[go: up one dir, main page]
More Web Proxy on the site http://driver.im/

FR2941447B1 - Substrat en verre transparent et procede de fabrication d'un tel substrat. - Google Patents

Substrat en verre transparent et procede de fabrication d'un tel substrat.

Info

Publication number
FR2941447B1
FR2941447B1 FR0950422A FR0950422A FR2941447B1 FR 2941447 B1 FR2941447 B1 FR 2941447B1 FR 0950422 A FR0950422 A FR 0950422A FR 0950422 A FR0950422 A FR 0950422A FR 2941447 B1 FR2941447 B1 FR 2941447B1
Authority
FR
France
Prior art keywords
substrate
manufacturing
transparent glass
glass substrate
transparent
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
FR0950422A
Other languages
English (en)
Other versions
FR2941447A1 (fr
Inventor
Michele Schiavoni
Marcus Neander
Pascal Roemgens
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Saint Gobain Glass France SAS
Compagnie de Saint Gobain SA
Original Assignee
Saint Gobain Glass France SAS
Compagnie de Saint Gobain SA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority to FR0950422A priority Critical patent/FR2941447B1/fr
Application filed by Saint Gobain Glass France SAS, Compagnie de Saint Gobain SA filed Critical Saint Gobain Glass France SAS
Priority to US13/145,379 priority patent/US9340453B2/en
Priority to EP10707572A priority patent/EP2382165A1/fr
Priority to CN201080013375.1A priority patent/CN102361833B/zh
Priority to KR1020117019443A priority patent/KR101455448B1/ko
Priority to PCT/FR2010/050097 priority patent/WO2010084290A1/fr
Priority to EA201170956A priority patent/EA027284B1/ru
Priority to JP2011546913A priority patent/JP5926054B2/ja
Publication of FR2941447A1 publication Critical patent/FR2941447A1/fr
Application granted granted Critical
Publication of FR2941447B1 publication Critical patent/FR2941447B1/fr
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C23/00—Other surface treatment of glass not in the form of fibres or filaments
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C23/00—Other surface treatment of glass not in the form of fibres or filaments
    • C03C23/008—Other surface treatment of glass not in the form of fibres or filaments comprising a lixiviation step
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B11/00—Pressing molten glass or performed glass reheated to equivalent low viscosity without blowing
    • C03B11/06—Construction of plunger or mould
    • C03B11/08—Construction of plunger or mould for making solid articles, e.g. lenses
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B13/00—Rolling molten glass, i.e. where the molten glass is shaped by rolling
    • C03B13/08—Rolling patterned sheets, e.g. sheets having a surface pattern
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F24—HEATING; RANGES; VENTILATING
    • F24S—SOLAR HEAT COLLECTORS; SOLAR HEAT SYSTEMS
    • F24S80/00—Details, accessories or component parts of solar heat collectors not provided for in groups F24S10/00-F24S70/00
    • F24S80/50—Elements for transmitting incoming solar rays and preventing outgoing heat radiation; Transparent coverings
    • F24S80/52—Elements for transmitting incoming solar rays and preventing outgoing heat radiation; Transparent coverings characterised by the material
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/02—Details
    • H01L31/0236—Special surface textures
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/02—Details
    • H01L31/0236—Special surface textures
    • H01L31/02366—Special surface textures of the substrate or of a layer on the substrate, e.g. textured ITO/glass substrate or superstrate, textured polymer layer on glass substrate
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/0248—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies
    • H01L31/036—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by their crystalline structure or particular orientation of the crystalline planes
    • H01L31/0392—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by their crystalline structure or particular orientation of the crystalline planes including thin films deposited on metallic or insulating substrates ; characterised by specific substrate materials or substrate features or by the presence of intermediate layers, e.g. barrier layers, on the substrate
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/0248—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies
    • H01L31/036—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by their crystalline structure or particular orientation of the crystalline planes
    • H01L31/0392—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by their crystalline structure or particular orientation of the crystalline planes including thin films deposited on metallic or insulating substrates ; characterised by specific substrate materials or substrate features or by the presence of intermediate layers, e.g. barrier layers, on the substrate
    • H01L31/03923—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by their crystalline structure or particular orientation of the crystalline planes including thin films deposited on metallic or insulating substrates ; characterised by specific substrate materials or substrate features or by the presence of intermediate layers, e.g. barrier layers, on the substrate including AIBIIICVI compound materials, e.g. CIS, CIGS
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2204/00—Glasses, glazes or enamels with special properties
    • C03C2204/08—Glass having a rough surface
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00—Energy generation through renewable energy sources
    • Y02E10/40—Solar thermal energy, e.g. solar towers
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00—Energy generation through renewable energy sources
    • Y02E10/50—Photovoltaic [PV] energy
    • Y02E10/541—CuInSe2 material PV cells
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P40/00—Technologies relating to the processing of minerals
    • Y02P40/50—Glass production, e.g. reusing waste heat during processing or shaping
    • Y02P40/57—Improving the yield, e-g- reduction of reject rates
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
    • Y10T428/24479—Structurally defined web or sheet [e.g., overall dimension, etc.] including variation in thickness
    • Y10T428/2457—Parallel ribs and/or grooves
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
    • Y10T428/24479—Structurally defined web or sheet [e.g., overall dimension, etc.] including variation in thickness
    • Y10T428/24612—Composite web or sheet

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Power Engineering (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Computer Hardware Design (AREA)
  • General Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Geochemistry & Mineralogy (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Combustion & Propulsion (AREA)
  • Thermal Sciences (AREA)
  • Sustainable Energy (AREA)
  • Mechanical Engineering (AREA)
  • General Engineering & Computer Science (AREA)
  • Sustainable Development (AREA)
  • Manufacturing & Machinery (AREA)
  • Surface Treatment Of Glass (AREA)
  • Photovoltaic Devices (AREA)
  • Surface Treatment Of Optical Elements (AREA)
FR0950422A 2009-01-23 2009-01-23 Substrat en verre transparent et procede de fabrication d'un tel substrat. Expired - Fee Related FR2941447B1 (fr)

Priority Applications (8)

Application Number Priority Date Filing Date Title
FR0950422A FR2941447B1 (fr) 2009-01-23 2009-01-23 Substrat en verre transparent et procede de fabrication d'un tel substrat.
EP10707572A EP2382165A1 (fr) 2009-01-23 2010-01-22 Substrat en verre transparent et procede de fabrication d'un tel substrat
CN201080013375.1A CN102361833B (zh) 2009-01-23 2010-01-22 透明玻璃基板和制造这种基板的方法
KR1020117019443A KR101455448B1 (ko) 2009-01-23 2010-01-22 투명 유리 기재 및 이러한 기재의 제조 방법
US13/145,379 US9340453B2 (en) 2009-01-23 2010-01-22 Transparent glass substrate and process for manufacturing such a substrate
PCT/FR2010/050097 WO2010084290A1 (fr) 2009-01-23 2010-01-22 Substrat en verre transparent et procede de fabrication d'un tel substrat
EA201170956A EA027284B1 (ru) 2009-01-23 2010-01-22 Прозрачная стеклянная подложка и способ изготовления такой подложки
JP2011546913A JP5926054B2 (ja) 2009-01-23 2010-01-22 透明ガラス基材及びこのような基材を製造するための方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR0950422A FR2941447B1 (fr) 2009-01-23 2009-01-23 Substrat en verre transparent et procede de fabrication d'un tel substrat.

Publications (2)

Publication Number Publication Date
FR2941447A1 FR2941447A1 (fr) 2010-07-30
FR2941447B1 true FR2941447B1 (fr) 2012-04-06

Family

ID=41057551

Family Applications (1)

Application Number Title Priority Date Filing Date
FR0950422A Expired - Fee Related FR2941447B1 (fr) 2009-01-23 2009-01-23 Substrat en verre transparent et procede de fabrication d'un tel substrat.

Country Status (8)

Country Link
US (1) US9340453B2 (fr)
EP (1) EP2382165A1 (fr)
JP (1) JP5926054B2 (fr)
KR (1) KR101455448B1 (fr)
CN (1) CN102361833B (fr)
EA (1) EA027284B1 (fr)
FR (1) FR2941447B1 (fr)
WO (1) WO2010084290A1 (fr)

Families Citing this family (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2948230B1 (fr) 2009-07-16 2011-10-21 Saint Gobain Plaque transparente texturee et procede de fabrication d'une telle plaque
KR20110048406A (ko) * 2009-11-02 2011-05-11 엘지이노텍 주식회사 태양전지 및 이의 제조방법
WO2012024676A2 (fr) 2010-08-20 2012-02-23 First Solar, Inc. Module photovoltaïque anti-réfléchissant
EP2625314A1 (fr) * 2010-10-06 2013-08-14 3M Innovative Properties Company Articles anti-reflet comportant des revêtements à base de nanosilice et couche barrière
CN103154320B (zh) * 2010-10-06 2015-12-16 3M创新有限公司 具有纳米二氧化硅基涂层的抗反射制品
CN102487095B (zh) * 2010-12-02 2014-07-16 沙嫣 新型非晶硅薄膜电池组件及其制造方法
CN102674697B (zh) * 2011-03-18 2014-04-02 北京市太阳能研究所有限公司 一种通过浸蚀制备减反射增透玻璃的方法
FR2978772B1 (fr) 2011-08-01 2013-08-02 Saint Gobain Photobioreacteur muni d'un empilement de couches minces selectif.
KR101325012B1 (ko) * 2012-03-21 2013-11-04 삼성코닝정밀소재 주식회사 광전지 모듈용 커버기판 및 이를 구비한 광전지 모듈
US8921841B2 (en) * 2012-05-09 2014-12-30 Samsung Corning Precision Materials Co., Ltd. Porous glass substrate for displays and method of manufacturing the same
FR2995245B1 (fr) * 2012-09-10 2015-05-15 Saint Gobain Vitrage decoratif a couche reflechissante deposee sur un substrat texture
KR101947187B1 (ko) * 2012-12-28 2019-02-12 주식회사 케이씨씨 고 투과율 무늬유리
US9556055B2 (en) * 2013-04-30 2017-01-31 Corning Incorporated Method for reducing glass-ceramic surface adhesion, and pre-form for the same
FR3035397A1 (fr) * 2015-04-23 2016-10-28 Saint Gobain Verre texture pour serre
FR3040536A1 (fr) * 2015-08-24 2017-03-03 St Microelectronics Sa Capteur d'image a diaphotie spectrale et optique reduite
CN206022388U (zh) * 2016-07-29 2017-03-15 上海比亚迪有限公司 一种太阳能电池组件
FR3068690B1 (fr) * 2017-07-07 2019-08-02 Saint-Gobain Glass France Procede d'obtention d'un substrat de verre texture revetu d'un revetement de type sol-gel antireflet.
FR3074117B1 (fr) * 2017-11-30 2020-12-04 Saint Gobain Vitrage de vehicule a signalisation lumineuse externe, vehicule l'incorporant et fabrication.
JP2021012976A (ja) * 2019-07-08 2021-02-04 株式会社リコー 光電変換モジュール
CN112897888A (zh) * 2019-12-04 2021-06-04 康宁股份有限公司 具有纹理化表面的玻璃基材的制造方法
CN112108493B (zh) * 2020-09-07 2023-12-05 青海黄河上游水电开发有限责任公司光伏产业技术分公司 一种光伏组件玻璃去除设备及去除方法

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
USB490662I5 (fr) * 1946-09-21
US5120605A (en) * 1988-09-23 1992-06-09 Zuel Company, Inc. Anti-reflective glass surface
US5326720A (en) 1990-10-25 1994-07-05 Nippon Sheet Glass Co., Ltd. Method for producing silicon dioxide film which prevents escape of Si component to the environment
JP3567483B2 (ja) * 1994-05-09 2004-09-22 日本板硝子株式会社 防汚性低反射率ガラスの製造方法
WO2001067140A1 (fr) 2000-03-07 2001-09-13 Koninklijke Philips Electronics N.V. Substrat pourvu d'un revetement antireflechissant et procede de fabrication d'un revetement antireflechissant
WO2002064518A1 (fr) * 2001-02-15 2002-08-22 Interfloat Corporation Panneau de verre
DE10123985A1 (de) * 2001-05-17 2002-11-21 Tesa Ag Selbstklebende Schutzfolie für Glasoberflächen mit poröser SiO-2-Antireflex-Schicht sowie die Verwendung dieser
FR2832811B1 (fr) 2001-11-28 2004-01-30 Saint Gobain Plaque transparente texturee a forte transmission de lumiere
US6929861B2 (en) * 2002-03-05 2005-08-16 Zuel Company, Inc. Anti-reflective glass surface with improved cleanability
JP2004335563A (ja) * 2003-05-01 2004-11-25 Sekisui Jushi Co Ltd 太陽電池モジュール
FR2870007B1 (fr) * 2004-05-10 2006-07-14 Saint Gobain Feuille transparente texturee a motifs pyramidaux inclines
DE102005027799B4 (de) * 2005-06-16 2007-09-27 Saint-Gobain Glass Deutschland Gmbh Verfahren zum Herstellen einer transparenten Scheibe mit einer Oberflächenstruktur und Vorrichtung zum Durchführen des Verfahrens
FR2908406B1 (fr) 2006-11-14 2012-08-24 Saint Gobain Couche poreuse, son procede de fabrication et ses applications.

Also Published As

Publication number Publication date
US20110281078A1 (en) 2011-11-17
FR2941447A1 (fr) 2010-07-30
CN102361833B (zh) 2016-05-04
EA201170956A1 (ru) 2012-03-30
EP2382165A1 (fr) 2011-11-02
KR101455448B1 (ko) 2014-10-27
US9340453B2 (en) 2016-05-17
JP2012515702A (ja) 2012-07-12
WO2010084290A1 (fr) 2010-07-29
EA027284B1 (ru) 2017-07-31
KR20110113189A (ko) 2011-10-14
JP5926054B2 (ja) 2016-05-25
CN102361833A (zh) 2012-02-22

Similar Documents

Publication Publication Date Title
FR2941447B1 (fr) Substrat en verre transparent et procede de fabrication d'un tel substrat.
FR2945549B1 (fr) Substrat fibreux, procede de fabrication et utilisations d'un tel substrat fibreux.
FR2944007B1 (fr) Procede de fabrication d'un recipient en verre et recipient correspondant.
BRPI0919445A2 (pt) processo de fabricação de substratos, notadamente substratos de vidros transparentes, conjunto de substratos, e, conjunto de vidraças.
FR2976576B1 (fr) Procede de fabrication d'un substrat en verre comportant des motifs imprimes en email.
EP1981085A4 (fr) Substrat tft, substrat tft reflechissant et leur procede de fabrication
FR2957684B1 (fr) Dispositif de variation optique, ensemble optique et procede de fabrication d'un tel dispositif
FR2903226B1 (fr) Transistor en couche mince,son procede de fabrication et dispositif d'affichage comportant un tel transistor.
FR2910702B1 (fr) Procede de fabrication d'un substrat mixte
FR2904868B1 (fr) Groupe structurel alveolaire et procede de fabrication d'un tel groupe
FR2911868B1 (fr) Procede de fabrication de verre
EP1970354A4 (fr) Substrat en verre non alcalin et son procede de fabrication
FR2902566B1 (fr) Dispositif d'affichage et son procede de fabrication.
SG124387A1 (en) Method for manufacturing a doughnut-shaped glass substrate
FR2943074B1 (fr) Substrat marquable au laser et procede de fabrication associe
FR2918793B1 (fr) Procede de fabrication d'un substrat semiconducteur-sur- isolant pour la microelectronique et l'optoelectronique.
FR2961952B1 (fr) Substrat comprenant une couche d'oxyde transparent conducteur et son procede de fabrication
EP2220698A4 (fr) Procédé de fabrication d'un substrat pour des applications de capteur utilisant des caractéristiques optiques et substrat obtenu par ce procédé
FR2936511B1 (fr) Procede de fabrication d'un vitrage feuillete
FR2915088B1 (fr) Implant endo-osseux composite a accrochage mecanique optimise et procede de fabrication d'un tel implant.
EP2495714A4 (fr) Substrat en verre pour un afficheur et procédé de fabrication du substrat en verre
FR2926296B1 (fr) Four verrier et procede de fabrication de verre.
HK1112449A1 (en) Method for manufacturing glass substrate for display and glass substrate
FR2924741B1 (fr) Procede de fabrication d'un element vitre, module de ventilation et element vitre equipe d'un tel module
FR2953068B1 (fr) Dispositif d'affichage electronique a ecran electroluminescent, et son procede de fabrication

Legal Events

Date Code Title Description
PLFP Fee payment

Year of fee payment: 8

PLFP Fee payment

Year of fee payment: 9

ST Notification of lapse

Effective date: 20180928