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JP2002029744A - Method for manufacturing tin oxide powder - Google Patents

Method for manufacturing tin oxide powder

Info

Publication number
JP2002029744A
JP2002029744A JP2000215482A JP2000215482A JP2002029744A JP 2002029744 A JP2002029744 A JP 2002029744A JP 2000215482 A JP2000215482 A JP 2000215482A JP 2000215482 A JP2000215482 A JP 2000215482A JP 2002029744 A JP2002029744 A JP 2002029744A
Authority
JP
Japan
Prior art keywords
tin
oxide powder
tin oxide
aqueous solution
solution
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2000215482A
Other languages
Japanese (ja)
Other versions
JP4701480B2 (en
Inventor
Takumi Shibuta
匠 渋田
Shinji Fujiwara
進治 藤原
Kunio Saegusa
邦夫 三枝
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sumitomo Chemical Co Ltd
Original Assignee
Sumitomo Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Chemical Co Ltd filed Critical Sumitomo Chemical Co Ltd
Priority to JP2000215482A priority Critical patent/JP4701480B2/en
Publication of JP2002029744A publication Critical patent/JP2002029744A/en
Application granted granted Critical
Publication of JP4701480B2 publication Critical patent/JP4701480B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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Abstract

PROBLEM TO BE SOLVED: To provide a method for synthesizing tin oxide powder which can be suitably used as the source material of a tin oxide sintered body used as a sputtering target and which has little aggregation of primary particles and narrow distribution of the particle size. SOLUTION: The particle size of the tin oxide powder calculated from the BET specific surface area ranges >=0.05 μm and <=1 μm, and the cumulative particle sizes D10, D50 and D90 corresponding to 10%, 50% and 90% accumulation of particles from the smaller particle size, respectively, in the cumulative distribution of particle size measured by a laser diffraction scattering method satisfy (D90-D10)/D50<=2 and D50<=1 μm. In the method for manufacturing the tin oxide powder by reacting an aqueous tin salt solution and alkali solution to produce a precipitate containing tin, then separating and drying the precipitate containing tin from the reaction liquid of the aqueous tin salt solution and alkali solution and then calcining the precipitate containing tin, the aqueous tin salt solution contains tetravalent tin ions, the reaction of the aqueous tin salt solution and alkali solution is carried out in a pH range from >=0.5 to <=4, and calcination is carried out in a temperature range from >=400 deg.C and <=1200 deg.C.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明が属する技術分野】本発明は、粒度分布が狭く焼
結用として好適な酸化錫粉末およびその製造方法に関す
る。
The present invention relates to a tin oxide powder having a narrow particle size distribution and suitable for sintering, and a method for producing the same.

【0002】[0002]

【従来の技術】酸化錫の薄膜は高い導電性と優れた透光
性を有するので、ITOとともに、透明導電膜として利
用されている。ITOは液晶ディスプレイ用の透明導電
膜として使用されているが、非常に高価である。酸化錫
は安価であるが、膜の加工性がITOより劣るため、微
細加工の必要がない太陽電池用TCO基板ガラス(透明
導電性酸化物コートガラス)、熱線反射ガラス、低放射
ガラス、電熱ガラスなどに使用されている。ITO薄膜
は、ITOの焼結体をターゲットとしてスパッタ法によ
り製造されているが、酸化錫薄膜は酸化錫ではなく金属
錫をターゲットとしており、スパッタにより気化した金
属錫を酸化性雰囲気中で酸化して酸化錫としつつスパッ
タを行う反応性スパッタにより酸化錫薄膜が製造されて
いる。これはターゲットとして使用可能な密度の高い酸
化錫焼結体が得られていないためである。ターゲットと
して好適な密度の高い酸化錫焼結体が望まれているが、
従来の酸化錫粉末は焼結性が不十分であった。
2. Description of the Related Art Tin oxide thin films are used as a transparent conductive film together with ITO because they have high conductivity and excellent light transmittance. ITO is used as a transparent conductive film for a liquid crystal display, but is very expensive. Tin oxide is inexpensive, but the workability of the film is inferior to that of ITO, so there is no need for fine processing. TCO substrate glass for solar cells (transparent conductive oxide coated glass), heat ray reflective glass, low radiation glass, electrothermal glass It is used for The ITO thin film is manufactured by a sputtering method using a sintered body of ITO as a target. However, the tin oxide thin film targets metal tin instead of tin oxide, and oxidizes metal tin vaporized by sputtering in an oxidizing atmosphere. Tin oxide thin films are manufactured by reactive sputtering in which sputtering is performed while forming tin oxide. This is because a tin oxide sintered body having a high density usable as a target has not been obtained. A high density tin oxide sintered body suitable as a target is desired,
Conventional tin oxide powder has insufficient sinterability.

【0003】酸化錫粉末の製造方法としては、例えば、
特開平3−263705号公報に、「塩化スズおよび塩
化アンチモンの溶液をアルカリで中和して酸化スズと酸
化アンチモンの水和物を生成させ、このものを焼成して
導電性微粉末を製造する方法において、該焼成をアンモ
ニウム塩の存在下に行うことを特徴とする導電性粉末の
製造方法」が開示されている。
As a method for producing tin oxide powder, for example,
JP-A-3-263705 discloses that "a solution of tin chloride and antimony chloride is neutralized with an alkali to form a hydrate of tin oxide and antimony oxide, and this is fired to produce a conductive fine powder. Wherein the calcination is carried out in the presence of an ammonium salt.

【0004】該公報にはその実施例において、アルカリ
による中和をpHを7.0または7.3に維持して行
い、生成した水和物をアンモニウム塩存在下にて500
〜550℃で焼成する技術が開示されている。しかし、
生成した粉末のBET比表面積は60〜76m2/gと
大きく、従って極めて微粒の粉末であり、焼結用には必
ずしも十分なものではなかった。
[0004] In the publication, in this example, neutralization with an alkali was carried out while maintaining the pH at 7.0 or 7.3, and the formed hydrate was added to the solution in the presence of an ammonium salt for 500 hours.
A technique of firing at 5550 ° C. is disclosed. But,
The BET specific surface area of the produced powder was as large as 60 to 76 m 2 / g, and was therefore an extremely fine powder, which was not always sufficient for sintering.

【0005】特開平7−187613号公報には、金属
酸化物前駆体をハロゲン化水素や分子状ハロゲンを含有
する雰囲気中にて焼成することにより、粒度分布の狭い
酸化物粉末を得る方法が開示されている。該公報の実施
例においては市販のメタスズ酸(金属錫と硝酸の反応に
より得られる固体)を塩化水素中で焼成する技術を開示
しているが、生成した粉末の一次粒子には凝集が残存し
ており、焼結用には必ずしも十分なものではなかった。
[0005] JP-A-7-187613 discloses a method for obtaining an oxide powder having a narrow particle size distribution by firing a metal oxide precursor in an atmosphere containing hydrogen halide or molecular halogen. Have been. In the examples of this publication, a technique of baking commercially available metastannic acid (solid obtained by the reaction of tin metal and nitric acid) in hydrogen chloride is disclosed, but aggregation remains in the primary particles of the generated powder. And it was not always enough for sintering.

【0006】[0006]

【発明が解決しようとする課題】本発明の目的は、スパ
ッタターゲットに用いられる酸化錫焼結体の原料等とし
て好適に用いることができる、一次粒子の凝集が少な
く、粒度分布の狭い酸化錫粉末とその製造方法を提供す
ることにある。
SUMMARY OF THE INVENTION An object of the present invention is to provide a tin oxide powder having a small primary particle agglomeration and a narrow particle size distribution, which can be suitably used as a raw material of a tin oxide sintered body used for a sputter target. And a method of manufacturing the same.

【0007】[0007]

【課題を解決するための手段】本発明者らは、上記の課
題を解決するために鋭意検討の結果、錫塩水溶液とアル
カリ溶液を反応させて錫含有沈殿を生成させ、該錫塩水
溶液と該アルカリ溶液の反応液から該錫含有沈殿を分離
し乾燥した後に、該錫含有沈殿を焼成することによる酸
化錫粉末の製造方法において、該錫塩水溶液中の錫イオ
ンの価数を4価を含むように制御し、該錫塩水溶液と該
アルカリ溶液を反応させる工程におけるpHを従来技術
とは異なる特定の範囲に制御することにより、一次粒子
の凝集が少なく粒度分布が狭く、スパッタターゲット用
の酸化錫焼結体の原料等として好適に用いることができ
る酸化錫粉末が製造できることを見出し、本発明を完成
するに至った。
Means for Solving the Problems The present inventors have made intensive studies to solve the above-mentioned problems, and as a result, have reacted an aqueous solution of a tin salt with an alkaline solution to form a tin-containing precipitate, After separating and drying the tin-containing precipitate from the reaction solution of the alkaline solution, the tin-containing precipitate is calcined to produce a tin oxide powder. By controlling the pH in the step of reacting the aqueous solution of the tin salt and the alkaline solution to a specific range different from the prior art, the aggregation of the primary particles is small, the particle size distribution is narrow, and the sputter target is used. The present inventors have found that tin oxide powder which can be suitably used as a raw material of a tin oxide sintered body can be produced, and have completed the present invention.

【0008】すなわち本発明は、BET比表面積より算
出した粒径が0.05μm以上1μm以下であり、レー
ザー回折散乱法により測定した累積粒度分布の微粒側か
ら累積10%、累積50%、累積90%の粒径をそれぞ
れD10、D50、D90としたとき、(D90−D1
0)/D50が2以下であり、D50が1μm以下であ
る酸化錫粉末を提供する。また本発明は、錫塩水溶液と
アルカリ溶液を反応させて錫含有沈殿を生成させ、該錫
塩水溶液と該アルカリ溶液の反応液から該錫含有沈殿を
分離し乾燥した後に、該錫含有沈殿を焼成する酸化錫粉
末の製造方法において、該錫塩水溶液が4価の錫イオン
を含み、該錫塩水溶液と該アルカリ溶液の反応をpHが
0.5以上4以下の範囲で行い、該焼成を400℃以上
1200℃以下の温度範囲で行う上記の酸化錫粉末の製
造方法を提供する。また本発明は、上記の酸化錫粉末を
用いる酸化錫焼結体を提供する。さらに本発明は、上記
の酸化錫焼結体を用いるスパッタターゲットを提供す
る。
That is, in the present invention, the particle size calculated from the BET specific surface area is 0.05 μm or more and 1 μm or less, and 10%, 50% and 90% from the fine particle side of the cumulative particle size distribution measured by the laser diffraction scattering method. % As D10, D50, and D90, respectively, (D90-D1
0) A tin oxide powder having a D50 of 2 or less and a D50 of 1 μm or less. Further, the present invention provides a method for producing a tin-containing precipitate by reacting an aqueous solution of a tin salt with an alkaline solution, separating and drying the tin-containing precipitate from a reaction solution of the aqueous solution of the tin salt and the alkaline solution, and then drying the tin-containing precipitate. In the method for producing tin oxide powder to be calcined, the tin salt aqueous solution contains tetravalent tin ions, and the reaction between the tin salt aqueous solution and the alkali solution is performed in a pH range of 0.5 or more and 4 or less. A method for producing the above tin oxide powder, which is performed in a temperature range of 400 ° C. to 1200 ° C. is provided. Further, the present invention provides a tin oxide sintered body using the above tin oxide powder. Further, the present invention provides a sputter target using the above tin oxide sintered body.

【0009】[0009]

【発明の実施の形態】以下に本発明について詳しく説明
する。本発明の方法においては、錫塩水溶液とアルカリ
溶液を反応させて錫含有沈殿を生成させ、該錫塩水溶液
と該アルカリ溶液の反応液から該錫含有沈殿を分離し乾
燥した後に、該錫含有沈殿を焼成するのであるが、該錫
塩水溶液が4価の錫イオンを含むことと、該錫塩水溶液
と該アルカリ溶液の反応をpHが0.5以上4以下の範
囲で行うことが必要である。錫は2価と4価の価数を有
するが、錫が2価である錫塩の水溶液を用いた場合は、
理由は明らかではないが、焼結用に適した酸化錫粉末を
得ることはできず、錫が主に4価である錫塩の水溶液を
用いた場合に、焼結用に適した酸化錫粉末を得ることが
できる。錫塩水溶液とアルカリ溶液の反応は、従来技術
においては中性付近すなわちpH=7付近で行っていた
のであるが、意外にもかなり酸性側である0.5以上4
以下のpH範囲で行った場合に、理由は明らかではない
が、焼結用に適した酸化錫粉末を得ることができるので
ある。
DESCRIPTION OF THE PREFERRED EMBODIMENTS The present invention will be described below in detail. In the method of the present invention, a tin-containing precipitate is formed by reacting an aqueous solution of a tin salt with an alkali solution, and the tin-containing precipitate is separated from a reaction solution of the aqueous solution of the tin salt and the alkali solution and dried, and then the tin-containing precipitate is formed. The precipitate is calcined. It is necessary that the tin salt aqueous solution contains tetravalent tin ions and that the reaction between the tin salt aqueous solution and the alkali solution be performed at a pH of 0.5 or more and 4 or less. is there. Tin has divalent and tetravalent valences, but when an aqueous solution of a tin salt in which tin is divalent is used,
Although the reason is not clear, it is not possible to obtain tin oxide powder suitable for sintering, and when using an aqueous solution of a tin salt in which tin is mainly tetravalent, tin oxide powder suitable for sintering is used. Can be obtained. In the prior art, the reaction between the aqueous solution of the tin salt and the alkali solution was carried out at around neutrality, that is, at around pH = 7.
When the reaction is carried out in the following pH range, tin oxide powder suitable for sintering can be obtained, although the reason is not clear.

【0010】以下本発明の方法の各工程および粉末物性
について詳しく説明する。本発明の方法で使用される4
価の錫イオンを含む錫塩水溶液としては、金属錫を塩酸
と硝酸の混酸に溶解させたものかまたは錫の無機塩を用
いることができる。金属錫を塩酸に溶解させて2価の錫
イオンを含む塩化錫水溶液を作製した後、2価の錫イオ
ンを硝酸により酸化して4価とすることにより、4価の
錫イオンを含む錫塩水溶液としたものを用いることがで
きる。さらに、塩化第二錫水溶液や硫酸第二錫水溶液等
の2価の錫イオンを含む錫塩水溶液と硝酸を反応させて
2価の錫イオンを酸化することにより4価の錫イオンを
生成させ、4価の錫イオンを含む錫塩水溶液としたもの
を用いることができる。
Hereinafter, each step of the method of the present invention and the physical properties of the powder will be described in detail. 4 used in the method of the present invention
As a tin salt aqueous solution containing a valence tin ion, a solution in which metal tin is dissolved in a mixed acid of hydrochloric acid and nitric acid, or an inorganic salt of tin can be used. A tin salt containing tetravalent tin ions is prepared by dissolving metallic tin in hydrochloric acid to prepare a tin chloride aqueous solution containing divalent tin ions, and then oxidizing the divalent tin ions with nitric acid to be tetravalent. An aqueous solution can be used. Further, a tin salt aqueous solution containing divalent tin ions, such as an aqueous stannic chloride solution or an aqueous stannic sulfate solution, is reacted with nitric acid to oxidize the divalent tin ions, thereby generating tetravalent tin ions. A tin salt aqueous solution containing tetravalent tin ions can be used.

【0011】本発明の方法で原料として使用される金属
錫の形態としては、インゴット、ショット、ビーズ等を
挙げることができる。
[0011] Examples of the form of metallic tin used as a raw material in the method of the present invention include ingots, shots, beads and the like.

【0012】本発明の方法で使用される混酸は、硝酸1
モルに対して塩酸を0.2〜5モル混合して得たものが
望ましい。混合する塩酸が硝酸に対して0.2モルより
少ないと、目的の酸化錫粉末を得ることが困難となり、
また5モルより多いと、錫塩水溶液中に、2価の錫イオ
ンが増えるため好ましくない。
The mixed acid used in the method of the present invention is nitric acid 1
Desirably, a mixture obtained by mixing 0.2 to 5 mol of hydrochloric acid with respect to mol is used. If the amount of hydrochloric acid to be mixed is less than 0.2 mol with respect to nitric acid, it becomes difficult to obtain a target tin oxide powder,
If the amount is more than 5 mol, divalent tin ions increase in the aqueous solution of the tin salt, which is not preferable.

【0013】本発明の方法で使用される硝酸の濃度は、
工業的に実施可能な反応時間に設定するために、6モル
/リットル以上であることが好ましい。工業的に入手可
能な硝酸の濃度は最大16モル/リットルであるので、
本発明の方法における硝酸の濃度は6モル/リットル〜
16モル/リットルが好ましい。
The concentration of nitric acid used in the method of the present invention is
In order to set the reaction time to be industrially practicable, it is preferably at least 6 mol / l. Since the concentration of industrially available nitric acid is up to 16 mol / l,
The concentration of nitric acid in the method of the present invention is from 6 mol / l to
16 mol / l is preferred.

【0014】4価の錫イオンを含む錫塩水溶液を得るた
めの金属錫と上記混酸との反応時の温度は40℃以上が
好ましい。40℃未満であると反応が遅く反応に長時間
を要するため、工業的な製造方法としては好ましくな
い。
The temperature at the time of the reaction between the metal tin and the above mixed acid to obtain a tin salt aqueous solution containing tetravalent tin ions is preferably 40 ° C. or higher. If the temperature is lower than 40 ° C., the reaction is slow and the reaction requires a long time, which is not preferable as an industrial production method.

【0015】錫塩水溶液中の錫濃度はSnとして20〜
400g/リットルの範囲のが好ましい。錫濃度がSn
として20g/リットル未満では得られる酸化錫粉末の
生産性(錫塩水溶液の単位体積当りの酸化錫の生産量)
が低下し、工業的な製造方法としては好ましくない。4
00g/リットルを越える濃度は飽和濃度を越える。
The tin concentration in the tin salt aqueous solution is 20 to
A range of 400 g / l is preferred. Tin concentration is Sn
As less than 20 g / liter, the productivity of the obtained tin oxide powder (the production amount of tin oxide per unit volume of the aqueous solution of tin salt)
, Which is not preferable as an industrial production method. 4
Concentrations above 00 g / liter exceed saturation concentrations.

【0016】次に、本発明の方法においては、錫塩水溶
液とアルカリ溶液を反応させ、錫含有沈殿を生成させ
る。該錫塩水溶液と該アルカリ溶液の反応中のpHが
0.5以上4以下の範囲に維持されるように、該錫塩水
溶液と該アルカリ溶液を供給する。反応中のpHが4よ
り高くなるかまたは0.5未満であると、目的とする狭
い粒度分布を有する焼結用に好適な酸化錫粉末が得られ
なくなる。
Next, in the method of the present invention, a tin salt aqueous solution and an alkali solution are reacted to form a tin-containing precipitate. The tin salt aqueous solution and the alkali solution are supplied such that the pH during the reaction between the tin salt aqueous solution and the alkali solution is maintained in the range of 0.5 to 4. If the pH during the reaction is higher than 4 or lower than 0.5, a tin oxide powder suitable for sintering having a targeted narrow particle size distribution cannot be obtained.

【0017】本発明において使用されるアルカリ溶液と
しては、アンモニア水、水酸化ナトリウム水溶液あるい
は水酸化カリウム水溶液等を挙げることができる。
Examples of the alkaline solution used in the present invention include aqueous ammonia, an aqueous sodium hydroxide solution and an aqueous potassium hydroxide solution.

【0018】得られる錫含有沈殿の濾過時間を短くする
ため、本発明の方法における錫塩水溶液とアルカリ溶液
の反応の温度は40℃以上100℃未満の範囲であるこ
とが好ましい。
In order to shorten the filtration time of the obtained tin-containing precipitate, the reaction temperature of the aqueous solution of the tin salt with the alkali solution in the method of the present invention is preferably in the range of 40 ° C. or more and less than 100 ° C.

【0019】本発明の方法において、錫塩水溶液とアル
カリ溶液を反応させ錫含有沈殿を生成させる方法として
は、反応槽中の錫塩水溶液中にアルカリ溶液を供給する
方法、反応槽中のアルカリ溶液中に錫塩水溶液を供給す
る方法、錫塩水溶液とアルカリ溶液を同時に反応槽に供
給する方法などを挙げることができる。
In the method of the present invention, as a method of reacting an aqueous solution of a tin salt with an alkaline solution to form a tin-containing precipitate, a method of supplying an alkaline solution to an aqueous solution of a tin salt in a reaction vessel, an alkaline solution in the reaction vessel A method of supplying an aqueous solution of a tin salt therein, a method of simultaneously supplying an aqueous solution of a tin salt and an alkaline solution to a reaction tank, and the like can be given.

【0020】本発明の方法における錫塩水溶液とアルカ
リ溶液を反応させ錫含有沈殿を生成させる方法として
は、例えば、反応槽に所定量、所定温度、所定pHの水
(蒸留水あるいはイオン交換水等)を入れて攪拌し、攪
拌しながら水中に錫塩水溶液の供給を開始し、錫塩水溶
液の供給により反応槽内の液のpHが低下するので、p
Hが0.5以上4以下の範囲に維持されるよう必要量の
アルカリ溶液を供給する方法を挙げることができる。
As a method for producing a tin-containing precipitate by reacting an aqueous solution of a tin salt with an alkaline solution in the method of the present invention, for example, water (e.g., distilled water or ion-exchanged water) having a predetermined amount, a predetermined temperature and a predetermined pH is added to a reaction tank. ) Is added and stirred. The supply of the aqueous solution of the tin salt is started while stirring, and the supply of the aqueous solution of the tin salt lowers the pH of the liquid in the reaction vessel.
A method of supplying a required amount of an alkaline solution so that H is maintained in a range of 0.5 or more and 4 or less can be mentioned.

【0021】本発明の方法においては、錫塩水溶液とア
ルカリ溶液の反応により生成した錫含有沈殿を、該錫塩
水溶液と該アルカリ溶液の反応液から濾過あるいは遠心
分離等の方法により分離して回収する。該分離操作に使
用する装置としては、ヌッチェフィルター、フィルター
プレス、ケリー葉状濾過機、押出板型遠心分離機、スク
リュー排出型遠心脱水機、シックナー、回分式沈降装置
などを挙げることができる。
In the method of the present invention, the tin-containing precipitate formed by the reaction between the aqueous solution of the tin salt and the alkali solution is separated and recovered from the reaction solution of the aqueous solution of the tin salt and the alkali solution by filtration or centrifugation. I do. Examples of the apparatus used for the separation operation include a Nutsche filter, a filter press, a Kelly leaf filter, an extruder centrifuge, a screw discharge centrifugal dehydrator, a thickener, and a batch sedimentation apparatus.

【0022】本発明の方法において、反応液から分離後
の錫含有沈殿には、錫塩とアルカリの反応により生成し
た塩(硝酸アンモニウムなどのアンモニウム塩、硝酸ナ
トリウムなどのアルカリ金属塩)が残存しているため、
該錫含有沈殿を洗浄することが望ましい。洗浄に用いる
液としては、副生成した塩類を溶解することができ、か
つ乾燥後に洗浄液由来の残留物を残すことの無い蒸留水
やイオン交換水等の水、あるいは、アンモニア水等のア
ルカリ水溶液を挙げることができる。
In the method of the present invention, a salt (an ammonium salt such as ammonium nitrate, an alkali metal salt such as sodium nitrate) formed by a reaction between a tin salt and an alkali remains in the tin-containing precipitate after separation from the reaction solution. Because
It is desirable to wash the tin-containing precipitate. As a solution used for washing, water such as distilled water or ion-exchanged water which can dissolve salts by-produced and does not leave a residue derived from the washing solution after drying, or an alkaline aqueous solution such as ammonia water is used. Can be mentioned.

【0023】次に、本発明の方法においては、焼成の前
に乾燥が必要である。コニカルドライヤーや棚段式乾燥
機等、工業的に使用できる装置を用いて乾燥する事がで
きる。乾燥温度は、錫含有沈殿に付着した水分を除去で
きる程度の温度であれば良く、20℃以上300℃以下
の温度範囲が好ましく、90℃以上150℃以下がさら
に好ましい。また、焼成炉の中に仕込んだ状態で乾燥を
行い、乾燥工程と焼成工程を連続して行うこともでき
る。
Next, in the method of the present invention, drying is required before firing. Drying can be performed using an industrially usable device such as a conical dryer or a tray type dryer. The drying temperature may be a temperature at which water adhering to the tin-containing precipitate can be removed, and is preferably in a temperature range of 20 ° C to 300 ° C, more preferably 90 ° C to 150 ° C. Further, drying can be performed in a state of being charged in a firing furnace, and the drying step and the firing step can be continuously performed.

【0024】本発明の方法における焼成は400℃以上
1200℃以下の温度範囲で行うが、600℃以上11
00℃以下の温度範囲が望ましい。焼成温度が400℃
未満では、結晶化温度が十分でなかったり、錫含有沈殿
の乾燥物に付着した硝酸アンモニウム等の塩の分解が不
十分であったりする。焼成温度が1200℃を超える場
合には、一次粒子が結晶成長し一部が凝集して、一次粒
子の分散性のよい酸化錫粉末が得られない場合がある。
適切な焼成の時間は雰囲気ガスの濃度や焼成の温度にも
依存するが、好ましくは1分以上24時間以下、より好
ましくは10分以上10時間以下である。
The calcination in the method of the present invention is carried out at a temperature in the range of 400 ° C. to 1200 ° C.
A temperature range of 00 ° C or less is desirable. The firing temperature is 400 ° C
If it is less than 1, the crystallization temperature is not sufficient, or the decomposition of salts such as ammonium nitrate adhered to the dried tin-containing precipitate is insufficient. If the firing temperature exceeds 1200 ° C., the primary particles may grow crystals and a part of the particles may aggregate, so that tin oxide powder having good dispersibility of the primary particles may not be obtained.
The appropriate firing time depends on the concentration of the atmosphere gas and the firing temperature, but is preferably 1 minute to 24 hours, more preferably 10 minutes to 10 hours.

【0025】本発明の方法における焼成の雰囲気ガスと
しては、空気、酸素、窒素あるいは塩化水素、臭化水
素、ヨウ化水素等のハロゲン化水素ガス、または、塩
素、臭素、ヨウ素等のハロゲンガス等を用いることが好
ましいが、ハロゲン化水素ガスまたはハロゲンガスを含
有する雰囲気中での焼成がより好ましく、塩化水素ガス
を含有する雰囲気ガス中での焼成が特に好ましい。塩化
水素ガスを含有する雰囲気ガス中での焼成によって、最
も一次粒子の凝集の弱い酸化錫粉末を得ることができ
る。
As the atmosphere gas for firing in the method of the present invention, air, oxygen, nitrogen, a hydrogen halide gas such as hydrogen chloride, hydrogen bromide, hydrogen iodide, or a halogen gas such as chlorine, bromine, iodine, etc. Is preferably used, but firing in an atmosphere containing a hydrogen halide gas or a halogen gas is more preferable, and firing in an atmosphere gas containing a hydrogen chloride gas is particularly preferable. By firing in an atmosphere gas containing hydrogen chloride gas, tin oxide powder with the least aggregation of primary particles can be obtained.

【0026】本発明の方法において、ハロゲン化水素ガ
スあるいはハロゲンガス、特に塩化水素ガスを含有する
雰囲気中で焼成する場合、雰囲気ガスの全体積に対し
て、該ガスを好ましくは0.5体積%以上、より好まし
くは1体積%、さらに好ましくは2体積%以上含有する
雰囲気ガス中にて焼成する。ハロゲン化水素ガスの濃度
の上限は特に限定されないが、工業的な生産性の面か
ら、好ましくは50体積%以下、より好ましくは20体
積%以下、さらに好ましくは10体積%以下である。該
ガスの希釈ガスとしては、アルゴン等の不活性ガス、窒
素、酸素、空気またはこれらの混合ガスを挙げることが
できる。
In the method of the present invention, when firing in an atmosphere containing a hydrogen halide gas or a halogen gas, particularly a hydrogen chloride gas, the gas is preferably 0.5% by volume with respect to the total volume of the atmosphere gas. The firing is performed in an atmosphere gas containing 1% by volume, more preferably 2% by volume or more, more preferably. The upper limit of the concentration of the hydrogen halide gas is not particularly limited, but is preferably 50% by volume or less, more preferably 20% by volume or less, and still more preferably 10% by volume or less from the viewpoint of industrial productivity. Examples of the diluting gas for the gas include an inert gas such as argon, nitrogen, oxygen, air, and a mixed gas thereof.

【0027】本発明の方法においてハロゲン化水素ガス
あるいはハロゲンガス含有雰囲気中で焼成を行う場合、
雰囲気ガスの供給方法としては、例えば所定の濃度にガ
スを混合したボンベ等を用いることができる。焼成にお
ける雰囲気ガスの圧力は、工業的に用いられる範囲にお
いて選ぶことができる。
In the method of the present invention, when firing is performed in a hydrogen halide gas or an atmosphere containing a halogen gas,
As a method for supplying the atmospheric gas, for example, a cylinder or the like in which a gas is mixed at a predetermined concentration can be used. The pressure of the atmosphere gas in the firing can be selected in a range used industrially.

【0028】本発明の方法においては、焼成装置とし
て、例えばガス炉、電気炉、トンネル炉などの焼成炉を
挙げることができる。
In the method of the present invention, examples of the firing apparatus include firing furnaces such as a gas furnace, an electric furnace, and a tunnel furnace.

【0029】本発明の方法においてハロゲン化水素ガス
あるいはハロゲンガス含有雰囲気中で焼成を行う場合、
焼成炉はハロゲン化水素ガスまたはハロゲンガスに腐食
されない材質で構成されていることが好ましく、気密性
があることが望ましい。本発明の方法においてハロゲン
化水素ガスあるいはハロゲンガス含有雰囲気中で焼成を
行う場合、焼成炉の高温部や錫含有沈殿を入れる容器
(坩堝やボート)は、アルミナ製、石英製、耐酸レンガ
或いはグラファイト製であることが好ましい。
In the method of the present invention, when calcination is performed in an atmosphere containing a hydrogen halide gas or a halogen gas,
The firing furnace is preferably made of a material that is not corroded by hydrogen halide gas or halogen gas, and is preferably airtight. When calcination is performed in an atmosphere containing a hydrogen halide gas or a halogen gas in the method of the present invention, a container (a crucible or a boat) for storing a high-temperature portion of the firing furnace or a tin-containing precipitate is made of alumina, quartz, acid-resistant brick or graphite. It is preferable that it is manufactured.

【0030】本発明の方法による焼成後の酸化錫粉末は
必要に応じて粉砕することができる。酸化錫粉末の粉砕
方法としは、例えば通常工業的に用いられる、振動ミ
ル、ボールミルやジェットミル、アトリッションミル等
による粉砕方法が挙げられるが、本発明の酸化錫粉末は
一次粒子同士の凝集が弱いため、例えばボールミルやジ
ェットミル等による軽度の粉砕方法を用いることができ
る。また、ボールミル粉砕に際しては、乾式粉砕、湿式
粉砕またはこれらの組み合わせのいずれの方法も用いる
ことができる。
The tin oxide powder after firing by the method of the present invention can be pulverized if necessary. Examples of the method of pulverizing tin oxide powder include, for example, a method commonly used in industry, such as a vibration mill, a ball mill, a jet mill, and an attrition mill.The tin oxide powder of the present invention is an agglomeration of primary particles. Therefore, for example, a light grinding method using a ball mill, a jet mill, or the like can be used. In ball mill pulverization, any of dry pulverization, wet pulverization or a combination thereof can be used.

【0031】本発明の方法による酸化錫粉末の粉砕に用
いられる粉砕容器としては、アルミナ製や樹脂製等のも
のを挙げることができ、粉砕用ボールとしてはアルミナ
製やジルコニア製や樹脂製等のものを挙げることができ
る。ボールミル粉砕の際に粉砕容器やボールからの汚染
を抑制するため、粉砕用容器は樹脂製容器を、粉砕用ボ
ールは耐摩耗性の高いジルコニア製ボールを用いること
が好ましい。
Examples of the pulverizing container used for pulverizing the tin oxide powder according to the method of the present invention include those made of alumina, resin, and the like. Examples of the pulverizing balls include those made of alumina, zirconia, and resin. Things can be mentioned. In order to suppress contamination from the crushing container and the balls during the ball mill crushing, it is preferable to use a resin container as the crushing container and a zirconia ball with high wear resistance as the crushing ball.

【0032】本発明の酸化錫粉末は、BET比表面積か
ら算出した粒径(以下「BET比表面積径」と称する)
は、0.05μm以上1μm以下であり、レーザー回折
散乱法による累積粒度分布の微粒側から累積10%、累
積50%、累積90%の粒径をそれぞれD10、D5
0、D90としたとき、(D90−D10)/D50が
2以下、好ましくは1.5以下であり、D50が1μm
以下である粒度分布を有する。焼結に適当な粒径を有
し、かつ一次粒子の凝集が少なく粒径が揃っているの
で、本発明の酸化錫粉末は焼結用に好適に使用できる。
BET比表面積径が0.05μmより小さいと一次粒子
が凝集し焼結性が低下する。BET比表面積径が1μm
より大きいと焼結性が低下する。(D90−D10)/
D50が2より大きいと粒径が不揃いであるため焼結性
が低下する。D50が大き過ぎると粒径が大き過ぎ、焼
結性が低下する。D50/(BET比表面積径)は1〜
10が好ましい。10より大きいかまたは1より小さい
と凝集粒子が多く凝集も強く焼結性が低下する場合があ
る。
The tin oxide powder of the present invention has a particle size calculated from the BET specific surface area (hereinafter referred to as “BET specific surface area diameter”).
Is not less than 0.05 μm and not more than 1 μm, and the particle diameters of 10%, 50% and 90% from the fine particle side of the cumulative particle size distribution by the laser diffraction scattering method are D10 and D5, respectively.
0 and D90, (D90−D10) / D50 is 2 or less, preferably 1.5 or less, and D50 is 1 μm
It has the following particle size distribution: The tin oxide powder of the present invention can be suitably used for sintering because it has an appropriate particle size for sintering and has a uniform particle size with little aggregation of primary particles.
When the BET specific surface area diameter is smaller than 0.05 μm, the primary particles aggregate and the sinterability decreases. BET specific surface area diameter is 1μm
If it is larger, the sinterability decreases. (D90-D10) /
When D50 is larger than 2, the sinterability is reduced because the particle diameter is not uniform. If D50 is too large, the particle size is too large, and the sinterability decreases. D50 / (BET specific surface area diameter) is 1 to
10 is preferred. If it is larger than 10 or smaller than 1, there may be a large number of agglomerated particles, strong agglomeration and reduced sinterability.

【0033】本発明の酸化錫粉末の焼結方法としては、
例えば特開平11−116325号公報に開示された公
知の方法を用いることができ、本発明の酸化錫粉末を使
用して製造した焼結体は、透明導電膜を作製するための
スパッタターゲットとして好適に使用できる。
The method for sintering the tin oxide powder of the present invention includes:
For example, a known method disclosed in Japanese Patent Application Laid-Open No. H11-116325 can be used. The sintered body produced using the tin oxide powder of the present invention is suitable as a sputter target for producing a transparent conductive film. Can be used for

【0034】[0034]

【実施例】次に本発明を実施例によりさらに詳しく説明
するが、本発明はこれらの実施例に限定されるものでは
ない。
EXAMPLES Next, the present invention will be described in more detail with reference to examples, but the present invention is not limited to these examples.

【0035】なお、本発明における累積粒度分布とBE
T比表面積の測定は次のようにして行った。 1.粒度分布 レーザー回折散乱法を測定原理とする粒度分布測定装置
である株式会社島津製作所製SALD−2000A型を
用いて測定した。 2.BET比表面積 BET比表面積測定装置の株式会社島津製作所製フロー
ソーブII2300型を用いてBET比表面積を測定し
た。また、次式によってBET比表面積径を算出した。 BET比表面積径(μm)=6/(S*ρ) SはBET比表面積(m2/g) ρは酸化錫の理論密度であり7.00g/cm3であ
る。
In the present invention, the cumulative particle size distribution and BE
The measurement of the T specific surface area was performed as follows. 1. Particle size distribution The particle size distribution was measured using a SALD-2000A model manufactured by Shimadzu Corporation, which is a particle size distribution measuring apparatus based on a laser diffraction scattering method. 2. BET specific surface area The BET specific surface area was measured using a flowsorb II2300 model manufactured by Shimadzu Corporation, a BET specific surface area measuring device. The BET specific surface area diameter was calculated by the following equation. BET specific surface area diameter (μm) = 6 / (S * ρ) S is the BET specific surface area (m 2 / g) and ρ is the theoretical density of tin oxide, which is 7.00 g / cm 3 .

【0036】実施例1 濃度35質量%の塩酸600ミリリットルと、濃度60
質量%硝酸200ミリリットルを混合し混酸(A)(塩
酸/硝酸モル比=2.6)を得た。金属錫113.66
gと混酸(A)を混合し、塩化錫(4価)水溶液を得
た。次いで容量2リットルのセパラブルフラスコ中に純
水1リットルを入れ、60℃に保持した。この60℃の
純水1リットルを攪拌回転数290rpmで攪拌しなが
ら、塩化錫(4価)水溶液627.34gと濃度28質
量%のアンモニア水を、反応中のpHを2.0に維持す
るように122分かけて同時に供給して反応させ、錫含
有沈殿を生成させた。錫含有沈殿を生成後、60℃にて
30分攪拌し、さらに室温で一晩静置して沈殿を熟成し
た。錫含有沈殿をpH=8に調整し、室温にて30分攪
拌した。次いで、吸引濾過を行い、洗浄を行い、沈殿を
回収した。この沈殿を130℃にて乾燥した。
Example 1 600 ml of hydrochloric acid having a concentration of 35% by mass and a concentration of 60
A mixed acid (A) (molar ratio of hydrochloric acid / nitric acid = 2.6) was obtained by mixing 200 ml of mass% nitric acid. Metal tin 113.66
g and the mixed acid (A) were mixed to obtain a tin chloride (tetravalent) aqueous solution. Next, 1 liter of pure water was placed in a separable flask having a capacity of 2 liters and kept at 60 ° C. While stirring 1 liter of the pure water at 60 ° C. at a stirring rotation speed of 290 rpm, 627.34 g of an aqueous solution of tin chloride (tetravalent) and aqueous ammonia having a concentration of 28% by mass are maintained at a pH of 2.0 during the reaction. For 122 minutes to produce a tin-containing precipitate. After the formation of the tin-containing precipitate, the mixture was stirred at 60 ° C. for 30 minutes, and left still at room temperature overnight to mature the precipitate. The tin-containing precipitate was adjusted to pH = 8 and stirred at room temperature for 30 minutes. Next, suction filtration was performed, washing was performed, and the precipitate was collected. The precipitate was dried at 130 ° C.

【0037】次いで乾燥した沈殿を、アルミナ製のボー
トに充填し、管状炉にて焼成を行った。焼成温度は11
00℃で30分とし、昇温速度は900℃までは10℃
/分、900℃からは5℃/分とした。雰囲気ガスとし
ては、室温から1000℃までは空気のみを流し、10
00℃から1100℃までは2.5体積%塩化水素ガス
−97.5体積%空気を流した。焼成後は空気のみを流
して冷却し、炉から取り出した粉末を水洗、乾燥して酸
化錫粉末を得た。得られた酸化錫粉末を湿式粉砕した。
Next, the dried precipitate was charged into an alumina boat and fired in a tubular furnace. Firing temperature is 11
30 minutes at 00 ° C, heating rate is 10 ° C up to 900 ° C
/ Minute from 900 ° C, 5 ° C / minute. As atmosphere gas, only air is allowed to flow from room temperature to 1000 ° C.
From 00 ° C to 1100 ° C, 2.5% by volume hydrogen chloride gas-97.5% by volume air was flown. After the firing, the air was cooled by flowing only air, and the powder taken out of the furnace was washed with water and dried to obtain a tin oxide powder. The obtained tin oxide powder was wet-pulverized.

【0038】湿式粉砕して得られた酸化錫粉末の粒度分
布を測定したところ、D50は0.65μm、(D90
−D10)/D50は1.05であった。BET比表面
積は4.42m2/gであった。BET比表面積径を算
出すると0.19μmとなり、D50をBET比表面積
径で除した値は3.42となる。
When the particle size distribution of the tin oxide powder obtained by wet pulverization was measured, D50 was 0.65 μm and (D90
-D10) / D50 was 1.05. The BET specific surface area was 4.42 m 2 / g. The calculated BET specific surface area diameter is 0.19 μm, and the value obtained by dividing D50 by the BET specific surface area diameter is 3.42.

【0039】実施例2 金属錫30.0kgを35質量%塩酸39.7kgに溶
解して塩化錫(2価)水溶液(A)を得た。次いで塩化
錫(2価)水溶液(A)352.5gと濃度35質量%
の塩酸209.5gを混合し、塩化錫(2価)水溶液
(B)を得た。次いで塩化錫(2価)水溶液(B)を8
0℃に保持した。80℃に保持したこの溶液中に濃度6
0質量%の硝酸188.5gを68分かけて滴下し、塩
化錫(4価)水溶液(C)を得た。次いで2リットルの
セパラブルフラスコ中に純水1リットルを入れ、60℃
に保持した。この60℃の純水1リットルを攪拌回転数
298rpmで攪拌しながら、塩化錫(4価)水溶液
(C)733.3gと濃度28質量%アンモニア水を、
反応中のpHを2.0に維持するように122分かけて
同時に供給して反応させ、錫含有沈殿を生成させた。錫
含有沈殿を生成後、60℃にて30分攪拌し、さらに室
温で一晩静置して沈殿を熟成した。錫含有沈殿をpHを
8に調整し、室温にて30分攪拌した。次いで、吸引濾
過を行い、洗浄を行い、沈殿を回収した。この沈殿を1
30℃にて乾燥した。
Example 2 30.0 kg of metallic tin was dissolved in 39.7 kg of 35 mass% hydrochloric acid to obtain an aqueous tin chloride (divalent) solution (A). Subsequently, 352.5 g of tin chloride (divalent) aqueous solution (A) and a concentration of 35% by mass were used.
Was mixed with 209.5 g of hydrochloric acid to obtain a tin chloride (divalent) aqueous solution (B). Then, tin chloride (divalent) aqueous solution (B) was added to 8
It was kept at 0 ° C. A concentration of 6 in this solution maintained at 80 ° C.
188.5 g of 0 mass% nitric acid was added dropwise over 68 minutes to obtain a tin chloride (tetravalent) aqueous solution (C). Next, 1 liter of pure water was placed in a 2 liter separable flask,
Held. While stirring 1 liter of the pure water at 60 ° C. at a stirring rotation speed of 298 rpm, 733.3 g of a tin chloride (tetravalent) aqueous solution (C) and a 28% by mass ammonia water solution were added.
The reaction was carried out by simultaneously supplying over 122 minutes to maintain the pH during the reaction at 2.0, thereby producing a tin-containing precipitate. After the formation of the tin-containing precipitate, the mixture was stirred at 60 ° C. for 30 minutes, and left still at room temperature overnight to mature the precipitate. The tin-containing precipitate was adjusted to pH 8 and stirred at room temperature for 30 minutes. Next, suction filtration was performed, washing was performed, and the precipitate was collected. This precipitate is
Dried at 30 ° C.

【0040】次いで乾燥した沈殿を、アルミナ製のボー
トに充填し、管状炉にて焼成を行った。焼成温度は11
00℃で30分とし、昇温速度は900℃までは10℃
/分、900℃からは5℃/分とした。雰囲気ガスとし
ては、室温から1000℃までは空気のみを流し、10
00℃から1100℃までは2.5体積%塩化水素ガス
−97.5体積%空気を流した。焼成後は空気のみを流
して冷却し、炉から取り出した粉末を水洗、乾燥して酸
化錫粉末を得た。得られた酸化錫粉末のBET比表面積
は3.12m2/gであった。得られた酸化錫粉末を湿
式粉砕した。
Next, the dried precipitate was filled in an alumina boat and fired in a tubular furnace. Firing temperature is 11
30 minutes at 00 ° C, heating rate is 10 ° C up to 900 ° C
/ Minute from 900 ° C, 5 ° C / minute. As atmosphere gas, only air is allowed to flow from room temperature to 1000 ° C.
From 00 ° C to 1100 ° C, 2.5% by volume hydrogen chloride gas-97.5% by volume air was flown. After the firing, the air was cooled by flowing only air, and the powder taken out of the furnace was washed with water and dried to obtain a tin oxide powder. The BET specific surface area of the obtained tin oxide powder was 3.12 m 2 / g. The obtained tin oxide powder was wet-pulverized.

【0041】湿式粉砕により得られた酸化錫粉末の粒度
分布を測定したところ、D50は0.49μm、(D9
0−D10)/D50は0.72であった。BET比表
面積は13.09m2/gであった。BET比表面積径
を算出すると0.07μmとなり、D50をBET比表
面積径で除した値は7.00となる。
When the particle size distribution of the tin oxide powder obtained by the wet pulverization was measured, D50 was 0.49 μm and (D9
0-D10) / D50 was 0.72. The BET specific surface area was 13.09 m 2 / g. The calculated BET specific surface area diameter is 0.07 μm, and the value obtained by dividing D50 by the BET specific surface area diameter is 7.00.

【0042】比較例1 金属錫を濃度60質量%の硝酸と反応させ、メタスズ酸
(固体)を得た。次いで吸引濾過を行い、洗浄を行い、
メタスズ酸を回収した。このメタスズ酸を130℃にて
乾燥した後、石英ガラス製のボートに充填し、管状炉に
て焼成を行った。焼成温度は1100℃で60分とし、
昇温速度は5℃/分とした。雰囲気ガスとしては、室温
から1000℃までは空気のみを流し、1000℃から
1100℃までは20体積%塩化水素ガス−80体積%
空気を流した。焼成後は空気のみを流して冷却し、炉か
ら取り出した粉末を水洗、乾燥して酸化錫粉末を得た。
得られた酸化錫粉末を湿式粉砕した。粉砕後の酸化錫粉
末の粒度分布を測定したところ、D50は1.32μ
m、(D90−D10)/D50は2.35であり、B
ET比表面積は9.26m2/gであった。BET比表
面積径は0.09μmとなり、D50をBET比表面積
径で除した値は14.67となる。
Comparative Example 1 Metal tin was reacted with nitric acid having a concentration of 60% by mass to obtain metastannic acid (solid). Then perform suction filtration, wash,
Metastannic acid was recovered. After drying this metastannic acid at 130 ° C., it was charged into a quartz glass boat and fired in a tubular furnace. The firing temperature is 1100 ° C for 60 minutes,
The heating rate was 5 ° C./min. As the atmosphere gas, only air is allowed to flow from room temperature to 1000 ° C., and from 1000 ° C. to 1100 ° C., 20% by volume of hydrogen chloride gas−80% by volume.
The air was shed. After the firing, the air was cooled by flowing only air, and the powder taken out of the furnace was washed with water and dried to obtain a tin oxide powder.
The obtained tin oxide powder was wet-pulverized. When the particle size distribution of the crushed tin oxide powder was measured, D50 was 1.32 μm.
m, (D90−D10) / D50 is 2.35, and B
The ET specific surface area was 9.26 m 2 / g. The BET specific surface area diameter is 0.09 μm, and the value obtained by dividing D50 by the BET specific surface area diameter is 14.67.

【0043】比較例2 金属錫30.0kgを35質量%塩酸39.7kgに溶
解して塩化錫(2価)水溶液を得た。次いで1リットル
のセパラブルフラスコ中に純水400ミリリットルを入
れ、60℃に保持した。この60℃の純水400ミリリ
ットルを攪拌回転数250rpmで攪拌しながら、塩化
錫(2価)水溶液150.0gと28質量%アンモニア
水を、反応中のpHを6.0に維持するように65分か
けて同時に供給して反応させ、錫含有沈殿を生成させ
た。錫含有沈殿を生成後、60℃にて30分攪拌し、さ
らに室温で一晩静置して沈殿を熟成した。錫含有沈殿を
pH=8に調整し、室温にて30分攪拌した。次いで吸
引濾過を行い、洗浄を行い、沈殿を回収した。この沈殿
を130℃にて乾燥した。
Comparative Example 2 30.0 kg of metallic tin was dissolved in 39.7 kg of 35% by mass hydrochloric acid to obtain an aqueous solution of tin chloride (divalent). Next, 400 ml of pure water was placed in a 1 liter separable flask and maintained at 60 ° C. While stirring 400 ml of the pure water at 60 ° C. at a stirring rotation speed of 250 rpm, 150.0 g of an aqueous solution of tin chloride (divalent) and 28% by mass of aqueous ammonia were added to form 65% so that the pH during the reaction was maintained at 6.0. The reaction was fed simultaneously over a period of minutes to produce a tin-containing precipitate. After the formation of the tin-containing precipitate, the mixture was stirred at 60 ° C. for 30 minutes, and left still at room temperature overnight to mature the precipitate. The tin-containing precipitate was adjusted to pH = 8 and stirred at room temperature for 30 minutes. Next, suction filtration was performed, washing was performed, and the precipitate was collected. The precipitate was dried at 130 ° C.

【0044】次いで乾燥した沈殿を、アルミナ製のボー
トに充填し、管状炉にて焼成を行った。焼成温度は11
00℃で30分とし、昇温速度は900℃までは10℃
/分、900℃からは5℃/分とした。雰囲気ガスとし
ては、室温から1000℃までは空気のみを流し、10
00℃から1100℃までは10体積%の塩化水素ガス
−90体積%空気を流した。焼成後は空気のみを流して
冷却し、炉から取り出した粉末を水洗、乾燥して酸化錫
粉末を得た。得られた酸化錫粉末の粒度分布を測定した
ところ、D50は1.77μm、(D90−D10)/
D50は2.36であった。
Next, the dried precipitate was charged into an alumina boat and fired in a tubular furnace. Firing temperature is 11
30 minutes at 00 ° C, heating rate is 10 ° C up to 900 ° C
/ Minute from 900 ° C, 5 ° C / minute. As atmosphere gas, only air is allowed to flow from room temperature to 1000 ° C.
From 00 ° C to 1100 ° C, 10% by volume of hydrogen chloride gas-90% by volume of air was flowed. After the firing, the air was cooled by flowing only air, and the powder taken out of the furnace was washed with water and dried to obtain a tin oxide powder. When the particle size distribution of the obtained tin oxide powder was measured, D50 was 1.77 μm, and (D90-D10) /
D50 was 2.36.

【0045】[0045]

【発明の効果】本発明の酸化錫粉末は一次粒子の凝集が
少なく粒度分布が狭い、焼結用に好適な粉末であり、本
発明の製造方法により該酸化錫粉末を製造することがで
きるので、本発明は工業的に有用である。
The tin oxide powder of the present invention is a powder which is suitable for sintering and has a small primary particle agglomeration and a narrow particle size distribution. The tin oxide powder can be produced by the production method of the present invention. The present invention is industrially useful.

───────────────────────────────────────────────────── フロントページの続き (72)発明者 三枝 邦夫 茨城県つくば市北原6 住友化学工業株式 会社内 Fターム(参考) 4K029 BA47 DC05 DC09  ──────────────────────────────────────────────────続 き Continued on front page (72) Inventor Kunio Saegusa 6 Kitahara, Tsukuba, Ibaraki F-term in Sumitomo Chemical Co., Ltd. 4K029 BA47 DC05 DC09

Claims (9)

【特許請求の範囲】[Claims] 【請求項1】BET比表面積より算出した粒径が0.0
5μm以上1μm以下であり、レーザー回折散乱法によ
り測定した累積粒度分布の微粒側から累積10%、累積
50%、累積90%の粒径をそれぞれD10、D50、
D90としたとき、(D90−D10)/D50が2以
下であり、D50が1μm以下である酸化錫粉末。
A particle diameter calculated from a BET specific surface area is 0.0
5 μm or more and 1 μm or less, and the particle diameters of 10%, 50% and 90% from the fine particle side of the cumulative particle size distribution measured by the laser diffraction scattering method are D10, D50,
Tin oxide powder wherein D90 is (D90-D10) / D50 is 2 or less and D50 is 1 μm or less.
【請求項2】D50をBET比表面積より算出した粒径
で除した値が1〜10である請求項1記載の酸化錫粉
末。
2. The tin oxide powder according to claim 1, wherein a value obtained by dividing D50 by a particle diameter calculated from a BET specific surface area is 1 to 10.
【請求項3】錫塩水溶液とアルカリ溶液を反応させて錫
含有沈殿を生成させ、該錫塩水溶液と該アルカリ溶液の
反応液から該錫含有沈殿を分離し乾燥した後に、該錫含
有沈殿を焼成する酸化錫粉末の製造方法において、該錫
塩水溶液が4価の錫イオンを含む錫塩水溶液であり、該
錫塩水溶液と該アルカリ溶液の反応をpHが0.5以上
4以下の範囲で行い、該焼成を400℃以上1200℃
以下の温度範囲で行うことを特徴とする請求項1記載の
酸化錫粉末の製造方法。
3. An aqueous solution of a tin salt and an alkaline solution are reacted to form a tin-containing precipitate. The tin-containing precipitate is separated from a reaction solution of the aqueous solution of the tin salt and the alkali solution and dried. In the method for producing a tin oxide powder to be calcined, the tin salt aqueous solution is a tin salt aqueous solution containing tetravalent tin ions, and the reaction between the tin salt aqueous solution and the alkali solution is performed at a pH of 0.5 or more and 4 or less. And the firing is performed at 400 ° C. or more and 1200 ° C.
The method for producing tin oxide powder according to claim 1, wherein the method is performed in the following temperature range.
【請求項4】焼成をハロゲン化水素ガスまたはハロゲン
ガスを0.5体積%以上含有する雰囲気ガス中で行う請
求項3記載の酸化錫粉末の製造方法。
4. The method for producing tin oxide powder according to claim 3, wherein the firing is performed in an atmosphere gas containing 0.5% by volume or more of a hydrogen halide gas or a halogen gas.
【請求項5】4価の錫イオンを含む錫塩水溶液が、硝酸
1モルに対して塩酸を0.2〜5モルの範囲で混合して
得られる混酸と金属錫を反応させて得られる4価の錫イ
オンを含む錫塩水溶液である請求項3記載の酸化錫粉末
の製造方法。
5. A tin salt aqueous solution containing tetravalent tin ions, and a mixed acid obtained by mixing 0.2 mol to 5 mol of hydrochloric acid with respect to 1 mol of nitric acid to react with metal tin. 4. The method for producing tin oxide powder according to claim 3, which is an aqueous solution of a tin salt containing monovalent tin ions.
【請求項6】4価の錫イオンを含む錫塩水溶液が、2価
の錫イオンを含む錫塩水溶液と硝酸を反応させて得られ
る4価の錫イオンを含む錫塩水溶液である請求項3記載
の酸化錫粉末の製造方法。
6. A tin salt aqueous solution containing tetravalent tin ions obtained by reacting a tin salt aqueous solution containing divalent tin ions with nitric acid. A method for producing the tin oxide powder described above.
【請求項7】2価の錫イオンを含む錫塩水溶液が、金属
錫と塩酸を反応させて得られる2価の錫イオンを含む錫
塩水溶液である請求項6記載の酸化錫粉末の製造方法。
7. The method for producing tin oxide powder according to claim 6, wherein the tin salt aqueous solution containing divalent tin ions is a tin salt aqueous solution containing divalent tin ions obtained by reacting metal tin with hydrochloric acid. .
【請求項8】請求項1記載の酸化錫粉末を用いる酸化錫
焼結体。
8. A tin oxide sintered body using the tin oxide powder according to claim 1.
【請求項9】請求項8記載の酸化錫焼結体を用いるスパ
ッタターゲット。
9. A sputter target using the tin oxide sintered body according to claim 8.
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Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100474845B1 (en) * 2002-03-22 2005-03-09 삼성코닝 주식회사 Tin oxide powder, manufacturing method thereof, and manufacturing method of high density indium tin oxide target using the same
WO2005076291A1 (en) * 2004-02-06 2005-08-18 Mitsui Mining & Smelting Co., Ltd. Electroconductive tin oxide powder and method for production thereof
JP2006069882A (en) * 2004-08-05 2006-03-16 Mitsubishi Materials Corp Fine tin oxide powder, and its production method and application
JP2008056514A (en) * 2006-08-30 2008-03-13 Mitsubishi Materials Corp Tin oxide powder and method for manufacturing the same
JP2010030886A (en) * 2008-07-02 2010-02-12 Ishihara Sangyo Kaisha Ltd Tin oxide particle and its manufacture method
US7799312B2 (en) 2002-03-22 2010-09-21 Samsung Corning Precision Glass Co., Ltd. Method for manufacturing high-density indium tin oxide target, methods for preparing tin oxide powder and indium oxide powder used therefor
JP2013256425A (en) * 2012-06-14 2013-12-26 Sumitomo Metal Mining Co Ltd Tin oxide powder for ito sputtering target, method of manufacturing mixed powder of tin oxide and indium oxide for ito sputtering target, and sintered body for ito sputtering target
JP2017019668A (en) * 2015-07-07 2017-01-26 株式会社コベルコ科研 Oxide sintered body and sputtering target and manufacturing method therefor

Citations (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6046924A (en) * 1983-08-25 1985-03-14 Mitsubishi Metal Corp Production of fine powder of tin oxide having low electrical resistance
JPH03263705A (en) * 1990-03-13 1991-11-25 Ishihara Sangyo Kaisha Ltd Manufacture of conductive fine powder
JPH0557102A (en) * 1990-08-03 1993-03-09 Imperial Chem Ind Plc <Ici> Method for obtaining substantially dried solid from powdery state having narrow particle distribution
JPH0625349A (en) * 1992-03-27 1994-02-01 Elf Atochem Sa Catalyst for olefin polymerization and its preparation
JPH06191846A (en) * 1992-12-25 1994-07-12 Tosoh Corp Indium oxide powder, its production and production of ito sintered compact
JPH07187613A (en) * 1993-08-11 1995-07-25 Sumitomo Chem Co Ltd Metal oxide power and its production
JPH07330337A (en) * 1994-06-09 1995-12-19 Mitsubishi Materials Corp Dispersion of electro-conductive fine powder and its production
JPH07335031A (en) * 1994-06-14 1995-12-22 Mitsui Mining & Smelting Co Ltd Composite conductive powder and conductive film
JPH08246143A (en) * 1995-03-08 1996-09-24 Sumitomo Metal Mining Co Ltd Oxide sintered compact
JPH08277208A (en) * 1995-04-05 1996-10-22 Sumitomo Chem Co Ltd Make-up cosmetic
JPH1179745A (en) * 1997-09-04 1999-03-23 Mitsubishi Materials Corp Production of indium oxide powder for ito target
JPH11116325A (en) * 1997-10-16 1999-04-27 Mitsui Mining & Smelting Co Ltd Stannic oxide-based sintered compact containing iron, nickel, cobalt and indium
JPH11130432A (en) * 1997-10-24 1999-05-18 Mitsubishi Materials Corp Production of tin oxide powder
JPH11302289A (en) * 1998-04-27 1999-11-02 Mitsui Chem Inc Solid ionic boron compound, catalyst for polymerizing olefin, and polymerization of olefin
JPH11322336A (en) * 1998-05-15 1999-11-24 Mitsubishi Materials Corp Production of tin oxide powder
JP2002505993A (en) * 1998-03-13 2002-02-26 ナノグラム・コーポレーション Tin oxide particles

Patent Citations (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6046924A (en) * 1983-08-25 1985-03-14 Mitsubishi Metal Corp Production of fine powder of tin oxide having low electrical resistance
JPH03263705A (en) * 1990-03-13 1991-11-25 Ishihara Sangyo Kaisha Ltd Manufacture of conductive fine powder
JPH0557102A (en) * 1990-08-03 1993-03-09 Imperial Chem Ind Plc <Ici> Method for obtaining substantially dried solid from powdery state having narrow particle distribution
JPH0625349A (en) * 1992-03-27 1994-02-01 Elf Atochem Sa Catalyst for olefin polymerization and its preparation
JPH06191846A (en) * 1992-12-25 1994-07-12 Tosoh Corp Indium oxide powder, its production and production of ito sintered compact
JPH07187613A (en) * 1993-08-11 1995-07-25 Sumitomo Chem Co Ltd Metal oxide power and its production
JPH07330337A (en) * 1994-06-09 1995-12-19 Mitsubishi Materials Corp Dispersion of electro-conductive fine powder and its production
JPH07335031A (en) * 1994-06-14 1995-12-22 Mitsui Mining & Smelting Co Ltd Composite conductive powder and conductive film
JPH08246143A (en) * 1995-03-08 1996-09-24 Sumitomo Metal Mining Co Ltd Oxide sintered compact
JPH08277208A (en) * 1995-04-05 1996-10-22 Sumitomo Chem Co Ltd Make-up cosmetic
JPH1179745A (en) * 1997-09-04 1999-03-23 Mitsubishi Materials Corp Production of indium oxide powder for ito target
JPH11116325A (en) * 1997-10-16 1999-04-27 Mitsui Mining & Smelting Co Ltd Stannic oxide-based sintered compact containing iron, nickel, cobalt and indium
JPH11130432A (en) * 1997-10-24 1999-05-18 Mitsubishi Materials Corp Production of tin oxide powder
JP2002505993A (en) * 1998-03-13 2002-02-26 ナノグラム・コーポレーション Tin oxide particles
JPH11302289A (en) * 1998-04-27 1999-11-02 Mitsui Chem Inc Solid ionic boron compound, catalyst for polymerizing olefin, and polymerization of olefin
JPH11322336A (en) * 1998-05-15 1999-11-24 Mitsubishi Materials Corp Production of tin oxide powder

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100474845B1 (en) * 2002-03-22 2005-03-09 삼성코닝 주식회사 Tin oxide powder, manufacturing method thereof, and manufacturing method of high density indium tin oxide target using the same
US7799312B2 (en) 2002-03-22 2010-09-21 Samsung Corning Precision Glass Co., Ltd. Method for manufacturing high-density indium tin oxide target, methods for preparing tin oxide powder and indium oxide powder used therefor
WO2005076291A1 (en) * 2004-02-06 2005-08-18 Mitsui Mining & Smelting Co., Ltd. Electroconductive tin oxide powder and method for production thereof
JP2006069882A (en) * 2004-08-05 2006-03-16 Mitsubishi Materials Corp Fine tin oxide powder, and its production method and application
JP2008056514A (en) * 2006-08-30 2008-03-13 Mitsubishi Materials Corp Tin oxide powder and method for manufacturing the same
JP2010030886A (en) * 2008-07-02 2010-02-12 Ishihara Sangyo Kaisha Ltd Tin oxide particle and its manufacture method
JP2013189371A (en) * 2008-07-02 2013-09-26 Ishihara Sangyo Kaisha Ltd Tin oxide particle and method for producing the same
JP2013256425A (en) * 2012-06-14 2013-12-26 Sumitomo Metal Mining Co Ltd Tin oxide powder for ito sputtering target, method of manufacturing mixed powder of tin oxide and indium oxide for ito sputtering target, and sintered body for ito sputtering target
JP2017019668A (en) * 2015-07-07 2017-01-26 株式会社コベルコ科研 Oxide sintered body and sputtering target and manufacturing method therefor

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