JP2003241353A - Photosensitive material development processing device - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To maintain a processing capability by facilitating device maintenance and assuring sealing performance. <P>SOLUTION: A washing tank 27 is freely attachably and detachably mounted with a partition 42. The partition 42 is freely attachably and detachably mounted with a submerged squeezing section 45. A groove 72 is formed on a contact surface 71 with washing tank 27 of the partition 42. The groove 72 is fitted with a sealing member 73. The sealing member 73 is pressed and crushed by a flat surface 46a in the state of mounting the partition 42 on the washing tank 27, by which the intrusion of the washing liquid between the washing tanks is prevented. The maintenance of the submerged squeezing section 45 can be carried out by removing the partition 42 from the washing tank 27. <P>COPYRIGHT: (C)2003,JPO

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a photosensitive material development processing apparatus incorporated in an automatic developing machine such as a printer processor.

[0002]

2. Description of the Related Art An automatic developing machine such as a printer processor used in a photo lab has an exposure processing apparatus for exposing a photosensitive material such as photographic paper and a developing processing apparatus for developing an exposed photosensitive material. Is incorporated inside. The developing device is provided with a carrying member for carrying the photosensitive material on which the frame image is exposed, and a plurality of processing tanks containing a processing solution for color development, bleach-fixing, washing and stabilizing,
The photosensitive material is conveyed to the processing tank by the conveying member, and development processing is performed by sequentially passing through each processing solution.

In the conventional processing tank, a so-called crossover structure has been adopted in which the photosensitive material is once carried over the air when it is carried from the previous tank to the next tank. In order to shorten the development processing time by shortening the length, a submerged squeezing section composed of a blade or the like is provided in the partition wall between the processing tanks, and the photosensitive material is submerged through the submerged squeezing section. Is applied to a washing tank, for example.

In a photosensitive material development processing apparatus, while a large amount of a photosensitive material is being processed, chemical substances in the processing liquid are deteriorated by oxidation and stains deposited due to changes in temperature conditions adhere to the conveying member and the submerged squeeze portion. . For this reason, it is necessary to perform maintenance of the apparatus such as periodically cleaning the transport member, the rack supporting the transport member, the submerged squeeze portion and the like. Since the rack supporting the transfer member is detachable from the processing tank, the maintenance can be relatively easily performed.

[0005]

By the way, in the above-described photosensitive material development processing apparatus, when the partition wall provided with the submerged squeeze section and the processing tank are integrally provided, maintenance of the submerged squeeze section is required. It will be difficult. On the other hand, when the partition wall and the processing tank are separately provided and detachable, the maintenance of the submerged squeeze portion can be easily performed, but when the partition wall is attached to the processing tank, If the sealing with the processing tanks is not reliable, the processing liquid mixes between the processing tanks and the processing capacity of the apparatus is reduced.

SUMMARY OF THE INVENTION It is an object of the present invention to provide a photosensitive material development processing apparatus which can maintain the processing ability while facilitating the maintenance of the apparatus.

[0007]

In order to achieve the above object, the present invention is provided on a partition wall between a plurality of processing tanks in which a processing solution is stored, which allows passage of a photosensitive material and at the same time In the photosensitive material development processing apparatus which conveys the photosensitive material in the liquid through the submerged squeeze part for preventing passage, the partition is detachable from the processing tank.

A groove is provided on the contact surface of the partition wall with the processing tank, a flat surface is provided on the contact surface of the processing tank with the partition wall, and the partition wall is attached to the processing tank. It is preferable that a seal member, which is pressed and crushed by the flat surface to prevent mixing of the processing liquid between the processing tanks, is fitted in the groove. Further, the dimensional difference in the pressing direction between the initial state and the pressed state of the seal member is within the range of 0.5 to 3 mm, and the dimensional difference when the size of the seal member in the initial state is 100%. Is 10
It is preferably in the range of ˜45%. Furthermore, it is more preferable that the seal member is attached to the partition wall by crimping both ends thereof. Further, it is preferable that both side surfaces of the partition wall are tapered so as to be inclined with respect to the insertion direction, and the inclination angles are different between the left and right side surfaces.

[0009]

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS FIG. 1 shows the outline of the internal structure of a printer processor in which the photosensitive material developing processing apparatus of the present invention is implemented. The printer processor 2 includes a printer unit 3 and a processor unit 4. The printer unit 3 includes a magazine 5,
It is composed of a cutter 6, a back printing unit 7, an exposure unit 8, and a sorting unit 9. Belt-shaped photosensitive material 1 set in magazine 5
0 is cut by the cutter 6 according to the print size and becomes a cut sheet-shaped photosensitive material 10a (see FIG. 5). The photosensitive material 10a is conveyed toward the exposure section 8 along a conveyance path 14 indicated by a chain double-dashed line in the figure, and a back printing section 7 prints a frame number and correction data on the way. Then, an image based on the image data is exposed and recorded on the light receiving surface of the photosensitive material 10a by the exposure unit 8. Then, the exposed light-sensitive material 10a is arranged in two rows by the sorting unit 9 and is conveyed to the processor unit 4 with the emulsion surface on the upper side and the support on the lower side.

The processor unit 4 is composed of a photosensitive material development processing device 11, a drying device 12, and a sorter unit 13. As shown in FIG. 2 in detail, the photosensitive material developing processing apparatus 11 includes a developing tank 21, a bleach-fixing tank 22, a first washing tank 23, a first washing tank 23, and a first washing tank 23 in order from the upstream side (the left side in the drawing) of the conveying path 14. A water washing tank 24 including a second water washing tank 24, a third water washing tank 25, and a fourth water washing tank 26 is provided. A developer is stored in the developing tank 21, a bleach-fixing solution is stored in the bleach-fixing tank 22, and a predetermined amount of the washing solution is stored in the washing tank 27. Developing tank 21
Further, inside the bleach-fixing tank 22, there is provided a carrying rack 28 composed of a plurality of carrying rollers for carrying the photosensitive material 10a in a substantially U-shape inside the tank.

Above the developing tank 21, a pair of conveying rollers 29 for conveying the photosensitive material 10a from the printer section 3 into the developing tank 21, and a conveying roller for conveying the developed photosensitive material 10a to the bleach-fixing tank 22 side. Pair 30 is provided. Similarly, above the bleach-fixing tank 22, a pair of conveying rollers 31 for conveying the photosensitive material 10a conveyed from the developing tank 21 side into the bleach-fixing tank 22 and the fixing-processed photosensitive material 10a in the first washing tank. Transport roller pair 3 for transporting to the 23 side
Two are provided. Further, above the first washing tank 23, there is provided a pair of conveying rollers 33 for conveying the fixed photosensitive material 10 a into the first washing tank 23. The liquid outside squeeze portion 36 is formed by these conveying roller pairs 30 to 33.
(A portion surrounded by a chain double-dashed line in the figure) is configured to prevent the processing liquid adhering to the photosensitive material 10a from being carried into the next tank. Above the fourth washing tank 26, a pair of conveying rollers 3 for conveying the washed photosensitive material 10a to the drying device 12.
4 are provided. In the washing tank 27, each of the photosensitive materials 1
A conveying roller pair 35 is provided as a means for conveying 0a. Although illustration is omitted because it becomes complicated, the pair of transport rollers 35 in each water washing tank are provided integrally with each removable transport rack.

As shown in FIG. 3, a sub tank 37 is provided on the front surface of the fourth washing tank 26. Sub tank 3
A pump 38 is provided outside the device 7, and the washing liquid is replenished from a replenishment tank 39 by the pump 38. Fresh water washing liquid is replenished from the sub tank 37 to the fourth water washing tank 26, and by this replenishment, overflow passage openings 80, 81 provided in partition walls 42 to 44 described later are provided from the fourth water washing tank 26.
The washing liquid flows down to the third washing tank 25 via (see FIG. 7). Thereafter, the washing liquid flows down into the second and first washing tanks sequentially through the overflow passage openings 80 and 81. The first washing tank 23 is provided with a discharge pipe 40 for discharging a predetermined amount or more of washing liquid. The overflowed washing liquid is stored in the storage tank 41 via the discharge pipe 40.

The first washing tank 23 and the second washing tank 24, the second washing tank 24 and the third washing tank 25, and the third washing tank 25 and the fourth washing tank 26 are partitioned from each other. Partition wall 42,
43 and 44 are provided respectively. These partitions 4
2 to 44 enable passage of the photosensitive material 10a,
An in-liquid squeeze portion 45 that prevents passage of the washing liquid is provided.

As shown in FIG. 3, both ends of the partition walls 42 to 44 are attached to the water washing tank 27 by screws 92 (see also FIG. 8) and can be detached from the water washing tank 27. Also,
As shown in FIG. 4, a convex portion 46 having a flat surface 46a is provided at a partition portion of each washing tank, that is, a portion where the washing tank 27 and the partition walls 42 to 44 contact each other. The convex portion 46 has a contact surface 71 of the partition walls 42 to 44 with which the washing tank 27 is contacted.
(See FIG. 7). In addition, a sub-tank portion 47 is provided on the front surface of the photosensitive material development processing device 11.
Is provided. The sub-tank section 47 accommodates various sub-tanks in addition to the sub-tank 37 and the pump 38 described above. Further, each processing tank is provided with a mounting groove for mounting a transport rack and ribs 48a and 48b.

As shown in FIGS. 5 and 6, the submerged squeeze portion 45 includes a main body portion 52 attached to the opening 51 of the partition wall 42, a blade 53, and a blade retainer 54. The main body portion 52 is attached to the partition wall 42 with screws 55 and is detachable. A packing 56 is sandwiched between the main body 52 and the partition wall 42. The main body 52 and the partition wall 42 may be integrally formed. In this case, the packing 56 is unnecessary.

As shown in FIG. 6, the main body 52 is formed in a rectangular plate shape, and a slit 57 that is long in the horizontal direction is formed in the central portion. This slit 57 has an upper edge 5
7a, a lower edge portion 57b, and a side edge portion 57c. A portion of the slit 57 on the upstream side in the transport direction of the photosensitive material 10a is obliquely cut. The inclined surface that is continuous with the upper edge 57a of this obliquely cut portion is the blade mounting surface 58. Also, the lower edge 57
The inclined surface continuous with b is a guide surface 59 for guiding the tip of the photosensitive material.

A screw hole 60 is formed in the blade mounting surface 58.
And a positioning boss 64 are formed. The blade 53 has a mounting hole 61 that is a long hole that is long in the horizontal direction.
And a positioning hole 65 in which the boss 64 is fitted and positioned. A screw insertion hole 62 is formed in the blade retainer 54. By inserting the screw 63 into the screw insertion hole 62 and attaching the screw 63 to the screw hole 60, the blade 53 is attached to the blade attachment surface 58 via the blade retainer 54. In this way, since the submerged squeeze portion 45 can be attached to and detached from the partition wall 42, maintenance becomes easy.

The blade 53 is made of a synthetic resin thin plate such as a thermosetting polyurethane resin and elastically deforms. With the blade 53 attached to the main body 52,
The tip of the blade 53 has a lower edge 57b of the slit 57.
To contact with. As a result, the slits 57 are sealed by the blades 53, and the washing liquid in the washing tank 27 partitioned by the partition wall 42 does not flow to each other. When the photosensitive material 10a passes, the photosensitive material 10a
The tip of the blade 53 pushes the tip of the blade 53. As a result, the photosensitive material 10a can pass through the slits 57, and the blade 53 prevents the washing liquid from passing therethrough.

The blade retainer 54 is formed in a wedge shape that becomes thinner toward the tip. This blade holder 5
4 is a guide surface 5 for guiding the tip of the photosensitive material 10a with the blade 53 attached to the main body 52.
4a. The guide surface 54a and the guide surface 59
Is formed such that the interval gradually increases toward the upstream side in the photosensitive material transport direction.

As shown in FIG. 7, the washing tank 27 of the partition wall 42.
A groove 72 having a constant width L1 is formed over the entire abutting surface 71. In this groove 72, the seal member 7
3 is fitted. The seal member 73 is shaped in a substantially U shape, and has a cross section of L2 × L3 = 4.5 × 4.5 mm, for example.
The rectangular shape is made of foamed silicon having a hardness of 40 degrees. The groove width L1 is, for example, 3 mm, and is slightly smaller than the width L2 of the seal member 73 in order to fit and hold the seal member 73 in the groove 72. The seal member 73 has a side of φ4.
5 or φ5.0 may be a round shape, and the cross-sectional dimension is L2 × L3 = 4.5 × 5.0 mm, 5.0 × 5.0
mm may be sufficient. Further, the material may be foamed silicon having a hardness of 20 to 40 degrees or solid silicon.

A screw hole 7 is formed in the upper end surface 42a of the partition wall 42.
4, a seal member insertion hole 75, and a screw insertion hole 76 are formed. A screw insertion hole 78 is formed in the seal member holder 77. Both ends of the seal member 73 are passed through the seal member insertion holes 75, and the seal member pressing 77
And the upper end surface 42a of the partition wall 42 sandwiches both ends of the seal member 73, and a screw 79 is inserted into the screw insertion hole 78 so that the screw hole 7
It is mounted on the partition wall 42 by mounting it on the partition wall 4. Thereby, the seal member 73 can be easily attached and detached.

A normal overflow opening 80 is formed in each partition wall 42-44.
And an emergency overflow opening 81 are formed. The normal overflow opening 80 is formed at a lower level than the emergency overflow opening 81, and the washing liquid usually flows down through the normal overflow opening 80. For example, four emergency overflow openings 81 are provided side by side in the horizontal direction in order to increase the opening area.

As shown in FIG. 8, the washing tank 27 has a screw hole 91 formed at a position facing the screw insertion hole 76 of the partition wall 42. The partition wall 42 has a screw 92 and a screw insertion hole 76.
And then attach to the screw hole 91 to wash the tank 2
It is attached to 7. At this time, the seal member 73 is pressed by the flat surface 46a, and the tip portion thereof is crushed.

Both side surfaces of the partition wall 42 are inclined so that the width becomes gradually smaller from the upper side to the lower side, and the inclination angles α and β are 0.5 ° and 3 °, respectively. The convex portion 46 of the washing tank 27 is also formed to match this angle. This prevents erroneous insertion of the partition wall 42. The inclination angles α and β are preferably in the range of 0.5 to 5 °.

As shown in FIG. 9, the partition wall 42 is a washing tank 27.
When it is mounted on, the tip portion of the seal member 73 is pressed by the flat surface 46a of the convex portion 46 and elastically deforms. This allows
The gap between the partition wall 42 and the washing tank 27 is sealed, and the mixing of the washing liquid between the first washing tank 23 and the second washing tank 24 is prevented. The dimensional difference L4 in the pressing direction between the initial state (shown by the dotted line in the figure) before the seal member 73 is mounted in the washing tank 27 and the pressed state after mounting is in the range of 0.5 to 3 mm,
The ratio of the dimensional difference L4 when the dimension of the seal member 73 in the initial state is 100% is in the range of 10 to 45%. This ensures the sealing performance between the washing tanks,
The rinsing ability of the rinsing tank can be maintained. Note that FIG.
As shown in 0, the small protrusion 101 may be formed on the flat surface 46a.

Although only the partition wall 42 has been described so far, the partition walls 43 and 44 have the same structure as the partition wall 42. Further, in the above-described embodiment, the seal member 73 is fitted in the groove 72 of the partition wall 42. However, the present invention can be applied to the case where the groove is formed in the washing tank and the seal member is mounted.

In the above embodiment, when the submerged squeeze portion 45 is maintained, it is preferable to discharge the washing liquid stored in the washing tank 27 so that the washing liquid in each washing tank is not mixed. Before removing the partition 42 from the washing tank 27, a shielding plate for preventing the mixing of the washing liquid is attached before or after the partition 42 is removed so that the maintenance can be performed without discharging the washing liquid, or the shielding plate is automatically lowered. May be.

When the transport rack is attached to the washing tank, the water level of the washing solution is maintained sufficiently, and when it is removed, the water level of the washing solution is the passing position of the photosensitive material 10a of the submerged squeeze portion 45. If the volume of the transfer rack is increased so that it is lower than that, without removing the partition from the washing tank,
The squeeze part in the liquid can be removed without draining the washing liquid. Furthermore, after removing the submerged squeeze portion, a closing member such as a cap that closes the opening may be attached.

[0029]

As described above, according to the photosensitive material development processing apparatus of the present invention, since the partition wall can be attached to and detached from the processing tank, the apparatus can be easily maintained. Further, by providing a groove on the contact surface of the partition wall with the processing tank and providing a flat surface on the contact surface of the processing tank with the partition wall, when the partition wall is attached to the processing tank, it is pressed by the flat surface. Since the sealing member for preventing the mixing of the processing liquid of the previous processing tank and the processing tank of the subsequent processing is fitted in the groove, the sealing performance between the processing tanks is secured and the processing capacity of the processing tanks can be maintained. .

[Brief description of drawings]

FIG. 1 is a schematic diagram showing an internal configuration of a printer processor in which a photosensitive material development processing apparatus of the present invention is implemented.

FIG. 2 is a schematic plan view of a photosensitive material development processing apparatus.

FIG. 3 is a schematic perspective view of a photosensitive material development processing apparatus.

FIG. 4 is a schematic perspective view of a photosensitive material development processing apparatus.

FIG. 5 is an enlarged cross-sectional view of a submerged squeeze portion.

FIG. 6 is an exploded perspective view of a submerged squeeze portion.

FIG. 7 is an exploded perspective view of a partition wall and a seal member.

FIG. 8 is an exploded plan view of a partition wall and a water washing tank.

FIG. 9 is a cross-sectional view of essential parts when the partition wall is attached to the water washing tank.

FIG. 10 shows another embodiment of a flat surface.

[Explanation of symbols]

2 Printer processor 10 Photosensitive material 21 developer tank 22 Bleach-fixing tank 27 Washing tank 28 Transport rack 29-35 Conveyor roller pair 36 Liquid Squeeze Part 42-44 partition wall 45 Submerged squeeze part 46a flat surface 53 blade 57 slits 71 Contact surface 72 groove 73 Seal member 77 Seal member holder

Claims (3)

[Claims] 1. Inside the processing tank via a submerged squeeze portion, which is provided on a partition wall between a plurality of processing tanks in which the processing solution is stored to allow passage of a photosensitive material and to prevent passage of the processing solution. A photosensitive material development processing apparatus for transporting the photosensitive material in a liquid, wherein the partition is removable from the processing tank. 2. A groove is provided on a contact surface of the partition wall with the processing tank, a flat surface is provided on a contact surface of the processing tank with the partition wall, and the partition wall is attached to the processing tank, 2. The photosensitive material development processing apparatus according to claim 1, wherein a seal member, which is pressed and crushed by the flat surface to prevent the processing solution from entering the processing tank, is fitted in the groove. 3. The dimensional difference in the pressing direction between the initial state and the pressed state of the seal member is in the range of 0.5 to 3 mm, and the size of the seal member in the initial state is 10 mm.
3. The photosensitive material development processing apparatus according to claim 1, wherein the ratio of the dimensional difference when set to 0% is in the range of 10 to 45%.