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HK1099606A1 - Exposure apparatus and exposure method - Google Patents

Exposure apparatus and exposure method

Info

Publication number
HK1099606A1
HK1099606A1 HK07106973.1A HK07106973A HK1099606A1 HK 1099606 A1 HK1099606 A1 HK 1099606A1 HK 07106973 A HK07106973 A HK 07106973A HK 1099606 A1 HK1099606 A1 HK 1099606A1
Authority
HK
Hong Kong
Prior art keywords
light
splitting element
optical path
optical
light splitting
Prior art date
Application number
HK07106973.1A
Other languages
English (en)
Inventor
Motoo Koyama
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=35509985&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=HK1099606(A1) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Nikon Corp filed Critical Nikon Corp
Publication of HK1099606A1 publication Critical patent/HK1099606A1/xx

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • H01L21/0271—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers
    • H01L21/0273—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers characterised by the treatment of photoresist layers
    • H01L21/0274—Photolithographic processes
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/7085—Detection arrangement, e.g. detectors of apparatus alignment possibly mounted on wafers, exposure dose, photo-cleaning flux, stray light, thermal load
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J1/00—Photometry, e.g. photographic exposure meter
    • G01J1/02—Details
    • G01J1/04—Optical or mechanical part supplementary adjustable parts
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J1/00—Photometry, e.g. photographic exposure meter
    • G01J1/02—Details
    • G01J1/04—Optical or mechanical part supplementary adjustable parts
    • G01J1/0407—Optical elements not provided otherwise, e.g. manifolds, windows, holograms, gratings
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J1/00—Photometry, e.g. photographic exposure meter
    • G01J1/02—Details
    • G01J1/04—Optical or mechanical part supplementary adjustable parts
    • G01J1/0407—Optical elements not provided otherwise, e.g. manifolds, windows, holograms, gratings
    • G01J1/0414—Optical elements not provided otherwise, e.g. manifolds, windows, holograms, gratings using plane or convex mirrors, parallel phase plates, or plane beam-splitters
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • G03F7/70558—Dose control, i.e. achievement of a desired dose

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Engineering & Computer Science (AREA)
  • Public Health (AREA)
  • Health & Medical Sciences (AREA)
  • Epidemiology (AREA)
  • Environmental & Geological Engineering (AREA)
  • Power Engineering (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Manufacturing & Machinery (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Photometry And Measurement Of Optical Pulse Characteristics (AREA)
  • Liquid Crystal (AREA)
  • Electron Beam Exposure (AREA)
HK07106973.1A 2004-06-18 2007-06-29 Exposure apparatus and exposure method HK1099606A1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2004180816 2004-06-18
PCT/JP2005/010356 WO2005124831A1 (ja) 2004-06-18 2005-06-06 光検出装置、照明光学装置、露光装置、および露光方法

Publications (1)

Publication Number Publication Date
HK1099606A1 true HK1099606A1 (en) 2007-08-17

Family

ID=35509985

Family Applications (1)

Application Number Title Priority Date Filing Date
HK07106973.1A HK1099606A1 (en) 2004-06-18 2007-06-29 Exposure apparatus and exposure method

Country Status (8)

Country Link
US (1) US7573019B2 (de)
EP (1) EP1780770B2 (de)
JP (1) JP4730712B2 (de)
KR (2) KR101173715B1 (de)
AT (1) ATE482465T1 (de)
DE (1) DE602005023740D1 (de)
HK (1) HK1099606A1 (de)
WO (1) WO2005124831A1 (de)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI463272B (zh) * 2010-11-30 2014-12-01 Ushio Electric Inc Light irradiation device
US9528906B1 (en) * 2013-12-19 2016-12-27 Apple Inc. Monitoring DOE performance using total internal reflection
US10113903B1 (en) * 2014-09-02 2018-10-30 Amazon Technologies, Inc. Ambient light sensor calibration
US10073004B2 (en) 2016-09-19 2018-09-11 Apple Inc. DOE defect monitoring utilizing total internal reflection
DE102018124314B9 (de) * 2018-10-02 2020-12-31 Carl Zeiss Smt Gmbh Vorrichtung zur Bestimmung der Belichtungsenergie bei der Belichtung eines Elements in einem optischen System, insbesondere für die Mikrolithographie
WO2022115457A1 (en) * 2020-11-24 2022-06-02 Applied Materials, Inc. Illumination system for ar metrology tool

Family Cites Families (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4172646A (en) † 1972-12-11 1979-10-30 Canon Kabushiki Kaisha Device to control introduction of diffracted beam by means of diffraction element
DE2654464A1 (de) † 1976-12-01 1978-06-08 Sick Optik Elektronik Erwin Photoelektrische lichtempfangsanordnung
JPS5627117A (en) 1979-08-10 1981-03-16 Canon Inc Light splitter
JPS5727227A (en) 1980-07-25 1982-02-13 Canon Inc Optical separator
US4591256A (en) † 1982-11-08 1986-05-27 Canon Kabushiki Kaisha Beam splitter and light measuring device for camera
JPH0782981B2 (ja) † 1986-02-07 1995-09-06 株式会社ニコン 投影露光方法及び装置
GB9424523D0 (en) * 1994-12-05 1995-01-25 At & T Global Inf Solution Optical receiver for modulated light
JPH08203803A (ja) 1995-01-24 1996-08-09 Nikon Corp 露光装置
CN1130602C (zh) 1996-02-23 2003-12-10 Asm石版印刷公司 光学系统的照明单元和用于重复地将掩模图案成像在基片上的装置
JPH10153866A (ja) * 1996-11-22 1998-06-09 Nikon Corp 照明装置および該照明装置を備えた露光装置
JP3762102B2 (ja) † 1998-06-04 2006-04-05 キヤノン株式会社 走査型投影露光装置及びそれを用いたデバイスの製造方法
JP3710321B2 (ja) 1999-04-01 2005-10-26 キヤノン株式会社 露光量制御方法、露光装置およびデバイス製造方法
JP2001059905A (ja) 1999-06-16 2001-03-06 Matsushita Electronics Industry Corp 回折型光学素子および当該回折型光学素子を用いた光ピックアップ
US6728034B1 (en) 1999-06-16 2004-04-27 Matsushita Electric Industrial Co., Ltd. Diffractive optical element that polarizes light and an optical pickup using the same
DE10059961A1 (de) † 2000-01-11 2001-07-12 Zeiss Carl Strahlenteiler
JP2003110802A (ja) * 2001-09-27 2003-04-11 Fuji Photo Film Co Ltd 撮像装置
JP2003257846A (ja) * 2002-03-07 2003-09-12 Nikon Corp 光源ユニット、照明装置、露光装置及び露光方法

Also Published As

Publication number Publication date
KR20120034139A (ko) 2012-04-09
EP1780770B2 (de) 2017-01-25
ATE482465T1 (de) 2010-10-15
EP1780770A1 (de) 2007-05-02
JPWO2005124831A1 (ja) 2008-04-17
US20080042044A1 (en) 2008-02-21
KR101173715B1 (ko) 2012-08-13
EP1780770A4 (de) 2008-02-27
JP4730712B2 (ja) 2011-07-20
KR20070026797A (ko) 2007-03-08
WO2005124831A1 (ja) 2005-12-29
KR101251167B1 (ko) 2013-04-05
US7573019B2 (en) 2009-08-11
DE602005023740D1 (de) 2010-11-04
EP1780770B1 (de) 2010-09-22

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Legal Events

Date Code Title Description
AM43 Amendment of standard patent following opposition or revocation proceedings in the designated patent office (acc. sect 43 patent ordinance)
PC Patent ceased (i.e. patent has lapsed due to the failure to pay the renewal fee)

Effective date: 20230604