JP2001292378A - Solid-state imaging apparatus - Google Patents
Solid-state imaging apparatusInfo
- Publication number
- JP2001292378A JP2001292378A JP2000107522A JP2000107522A JP2001292378A JP 2001292378 A JP2001292378 A JP 2001292378A JP 2000107522 A JP2000107522 A JP 2000107522A JP 2000107522 A JP2000107522 A JP 2000107522A JP 2001292378 A JP2001292378 A JP 2001292378A
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- solid
- state imaging
- flexible substrate
- imaging device
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000003384 imaging method Methods 0.000 title claims abstract description 62
- 239000000758 substrate Substances 0.000 claims abstract description 123
- 239000000853 adhesive Substances 0.000 claims abstract description 22
- 229920005989 resin Polymers 0.000 claims abstract description 13
- 239000011347 resin Substances 0.000 claims abstract description 13
- 238000007789 sealing Methods 0.000 claims abstract description 12
- 230000001070 adhesive effect Effects 0.000 claims description 20
- 230000002093 peripheral effect Effects 0.000 claims description 9
- 239000010931 gold Substances 0.000 description 7
- 238000007747 plating Methods 0.000 description 7
- PXHVJJICTQNCMI-UHFFFAOYSA-N nickel Substances [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 5
- 239000010949 copper Substances 0.000 description 3
- 230000007774 longterm Effects 0.000 description 3
- 229920001187 thermosetting polymer Polymers 0.000 description 3
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 2
- 229910052802 copper Inorganic materials 0.000 description 2
- 239000003822 epoxy resin Substances 0.000 description 2
- 229920000647 polyepoxide Polymers 0.000 description 2
- 239000012141 concentrate Substances 0.000 description 1
- 230000005494 condensation Effects 0.000 description 1
- 238000009833 condensation Methods 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 239000005304 optical glass Substances 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
Landscapes
- Solid State Image Pick-Up Elements (AREA)
- Transforming Light Signals Into Electric Signals (AREA)
- Light Receiving Elements (AREA)
Abstract
Description
【0001】[0001]
【発明の属する技術分野】本発明は、固体撮像装置に関
し、特には撮像領域上に中空部を設けた固体撮像装置に
関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a solid-state imaging device, and more particularly, to a solid-state imaging device having a hollow portion on an imaging area.
【0002】[0002]
【従来の技術】一般に固体撮像装置においては、その感
度向上のため、撮像領域の受光面の上にオンチップレン
ズを設け、入射した光を受光面に集中させて効率的な集
光をなすようにしている。このような固体撮像装置にお
いては、撮像時の感度を保つために撮像領域上部を中空
構造としている。2. Description of the Related Art Generally, in a solid-state image pickup device, an on-chip lens is provided on a light receiving surface of an image pickup area so as to concentrate incident light on the light receiving surface so as to collect light efficiently. I have to. In such a solid-state imaging device, the upper portion of the imaging region has a hollow structure in order to maintain sensitivity during imaging.
【0003】このような固体撮像装置としては、従来、
例えば図4(1)の平面図及び図4(2)の断面図に示
すものが知られている。これらの図に示す固体撮像装置
は、素子基板1、フレキシブルプリント基板(以下フレ
キシブル基板と記す)2及び透明基板3を備えている。[0003] As such a solid-state imaging device, conventionally,
For example, those shown in the plan view of FIG. 4A and the cross-sectional view of FIG. 4B are known. The solid-state imaging device shown in these figures includes an element substrate 1, a flexible printed substrate (hereinafter, referred to as a flexible substrate) 2, and a transparent substrate 3.
【0004】素子基板1は、その表面側に受光センサを
配列形成してなる撮像領域(例えばCCDエリアセン
サ)11を有すると共に、この撮像領域11の周囲に電
極パッド12を配列形成してなり、電極パッド12上に
はAu(金)ボールバンプのような突起電極13(断面
図のみに図示)が形成されている。The element substrate 1 has an imaging area (for example, a CCD area sensor) 11 in which light receiving sensors are arrayed on the surface side thereof, and electrode pads 12 are arrayed around the imaging area 11. On the electrode pad 12, a protruding electrode 13 (shown only in a sectional view) such as an Au (gold) ball bump is formed.
【0005】また、フレキシブル基板2は、柔軟性を有
する絶縁性フィルム上に配線21(断面図のみに図示)
を設けてなると共に、特に、素子基板1の撮像領域11
に対応する開口部22を有している。配線21は、例え
ばCu配線にNi(ニッケル)メッキやAuメッキを施
してなる。このフレキシブル基板2は、例えば熱硬化性
Agペーストのような導電性ペースト4(断面図のみに
図示)を介して配線21の一端を突起電極13に電気
的、機械的に接続させた状態で、撮像領域11に対して
開口部22が対向して配置される。また、フレキシブル
基板2の一端側は、素子基板1の外側に延設されてお
り、配線21の他端側が信号処理を行う外部回路基板と
の接続を図るための外部リードとして、素子基板1より
も外側に延設されている。[0005] The flexible substrate 2 is formed by wiring 21 (shown only in a sectional view) on a flexible insulating film.
And, in particular, the imaging region 11 of the element substrate 1.
Has an opening 22 corresponding to. The wiring 21 is formed, for example, by applying Ni (nickel) plating or Au plating to a Cu wiring. The flexible substrate 2 is electrically connected to one end of the wiring 21 via the conductive paste 4 such as a thermosetting Ag paste (shown only in a cross-sectional view). The opening 22 is arranged to face the imaging region 11. One end of the flexible substrate 2 extends outside the element substrate 1, and the other end of the wiring 21 serves as an external lead for connection with an external circuit substrate that performs signal processing. Also extend outward.
【0006】そして、透明基板3は、フレキシブル基板
2の開口部22を塞ぐように、素子基板1の撮像領域1
1に対向して配置され、これによって撮像領域11上を
中空部aとしている。この透明基板3は、例えば光学ガ
ラスからなり、接着剤(例えば熱硬化性エポキシ樹脂)
5を介して、フレキシブル基板2の開口部22を除く全
面に対して貼り付けられている。The transparent substrate 3 covers the imaging region 1 of the element substrate 1 so as to cover the opening 22 of the flexible substrate 2.
1 so that a hollow portion a is formed above the imaging area 11. The transparent substrate 3 is made of, for example, optical glass and has an adhesive (for example, a thermosetting epoxy resin).
5 is attached to the entire surface of the flexible substrate 2 except for the opening 22.
【0007】さらに、素子基板1と透明基板3との間に
形成された中空部aを封止するために、素子基板1とフ
レキシブル基板2との間には、開口部22の全周に亘っ
て封止樹脂(例えば熱硬化性エポキシ樹脂)6が充填さ
れ、さらにフレキシブル基板2の外周を覆う状態で透明
基板3上に封止樹脂6が充填されている。Further, in order to seal a hollow portion a formed between the element substrate 1 and the transparent substrate 3, the entire periphery of the opening 22 is provided between the element substrate 1 and the flexible substrate 2. The transparent resin 3 is filled with a sealing resin (for example, a thermosetting epoxy resin) 6 while covering the outer periphery of the flexible substrate 2.
【0008】このように構成された固体撮像装置では、
中空部a内が封止されているため、中空部a内への水分
の浸入による結露の発生を防止することができる。In the solid-state imaging device configured as described above,
Since the inside of the hollow portion a is sealed, it is possible to prevent the occurrence of dew condensation due to the intrusion of moisture into the hollow portion a.
【0009】[0009]
【発明が解決しようとする課題】しかしながら、図4を
用いて説明した構成の固体撮像装置では、外部環境の変
化(例えば温度,湿度の上昇)によって、密閉状態にあ
る中空部aの内部圧力が上昇すると共に封止樹脂6が熱
膨張する。これによって、断面図中に矢印で示すよう
に、素子基板1と透明基板3とには、これらを外側に押
し出す方向の応力が加わるため、各部材の接着部分にお
いてはこれらを剥離させるような応力(以下、剥離応力
と記す)が生じることになる。However, in the solid-state imaging device having the structure described with reference to FIG. 4, the internal pressure of the hollow portion a in the closed state is increased due to a change in the external environment (for example, an increase in temperature and humidity). As it rises, the sealing resin 6 thermally expands. As a result, as indicated by arrows in the cross-sectional view, stress is applied to the element substrate 1 and the transparent substrate 3 in a direction in which they are pushed outward. (Hereinafter, referred to as peeling stress).
【0010】特に、図5の要部拡大断面図に示すよう
に、通常直径60μm〜80μm程度に形成される突起
電極13と配線21との接続部分は、導電性ペースト4
との間の接着面積が小さく、上記剥離応力が繰り返し加
わることによって剥離が発生し易い。その中でも特に、
導電性ペースト4−配線21間においては、Auバンプ
のような突起電極13に対する導電性ペースト4の濡れ
性と比較して、銅配線の表面にNiメッキやAuメッキ
を施してなる配線21に対しての導電性ペースト4の濡
れ性が劣るといった理由から、上記剥離応力が加わるこ
とによって剥がれが生じやすかった。In particular, as shown in an enlarged cross-sectional view of a main part of FIG.
Is small, and peeling is likely to occur due to repeated application of the peeling stress. Among the,
Between the conductive paste 4 and the wiring 21, compared to the wettability of the conductive paste 4 to the bump electrode 13 such as an Au bump, the wiring 21 formed by applying Ni plating or Au plating to the surface of the copper wiring Since the wettability of all the conductive pastes 4 was poor, peeling was likely to occur when the above-mentioned peeling stress was applied.
【0011】このため、厳しい使用環境下においては、
素子基板1の電極パッド12とフレキシブル基板2の配
線21との接続状態が不安定になり、固体撮像装置の長
期信頼性を得ることができないといった問題がある。For this reason, in a severe use environment,
There is a problem that the connection state between the electrode pad 12 of the element substrate 1 and the wiring 21 of the flexible substrate 2 becomes unstable, so that long-term reliability of the solid-state imaging device cannot be obtained.
【0012】そこで本発明は、外部環境に依らず素子基
板の電極パッドとフレキシブル基板上の配線との安定し
た接続状態を長期間確保できる固体撮像装置を提供する
ことを目的とする。SUMMARY OF THE INVENTION It is an object of the present invention to provide a solid-state imaging device capable of securing a stable connection state between an electrode pad of an element substrate and a wiring on a flexible substrate for a long time regardless of an external environment.
【0013】[0013]
【課題を解決するための手段】このような目的を達成す
るための本発明の固体撮像装置は、撮像領域の周囲に電
極パッドを設けてなる素子基板と、撮像領域側に対向し
て配置された透明基板との間に、配線が形成されたフレ
キシブル基板を挟んでなるものである。素子基板の電極
パッドに対して配線を接続させる状態で配置されたフレ
キシブル基板には、撮像領域に対向する開口部が設けら
れており、これによって開口部内に中空部を形成してい
る。さらに、フレキシブル基板と透明基板とは接着剤に
よって接着されており、開口部の周囲における素子基板
と透明基板との間には封止樹脂が充填されている。そし
て特に、フレキシブル基板と透明基板との間の接着剤
は、電極パッドが配置されたパッド領域よりも外周側に
設けられていることを特徴としている。According to the present invention, there is provided a solid-state image pickup device comprising: an element substrate having an electrode pad provided around an image pickup area; And a transparent substrate on which a wiring is formed. An opening facing the imaging region is provided on the flexible substrate arranged so that wiring is connected to the electrode pads of the element substrate, thereby forming a hollow portion in the opening. Further, the flexible substrate and the transparent substrate are adhered by an adhesive, and a space between the element substrate and the transparent substrate around the opening is filled with a sealing resin. In particular, the adhesive between the flexible substrate and the transparent substrate is provided on the outer peripheral side of the pad area where the electrode pads are arranged.
【0014】このような構成の固体撮像装置では、素子
基板におけるパッド領域の外周側に対応するフレキシブ
ル基板部分のみが接着剤によって透明基板に接着され、
パッド領域から開口部側に対応するフレキシブル基板部
分は透明基板に接着されずに素子基板側にのみ接着され
た状態になっている。このため、外部環境の変化によっ
て、素子基板と透明基板との間に形成される中空部の内
圧が上昇したり封止樹脂が膨張して素子基板と透明基板
とを外側に押し出す応力が生じた場合、パッド領域に対
応するフレキシブル基板部分が素子基板側に追従するよ
うに、当該フレキシブル基板が湾曲する。そして、この
湾曲によって、パッド領域に対応する部分に加わる剥離
応力が逃がされることになる。したがって、フレキシブ
ル基板上の配線と素子基板表面の電極パッドとの接続部
分に剥離応力が加わることはなく、配線と電極パッドと
の接続状態が確保される。In the solid-state imaging device having such a configuration, only the flexible substrate portion corresponding to the outer peripheral side of the pad region on the element substrate is bonded to the transparent substrate with an adhesive,
The portion of the flexible substrate corresponding to the opening side from the pad region is not bonded to the transparent substrate but is bonded only to the element substrate side. For this reason, due to a change in the external environment, the internal pressure of the hollow portion formed between the element substrate and the transparent substrate was increased, or the sealing resin was expanded and a stress was generated to push the element substrate and the transparent substrate outward. In this case, the flexible substrate is curved such that the portion of the flexible substrate corresponding to the pad region follows the element substrate. Then, due to this curvature, the peeling stress applied to the portion corresponding to the pad region is released. Therefore, no peeling stress is applied to the connection portion between the wiring on the flexible substrate and the electrode pad on the surface of the element substrate, and the connection state between the wiring and the electrode pad is ensured.
【0015】また、上記構成の固体撮像装置において、
フレキシブル基板に、開口部の内周側からパッド領域に
沿った切り込み部を設けても良い。Further, in the solid-state imaging device having the above configuration,
The flexible substrate may be provided with a cut portion along the pad region from the inner peripheral side of the opening.
【0016】このような切り込み部を設けることによっ
て、パッド領域に対応するフレキシブル基板部分の湾曲
性が向上する。By providing such notches, the bendability of the flexible substrate corresponding to the pad area is improved.
【0017】[0017]
【発明の実施の形態】以下、本発明の固体撮像装置を、
図面に基づいて詳細に説明する。尚、従来の技術におい
て図4及び図5を用いて説明したと同様の構成部材には
同一の符号を付し、重複する説明は省略する。DESCRIPTION OF THE PREFERRED EMBODIMENTS Hereinafter, a solid-state imaging device according to the present invention will be described.
This will be described in detail with reference to the drawings. The same components as those described with reference to FIGS. 4 and 5 in the related art are denoted by the same reference numerals, and redundant description will be omitted.
【0018】(第1実施形態)図1(1)は第1実施形
態の固体撮像装置の一部を切り欠いた平面図であり、図
1(2)はそのA−A’部分に対応する断面図である。
また、図2は図1(2)の断面図における要部拡大断面
図である。(First Embodiment) FIG. 1A is a plan view of the solid-state imaging device according to the first embodiment with a part cut away, and FIG. 1B corresponds to an AA 'portion thereof. It is sectional drawing.
FIG. 2 is an enlarged sectional view of a main part in the sectional view of FIG.
【0019】図1及び図2に示す固体撮像装置は、従来
の固体撮像装置と同様に、撮像領域11の周囲に電極パ
ッド12及び突起電極13を設けてなる素子基板1、配
線21と開口部22とを設けてなるフレキシブル基板
2、及び透明基板3が備えられ、撮像領域11上には中
空部aが設けられている。また、突起電極13と配線2
1とが導電性ペースト4によって電気的,機械的に接続
され、フレキシブル基板2と透明基板3との間は接着剤
5’によって接着されている。さらに、開口部22の周
囲における素子基板1と透明基板3との間、すなわち、
素子基板1とフレキシブル基板2との間、及びフレキシ
ブル基板2の外周を覆う状態で透明基板3上には、封止
樹脂6が充填されている。The solid-state imaging device shown in FIGS. 1 and 2 has an element substrate 1 having an electrode pad 12 and a protruding electrode 13 provided around an imaging region 11, a wiring 21 and an opening, similarly to the conventional solid-state imaging device. 22 and a transparent substrate 3 provided with the transparent substrate 3, and a hollow portion a is provided on the imaging region 11. Further, the protruding electrode 13 and the wiring 2
1 are electrically and mechanically connected by a conductive paste 4, and the flexible substrate 2 and the transparent substrate 3 are bonded by an adhesive 5 '. Further, between the element substrate 1 and the transparent substrate 3 around the opening 22, that is,
A sealing resin 6 is filled on the transparent substrate 3 so as to cover the space between the element substrate 1 and the flexible substrate 2 and the outer periphery of the flexible substrate 2.
【0020】そして、これらの図に示す固体撮像装置
が、図4や図5に示した固体撮像装置と異なるところ
は、接着剤5’の配置状態にある。すなわち、フレキシ
ブル基板2と透明基板3とを接着するための接着剤5’
は、素子基板1の電極パッド12が設けられたパッド領
域14よりも外周側に設けられていることとする。この
パッド領域14は、複数の電極パッドが配列された領域
を一まとめにした領域であることとする。The solid-state image pickup device shown in these figures differs from the solid-state image pickup devices shown in FIGS. 4 and 5 in the arrangement of the adhesive 5 '. That is, an adhesive 5 ′ for bonding the flexible substrate 2 and the transparent substrate 3
Is provided on the outer peripheral side of the pad region 14 of the element substrate 1 where the electrode pads 12 are provided. The pad region 14 is a region in which regions in which a plurality of electrode pads are arranged are put together.
【0021】例えば、図1(1)の平面図に示したよう
に、撮像領域11の両側に複数の電極パッド12が1列
づつ配列されている場合、撮像領域11の両側をそれぞ
れパッド領域14とする。そして、接着剤5’は、この
パッド領域14よりも外周側において、開口部aの全周
に亘って透明基板3とフレキシブル基板2との間に連続
して設けられていることとする。つまり、開口部aの内
周からパッド領域14に亘ってのフレキシブル基板2部
分は、透明基板3に対して接着させずに封止樹脂6と導
電ペースト4とによって素子基板1側にのみ接着される
ことになる。ただし、接着剤5’は、透明基板3とフレ
キシブル基板2との間の接着力が確保される程度に、各
部の幅が保たれていることとする。For example, as shown in the plan view of FIG. 1A, when a plurality of electrode pads 12 are arranged in a row on both sides of the image pickup area 11, both sides of the image pickup area 11 are provided in the pad areas 14 respectively. And The adhesive 5 ′ is provided continuously between the transparent substrate 3 and the flexible substrate 2 over the entire periphery of the opening a on the outer peripheral side of the pad region 14. That is, the portion of the flexible substrate 2 extending from the inner periphery of the opening a to the pad region 14 is adhered only to the element substrate 1 by the sealing resin 6 and the conductive paste 4 without being adhered to the transparent substrate 3. Will be. However, the width of each part of the adhesive 5 ′ is maintained to such an extent that the adhesive force between the transparent substrate 3 and the flexible substrate 2 is secured.
【0022】さらにこの固体撮像装置は、電極パッド1
2と接着剤5’との平面視的な間隔Wが、100μm程
度に保たれるように設計されていることとし、これによ
って、電極パッド12に対して接着剤5’が重なること
のないようにする。Further, the solid-state imaging device has an electrode pad 1
The space W between the adhesive 2 and the adhesive 5 ′ in plan view is designed to be maintained at about 100 μm, so that the adhesive 5 ′ does not overlap the electrode pad 12. To
【0023】このような構成の固体撮像装置によれば、
電極パッド12が配置されたパッド領域14よりも外周
側に対応するフレキシブル基板2部分のみが接着剤5’
によって透明基板3に接着され、パッド領域14及びそ
の開口部22側に対応するフレキシブル基板2部分は素
子基板1側にのみ接着されることになる。このため、外
部環境の変化によって中空部aの内部圧力が上昇したり
封止樹脂6が熱膨張することで、断面図中矢印に示すよ
うに素子基板1と透明基板3とを外側に押し出すような
応力が生じた場合、図2に示したようにパッド領域14
に対応するフレキシブル基板2部分が素子基板1側に追
従するように、当該フレキシブル基板2が湾曲する。According to the solid-state imaging device having such a configuration,
Only the portion of the flexible substrate 2 corresponding to the outer peripheral side of the pad area 14 where the electrode pads 12 are disposed is the adhesive 5 ′.
Thus, the pad region 14 and the portion of the flexible substrate 2 corresponding to the opening 22 side are bonded only to the element substrate 1 side. Therefore, the element substrate 1 and the transparent substrate 3 are pushed outward as indicated by arrows in the cross-sectional view due to an increase in the internal pressure of the hollow portion a and a thermal expansion of the sealing resin 6 due to a change in the external environment. When a large stress is generated, as shown in FIG.
The flexible substrate 2 is curved such that the portion of the flexible substrate 2 corresponding to the element follows the element substrate 1 side.
【0024】したがって、パッド領域14に対応する部
分においては、フレキシブル基板2の湾曲によって、上
記の応力の発生によって各部材に加わる剥離応力が逃が
されることになり、接着面積が小さく接着力の弱い導電
性ペースト4に剥離応力が加わることを防止できる。こ
の結果、導電性ペースト4を介して接続された配線21
と突起電極13との接続状態が安定化し、フレキシブル
基板2と素子基板1との接続状態を確保することが可能
になる。Therefore, in the portion corresponding to the pad region 14, the peeling stress applied to each member due to the generation of the above-mentioned stress is released by the curvature of the flexible substrate 2, so that the conductive area having a small bonding area and a weak bonding force is reduced. The peel stress can be prevented from being applied to the conductive paste 4. As a result, the wiring 21 connected via the conductive paste 4
The connection state between the flexible substrate 2 and the protruding electrode 13 is stabilized, and the connection state between the flexible substrate 2 and the element substrate 1 can be secured.
【0025】特に、銅配線の表面にNiメッキやAuメ
ッキを施してなる配線21に対しては、Auバンプのよ
うな突起電極13に対するよりも、導電性ペースト4の
濡れ性が劣るため、導電性ペースト4−配線21間では
上記剥離応力が加わることによって剥がれが生じやすか
った。しかし、導電性ペースト4に剥離応力が加わるこ
とが防止されるため、導電性ペースト4−配線21間の
接続状態が確保でき、この結果として配線21−電極パ
ッド12間の接続状態を安定化させることが可能になる
のである。以上の結果、使用環境によらず固体撮像装置
の長期信頼性の向上を図ることが可能になる。In particular, the wiring 21 formed by plating the surface of the copper wiring with Ni plating or Au plating has a lower wettability of the conductive paste 4 than the protrusion electrode 13 such as an Au bump. Peeling was likely to occur between the conductive paste 4 and the wiring 21 due to the above-mentioned peeling stress. However, since a peeling stress is prevented from being applied to the conductive paste 4, a connection state between the conductive paste 4 and the wiring 21 can be secured, and as a result, a connection state between the wiring 21 and the electrode pad 12 is stabilized. It becomes possible. As a result, it is possible to improve the long-term reliability of the solid-state imaging device regardless of the use environment.
【0026】(第2実施形態)図3は、第2実施形態の
固体撮像装置の構成を示す一部切り欠き平面図である。
この図に示す固体撮像装置と第1実施形態の固体撮像装
置との異なることころは、フレキシブル基板2’の構成
にあり、その他の構成は同様であることとする。(Second Embodiment) FIG. 3 is a partially cutaway plan view showing the configuration of a solid-state imaging device according to a second embodiment.
The difference between the solid-state imaging device shown in this figure and the solid-state imaging device of the first embodiment lies in the configuration of the flexible substrate 2 ', and the other configurations are the same.
【0027】すなわち、この図に示す固体撮像装置のフ
レキシブル基板2’は、第1実施形態のフレキシブル基
板(2)に切り込み部23を設けた構成になっている。
この切り込み部23は、開口部22の内周側からパッド
領域14に沿って、接着剤5’が設けられている部分に
達する長さで設けられている。このため、このフレキシ
ブル基板2’には、2列のパッド領域14の各両端側に
それぞれ、合計4箇所の切り込み部23が設けられるこ
とになる。That is, the flexible substrate 2 'of the solid-state imaging device shown in this figure has a configuration in which the flexible substrate (2) of the first embodiment is provided with the cutout portion 23.
The cutout portion 23 is provided to have a length extending from the inner peripheral side of the opening 22 to the portion where the adhesive 5 ′ is provided along the pad region 14. For this reason, the flexible substrate 2 'is provided with a total of four cut portions 23 at both ends of the two rows of pad regions 14, respectively.
【0028】この切り込み部23は、幅を有していても
良く、また幅を有していなくても良い。The cut portion 23 may have a width or may not have a width.
【0029】このような構成の固体撮像装置では、パッ
ド領域14に沿った切り込み部23を設けたことによっ
て、パッド領域14に対応するフレキシブル基板2’部
分の湾曲性が向上する。このため、第1実施形態の固体
撮像装置と比較して、外部環境の変化によって中空部a
や封止樹脂6が膨張し、素子基板1と透明基板3とを外
側に押し出す応力が生じた場合、パッド領域14に対応
する部分に加わる剥離応力をさらに逃がし易くなる。し
たがって、第1実施形態よりもさらに確実に、素子基板
1とフレキシブル基板2との接続状態を安定化させるこ
とが可能になる。In the solid-state imaging device having such a configuration, the curving property of the portion of the flexible substrate 2 'corresponding to the pad region 14 is improved by providing the cut portion 23 along the pad region 14. For this reason, compared with the solid-state imaging device of the first embodiment, the hollow part a
When the sealing resin 6 expands and a stress is generated that pushes the element substrate 1 and the transparent substrate 3 outward, the peeling stress applied to the portion corresponding to the pad region 14 is further easily released. Therefore, the connection state between the element substrate 1 and the flexible substrate 2 can be stabilized more reliably than in the first embodiment.
【0030】以上説明した第1実施形態及び第2実施形
態では、撮像領域11の両側にパッド領域14が設けら
れている場合を説明した。しかし、本発明の固体撮像装
置はこれに限定されることはなく、例えば撮像領域11
の全周に亘ってパッド領域14が配置された固体撮像装
置や、撮像領域11の一辺側にパッド領域14が配置さ
れた固体撮像装置にも広く適用可能である。この場合、
接着剤5’は、これらのパッド領域14よりも外側に設
けることとし、切り込み部23を設ける場合には、各パ
ッド領域14に沿った各部に切り込み部23を設けるこ
ととする。In the first and second embodiments described above, the case where the pad regions 14 are provided on both sides of the imaging region 11 has been described. However, the solid-state imaging device of the present invention is not limited to this.
The solid-state imaging device in which the pad region 14 is arranged over the entire circumference of the solid-state imaging device and the solid-state imaging device in which the pad region 14 is arranged on one side of the imaging region 11 are widely applicable. in this case,
The adhesive 5 ′ is provided outside these pad regions 14, and when the cut portions 23 are provided, the cut portions 23 are provided at respective portions along the respective pad regions 14.
【0031】[0031]
【発明の効果】以上説明したように本発明の固体撮像装
置によれば、撮像領域上に中空部を備えた固体撮像装置
において、中空部の内圧が上昇したりその周囲の封止樹
脂が膨張することによって素子基板と透明基板とを外側
に押し出す応力が生じた場合、素子基板のパッド領域に
対応するフレキシブル基板部分を素子基板側に追従させ
るように当該フレキシブル基板を湾曲させることができ
るため、フレキシブル基板上の配線と素子基板表面の電
極パッドとの間に剥離応力が加わることを防止でき、配
線と電極パッドとの接続状態を確保することが可能にな
る。この結果、外部環境に依らず素子基板の電極パッド
とフレキシブル基板の配線との安定した接続状態を確保
でき、厳しい使用環境下においても長期信頼性の高い固
体撮像装置を提供することが可能になる。As described above, according to the solid-state imaging device of the present invention, in a solid-state imaging device having a hollow portion on the imaging area, the internal pressure of the hollow portion increases or the sealing resin around the hollow portion expands. When a stress is generated that pushes the element substrate and the transparent substrate outward by doing so, the flexible substrate can be curved so that the flexible substrate portion corresponding to the pad region of the element substrate follows the element substrate side. It is possible to prevent separation stress from being applied between the wiring on the flexible substrate and the electrode pad on the surface of the element substrate, and it is possible to secure a connection state between the wiring and the electrode pad. As a result, a stable connection state between the electrode pads of the element substrate and the wiring of the flexible substrate can be ensured regardless of the external environment, and it is possible to provide a solid-state imaging device with high long-term reliability even in a severe use environment. .
【図1】第1実施形態の固体撮像装置の構成を示す平面
図及び断面図である。FIG. 1 is a plan view and a cross-sectional view illustrating a configuration of a solid-state imaging device according to a first embodiment.
【図2】実施形態の固体撮像装置の構成を説明するため
の要部拡大断面図である。FIG. 2 is an enlarged sectional view of a main part for describing a configuration of the solid-state imaging device according to the embodiment;
【図3】第2実施形態の固体撮像装置の構成を説明する
ための平面図である。FIG. 3 is a plan view illustrating a configuration of a solid-state imaging device according to a second embodiment.
【図4】従来の固体撮像装置の構成を説明するための平
面図及び断面図である。FIG. 4 is a plan view and a cross-sectional view for explaining a configuration of a conventional solid-state imaging device.
【図5】従来の課題を説明するための要部拡大断面図で
ある。FIG. 5 is an enlarged sectional view of a main part for describing a conventional problem.
1…素子基板、2,2’…フレキシブル基板、3…支持
基板、5…接着剤、6…封止樹脂、11…撮像領域、1
2…電極パッド、14…パッド領域、21…配線、22
…開口部、23…切り込み部、a…中空部DESCRIPTION OF SYMBOLS 1 ... Element board, 2 and 2 '... Flexible board, 3 ... Support board, 5 ... Adhesive, 6 ... Sealing resin, 11 ... Imaging area, 1
2 ... electrode pad, 14 ... pad area, 21 ... wiring, 22
... opening, 23 ... cut, a ... hollow
Claims (2)
る素子基板と、表面側の配線を前記電極パッドに接続さ
せて配置した状態で前記撮像領域に対向する開口部を備
えたフレキシブルプリント配線基板と、前記開口部内を
中空にする状態で前記素子基板の撮像領域側に対向させ
て配置され接着剤を介して前記フレキシブルプリント配
線基板の裏面側に貼り付けられた透明基板と、前記開口
部の周囲における前記素子基板と前記透明基板との間に
充填された封止樹脂とを備えてなる固体撮像装置におい
て、 前記フレキシブルプリント配線基板と前記透明基板との
間の接着剤は、前記電極パッドが配置されたパッド領域
よりも外周側に設けられたことを特徴とする固体撮像装
置。1. A flexible printed wiring comprising: an element substrate having an electrode pad provided around an imaging region; and an opening opposed to the imaging region in a state where a wiring on a front surface side is connected to the electrode pad. A substrate, a transparent substrate that is disposed to face the imaging area side of the element substrate in a state where the inside of the opening is hollow, and is attached to the back side of the flexible printed wiring board via an adhesive; A solid-state imaging device comprising a sealing resin filled between the element substrate and the transparent substrate around the adhesive substrate, wherein an adhesive between the flexible printed wiring board and the transparent substrate is provided on the electrode pad. A solid-state imaging device, which is provided on an outer peripheral side of a pad region in which is disposed.
内周側から前記パッド領域に沿って切り込み部が設けら
れたことを特徴とする固体撮像装置。2. The solid-state imaging device according to claim 1, wherein a cutout portion is provided in the flexible printed circuit board from the inner peripheral side of the opening along the pad region. apparatus.
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JP2000107522A JP4362931B2 (en) | 2000-04-10 | 2000-04-10 | Solid-state imaging device |
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JP2000107522A JP4362931B2 (en) | 2000-04-10 | 2000-04-10 | Solid-state imaging device |
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JP4362931B2 JP4362931B2 (en) | 2009-11-11 |
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Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2004095832A1 (en) * | 2003-04-22 | 2004-11-04 | Konica Minolta Opto, Inc. | Imaging device and mobile terminal using this imaging device |
KR100769729B1 (en) | 2006-06-26 | 2007-10-23 | 삼성전기주식회사 | Camera module package |
KR20220054078A (en) * | 2020-10-23 | 2022-05-02 | 삼성전기주식회사 | Electronic device module and manufacturing method thereof |
-
2000
- 2000-04-10 JP JP2000107522A patent/JP4362931B2/en not_active Expired - Fee Related
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2004095832A1 (en) * | 2003-04-22 | 2004-11-04 | Konica Minolta Opto, Inc. | Imaging device and mobile terminal using this imaging device |
KR100769729B1 (en) | 2006-06-26 | 2007-10-23 | 삼성전기주식회사 | Camera module package |
KR20220054078A (en) * | 2020-10-23 | 2022-05-02 | 삼성전기주식회사 | Electronic device module and manufacturing method thereof |
KR102444299B1 (en) | 2020-10-23 | 2022-09-15 | 삼성전기주식회사 | Electronic device module and manufacturing method thereof |
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JP4362931B2 (en) | 2009-11-11 |
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