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HK1054815B - 研磨工具和使用其的研磨方法及裝置 - Google Patents

研磨工具和使用其的研磨方法及裝置

Info

Publication number
HK1054815B
HK1054815B HK03101637.4A HK03101637A HK1054815B HK 1054815 B HK1054815 B HK 1054815B HK 03101637 A HK03101637 A HK 03101637A HK 1054815 B HK1054815 B HK 1054815B
Authority
HK
Hong Kong
Prior art keywords
polishing
tool
polishing tool
polishing method
Prior art date
Application number
HK03101637.4A
Other languages
English (en)
Other versions
HK1054815A1 (en
Inventor
關家臣之典
山本節男
狛豐
青木昌史
松谷直宏
Original Assignee
株式會社迪斯科
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP2001093398A external-priority patent/JP4594545B2/ja
Priority claimed from JP2001093399A external-priority patent/JP4580118B2/ja
Priority claimed from JP2001093397A external-priority patent/JP4546659B2/ja
Priority claimed from JP2001311450A external-priority patent/JP2003124164A/ja
Application filed by 株式會社迪斯科 filed Critical 株式會社迪斯科
Publication of HK1054815A1 publication Critical patent/HK1054815A1/xx
Publication of HK1054815B publication Critical patent/HK1054815B/zh

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24D—TOOLS FOR GRINDING, BUFFING OR SHARPENING
    • B24D11/00—Constructional features of flexible abrasive materials; Special features in the manufacture of such materials
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B7/00—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor
    • B24B7/20—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor characterised by a special design with respect to properties of the material of non-metallic articles to be ground
    • B24B7/22—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor characterised by a special design with respect to properties of the material of non-metallic articles to be ground for grinding inorganic material, e.g. stone, ceramics, porcelain
    • B24B7/228—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor characterised by a special design with respect to properties of the material of non-metallic articles to be ground for grinding inorganic material, e.g. stone, ceramics, porcelain for grinding thin, brittle parts, e.g. semiconductors, wafers
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24D—TOOLS FOR GRINDING, BUFFING OR SHARPENING
    • B24D13/00—Wheels having flexibly-acting working parts, e.g. buffing wheels; Mountings therefor
    • B24D13/14—Wheels having flexibly-acting working parts, e.g. buffing wheels; Mountings therefor acting by the front face
    • B24D13/147—Wheels having flexibly-acting working parts, e.g. buffing wheels; Mountings therefor acting by the front face comprising assemblies of felted or spongy material; comprising pads surrounded by a flexible material

Landscapes

  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Chemical & Material Sciences (AREA)
  • Ceramic Engineering (AREA)
  • Inorganic Chemistry (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)
  • Polishing Bodies And Polishing Tools (AREA)
HK03101637.4A 2001-03-28 2003-03-05 研磨工具和使用其的研磨方法及裝置 HK1054815B (zh)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP2001093398A JP4594545B2 (ja) 2001-03-28 2001-03-28 研磨装置及びこれを含んだ研削・研磨機
JP2001093399A JP4580118B2 (ja) 2001-03-28 2001-03-28 研磨方法及び研削・研磨方法
JP2001093397A JP4546659B2 (ja) 2001-03-28 2001-03-28 研磨工具
JP2001311450A JP2003124164A (ja) 2001-10-09 2001-10-09 研磨工具

Publications (2)

Publication Number Publication Date
HK1054815A1 HK1054815A1 (en) 2003-12-12
HK1054815B true HK1054815B (zh) 2006-11-03

Family

ID=27482146

Family Applications (1)

Application Number Title Priority Date Filing Date
HK03101637.4A HK1054815B (zh) 2001-03-28 2003-03-05 研磨工具和使用其的研磨方法及裝置

Country Status (7)

Country Link
US (2) US7713107B2 (zh)
KR (1) KR100838028B1 (zh)
CN (1) CN1246885C (zh)
DE (1) DE10211342B4 (zh)
HK (1) HK1054815B (zh)
SG (1) SG131737A1 (zh)
TW (1) TW528656B (zh)

Families Citing this family (33)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7252736B1 (en) * 2004-03-31 2007-08-07 Lam Research Corporation Compliant grinding wheel
JP2007081322A (ja) * 2005-09-16 2007-03-29 Jsr Corp 化学機械研磨パッドの製造方法
US7329174B2 (en) * 2004-05-20 2008-02-12 Jsr Corporation Method of manufacturing chemical mechanical polishing pad
JP2006108428A (ja) * 2004-10-06 2006-04-20 Disco Abrasive Syst Ltd ウェーハの分割方法
US20080220701A1 (en) * 2005-12-30 2008-09-11 Chung-Ching Feng Polishing Pad and Method for Making the Same
JP2008108792A (ja) * 2006-10-23 2008-05-08 Disco Abrasive Syst Ltd ウエーハの加工方法
DE102009048436B4 (de) * 2009-10-07 2012-12-20 Siltronic Ag Verfahren zum Schleifen einer Halbleiterscheibe
CN101885164B (zh) * 2010-06-08 2011-12-14 沈阳理工大学 一种仿生结构的锡固结金刚石磨料抛光垫及制造方法
US8684791B2 (en) * 2011-11-09 2014-04-01 Alvin Gabriel Stern Linear, automated apparatus and method for clean, high purity, simultaneous lapping and polishing of optics, semiconductors and optoelectronic materials
US10090207B2 (en) * 2012-11-28 2018-10-02 Taiwan Semiconductor Manufacturing Company, Ltd. Multi-point chemical mechanical polishing end point detection system and method of using
KR102238750B1 (ko) * 2013-08-10 2021-04-08 어플라이드 머티어리얼스, 인코포레이티드 새로운 또는 개장된 정전 척을 폴리싱하는 방법
CN103552005A (zh) * 2013-11-08 2014-02-05 谢泽 一种含纤维绳、磨料以及空心微球的抛磨一体轮
CN104130750B (zh) * 2014-08-15 2016-05-04 常州华森医疗器械有限公司 雨花石的新用途
CN104842239A (zh) * 2015-04-28 2015-08-19 深圳青羽机器人自动化有限公司 一种打磨设备
JP6831835B2 (ja) * 2015-08-14 2021-02-17 エム キューブド テクノロジーズ， インコーポレイテッド 被加工物を仕上げるための、高度に制御可能な処理ツールを有する機械
KR101658921B1 (ko) 2015-12-03 2016-09-22 이인영 압출용 마그네슘 합금 빌렛의 제조방법
USD866891S1 (en) * 2016-01-22 2019-11-12 3M Innovative Properties Company Scouring article
USD787768S1 (en) * 2016-04-11 2017-05-23 Linda Daoud Sponge
CN205668186U (zh) * 2016-05-12 2016-11-02 东莞市晶研仪器科技有限公司 智能bga芯片维修仪器
USD795518S1 (en) * 2016-06-24 2017-08-22 Un Hwa Chung Rotary mop with durable gear drive unit
EP3421180B1 (en) * 2017-06-30 2023-07-12 Guido Valentini Polishing pad of a hand-held power tool and power tool with such a polishing pad
CN109202695A (zh) * 2017-06-30 2019-01-15 盖多·瓦伦蒂尼 手持式动力工具的抛光垫和带有这种抛光垫的动力工具
USD843672S1 (en) * 2017-07-31 2019-03-19 3M Innovative Properties Company Floor pad
USD843073S1 (en) * 2017-08-09 2019-03-12 3M Innovative Properties Company Floor pad
USD844272S1 (en) * 2017-08-09 2019-03-26 3M Innovative Properties Company Floor pad
USD854768S1 (en) * 2017-08-09 2019-07-23 3M Innovative Properties Company Floor pad
USD843673S1 (en) * 2017-08-09 2019-03-19 3M Innovtive Properties Company Floor pad
CN108044473A (zh) * 2018-01-05 2018-05-18 苏州川鹏塑料有限公司 用于塑品表面光泽处理的设备
KR102053651B1 (ko) * 2018-05-30 2019-12-09 이화다이아몬드공업 주식회사 사파이어, 실리콘카바이드, 유리 및 실리콘 웨이퍼 폴리싱을 위한 고정지립 패드 및 그 패드의 제조방법
CN110877282A (zh) * 2019-12-25 2020-03-13 郝松涛 弯管自动仿形砂光或抛光设备
CN111805413A (zh) * 2020-07-23 2020-10-23 中国科学院微电子研究所 化学机械研磨方法
CN112658948B (zh) * 2020-12-17 2024-11-08 庆安集团有限公司 一种对金属内凹型面进行抛光的抛光装置和方法
CN115556011A (zh) * 2022-09-28 2023-01-03 郑州磨料磨具磨削研究所有限公司 一种用于硅片精密抛光的磨抛轮及其制备方法

Family Cites Families (30)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5656382A (en) 1979-10-11 1981-05-18 Asahi Glass Co Ltd Manufacture of laminated grinding buff
US4728552A (en) * 1984-07-06 1988-03-01 Rodel, Inc. Substrate containing fibers of predetermined orientation and process of making the same
DE3438381A1 (de) * 1984-10-19 1986-04-24 Jack 3330 Helmstedt Brand Filzkoerper als technisches hilfsmittel sowie verfahren und vorrichtung zu dessen herstellung
US5369916A (en) * 1988-08-01 1994-12-06 Dentsply Research & Development Corp. Polishing element
JPH03190675A (ja) 1989-12-20 1991-08-20 Kanai Hiroyuki 不織布研磨材
US6069080A (en) * 1992-08-19 2000-05-30 Rodel Holdings, Inc. Fixed abrasive polishing system for the manufacture of semiconductor devices, memory disks and the like
JPH06155310A (ja) * 1992-11-27 1994-06-03 Kanai Hiroyuki 不織布研磨材
JP3211012B2 (ja) * 1992-11-27 2001-09-25 金井 宏之 不織布研磨材
JP2914166B2 (ja) * 1994-03-16 1999-06-28 日本電気株式会社 研磨布の表面処理方法および研磨装置
AU7480896A (en) * 1995-12-04 1997-06-27 Minnesota Mining And Manufacturing Company Abrasive article back up pad with foam layer
JPH09193008A (ja) 1996-01-17 1997-07-29 Sony Corp 平坦化研磨装置およびその方法
JP3560051B2 (ja) * 1996-11-15 2004-09-02 株式会社荏原製作所 基板の研磨方法及び装置
US6126532A (en) * 1997-04-18 2000-10-03 Cabot Corporation Polishing pads for a semiconductor substrate
KR100499601B1 (ko) * 1997-08-06 2005-07-07 롬 앤드 하스 일렉트로닉 머티리얼스 씨엠피 홀딩스, 인코포레이티드 개선된 연마용 패드 및 연마 방법
JP3076291B2 (ja) 1997-12-02 2000-08-14 日本電気株式会社 研磨装置
US6156056A (en) * 1998-01-09 2000-12-05 Ethicon, Inc. Suture buttress
JP3401706B2 (ja) 1998-01-19 2003-04-28 株式会社東京精密 平面研削装置
JPH11309653A (ja) * 1998-04-27 1999-11-09 Tokyo Seimitsu Co Ltd ウェーハの平面加工装置
KR100574311B1 (ko) * 1998-08-28 2006-04-27 도레이 가부시끼가이샤 연마 패드
JP2000254857A (ja) 1999-01-06 2000-09-19 Tokyo Seimitsu Co Ltd 平面加工装置及び平面加工方法
JP2000301459A (ja) * 1999-04-19 2000-10-31 Nippei Toyama Corp 砥石およびこれを用いた研磨方法
US6328634B1 (en) * 1999-05-11 2001-12-11 Rodel Holdings Inc. Method of polishing
JP2000343440A (ja) * 1999-06-04 2000-12-12 Disco Abrasive Syst Ltd 研磨砥石及び研磨砥石の製造方法
TW428306B (en) * 1999-07-01 2001-04-01 Viking Tech Corp Packaging method for thin-film passive device on silicon
JP3675237B2 (ja) * 1999-07-09 2005-07-27 株式会社東京精密 平面加工装置
US6713413B2 (en) * 2000-01-03 2004-03-30 Freudenberg Nonwovens Limited Partnership Nonwoven buffing or polishing material having increased strength and dimensional stability
IT249604Y1 (it) * 2000-04-28 2003-05-20 Cressi Sub Spa Giubbetto equilibratore per sub con valvole di scarico rapido adazionamento sincronizzato
US6764388B2 (en) * 2002-05-09 2004-07-20 Taiwan Semiconductor Manufacturing Co., Ltd High-pressure pad cleaning system
JP2004023009A (ja) * 2002-06-20 2004-01-22 Nikon Corp 研磨体、研磨装置、半導体デバイス及び半導体デバイス製造方法
US7182673B2 (en) * 2004-06-29 2007-02-27 Novellus Systems, Inc. Method and apparatus for post-CMP cleaning of a semiconductor work piece

Also Published As

Publication number Publication date
US7713107B2 (en) 2010-05-11
KR20020077190A (ko) 2002-10-11
HK1054815A1 (en) 2003-12-12
SG131737A1 (en) 2007-05-28
TW528656B (en) 2003-04-21
KR100838028B1 (ko) 2008-06-12
CN1246885C (zh) 2006-03-22
US20020173244A1 (en) 2002-11-21
CN1384534A (zh) 2002-12-11
US20080085662A1 (en) 2008-04-10
DE10211342B4 (de) 2017-06-29
DE10211342A1 (de) 2002-10-24
US7736215B2 (en) 2010-06-15

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Legal Events

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PE Patent expired

Effective date: 20220327