the boundary portion between the reflective display area 31 and the transmissive display area 32,
As a result of the layer thickness d of the liquid crystal layer 5 changing continuously, the retardation Δn · d also changes continuously. In addition, the liquid crystal molecules included in the liquid crystal layer 5 are
Although the initial alignment state is defined by the alignment films 12 and 22 formed on the outermost surface of the substrate 20 of FIG.
Since the alignment regulating force of the alignment film 12 acts diagonally, the alignment of the liquid crystal molecules is disturbed in this portion.

Even when the surface is not inclined, the step and the step are vertical, and the alignment of liquid crystal molecules may be disturbed at the boundary.

Therefore, in the conventional liquid crystal device 1, for example, when it is designed to be normally white, the display should be entirely black when the electric field is applied, but light leaks at the portion corresponding to the slope 60. However, a display defect such as a decrease in contrast occurs.

In view of the above problems, in the present invention, a multi-gap type liquid crystal device in which the layer thickness of the liquid crystal layer is changed to an appropriate value between the transmissive display region and the reflective display region in one pixel region, And in electronic devices using the same, high-quality display is performed even if the retardation is inappropriate at the boundary between the transmissive display area and the reflective display area or the alignment of liquid crystal molecules is disturbed. It is to provide a configuration capable of doing.

[0013]

In order to solve the above problems, according to the present invention, a first substrate having a surface on which a first transparent electrode is formed and a surface opposite to the first electrode are provided with a first substrate. A second substrate on which two transparent electrodes are formed, and a liquid crystal layer held between the first substrate and the second substrate, wherein the first substrate is the first substrate. A light-reflecting layer that forms a reflective display area in a pixel area where the transparent electrode and the second transparent electrode face each other, and uses the remaining area of the pixel area as a transmissive display area;
A layer thickness adjusting layer for making the layer thickness of the liquid crystal layer in the reflective display region smaller than the layer thickness of the liquid crystal layer in the transmissive display region, and the first transparent electrode in this order from the lower layer side to the upper layer side. In the semi-transmissive / reflective liquid crystal device, a light-shielding film is formed on at least one of the first substrate and the second substrate so as to overlap a boundary region between the reflective display region and the transmissive display region. It is characterized by being.

Further, according to the present invention, there is provided a semi-transmissive / reflective liquid crystal device having a reflective display region and a transmissive display region, wherein a first substrate and a transparent electrode on a surface side facing the first substrate. A second substrate on which is formed, the first substrate and the second substrate.
A liquid crystal layer held between the liquid crystal layer in the reflective display area and the liquid crystal layer in the transmissive display area. In the semi-transmissive / reflective liquid crystal device, the layer thickness adjusting layer having a thickness smaller than the layer thickness and the light reflecting electrode are provided in this order from the lower layer side to the upper layer side, while the transparent electrode is provided in the transmissive display region. A light-shielding film is formed on at least one of the substrate and the second substrate so as to overlap a boundary region between the reflective display region and the transmissive display region.

Further, according to the present invention, the first substrate having the first transparent electrode formed on the surface thereof, and the second substrate having the second transparent electrode formed on the surface side facing the first electrode. And a liquid crystal layer held between the first substrate and the second substrate, wherein the first transparent electrode and the second transparent electrode face each other in the first substrate. Forming a reflective display area in the pixel area, the light reflective layer having the remaining area of the pixel area as a transmissive display area, and the first transparent electrode in this order from the lower layer side to the upper layer side. The second substrate is
In the reflective display region, a layer thickness adjusting layer that makes the layer thickness of the liquid crystal layer in the reflective display region smaller than the layer thickness of the liquid crystal layer in the transmissive display region, and the second transparent electrode from the lower layer side to the upper layer side. In a semi-transmissive / reflective liquid crystal device provided in this order toward the side, at least one of the first substrate and the second substrate overlaps a boundary region between the reflective display region and the transmissive display region. The light-shielding film is thus formed.

Further, according to the present invention, there is provided a semi-transmissive / reflective liquid crystal device having a reflective display area and a transmissive display area, wherein a first substrate and a transparent electrode on a surface side facing the first substrate. A second substrate on which is formed, the first substrate and the second substrate.
A liquid crystal layer held between the first substrate and the substrate, and the first substrate includes a light reflecting electrode in the reflective display region and a transparent electrode in the transmissive display region, and the second substrate is In the reflective display region, a layer thickness adjusting layer that makes the layer thickness of the liquid crystal layer in the reflective display region smaller than the layer thickness of the liquid crystal layer in the transmissive display region, and the transparent electrode from the lower layer side to the upper layer side. In the semi-transmissive / reflective liquid crystal device provided in this order, at least one of the first substrate and the second substrate is overlapped with a boundary region between the reflective display region and the transmissive display region. A light-shielding film is formed.

In the present invention, the boundary area between the reflective display area and the transmissive display area means the boundary between the reflective display area and the transmissive display area defined by the edge of the light reflective layer or the light reflective electrode.
An area formed by the end of the reflective display area adjacent to the boundary and / or the end of the transmissive display area adjacent to the boundary. In the present invention, the light-shielding film is formed so as to overlap the boundary area between the reflective display area and the transmissive display area. Therefore, when the thickness of the layer thickness adjusting layer continuously changes in the boundary region between the reflective display region and the transmissive display region, and the retardation Δn · d continuously changes in this portion, or Even if the alignment of liquid crystal molecules is disturbed,
Neither reflected display light nor transmitted display light is emitted from such a region. Therefore, it is possible to avoid the occurrence of problems such as light leakage during black display, and thus it is possible to perform display with high contrast and high quality.

In the present invention, the light shielding film is, for example,
It is formed on the side of the first transparent substrate. Alternatively, the light shielding film may be formed on the second transparent substrate side.

In the present invention, it is preferable that in the layer thickness adjusting layer, a boundary region between the reflective display region and the transmissive display region is a slope. In the present invention, it is preferable that the light shielding film is formed in a region that planarly overlaps the slope of the layer thickness adjusting layer. Here, that the light-shielding film is formed in a region that overlaps with the slope in plan view means that the slope and the light-shielding film overlap with each other when seen in a plan view, and the slope includes the light-shielding film. May be.

In the present invention, it is preferable that the light shielding film is formed so as to planarly overlap with an end portion of the light reflecting layer. In the present invention, the boundary area between the reflective display area and the transmissive display area is designed to be covered with a light-shielding film, but due to an error in forming a light-reflecting film, an error in forming a light-shielding film, or the like, Light leaks from the boundary between the reflective display area and the transmissive display area, that is, the boundary between the area where the light reflective layer or the light reflective electrode is formed and the remaining area, and the leaked light is the thickness of the layer thickness adjusting layer. There is a possibility that a problem such as a decrease in contrast may occur due to the light being transmitted through a portion in which the orientation is changed or a portion in which the alignment of liquid crystal molecules is disturbed and emitted. Therefore, by forming the light-shielding film so as to planarly overlap the end portion of the light reflection layer or the light reflection electrode, it is possible to reliably prevent light leakage from the boundary between the reflection display region and the transmissive display region. it can.

In the present invention, the transmissive display area is, for example, arranged in an island shape in the reflective display area.

In the present invention, the transmissive display area may be arranged at an end of the pixel area.

In the present invention, when the pixel area is formed as a rectangular area, the transmissive display area is
For example, it is preferable to have a rectangular shape in which at least one side overlaps the side of the pixel region. The wider the area where the light-shielding film is formed, the lower the amount of light that contributes to the display and the darker the display becomes. However, when the side of the transmissive display area is overlapped with the side of the pixel area, the transmissive display area and the reflective display area are correspondingly separated. Since the total length of the boundary region, that is, the total length of the light shielding layer can be shortened, it is possible to minimize the decrease in the amount of light that contributes to display.
Further, a light-shielding film or a light-shielding wiring is generally formed in a boundary region between adjacent pixel regions, so that a portion of the periphery of the transmissive display region which is covered with these light-shielding films is originally used for display. Since it does not contribute, even if the retardation or the alignment of the liquid crystal is disturbed in this portion, the display quality is not deteriorated.

As such a structure, for example, the transmissive display area is arranged at a position where one side overlaps with the side of the pixel area, and is arranged at a position where two sides overlap with the side of the pixel area. Or the configuration in which three sides overlap the sides of the pixel region. Here, if a light-shielding wiring passes through the light-shielding film so as to divide the pixel area into two, and the reflection display area and the transmissive display area are arranged on both sides of the wiring, the transmissive display area is formed. Are arranged at positions where three sides overlap the sides of the pixel region.

In the present invention, if a color filter is formed in the image display area, a semi-transmissive / reflective liquid crystal device for color display can be constructed. In this case, it is preferable that a reflective display color filter is formed in the reflective display area, and a transmissive display color filter having a higher degree of coloring than the reflective display color filter is formed in the transmissive display area. .

In the present invention, the reflective display area is wider than the transmissive display area, the reflective display area is narrower than the transmissive display area, and the reflective display area and the transmissive display area are equal in area. Either of them may be used.

The liquid crystal device to which the present invention is applied can be used as a display device for electronic devices such as mobile phones and mobile computers.

[0028]

BEST MODE FOR CARRYING OUT THE INVENTION Embodiments of the present invention will be described with reference to the drawings. In each figure used in the following description,
In order to make each layer and each member recognizable in the drawing, the scale is different for each layer and each member.

[Embodiment 1] FIGS. 1 (A), 1 (B),
FIG. 3C is a plan view schematically showing one of a plurality of pixel regions formed in a matrix in the liquid crystal device, the plan view thereof being taken along the line AA ′, and the cross section taken along the line BB ′. Is. Since the liquid crystal device of this embodiment has a basic configuration in common with a conventional liquid crystal device, parts having common functions will be described with the same reference numerals.

The pixel regions shown in FIGS. 1A, 1B, and 1C are obtained by using either a TFD or a TFT as a nonlinear element for pixel switching in an active matrix type liquid crystal device described later. Also, the common parts are extracted and shown. The liquid crystal device 1 shown here is ITO
A transparent first substrate 10 such as quartz or glass having a first transparent electrode 11 made of a film or the like formed on the surface thereof, and a second substrate also made of an ITO film or the like on the side facing the first electrode 11. A transparent second substrate 20 such as quartz or glass on which a transparent electrode 21 is formed, a first substrate 10 and a second substrate 20.
Liquid crystal layer 5 made of TN mode liquid crystal held between
0, and the region where the first transparent electrode 11 and the second transparent electrode 21 face each other is the pixel region 3 that directly contributes to the display.

In the liquid crystal device 1, a large number of pixel regions 3 are formed in a matrix, and these pixel regions 3 are formed.
When the boundary area between them is seen in a plan view, the light-shielding film 90 called black mask or black stripe formed on the first substrate 10 or the second substrate 20, or the light-shielding wiring (not shown) Passing through. Therefore, the pixel region 3 is in a state of being surrounded by the light shielding film 90 and the light shielding wiring in a plan view.

The first transparent electrode 11 is formed on the first substrate 10.
The rectangular light reflection layer 4 forming the reflection display region 31 is formed of an aluminum film or a silver alloy film in the rectangular pixel region 3 where the second transparent electrode 21 and the second transparent electrode 21 face each other.
A rectangular opening 40 is formed in the center of the. Therefore, in the pixel region 3, the region in which the light reflection layer 4 is formed is the reflection display region 31, but the region corresponding to the opening 40 is island-shaped in which the light reflection layer 4 is not formed, and , A rectangular transparent display area 32.

Polarizing plates 41 and 42 are disposed on the outer surfaces of the first substrate 10 and the second substrate 20, respectively, and the backlight device 7 is disposed opposite to the polarizing plate 41 side.

In the liquid crystal device 1 thus constructed,
Of the light emitted from the backlight device 7, the light incident on the transmissive display region 32 is the first light as indicated by the arrow L1.
The light enters the liquid crystal layer 50 from the side of the substrate 10, is light-modulated therein, and then is emitted as transmission display light from the side of the second substrate 20 to display an image (transmission mode).

Of the external light incident from the second substrate 20 side, the light incident on the reflective display area 31 is indicated by the arrow L2.
As shown in FIG. 2, the light reaches the reflective layer 4 through the liquid crystal layer 50, is reflected by the reflective layer 4, and again passes through the liquid crystal layer 50 to the second layer.
The image is displayed by being emitted as reflection display light from the substrate 20 side (reflection mode).

Here, on the first substrate 10, a reflective display color filter 81 and a transmissive display color filter 82 are provided in each of the reflective display region 31 and the transmissive display region 32.
Is formed, color display is possible. As the transmissive display color filter 82, a filter having a higher degree of coloring than the reflective display color filter 81, such as a large amount of pigment, is used.

In such a semi-transmissive / reflective liquid crystal device 1, transmissive display light passes through the liquid crystal layer 50 only once and is emitted, whereas reflective display light passes through the liquid crystal layer 50.
It will pass once. Therefore, in the first substrate 10, the lower layer side of the first transparent electrode 11 and the light reflection layer 4
On the upper layer side, a layer thickness adjusting layer 6 made of a photosensitive resin layer having an opening 61 in a region corresponding to the transmissive display region 32 is formed. Therefore, in the transmissive display area 32, as compared with the reflective display area 31, only the film thickness of the layer thickness adjusting layer 6 is
Since the layer thickness d of the liquid crystal layer 50 is large, the retardation Δn · d can be optimized for both the transmitted display light and the reflected display light.

When the layer thickness adjusting layer 6 is formed, a photolithography technique is used. The exposure accuracy at that time is
Alternatively, due to side etching or the like at the time of development, in the layer thickness adjusting layer 6, the boundary portion between the reflective display region 31 and the transmissive display region 32 is an obliquely upward slope 60. When viewed, it is in a state of being formed with a width of 8 μm. Therefore, at the boundary with the transmissive display region 32, the layer thickness d of the liquid crystal layer 50 changes continuously, and as a result, the retardation Δn · d also changes continuously. The initial alignment state of the liquid crystal molecules contained in the liquid crystal layer 50 is defined by the alignment films 12 and 22 formed on the outermost layers of the first substrate 10 and the second substrate 20, but on the slope 60, Since the alignment regulating force of the alignment film 12 acts diagonally, the alignment of the liquid crystal molecules is disturbed in this portion.

Since such a boundary region in an unstable state causes deterioration of display quality, in the present embodiment, the boundary between the reflective display region 31 and the transmissive display region 32 is formed on the first substrate 10. The light-shielding film 9 is formed so as to overlap the entire region. The light-shielding film 9 has a width of about 9 μm,
The slope 60 is formed so as to be included in the light shielding film 9 when viewed in a plan view. That is, in the present embodiment, the light-shielding film 9 made of a light-shielding metal film such as a chrome film is provided along the entire inner peripheral edge of the light-reflecting layer 4 that partitions the reflective display region 31 and the transmissive display region 32. Is formed in a rectangular frame shape so that a part of the above covers the end of the light reflection layer 4.

As described above, in this embodiment, the reflective display area 31 is provided.
Since the light-shielding film 9 is formed so as to overlap the entire boundary area between the reflective display area 31 and the transmissive display area 32, the thickness of the layer thickness adjusting layer 6 is continuous in the boundary area between the reflective display area 31 and the transmissive display area 32. Even if the retardation Δn · d changes continuously in this portion, or the orientation of the liquid crystal molecules is disturbed, neither reflective display light nor transmissive display light is emitted from such a region. . Further, since the light-shielding film 9 is formed so as to planarly overlap the inner peripheral end portion of the light reflection layer 4, light leakage does not occur at the boundary between the reflective display region 31 and the transmissive display region 32. Therefore, it is possible to avoid the occurrence of problems such as light leakage during black display, and thus it is possible to perform high-quality display with high contrast.

Further, since the transmissive display color filter 82 having a higher degree of coloring than the reflective display color filter 81 is used, the transmissive display light may pass through the color filter only once. Since the same color as the reflected display light that passes through the color filter twice is obtained, high quality color display can be performed.

When manufacturing the liquid crystal device 1 having such a structure, the first substrate 10 is formed as follows.

First, after preparing the first substrate 10 made of quartz or glass, a reflective metal film such as aluminum or silver alloy is formed on the entire surface thereof, and then this metal is formed by using a photolithography technique. The film is patterned to form the light reflecting layer 4. When the first substrate has the scattering function, the scattering structure may be formed by etching glass or using resin before forming the metal film.

Next, after forming a light-shielding metal film of chromium or the like on the entire surface of the first substrate 10, this metal film is patterned by using the photolithography technique to form the light-shielding film 9.

Next, the reflective display color filter 81 and the transmissive display color filter 82 are formed in predetermined regions by using a flexographic printing method, a photolithography technique, or an inkjet method.

Next, by using a spin coating method, a photosensitive resin is applied to the entire surface of the first substrate 10 and then exposed and developed to form a layer thickness adjusting layer 6.

Next, a transparent conductive film such as an ITO film is formed on the entire surface of the first substrate 10, and then the transparent conductive film is patterned by using the photolithography technique to form the first transparent electrode 11. To do.

Next, using a spin coating method, a polyimide resin is applied to the entire surface of the first substrate 10 and baked, and then an alignment treatment such as a rubbing treatment is performed to form an alignment film 12.

The first substrate 10 thus formed is attached to the separately formed second substrate 20 with a predetermined gap, and then liquid crystal is injected between the substrates to form a liquid crystal. Form layer 50.

In the liquid crystal device 1, since a non-linear element for pixel switching such as TFD or TFT may be formed on the side of the first substrate 10, the light shielding film 9 and other layers may have TFD or TFT. You may form using a part of process of forming TFT etc.

In the transparent display area 31 and the transparent display area 32, the transparent display area 31 is the transparent display area 3
2, the transparent display area 31 is wider than the transparent display area 3
Structure smaller than 2, transparent display area 31 and transparent display area 3
2 may have a structure having the same area.

[Second Embodiment] FIGS. 2A and 2B,
(C) is a plan view schematically showing one of a plurality of pixel regions formed in a matrix in the liquid crystal device of the present embodiment, showing a schematic plan view thereof, an AA ′ cross-sectional view thereof, and B, respectively.
It is a -B 'sectional view. Since the liquid crystal devices according to the present embodiment and the third to eighth embodiments described below have the same basic configuration as that of the first embodiment, the same reference numerals are given to parts having common functions. And their description is omitted.
The manufacturing method is also the same as that of the first embodiment, and thus the description thereof is omitted.

In the pixel regions shown in FIGS. 2A, 2B, and 2C, as in the first embodiment, in the active matrix type liquid crystal device, either TFD or TFT is used as the nonlinear element for pixel switching. In the case of using, the common part is extracted and shown. The liquid crystal device 1 shown here also includes a transparent first substrate 10 having a first transparent electrode 11 formed on the surface thereof, and a second substrate 10 on the side facing the first electrode 11.
A transparent second substrate 20 on which a transparent electrode 21 of
T held between the first substrate 10 and the second substrate 20
A liquid crystal layer 50 made of N-mode liquid crystal is provided, and a region where the first transparent electrode 11 and the second transparent electrode 21 face each other is a pixel region 3 that directly contributes to display. Further, the pixel region 3 is in a state of being surrounded by the light shielding film 90 and the light shielding wiring in a plan view.

The first transparent electrode 11 is formed on the first substrate 10.
The light reflection layer 4 forming the reflection display area 31 is formed of an aluminum film or a silver alloy film in the rectangular pixel area 3 where the second transparent electrode 21 and the second transparent electrode 21 face each other, and corresponds to one side of the light reflection layer 4. A rectangular opening 40 is formed in the portion.
Therefore, in the pixel area 3, the area where the light reflection layer 4 is formed is the reflection display area 31, but the opening 4
The area corresponding to 0 is a rectangular transmissive display area 32 in which the light reflection layer 4 is not formed. Here, one side of the transmissive display area 32 overlaps one side of the pixel area 3.

The first substrate 10 and the second substrate 2
Polarizing plates 41 and 42 are disposed on the outer surface of each of 0,
The backlight device 7 is arranged to face the polarizing plate 41. In addition, the reflective display area 3 is formed on the first substrate 10.
Since the reflective display color filter 81 and the transmissive display color filter 82 are formed in each of 1 and the transmissive display area 32, color display is possible.

Also in this embodiment, in the first substrate 10, the region corresponding to the transmissive display region 32 is the opening 61 on the lower layer side of the first transparent electrode 11 and the upper layer side of the light reflecting layer 4. A layer thickness adjusting layer 6 made of a photosensitive resin layer is formed. Therefore, in the transmissive display area 32, as compared with the reflective display area 31, the liquid crystal layer 5 is formed by the thickness of the layer thickness adjusting layer 6.
Since the layer thickness d of 0 is large, the retardation Δn · d is optimized for both the transmitted display light and the reflected display light.

Here, in the layer thickness adjusting layer 6, an obliquely upward slope 60 having a width of 8 μm is formed at the boundary between the reflective display region 31 and the transmissive display region 32. Therefore, in the present embodiment, the light-shielding film 9 is formed in a U-shape in plan view so as to overlap the entire boundary region between the reflective display region 31 and the transmissive display region 32 on the first substrate 10. The light-shielding film 9 has a width of about 9 μm and is formed so that the slope 60 is included in the light-shielding film 9 when seen in a plan view. That is, in the present embodiment, the light-shielding film made of a light-shielding metal film such as a chrome film is provided along three sides of the four sides of the rectangular transmissive display region 32 except for a region overlapping with one side of the pixel region 3. 9 is formed in a U shape so that a part of the light shielding film 9 covers the end portion of the light reflection layer 4.

As described above, in the present embodiment, the light-shielding film 9 is formed so as to overlap the entire boundary area between the reflective display area 31 and the transmissive display area 32, as in the first embodiment.
The same effects as those of the first embodiment can be obtained, such as the occurrence of a defect such as light leakage at the boundary area between the reflective display area 31 and the transmissive display area 32 during black display.

Further, as the light-shielding film 9 has a wider formation area, the amount of light contributing to the display decreases, so that the display tends to be darker. However, in the present embodiment, the light-shielding film 9 has a U-shaped planar shape. The light-shielding film 9 is not formed in the portion that is formed and corresponds to one side of the transmissive display region 32. For this reason, since the total length of the light shielding film 9 is short, it is possible to minimize the decrease in the amount of light contributing to the display. Here, since the light-shielding film 90 and the light-shielding wiring are generally formed in the boundary region between the adjacent pixel regions 3, a portion of the periphery of the transmissive display region 32 which is covered with these light-shielding films 90. Does not contribute to the display, and therefore, even if the retardation or the alignment of the liquid crystal is disturbed at this portion, the display quality is not deteriorated.

In this embodiment, since the end of the light-shielding film 9 reaches the boundary region between the adjacent pixel regions 3, it is extended from another light-shielding film 90 passing through this boundary region or the light-shielding wiring. The light shielding film 9 may be formed as a part.

In the transparent display area 31 and the transparent display area 32, the transparent display area 31 is the transparent display area 3
2, the transparent display area 31 is wider than the transparent display area 3
Structure smaller than 2, transparent display area 31 and transparent display area 3
2 may have a structure having the same area.

[Third Embodiment] FIGS. 3A and 3B,
(C) is a plan view schematically showing one of a plurality of pixel regions formed in a matrix in the liquid crystal device of the present embodiment, showing a schematic plan view thereof, an AA ′ cross-sectional view thereof, and B, respectively.
It is a -B 'sectional view.

In the pixel regions shown in FIGS. 3A, 3B, and 3C, as in the first embodiment, in the active matrix type liquid crystal device, either TFD or TFT is used as a nonlinear element for pixel switching. In the case of using, the common part is extracted and shown. The liquid crystal device 1 shown here also includes a transparent first substrate 10 having a first transparent electrode 11 formed on the surface thereof, and a second substrate 10 on the side facing the first electrode 11.
A transparent second substrate 20 on which a transparent electrode 21 of
T held between the first substrate 10 and the second substrate 20
A liquid crystal layer 50 made of N-mode liquid crystal is provided, and a region where the first transparent electrode 11 and the second transparent electrode 21 face each other is a pixel region 3 that directly contributes to display. Further, the pixel region 3 is in a state of being surrounded by the light shielding film 90 and the light shielding wiring in a plan view.

The first transparent electrode 11 is formed on the first substrate 10.
The light reflection layer 4 forming the reflection display area 31 is formed of an aluminum film or a silver alloy film in the rectangular pixel area 3 where the second transparent electrode 21 and the second transparent electrode 21 face each other, and a portion corresponding to a corner of the light reflection layer 4 is formed. A rectangular opening 40 is formed in the. Therefore, in the pixel region 3, the region where the light reflection layer 4 is formed is the reflective display region 31, but the opening 40
The area corresponding to is a rectangular transmissive display area 32 in which the light reflection layer 4 is not formed. Here, the transparent display area 32 has its two sides overlapping with the two sides of the pixel area 3.

The first substrate 10 and the second substrate 2
Polarizing plates 41 and 42 are disposed on the outer surface of each of 0,
The backlight device 7 is arranged to face the polarizing plate 41. In addition, the reflective display area 3 is formed on the first substrate 10.
Since the reflective display color filter 81 and the transmissive display color filter 82 are formed in each of 1 and the transmissive display area 32, color display is possible.

Further, in the first substrate 10, on the lower layer side of the first transparent electrode 11 and the upper layer side of the light reflecting layer 4, a region corresponding to the transmissive display region 32 is an opening 61. A layer thickness adjusting layer 6 made of a flexible resin layer is formed. Therefore, in the transmissive display area 32, the reflective display area 3
Compared with 1, the liquid crystal layer 50 is formed by the film thickness of the layer thickness adjusting layer 6.
Since the layer thickness d is large, the retardation Δn · d is optimized for both the transmitted display light and the reflected display light.

Here, in the layer thickness adjusting layer 6, an obliquely upward slope 60 having a width of 8 μm is formed at the boundary between the reflective display region 31 and the transmissive display region 32. Therefore, in the present embodiment, the light-shielding film 9 is formed in a planar L-shape on the first substrate 10 so as to overlap the entire boundary region between the reflective display region 31 and the transmissive display region 32. The light-shielding film 9 has a width of about 9 μm and is formed so that the slope 60 is included in the light-shielding film 9 when seen in a plan view. That is, in the present embodiment, the light-shielding film made of a light-shielding metal film such as a chrome film is provided along two sides of the four sides of the rectangular transmissive display region 32 except the region overlapping the two sides of the pixel region 3. 9 is formed in an L shape so that a part of the light shielding film 9 covers the end portion of the light reflection layer 4.

As described above, in the present embodiment, the light-shielding film 9 is formed so as to overlap the entire boundary area between the reflective display area 31 and the transmissive display area 32, as in the first embodiment.
The same effects as those of the first embodiment can be obtained, such as the occurrence of a defect such as light leakage at the boundary area between the reflective display area 31 and the transmissive display area 32 during black display.

Further, with respect to the light-shielding film 9, the wider the formation area is, the less the amount of light contributing to the display is, so that the display tends to be dark, but in the present embodiment, the light-shielding film 9 has a flat surface L.
The light-shielding film 9 is not formed in a portion corresponding to two sides of the transmissive display region 32, which is formed in a letter shape. For this reason, since the total length of the light shielding film 9 is short, it is possible to minimize the decrease in the amount of light contributing to the display. Here, since the light-shielding film 90 and the light-shielding wiring are generally formed in the boundary region between the adjacent pixel regions 3, a portion of the periphery of the transmissive display region 32 which is covered with these light-shielding films 90. Does not contribute to the display, and therefore, even if the retardation or the alignment of the liquid crystal is disturbed at this portion, the display quality is not deteriorated.

In this embodiment, since the edge of the light-shielding film 9 reaches the boundary region between the adjacent pixel regions 3, it is extended from another light-shielding film 90 passing through this boundary region or the light-shielding wiring. The light shielding film 9 may be formed as a part.

In the transparent display area 31 and the transparent display area 32, the transparent display area 31 is the transparent display area 3
2, the transparent display area 31 is wider than the transparent display area 3
Structure smaller than 2, transparent display area 31 and transparent display area 3
2 may have a structure having the same area.

[Fourth Embodiment] FIGS. 4A and 4B schematically show one of a plurality of pixel regions formed in a matrix in the liquid crystal device of the present embodiment. It is a top view and its BB 'sectional drawing.

In the pixel region shown in FIGS. 4A and 4B, as in the first embodiment, the TFD is used as a nonlinear element for pixel switching in the active matrix type liquid crystal device.
In both cases of using the TFT and the TFT, common portions are extracted and shown. The liquid crystal device 1 shown here is also an IT
A transparent first substrate 10 such as quartz or glass having a first transparent electrode 11 formed of an O film or the like formed on its surface, and a first substrate 11 also formed of an ITO film or the like on the surface side facing the first electrode 11. A second transparent substrate 20 such as quartz or glass on which the second transparent electrode 21 is formed, and a liquid crystal layer 50 made of TN type liquid crystal held between the first substrate 10 and the second substrate 20. The area where the first transparent electrode 11 and the second transparent electrode 21 face each other is the pixel area 3 that directly contributes to the display. Further, the pixel region 3 is in a state of being surrounded by the light shielding film 90 and the light shielding wiring in a plan view.

The first transparent electrode 11 is formed on the first substrate 10.
The light reflection layer 4 forming the reflection display area 31 is formed in a rectangular shape by an aluminum film or a silver alloy film in the rectangular pixel area 3 where the second transparent electrode 21 and the second transparent electrode 21 face each other. The region corresponding to is a rectangular opening 40 in which the light reflection layer 4 is not formed. Therefore, in the pixel region 3, the region where the light reflection layer 4 is formed is the reflection display region 31, but the region corresponding to the opening 40 is a rectangular transmissive display where the light reflection layer 4 is not formed. It is an area 32. Here, the transmissive display area 32 has its three sides overlapping with the three sides of the pixel area 3.

The first substrate 10 and the second substrate 2
Polarizing plates 41 and 42 are disposed on the outer surface of each of 0,
The backlight device 7 is arranged to face the polarizing plate 41. In addition, the reflective display area 3 is formed on the first substrate 10.
Since the reflective display color filter 81 and the transmissive display color filter 82 are formed in each of 1 and the transmissive display area 32, color display is possible.

Further, in the first substrate 10, on the lower layer side of the first transparent electrode 11 and on the upper layer side of the light reflection layer 4, a region corresponding to the transmissive display region 32 has an opening 61. A layer thickness adjusting layer 6 made of a flexible resin layer is formed. Therefore, in the transmissive display area 32, the reflective display area 3
Compared with 1, the liquid crystal layer 50 is formed by the film thickness of the layer thickness adjusting layer 6.
Since the layer thickness d is large, the retardation Δn · d is optimized for both the transmitted display light and the reflected display light.

Here, in the layer thickness adjusting layer 6, an obliquely upward slope 60 having a width of 8 μm is formed at the boundary between the reflective display region 31 and the transmissive display region 32. Therefore, in the present embodiment, the light shielding film 9 is formed in a straight line on the first substrate 10 so as to overlap the entire boundary region between the reflective display region 31 and the transmissive display region 32. The light-shielding film 9 has a width of about 9 μm and is formed so that the slope 60 is included in the light-shielding film 9 when seen in a plan view. That is,
In the present embodiment, the light-shielding film 9 made of a light-shielding metal film such as a chrome film is provided along one side of the four sides of the rectangular transmissive display area 32 except the area overlapping with the three sides of the pixel area 3.
Is formed in a straight line so that a part of the light shielding film 9 covers the end of the light reflecting layer 4.

As described above, in this embodiment, as in the first embodiment, the light shielding film 9 is formed so as to overlap the entire boundary area between the reflective display area 31 and the transmissive display area 32.
The same effects as those of the first embodiment can be obtained, such as the occurrence of a defect such as light leakage at the boundary area between the reflective display area 31 and the transmissive display area 32 during black display.

Further, with respect to the light-shielding film 9, the wider the formation area is, the less the amount of light contributing to the display is, and therefore the display tends to be dark. However, in the present embodiment, the light-shielding film 9 is formed in a straight line and is transmitted. The light-shielding film 9 is not formed on a portion corresponding to three sides of the four sides of the display area 32. For this reason, since the total length of the light shielding film 9 is short, it is possible to minimize the decrease in the amount of light contributing to the display. here,
In general, the light-shielding film 9 is formed in the boundary area between the adjacent pixel areas 3.
Since 0 or a light-shielding wiring is formed, the portion of the periphery of the transmissive display region 32 covered with these light-shielding films 90 does not contribute to display as a matter of course. Even if there is a disturbance, the display quality does not deteriorate.

In this embodiment, since the edge of the light-shielding film 9 reaches the boundary region of the adjacent pixel regions 3, it is extended from another light-shielding film 90 passing through this boundary region or the light-shielding wiring. The light shielding film 9 may be formed as a part.

In the transparent display area 31 and the transparent display area 32, the transparent display area 31 is the transparent display area 3
2, the transparent display area 31 is wider than the transparent display area 3
Structure smaller than 2, transparent display area 31 and transparent display area 3
2 may have a structure having the same area.

[Embodiment 5] The liquid crystal device of this embodiment is obtained by modifying the arrangement of the light-shielding film 9 of the liquid crystal device according to Embodiment 1, and FIG. 5) is also used, and only the AA 'sectional view is shown in FIG. The sectional view taken along the line BB 'is similar to that of FIG. In addition, the pixel area shown in FIG.
Similar to the first embodiment, in the active matrix liquid crystal device, the TF is used as the nonlinear element for pixel switching.
The portions common to both D and TFT are extracted and shown.

The liquid crystal device 1 shown here also includes a transparent first substrate 10 having a first transparent electrode 11 formed on its surface, and a first transparent substrate 10.
Transparent second substrate 20 having a second transparent electrode 21 formed on the side facing the electrode 11 of the first substrate 10, the second substrate 20, and the second substrate 20.
A liquid crystal layer 50 made of TN mode liquid crystal held between the first transparent electrode 11 and the second transparent electrode 21 and directly contributing to the display. It is a pixel region 3 which is to be operated. Further, the pixel region 3 is in a state of being surrounded by the light shielding film 90 and the light shielding wiring in a plan view. Then, on the first substrate 10, the rectangular light reflection layer 4 constituting the reflective display area 31 is formed of an aluminum film in the rectangular pixel area 3 where the first transparent electrode 11 and the second transparent electrode 21 face each other. It is formed of a silver alloy film, and a rectangular opening 40 is formed in the center of the light reflection layer 4. Therefore, in the pixel region 3, the region in which the light reflection layer 4 is formed is the reflection display region 31, but the region corresponding to the opening 40 is island-shaped in which the light reflection layer 4 is not formed, and , A rectangular transparent display area 32.

The first substrate 10 and the second substrate 2
Polarizing plates 41 and 42 are disposed on the outer surface of each of 0,
The backlight device 7 is arranged to face the polarizing plate 41. In addition, the reflective display area 3 is formed on the first substrate 10.
Since the reflective display color filter 81 and the transmissive display color filter 82 are formed in each of 1 and the transmissive display area 32, color display is possible. Also in this embodiment, in the first substrate 10, on the lower layer side of the first transparent electrode 11 and on the upper layer side of the light reflection layer 4, the transmissive display region 3 is provided.
A layer thickness adjusting layer 6 made of a photosensitive resin layer having an opening 61 in a region corresponding to 2 is formed. Therefore, in the transmissive display region 32, the layer thickness d of the liquid crystal layer 50 is larger than that in the reflective display region 31 by the film thickness of the layer thickness adjusting layer 6, and therefore, for both the transmissive display light and the reflective display light. Retardation Δn · d is optimized.

Here, in the layer thickness adjusting layer 6, an obliquely upward slope 60 having a width of 8 μm is formed at the boundary between the reflective display region 31 and the transmissive display region 32. Therefore, in the present embodiment, the light shielding film 9 is formed in a rectangular frame shape on the second substrate 20 so as to overlap the entire boundary region between the reflective display region 31 and the transmissive display region 32 when viewed in a plan view. . The light-shielding film 9 has a width of about 9 μm and is formed so that the slope 60 is included in the light-shielding film 9 when seen in a plan view. As described above, in the present embodiment, the light-shielding film 9 is formed so as to overlap the entire boundary region between the reflective display region 31 and the transmissive display region 32, as in the first embodiment.
The same effects as those of the first embodiment can be obtained, such as the occurrence of a defect such as light leakage at the boundary area between the reflective display area 31 and the transmissive display area 32 during black display.

[Embodiment 6] The liquid crystal device of this embodiment is obtained by modifying the configuration of the pixel electrodes and the arrangement of color filters formed on the first substrate 10 of the liquid crystal device according to Embodiment 1. However, the plan view of the pixel region is the same as that in FIG. 1A, so that it is also used, and only the AA ′ cross-sectional view is shown in FIG. The cross-sectional view taken along the line BB 'is similar to that shown in FIG. In addition, the pixel region shown in FIG. 6 is, as in the first embodiment, a non-linear element for pixel switching in the active matrix liquid crystal device.
A common portion is extracted and shown regardless of whether TFD or TFT is used.

The liquid crystal device 1 shown here has a pixel electrode 11
Transparent first substrate 10 having T and 11R formed on its surface
And the second transparent electrode 2 on the side facing the first substrate 10.
Transparent second substrate 20 on which 1 is formed, and the first substrate 1
0 and the second substrate 20 and a liquid crystal layer 50 made of a TN mode liquid crystal and held between the pixel electrode 11 and the second electrode 20.
A region where T, 11R and the second transparent electrode 21 face each other is a pixel region 3 that directly contributes to display. Further, the pixel region 3 is in a state of being surrounded by the light shielding film 90 and the light shielding wiring in a plan view. It is arranged in the opening 40.

Here, the pixel electrode formed on the surface of the first substrate 10 is a light reflecting electrode 11R made of an aluminum film or a silver alloy film, and a first transparent electrode 11 made of ITO or the like.
It is composed of T and T. The light reflection electrode 11R is arranged in a rectangular frame shape along the outer periphery of the pixel region 3, and the first transparent electrode 11T is arranged inside the opening 40 in the central portion. That is, in this embodiment, the light reflection layer is also used as the pixel electrode. Therefore, in the pixel region 3, the region where the light reflecting electrode 11R is formed is the reflective display region 31, but the region corresponding to the opening 40 is
The island-shaped and rectangular transmissive display region 32 is formed without the light reflection electrode 11R.

The first substrate 10 and the second substrate 2
Polarizing plates 41 and 42 are disposed on the outer surface of each of 0,
The backlight device 7 is arranged to face the polarizing plate 41. Further, in the present embodiment, the reflective display color filter 81 and the transmissive display color filter 82 are formed in the reflective display area 31 and the transmissive display area 32, respectively, on the second substrate 20 to enable color display. There is.
Then, the second transparent electrode 21 is formed on the color filters 81 and 82.

In this embodiment, the layer thickness adjusting layer 6 made of a photosensitive resin layer having the opening 61 in the region corresponding to the transmissive display region 32 is formed below the pixel electrodes 11R and 11T. Therefore, in the transmissive display region 32, the layer thickness d of the liquid crystal layer 50 is larger than that in the reflective display region 31 by the film thickness of the layer thickness adjusting layer 6, and therefore, for both the transmissive display light and the reflective display light. Retardation Δn · d is optimized. Here, the layer thickness adjusting layer 6 includes the reflective display region 3
An obliquely upward slope 60 having a width of 8 μm is formed at the boundary between the transparent display area 32 and the transparent display area 32. Therefore,
In the present embodiment, the light shielding film 9 is formed in a rectangular frame shape on the first substrate 10 so as to overlap the entire boundary region between the reflective display region 31 and the transmissive display region 32 when seen in a plan view. The light-shielding film 9 has a width of about 9 μm and is formed so that the slope 60 is included in the light-shielding film 9 when seen in a plan view.

As described above, in this embodiment, the light-shielding film 9 is formed so as to overlap the entire boundary area between the reflective display area 31 and the transmissive display area 32, as in the first embodiment.
The same effects as those of the first embodiment can be obtained, such as the occurrence of a defect such as light leakage at the boundary area between the reflective display area 31 and the transmissive display area 32 during black display. Although the light shielding film 9 is formed on the first substrate 10 side in the sixth embodiment described above, it may be formed on the second substrate 20 side as in the fifth embodiment, and the same applies in this case. The effect of can be obtained.

[Embodiment 7] The liquid crystal device of this embodiment is obtained by modifying the arrangement of the layer thickness adjusting layer 6 of the liquid crystal device according to Embodiment 1, and FIG. Since it is similar to (a), it is diverted, and only the AA 'sectional view is shown in FIG. The sectional view taken along the line BB 'is similar to that of FIG. In addition, the pixel region shown in FIG. 7 is also a nonlinear element for pixel switching in the active matrix liquid crystal device, as in the first embodiment.
A common portion is extracted and shown regardless of whether TFD or TFT is used.

The liquid crystal device 1 shown here also includes a transparent first substrate 10 having a first transparent electrode 11 formed on the surface thereof, and a first transparent substrate 10.
Transparent second substrate 20 having a second transparent electrode 21 formed on the side facing the electrode 11 of the first substrate 10, the second substrate 20, and the second substrate 20.
A liquid crystal layer 50 made of TN mode liquid crystal held between the first transparent electrode 11 and the second transparent electrode 21 and directly contributing to the display. It is a pixel region 3 which is to be operated. Further, the pixel region 3 is in a state of being surrounded by the light shielding film 90 and the light shielding wiring in a plan view. Then, on the first substrate 10, the rectangular light reflection layer 4 constituting the reflective display area 31 is formed of an aluminum film in the rectangular pixel area 3 where the first transparent electrode 11 and the second transparent electrode 21 face each other. It is formed of a silver alloy film, and a rectangular opening 40 is formed in the center of the light reflection layer 4. Therefore, in the pixel region 3, the region in which the light reflection layer 4 is formed is the reflection display region 31, but the region corresponding to the opening 40 is island-shaped in which the light reflection layer 4 is not formed, and , A rectangular transparent display area 32.

The first substrate 10 and the second substrate 2
Polarizing plates 41 and 42 are disposed on the outer surface of each of 0,
The backlight device 7 is arranged to face the polarizing plate 41. In addition, the reflective display area 3 is formed on the first substrate 10.
Since the reflective display color filter 81 and the transmissive display color filter 82 are formed in each of 1 and the transmissive display area 32, color display is possible.

In the present embodiment, in the second substrate 20, a layer thickness adjusting layer made of a photosensitive resin layer in which a region corresponding to the transmissive display region 32 has an opening 61 below the second transparent electrode 21. 6 is formed. Therefore, in the transmissive display area 32, as compared with the reflective display area 31, the layer thickness adjusting layer 6
Since the layer thickness d of the liquid crystal layer 50 is large by the film thickness of, the retardation Δn · d is optimized for both the transmitted display light and the reflected display light. Here, the layer thickness adjusting layer 6
At the boundary portion between the reflective display area 31 and the transmissive display area 32, an obliquely upward slope 60 having a width of 8 μm is formed. Therefore, in the present embodiment, the light shielding film 9 is formed in a rectangular frame shape on the first substrate 10 so as to overlap the entire boundary region between the reflective display region 31 and the transmissive display region 32 when viewed in a plan view. . The light-shielding film 9 has a thickness of about 9μ.
The width of m is formed so that the inclined surface 60 is included in the light shielding film 9 when viewed in a plan view.

As described above, in this embodiment, as in the first embodiment, the light shielding film 9 is formed so as to overlap the entire boundary area between the reflective display area 31 and the transmissive display area 32.
The same effects as those of the first embodiment can be obtained, such as the occurrence of a defect such as light leakage at the boundary area between the reflective display area 31 and the transmissive display area 32 during black display. Although the light-shielding film 9 is formed on the first substrate 10 side in the seventh embodiment, it may be formed on the second substrate 20 side as in the fifth embodiment, and the same applies in this case. The effect of can be obtained.

[Embodiment 8] The liquid crystal device of this embodiment is obtained by modifying the arrangement of the layer thickness adjusting layer, the light shielding film 9 and the layer thickness adjusting layer 6 of the liquid crystal device according to the sixth embodiment. The plan view of the pixel region is the same as that of FIG. 1A and is therefore used. Only the cross-sectional view along the line AA ′ is shown in FIG. In addition,
The cross-sectional view taken along the line BB 'is similar to that in FIG. The pixel region shown in FIG. 8 is also the same as in the first embodiment.
In the active matrix type liquid crystal device, a portion common to both TFD and TFT is used as a nonlinear element for pixel switching.

The liquid crystal device 1 shown here has a pixel electrode 11
Transparent first substrate 10 having T and 11R formed on its surface
And the second transparent electrode 2 on the side facing the first substrate 10.
Transparent second substrate 20 on which 1 is formed, and the first substrate 1
0 and the second substrate 20 and a liquid crystal layer 50 made of a TN mode liquid crystal and held between the pixel electrode 11 and the second electrode 20.
A region where T, 11R and the second transparent electrode 21 face each other is a pixel region 3 that directly contributes to display. Further, the pixel region 3 is in a state of being surrounded by the light shielding film 90 and the light shielding wiring in a plan view. It is arranged in the opening 40.

Here, the pixel electrode formed on the surface of the first substrate 10 is a light reflecting electrode 11R made of an aluminum film or a silver alloy film and a first transparent electrode 11 made of ITO or the like.
It is composed of T and T. The light reflection electrode 11R is arranged in a rectangular frame shape along the outer periphery of the pixel region 3, and the first transparent electrode 11T is arranged inside the opening 40 in the central portion. That is, in this embodiment, the light reflection layer is also used as the pixel electrode. Therefore, in the pixel region 3, the region where the light reflecting electrode 11R is formed is the reflective display region 31, but the region corresponding to the opening 40 is
The island-shaped and rectangular transmissive display region 32 is formed without the light reflection electrode 11R. The first substrate 1
0 and the second substrate 20 has a polarizing plate 4 on the outer surface of each.
1, 42 are arranged, and the backlight device 7 is arranged opposite to the polarizing plate 41 side. In the present embodiment, the second
A color filter 81 for reflective display and a color filter 82 for transmissive display are formed in each of the reflective display area 31 and the transmissive display area 32 on the substrate 20 to enable color display.

In this embodiment, on the second substrate 20, the lower layer side of the second transparent electrode 21 and the color filter 8 are provided.
A layer thickness adjusting layer 6 made of a photosensitive resin layer having an opening 61 in a region corresponding to the transmissive display region 32 is formed on the upper layer side of the first and second layers 82. Therefore, in the transmissive display region 32, the layer thickness d of the liquid crystal layer 50 is larger than that in the reflective display region 31 by the film thickness of the layer thickness adjusting layer 6, and therefore, for both the transmissive display light and the reflective display light. Retardation Δn
-D is optimized. Here, in the layer thickness adjusting layer 6,
At the boundary between the reflective display area 31 and the transmissive display area 32,
An obliquely upward slope 60 is formed with a width of 8 μm. Therefore, in the present embodiment, in the second substrate 20,
The reflective display area 31 and the transmissive display area 32 when viewed in a plan view.
The light-shielding film 9 is formed in a rectangular frame shape so as to overlap the entire boundary area between the light-shielding film 9 and the light-shielding film 9. The light-shielding film 9 has a width of about 9 μm and is formed so that the slope 60 is included in the light-shielding film 9 when seen in a plan view.

As described above, in the present embodiment, the light-shielding film 9 is formed so as to overlap the entire boundary region between the reflective display region 31 and the transmissive display region 32, as in the first embodiment.
The same effects as those of the first embodiment can be obtained, such as the occurrence of a defect such as light leakage at the boundary area between the reflective display area 31 and the transmissive display area 32 during black display. Although the light-shielding film 9 is formed on the first substrate 10 side in the seventh embodiment, it may be formed on the second substrate 20 side as in the fifth embodiment, and the same applies in this case. The effect of can be obtained.

[Ninth Embodiment] Next, the structure of a TFD active matrix type liquid crystal device adopting the structure according to the first to eighth embodiments will be described.

FIG. 9 is a block diagram schematically showing the electrical configuration of the liquid crystal device. FIG. 10 is an exploded perspective view showing the structure of this liquid crystal device. FIG. 11 shows one of the pair of substrates that sandwich the liquid crystal in the liquid crystal device, which is one of the element substrates.
It is a top view of a pixel portion. 12A and 12B are a cross-sectional view taken along the line III-III ′ of FIG. 11 and a perspective view of the TFD element formed in each pixel, respectively.

In the liquid crystal device 100 shown in FIG. 9, the scanning lines 151 as a plurality of wirings are formed in the row direction (X direction), and the plurality of data lines 152 are formed in the column direction (Y direction). A pixel 153 is formed at a position corresponding to each intersection of the scanning line 151 and the data line 152.
53, the liquid crystal layer 154 and the TF for pixel switching.
The D element 156 (non-linear element) is connected in series. Each scanning line 151 is driven by the scanning line driving circuit 157, and each data line 152 is driven by the data line driving circuit 158.

As shown in FIG. 10, the active matrix type liquid crystal device 100 having the above structure has the liquid crystal 10
Of the pair of transparent substrates holding 6 the element substrate 120
In, a plurality of scanning lines 151 extend and each scanning line 1
51 to the pixel electrode 166 via the TFD element 156.
Are electrically connected. On the other hand, the counter substrate 11
At 0, a plurality of columns of band-shaped data lines 152 extending in a direction intersecting with the scanning lines 151 of the element substrate 120 are formed of an ITO film, and a light-shielding film 159 called a black stripe is provided between the data lines 152. Has been formed. Therefore, around the pixel electrode 166, the light-shielding film 1 is planarly viewed.
It is surrounded by 59 and the scanning line 151.

A normal TN mode liquid crystal 106 is used as the liquid crystal 106. Since this type of liquid crystal 106 performs light modulation by changing the polarization direction of light, it is located outside the counter substrate 110 and the element substrate 120. Polarizing plates 108 and 109 are arranged so as to overlap each other on the surface. In addition, the polarizing plate 10
A backlight device 103 is arranged to face 8 side.

In the example shown here, the element substrate 120
Scan lines 151 are formed on the counter substrate 10 and the data lines 15 are formed on the counter substrate 10.
2 is formed, the data line is formed on the element substrate 120,
Scanning lines may be formed on the counter substrate 110.

The TFD element 156 may be used in the element substrate 120 as shown in FIGS. 11 and 12A and 12B, for example.
Formed on the underlayer 161 formed on the surface of the
TFD element 156a and second TFD element 156
By the two TFD element elements consisting of b, so-called B
It is configured as an ack-to-back structure. Therefore, in the TFD element 156, the non-linear current-voltage characteristics are symmetrical in both positive and negative directions. Underlayer 16
1 is made of, for example, tantalum oxide (Ta2O5) having a thickness of about 50 nm to 200 nm.

Each of the first TFD element 156a and the second TFD element 156b includes a first metal film 162, an insulating film 163 formed on the surface of the first metal film 162,
The second metal films 164a and 164b are formed on the surface of the insulating film 163 so as to be separated from each other.
The first metal film 162 has, for example, a thickness of 100 nm to 5 nm.
The insulating film 163 is formed of a simple Ta film of about 00 nm or a Ta alloy film such as a Ta-W (tungsten) alloy film, and the insulating film 163 is formed by, for example, oxidizing the surface of the first metal film 162 by an anodic oxidation method. It is tantalum oxide (Ta2O5) having a thickness of 10 nm to 35 nm.

The second metal films 164a and 164b are made of a light-shielding metal film such as chromium (Cr) and have a thickness of 50 nm.
It is formed to a thickness of about 300 nm. The second metal film 164a serves as the scanning line 151 as it is, and the other second metal film 164b serves as the pixel electrode 1 made of ITO or the like.
It is connected to 66.

In the liquid crystal device 100 thus configured, the region where the pixel electrode 166 and the data line 152 face each other is the pixel region 3 described in the first to eighth embodiments. Therefore, the element substrate 120, the counter substrate 110, the pixel electrode 166, and the data line 152 are respectively the first substrate 10 and the second substrate 2 in the first to eighth embodiments.
0, the first electrode 11, and the second electrode 21,
The reflective film 4, the light shielding film 9, the reflective display color filter 81, the transmissive display color filter 82, and the layer thickness adjusting layer 6 described with reference to FIGS. 1 to 4 are formed on the lower layer side of the pixel electrode 166. Will be.

Here, when the structure described in the fourth embodiment is applied to the liquid crystal device 100, the pixel electrode 166 is formed so as to straddle the scanning line 151, and one of both sides sandwiching the scanning line 151 is transparently displayed. If the area 31 is set and the other is set as the transmissive display area 32, the scanning lines 151 are formed along the boundary area. Therefore, the scanning line 151 can be used as the light shielding film 9 shown in FIG.

In the liquid crystal device 100, the element substrate 120, the counter substrate, the pixel electrode 166, and the data line 1 are also provided.
52 may be the second substrate 20, the first substrate 10, the second electrode 21, and the first electrode 11 in the first to eighth embodiments, respectively. In this case, data line 1
On the lower layer side of 52, the reflective film 4, the light shielding film 9, the reflective display color filter 81, the transmissive display color filter 82, and the layer thickness adjusting layer 6 described with reference to FIGS. 1 to 4 are formed. Thus, the backlight device 163 is arranged to face the counter substrate 200.

[Embodiment 10] Next, the structure of a TFT active matrix type liquid crystal device adopting the structure according to Embodiments 1 to 8 will be described.

FIG. 13 is a plan view of the TFT active matrix type liquid crystal device together with the respective components as seen from the side of the counter substrate, and FIG. 14 is a sectional view taken along line HH 'of FIG. FIG. 15 is an equivalent circuit diagram of various elements and wirings in a plurality of pixels formed in a matrix in the image display area of the liquid crystal device.

In FIGS. 13 and 14, the liquid crystal device 200 of this embodiment has a TFT array substrate 210 and a counter substrate 2.
20 is bonded by a sealing material 252, and the area defined by the sealing material 252 (liquid crystal filled area)
A liquid crystal 250 as an electro-optical material is sandwiched inside. Polarizing plates 288 and 289 are arranged on the TFT array substrate 210 and the counter substrate 220, respectively.
The backlight device 290 is arranged so as to face the No. 8 side.

A peripheral partition 253 made of a light-shielding material is formed inside the area where the sealing material 252 is formed. A data line driving circuit 301 and a mounting terminal 302 are formed along a side of the TFT array substrate 210 in a region outside the sealing material 252, and the scanning line driving circuit 304 is formed along two sides adjacent to the side. Are formed. A plurality of wirings 305 for connecting the scanning line driving circuits 304 provided on both sides of the image display area are provided on the remaining one side of the TFT array substrate 210.
A precharge circuit or an inspection circuit may be provided under the peripheral partition 253. Further, at least at one corner of the counter substrate 220, T
An inter-substrate conductive material 306 is formed for electrical conduction between the FT array substrate 210 and the counter substrate 220.

Instead of forming the data line driving circuit 301 and the scanning line driving circuit 304 on the TFT array substrate 210, for example, a driving LSI mounted on a T
An AB (tape automated, bonding) substrate may be electrically and mechanically connected to a terminal group formed in the peripheral portion of the TFT array substrate 210 via an anisotropic conductive film. The liquid crystal device 20 of the present embodiment
Even at 0, the liquid crystal 50 is used in the TN mode.

In the image display area of the liquid crystal device 200 having such a structure, as shown in FIG. 15, a plurality of pixels 200a are arranged in a matrix, and each of the pixels 200a has a pixel. Electrode 209
a and a pixel switching TFT 230 for driving the pixel electrode 209a are formed, and a data line 206a for supplying the pixel signals S1, S2 ... Sn.
Are electrically connected to the source of the TFT 230. Pixel signals S1 and S2 to be written in the data line 206a
..Sn may be supplied line-sequentially in this order,
The data lines 206a adjacent to each other may be supplied for each group. In addition, the TFT 23
The scanning line 203a is electrically connected to the gate of 0, and is configured to apply the scanning signals G1, G2 ... Gm to the scanning line 203a in a pulse-sequential order in this order at a predetermined timing. ing. The pixel electrode 209a is TF
The pixel signal S1, S2 ... Sn supplied from the data line 206a is predetermined for each pixel by being electrically connected to the drain of T230 and turning on the TFT 230 which is a switching element for a certain period. Write at the timing of. In this way, the pixel signal S1 of a predetermined level written in the liquid crystal through the pixel electrode 209a,
S2, ... Sn are held for a certain period between the counter electrode 221 of the counter substrate 220 shown in FIG.

Here, the liquid crystal 250 modulates the light by changing the orientation and order of the molecular assembly depending on the applied voltage level, and enables gradation display. In the normally white mode, the amount of incident light passing through the liquid crystal 250 decreases depending on the applied voltage, and in the normally black mode, the incident light changes according to the applied voltage. The amount of light passing through the liquid crystal 250 increases. As a result, light having a contrast according to the pixel signals S1, S2, ... Sn is emitted from the liquid crystal device 200 as a whole.

The pixel signals S1, S2, ...
..Pixel electrode 209 to prevent Sn from leaking
A storage capacitor 260 may be added in parallel with the liquid crystal capacitor formed between a and the counter electrode. For example, the pixel electrode 2
The voltage of 09a is 3 times longer than the time when the source voltage is applied.
The storage capacity 260 holds the digit for a long time. As a result, the charge retention characteristics are improved, and the liquid crystal device 200 having a high contrast ratio can be realized. In addition, storage capacity 2
As a method of forming the capacitor 60, as illustrated in FIG. 15, it is formed between the capacitor line 203b which is a wiring for forming the storage capacitor 260 or between the scan line 203a of the previous stage. Either case may be used.

16 (A) and 16 (B) are respectively shown in FIG.
In the liquid crystal device shown in FIG.
8 is a plan view showing the configuration of each pixel formed on the TFT array substrate to which the configurations according to Nos. 8 to 8 are applied, and Embodiment 4
FIG. 6 is a plan view showing a configuration of each pixel formed on a TFT array substrate to which the configuration according to the above is applied. FIG. 17 shows a part of the pixel of the liquid crystal device of this embodiment, which is taken along the line CC ′ of FIGS.
It is sectional drawing when it cut | disconnects in the position corresponding to a line.

In FIG. 16A, when the structure according to the first to third or fifth to eighth embodiments is applied to the liquid crystal device shown in FIG. 13, a plurality of transparent ITO (on the TFT array substrate 210 is formed). Indium Tin Ox
The pixel electrodes 209a made of a (ide) film are formed in a matrix, and the pixel switching TFTs 230 are connected to the respective pixel electrodes 209a. Further, along the vertical and horizontal boundaries of the pixel electrode 209a, the data line 206a, the scanning line 203a, and the capacitor line 203.
b is formed, and the TFT 230 is connected to the data line 206a and the scanning line 203a. That is, the data line 206a is connected to the TFT 2 through the contact hole.
The pixel electrode 209a is electrically connected to the high-concentration source region 201d of the TFT 30, and the pixel electrode 209a is connected to the TFT 2 through the contact hole.
No. 03, the high concentration drain region 201e is electrically connected. Further, the scanning line 203a extends so as to face the channel region 201a 'of the TFT 230. Note that the storage capacitor 260 has a lower electrode that is obtained by making the extended portion 201f of the semiconductor film 201 for forming the pixel switching TFT 230 conductive, and the lower electrode 241 has a capacitance line in the same layer as the scanning line 203b. 203b has an overlapping structure as an upper electrode.

Here, the capacitance line 203b is the scanning line 203.
The main line portion 20 extending along the scanning line 203b near b
3b 'and the data line 206 from this main line portion 203b'
It is composed of a protruding portion 203b ″ protruding along a.

However, when the configuration according to the fourth embodiment is applied to the liquid crystal device shown in FIG.
As shown in (B), the capacitance line 203b includes a main line portion 203b 'extending along the scanning line 203b at a substantially intermediate position between two adjacent scanning lines 203b, and this main line portion 203.
After protruding from b ′ along the data line 206a, a protruding portion 203b ″ extending along the scan line 203b in the vicinity of the scan line 203b is formed.
If one of both sides sandwiching the main line portion 203b 'of 3b is the transmissive display area 31 and the other is the transmissive display area 32, the capacitive line 3b is formed along the boundary area.
Therefore, the main line portion 203b 'of the capacitance line 3b can be used as the light shielding film 9 shown in FIG.

In the liquid crystal device 200 having the above structure, the surface of the TFT array substrate 210 has a thickness of 50 n.
An island-shaped semiconductor film 201a having a thickness of m to 100 nm is formed. The surface of the semiconductor film 201a has a thickness of about 50 to 1
Gate insulating film 202 made of a 50 nm silicon oxide film
Is formed, and a scanning line 203a having a thickness of 300 nm to 800 nm passes through as a gate electrode on the surface of the gate insulating film 202. The scan line 2 of the semiconductor film 201a
A region facing 03a through the gate insulating film 202 is a channel region 201a '. A source region including a low concentration source region 201b and a high concentration source region 201d is formed on one side of the channel region 201a ', and a low concentration drain region 2 is formed on the other side.
01c and a high-concentration drain region 201e are formed.

On the front surface side of the pixel switching TFT 230, a first interlayer insulating film 204 made of a silicon oxide film having a thickness of 300 nm to 800 nm and a thickness of 100 are formed.
A second interlayer insulating film 205 made of a silicon nitride film having a thickness of 300 nm to 300 nm is formed. A data line 2 having a thickness of 300 nm to 800 nm is formed on the surface of the first interlayer insulating film 204.
06a is formed, and the data line 206a is electrically connected to the high-concentration source region 201d through a contact hole formed in the first interlayer insulating film 204.

ITO is formed on the second interlayer insulating film 205.
A pixel electrode 209a made of a film is formed. The pixel electrode 209a is electrically connected to the drain electrode 206b via a contact hole or the like formed in the second interlayer insulating film 205. An alignment film 212 made of a polyimide film is formed on the surface side of the pixel electrode 209a. The alignment film 212 is a film obtained by rubbing a polyimide film.

Further, with respect to the extended portion 201f (lower electrode) extending from the high-concentration drain region 201e, an insulating film (dielectric film) formed simultaneously with the gate insulating film 202 is interposed,
A storage capacitor 260 is formed by the scanning line 203a and the capacitance line 203b in the same layer facing each other as an upper electrode.

Although the TFT 230 preferably has the LDD structure as described above, the low concentration source region 201 is used.
An offset structure in which impurity ions are not implanted may be provided in the region corresponding to b and the low concentration drain region 201c. Further, the TFT 230 may be a self-aligned TFT in which high-concentration source and drain regions are formed in a self-aligned manner by implanting high-concentration impurity ions using the gate electrode (a part of the scanning line 203a) as a mask. .

Further, in the present embodiment, only one gate electrode (scanning line 203a) of the TFT 230 is arranged between the source-drain regions, but a single gate structure is arranged, but two or more gate electrodes are arranged between them. You may. At this time, the same signal is applied to each gate electrode. In this way dual gate (double gate),
Alternatively, if the TFT 230 is composed of triple gates or more, it is possible to prevent a leak current at the junction between the channel and the source-drain region, and reduce the current when off. If at least one of these gate electrodes has an LDD structure or an offset structure, the off current can be further reduced, and a stable switching element can be obtained.

In FIG. 17, the counter substrate 220 has T
Pixel electrodes 209 formed on the FT array substrate 210
A light-shielding film 223 called a black matrix or a black stripe is formed in a region facing the vertical and horizontal boundary regions of a, and a counter electrode 221 made of an ITO film is formed above the light-shielding film 223. In addition, the counter electrode 2
An alignment film 222 made of a polyimide film is provided on the upper layer side of 21.
The alignment film 222 is formed by rubbing a polyimide film.

In the liquid crystal device 200 having such a configuration, the region where the pixel electrode 209a and the counter electrode 221 face each other is the pixel region 3 described in the first to eighth embodiments. Therefore, the TFT array substrate 210 and the counter substrate 22
0, the pixel electrode 209a, and the counter electrode 221 are the first substrate 10, the second substrate 20, the first electrode 11, and the second electrode 21 in the first to eighth embodiments, respectively.
1 to 4, the reflective film 4, the light-shielding film 9, the reflective display color filter 81, and the transmissive display color filter 8 are disposed on the lower layer side of the pixel electrode 209a.
2 and the layer thickness adjusting layer 6 are formed.

In the liquid crystal device 200, the TFT array substrate 210, the counter substrate 220, the pixel electrodes 209a,
The counter electrode 221 and the counter electrode 221 may be the second substrate 20, the first substrate 10, the second electrode 21, and the first electrode 11 in Embodiments 1 to 8, respectively. In this case, on the lower layer side of the counter electrode 221, the reflective film 4, the light shielding film 9, the reflective display color filter 81, the transmissive display color filter 82, and the layer thickness adjustment described with reference to FIGS. The layer 6 is formed, and the counter substrate 200 is formed.
The backlight device 290 is arranged opposite to the above.

[Application of Liquid Crystal Device to Electronic Equipment] The reflective or semi-transmissive / reflective liquid crystal device configured as described above can be used as a display portion of various electronic equipments. This will be described with reference to FIGS. 18, 19 and 20.

FIG. 18 is a block diagram showing a circuit configuration of an electronic device using the liquid crystal device according to the present invention as a display device.

In FIG. 18, the electronic equipment includes a display information output source 570, a display information processing circuit 571, and a power supply circuit 57.
2, timing generator 573, and liquid crystal device 5
Has 74. Further, the liquid crystal device 574 includes a liquid crystal display panel 575 and a drive circuit 576. Liquid crystal device 57
4 is the liquid crystal device 1, 100, 2 to which the present invention is applied.
00 can be used.

The display information output source 570 is a ROM (Rea).
d Only Memory), RAM (Random)
A memory such as an Access Memory), a storage unit such as various disks, a tuning circuit that tunes and outputs a digital image signal, and the like, and displays an image signal in a predetermined format based on various clock signals generated by the timing generator 573. Information is supplied to the display information processing circuit 571.

The display information processing circuit 571 is provided with various known circuits such as a serial-parallel conversion circuit, an amplification / inversion circuit, a rotation circuit, a gamma correction circuit, a clamp circuit, etc., and executes processing of input display information. , The image signal together with the clock signal CLK the drive circuit 576
Supply to. The power supply circuit 572 supplies a predetermined voltage to each component.

FIG. 19 shows a mobile personal computer which is an embodiment of the electronic apparatus according to the present invention. The personal computer 580 shown here is
It has a main body portion 582 having a keyboard 581 and a liquid crystal display unit 583. The liquid crystal display unit 583 is
The liquid crystal device 1, 100, 200 to which the present invention is applied is included.

FIG. 20 shows a mobile phone which is another embodiment of the electronic apparatus according to the present invention. A mobile phone 590 shown here has a plurality of operation buttons 591 and a display unit including the liquid crystal devices 1, 100 and 200 to which the present invention is applied.

[0142]

As described above, in the semi-transmissive / reflective liquid crystal device according to the present invention, the light shielding film is formed so as to overlap the boundary region between the reflective display region and the transmissive display region. Therefore, when the thickness of the layer thickness adjusting layer continuously changes in the boundary region between the reflective display region and the transmissive display region, and the retardation Δn · d continuously changes in this portion, or Even if the alignment of the liquid crystal molecules is disturbed, neither reflected display light nor transmitted display light is emitted from such a region. Therefore, it is possible to avoid the occurrence of problems such as light leakage during black display, and thus it is possible to perform display with high contrast and high quality.

[Brief description of drawings]

1A, 1B, and 1C are each a plurality of pixel regions formed in a matrix in a semi-transmissive / reflective liquid crystal device according to Embodiment 1 of the present invention. It is the top view which extracts one and shows it typically, its AA 'sectional view, and BB' sectional view.

2A, 2B, and 2C are each one of a plurality of pixel regions formed in a matrix in a semi-transmissive / reflective liquid crystal device according to a second embodiment of the present invention. It is the top view which extracts one and shows it typically, its AA 'sectional view, and BB' sectional view.

3A, 3B, and 3C are each a plurality of pixel regions formed in a matrix in a semi-transmissive / reflective liquid crystal device according to a third embodiment of the present invention. It is the top view which extracts one and shows it typically, its AA 'sectional view, and BB' sectional view.

FIGS. 4A and 4B respectively show one of a plurality of pixel regions formed in a matrix in a semi-transmissive / reflective liquid crystal device according to a fourth embodiment of the present invention. FIG. 2 is a plan view schematically showing the above, and a BB ′ sectional view thereof.

FIG. 5 is a cross-sectional view of a plurality of pixel regions formed in a matrix in a semi-transmissive / reflective liquid crystal device according to a fifth embodiment of the present invention, and is a diagram corresponding to FIG. 1B. .

FIG. 6 is a cross-sectional view of a plurality of pixel regions formed in a matrix in a semi-transmissive / reflective liquid crystal device according to a sixth embodiment of the present invention, and is a diagram corresponding to FIG. .

FIG. 7 is a cross-sectional view of a plurality of pixel regions formed in a matrix in a semi-transmissive / reflective liquid crystal device according to a seventh embodiment of the present invention, and is a diagram corresponding to FIG. 1B. .

FIG. 8 is a cross-sectional view of a plurality of pixel regions formed in a matrix in a semi-transmissive / reflective liquid crystal device according to an eighth embodiment of the present invention, and is a diagram corresponding to FIG. 1B. .

FIG. 9 is a block diagram schematically showing an electrical configuration of a semi-transmissive / reflective TFD active matrix type liquid crystal device according to a ninth embodiment of the present invention.

10 is an exploded perspective view showing the structure of the liquid crystal device shown in FIG.

11 is a plan view of one pixel on an element substrate of a pair of substrates holding liquid crystal in the liquid crystal device shown in FIG.

12 (A) and (B) are respectively III of FIG.
FIG. 12 is a cross-sectional view taken along the line-III ′ and a perspective view of the TFD element shown in FIG. 11.

FIG. 13 is a plan view of a semi-transmissive / reflective TFT active matrix liquid crystal device according to Embodiment 10 of the present invention when viewed from the counter substrate side.

14 is a cross-sectional view taken along the line HH 'in FIG.

15 is an equivalent circuit diagram of various elements, wirings, etc. formed in a plurality of pixels arranged in a matrix in the liquid crystal device shown in FIG.

16A and 16B respectively show the configuration of each pixel formed on the TFT array substrate to which the configuration according to Embodiments 1 to 3 or 5 to 8 in the liquid crystal device shown in FIG. 13 is applied. 6A and 6B are a plan view and a plan view showing a configuration of each pixel formed on a TFT array substrate to which the configuration according to the fourth embodiment is applied.

FIG. 17 shows part of a pixel of the liquid crystal device shown in FIG.
6 (A) and 6 (B) are cross-sectional views taken along the line CC ′ of FIG.

FIG. 18 is a block diagram showing a circuit configuration of an electronic device using the liquid crystal device according to the present invention as a display device.

FIG. 19 is an explanatory diagram showing a mobile personal computer as an embodiment of an electronic apparatus using the liquid crystal device according to the present invention.

FIG. 20 is an explanatory diagram of a mobile phone as an embodiment of an electronic apparatus using the liquid crystal device according to the invention.

21 (A), (B), and (C) are schematic diagrams in which one of a plurality of pixel regions formed in a matrix in a conventional transflective / reflective liquid crystal device is extracted. FIG. 5 is a plan view, a sectional view taken along the line AA ′, and a sectional view taken along the line BB ′.

[Explanation of symbols]

1, 100, 200 Liquid crystal device 3 pixel area 5 Liquid crystal layer 6 layer thickness adjustment layer 7 Backlight device 9 Light-shielding film 10 First substrate 11,11T First transparent electrode 11R Light reflection 20 Second substrate 21 Second transparent electrode 31 reflective display area 32 transparent display area 40 Opening of light reflection layer 41, 42 Polarizing plate 60 Slope of thickness adjustment layer 61 Opening of layer thickness adjustment layer 81 Color filter for reflective display 82 Color filter for transmissive display Light-shielding film surrounding 90 pixel area

   ─────────────────────────────────────────────────── ─── Continued front page    F-term (reference) 2H042 AA09 AA15 AA26                 2H091 FA02Y FA15Y FA34Y FA41Z                       LA15 LA17                 2H092 GA13 GA16 HA03 HA05 JA24                       JB07 JB51 JB56 NA01 PA08                       PA09 PA11 PA12 PA13

Claims (22)

[Claims] 1. A first transparent electrode having a first transparent electrode formed on the surface thereof.
Substrate, a second substrate on which a second transparent electrode is formed on the surface side facing the first electrode, and a liquid crystal layer held between the first substrate and the second substrate. The first substrate has a reflective display region in a pixel region where the first transparent electrode and the second transparent electrode face each other, and the remaining region of the pixel region is a transmissive display region. A light reflection layer, a layer thickness adjusting layer for making the layer thickness of the liquid crystal layer in the reflective display region smaller than the layer thickness of the liquid crystal layer in the transmissive display region, and the first transparent electrode from the lower layer side to the upper layer. In a semi-transmissive / reflective liquid crystal device provided in this order toward the side, at least one of the first substrate and the second substrate overlaps a boundary region between the reflective display region and the transmissive display region. The light-shielding film is formed like Transflective liquid crystal device. 2. A semi-transmissive / reflective liquid crystal device having a reflective display region and a transmissive display region, wherein a first substrate and a transparent electrode are formed on a surface side facing the first substrate. Second
And a liquid crystal layer held between the first substrate and the second substrate, wherein the first substrate is in the reflective display area, and the liquid crystal layer in the reflective display area. A layer thickness adjusting layer for making the layer thickness smaller than the layer thickness of the liquid crystal layer in the transmissive display region, and a light reflecting electrode in this order from the lower layer side to the upper layer side, while the transparent electrode is provided in the transmissive display region. In the semi-transmissive / reflective liquid crystal device, a light-shielding film is formed on at least one of the first substrate and the second substrate so as to overlap with a boundary region between the reflective display region and the transmissive display region. A semi-transmissive / reflective liquid crystal device characterized in that 3. A first transparent electrode having a first transparent electrode formed on the surface thereof.
Substrate, a second substrate on which a second transparent electrode is formed on the surface side facing the first electrode, and a liquid crystal layer held between the first substrate and the second substrate. The first substrate has a reflective display region in a pixel region where the first transparent electrode and the second transparent electrode face each other, and the remaining region of the pixel region is a transmissive display region. And a first transparent electrode in this order from the lower layer side to the upper layer side, the second substrate is provided in the reflective display area, and the layer thickness of the liquid crystal layer in the reflective display area. A semi-transmissive / reflective liquid crystal device comprising: a layer thickness adjusting layer that reduces the thickness of the liquid crystal layer in the transmissive display region to be smaller than the layer thickness of the liquid crystal layer; At least one of a first substrate and the second substrate In the semi-transmissive / reflective liquid crystal device, a light-shielding film is formed so as to overlap a boundary region between the reflective display region and the transmissive display region. 4. A semi-transmissive / reflective liquid crystal device having a reflective display region and a transmissive display region, wherein a first substrate and a transparent electrode are formed on a surface side facing the first substrate. Second
Substrate and a liquid crystal layer held between the first substrate and the second substrate, the first substrate including a light reflection electrode in the reflection display region and the transmissive display. An area is provided with a transparent electrode, and the second substrate has a layer thickness adjustment for making the layer thickness of the liquid crystal layer in the reflective display area smaller than that of the liquid crystal layer in the transmissive display area in the reflective display area. A semi-transmissive / reflective liquid crystal device including a layer and the transparent electrode in this order from a lower layer side to an upper layer side, wherein the reflective display region is provided on at least one of the first substrate and the second substrate. A semi-transmissive / reflective liquid crystal device, wherein a light-shielding film is formed so as to overlap a boundary region between the transparent display region and the transparent display region. 5. The method according to any one of claims 1 to 4,
The semi-transmissive / reflective liquid crystal device, wherein the light shielding film is formed on the first transparent substrate side. 6. The method according to any one of claims 1 to 4,
The semi-transmissive / reflective liquid crystal device, wherein the light shielding film is formed on the second transparent substrate side. 7. The method according to any one of claims 1 to 6,
The semi-transmissive / reflective liquid crystal device, wherein the layer thickness adjusting layer has an inclined surface at a boundary region between the reflective display region and the transmissive display region. 8. The semi-transmissive / reflective liquid crystal device according to claim 7, wherein the light-shielding film is formed in a region that planarly overlaps the slope of the layer thickness adjusting layer. 9. The method according to any one of claims 1 to 8,
The semi-transmissive / reflective liquid crystal device, wherein the light-shielding film is formed so as to planarly overlap an end portion of the light-reflecting layer. 10. The transflective liquid crystal device according to claim 1, wherein the transmissive display region is arranged in an island shape in the reflective display region. 11. The transflective liquid crystal device according to claim 1, wherein the transmissive display area is arranged at an end of the pixel area. 12. The pixel area according to claim 11, wherein the pixel area is formed as a rectangular area, and the transmissive display area has a rectangular shape in which at least one side overlaps a side of the pixel area. Transflective liquid crystal device. 13. The transflective liquid crystal device according to claim 12, wherein the transmissive display region is arranged at a position where one side overlaps a side of the pixel region. 14. The transflective liquid crystal device according to claim 12, wherein the transmissive display region is arranged at a position where two sides overlap the sides of the pixel region. 15. The transflective liquid crystal device according to claim 12, wherein the transmissive display region is arranged at a position where three sides overlap the sides of the pixel region. 16. The wiring according to claim 15, wherein a wiring that shields the pixel area so as to divide the pixel area into two passes through as the light shielding film, and the reflective display area and the transmissive display area are arranged on both sides of the wiring. A semi-transmissive / reflective liquid crystal device. 17. A transflective liquid crystal device according to claim 1, wherein a color filter is formed in the image display area. 18. A reflective display color filter is formed in the reflective display area, while a reflective display color filter is formed in the transmissive display area. A semi-transmissive / reflective liquid crystal device characterized in that a color filter for transmissive display having strong coloring is formed. 19. The transflective liquid crystal device according to claim 1, wherein the reflective display region is wider than the transmissive display region. 20. The transflective liquid crystal device according to claim 1, wherein the reflective display area is narrower than the transmissive display area. 21. The transflective liquid crystal device according to claim 1, wherein the reflective display area and the transmissive display area have the same area. 22. An electronic device comprising a semi-transmissive / reflective liquid crystal device according to claim 1 in a display section.