JP2000158268A - Wafer attaching plate for universal chuck and its manufacture - Google Patents
Wafer attaching plate for universal chuck and its manufactureInfo
- Publication number
- JP2000158268A JP2000158268A JP10352189A JP35218998A JP2000158268A JP 2000158268 A JP2000158268 A JP 2000158268A JP 10352189 A JP10352189 A JP 10352189A JP 35218998 A JP35218998 A JP 35218998A JP 2000158268 A JP2000158268 A JP 2000158268A
- Authority
- JP
- Japan
- Prior art keywords
- annular
- porous ceramic
- permeable
- air
- outer periphery
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Mechanical Treatment Of Semiconductor (AREA)
- Jigs For Machine Tools (AREA)
Abstract
Description
【0001】[0001]
【発明の属する技術分野】本発明は、径が異なった半導
体ウエハであっても1台のチャックテ−ブルでウエハを
吸着し、研削あるいは研磨できるユニバ−サルチャック
に用いるウエハの取付板およびその製造方法に関する。
この取付板を備えたユニバ−サルチャックを用いて研
削、研磨されたウエハは取付板の仕切壁の環状マ−クが
ウエハに転写されることはない。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a mounting plate for a universal chuck which can be used for a universal chuck which can chuck and grind or polish a single semiconductor wafer even if the semiconductor wafers have different diameters. About the method.
When the wafer is ground and polished using the universal chuck provided with the mounting plate, the annular mark on the partition wall of the mounting plate is not transferred to the wafer.
【0002】[0002]
【従来の技術】半導体ウエハの研削、研磨に用いるバキ
ュ−ムチャックとしては、従来はウエハ径に応じてその
都度、径の異なるウエハ吸着取付板を用いていた(特許
第2711424号、特開平6−5569号、同6−3
9709号)。従って、径の異なるウエハを研削すると
きはチャックのウエハ吸着板を取り替える必要があり、
研削あるいは研磨作業が中断される。かかる欠点をなく
すチャックとして、径の異なるウエハでも1台のチャッ
クでウエハを吸着し、研削または研磨を行えるユニバ−
サルチャックが提案され、実用化されている(特開平3
−32537号、同8−1464号、同8−14854
8号、同9−174364号)。2. Description of the Related Art Conventionally, as a vacuum chuck used for grinding and polishing of a semiconductor wafer, a wafer suction mounting plate having a different diameter has been used each time according to the wafer diameter (Japanese Patent No. 2711424, Japanese Patent Laid-Open No. 6-1994). No. 5569, 6-3
No. 9709). Therefore, when grinding wafers with different diameters, it is necessary to replace the wafer suction plate of the chuck,
The grinding or polishing operation is interrupted. As a chuck that eliminates such defects, a single chuck that can chuck and grind or polish wafers of different diameters using a single chuck.
Sulchuk has been proposed and put into practical use (Japanese Unexamined Patent Publication No.
-32537, 8-1464, 8-14854
No. 8, No. 9-174364).
【0003】ユニバ−サルチャック1は、例えば図1お
よび図2に示されるように、(A)通気性ポ−ラスセラ
ミック製円板2を中心とし、この円板の外周に軸心を同
一、かつ、高さを同一にした複数の通気性ポ−ラスセラ
ミック製環状体3a,3b,3c,3d…が配列され、
前記通気性ポ−ラスセラミック製円板2と通気性ポ−ラ
スセラミック製環状体3a,3b,3c,3d…の間お
よびこれら通気性ポ−ラスセラミック製環状体同士の間
に、幅が数ミリメ−トル、高さが前記円板と同一の非通
気性環状仕切壁4a,4b,4c,4d…が配列されて
全体として1枚の円盤を構成するウエハ取付板5、およ
び(B)上面にこの取付板を収納する凹状環状縁部6を
有し、取付板5の下側に位置する上面部分の中心部に凹
陥部7を設けると共に、該凹陥部7を中心にして複数の
流体通路用の環状溝8a,8b,8c…が同心円状に設
けられ、該環状溝には複数の吸気孔9,9,9,9,9
…が各々垂直方向に設けられたウエハ取付板収納フラン
ジ10、および(C)取付板の非通気性環状仕切壁と前
記フランジの環状溝に設けられた吸気孔により構成され
た吸気領域における通気性ポ−ラスセラミック製円板、
通気性ポ−ラスセラミック製環状体の各底面を吸気する
吸気手段11a,11b,11c,11d…、この吸気
手段を減圧、または加圧する、あるいは水等の液体を供
給するパイプ12a,12b,12c,12d…、これ
らパイプに取り付けられた切替バルブ13a,13b,
13c,13d…を有している。As shown in FIGS. 1 and 2, for example, a universal chuck 1 has, as shown in FIG. 1 and FIG. 2, a (A) air-permeable porous ceramic disk 2 having the same axis as the outer periphery of the disk. And a plurality of permeable porous ceramic annular bodies 3a, 3b, 3c, 3d...
The width between the air-permeable porous ceramic disk 2 and the air-permeable porous ceramic annular bodies 3a, 3b, 3c, 3d... A wafer mounting plate 5 in which a non-breathable annular partition wall 4a, 4b, 4c, 4d,... Having the same millimeter and height as the disk are arranged to form a single disk as a whole; A concave annular edge 6 for accommodating the mounting plate, a concave portion 7 is provided at the center of an upper surface portion located below the mounting plate 5, and a plurality of fluid passages are formed around the concave portion 7. Are provided concentrically, and a plurality of intake holes 9, 9, 9, 9, 9, 9 are provided in the annular groove.
.. Are provided in the vertical direction, respectively, in the wafer mounting plate housing flange 10, and (C) the air permeability in the air suction area formed by the non-air permeable annular partition wall of the mounting plate and the air inlet provided in the annular groove of the flange. Porous ceramic disc,
.. Intake means 11a, 11b, 11c, 11d... For inhaling each bottom face of the permeable porous ceramic annular body, and pipes 12a, 12b, 12c for reducing or increasing the pressure of the intake means or for supplying a liquid such as water. , 12d,..., Switching valves 13a, 13b,
13c, 13d...
【0004】前記パイプは、図示されていないが、コン
プレッサ−、吸水ポンプ、真空ポンプ等に接続されてい
る。このユニバ−サルチャックは、通常中空軸に軸承さ
れたヘッド、または中空軸に軸承された回転テ−ブルに
備え付けられ、ウエハをチャックの取付板に置き、ウエ
ハの径によりユニバ−サルチャックの取付板5の円板2
とどの位置の環状体3a,3b,3c…を吸気させるか
決め、吸気手段11の切替バルブ12aおよび他の切替
バルブ12b,12c…を開き、減圧してウエハを吸着
した後、砥石または研磨パッドをウエハ面に押圧し、ウ
エハおよび砥石または研磨パッドの両方を回転させてウ
エハを研削または研磨する。研削または研磨中、研削剤
または研磨剤スラリ−がウエハ面または研磨パッド面に
供給されることもある。Although not shown, the pipe is connected to a compressor, a water suction pump, a vacuum pump, and the like. This universal chuck is usually mounted on a head supported on a hollow shaft or on a rotating table supported on a hollow shaft. The wafer is placed on a mounting plate of the chuck, and the universal chuck is mounted according to the diameter of the wafer. Disk 2 of plate 5
Is determined, and the switching valve 12a and the other switching valves 12b, 12c... Of the suction means 11 are opened, and the wafer is sucked under reduced pressure. Is pressed against the wafer surface, and both the wafer and the grindstone or polishing pad are rotated to grind or polish the wafer. During grinding or polishing, abrasive or abrasive slurry may be supplied to the wafer surface or polishing pad surface.
【0005】また、ユニバ−サルチャックは、ウエハを
バキュ−ムチャックに吸着させる前にウエハ裏面を洗浄
する乗載台のウエハチャックとして利用されることもあ
る(特開平4−267541号)。研磨パッドの研磨布
素材としては、ポリウレタン、ポリエステル、ポリビニ
ルアルコ−ル、ポリアミド、セルロ−ス系繊維等の不織
布、フェルト、発泡シ−ト状物が用いられる。砥石とし
ては、カップホイ−ル型ダイヤモンド砥石やCBN砥石
が用いられる。Further, the universal chuck is sometimes used as a wafer chuck of a mounting table for cleaning the back surface of the wafer before the wafer is attracted to the vacuum chuck (Japanese Patent Laid-Open No. Hei 4-267541). As a polishing cloth material for the polishing pad, a nonwoven fabric such as polyurethane, polyester, polyvinyl alcohol, polyamide, cellulose fiber, felt, or foam sheet is used. As a grindstone, a cup wheel type diamond grindstone or a CBN grindstone is used.
【0006】[0006]
【発明が解決しようとする課題】近時、LSI、デバイ
スウエハの量産化を図るため、ウエハの径は300m
m、450mmと拡径しており、かつウエハの表面平坦
度(TTV)は0.5μm以下であることが要求されて
いる。。およびLSI配線の微細化、256MB以上の
高集積化のため多層配線は必須となり、光リソグラフィ
の焦点深度0.25μm以下を満足する、層間絶縁膜の
平坦化を有するウエハが要求されている。Recently, in order to mass-produce LSIs and device wafers, the diameter of the wafer is 300 m.
m and 450 mm, and the surface flatness (TTV) of the wafer is required to be 0.5 μm or less. . In addition, multilayer wiring is indispensable for miniaturization of LSI wiring and high integration of 256 MB or more, and a wafer having a flat interlayer insulating film that satisfies the depth of focus of optical lithography of 0.25 μm or less is required.
【0007】従来のユニバ−サルチャックのウエハ取付
板の非通気性仕切壁の幅は2〜6mmと幅が広いので、
これら大径のウエハの研削・研磨には非通気性仕切壁の
環状模様が転写され、かつ上記平坦性を満たすことがで
きない。また、従来のユニバ−サルチャックのウエハ取
付板の非通気性仕切壁は、通気性ポ−ラスセラミック製
円板の外周と通気性ポ−ラスセラミック製環状体との隙
間および通気性ポ−ラスセラミック製環状体同士の隙間
にガラス繊維補強液状エポキシ樹脂やフェノ−ル樹脂を
充填し、硬化させて得た円盤状取付板の表面を平坦に研
削もしくは研磨して面一としたものであるので、液状樹
脂がポ−ラスセラミックに浸透、硬化して通気性孔を減
じ、研削または研磨時のウエハ吸着のため減圧度(真空
度)を高くする必要があり、かかることが大口径で、よ
り平坦な表面を有するウエハの研削・研磨時に環状仕切
壁の模様がウエハに転写される原因となるものと推測さ
れる。本発明は、かかる仕切壁の模様がウエハに転写さ
れず、かつ、平坦性の優れるウエハを与えるに適したユ
ニバ−サルチャックのウエハ取付板の提供を目的とす
る。Since the width of the non-permeable partition wall of the wafer mounting plate of the conventional universal chuck is as wide as 2 to 6 mm,
In the grinding and polishing of these large-diameter wafers, the annular pattern of the impermeable partition wall is transferred, and the flatness cannot be satisfied. Further, the non-permeable partition wall of the wafer mounting plate of the conventional universal chuck has a gap between the outer periphery of the permeable porous ceramic disk and the permeable porous ceramic annular body and the permeable porous member. The space between the ceramic annular bodies is filled with glass fiber reinforced liquid epoxy resin or phenolic resin, and the surface of the disk-shaped mounting plate obtained by curing is flattened or polished to be flush. The liquid resin penetrates and hardens the porous ceramic to reduce the porosity, and it is necessary to increase the degree of decompression (vacuum) for wafer adsorption during grinding or polishing. It is presumed that the pattern of the annular partition wall is transferred to the wafer during grinding and polishing of a wafer having a flat surface. SUMMARY OF THE INVENTION It is an object of the present invention to provide a universal chuck wafer mounting plate suitable for providing a wafer having excellent flatness without transferring the pattern of the partition wall onto the wafer.
【0008】[0008]
【課題を解決するための手段】本発明の請求項1は、通
気性ポ−ラスセラミック製円板を中心とし、この円板の
外周に軸心を同一、かつ、高さを同一にした複数の通気
性ポ−ラスセラミック製環状体が配列され、前記通気性
ポ−ラスセラミック製円板と通気性ポ−ラスセラミック
製環状体の間および通気性ポ−ラスセラミック製環状体
同士の間には、幅が0.1〜0.8mm、高さが前記円
板と同一の溶射セラミックの非通気性薄膜環状仕切壁が
配列されて全体として1枚の円盤を構成する、ユニバ−
サルチャック用ウエハ取付板を提供するものである。ユ
ニバ−サルチャック用ウエハ取付板の非通気性薄膜環状
仕切壁の幅を0.1〜0.8mmと狭くし、かつ、素材
として溶射セラミックを用いたので通気性ポ−ラスセラ
ミック製環状体に浸透することなく、かつ、非通気性薄
膜環状仕切壁と通気性ポ−ラスセラミック製環状体の接
着強度が高い。A first aspect of the present invention is a plurality of discs having a center of the same axis and a same height on the outer periphery of the disc centered on a permeable porous ceramic disc. Are arranged between the air-permeable porous ceramic disk and the air-permeable porous ceramic annular body and between the air-permeable porous ceramic annular bodies. Is a universal disk in which a non-breathable thin-film annular partition wall of a sprayed ceramic having a width of 0.1 to 0.8 mm and the same height as the disk is arranged to form one disk as a whole.
An object of the present invention is to provide a wafer mounting plate for a monkey chuck. The width of the non-permeable thin annular partition wall of the universal chuck wafer mounting plate is reduced to 0.1 to 0.8 mm, and a sprayed ceramic is used as a material. It does not penetrate and has high adhesive strength between the non-breathable thin-film annular partition wall and the breathable porous ceramic annular body.
【0009】本発明の請求項2は、通気性ポ−ラスセラ
ミック製円板の外周に、セラミック粉末を溶射して環状
の非通気性環状体を形成し、この非通気性環状体を研削
して幅0.1〜0.8mmの非通気性薄膜環状仕切壁と
し、この非通気性薄膜環状仕切壁の外周にグリ−ンシ−
トを燒結して通気性ポ−ラスセラミック製環状体を形成
し、この通気性ポ−ラスセラミック製環状体の外周にセ
ラミック粉末を溶射して環状の非通気性環状体を形成
し、この非通気性環状体を研削して幅0.1〜0.8m
mの非通気性薄膜環状仕切壁とし、この非通気性薄膜環
状仕切壁の外周にグリ−ンシ−トを燒結して通気性ポ−
ラスセラミック製環状体を形成させることを特徴とす
る、上記ユニバ−サルチャック用ウエハ取付板の製造方
法を提供するものである。1〜2mmの幅に形成された
非通気性環状体を研削または研磨して幅0.1〜0.8
mm、好ましくは0.2〜0.5mmの非通気性薄膜環
状仕切壁を形成することができた。A second aspect of the present invention is to form an annular air-impermeable ring by spraying ceramic powder on the outer periphery of a gas-permeable porous ceramic disk, and grinding the air-impermeable ring. And a non-breathable thin-film annular partition wall having a width of 0.1 to 0.8 mm.
To form an air-permeable porous ceramic annular body, and spray ceramic powder on the outer periphery of the air-permeable porous ceramic annular body to form an annular air-impermeable annular body. Grinding the permeable annular body, width 0.1-0.8m
m, a non-breathable thin-film annular partition wall, and a green sheet is sintered on the outer periphery of the non-breathable thin-film annular partition wall to form a breathable port.
An object of the present invention is to provide a method for manufacturing the wafer mounting plate for a universal chuck, comprising forming an annular body made of a lath ceramic. A non-breathable annular body formed to a width of 1 to 2 mm is ground or polished to a width of 0.1 to 0.8.
mm, preferably 0.2 to 0.5 mm, could form a non-permeable thin film annular partition wall.
【0010】本発明の請求項3は、通気性ポ−ラスセラ
ミック製円板の外周に、セラミック粉末を溶射して環状
の非通気性環状体を形成し、この非通気性環状体を研削
して幅0.1〜0.8mmの非通気性薄膜環状仕切壁と
し、この非通気性薄膜環状仕切壁の外周にガラス接着剤
を塗布し、ついで通気性ポ−ラスセラミック製環状体を
前記非通気性薄膜環状仕切壁の外周に嵌合し、この通気
性ポ−ラスセラミック製環状体の外周にセラミック粉末
を溶射して環状の非通気性環状体を形成し、この非通気
性環状体を研削して幅0.1〜0.8mmの非通気性薄
膜環状仕切壁とし、この非通気性薄膜環状仕切壁の外周
にガラス接着剤を塗布し、ついで通気性ポ−ラスセラミ
ック製環状体を非通気性薄膜環状仕切壁の外周に嵌合さ
せることを特徴とする、請求項1に記載のユニバ−サル
チャック用ウエハ取付板の製造方法を提供するものであ
る。液状のガラス接着剤は、非通気性薄膜環状仕切壁に
5〜50μmの薄い厚みで塗布されるので、仕切壁の厚
みを大幅に上昇させることがないので、ウエハへの仕切
壁の転写は生じない。A third aspect of the present invention is to form an annular air-impermeable ring by spraying ceramic powder on the outer periphery of a gas-permeable porous ceramic disk, and grinding the air-impermeable ring. To form a non-breathable thin-film annular partition wall having a width of 0.1 to 0.8 mm, a glass adhesive is applied to the outer periphery of the non-breathable thin-film annular partition wall, and then a breathable porous ceramic annular body is formed. The outer periphery of the air-permeable thin-film annular partition wall is fitted, and ceramic powder is sprayed on the outer periphery of the air-permeable porous ceramic annular body to form an annular air-impermeable annular body. Grinding to form a non-permeable thin-film annular partition wall having a width of 0.1 to 0.8 mm, applying a glass adhesive to the outer periphery of the non-permeable thin-film annular partition wall, and then forming an air-permeable porous ceramic annular body It is characterized in that it is fitted around the outer periphery of a non-breathable thin annular partition wall. That, Yuniba of claim 1 - is intended to provide a method of manufacturing a wafer mounting plate for monkey chuck. Since the liquid glass adhesive is applied to the non-breathable thin film annular partition wall with a thin thickness of 5 to 50 μm, the partition wall does not greatly increase in thickness, so that the transfer of the partition wall to the wafer occurs. Absent.
【0011】[0011]
【発明の実施の形態】本発明の円盤状取付板の通気性円
板、通気性環状体のポ−ラスセラミックは、窒化珪素、
窒化硼素、炭化珪素、珪石、長石、コランダム、アルミ
ナ、チタンカ−バイト、酸化ジルコニウム等のセラミッ
ク粉末を、メタクリル酸n−ブチル・メタクリル酸共重
合体、メタクリル酸n−ブチル・メタクリル酸・スチレ
ン共重合体、メタクリル酸n−ブチル・メタクリル酸・
メタクリル酸メチル共重合体等のアクリル系水性エマル
ジョンをバインダ−としてシ−ト状に形成したグリ−ン
シ−トを円板または環状体に成型し、これを先に600
〜900℃で仮焼し、ついで1000〜1300℃で焼
成して得た焼成物を円筒形研削盤(研磨盤)や平面研削
盤(研磨盤)を用いて外周面、内周面、表裏面を平坦に
研削(研磨)することにより製造される。又、セラミッ
ク粉末に、ポリスチレン、ポリエチレン等の熱可塑性樹
脂、バインダー、ジエチルフタレート、ジブチルフタレ
ート等の可塑剤、ステアリン酸亜鉛等の潤滑剤を配合し
たものを射出成形、もしくは圧縮成形して円板を形成し
てもよい。BEST MODE FOR CARRYING OUT THE INVENTION The porous ceramic of the permeable disk of the disk-shaped mounting plate and the permeable annular body of the present invention are silicon nitride,
Ceramic powders such as boron nitride, silicon carbide, silica stone, feldspar, corundum, alumina, titanium carbide, zirconium oxide, etc. are mixed with n-butyl methacrylate / methacrylic acid copolymer, n-butyl methacrylate / methacrylic acid / styrene copolymer. Coalescence, n-butyl methacrylate / methacrylic acid
A green sheet formed in the form of a sheet is formed into a disk or a ring by using an aqueous acrylic emulsion such as a methyl methacrylate copolymer as a binder.
The calcined product is calcined at ~ 900 ° C, then calcined at 1000-1300 ° C, and the outer surface, inner surface, front and back surfaces are obtained using a cylindrical grinder (polishing machine) or a surface grinder (polishing machine). It is manufactured by grinding (polishing) flat. Injection molding or compression molding of ceramic powder mixed with thermoplastic resin such as polystyrene and polyethylene, binder, plasticizer such as diethyl phthalate and dibutyl phthalate, and lubricating agent such as zinc stearate. It may be formed.
【0012】非通気性環状薄膜仕切壁は、上記通気性ポ
−ラスセラミック製円板の外周に、前記セラミック粉末
を600〜800℃で溶射して幅1〜2mmの環状の非
通気性環状体を形成し、この非通気性環状体を研削して
幅0.1〜0.8mm、好ましくは0.2〜0.5mm
の非通気性薄膜環状仕切壁とし、この非通気性薄膜環状
仕切壁の外周にグリ−ンシ−トを上記のように仮焼・焼
成(燒結)して通気性ポ−ラスセラミック製環状体を形
成し、この通気性ポ−ラスセラミック製環状体の外周に
セラミック粉末を溶射して肉厚1〜2mmの非通気性環
状体を形成し、この非通気性環状体を研削して幅0.1
〜0.8mm、好ましくは0.2〜0.5mmの非通気
性薄膜環状仕切壁とし、この非通気性薄膜環状仕切壁の
外周にグリ−ンシ−トを燒結して通気性ポ−ラスセラミ
ック製環状体を形成させる。又、この通気性ポ−ラスセ
ラミック製環状体を予じめ射出成形や圧縮成形で作製し
ておき、非通気性薄膜環状仕切壁の外周にガラス接着剤
を5〜50μmの厚みで塗布し、ついでこのガラス接着
剤の外周に通気性ポ−ラスセラミック製環状体を嵌合さ
せてもよい。The non-breathable annular thin film partition wall is formed by spraying the ceramic powder at 600 to 800 ° C. on the outer periphery of the permeable porous ceramic disk at a temperature of 600 to 800 ° C. Is formed, and the impervious annular body is ground to have a width of 0.1 to 0.8 mm, preferably 0.2 to 0.5 mm.
And a green sheet is calcined and fired (sintered) around the outer periphery of the non-breathable thin-film annular partition as described above to form a breathable porous ceramic annular body. Then, ceramic powder is sprayed on the outer periphery of the air-permeable porous ceramic annular body to form a non-air-permeable annular body having a thickness of 1 to 2 mm. 1
A non-permeable thin-film annular partition wall having a thickness of about 0.8 mm, preferably 0.2 to 0.5 mm, and a green sheet sintered on the outer periphery of the non-permeable thin-film annular partition wall to form a breathable porous ceramic. An annular body is formed. Also, this air-permeable porous ceramic annular body is prepared in advance by injection molding or compression molding, and a glass adhesive is applied to the outer periphery of the air-impermeable thin-film annular partition wall in a thickness of 5 to 50 μm, Next, an annular body made of a breathable porous ceramic may be fitted to the outer periphery of the glass adhesive.
【0013】通気性ポ−ラスセラミック製環状体および
非通気性薄膜環状仕切壁の数は、ユニバ−サルチャック
をどの径のウエハ兼用にするかにより決まる。取付板の
厚みは、10〜30mmが一般である。この取付板5を
図2に示すように収納フランジ10に収納し、さらに吸
気手段11を付属させてユニバ−サルチャックとし、従
来技術のように中空軸に軸承させたヘッドに取り組み、
ウエハホルダ−を形成するか、中空軸に軸承させてウエ
ハ乗載台として利用するか、中空軸に軸承させてバキュ
−ムチャックとして利用する。The number of the air-permeable porous ceramic annular bodies and the air-impermeable thin-film annular partition walls is determined by the diameter of the universal chuck used for the wafer. The thickness of the mounting plate is generally 10 to 30 mm. The mounting plate 5 is housed in a housing flange 10 as shown in FIG. 2, and a suction means 11 is attached to make a universal chuck.
Either a wafer holder is formed, or a hollow shaft is used as a wafer mounting table, or a hollow shaft is used as a vacuum chuck.
【0014】[0014]
【発明の効果】本発明のユニバ−サルチャックのウエハ
取付板は、非通気性の環状薄膜仕切壁の幅が0.1〜
0.8mm、好ましくは0.2〜0.5mmと狭く、か
つ、溶射セラミックで形成したので、ウエハ研削・研磨
時、ウエハ吸着の減圧度を低くすることができるととも
に、研削・研磨されたウエハにはこれら非通気性の環状
薄膜仕切壁の模様が転写されず、極めて平坦性の優れる
ウエハを提供できる。According to the wafer mounting plate of the universal chuck of the present invention, the width of the impermeable annular thin film partition wall is 0.1 to 0.1 mm.
0.8 mm, preferably 0.2-0.5 mm, and formed of sprayed ceramic, during the grinding and polishing of the wafer, it is possible to reduce the degree of decompression of the wafer suction, while grinding and polishing the wafer The pattern of the non-breathable annular thin film partition wall is not transferred to the wafer, and a wafer having extremely excellent flatness can be provided.
【図1】ユニバ−サルチャックテ−ブルの一部を切り欠
いた斜視図である。FIG. 1 is a perspective view of a universal chuck table with a part cut away.
【図2】図1のA−A線での切断図である。FIG. 2 is a sectional view taken along line AA of FIG.
1 ユニバ−サルチャックテ−ブル w ウエハ 2 通気性ポ−ラスセラミック製円板 3 通気性ポ−ラスセラミック製環状体 4 非通気性溶射セラミック製薄膜環状仕切壁 5 取付板 10 取付板収納フランジ 11 吸気手段 DESCRIPTION OF SYMBOLS 1 Universal chuck table w Wafer 2 Air-permeable porous ceramic disk 3 Air-permeable porous ceramic ring 4 Non-air-permeable sprayed ceramic thin-film annular partition wall 5 Mounting plate 10 Mounting plate storage flange 11 Intake means
Claims (3)
とし、この円板の外周に軸心を同一、かつ、高さを同一
にした複数の通気性ポ−ラスセラミック製環状体が配列
され、前記通気性ポ−ラスセラミック製円板と通気性ポ
−ラスセラミック製環状体の間および通気性ポ−ラスセ
ラミック製環状体同士の間には、幅が0.1〜0.8m
m、高さが前記円板と同一の溶射セラミックの非通気性
薄膜環状仕切壁が配列されて全体として1枚の円盤を構
成する、ユニバ−サルチャック用ウエハ取付板。1. A plurality of permeable porous ceramic annular bodies having the same axial center and the same height are arranged on the outer periphery of a circular plate made of a permeable porous ceramic. The width between the air-permeable porous ceramic disk and the air-permeable porous ceramic annular body and between the air-permeable porous ceramic annular bodies is 0.1 to 0.8 m.
m, a wafer mounting plate for a universal chuck in which non-breathable thin-film annular partition walls of sprayed ceramic having the same height as the circular plate are arranged to constitute one disk as a whole.
に、セラミック粉末を溶射して環状の非通気性環状体を
形成し、この非通気性環状体を研削して幅0.1〜0.
8mmの非通気性薄膜環状仕切壁とし、この非通気性薄
膜環状仕切壁の外周にグリ−ンシ−トを燒結して通気性
ポ−ラスセラミック製環状体を形成し、この通気性ポ−
ラスセラミック製環状体の外周にセラミック粉末を溶射
して環状の非通気性環状体を形成し、この非通気性環状
体を研削して幅0.1〜0.8mmの非通気性薄膜環状
仕切壁とし、この非通気性薄膜環状仕切壁の外周にグリ
−ンシ−トを燒結して通気性ポ−ラスセラミック製環状
体を形成させることを特徴とする、請求項1に記載のユ
ニバ−サルチャック用ウエハ取付板の製造方法。2. An annular air-impermeable annular body is formed by spraying ceramic powder on the outer periphery of a gas-permeable porous ceramic disk, and the non-air-permeable annular body is ground to a width of 0.1 to 0.1 mm. 0.
An 8 mm non-breathable thin-film annular partition is formed, and a green sheet is sintered around the outer periphery of the non-breathable thin-film annular partition to form a breathable porous ceramic annular body.
A ceramic powder is sprayed on the outer periphery of the lath ceramic annular body to form an annular air-impermeable annular body, and the air-impermeable annular body is ground to form a non-permeable thin-film annular partition having a width of 0.1 to 0.8 mm. 2. The universal as claimed in claim 1, wherein a green sheet is sintered around the outer periphery of the non-breathable thin-film annular partition wall to form a breathable porous ceramic annular body. Manufacturing method of wafer mounting plate for chuck.
に、セラミック粉末を溶射して環状の非通気性環状体を
形成し、この非通気性環状体を研削して幅0.1〜0.
8mmの非通気性薄膜環状仕切壁とし、この非通気性薄
膜環状仕切壁の外周にガラス接着剤を塗布し、ついで通
気性ポ−ラスセラミック製環状体を前記非通気性薄膜環
状仕切壁の外周に嵌合し、この通気性ポ−ラスセラミッ
ク製環状体の外周にセラミック粉末を溶射して環状の非
通気性環状体を形成し、この非通気性環状体を研削して
幅0.1〜0.8mmの非通気性薄膜環状仕切壁とし、
この非通気性薄膜環状仕切壁の外周にガラス接着剤を塗
布し、ついで通気性ポ−ラスセラミック製環状体を非通
気性薄膜環状仕切壁の外周に嵌合させることを特徴とす
る、請求項1に記載のユニバ−サルチャック用ウエハ取
付板の製造方法。3. An annular air-impermeable annular body is formed by spraying ceramic powder on the outer periphery of a gas-permeable porous ceramic disc, and the non-air-permeable annular body is ground to a width of 0.1 to 0.1 mm. 0.
An 8 mm non-permeable thin-film annular partition wall is coated with a glass adhesive around the outer periphery of the non-permeable thin-film annular partition wall. And a ceramic powder is sprayed on the outer periphery of the air-permeable porous ceramic annular body to form an annular air-impermeable annular body. 0.8mm non-breathable thin film annular partition wall,
A glass adhesive is applied to the outer periphery of the non-permeable thin-film annular partition wall, and then a permeable porous ceramic annular body is fitted to the outer periphery of the non-permeable thin-film annular partition wall. 2. The method for manufacturing a wafer mounting plate for a universal chuck according to 1.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP10352189A JP2000158268A (en) | 1998-11-27 | 1998-11-27 | Wafer attaching plate for universal chuck and its manufacture |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP10352189A JP2000158268A (en) | 1998-11-27 | 1998-11-27 | Wafer attaching plate for universal chuck and its manufacture |
Publications (1)
Publication Number | Publication Date |
---|---|
JP2000158268A true JP2000158268A (en) | 2000-06-13 |
Family
ID=18422399
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP10352189A Pending JP2000158268A (en) | 1998-11-27 | 1998-11-27 | Wafer attaching plate for universal chuck and its manufacture |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP2000158268A (en) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2005059173A (en) * | 2003-08-18 | 2005-03-10 | Yoshioka Seiko:Kk | Suction device and chuck table |
US9583376B2 (en) | 2013-04-05 | 2017-02-28 | Rohm Co., Ltd. | Suction-holding apparatus and wafer polishing apparatus |
JP2018034299A (en) * | 2017-11-22 | 2018-03-08 | ローム株式会社 | Suction holding device and wafer polishing device |
CN111992774A (en) * | 2020-07-24 | 2020-11-27 | 西安理工大学 | Intelligent reconfigurable drilling clamp for circumferential thin plate |
-
1998
- 1998-11-27 JP JP10352189A patent/JP2000158268A/en active Pending
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2005059173A (en) * | 2003-08-18 | 2005-03-10 | Yoshioka Seiko:Kk | Suction device and chuck table |
US9583376B2 (en) | 2013-04-05 | 2017-02-28 | Rohm Co., Ltd. | Suction-holding apparatus and wafer polishing apparatus |
JP2018034299A (en) * | 2017-11-22 | 2018-03-08 | ローム株式会社 | Suction holding device and wafer polishing device |
CN111992774A (en) * | 2020-07-24 | 2020-11-27 | 西安理工大学 | Intelligent reconfigurable drilling clamp for circumferential thin plate |
CN111992774B (en) * | 2020-07-24 | 2021-09-10 | 西安理工大学 | Intelligent reconfigurable drilling clamp for circumferential thin plate |
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