JPS5727227A - Optical separator - Google Patents
Optical separatorInfo
- Publication number
- JPS5727227A JPS5727227A JP10258680A JP10258680A JPS5727227A JP S5727227 A JPS5727227 A JP S5727227A JP 10258680 A JP10258680 A JP 10258680A JP 10258680 A JP10258680 A JP 10258680A JP S5727227 A JPS5727227 A JP S5727227A
- Authority
- JP
- Japan
- Prior art keywords
- optical separator
- structure substance
- light beam
- luminous flux
- diffracted structure
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/10—Beam splitting or combining systems
- G02B27/1086—Beam splitting or combining systems operating by diffraction only
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
- G03B2217/00—Details of cameras or camera bodies; Accessories therefor
- G03B2217/005—Blur detection
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Exposure Control For Cameras (AREA)
Abstract
PURPOSE:To execute the photometry of a photographic field compactly and exactly, and to prevent a blur of a finder system, by constituting so that the image formation luminous flux incident surface of an optical separator using a relief type diffracted structure substance is made a diffusion surface and the optical separator and a focusing plate are formed in one body. CONSTITUTION:A lower surface 4 of an optical separator 6 having a relief type diffracted structure substance 9 is made a mat surface. An image formation luminous flux 1 which has been made incident to the optical separator is partially separated by the diffracted structure substance, a separated light beam 2 is propagated by total reflection in the optical separator, and is led to a photodetecor 8 of SPC, etc. On the other hand, a transmission light beam passes through an eye piece lens and forms an image on the mat surface. When an inclined surface alpha of the diffracted structure substance is decided in accordance with a condition shown in the expression, the separated light beam does not hit against the lower mat surface of the optical separator. Provided that, in the expression, T, (t), L and theta show length of the optical separator, the space between 4 and 9, a maximum distance up to the end of the diffracted structure substance, and an extended half angle of the luminous flux, respectively.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10258680A JPS5727227A (en) | 1980-07-25 | 1980-07-25 | Optical separator |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10258680A JPS5727227A (en) | 1980-07-25 | 1980-07-25 | Optical separator |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS5727227A true JPS5727227A (en) | 1982-02-13 |
Family
ID=14331329
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP10258680A Pending JPS5727227A (en) | 1980-07-25 | 1980-07-25 | Optical separator |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5727227A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP1780770A1 (en) * | 2004-06-18 | 2007-05-02 | Nikon Corporation | Light detecting apparatus, illumination optical apparatus, exposure apparatus and exposure method |
| CN110989181A (en) * | 2018-10-02 | 2020-04-10 | 卡尔蔡司Smt有限责任公司 | Device for determining exposure energy during exposure of an element in an optical system |
-
1980
- 1980-07-25 JP JP10258680A patent/JPS5727227A/en active Pending
Cited By (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP1780770A1 (en) * | 2004-06-18 | 2007-05-02 | Nikon Corporation | Light detecting apparatus, illumination optical apparatus, exposure apparatus and exposure method |
| EP1780770A4 (en) * | 2004-06-18 | 2008-02-27 | Nikon Corp | Light detecting apparatus, illumination optical apparatus, exposure apparatus and exposure method |
| JPWO2005124831A1 (en) * | 2004-06-18 | 2008-04-17 | 株式会社ニコン | Photodetection apparatus, illumination optical apparatus, exposure apparatus, and exposure method |
| US7573019B2 (en) | 2004-06-18 | 2009-08-11 | Nikon Corporation | Light detecting apparatus, illumination optical apparatus, exposure apparatus and exposure method |
| JP4730712B2 (en) * | 2004-06-18 | 2011-07-20 | 株式会社ニコン | Illumination optical apparatus, exposure apparatus, and exposure method |
| KR101173715B1 (en) | 2004-06-18 | 2012-08-13 | 가부시키가이샤 니콘 | Light detecting apparatus, illumination optical apparatus, exposure apparatus and exposure method |
| CN110989181A (en) * | 2018-10-02 | 2020-04-10 | 卡尔蔡司Smt有限责任公司 | Device for determining exposure energy during exposure of an element in an optical system |
| US11079604B2 (en) | 2018-10-02 | 2021-08-03 | Carl Zeiss Smt Gmbh | Device for determining the exposure energy during the exposure of an element in an optical system, in particular for microlithography |
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