JP2000063156A - Sealing structure for peripheral part of glass panel and sealing method - Google Patents
Sealing structure for peripheral part of glass panel and sealing methodInfo
- Publication number
- JP2000063156A JP2000063156A JP10226735A JP22673598A JP2000063156A JP 2000063156 A JP2000063156 A JP 2000063156A JP 10226735 A JP10226735 A JP 10226735A JP 22673598 A JP22673598 A JP 22673598A JP 2000063156 A JP2000063156 A JP 2000063156A
- Authority
- JP
- Japan
- Prior art keywords
- metal
- glass
- glass panel
- metal layer
- peripheral edge
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02A—TECHNOLOGIES FOR ADAPTATION TO CLIMATE CHANGE
- Y02A30/00—Adapting or protecting infrastructure or their operation
- Y02A30/24—Structural elements or technologies for improving thermal insulation
- Y02A30/249—Glazing, e.g. vacuum glazing
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02B—CLIMATE CHANGE MITIGATION TECHNOLOGIES RELATED TO BUILDINGS, e.g. HOUSING, HOUSE APPLIANCES OR RELATED END-USER APPLICATIONS
- Y02B80/00—Architectural or constructional elements improving the thermal performance of buildings
- Y02B80/22—Glazing, e.g. vaccum glazing
Landscapes
- Securing Of Glass Panes Or The Like (AREA)
- Joining Of Glass To Other Materials (AREA)
Abstract
Description
【0001】[0001]
【発明の属する技術分野】本発明は、複数枚のガラス板
の間に空隙を形成したガラスパネルの周縁部封止構造に
関し、詳しくは、その空隙を周囲雰囲気に対して気密に
隔絶してあるガラスパネルの周縁部封止構造に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a peripheral sealing structure for a glass panel in which a space is formed between a plurality of glass plates, and more specifically, a glass panel in which the space is hermetically isolated from the surrounding atmosphere. The present invention relates to a peripheral edge sealing structure.
【0002】[0002]
【従来の技術】上記ガラスパネルの周縁部封止構造にお
いては、従来、ガラスパネルを形成するガラス板よりも
軟化点の低い低融点ガラスを用いて対向するガラス板の
周縁部に封止部を形成した封止構造が用いられていた。
つまり、例えば図6に示すように、複数枚のガラス板1
の間に空隙3を形成したガラスパネルにおいて、その空
隙3を周囲雰囲気に対して気密に隔絶するガラスパネル
の周縁部2を封止するのに、前記ガラス板1よりも軟化
温度の低い低融点ガラスを用いて前記周縁部2の封止部
9を形成している。このガラスパネルが複数のガラス板
1の間に真空層を形成したガラスパネルである場合に
は、前記空隙3を外気と遮断した後、予め一方のガラス
板1Aに設けられている吸引口10から前記空隙3内の
空気を吸引して、両ガラス板1A,1Bの間を真空に維
持するために、前記吸引口10を低融点ガラスで封止す
ることが行われている。この低融点ガラスを用いた周縁
部の封止構造は、前記空隙3内に間隔保持材7を配置し
てはいるが、前記封止部9にも前記空隙3を挟むガラス
板1A,1B間の間隔を維持する役割をも果たすもので
ある。2. Description of the Related Art In the above-described glass panel peripheral edge sealing structure, conventionally, a low melting point glass having a softening point lower than that of a glass plate forming the glass panel is used to form a sealing portion on the peripheral edge of the opposing glass plate. The formed sealing structure was used.
That is, for example, as shown in FIG. 6, a plurality of glass plates 1
In a glass panel in which a void 3 is formed between the glass plate 1 and the glass plate 1, a low melting point having a softening temperature lower than that of the glass plate 1 is used to seal the peripheral portion 2 of the glass panel that hermetically isolates the void 3 from the surrounding atmosphere. The sealing portion 9 of the peripheral portion 2 is formed using glass. In the case where this glass panel is a glass panel in which a vacuum layer is formed between a plurality of glass plates 1, after the gap 3 is cut off from the outside air, the glass plate 1 is preliminarily provided with a suction port 10 provided in one glass plate 1A. In order to suck the air in the gap 3 and maintain a vacuum between the glass plates 1A and 1B, the suction port 10 is sealed with a low melting glass. Although the peripheral edge sealing structure using this low melting point glass has the spacing member 7 disposed in the void 3, the sealing portion 9 also has a space between the glass plates 1A and 1B sandwiching the void 3. It also plays a role in maintaining the interval.
【0003】[0003]
【発明が解決しようとする課題】しかしながら、上記従
来の封止構造においては、封止のために前記ガラス板1
の周縁部2を封止する低融点ガラスが十分に軟化して両
側のガラス板1A,1Bに融着することが必要であり、
このために、前記低融点ガラスは前記両ガラス板1A,
1Bよりも軟化点の低いものを使用する。一般に低融点
ガラスは、軟化点の低いものほど酸・アルカリに対する
耐久性や耐水性が低いものが多く、前記ガラス板1A,
1Bの軟化点が低い場合に、さらに低い軟化点の低融点
ガラスを用いることは、ガラスパネルの耐久性、耐水性
を低下させることになる。However, in the above conventional sealing structure, the glass plate 1 is used for sealing.
It is necessary that the low-melting-point glass that seals the peripheral edge portion 2 of the above is sufficiently softened and fused to the glass plates 1A and 1B on both sides,
For this reason, the low melting point glass is
Use a softening point lower than 1B. In general, the lower the melting point of the glass, the lower the softening point is, the more the durability against acid and alkali and the water resistance are lower.
When the softening point of 1B is low, the use of a low melting point glass having a lower softening point lowers the durability and water resistance of the glass panel.
【0004】そこで、本発明は上記の問題を解決してよ
り低温の加熱温度下で施工可能なガラスパネルの周縁部
封止構造及びその封止方法を提供する点にある。Therefore, the present invention is to solve the above problems and to provide a glass panel peripheral edge sealing structure which can be installed at a lower heating temperature and a sealing method therefor.
【0005】[0005]
【課題を解決するための手段】〔本発明の特徴構成〕請
求項1に係わる本発明のガラスパネルの周縁部封止構造
の特徴構成は、図1に示す例により説明すると、互いに
対向する前記一方のガラス板1Aと前記他方のガラス板
1Bとの間に、夫々の周縁部2の対向するガラス面2a
夫々に結合した下地金属層4と、前記両下地金属層4の
間を気密に金属接合した低融点金属ロウ材層6とを形成
してある(第1特徴構成)点にある。[Characteristic Configuration of the Present Invention] The characteristic configuration of the peripheral edge sealing structure of a glass panel of the present invention according to claim 1 will be described with reference to an example shown in FIG. Between the one glass plate 1A and the other glass plate 1B, the opposite glass surfaces 2a of the respective peripheral edge portions 2 are provided.
The point is that the underlying metal layers 4 bonded to each other and the low melting point metal brazing material layer 6 in which the two underlying metal layers 4 are hermetically metal-bonded to each other are formed (first characteristic configuration).
【0006】請求項2に係わる本発明のガラスの周縁部
封止構造複層の特徴構成は、図1に示す例に沿って説明
すると、上記第1特徴構成における下地金属層4を、ニ
ッケル、銀又はクロムを前記対向面に積層形成して構成
してある(第2特徴構成)点にある。The characteristic structure of the glass peripheral edge sealing structure multi-layer according to the second aspect of the present invention will be described with reference to the example shown in FIG. 1. When the underlying metal layer 4 in the first characteristic structure is nickel, This is characterized in that silver or chrome is laminated and formed on the facing surface (second characteristic constitution).
【0007】請求項3に係わる本発明のガラスパネルの
周縁部封止構造の特徴構成は、図2に示す例に沿って説
明すると、上記第2特徴構成における下地金属層4を、
ニッケル又は銀を対向面に化学メッキして形成してある
(第3特徴構成)点にある。The characteristic structure of the peripheral edge sealing structure for a glass panel of the present invention according to claim 3 will be described with reference to the example shown in FIG.
The point is that nickel or silver is formed by chemical plating on the opposite surface (third characteristic configuration).
【0008】請求項4に係わる本発明のガラスパネルの
周縁部封止構造の特徴構成は、図4に示す例に沿って説
明すると、上記第2特徴構成においてクロムを積層形成
するのに、物理蒸着法(例えばスパッタリング法)によ
りクロム蒸着層4Bを形成したものである(第4特徴構
成)点にある。The characteristic constitution of the peripheral edge sealing structure of the glass panel of the present invention according to claim 4 will be described with reference to the example shown in FIG. The point is that the chromium vapor deposition layer 4B is formed by the vapor deposition method (for example, the sputtering method) (fourth characteristic configuration).
【0009】請求項5に係わる本発明のガラスパネルの
周縁部封止構造の特徴構成は、図3に示す例により説明
すると、互いに対向する前記一方のガラス板1Aと前記
他方のガラス板1Bとの間に、夫々の周縁部2の対向す
るガラス面2aに結合した下地金属層4と、前記両下地
金属層4上に金属接合した被覆金属層5と、前記両被覆
金属層5の間を気密に金属接合した低融点金属ロウ材層
6とを形成してある(第5特徴構成)点にある。The characteristic structure of the peripheral edge sealing structure for a glass panel according to the fifth aspect of the present invention will be described with reference to the example shown in FIG. 3. The one glass plate 1A and the other glass plate 1B are opposed to each other. Between the base metal layers 4 bonded to the opposing glass surfaces 2a of the respective peripheral edge portions 2, the coated metal layers 5 metal-bonded to the both base metal layers 4, and the two coated metal layers 5 between The low-melting-point metal brazing material layer 6 that is airtightly metal-bonded is formed (fifth characteristic configuration).
【0010】請求項6に係わる本発明のガラスパネルの
周縁部封止構造の特徴構成は、図3に示す例に沿って説
明すると、上記第5特徴構成における下地金属層4を、
前記他の各層5,6を構成する金属材料の酸化還元電位
に対して最も低くなるように、金属材料を選択して形成
してある(第6特徴構成)点にある。The characteristic construction of the peripheral edge sealing structure for a glass panel according to the sixth aspect of the present invention will be described with reference to the example shown in FIG. 3, in which the underlying metal layer 4 in the fifth characteristic construction is
The point is that the metal material is selected and formed so as to have the lowest potential with respect to the redox potential of the metal material forming the other layers 5 and 6 (sixth characteristic configuration).
【0011】請求項7に係わる本発明のガラスパネルの
周縁部封止構造の特徴構成は、図3に示す例に沿って説
明すると、上記第6特徴構成における下地金属層4を、
ニッケル、クロム、銀、銅の中から選択された金属で形
成してある(第7特徴構成)点にある。The characteristic construction of the peripheral edge sealing structure for a glass panel of the present invention according to claim 7 will be described with reference to the example shown in FIG. 3, in which the underlying metal layer 4 in the sixth characteristic construction is
It is formed of a metal selected from nickel, chromium, silver, and copper (seventh characteristic configuration).
【0012】請求項8に係わる本発明のガラスパネルの
周縁部封止構造の特徴構成は、図3に示す例に沿って説
明すると、上記第6特徴構成又は第7特徴構成における
被覆金属層5を、金、銀、白金、銅、錫の中から選択さ
れた金属で形成してある(第8特徴構成)点にある。The characteristic constitution of the peripheral edge sealing structure for a glass panel of the present invention according to claim 8 will be described with reference to the example shown in FIG. 3. The covering metal layer 5 in the sixth characteristic constitution or the seventh characteristic constitution described above. Is formed of a metal selected from gold, silver, platinum, copper, and tin (eighth characteristic configuration).
【0013】請求項9に係わる本発明のガラスパネルの
周縁部封止構造の特徴構成は、上記第1〜第8の何れか
の特徴構成における低融点金属ロウ材層6を形成する金
属材料が、ビスマス、鉛、錫、亜鉛、インジウム、アン
チモンの何れか1種又は2種以上を主成分とするもので
ある(第9特徴構成)点にある。According to the ninth aspect of the present invention, there is provided a glass panel peripheral edge sealing structure, wherein the metal material forming the low melting point metal brazing material layer 6 is the metal material forming the low melting point metal brazing material layer 6 of any one of the first to eighth aspects. , Bismuth, lead, tin, zinc, indium, and antimony as a main component, or at least two of them (the ninth characteristic configuration).
【0014】請求項10に係わる本発明のガラスパネル
の周縁部封止構造の特徴構成は、上記第9特徴構成にお
ける金属材料に、銀、アルミニウムの少なくとも一方を
副成分として含有するものである(第10特徴構成)点
にある。According to a tenth aspect of the glass panel peripheral edge sealing structure of the present invention, at least one of silver and aluminum is contained as an auxiliary component in the metal material in the ninth characteristic configuration. The tenth characteristic composition) point.
【0015】請求項11に係わる本発明のガラスパネル
の周縁部封止構造の特徴構成は、上記第1〜第10特徴
構成の何れかにおいて、空隙内に粒径が0.1μm以上
10μm未満の粉粒体を分散して介在させてある(第1
1特徴構成)点にある。According to the eleventh aspect of the invention, there is provided a glass panel peripheral edge sealing structure according to any one of the first to tenth aspects, wherein the voids have a particle size of 0.1 μm or more and less than 10 μm. Particles are dispersed and interposed (first
1 characteristic configuration).
【0016】請求項12に係わる本発明のガラスパネル
の周縁部封止方法の特徴構成は、図1に示す例により説
明すると、両ガラス板周縁部2の所定の領域夫々に下地
金属層4を積層形成し、前記下地金属層4を対向させた
状態で前記両板ガラス1A,1Bを重ね合わせて、前記
両下地金属層の間で低融点金属ロウ材を溶融させ、その
後凝固させる(第12特徴構成)点にある。The characteristic construction of the glass panel peripheral edge sealing method of the present invention according to claim 12 will be described with reference to the example shown in FIG. 1. The underlying metal layer 4 is provided in each of the predetermined regions of both glass plate peripheral edges 2. Both of the plate glasses 1A and 1B are stacked in a state where they are laminated and the underlying metal layer 4 is opposed to each other, and the low melting point metal brazing material is melted between the underlying metal layers and then solidified (Twelfth feature) Composition) point.
【0017】請求項13に係わる本発明のガラスパネル
の周縁部封止方法の特徴構成は、図1に示す例に沿って
説明すると、上記第12特徴構成における下地金属層4
を積層形成するに、ニッケル、銅、銀の中から選択され
た金属をメッキする(第13特徴構成)点にある。The characteristic construction of the glass panel peripheral edge sealing method according to the thirteenth aspect of the present invention will be described with reference to the example shown in FIG.
In forming the laminate, a metal selected from nickel, copper, and silver is plated (thirteenth characteristic configuration).
【0018】請求項14に係わる本発明のガラスパネル
の周縁部封止方法の特徴構成は、図1に示す例に沿って
説明すると、上記第12特徴構成における下地金属層4
を積層形成するに、金属クロムを物理蒸着法により形成
する(第14特徴構成)点にある。The characteristic construction of the glass panel peripheral edge sealing method according to the fourteenth aspect of the present invention will be described with reference to the example shown in FIG.
In the case of stacking, the metal chromium is formed by physical vapor deposition (fourteenth characteristic configuration).
【0019】請求項15に係わる本発明のガラスパネル
の周縁部封止構造の特徴構成は、図3に示す例により説
明すると、両ガラス板周縁部2の所定の領域夫々に下地
金属層4を積層形成し、前記両下地金属層4夫々の面上
にロウ付けに適した金属材料の被覆金属層5を形成し、
前記両被覆金属層5を対向させた状態で前記両板ガラス
1を重ね合わせて、前記両被覆金属層5の間で低融点金
属ロウ材を溶融させ、その後凝固させる(第15特徴構
成)点にある。The characteristic construction of the glass panel peripheral edge sealing structure according to the fifteenth aspect of the present invention will be described with reference to the example shown in FIG. Forming a laminated layer, and forming a coating metal layer 5 of a metal material suitable for brazing on each surface of the two underlying metal layers 4;
The two plate glasses 1 are overlapped with the both coating metal layers 5 facing each other, the low melting point metal brazing material is melted between the both coating metal layers 5, and then solidified (a fifteenth characteristic configuration). is there.
【0020】請求項16に係わる本発明のガラスパネル
の周縁部封止構造の特徴構成は、図3に示す例に沿って
説明すると、上記第15特徴構成における下地金属層4
を形成するのに、被覆金属層5を形成する金属材料及び
低融点金属ロウ材の何れよりも酸化還元電位の低い金属
材料を用いる(第16特徴構成)点にある。The characteristic construction of the peripheral edge sealing structure for a glass panel of the present invention according to claim 16 will be described with reference to the example shown in FIG.
In forming the metal, a metal material having a lower redox potential than both the metal material forming the coating metal layer 5 and the low melting point metal brazing material is used (sixteenth characteristic configuration).
【0021】請求項17に係わる本発明のガラスパネル
の周縁部封止構造の特徴構成は、図3に示す例に沿って
説明すると、上記第16特徴構成における下地金属層4
を積層形成するに、ニッケル、銅、銀の中から選択され
た少なくとも1種の金属をメッキする(第17特徴構
成)点にある。The characteristic construction of the peripheral edge sealing structure for a glass panel according to the seventeenth aspect of the present invention will be described with reference to the example shown in FIG.
In laminating, at least one metal selected from nickel, copper, and silver is plated (seventeenth characteristic configuration).
【0022】請求項18に係わる本発明のガラスパネル
の周縁部封止構造の特徴構成は、図4に示す例に沿って
説明すると、上記第15特徴構成における下地金属層4
を積層形成するに、金属クロムを物理蒸着したクロム蒸
着層4Bで形成してある(第18特徴構成)点にある。The characteristic construction of the glass panel peripheral edge sealing structure of the eighteenth aspect of the present invention will be described with reference to the example shown in FIG.
Is formed by the chromium vapor deposition layer 4B in which metal chromium is physically vapor deposited (the eighteenth characteristic structure).
【0023】請求項19に係わる本発明のガラスパネル
の周縁部封止構造の特徴構成は、図3又は図4に示す例
に沿って説明すると、上記第15〜第18特徴構成の何
れかにおける被覆金属層を形成するのに、金、銀、白
金、銅の中から選択された少なくとも一種の金属材料を
メッキする(第17特徴構成)点にある。The characteristic construction of the peripheral edge sealing structure for a glass panel according to the nineteenth aspect of the present invention will be described with reference to the example shown in FIG. 3 or FIG. In forming the coating metal layer, at least one metal material selected from gold, silver, platinum, and copper is plated (seventeenth characteristic configuration).
【0024】〔各特徴構成の作用及び効果〕上記請求項
1に記載の発明に係わるガラスパネルの周縁部封止構造
の特徴構成によれば、周縁部の封止に際してその加熱温
度を比較的低温度にできる。従って、低融点ガラスを用
いて封止するより低温でガラスパネルの周縁部を封止す
ることができる。[Operations and Effects of Each Characteristic Configuration] According to the characteristic configuration of the peripheral edge sealing structure of the glass panel according to the invention described in claim 1, the heating temperature at the time of sealing the peripheral edge is relatively low. Can be temperature. Therefore, the peripheral portion of the glass panel can be sealed at a lower temperature than the case where the sealing is performed using the low melting point glass.
【0025】上記請求項2に記載の発明に係わるガラス
パネルの周縁部封止構造の特徴構成は上記第1特徴構成
の具体例を示す構成であって、上記第1特徴構成の作用
効果に加えて、その特徴的な作用効果として下地金属層
とガラス面との密着性をさらに改善できる。つまり、図
1に示した例に沿って説明すれば、下地金属層4を形成
するニッケル、銀又はクロムが、その酸化還元電位の低
いことからガラス中の酸化物の酸素原子と結合するの
で、例えば蒸着のような物理的付着による被膜形成によ
ってもガラス面に対する密着性のよい下地金属層4を形
成できる。The characteristic constitution of the peripheral edge sealing structure of the glass panel according to the invention as defined in claim 2 is a constitution showing a specific example of the first characteristic constitution, and in addition to the function and effect of the first characteristic constitution. As a characteristic effect, the adhesion between the underlying metal layer and the glass surface can be further improved. That is, to explain along the example shown in FIG. 1, since nickel, silver or chromium forming the underlying metal layer 4 has a low redox potential, it bonds with oxygen atoms of the oxide in the glass. For example, the underlying metal layer 4 having good adhesion to the glass surface can be formed by forming a film by physical attachment such as vapor deposition.
【0026】上記請求項3に記載の発明に係わるガラス
パネルの周縁部封止構造の特徴構成は上記第2特徴構成
の具体例を示す構成であって、上記第2特徴構成の作用
効果に加えて、その特徴的な作用効果として下地金属層
とガラス面との密着性を改善できるようになる。つま
り、図2に示した例に沿って説明すれば、下地金属層4
にニッケル又は銀を用いることで無電解化学メッキが可
能であり、ガラス表面へのメッキが容易となる。殊に、
ニッケルはその酸化還元電位の低いことからガラス中の
酸化物の酸素原子との結合が強固になるので、ガラス面
に対する密着性のよい下地金属層4を形成できる。さら
に、ニッケル、銀等は半田に馴染み易いから半田付けが
容易であり、低温での周縁部の封着が容易になる。The characteristic constitution of the peripheral edge sealing structure of the glass panel according to the invention as defined in claim 3 is a constitution showing a specific example of the second characteristic constitution, and in addition to the operational effect of the second characteristic constitution. As a characteristic effect, the adhesion between the underlying metal layer and the glass surface can be improved. That is, to explain with reference to the example shown in FIG.
By using nickel or silver for electroless chemical plating, the glass surface can be easily plated. In particular,
Since nickel has a low redox potential, the bond with the oxygen atom of the oxide in the glass becomes strong, so that the underlying metal layer 4 having good adhesion to the glass surface can be formed. Furthermore, since nickel, silver, etc. are easily compatible with solder, soldering is easy, and sealing of the peripheral portion at low temperature is easy.
【0027】上記請求項4に記載の発明に係わるガラス
パネルの周縁部封止構造の特徴構成は上記第2特徴構成
のさらに具体的な構成であって、上記第2特徴構成の作
用効果に加えて、その特徴的な作用効果として下地金属
層とガラス面との密着性を確実に高いものにできる。つ
まり、図4に示した例に沿って説明すれば、下地金属層
4を真空下で蒸着する物理蒸着法によって形成すれば、
蒸着されるクロムは、ガラス面2aに到達するまで酸素
と接触する機会がほとんどないから、ガラス中の酸素と
結合しやすく、強固なガラス面への密着積層が可能にな
る。しかも、極めて微細な粒子の状態でガラス面2aに
蒸着するから、極めて薄い下地金属層4を形成すること
ができる。The characteristic constitution of the peripheral edge sealing structure for a glass panel according to the invention described in claim 4 is a more specific constitution of the second characteristic constitution, and in addition to the operational effect of the second characteristic constitution. As a characteristic effect, the adhesion between the underlying metal layer and the glass surface can be surely increased. That is, to explain according to the example shown in FIG. 4, if the underlying metal layer 4 is formed by a physical vapor deposition method in which it is deposited under vacuum,
The deposited chromium has almost no chance of coming into contact with oxygen until it reaches the glass surface 2a, so that it is easy to bond with oxygen in the glass, and it becomes possible to adhere and laminate to a strong glass surface. Moreover, since the extremely fine particles are vapor-deposited on the glass surface 2a, the extremely thin base metal layer 4 can be formed.
【0028】上記請求項5に記載の発明に係わるガラス
パネルの周縁部封止構造の特徴構成によれば、ガラスパ
ネルが加熱の影響を抑制しながら周縁部を封止して形成
したものとなる。つまり、図3に示した例に沿って説明
すれば、ガラス面2aに結合した下地金属層4は、ガラ
ス面2aへの密着積層に適しても、酸素との結合性が高
いからその表面に酸化被膜が生成しやすく、ロウ付けに
際して酸化被膜除去のためのフラックスが必要になる
が、前記下地金属層4に金属接合した被覆金属層5を設
けることによってロウ付けが容易になる。例えば前記被
覆金属層5を構成する金属よりも酸化還元電位の高い金
属で前記被覆金属層5を形成すれば、酸化被膜の形成を
抑制し、或いは形成した酸化被膜を破壊しやすくするこ
とで溶融金属ロウが馴染みやすくなる。According to the characteristic construction of the peripheral edge sealing structure of the glass panel according to the invention described in claim 5, the glass panel is formed by sealing the peripheral edge while suppressing the influence of heating. . That is, to explain according to the example shown in FIG. 3, even if the underlying metal layer 4 bonded to the glass surface 2a is suitable for adhesion and lamination on the glass surface 2a, since it has a high bonding property with oxygen, An oxide film is likely to be formed, and a flux for removing the oxide film is required at the time of brazing, but brazing is facilitated by providing the coating metal layer 5 which is metal-bonded to the base metal layer 4. For example, if the coating metal layer 5 is formed of a metal having a redox potential higher than that of the metal forming the coating metal layer 5, the formation of an oxide film is suppressed, or the formed oxide film is easily broken to melt. The metal wax becomes easy to fit in.
【0029】上記請求項6に記載の発明に係わるガラス
パネルの周縁部封止構造の特徴構成は上記第5特徴構成
の好ましい例を示す構成であって、上記第5特徴構成の
作用効果に加えて、その特徴的な作用効果として下地金
属層がガラス面に安定して密着形成されたものとなる。
つまり、図3に示す例に沿って説明すると、各層4,
5,6を構成する金属材料の中で酸化還元電位が最も低
い金属材料で下地金属層4を形成すれば、その下地金属
層4が最もガラスと結合しやすい条件となるから、十分
にガラス面2aに密着した下地金属層4を形成すること
が可能になる。The characteristic constitution of the peripheral edge sealing structure for a glass panel according to the sixth aspect of the present invention is a preferable example of the fifth characteristic constitution, and in addition to the operational effects of the fifth characteristic constitution. As a characteristic effect, the underlying metal layer is stably and closely formed on the glass surface.
That is, to explain according to the example shown in FIG.
If the underlayer metal layer 4 is formed of a metal material having the lowest redox potential among the metal materials forming the layers 5 and 6, the underlayer metal layer 4 is in a condition in which it is most easily bonded to glass. It is possible to form the underlying metal layer 4 that is in close contact with the 2a.
【0030】上記請求項7に記載の発明に係わるガラス
パネルの周縁部封止構造の特徴構成も上記第5徴構成の
具体例を示す構成であって、上記第5特徴構成の作用効
果に加えて、その特徴的な作用効果として下地金属層が
ガラス面に安定して密着形成されたものとなる。つま
り、図3に示した例に沿って説明すれば、ニッケル及び
クロムは何れも酸化還元電位の低い金属であり、銀及び
銅は何れもガラス面上に化学メッキを施すことが容易な
金属であるから、何れの金属を用いてもガラス面2aと
下地金属層4との間を安定して密着させることが可能に
なる。The characteristic construction of the peripheral edge sealing structure for a glass panel according to the invention described in claim 7 is also a construction showing a specific example of the fifth characteristic construction, and in addition to the action and effect of the fifth characteristic construction. As a characteristic effect, the underlying metal layer is stably and closely formed on the glass surface. That is, referring to the example shown in FIG. 3, nickel and chromium are both metals having a low redox potential, and silver and copper are both metals that are easy to chemically plate on the glass surface. Therefore, whichever metal is used, the glass surface 2a and the underlying metal layer 4 can be stably adhered.
【0031】上記請求項8に記載の発明に係わるガラス
パネルの周縁部封止構造の特徴構成は上記第5特徴構成
乃至第7特徴構成の具体例を示す構成であって、上記第
6特徴構成乃至第7特徴構成の何れかにおいて、その作
用効果を奏しながら、さらにその特徴的な作用効果とし
て低融点金属ロウ材層と被覆金属層との間の密着性をよ
り優れたものにする。つまり、図3に示した例に沿って
説明すれば、金、銀、白金、銅は何れも酸化還元電位の
高い金属であり、形成した被覆金属層5の表面に酸化被
膜が形成されにくいから、低融点金属ロウ材層6を形成
する金属ロウ付けをした際に、前記被覆金属層5と前記
低融点金属ロウ材層6との境界面に酸化被膜が介在する
おそれがないから、健全なロウ付けが可能になる。従っ
て、下地金属層4と被覆金属層5の間及び両側の被覆金
属層5の間の低融点金属ロウ材層6を介しての密着性を
確保できるようになる。The characteristic construction of the peripheral edge sealing structure for a glass panel according to the invention described in claim 8 is a construction showing specific examples of the fifth characteristic construction to the seventh characteristic construction, and the sixth characteristic construction. In any one of the seventh to seventh characteristic configurations, while exhibiting the action and effect, the adhesiveness between the low melting point metal brazing material layer and the coating metal layer is further enhanced as the characteristic action and effect. That is, to explain according to the example shown in FIG. 3, gold, silver, platinum, and copper are all metals having a high redox potential, and an oxide film is difficult to be formed on the surface of the formed coating metal layer 5. When the metal brazing for forming the low melting point metal brazing material layer 6 is performed, there is no possibility that an oxide film will be present at the boundary surface between the coating metal layer 5 and the low melting point metal brazing material layer 6, so that the soundness is sound. Brazing becomes possible. Therefore, it becomes possible to secure the adhesion between the base metal layer 4 and the coating metal layer 5 and between the coating metal layers 5 on both sides via the low melting point metal brazing material layer 6.
【0032】上記請求項9に記載の発明に係わるガラス
パネルの周縁部封止構造の特徴構成によれば、例えば鉛
錫合金、亜鉛錫合金、亜鉛、錫等を使用することによっ
て、より低い温度で、両ガラス板の周縁部を封止でき
る。According to the characteristic construction of the peripheral edge sealing structure of the glass panel according to the invention described in claim 9, for example, by using lead-tin alloy, zinc-tin alloy, zinc, tin, etc. Thus, the peripheral portions of both glass plates can be sealed.
【0033】請求項10に記載の発明に係わるガラスパ
ネルの周縁部封止構造の特徴構成によれば、低融点ロウ
材に銀又はアルミニウム、或いはその両者を含有させる
ことで、低融点ロウ材の靱性、強度を改善でき、各金属
層を金属接合した封止部の靱性並びに強度を増強でき
る。According to the characteristic construction of the peripheral edge sealing structure of the glass panel according to the tenth aspect of the present invention, the low melting point brazing material is made to contain silver or aluminum or both of them. The toughness and strength can be improved, and the toughness and strength of the sealed portion where the metal layers are metal-bonded can be enhanced.
【0034】請求項11に記載の発明に係わるガラスパ
ネルの周縁部封止構造の特徴構成によれば、粉粒体を間
隔保持材とすることで、空隙を挟むガラス板の間隔を狭
くし、且つ、その間隔の差を小さくして、干渉縞を見え
にくくすることができる。また、粉粒体のは位置密度を
高めれば、磨りガラスの風合いを醸し出すこともでき
る。According to the characteristic construction of the peripheral edge sealing structure for a glass panel according to the invention as defined in claim 11, the powder particles are used as the spacing material, whereby the spacing between the glass plates sandwiching the voids is narrowed, In addition, it is possible to reduce the difference in the intervals and make the interference fringes less visible. Further, the texture of the ground glass can be produced by increasing the positional density of the granular material.
【0035】上記請求項12に記載の発明に係わるガラ
スパネルの周縁部封止方法の特徴構成によれば、低融点
金属ロウ材を溶融させ、その後凝固させるだけでガラス
パネルの周縁部を封止できるようになる。例えば炉中ロ
ウ付けも容易になる。つまり、図1に示した例に沿って
説明すれば、両ガラス板1を重ねて、周縁部2に形成し
た下地金属層4の間に低融点金属ロウ材(例えば半田)
を介装し、その重ね合わせた状態で前記低融点金属ロウ
材を溶融させ、その後凝固させることで、簡単に前記周
縁部2を封止できる。従って、炉中ロウ付けも可能にな
り、例えば真空炉中で上記のように重ね合わせたガラス
板1を加熱すれば、両ガラス板1間の空隙は真空に維持
できるようになる。According to the characteristic construction of the method for sealing the peripheral portion of the glass panel according to the twelfth aspect of the invention, the peripheral portion of the glass panel is sealed only by melting the low melting point metal brazing material and then solidifying it. become able to. For example, brazing in a furnace becomes easy. That is, to explain according to the example shown in FIG. 1, both glass plates 1 are overlapped with each other, and a low melting point metal brazing material (for example, solder) is placed between the underlying metal layers 4 formed on the peripheral edge portion 2.
The low-melting-point metal brazing material is melted in the superposed state, and then the peripheral portion 2 can be easily sealed by solidifying. Therefore, brazing in the furnace is also possible. For example, if the glass plates 1 stacked as described above are heated in a vacuum furnace, the gap between the glass plates 1 can be maintained in vacuum.
【0036】上記請求項13に記載の発明に係わるガラ
スパネルの周縁部封止方法の特徴構成は上記第12特徴
構成の具体例を示す構成であって、上記第12特徴構成
の作用効果を奏しながら、さらにその特徴的な作用効果
として、下地金属層の形成が容易になる。つまり、図1
に示した例に沿って説明すれば、例えば、ニッケル、
銅、銀の中から選択された金属の電解液にガラス板周縁
部2の所定の領域を接触させることで、化学的に前記金
属を前記ガラス板周縁部2のガラス面2a上に析出させ
ることができるから、前記ガラス面2aに密着した下地
金属層4を形成することが可能になる。According to the thirteenth aspect of the present invention, the glass panel peripheral edge sealing method is characterized in that it is a specific example of the twelfth characteristic configuration, and has the operational effects of the twelfth characteristic configuration. However, as a further characteristic effect thereof, the formation of the base metal layer is facilitated. That is, FIG.
To explain along the example shown in, for example, nickel,
Chemically depositing the metal on the glass surface 2a of the glass plate peripheral portion 2 by bringing a predetermined region of the glass plate peripheral portion 2 into contact with an electrolytic solution of a metal selected from copper and silver. Therefore, it becomes possible to form the underlying metal layer 4 that is in close contact with the glass surface 2a.
【0037】上記請求項14に記載の発明に係わるガラ
スパネルの周縁部封止方法の特徴構成も上記第12特徴
構成の具体例を示す構成であって、上記第12特徴構成
の作用効果を奏しながら、さらにその特徴的な作用効果
として、ガラス板に密着した下地金属層の形成が容易に
なる。つまり、図1に示した例に沿って説明すれば、金
属クロムの蒸気にガラス板周縁部2の所定の領域を接触
させることで、前記ガラス板周縁部2のガラス面2a上
にクロムを蒸着することができる。真空中であれば雰囲
気中の酸素の分圧が低く、しかも蒸着するクロムの活性
は高く、蒸着するクロムがガラス中の酸素と結合しやす
いから、前記ガラス面2aに密着したクロム蒸着層4B
即ち下地金属層4を極めて薄く形成することが可能にな
る。The characteristic construction of the peripheral edge sealing method for a glass panel according to the invention of claim 14 is also a construction showing a specific example of the twelfth characteristic construction, and has the operational effect of the twelfth characteristic construction. However, as a further characteristic effect thereof, it becomes easy to form the underlying metal layer in close contact with the glass plate. That is, to explain according to the example shown in FIG. 1, chromium is vapor-deposited on the glass surface 2a of the glass plate peripheral portion 2 by bringing a predetermined area of the glass plate peripheral portion 2 into contact with vapor of metallic chromium. can do. In a vacuum, the partial pressure of oxygen in the atmosphere is low, the activity of the deposited chromium is high, and the deposited chromium easily bonds with oxygen in the glass. Therefore, the chromium deposition layer 4B adhered to the glass surface 2a.
That is, the base metal layer 4 can be formed extremely thin.
【0038】上記請求項15に記載の発明に係わるガラ
スパネルの周縁部封止方法の特徴構成によっても、低融
点金属ロウ材を溶融させ、その後凝固させるだけでガラ
スパネルの周縁部を封止できるようになる。例えば炉中
ロウ付けも容易になる。つまり、図3に示した例に沿っ
て説明すれば、下地金属層4を形成する金属としてガラ
ス面2aに密着形成することが容易な金属を選択すれ
ば、ガラス面2a上に密着した下地金属層4を容易に形
成でき、その下地金属層4の金属面上にロウ付けに適し
た即ち低融点金属ロウ材に対する濡れ性のよい金属材料
の被覆金属層5を形成することにより、前記被覆金属層
5の間にロウ材を介在させて加熱するだけで良好にロウ
付けできるようになる。According to the characteristic construction of the peripheral edge sealing method for a glass panel according to the fifteenth aspect of the invention, the peripheral edge of the glass panel can be sealed only by melting the low melting point metal brazing material and then solidifying it. Like For example, brazing in a furnace becomes easy. That is, according to the example shown in FIG. 3, if a metal that is easily adhered to the glass surface 2a is selected as the metal forming the base metal layer 4, the base metal adhered to the glass surface 2a is selected. The layer 4 can be easily formed, and by forming a coating metal layer 5 of a metal material suitable for brazing, that is, having a high wettability to a low melting point metal brazing material on the metal surface of the underlying metal layer 4, the coating metal is formed. Good brazing can be achieved simply by interposing a brazing material between the layers 5 and heating.
【0039】上記請求項16に記載の発明に係わるガラ
スパネルの周縁部封止方法の特徴構成は上記第15特徴
構成の好ましい例を示す構成であって、上記第15特徴
構成の作用効果を奏しながら、さらにその特徴的な作用
効果として、ロウ付けを容易にする。つまり、図3に示
した例に沿って説明すれば、下地金属層4を構成する金
属は、他の層の金属材料より酸化還元電位が低いから、
ガラス組成中の酸素と結合しやすく、ガラス面2a上に
強固に密着形成される。According to the sixteenth aspect of the present invention, the glass panel peripheral edge sealing method is characterized in that it is a preferable example of the fifteenth characteristic configuration, and has the operational effects of the fifteenth characteristic configuration. However, as a further characteristic effect thereof, brazing is facilitated. That is, according to the example shown in FIG. 3, since the metal forming the underlying metal layer 4 has a lower redox potential than the metal material of the other layers,
It is easily bonded to oxygen in the glass composition, and is firmly and closely formed on the glass surface 2a.
【0040】上記請求項17に記載の発明に係わるガラ
スパネルの周縁部封止方法の特徴構成は上記第16特徴
構成のさらに具体的な例を示す構成であって、上記第1
6特徴構成の作用効果に加えて、さらにその特徴的な作
用効果として、ガラス面との密着性をより高くした下地
金属層を容易に形成できる。つまり、図3に示した例に
沿って説明すれば、例えば、ニッケル、銅、銀の中から
選択された少なくとも一種の金属の電解液にガラス板周
縁部2の所定の領域を接触させることで、化学的に前記
金属を前記ガラス板周縁部2のガラス面2a上に良好な
密着状態で析出させることができる。The characteristic construction of the peripheral edge sealing method for a glass panel according to the seventeenth aspect of the present invention is a construction showing a more specific example of the sixteenth characteristic construction.
In addition to the function and effect of the sixth characteristic configuration, as a further characteristic function and effect, it is possible to easily form the underlying metal layer having higher adhesion to the glass surface. That is, to explain along the example shown in FIG. 3, for example, by contacting a predetermined region of the glass plate peripheral portion 2 with an electrolytic solution of at least one metal selected from nickel, copper, and silver. The metal can be chemically deposited on the glass surface 2a of the glass plate peripheral portion 2 in a good adhesion state.
【0041】上記請求項18に記載の発明に係わるガラ
スパネルの周縁部封止方法の特徴構成も上記第15特徴
構成の具体例を示す構成であって、上記第15特徴構成
の作用効果に加えて、さらにその特徴的な作用効果とし
て、ガラス板に密着した下地金属層の形成が容易にな
る。つまり、図4に示した例に沿って説明すれば、金属
クロムの蒸気にガラス板周縁部2の所定の領域を接触さ
せることで、前記ガラス板周縁部2のガラス面2a上に
クロムを物理蒸着してクロム蒸着層4Bを形成すること
ができる。真空中であれば雰囲気中の酸素の分圧が低
く、しかも蒸着するクロムの活性は高く、物理蒸着する
クロムがガラス中の酸素と結合しやすいから、前記ガラ
ス面2aに密着した下地金属層4としてクロム蒸着層4
Bを形成することが可能になる。しかも、蒸着するクロ
ムは極めて微細な粒子の状態でガラス面2aに蒸着する
から、クロム蒸着層4Bからなる下地金属層4を極めて
薄く形成することが可能である。The characteristic construction of the peripheral edge sealing method for a glass panel according to the eighteenth aspect of the invention is also a concrete example of the fifteenth characteristic construction, and in addition to the operational effects of the fifteenth characteristic construction. Further, as a characteristic effect thereof, it is easy to form the underlying metal layer that is in close contact with the glass plate. That is, referring to the example shown in FIG. 4, the chromium is physically deposited on the glass surface 2a of the glass plate peripheral portion 2 by bringing a predetermined region of the glass plate peripheral portion 2 into contact with the vapor of metallic chromium. The chromium vapor deposition layer 4B can be formed by vapor deposition. In a vacuum, the partial pressure of oxygen in the atmosphere is low, the activity of vapor-deposited chromium is high, and the vapor-deposited chromium is likely to bond with oxygen in the glass. Therefore, the underlying metal layer 4 adhered to the glass surface 2a is As chromium deposition layer 4
It becomes possible to form B. Moreover, since the chromium to be vapor-deposited is vapor-deposited on the glass surface 2a in the state of extremely fine particles, it is possible to form the base metal layer 4 composed of the chromium vapor-deposited layer 4B to be extremely thin.
【0042】上記請求項19に記載の発明に係わるガラ
スパネルの周縁部封止方法の特徴構成は上記第15特徴
構成乃至第18特徴構成の具体例を示す構成であって、
上記第15特徴構成乃至第18特徴構成の何れにおいて
も、夫々の作用効果を奏しながら、さらにその特徴的な
作用効果として、低融点金属ロウ材層と被覆金属層との
間の密着性をより優れたものにする。つまり、図3又は
図4に示した例に沿って説明すれば、金、銀、白金、銅
は何れも酸化還元電位の高い金属であり、表面に酸化被
膜が形成されにくいから、被覆金属層5の間を金属ロウ
付けをした際に、前記被覆金属層5と金属ロウ材層6と
の境界面に酸化被膜が介在するおそれがないから、健全
なロウ付けが可能になる。従って、下地金属層4と被覆
金属層5の間及び両側の被覆金属層5の間の低融点金属
ロウ材層6を介しての密着性を確保できるようになる。The characteristic constitution of the method for sealing a peripheral portion of a glass panel according to the invention described in claim 19 is a constitution showing specific examples of the fifteenth characteristic constitution to the eighteenth characteristic constitution,
In any of the fifteenth characteristic configuration to the eighteenth characteristic configuration described above, while exhibiting the respective operational effects, as a further characteristic operational effect, the adhesion between the low melting point metal brazing material layer and the coating metal layer is further improved. Make it excellent. That is, to explain according to the example shown in FIG. 3 or FIG. 4, all of gold, silver, platinum, and copper are metals having a high redox potential, and an oxide film is hard to be formed on the surface. When metal brazing is performed between the portions 5, there is no possibility that an oxide film will intervene on the boundary surface between the coating metal layer 5 and the metal brazing material layer 6, so that sound brazing can be performed. Therefore, it becomes possible to secure the adhesion between the base metal layer 4 and the coating metal layer 5 and between the coating metal layers 5 on both sides via the low melting point metal brazing material layer 6.
【0043】その結果、ガラスパネルの周縁部を比較的
低温の下で封止できるようになる。しかも、空隙を挟む
ガラス板の間の間隔を極めて小さく形成できるようにな
る。As a result, the peripheral portion of the glass panel can be sealed at a relatively low temperature. Moreover, it becomes possible to form a very small gap between the glass plates that sandwich the gap.
【0044】尚、上記の本発明の課題を解決するための
手段の説明において、図面を参照し、図面との対照を便
利にするために符号を記したが、上記図面の参照及び符
号の記入により本発明が参照図面他添付図面の構成に限
定されるものではない。In the above description of the means for solving the problems of the present invention, reference numerals are given to refer to the drawings and for convenience of comparison with the drawings. Therefore, the present invention is not limited to the configurations of the reference drawings and other accompanying drawings.
【0045】[0045]
【発明の実施の形態】以下、本発明に係わるガラスパネ
ルの周縁部封止構造について説明する。図3は本発明に
係わるガラスパネルの一例の要部縦断面図である。BEST MODE FOR CARRYING OUT THE INVENTION The peripheral edge sealing structure of a glass panel according to the present invention will be described below. FIG. 3 is a longitudinal sectional view of an essential part of an example of the glass panel according to the present invention.
【0046】図1に本発明によるガラスパネルの周縁部
封止構造の一例として二枚のガラス板の間に空隙を形成
したガラスパネルに関する例を示した。ガラスパネル
は、その空隙3を周囲雰囲気に対して気密に隔絶する周
縁部封止構造を備えている。FIG. 1 shows an example of a glass panel in which a gap is formed between two glass plates as an example of the peripheral edge sealing structure of the glass panel according to the present invention. The glass panel has a peripheral edge sealing structure that hermetically isolates the void 3 from the surrounding atmosphere.
【0047】前記周縁部封止構造として、互いに対向す
る前記一方のガラス板1Aと前記他方のガラス板1Bと
の間に、夫々の周縁部2の対向するガラス面2aに結合
した下地金属層4と、前記両下地金属層4上に金属接合
した被覆金属層5と、前記両被覆金属層5の間を気密に
金属接合した低融点金属ロウ材層6とを形成して五層構
造に構成してある。As the peripheral edge sealing structure, the underlying metal layer 4 bonded to the opposing glass surfaces 2a of each peripheral edge portion 2 between the one glass plate 1A and the other glass plate 1B facing each other. And a low-melting metal brazing material layer 6 in which metal is bonded to both of the base metal layers 4 and the cover metal layers 5 are hermetically bonded to each other to form a five-layer structure. I am doing it.
【0048】前記下地金属層4は、前記他の各層即ち被
覆金属層5及び低融点金属ロウ材層6を夫々構成する金
属材料の酸化還元電位の何れよりも低くなる金属材料で
形成することが好ましく、ニッケルを選択して形成す
る。尚、他の各層を構成する金属の酸化還元電位が高い
場合には前記ニッケルよりも酸化還元電位の高い金属を
選択可能であるが、ガラス面へのメッキの容易性に関す
る観点から、ガラスの組成との関わりがあって一概に定
めることはできない。The base metal layer 4 may be formed of a metal material having a lower oxidation reduction potential than that of the metal material forming each of the other layers, that is, the coating metal layer 5 and the low melting point metal brazing material layer 6. Preferably, nickel is selected and formed. When the redox potential of the metal forming each of the other layers is high, a metal having a higher redox potential than nickel can be selected, but from the viewpoint of easiness of plating on the glass surface, the glass composition There is a relationship with, and it cannot be determined in a general way.
【0049】前記被覆金属層5は、その有する酸化還元
電位が前記下地金属層4及び低融点金属ロウ材層6の夫
々を構成する金属が有する酸化還元電位の何れよりも高
い金属で形成することが好ましい。ここでは前記下地金
属としてのニッケルをガラス面2aに化学メッキして形
成したニッケルメッキ層4Aの上に前記酸化還元電位の
高い金属として、後述の低融点金属ロウとの馴染み易さ
と入手の容易性の観点から金を選択して金メッキする。
尚、銀、白金、銅等も酸化被膜を形成しにくい金属とし
て選択できる。The covering metal layer 5 is formed of a metal whose redox potential is higher than any of the redox potentials of the metals constituting the underlying metal layer 4 and the low melting point metal brazing material layer 6, respectively. Is preferred. Here, on the nickel plating layer 4A formed by chemically plating the glass surface 2a with nickel as the base metal, the metal having a high redox potential is used as a metal having a high redox potential, and is easily compatible with a low melting point metal wax described later and is easily available. From the point of view of choosing gold to be gold plated.
Incidentally, silver, platinum, copper and the like can also be selected as the metal which hardly forms an oxide film.
【0050】二枚のガラス板1A,1Bに形成された前
記被覆金属層5同士を気密に接合する前記低融点金属ロ
ウ材層6を形成する金属材料としては鉛錫半田が最も好
適である。殊に錫が62〜64重量%で残余を鉛とした
錫−鉛合金を用いれば、185℃以下の温度で溶融する
のでガラス板の加熱温度を低くできる。尚、他の配合の
鉛錫半田や、亜鉛錫半田、亜鉛、錫の何れもがガラス板
に加熱による悪影響を及ぼさないので好適に用いられ
る。Lead tin solder is most suitable as the metal material for forming the low melting point metal brazing material layer 6 for hermetically joining the coated metal layers 5 formed on the two glass plates 1A and 1B. In particular, when a tin-lead alloy containing 62 to 64% by weight of tin and the remainder being lead is used, it melts at a temperature of 185 ° C. or lower, so that the heating temperature of the glass plate can be lowered. It should be noted that lead-tin solder, zinc-tin solder, zinc, and tin having other formulations do not adversely affect the glass plate due to heating, and are therefore preferably used.
【0051】以上のように構成したガラスパネルは、ガ
ラス板周縁部2の封止構造を金属のメッキとロウ付け
(半田付け)に依っているから、メッキ層を薄くでき、
微少間隙のガラスパネルとなっている。In the glass panel constructed as described above, since the sealing structure of the glass plate peripheral portion 2 is based on metal plating and brazing (soldering), the plating layer can be made thin,
It is a glass panel with a small gap.
【0052】上記ガラスパネルの組立の工程の一例につ
いて以下に図5に沿って説明する。上記のように、ガラ
スパネルを構成する二枚のガラス板1A,1Bの間に空
隙3を形成して周縁部2を封止するのであるが、前記両
ガラス板周縁部2の所定の領域夫々に下地金属層4を化
学メッキにより積層形成する。下地金属として酸化還元
電位の低い金属の一つであるニッケルを用いた具体例を
示すと、前記ガラス板1の周縁部2で前記下地金属層4
の被覆を施す所定の領域に塩化パラジウム液で触媒処理
を施す。その後、公知の硫酸ニッケルと次亜燐酸塩を主
成分とする無電解ニッケルメッキ浴中に浸漬する(図5
(イ)参照)。所定時間後に取り出して水洗い乾燥すれ
ば前記下地金属層4としてのニッケルメッキ層4Aが得
られる。浸漬時間は概ね10〜20分程度であるが、ニ
ッケルメッキ層4Aの厚さと表面の光沢を維持するため
に、メッキ浴の温度等を調整するに伴って適宜設定す
る。尚、浴中浸漬に代えて、前記所定の領域に前記メッ
キ浴を形成する液を塗布してもよい。以上のようにし
て、例えば0.1〜2.0μmのニッケルメッキ層4A
を形成する。An example of the steps of assembling the above glass panel will be described below with reference to FIG. As described above, the gap 3 is formed between the two glass plates 1A and 1B constituting the glass panel to seal the peripheral edge portion 2. Then, the underlying metal layer 4 is laminated by chemical plating. As a specific example using nickel, which is one of the metals having a low redox potential, as the base metal, the base metal layer 4 is formed at the peripheral portion 2 of the glass plate 1.
A predetermined area to be coated with is subjected to catalytic treatment with a palladium chloride solution. Then, it is immersed in a known electroless nickel plating bath containing nickel sulfate and hypophosphite as main components (FIG. 5).
(See (a)). After a predetermined period of time, it is taken out, washed with water and dried to obtain the nickel-plated layer 4A as the base metal layer 4. The immersion time is generally about 10 to 20 minutes, but is appropriately set as the temperature of the plating bath and the like are adjusted in order to maintain the thickness of the nickel plating layer 4A and the surface gloss. Instead of the immersion in the bath, a liquid for forming the plating bath may be applied to the predetermined area. As described above, for example, the nickel plating layer 4A having a thickness of 0.1 to 2.0 μm
To form.
【0053】上記のようにして形成して前記両下地金属
層4夫々の面上にロウ付けに適した金属材料をメッキし
て夫々被覆金属層5を形成する(図5(ロ)参照)。上
記ニッケルメッキ層4Aの酸化を防止することが目的で
ある。被覆金属として酸化膜の生成しにくい金を用いる
例について具体的に説明すると、前記ニッケルメッキ層
4Aを直流電源の陰極側に接続してメッキ用電解液浴
(メッキ浴)中に浸漬し、金電極を同じメッキ浴中に浸
漬して陽極電圧を印加する。約0.2μmの金メッキ層
5Aを生成したところで電源をOFFにしてガラス板1
をメッキ浴から引き上げて水洗する。このメッキの時間
は、印加電圧、メッキ浴の成分及び温度に依存するもの
で、適宜調整する。尚、この金メッキは化学メッキでも
よく、銀、白金、銅等の他の金属をメッキしてもよい。
これら他の金属のメッキ方法も、電気メッキ、化学メッ
キ等任意に選択できる。また、上記金メッキ層5Aの厚
さは0.1μm以下であっても十分にその機能を果た
す。A metal material suitable for brazing is formed on the surfaces of both the base metal layers 4 formed as described above to form the coated metal layers 5 (see FIG. 5B). The purpose is to prevent oxidation of the nickel plating layer 4A. A specific description will be given of an example in which gold, which is hard to form an oxide film, is used as the coating metal. The nickel plating layer 4A is connected to the cathode side of a DC power source and immersed in an electrolytic bath for plating (plating bath). The electrodes are immersed in the same plating bath and an anodic voltage is applied. When the gold plating layer 5A of about 0.2 μm is formed, the power is turned off and the glass plate 1
Is removed from the plating bath and washed with water. The plating time depends on the applied voltage, the components of the plating bath and the temperature, and is appropriately adjusted. The gold plating may be chemical plating or other metal such as silver, platinum or copper may be plated.
The plating method of these other metals can be arbitrarily selected such as electroplating and chemical plating. Further, even if the thickness of the gold plating layer 5A is 0.1 μm or less, the function is sufficiently fulfilled.
【0054】前記両被覆金属層5を対向させた状態で前
記両ガラス板1を重ね合わせて、前記両被覆金属層5の
間で低融点金属ロウ材を溶融させ、その後凝固させるこ
とで前記両ガラス板1を間に空隙3を設けて、且つ前記
空隙3の周縁部を封止しながら一体化させてガラスパネ
ルを形成する(図5(ニ)参照)。この操作を具体的に
説明すると、前記金メッキ層5Aを形成したガラス板1
夫々を、溶融した亜鉛錫半田浴中に夫々の周縁部を短時
間浸漬して、前記金メッキ層5A上に低融点金属ロウ材
層6を形成するための半田膜8を形成しておく(図5
(ハ)参照)。前記被覆金属層5を金メッキ層5Aで形
成してあるから、下地金属層4の半田による侵食を防止
しながら、前記金メッキ層5A上に溶融半田膜が付着す
る。その後、一方のガラス板1Aを、前記溶融半田膜8
を形成した側を上にして平置し、必要ならば、前記空隙
3の間隔を確保するために、間隔保持材7として、例え
ば予め端部に錫をコートしてある直径50μmのニッケ
ル細線7Aを配列し、その上から他方のガラス板1Bを
被せて、全体を加熱して前記半田膜8を再度溶融し、冷
却して低融点金属ロウ材層6を形成する。この重ね合わ
せ、加熱、冷却を真空炉中で行えば、前記空隙3内は真
空に維持できるから、形成したガラスパネルは真空ガラ
スパネルとなる。尚、上記間隔保持材7の材料及び形状
は任意であり、ガラスであってもよく、他の金属であっ
てもよく、柱状、球状、粒状、平板状等任意の形状を採
用可能である。The glass plates 1 are overlapped with the coated metal layers 5 facing each other, the low melting point metal brazing material is melted between the coated metal layers 5, and then solidified to solidify the two. A glass panel 1 is formed by providing a gap 3 between the glass plates 1 and sealing the peripheral portion of the gap 3 while integrating them (see FIG. 5D). This operation will be specifically described. The glass plate 1 having the gold plating layer 5A formed thereon.
Each of the peripheral portions is immersed for a short time in a molten zinc tin solder bath to form a solder film 8 for forming the low melting point metal brazing material layer 6 on the gold plating layer 5A (FIG. 5
(See (c)). Since the coating metal layer 5 is formed of the gold plating layer 5A, the molten solder film adheres on the gold plating layer 5A while preventing the base metal layer 4 from being corroded by the solder. Then, one glass plate 1A is attached to the molten solder film 8
It is placed flat with the side on which it is formed facing up, and if necessary, in order to secure the spacing of the voids 3, as the spacing member 7, for example, a nickel fine wire 7A having a diameter of 50 μm and having tin coated in advance on the ends thereof. Are arranged, and the other glass plate 1B is covered from above, and the whole is heated to melt the solder film 8 again, and cooled to form the low melting point metal brazing material layer 6. If the stacking, heating, and cooling are performed in a vacuum furnace, the inside of the void 3 can be maintained in a vacuum, so that the formed glass panel becomes a vacuum glass panel. The material and shape of the spacing member 7 may be arbitrary, and may be glass or other metal, and may be columnar, spherical, granular, flat, or any other shape.
【0055】以上のように周縁部の封止方法を構成した
結果、極めて容易に極薄の空隙を形成したガラスパネル
を形成できた。As a result of constructing the peripheral edge sealing method as described above, it was possible to extremely easily form a glass panel having an extremely thin void.
【0056】〔別実施形態〕以下に、上記実施の形態に
説明した周縁部封止構造及び封止方法についての本発明
に係る異なる構造並びに方法について説明する。
〈1〉 上記実施の形態では周縁部封止構造を五層構造
にする例について説明したが、前記被覆金属層5は省略
可能で、互いに対向する前記一方のガラス板1Aと前記
他方のガラス板1Bとの間に、夫々の周縁部2の対向す
るガラス面2a夫々に結合した下地金属層4と、前記両
下地金属層4の間を気密に金属接合した低融点金属ロウ
材層6とを形成してもよい(例えば図1参照)。つま
り、上記製造方法の例では、ニッケル下地層を形成した
後、金メッキ層5Aを形成することなく直ちに溶融半田
被覆を施してもよい(図2参照)。前記被覆金属層5は
先述のように半田付け(即ちロウ付け)に際しての半田
(即ち低融点金属ロウ材の一例)の馴染みを良好にする
ためのものであり、下地金属層4に酸化膜がロウ付けを
妨害するほどに形成しない間にロウ付けを行うならば、
前記被覆金属層5を形成しなくても、ロウ付けを施すこ
とが可能であるからである。換言すれば、前記被覆金属
層5はその後のロウ付けの工程を簡略化するものであ
る。[Other Embodiments] Hereinafter, different structures and methods according to the present invention regarding the peripheral edge sealing structure and the sealing method described in the above embodiments will be described. <1> In the above embodiment, an example in which the peripheral edge sealing structure has a five-layer structure has been described, but the coating metal layer 5 can be omitted, and the one glass plate 1A and the other glass plate facing each other can be omitted. 1B, a base metal layer 4 bonded to each of the opposing glass surfaces 2a of the respective peripheral edge portions 2, and a low melting point metal brazing material layer 6 in which the base metal layers 4 are hermetically metal-bonded to each other. It may be formed (see FIG. 1, for example). That is, in the example of the manufacturing method described above, after forming the nickel underlayer, the molten solder coating may be applied immediately without forming the gold plating layer 5A (see FIG. 2). As described above, the coating metal layer 5 is for improving the familiarity of solder (that is, an example of a low melting point metal brazing material) at the time of soldering (that is, brazing), and an oxide film is formed on the base metal layer 4. If brazing is done while not forming enough to interfere with brazing,
This is because brazing can be performed without forming the coating metal layer 5. In other words, the coating metal layer 5 simplifies the subsequent brazing process.
【0057】〈2〉 上記実施の形態では前記下地金属
層4にニッケルメッキ層4Aを用いた例を説明したが、
前記下地金属層4は、銀を化学メッキして形成したもの
であってもよい。また、公知の銅メッキして形成したも
のであってもよい。何れの金属を選択した場合において
も、その上に被覆金属層5を形成してあれば、その後の
ロウ付け工程を容易にし、或いは簡素化できる。<2> In the above embodiment, an example in which the nickel plating layer 4A is used as the base metal layer 4 has been described.
The base metal layer 4 may be formed by chemically plating silver. It may also be formed by known copper plating. Whichever metal is selected, if the coating metal layer 5 is formed thereon, the subsequent brazing process can be facilitated or simplified.
【0058】〈3〉 以上は、前記下地金属層4を形成
するのに、化学メッキによる例を説明したが、前記下地
金属層4が、化学メッキによらずクロムを前記対向する
ガラス面2aに積層形成したものであってもよい。例え
ば前記クロムを積層形成するのに、物理蒸着法(例えば
PVD)によりクロム蒸着層4Bを形成したものであっ
てもよい(例えば図4参照)。つまり、真空中でガラス
面上にクロムの極微細粒子が沈積積層した場合には、酸
素と結合していない、しかも活性のクロムがガラスに接
するから、ガラス中の酸素と極めて結合しやすく、物理
的に安定した結合状態が得られる。尚、上記物理蒸着法
には、真空中でクロムターゲットに電子線或いはイオン
ビームを照射してクロム極微粒子を対象物(この場合に
はガラス板1)上に沈積積層させることをも包含する。
この場合には、クロムの極微粒子が飛散する際に荷電粒
子による衝撃を受けているから、ガラス面2aに到達す
るクロム極微粒子は活性化されており、ガラスとの密着
性は良好となる。また、CVDによる蒸着であってもよ
く、この場合の下地金属層4とガラス板1との間の密着
性はさらによくなる。<3> In the above, an example in which chemical plating is used to form the base metal layer 4 has been described. However, the base metal layer 4 applies chromium to the opposing glass surface 2a without chemical plating. It may be laminated. For example, the chromium vapor deposition layer 4B may be formed by a physical vapor deposition method (for example, PVD) in order to form the chromium in a laminated manner (see, for example, FIG. 4). In other words, when ultrafine particles of chromium are deposited and laminated on the glass surface in a vacuum, they are not bonded to oxygen, and since active chromium contacts the glass, it is extremely easy to bond with oxygen in the glass and A stable binding state is obtained. The physical vapor deposition method also includes irradiating a chromium target with an electron beam or an ion beam in a vacuum to deposit and stack chromium ultrafine particles on an object (in this case, the glass plate 1).
In this case, since the ultrafine particles of chromium are impacted by the charged particles when they are scattered, the ultrafine chromium particles reaching the glass surface 2a are activated and the adhesion to the glass becomes good. Alternatively, vapor deposition by CVD may be used, and in this case, the adhesion between the base metal layer 4 and the glass plate 1 is further improved.
【0059】〈4〉 以上は、前記下地金属層4に、ニ
ッケル、銀、銅、クロムの何れかを用いた例を示した
が、要するに、前記下地金属層4を、前記被覆金属層
5、前記低融点金属ロウ材層6を構成する他の金属材料
の酸化還元電位に対して最も低くなるように、金属材料
を選択して形成してあればよい。<4> In the above, an example in which any one of nickel, silver, copper and chromium is used for the base metal layer 4 has been described. In short, the base metal layer 4 and the coating metal layer 5, It suffices that the metal material is selected and formed so as to be the lowest with respect to the redox potential of the other metal material forming the low melting point metal brazing material layer 6.
【0060】〈5〉 上記実施の形態においては、前記
被覆金属層5を、金メッキ層5Aで形成した例について
説明したが、この他銀、白金又は銅の何れかの金属で形
成してあってもよい。さらに、前記被覆金属層5は、上
述のように前記下地金属層4に対して金属ロウ材の馴染
みをよくするための被覆であるから、省略可能である
が、上記例示した金属以外にも選択可能な金属があり、
要は、酸化しにくい金属で、好ましくは前記下地金属層
4上に被膜形成しやすいもので、前記下地金属層4を形
成する金属に比して酸化還元電位の高い金属を用いるこ
とが可能である。さらに、その上に被着する金属ロウ材
と同等か或いはそれよりも高い酸化還元電位を有するも
のであることが好ましい。<5> In the above embodiment, an example in which the coating metal layer 5 is formed of the gold plating layer 5A has been described. However, in addition to this, it is formed of any metal of silver, platinum or copper. Good. Further, since the coating metal layer 5 is a coating for improving the familiarity of the metal brazing material with the base metal layer 4 as described above, it can be omitted, but a metal other than the above-exemplified metals is selected. There are possible metals,
In short, it is possible to use a metal that is hard to oxidize, preferably one that is easy to form a film on the underlying metal layer 4, and has a higher redox potential than the metal that forms the underlying metal layer 4. is there. Further, it is preferable that it has a redox potential equal to or higher than that of the metal brazing material deposited thereon.
【0061】〈6〉 上記実施の形態においては、下地
金属層4上に被覆金属層5を被膜形成し、その被覆金属
層5上に溶融半田層を形成して冷却し、形成した半田膜
8即ち低融点金属ロウ材層6同士を対向させた状態で前
記両ガラス板1を重ね合わせて、前記両下地金属層4の
間で半田を再び溶融させ、その後凝固させる例について
説明したが、前記下地金属層4の間に固形の低融点金属
ロウ材を介在させて両ガラス板1を重ね合わせ、加熱し
て前記低融点金属ロウ材を溶融させ、再び凝固させて低
融点金属ロウ材層6を形成するようにしてもよく、これ
が前記被覆金属層5同士の間であってもよい。本発明の
要点は、両ガラス板1の周縁部間を間隔保持材7を兼ね
うる金属層で直接接合してある或いは直接接合する点に
ある。尚、前記低融点金属ロウ材としてステアリン酸或
いは尿素等を成分とするフラックスと半田微粒子とを混
練した半田ペーストを前記下地金属層4或いは被覆金属
層5の上に塗布しておいて、これを重ねて加熱すること
でもガラスパネルの周縁部封止構造を形成できる。<6> In the above embodiment, the coating metal layer 5 is formed on the underlying metal layer 4, a molten solder layer is formed on the coating metal layer 5, and the solder film 8 is formed by cooling. That is, an example has been described in which the glass plates 1 are overlapped with the low-melting metal brazing material layers 6 facing each other, the solder is melted again between the base metal layers 4, and then the solder is solidified. Both glass plates 1 are stacked with a solid low-melting metal brazing material interposed between the base metal layers 4, and the low-melting metal brazing material is melted by heating and then solidified again to lower the low-melting metal brazing material layer 6 May be formed, which may be between the coated metal layers 5. The main point of the present invention is that the peripheral portions of both glass plates 1 are directly joined or directly joined by a metal layer which can also serve as the spacing member 7. As the low-melting metal brazing material, a solder paste obtained by kneading a flux containing stearic acid, urea or the like as a component and solder fine particles is applied on the base metal layer 4 or the coating metal layer 5 and then applied. By overlapping and heating, the peripheral edge sealing structure of the glass panel can be formed.
【0062】〈7〉 上記低融点金属ロウ材としては、
上記実施の形態に示した鉛錫半田、亜鉛錫半田、亜鉛、
錫の中では後三者が環境保全の観点からは好ましいが、
亜鉛、錫の他の合金も使用可能で、上記以外にビスマス
等の低融点金属或いはその合金をロウ材として用いるこ
とも可能である。<7> As the low melting point metal brazing material,
Lead-tin solder, zinc-tin solder, zinc shown in the above embodiment,
Of the tin, the latter three are preferable from the viewpoint of environmental protection,
Other alloys of zinc and tin can be used, and in addition to the above, a low melting point metal such as bismuth or its alloy can be used as the brazing material.
【0063】〈8〉 上記間隔保持剤7として、粒径が
0.1μm以上10μm未満(望むべくは0.1〜2μ
m)の粉粒体、例えば、珪砂、溶融アルミナ、フライア
ッシュや、セラミック、金属、ガラス等の微粉体を、ラ
ンダムに散布したものであってもよく、安価で、間隔保
持材が目立ちにくく、また、干渉縞も目立たない、見栄
えのよいガラスパネルを形成できる。この場合は、下地
金属層4、被覆金属層5及び低融点金属ロウ材層6の合
計厚さを前記粉粒体の径に合わせて、0.1〜10μm
とする。<8> The spacing agent 7 has a particle size of 0.1 μm or more and less than 10 μm (0.1 to 2 μm if desired).
m) powder, for example, silica sand, fused alumina, fly ash, or fine powder of ceramic, metal, glass, or the like may be randomly dispersed, which is inexpensive, and the spacing material is inconspicuous. Further, it is possible to form a good-looking glass panel in which interference fringes are not noticeable. In this case, the total thickness of the base metal layer 4, the coating metal layer 5, and the low melting point metal brazing material layer 6 is set to 0.1 to 10 μm according to the diameter of the powder or granular material.
And
【0064】〈9〉 上記実施の形態においては、ガラ
ス板の材質について具体的に示していないが、これは特
にガラス材質を特定する必要がないからであり、ソーダ
珪酸ガラス(ソーダ石灰シリカガラス)、ホウ珪酸ガラ
ス、アルミノ珪酸ガラスや、各種結晶化ガラスに適用可
能である。<9> In the above embodiments, the material of the glass plate is not specifically shown, but this is because it is not necessary to specify the glass material, soda silicate glass (soda lime silica glass). It can be applied to borosilicate glass, aluminosilicate glass, and various crystallized glasses.
【0065】〈10〉本発明に係るガラスパネルは、例
えば建築用、船舶車両用、プラズマディスプレイの表面
ガラス、冷蔵庫の開閉扉や壁部、保温装置の開閉扉や壁
部等の機器用材料としても用いられる多用途のものであ
る。<10> The glass panel according to the present invention is used, for example, as a material for equipment for construction, for marine vehicles, surface glass for plasma displays, opening / closing doors and walls of refrigerators, opening / closing doors and walls of heat retaining devices, and the like. Is also versatile.
【0066】〈11〉前記ガラスパネルを構成する両ガ
ラス板1は、寸法形状に限定のあるものではなく、任意
の形状寸法に形成可能である。<11> Both glass plates 1 constituting the glass panel are not limited in size and shape, and can be formed in any shape and size.
【図1】本発明に係わるガラスパネルの一例を示す一部
切り欠き斜視図FIG. 1 is a partially cutaway perspective view showing an example of a glass panel according to the present invention.
【図2】本発明に係わるガラスパネルの周縁部封止構造
の一例を示す要部断面図FIG. 2 is a sectional view of an essential part showing an example of a peripheral edge sealing structure of a glass panel according to the present invention.
【図3】本発明に係わるガラスパネルの周縁部封止構造
の他の例を示す要部断面図FIG. 3 is a sectional view of an essential part showing another example of the peripheral edge sealing structure for a glass panel according to the present invention.
【図4】本発明に係わるガラスパネルの周縁部封止構造
の他の例を示す要部断面図FIG. 4 is a sectional view of an essential part showing another example of the peripheral edge sealing structure for a glass panel according to the present invention.
【図5】本発明に係わるガラスパネルの製造工程の一例
を示す工程説明図FIG. 5 is a process explanatory view showing an example of a manufacturing process of the glass panel according to the present invention.
【図6】従来のガラスパネルの一例を示す一部切り欠き
斜視図FIG. 6 is a partially cutaway perspective view showing an example of a conventional glass panel.
1 ガラス板 1A 一方のガラス板 1B 他方のガラス板 2 ガラス板周縁部 2a ガラス板周縁部のガラス面 3 空隙 4 下地金属層 4B クロム蒸着層 5 被覆金属層 6 低融点金属ロウ材層 1 glass plate 1A One glass plate 1B The other glass plate 2 Glass plate periphery 2a The glass surface of the peripheral edge of the glass plate 3 void 4 Base metal layer 4B Chromium vapor deposition layer 5 Cover metal layer 6 Low melting point metal brazing material layer
───────────────────────────────────────────────────── フロントページの続き (72)発明者 金城 芳雄 東京都葛飾区堀切1丁目18番1号 株式会 社ナウケミカル内 (72)発明者 坂口 浩一 大阪府大阪市中央区道修町三丁目5番11号 日本板硝子株式会社内 Fターム(参考) 2E016 AA01 AA04 AA06 AA07 BA01 BA08 CA01 CB01 CC02 EA00 EA01 EA03 FA02 4G061 AA13 AA18 BA01 BA02 BA07 BA10 CB02 CB04 CB14 CD02 CD25 DA30 ─────────────────────────────────────────────────── ─── Continued front page (72) Inventor Yoshio Kaneshiro 1-18-1 Horikiri, Katsushika-ku, Tokyo Stock market Inside Now Chemical (72) Inventor Koichi Sakaguchi 3-5-11 Doshomachi, Chuo-ku, Osaka-shi, Osaka Within Nippon Sheet Glass Co., Ltd. F-term (reference) 2E016 AA01 AA04 AA06 AA07 BA01 BA08 CA01 CB01 CC02 EA00 EA01 EA03 FA02 4G061 AA13 AA18 BA01 BA02 BA07 BA10 CB02 CB04 CB14 CD02 CD25 DA30
Claims (19)
ガラスパネルにおいて、その空隙を周囲雰囲気に対して
気密に隔絶するガラスパネルの周縁部封止構造であっ
て、 互いに対向する前記一方のガラス板と前記他方のガラス
板との間に、夫々の周縁部の対向するガラス面夫々に結
合した下地金属層と、前記両下地金属層の間を気密に金
属接合した低融点金属ロウ材層とを形成してあるガラス
パネルの周縁部封止構造。1. A glass panel in which a void is formed between a plurality of glass plates, which is a glass panel peripheral edge sealing structure for airtightly isolating the void from the surrounding atmosphere, wherein the one glass faces each other. Between the plate and the other glass plate, a base metal layer bonded to each of the opposing glass surfaces of each peripheral portion, and a low melting point metal brazing material layer in which the base metal layers are hermetically metal-bonded to each other. A peripheral sealing structure for a glass panel in which the above is formed.
ロムを前記対向するガラス面に積層形成したものである
請求項1記載のガラスパネルの周縁部封止構造。2. The peripheral edge sealing structure for a glass panel according to claim 1, wherein the underlying metal layer is formed by laminating nickel, silver or chromium on the opposing glass surfaces.
記対向するガラス面に化学メッキして形成したものであ
る請求項2記載のガラスパネルの周縁部封止構造。3. The glass panel peripheral edge sealing structure according to claim 2, wherein the underlying metal layer is formed by chemically plating nickel or silver on the opposing glass surfaces.
着法によりクロム蒸着層を形成したものである請求項2
記載のガラスパネルの周縁部封止構造。4. A chromium vapor deposition layer is formed by a physical vapor deposition method to form the chromium in a laminated manner.
The peripheral edge sealing structure of the glass panel described.
ガラスパネルにおいて、その空隙を周囲雰囲気に対して
気密に隔絶するガラスパネルの周縁部封止構造であっ
て、 互いに対向する前記一方のガラス板と前記他方のガラス
板との間に、夫々の周縁部の対向するガラス面に結合し
た下地金属層と、前記両下地金属層上に金属接合した被
覆金属層と、前記両被覆金属層の間を気密に金属接合し
た低融点金属ロウ材層とを形成してあるガラスパネルの
周縁部封止構造。5. A glass panel in which a void is formed between a plurality of glass plates, which is a glass panel peripheral edge sealing structure for airtightly isolating the void from the ambient atmosphere, wherein the one glass faces each other. Between the plate and the other glass plate, the underlying metal layer bonded to the opposing glass surfaces of the respective peripheral edge portions, the coating metal layer metal-bonded to both the underlying metal layers, and the both coating metal layers A low-melting-point metal brazing material layer, which is airtightly metal-bonded to each other, is a peripheral edge sealing structure of a glass panel.
する金属材料の酸化還元電位に対して最も低くなるよう
に、金属材料を選択して形成してある請求項5記載のガ
ラスパネルの周縁部封止構造。6. The glass panel according to claim 5, wherein the base metal layer is formed by selecting a metal material so that it is the lowest with respect to the redox potential of the metal material forming each of the other layers. The peripheral edge sealing structure.
銀、銅の中から選択された金属で形成してある請求項6
記載のガラスパネルの周縁部封止構造。7. The base metal layer is formed of nickel, chromium,
7. A metal selected from silver and copper.
The peripheral edge sealing structure of the glass panel described.
錫の中から選択された金属で形成してある請求項5〜7
の何れか1項に記載のガラスパネルの周縁部封止構造。8. The coating metal layer is formed of gold, silver, platinum, copper,
8. A metal selected from tin.
The peripheral edge sealing structure for a glass panel according to claim 1.
材料が、ビスマス、鉛、錫、亜鉛、インジウム、アンチ
モンの何れか1種又は2種以上を主成分とするものであ
る請求項1〜8の何れか1項に記載のガラスパネルの周
縁部封止構造。9. The metal material forming the low-melting-point metal brazing material layer contains, as a main component, one or more of bismuth, lead, tin, zinc, indium, and antimony. The glass panel peripheral edge sealing structure according to any one of items 1 to 8.
少なくとも一方を副成分として含有するものである請求
項9記載のガラスパネルの周縁部封止構造。10. The sealing structure for a peripheral portion of a glass panel according to claim 9, wherein the metal material contains at least one of silver and aluminum as an accessory component.
0μm未満の粉粒体を分散して介在させてある請求項1
〜10の何れか1項に記載のガラスパネルの周縁部封止
構造。11. A particle size of 0.1 μm or more in the voids 1
The powder particles of less than 0 μm are dispersed and interposed.
10. The peripheral sealing structure for a glass panel according to any one of items 10 to 10.
たガラスパネルの空隙を周囲雰囲気に対して気密に隔絶
するガラスパネルの周縁部封止方法であって、 前記両ガラス板周縁部の所定の領域夫々に下地金属層を
積層形成し、 前記下地金属層を対向させた状態で前記両板ガラスを重
ね合わせて、 前記両下地金属層の間で低融点金属ロウ材を溶融させ、
その後凝固させるガラスパネルの周縁部封止方法。12. A method for sealing a peripheral portion of a glass panel, wherein a gap between a plurality of glass plates formed in a glass panel is airtightly isolated from an ambient atmosphere. A base metal layer is formed in each of the regions, and the two plate glasses are stacked with the base metal layer facing each other, and the low-melting metal brazing material is melted between the base metal layers,
A method for sealing a peripheral portion of a glass panel which is subsequently solidified.
ッケル、銅、銀の中から選択された金属をメッキする請
求項12記載のガラスパネルの周縁部封止方法。13. The method for sealing a peripheral portion of a glass panel according to claim 12, wherein a metal selected from nickel, copper, and silver is plated to form the underlying metal layer in a laminated manner.
属クロムを物理蒸着法により形成する請求項12記載の
ガラスパネルの周縁部封止方法。14. The method for sealing a peripheral edge portion of a glass panel according to claim 12, wherein metal chromium is formed by a physical vapor deposition method to form the underlying metal layer in a laminated manner.
たガラスパネルの空隙を周囲雰囲気に対して気密に隔絶
するガラスパネルの周縁部封止方法であって、 前記両ガラス板周縁部の所定の領域夫々に下地金属層を
積層形成し、 前記両下地金属層夫々の面上にロウ付けに適した金属材
料の被覆金属層を形成し、 前記両被覆金属層を対向させた状態で前記両板ガラスを
重ね合わせて、 前記両被覆金属層の間で低融点金属ロウ材を溶融させ、
その後凝固させるガラスパネルの周縁部封止方法。15. A method of sealing a peripheral edge of a glass panel, wherein a void of a glass panel in which a void is formed between a plurality of glass plates is airtightly isolated from an ambient atmosphere. A base metal layer is laminated on each of the regions, a coating metal layer of a metal material suitable for brazing is formed on the surface of each of the base metal layers, and the both glass plates are opposed to each other. By superposing, melting the low melting point metal brazing material between the both coating metal layers,
A method for sealing a peripheral portion of a glass panel which is subsequently solidified.
被覆金属層を形成する金属材料及び前記低融点金属ロウ
材の何れよりも酸化還元電位の低い金属材料を用いる請
求項15記載のガラスパネルの周縁部封止方法。16. The glass according to claim 15, wherein a metal material having a lower redox potential than any of the metal material forming the coating metal layer and the low melting point metal brazing material is used to form the base metal layer. A method for sealing the peripheral edge of a panel.
ッケル、銅、銀の中から選択された少なくとも一種の金
属をメッキする請求項16記載のガラスパネルの周縁部
封止方法。17. The method for sealing a peripheral portion of a glass panel according to claim 16, wherein at least one metal selected from nickel, copper, and silver is plated to form the underlying metal layer in a laminated manner.
属クロムを物理蒸着する請求項15記載のガラスパネル
の周縁部封止方法。18. The method of encapsulating a peripheral portion of a glass panel according to claim 15, wherein metal chromium is physically vapor-deposited when the underlying metal layer is laminated.
銀、白金、銅の中から選択された少なくとも一種の金属
材料をメッキする請求項15〜18の何れか1項にに記
載のガラスパネルの周縁部封止方法。19. Gold for forming the coating metal layer,
The glass panel peripheral edge sealing method according to any one of claims 15 to 18, wherein at least one metal material selected from silver, platinum, and copper is plated.
Priority Applications (1)
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JP10226735A JP2000063156A (en) | 1998-08-11 | 1998-08-11 | Sealing structure for peripheral part of glass panel and sealing method |
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JP10226735A JP2000063156A (en) | 1998-08-11 | 1998-08-11 | Sealing structure for peripheral part of glass panel and sealing method |
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WO2011063704A1 (en) | 2009-11-27 | 2011-06-03 | Luoyang Landglass Technology Co., Ltd. | Compound sealing method for glass plates |
WO2012050308A3 (en) * | 2010-10-11 | 2012-07-19 | Lg Electronics Inc. | Vacuum insulation glass panel and refrigerator having the same |
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