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HK1045860A1 - Method for increasing the yield in processes of deposition of thin layers onto a substrate - Google Patents

Method for increasing the yield in processes of deposition of thin layers onto a substrate

Info

Publication number
HK1045860A1
HK1045860A1 HK02107068A HK02107068A HK1045860A1 HK 1045860 A1 HK1045860 A1 HK 1045860A1 HK 02107068 A HK02107068 A HK 02107068A HK 02107068 A HK02107068 A HK 02107068A HK 1045860 A1 HK1045860 A1 HK 1045860A1
Authority
HK
Hong Kong
Prior art keywords
deposition
yield
processes
substrate
increasing
Prior art date
Application number
HK02107068A
Other versions
HK1045860B (en
Inventor
Andrea Conte
Francesco Mazza
Marco Moraja
Original Assignee
Getters Spa
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from IT1999MI000744A external-priority patent/IT1312248B1/en
Application filed by Getters Spa filed Critical Getters Spa
Publication of HK1045860A1 publication Critical patent/HK1045860A1/en
Publication of HK1045860B publication Critical patent/HK1045860B/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Chemical Vapour Deposition (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
HK02107068.0A 1999-04-12 2002-09-26 Method for increasing the yield in processes of deposition of thin layers onto a substrate HK1045860B (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
IT1999MI000744A IT1312248B1 (en) 1999-04-12 1999-04-12 METHOD TO INCREASE THE PRODUCTIVITY OF THIN DISTRICT DISPOSAL PROCESSES ON A SUBSTRATE AND GETTER DEVICES FOR
PCT/IT2000/000136 WO2000061832A1 (en) 1999-04-12 2000-04-11 Method and getter devices for use in deposition of thin layers

Publications (2)

Publication Number Publication Date
HK1045860A1 true HK1045860A1 (en) 2002-12-13
HK1045860B HK1045860B (en) 2006-09-15

Family

ID=34308071

Family Applications (1)

Application Number Title Priority Date Filing Date
HK02107068.0A HK1045860B (en) 1999-04-12 2002-09-26 Method for increasing the yield in processes of deposition of thin layers onto a substrate

Country Status (6)

Country Link
KR (1) KR100469527B1 (en)
HK (1) HK1045860B (en)
MX (1) MXPA01010337A (en)
MY (1) MY123684A (en)
RU (1) RU2240377C2 (en)
TW (1) TWI232889B (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
RU2523718C2 (en) * 2012-11-20 2014-07-20 Федеральное государственное автономное образовательное учреждение высшего профессионального образования "Национальный исследовательский университет "МИЭТ" (МИЭТ) Nanocomposite gettering structure and method of its preparation

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5685963A (en) * 1994-10-31 1997-11-11 Saes Pure Gas, Inc. In situ getter pump system and method

Also Published As

Publication number Publication date
MY123684A (en) 2006-05-31
MXPA01010337A (en) 2002-03-27
KR20010113796A (en) 2001-12-28
RU2240377C2 (en) 2004-11-20
KR100469527B1 (en) 2005-02-02
TWI232889B (en) 2005-05-21
HK1045860B (en) 2006-09-15

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Legal Events

Date Code Title Description
PC Patent ceased (i.e. patent has lapsed due to the failure to pay the renewal fee)

Effective date: 20110411