FR2818627B1 - Composant de micromecanique et procede de fabrication d'un tel composant - Google Patents
Composant de micromecanique et procede de fabrication d'un tel composantInfo
- Publication number
- FR2818627B1 FR2818627B1 FR0116669A FR0116669A FR2818627B1 FR 2818627 B1 FR2818627 B1 FR 2818627B1 FR 0116669 A FR0116669 A FR 0116669A FR 0116669 A FR0116669 A FR 0116669A FR 2818627 B1 FR2818627 B1 FR 2818627B1
- Authority
- FR
- France
- Prior art keywords
- component
- manufacturing
- micromechanical
- micromechanical component
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
- B81C1/00—Manufacture or treatment of devices or systems in or on a substrate
- B81C1/00436—Shaping materials, i.e. techniques for structuring the substrate or the layers on the substrate
- B81C1/00555—Achieving a desired geometry, i.e. controlling etch rates, anisotropy or selectivity
- B81C1/00563—Avoid or control over-etching
- B81C1/00571—Avoid or control under-cutting
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01P—MEASURING LINEAR OR ANGULAR SPEED, ACCELERATION, DECELERATION, OR SHOCK; INDICATING PRESENCE, ABSENCE, OR DIRECTION, OF MOVEMENT
- G01P15/00—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration
- G01P15/02—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses
- G01P15/08—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses with conversion into electric or magnetic values
- G01P15/0802—Details
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01P—MEASURING LINEAR OR ANGULAR SPEED, ACCELERATION, DECELERATION, OR SHOCK; INDICATING PRESENCE, ABSENCE, OR DIRECTION, OF MOVEMENT
- G01P15/00—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration
- G01P15/02—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses
- G01P15/08—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses with conversion into electric or magnetic values
- G01P15/125—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses with conversion into electric or magnetic values by capacitive pick-up
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81B—MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
- B81B2201/00—Specific applications of microelectromechanical systems
- B81B2201/02—Sensors
- B81B2201/0228—Inertial sensors
- B81B2201/0235—Accelerometers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81B—MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
- B81B2203/00—Basic microelectromechanical structures
- B81B2203/03—Static structures
- B81B2203/0323—Grooves
- B81B2203/033—Trenches
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
- B81C2201/00—Manufacture or treatment of microstructural devices or systems
- B81C2201/01—Manufacture or treatment of microstructural devices or systems in or on a substrate
- B81C2201/0101—Shaping material; Structuring the bulk substrate or layers on the substrate; Film patterning
- B81C2201/0102—Surface micromachining
- B81C2201/0105—Sacrificial layer
- B81C2201/0109—Sacrificial layers not provided for in B81C2201/0107 - B81C2201/0108
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01P—MEASURING LINEAR OR ANGULAR SPEED, ACCELERATION, DECELERATION, OR SHOCK; INDICATING PRESENCE, ABSENCE, OR DIRECTION, OF MOVEMENT
- G01P15/00—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration
- G01P15/02—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses
- G01P15/08—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses with conversion into electric or magnetic values
- G01P2015/0805—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses with conversion into electric or magnetic values being provided with a particular type of spring-mass-system for defining the displacement of a seismic mass due to an external acceleration
- G01P2015/0808—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses with conversion into electric or magnetic values being provided with a particular type of spring-mass-system for defining the displacement of a seismic mass due to an external acceleration for defining in-plane movement of the mass, i.e. movement of the mass in the plane of the substrate
- G01P2015/0811—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses with conversion into electric or magnetic values being provided with a particular type of spring-mass-system for defining the displacement of a seismic mass due to an external acceleration for defining in-plane movement of the mass, i.e. movement of the mass in the plane of the substrate for one single degree of freedom of movement of the mass
- G01P2015/0814—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses with conversion into electric or magnetic values being provided with a particular type of spring-mass-system for defining the displacement of a seismic mass due to an external acceleration for defining in-plane movement of the mass, i.e. movement of the mass in the plane of the substrate for one single degree of freedom of movement of the mass for translational movement of the mass, e.g. shuttle type
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Geometry (AREA)
- Manufacturing & Machinery (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Pressure Sensors (AREA)
- Micromachines (AREA)
- Transition And Organic Metals Composition Catalysts For Addition Polymerization (AREA)
- Medicines Containing Material From Animals Or Micro-Organisms (AREA)
- Preparation Of Compounds By Using Micro-Organisms (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE10065013A DE10065013B4 (de) | 2000-12-23 | 2000-12-23 | Verfahren zum Herstellen eines mikromechanischen Bauelements |
Publications (2)
Publication Number | Publication Date |
---|---|
FR2818627A1 FR2818627A1 (fr) | 2002-06-28 |
FR2818627B1 true FR2818627B1 (fr) | 2006-02-03 |
Family
ID=7668980
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
FR0116669A Expired - Fee Related FR2818627B1 (fr) | 2000-12-23 | 2001-12-21 | Composant de micromecanique et procede de fabrication d'un tel composant |
Country Status (5)
Country | Link |
---|---|
US (1) | US6686638B2 (fr) |
JP (1) | JP4603740B2 (fr) |
DE (1) | DE10065013B4 (fr) |
FR (1) | FR2818627B1 (fr) |
IT (1) | ITMI20012762A1 (fr) |
Families Citing this family (54)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE102004059911A1 (de) * | 2004-12-13 | 2006-06-14 | Robert Bosch Gmbh | Verfahren zum Bilden eines Grabens in einer Mikrostruktur |
US7205226B1 (en) * | 2005-02-24 | 2007-04-17 | Lam Research Corporation | Sacrificial layer for protection during trench etch |
US7560789B2 (en) | 2005-05-27 | 2009-07-14 | Semiconductor Energy Laboratory Co., Ltd. | Semiconductor device |
JP4519804B2 (ja) * | 2005-05-27 | 2010-08-04 | 株式会社半導体エネルギー研究所 | 半導体装置の作製方法 |
JP4799059B2 (ja) * | 2005-06-27 | 2011-10-19 | 株式会社東芝 | 半導体装置 |
JP2007071805A (ja) * | 2005-09-09 | 2007-03-22 | Denso Corp | 力学量センサの製造方法 |
KR20080068821A (ko) * | 2005-09-30 | 2008-07-24 | 퀄컴 엠이엠스 테크놀로지스, 인크. | Mems 장치 및 해당 장치용의 접속부 |
US20070128758A1 (en) * | 2005-12-01 | 2007-06-07 | Keisuke Tanaka | Semiconductor device and method for fabricating the same |
DE102006011545B4 (de) * | 2006-03-14 | 2016-03-17 | Robert Bosch Gmbh | Mikromechanisches Kombi-Bauelement und entsprechendes Herstellungsverfahren |
DE102006032195A1 (de) * | 2006-07-12 | 2008-01-24 | Robert Bosch Gmbh | Verfahren zur Herstellung von MEMS-Strukturen |
DE102006059084B4 (de) * | 2006-12-14 | 2022-05-05 | Robert Bosch Gmbh | Mikromechanisches Bauelement mit integrierten passiven elektronischen Bauelementen und Verfahren zu seiner Herstellung |
US8349167B2 (en) | 2006-12-14 | 2013-01-08 | Life Technologies Corporation | Methods and apparatus for detecting molecular interactions using FET arrays |
US8262900B2 (en) | 2006-12-14 | 2012-09-11 | Life Technologies Corporation | Methods and apparatus for measuring analytes using large scale FET arrays |
US7948015B2 (en) | 2006-12-14 | 2011-05-24 | Life Technologies Corporation | Methods and apparatus for measuring analytes using large scale FET arrays |
US11339430B2 (en) | 2007-07-10 | 2022-05-24 | Life Technologies Corporation | Methods and apparatus for measuring analytes using large scale FET arrays |
EP2109888A2 (fr) * | 2007-01-17 | 2009-10-21 | Nxp B.V. | Système dans un boîtier doté de trous d'interconnexion traversant le substrat |
JP5317154B2 (ja) * | 2007-06-07 | 2013-10-16 | 独立行政法人 宇宙航空研究開発機構 | 多軸慣性駆動型アクチュエータ |
DE102007031562B4 (de) * | 2007-07-06 | 2024-01-18 | Robert Bosch Gmbh | Gehäuse mit einem elektrischen Modul |
DE102007061096A1 (de) * | 2007-12-19 | 2009-06-25 | Robert Bosch Gmbh | Mikromechanisches Bauelement mit auslenkfähigem Element |
US8499629B2 (en) * | 2008-10-10 | 2013-08-06 | Honeywell International Inc. | Mounting system for torsional suspension of a MEMS device |
US20100137143A1 (en) | 2008-10-22 | 2010-06-03 | Ion Torrent Systems Incorporated | Methods and apparatus for measuring analytes |
US20100301398A1 (en) | 2009-05-29 | 2010-12-02 | Ion Torrent Systems Incorporated | Methods and apparatus for measuring analytes |
US7943525B2 (en) * | 2008-12-19 | 2011-05-17 | Freescale Semiconductor, Inc. | Method of producing microelectromechanical device with isolated microstructures |
US9940208B2 (en) | 2009-02-27 | 2018-04-10 | Red Hat, Inc. | Generating reverse installation file for network restoration |
US20120261274A1 (en) | 2009-05-29 | 2012-10-18 | Life Technologies Corporation | Methods and apparatus for measuring analytes |
US8776573B2 (en) | 2009-05-29 | 2014-07-15 | Life Technologies Corporation | Methods and apparatus for measuring analytes |
US9047155B2 (en) | 2009-06-30 | 2015-06-02 | Red Hat, Inc. | Message-based installation management using message bus |
DE102010000864B4 (de) * | 2010-01-13 | 2017-11-02 | Robert Bosch Gmbh | Mikromechanisches Bauelement und entsprechendes Herstellungsverfahren |
DE102010001021B4 (de) | 2010-01-19 | 2019-05-09 | Robert Bosch Gmbh | Mikromechanisches Bauelement und entsprechendes Herstellungsverfahren |
CN103392233B (zh) | 2010-06-30 | 2016-08-24 | 生命科技公司 | 阵列列积分器 |
CN103080739B (zh) | 2010-06-30 | 2016-12-21 | 生命科技公司 | 用于测试isfet阵列的方法和装置 |
US8858782B2 (en) | 2010-06-30 | 2014-10-14 | Life Technologies Corporation | Ion-sensing charge-accumulation circuits and methods |
US11307166B2 (en) | 2010-07-01 | 2022-04-19 | Life Technologies Corporation | Column ADC |
CN103168341B (zh) | 2010-07-03 | 2016-10-05 | 生命科技公司 | 具有轻度掺杂的排出装置的化学敏感的传感器 |
WO2012036679A1 (fr) | 2010-09-15 | 2012-03-22 | Life Technologies Corporation | Procédés et appareil de mesure d'analytes |
US8685324B2 (en) | 2010-09-24 | 2014-04-01 | Life Technologies Corporation | Matched pair transistor circuits |
JP5778914B2 (ja) * | 2010-11-04 | 2015-09-16 | キヤノン株式会社 | 電気機械変換装置の製造方法 |
US9970984B2 (en) | 2011-12-01 | 2018-05-15 | Life Technologies Corporation | Method and apparatus for identifying defects in a chemical sensor array |
EP2634154A1 (fr) | 2012-02-28 | 2013-09-04 | Omya Development AG | Procédé de préparation de ciment, mortiers, compositions de béton contenant un agent de remplissage à base de carbonate de calcium traité avec un agent de remplissage ultrafin et un superplastifiant, compositions et produits de ciment obtenus et leurs applications |
US8786331B2 (en) | 2012-05-29 | 2014-07-22 | Life Technologies Corporation | System for reducing noise in a chemical sensor array |
US9080968B2 (en) | 2013-01-04 | 2015-07-14 | Life Technologies Corporation | Methods and systems for point of use removal of sacrificial material |
US9841398B2 (en) | 2013-01-08 | 2017-12-12 | Life Technologies Corporation | Methods for manufacturing well structures for low-noise chemical sensors |
US8963216B2 (en) | 2013-03-13 | 2015-02-24 | Life Technologies Corporation | Chemical sensor with sidewall spacer sensor surface |
EP2972281B1 (fr) | 2013-03-15 | 2023-07-26 | Life Technologies Corporation | Dispositif chimique avec un élément conducteur |
US9835585B2 (en) | 2013-03-15 | 2017-12-05 | Life Technologies Corporation | Chemical sensor with protruded sensor surface |
US20140264472A1 (en) | 2013-03-15 | 2014-09-18 | Life Technologies Corporation | Chemical sensor with consistent sensor surface areas |
US20140336063A1 (en) | 2013-05-09 | 2014-11-13 | Life Technologies Corporation | Windowed Sequencing |
US10458942B2 (en) | 2013-06-10 | 2019-10-29 | Life Technologies Corporation | Chemical sensor array having multiple sensors per well |
DE102013107947A1 (de) | 2013-07-25 | 2015-02-19 | Acquandas GmbH | Verfahren zur Herstellung einer medizinischen Vorrichtung, Verfahren zum Modifizieren der Oberfläche einer medizinischen Vorrichtung, medizinische Vorrichtung und Schichtverbund mit einem Substrat |
TWI684004B (zh) | 2014-12-18 | 2020-02-01 | 美商生命技術公司 | 用於使用大規模fet陣列量測分析物之方法及設備 |
US10077472B2 (en) | 2014-12-18 | 2018-09-18 | Life Technologies Corporation | High data rate integrated circuit with power management |
TWI832669B (zh) | 2014-12-18 | 2024-02-11 | 美商生命技術公司 | 具有傳輸器組態的高資料速率積體電路 |
DE102015226155A1 (de) | 2015-12-21 | 2017-06-22 | Robert Bosch Gmbh | Verfahren zur Herstellung eines Schockdetektors und ein solcher Schockdetektor |
CN112055694B (zh) * | 2018-04-25 | 2023-12-19 | 希奥检测有限公司 | 具有温度稳定输出的电容式传感器 |
Family Cites Families (21)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB8921722D0 (en) * | 1989-09-26 | 1989-11-08 | British Telecomm | Micromechanical switch |
US5677560A (en) * | 1990-05-29 | 1997-10-14 | Fraunhofer Gesellschaft Zur Forderung Der Angewandten Forschung E.V. | Micromechanical component and process for the fabrication thereof |
DE4221432C2 (de) * | 1992-06-30 | 1994-06-09 | Siemens Ag | Globales Planarisierungsverfahren für integrierte Halbleiterschaltungen oder mikromechanische Bauteile |
US5461916A (en) * | 1992-08-21 | 1995-10-31 | Nippondenso Co., Ltd. | Mechanical force sensing semiconductor device |
DE4241045C1 (de) * | 1992-12-05 | 1994-05-26 | Bosch Gmbh Robert | Verfahren zum anisotropen Ätzen von Silicium |
DE4316856A1 (de) * | 1993-05-19 | 1994-11-24 | Siemens Ag | Mikromechanisches Bauteil und Verfahren zu seiner Herstellung |
DE4317274A1 (de) * | 1993-05-25 | 1994-12-01 | Bosch Gmbh Robert | Verfahren zur Herstellung oberflächen-mikromechanischer Strukturen |
DE4332057A1 (de) * | 1993-09-21 | 1995-03-30 | Siemens Ag | Integrierte mikromechanische Sensorvorrichtung und Verfahren zu deren Herstellung |
DE4418163B4 (de) * | 1994-05-25 | 2007-04-05 | Robert Bosch Gmbh | Verfahren zur Herstellung von mikromechanischen Strukturen |
DE19537814B4 (de) * | 1995-10-11 | 2009-11-19 | Robert Bosch Gmbh | Sensor und Verfahren zur Herstellung eines Sensors |
JP3430771B2 (ja) * | 1996-02-05 | 2003-07-28 | 株式会社デンソー | 半導体力学量センサの製造方法 |
DE19621996C2 (de) * | 1996-05-31 | 1998-04-09 | Siemens Ag | Verfahren zur Herstellung einer Kombination eines Drucksensors und eines elektrochemischen Sensors |
DE19648424C1 (de) * | 1996-11-22 | 1998-06-25 | Siemens Ag | Mikromechanischer Sensor |
DE19704454C2 (de) * | 1997-02-06 | 2000-03-02 | Bosch Gmbh Robert | Verfahren zur Herstellung oberflächenmikromechanischer Strukturen mittels Ätzung in der Dampfphase |
US6063696A (en) * | 1997-05-07 | 2000-05-16 | Texas Instruments Incorporated | Method of reducing wafer particles after partial saw using a superhard protective coating |
EP0882978A1 (fr) * | 1997-06-04 | 1998-12-09 | STMicroelectronics S.r.l. | Dispositif semi-conducteur intégré comportant un microcapteur chimiorésistif de gaz, et procédé pour sa fabrication |
US6065341A (en) * | 1998-02-18 | 2000-05-23 | Denso Corporation | Semiconductor physical quantity sensor with stopper portion |
DE19820816B4 (de) * | 1998-05-09 | 2006-05-11 | Robert Bosch Gmbh | Bondpadstruktur und entsprechendes Herstellungsverfahren |
US6105427A (en) * | 1998-07-31 | 2000-08-22 | Litton Systems, Inc. | Micro-mechanical semiconductor accelerometer |
US6218205B1 (en) * | 1998-10-09 | 2001-04-17 | The United States Of America As Represented By The Secretary Of The Air Force | Post-process depositing shielding for microelectromechanical systems |
DE19847305B4 (de) * | 1998-10-14 | 2011-02-03 | Robert Bosch Gmbh | Herstellungsverfahren für eine mikromechanische Vorrichtung |
-
2000
- 2000-12-23 DE DE10065013A patent/DE10065013B4/de not_active Expired - Fee Related
-
2001
- 2001-12-20 US US10/026,177 patent/US6686638B2/en not_active Expired - Lifetime
- 2001-12-21 FR FR0116669A patent/FR2818627B1/fr not_active Expired - Fee Related
- 2001-12-21 IT IT2001MI002762A patent/ITMI20012762A1/it unknown
- 2001-12-21 JP JP2001389728A patent/JP4603740B2/ja not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
FR2818627A1 (fr) | 2002-06-28 |
DE10065013B4 (de) | 2009-12-24 |
ITMI20012762A1 (it) | 2003-06-21 |
DE10065013A1 (de) | 2002-07-04 |
JP4603740B2 (ja) | 2010-12-22 |
US6686638B2 (en) | 2004-02-03 |
JP2002301695A (ja) | 2002-10-15 |
US20020096727A1 (en) | 2002-07-25 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
ST | Notification of lapse |
Effective date: 20160831 |