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IT1318937B1 - Metodo per la produzione di dispositivi getter porosi con ridottaperdita di particelle e dispositivi cosi' prodotti - Google Patents

Metodo per la produzione di dispositivi getter porosi con ridottaperdita di particelle e dispositivi cosi' prodotti

Info

Publication number
IT1318937B1
IT1318937B1 IT2000MI002099A ITMI20002099A IT1318937B1 IT 1318937 B1 IT1318937 B1 IT 1318937B1 IT 2000MI002099 A IT2000MI002099 A IT 2000MI002099A IT MI20002099 A ITMI20002099 A IT MI20002099A IT 1318937 B1 IT1318937 B1 IT 1318937B1
Authority
IT
Italy
Prior art keywords
devices
deposition
particles
getter
produced
Prior art date
Application number
IT2000MI002099A
Other languages
English (en)
Inventor
Andrea Conte
Marco Moraja
Original Assignee
Getters Spa
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Getters Spa filed Critical Getters Spa
Publication of ITMI20002099A0 publication Critical patent/ITMI20002099A0/it
Priority to IT2000MI002099A priority Critical patent/IT1318937B1/it
Priority to TW090123227A priority patent/TWI278523B/zh
Priority to AU2001295881A priority patent/AU2001295881A1/en
Priority to RU2003112221/02A priority patent/RU2253695C2/ru
Priority to EP01976619A priority patent/EP1322795B1/en
Priority to AT01976619T priority patent/ATE370261T1/de
Priority to KR1020037004244A priority patent/KR100784584B1/ko
Priority to PCT/IT2001/000488 priority patent/WO2002027058A1/en
Priority to CNB018164315A priority patent/CN1318642C/zh
Priority to JP2002530818A priority patent/JP2004509757A/ja
Priority to DE60130001T priority patent/DE60130001T2/de
Priority to US09/967,234 priority patent/US6620297B2/en
Publication of ITMI20002099A1 publication Critical patent/ITMI20002099A1/it
Priority to US10/389,382 priority patent/US6783696B2/en
Application granted granted Critical
Publication of IT1318937B1 publication Critical patent/IT1318937B1/it
Priority to US10/871,353 priority patent/US7122100B2/en
Priority to HK05105847A priority patent/HK1073337A1/xx

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J7/00—Details not provided for in the preceding groups and common to two or more basic types of discharge tubes or lamps
    • H01J7/14—Means for obtaining or maintaining the desired pressure within the vessel
    • H01J7/18—Means for absorbing or adsorbing gas, e.g. by gettering
    • H01J7/183—Composition or manufacture of getters
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B22—CASTING; POWDER METALLURGY
    • B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
    • B22F3/00—Manufacture of workpieces or articles from metallic powder characterised by the manner of compacting or sintering; Apparatus specially adapted therefor ; Presses and furnaces
    • B22F3/10—Sintering only
    • B22F3/11—Making porous workpieces or articles
    • B22F3/1146—After-treatment maintaining the porosity
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C1/00—Making non-ferrous alloys
    • C22C1/04—Making non-ferrous alloys by powder metallurgy
    • C22C1/045—Alloys based on refractory metals
    • C22C1/0458—Alloys based on titanium, zirconium or hafnium
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/14—Metallic material, boron or silicon
    • C23C14/16—Metallic material, boron or silicon on metallic substrates or on substrates of boron or silicon
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B22—CASTING; POWDER METALLURGY
    • B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
    • B22F2998/00—Supplementary information concerning processes or compositions relating to powder metallurgy
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/12—All metal or with adjacent metals
    • Y10T428/12014—All metal or with adjacent metals having metal particles
    • Y10T428/12021—All metal or with adjacent metals having metal particles having composition or density gradient or differential porosity
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/12—All metal or with adjacent metals
    • Y10T428/12479—Porous [e.g., foamed, spongy, cracked, etc.]
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
    • Y10T428/24273—Structurally defined web or sheet [e.g., overall dimension, etc.] including aperture
    • Y10T428/24298—Noncircular aperture [e.g., slit, diamond, rectangular, etc.]

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Solid-Sorbent Or Filter-Aiding Compositions (AREA)
  • Common Detailed Techniques For Electron Tubes Or Discharge Tubes (AREA)
  • Vessels, Lead-In Wires, Accessory Apparatuses For Cathode-Ray Tubes (AREA)
  • Powder Metallurgy (AREA)
  • Physical Vapour Deposition (AREA)
  • Gas-Filled Discharge Tubes (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Catalysts (AREA)
IT2000MI002099A 2000-09-27 2000-09-27 Metodo per la produzione di dispositivi getter porosi con ridottaperdita di particelle e dispositivi cosi' prodotti IT1318937B1 (it)

Priority Applications (15)

Application Number Priority Date Filing Date Title
IT2000MI002099A IT1318937B1 (it) 2000-09-27 2000-09-27 Metodo per la produzione di dispositivi getter porosi con ridottaperdita di particelle e dispositivi cosi' prodotti
TW090123227A TWI278523B (en) 2000-09-27 2001-09-20 Method for manufacturing porous getter devices with reduced particle loss and devices so manufactured
CNB018164315A CN1318642C (zh) 2000-09-27 2001-09-25 降低颗粒物损失的多孔吸气剂器件及其制备方法
JP2002530818A JP2004509757A (ja) 2000-09-27 2001-09-25 粒子損失を低減した多孔質ゲッター素子およびその製造方法
EP01976619A EP1322795B1 (en) 2000-09-27 2001-09-25 Porous getter devices with reduced particle loss and method for their manufacture
AT01976619T ATE370261T1 (de) 2000-09-27 2001-09-25 Poröse gettervorrichtungen mit verringertem teilchenverlust und verfahren zu deren herstellung
KR1020037004244A KR100784584B1 (ko) 2000-09-27 2001-09-25 입자 손실이 작은 다공성 게터 장치 및 그 제조 방법
PCT/IT2001/000488 WO2002027058A1 (en) 2000-09-27 2001-09-25 Porous getter devices with reduced particle loss and method for their manufacture
AU2001295881A AU2001295881A1 (en) 2000-09-27 2001-09-25 Porous getter devices with reduced particle loss and method for their manufacture
RU2003112221/02A RU2253695C2 (ru) 2000-09-27 2001-09-25 Пористые газопоглотительные устройства со сниженной потерей частиц и способ их изготовления
DE60130001T DE60130001T2 (de) 2000-09-27 2001-09-25 Poröse gettervorrichtungen mit verringertem teilchenverlust und verfahren zu deren herstellung
US09/967,234 US6620297B2 (en) 2000-09-27 2001-09-27 Porous getter devices with reduced particle loss and method for manufacturing same
US10/389,382 US6783696B2 (en) 2000-09-27 2003-03-14 Porous getter devices with reduced particle loss and method for manufacturing same
US10/871,353 US7122100B2 (en) 2000-09-27 2004-06-18 Porous getter devices with reduced particle loss and method for manufacturing same
HK05105847A HK1073337A1 (en) 2000-09-27 2005-07-11 Porous gettr devices with reduced particle loss and method for their manufacture

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
IT2000MI002099A IT1318937B1 (it) 2000-09-27 2000-09-27 Metodo per la produzione di dispositivi getter porosi con ridottaperdita di particelle e dispositivi cosi' prodotti

Publications (3)

Publication Number Publication Date
ITMI20002099A0 ITMI20002099A0 (it) 2000-09-27
ITMI20002099A1 ITMI20002099A1 (it) 2002-03-27
IT1318937B1 true IT1318937B1 (it) 2003-09-19

Family

ID=11445869

Family Applications (1)

Application Number Title Priority Date Filing Date
IT2000MI002099A IT1318937B1 (it) 2000-09-27 2000-09-27 Metodo per la produzione di dispositivi getter porosi con ridottaperdita di particelle e dispositivi cosi' prodotti

Country Status (13)

Country Link
US (3) US6620297B2 (it)
EP (1) EP1322795B1 (it)
JP (1) JP2004509757A (it)
KR (1) KR100784584B1 (it)
CN (1) CN1318642C (it)
AT (1) ATE370261T1 (it)
AU (1) AU2001295881A1 (it)
DE (1) DE60130001T2 (it)
HK (1) HK1073337A1 (it)
IT (1) IT1318937B1 (it)
RU (1) RU2253695C2 (it)
TW (1) TWI278523B (it)
WO (1) WO2002027058A1 (it)

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WO2002006344A2 (en) * 2000-06-08 2002-01-24 Baylor College Of Medicine Rtvp based compositions and methods for the treatment of prostate cancer
IT1318937B1 (it) * 2000-09-27 2003-09-19 Getters Spa Metodo per la produzione di dispositivi getter porosi con ridottaperdita di particelle e dispositivi cosi' prodotti
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JP3740479B2 (ja) * 2002-07-23 2006-02-01 キヤノン株式会社 画像表示装置とその製造方法
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US7135141B2 (en) * 2003-03-31 2006-11-14 Hitachi Metals, Ltd. Method of manufacturing a sintered body
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US7871660B2 (en) * 2003-11-14 2011-01-18 Saes Getters, S.P.A. Preparation of getter surfaces using caustic chemicals
US7824685B2 (en) * 2004-01-26 2010-11-02 Baylor College Of Medicine RTVP based compositions and methods for the treatment of prostate cancer
JPWO2005124813A1 (ja) * 2004-06-18 2008-04-17 株式会社東芝 画像表示装置および画像表示装置の製造方法
KR100641301B1 (ko) * 2004-09-15 2006-11-02 주식회사 세종소재 겟터 겸용 수은 보충재
ITMI20042271A1 (it) * 2004-11-23 2005-02-23 Getters Spa Leghe getter non evaporabili per assorbimento di idrogeno
WO2006113816A2 (en) * 2005-04-20 2006-10-26 Technic, Inc. Underlayer for reducing surface oxidation of plated deposits
EP1821328A1 (en) 2006-02-10 2007-08-22 Nanoshell Materials Research & Development GmbH Metallic dendritic gas sorbents and method for producing the same
US20100143232A1 (en) * 2006-06-21 2010-06-10 Benedict James Costello Metal binary and ternary compounds produced by cathodic arc deposition
FR2903678B1 (fr) 2006-07-13 2008-10-24 Commissariat Energie Atomique Microcomposant encapsule equipe d'au moins un getter
JP2009522104A (ja) * 2006-12-15 2009-06-11 ビ−エイイ− システムズ パブリック リミテッド カンパニ− 薄膜ゲッタ装置に関する改善
ITMI20090410A1 (it) * 2009-03-18 2010-09-19 Getters Spa Leghe getter non evaporabili adatte particolarmente per l'assorbimento di idrogeno
DE102009029495A1 (de) * 2009-09-16 2011-03-24 Endress + Hauser Conducta Gesellschaft für Mess- und Regeltechnik mbH + Co. KG Messumformer für ein Multisensorsystem, insbesondere als Feldgerät für die Prozessautomatisierungstechnik und Verfahren zum Betreiben des Messumformers
CN102534489A (zh) * 2010-12-30 2012-07-04 鸿富锦精密工业（深圳）有限公司 镀膜件及其制造方法
RU2474912C1 (ru) * 2011-08-23 2013-02-10 Федеральное государственное бюджетное образовательное учреждение высшего профессионального образования "Национальный исследовательский университет "МИЭТ" (МИЭТ) Способ получения газопоглощающей структуры
RU2513563C2 (ru) * 2012-08-17 2014-04-20 Федеральное государственное унитарное предприятие "Научно-производственное предприятие "Исток" (ФГУП "НПП "Исток") Спеченный неиспаряющийся геттер
RU2523718C2 (ru) * 2012-11-20 2014-07-20 Федеральное государственное автономное образовательное учреждение высшего профессионального образования "Национальный исследовательский университет "МИЭТ" (МИЭТ) Нанокомпозитная газопоглощающая структура и способ ее получения
KR20150006459A (ko) * 2013-02-05 2015-01-16 캐논 아네르바 가부시키가이샤 성막 장치
FR3003647B1 (fr) * 2013-03-25 2015-12-25 IFP Energies Nouvelles Procede et systeme d'analyse d'un fluide gazeux comprenant au moins un gaz rare au moyen d'un substrat de getterisation
RU2532788C1 (ru) * 2013-06-20 2014-11-10 Федеральное государственное автономное образовательное учреждение высшего профессионального образования "Национальный исследовательский технологический университет "МИСиС" Способ получения объемно-пористых структур сплавов-накопителей водорода, способных выдерживать многократные циклы гидрирования-дегидрирования без разрушения
US9764946B2 (en) 2013-10-24 2017-09-19 Analog Devices, Inc. MEMs device with outgassing shield
ITMI20131921A1 (it) * 2013-11-20 2015-05-21 Getters Spa Leghe getter non evaporabili particolarmente adatte per l'assorbimento di idrogeno e monossido di carbonio
EP3012020B1 (en) 2014-10-24 2020-03-04 Samsung Electronics Co., Ltd. Gas-adsorbing material and use of a vacuum insulation material including the same
US10801097B2 (en) * 2015-12-23 2020-10-13 Praxair S.T. Technology, Inc. Thermal spray coatings onto non-smooth surfaces
CN106591790B (zh) * 2016-12-28 2019-12-13 杭州大立微电子有限公司 靶材制备方法和吸气剂薄膜形成方法
WO2019097421A1 (en) 2017-11-17 2019-05-23 Rockwool International A/S Suspension system
CN110820031A (zh) * 2019-11-19 2020-02-21 有研工程技术研究院有限公司 一种微型吸气剂的制备方法
CN111001545A (zh) * 2019-11-25 2020-04-14 烟台艾睿光电科技有限公司 防止吸气剂掉落颗粒的方法及吸气剂与加固涂层组件

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Also Published As

Publication number Publication date
DE60130001D1 (de) 2007-09-27
WO2002027058A1 (en) 2002-04-04
US20030165707A1 (en) 2003-09-04
US20020093003A1 (en) 2002-07-18
TWI278523B (en) 2007-04-11
JP2004509757A (ja) 2004-04-02
US20050023134A1 (en) 2005-02-03
US6783696B2 (en) 2004-08-31
DE60130001T2 (de) 2008-05-08
ITMI20002099A0 (it) 2000-09-27
CN1318642C (zh) 2007-05-30
EP1322795B1 (en) 2007-08-15
CN1596323A (zh) 2005-03-16
US7122100B2 (en) 2006-10-17
KR100784584B1 (ko) 2007-12-10
AU2001295881A1 (en) 2002-04-08
US6620297B2 (en) 2003-09-16
KR20030038765A (ko) 2003-05-16
HK1073337A1 (en) 2005-09-30
RU2253695C2 (ru) 2005-06-10
ITMI20002099A1 (it) 2002-03-27
WO2002027058A8 (en) 2003-04-10
EP1322795A1 (en) 2003-07-02
ATE370261T1 (de) 2007-09-15

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