FI115772B - Kompositioner baserade på polyorganosiloxaner och deras användning för framställning av icke vidhäftande beläggningar - Google Patents
Kompositioner baserade på polyorganosiloxaner och deras användning för framställning av icke vidhäftande beläggningar Download PDFInfo
- Publication number
- FI115772B FI115772B FI931254A FI931254A FI115772B FI 115772 B FI115772 B FI 115772B FI 931254 A FI931254 A FI 931254A FI 931254 A FI931254 A FI 931254A FI 115772 B FI115772 B FI 115772B
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- FI
- Finland
- Prior art keywords
- radical
- formula
- borate
- mixtures according
- symbols
- Prior art date
Links
- 239000000203 mixture Substances 0.000 title claims description 40
- 238000004132 cross linking Methods 0.000 title claims description 12
- 125000000524 functional group Chemical group 0.000 title claims description 8
- 238000000576 coating method Methods 0.000 title description 7
- 238000004519 manufacturing process Methods 0.000 title description 2
- -1 heterocyclic radical Chemical class 0.000 claims description 23
- 125000000538 pentafluorophenyl group Chemical group FC1=C(F)C(F)=C(*)C(F)=C1F 0.000 claims description 12
- 239000004593 Epoxy Substances 0.000 claims description 11
- 150000003254 radicals Chemical class 0.000 claims description 11
- 150000003839 salts Chemical class 0.000 claims description 11
- BTBUEUYNUDRHOZ-UHFFFAOYSA-N Borate Chemical compound [O-]B([O-])[O-] BTBUEUYNUDRHOZ-UHFFFAOYSA-N 0.000 claims description 9
- 229920001296 polysiloxane Polymers 0.000 claims description 8
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 claims description 6
- QYKIQEUNHZKYBP-UHFFFAOYSA-N Vinyl ether Chemical compound C=COC=C QYKIQEUNHZKYBP-UHFFFAOYSA-N 0.000 claims description 6
- 229910052731 fluorine Inorganic materials 0.000 claims description 6
- 239000011737 fluorine Substances 0.000 claims description 6
- 125000005843 halogen group Chemical group 0.000 claims description 6
- 125000000217 alkyl group Chemical group 0.000 claims description 5
- 150000001450 anions Chemical group 0.000 claims description 5
- 150000005840 aryl radicals Chemical class 0.000 claims description 5
- 125000002091 cationic group Chemical group 0.000 claims description 5
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 4
- ZUOUZKKEUPVFJK-UHFFFAOYSA-N diphenyl Chemical compound C1=CC=CC=C1C1=CC=CC=C1 ZUOUZKKEUPVFJK-UHFFFAOYSA-N 0.000 claims description 4
- 238000000034 method Methods 0.000 claims description 4
- 229910052757 nitrogen Inorganic materials 0.000 claims description 4
- 229920000642 polymer Polymers 0.000 claims description 4
- 229910052717 sulfur Inorganic materials 0.000 claims description 4
- 125000003118 aryl group Chemical group 0.000 claims description 3
- 230000005855 radiation Effects 0.000 claims description 3
- YHZWLYFIJJYQMV-UHFFFAOYSA-N 2-dodecyl-1h-isothiochromen-2-ium-4-one Chemical compound C1=CC=C2C[S+](CCCCCCCCCCCC)CC(=O)C2=C1 YHZWLYFIJJYQMV-UHFFFAOYSA-N 0.000 claims description 2
- QWTJRBCSEOMXGM-UHFFFAOYSA-N 2-ethyl-1h-isothiochromen-2-ium-4-one Chemical compound C1=CC=C2C[S+](CC)CC(=O)C2=C1 QWTJRBCSEOMXGM-UHFFFAOYSA-N 0.000 claims description 2
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical compound [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 claims description 2
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 claims description 2
- 229910018557 Si O Inorganic materials 0.000 claims description 2
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 claims description 2
- CIUQDSCDWFSTQR-UHFFFAOYSA-N [C]1=CC=CC=C1 Chemical group [C]1=CC=CC=C1 CIUQDSCDWFSTQR-UHFFFAOYSA-N 0.000 claims description 2
- 125000003545 alkoxy group Chemical group 0.000 claims description 2
- 125000004429 atom Chemical group 0.000 claims description 2
- 239000004305 biphenyl Substances 0.000 claims description 2
- 235000010290 biphenyl Nutrition 0.000 claims description 2
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 claims description 2
- 229910052794 bromium Inorganic materials 0.000 claims description 2
- 125000002837 carbocyclic group Chemical group 0.000 claims description 2
- 125000004432 carbon atom Chemical group C* 0.000 claims description 2
- 239000000460 chlorine Substances 0.000 claims description 2
- 229910052801 chlorine Inorganic materials 0.000 claims description 2
- 125000004188 dichlorophenyl group Chemical group 0.000 claims description 2
- 238000010894 electron beam technology Methods 0.000 claims description 2
- 125000006575 electron-withdrawing group Chemical group 0.000 claims description 2
- 229910052740 iodine Inorganic materials 0.000 claims description 2
- 125000001624 naphthyl group Chemical group 0.000 claims description 2
- HVZWVEKIQMJYIK-UHFFFAOYSA-N nitryl chloride Chemical compound [O-][N+](Cl)=O HVZWVEKIQMJYIK-UHFFFAOYSA-N 0.000 claims description 2
- 230000000737 periodic effect Effects 0.000 claims description 2
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims description 2
- 238000009877 rendering Methods 0.000 claims description 2
- LIVNPJMFVYWSIS-UHFFFAOYSA-N silicon monoxide Inorganic materials [Si-]#[O+] LIVNPJMFVYWSIS-UHFFFAOYSA-N 0.000 claims description 2
- 239000011593 sulfur Substances 0.000 claims description 2
- 125000003396 thiol group Chemical group [H]S* 0.000 claims description 2
- RWSOTUBLDIXVET-UHFFFAOYSA-N Dihydrogen sulfide Chemical class S RWSOTUBLDIXVET-UHFFFAOYSA-N 0.000 claims 1
- URSLCTBXQMKCFE-UHFFFAOYSA-N dihydrogenborate Chemical compound OB(O)[O-] URSLCTBXQMKCFE-UHFFFAOYSA-N 0.000 claims 1
- 125000000623 heterocyclic group Chemical group 0.000 claims 1
- 125000003107 substituted aryl group Chemical group 0.000 claims 1
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 16
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 16
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 14
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 12
- NFHFRUOZVGFOOS-UHFFFAOYSA-N palladium;triphenylphosphane Chemical compound [Pd].C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 NFHFRUOZVGFOOS-UHFFFAOYSA-N 0.000 description 10
- LWNGJAHMBMVCJR-UHFFFAOYSA-N (2,3,4,5,6-pentafluorophenoxy)boronic acid Chemical compound OB(O)OC1=C(F)C(F)=C(F)C(F)=C1F LWNGJAHMBMVCJR-UHFFFAOYSA-N 0.000 description 9
- 239000003054 catalyst Substances 0.000 description 9
- 238000001914 filtration Methods 0.000 description 7
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 6
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 6
- 239000011541 reaction mixture Substances 0.000 description 6
- WHXSMMKQMYFTQS-UHFFFAOYSA-N Lithium Chemical compound [Li] WHXSMMKQMYFTQS-UHFFFAOYSA-N 0.000 description 5
- 229960000583 acetic acid Drugs 0.000 description 5
- 150000001875 compounds Chemical class 0.000 description 5
- 239000003999 initiator Substances 0.000 description 5
- 229910052744 lithium Inorganic materials 0.000 description 5
- CSNNHWWHGAXBCP-UHFFFAOYSA-L Magnesium sulfate Chemical compound [Mg+2].[O-][S+2]([O-])([O-])[O-] CSNNHWWHGAXBCP-UHFFFAOYSA-L 0.000 description 4
- 239000012071 phase Substances 0.000 description 4
- WFDIJRYMOXRFFG-UHFFFAOYSA-N Acetic anhydride Chemical compound CC(=O)OC(C)=O WFDIJRYMOXRFFG-UHFFFAOYSA-N 0.000 description 3
- WEVYAHXRMPXWCK-UHFFFAOYSA-N Acetonitrile Chemical compound CC#N WEVYAHXRMPXWCK-UHFFFAOYSA-N 0.000 description 3
- 229910004298 SiO 2 Inorganic materials 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 230000001070 adhesive effect Effects 0.000 description 3
- 238000006243 chemical reaction Methods 0.000 description 3
- 239000011248 coating agent Substances 0.000 description 3
- OZLBDYMWFAHSOQ-UHFFFAOYSA-N diphenyliodanium Chemical compound C=1C=CC=CC=1[I+]C1=CC=CC=C1 OZLBDYMWFAHSOQ-UHFFFAOYSA-N 0.000 description 3
- 239000011521 glass Substances 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 239000012074 organic phase Substances 0.000 description 3
- 239000000123 paper Substances 0.000 description 3
- 239000002244 precipitate Substances 0.000 description 3
- 239000007787 solid Substances 0.000 description 3
- 239000002904 solvent Substances 0.000 description 3
- 239000000758 substrate Substances 0.000 description 3
- VQVGJEIVVJBMCV-UHFFFAOYSA-N (4-octoxyphenyl)-phenyliodanium Chemical compound C1=CC(OCCCCCCCC)=CC=C1[I+]C1=CC=CC=C1 VQVGJEIVVJBMCV-UHFFFAOYSA-N 0.000 description 2
- LDSRDVDEPKEARF-UHFFFAOYSA-M 4-methylbenzenesulfonate;(4-octoxyphenyl)-phenyliodanium Chemical compound CC1=CC=C(S([O-])(=O)=O)C=C1.C1=CC(OCCCCCCCC)=CC=C1[I+]C1=CC=CC=C1 LDSRDVDEPKEARF-UHFFFAOYSA-M 0.000 description 2
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 2
- QZRGKCOWNLSUDK-UHFFFAOYSA-N Iodochlorine Chemical compound ICl QZRGKCOWNLSUDK-UHFFFAOYSA-N 0.000 description 2
- MZRVEZGGRBJDDB-UHFFFAOYSA-N N-Butyllithium Chemical compound [Li]CCCC MZRVEZGGRBJDDB-UHFFFAOYSA-N 0.000 description 2
- OFBQJSOFQDEBGM-UHFFFAOYSA-N Pentane Chemical compound CCCCC OFBQJSOFQDEBGM-UHFFFAOYSA-N 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- 239000000853 adhesive Substances 0.000 description 2
- 229910052783 alkali metal Inorganic materials 0.000 description 2
- 125000000129 anionic group Chemical group 0.000 description 2
- 150000001642 boronic acid derivatives Chemical class 0.000 description 2
- 125000003700 epoxy group Chemical group 0.000 description 2
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 2
- 230000004927 fusion Effects 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 238000006459 hydrosilylation reaction Methods 0.000 description 2
- 230000000977 initiatory effect Effects 0.000 description 2
- MGFYSGNNHQQTJW-UHFFFAOYSA-N iodonium Chemical compound [IH2+] MGFYSGNNHQQTJW-UHFFFAOYSA-N 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- KWGKDLIKAYFUFQ-UHFFFAOYSA-M lithium chloride Chemical compound [Li+].[Cl-] KWGKDLIKAYFUFQ-UHFFFAOYSA-M 0.000 description 2
- 229910052943 magnesium sulfate Inorganic materials 0.000 description 2
- 235000019341 magnesium sulphate Nutrition 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 239000003921 oil Substances 0.000 description 2
- 229920003023 plastic Polymers 0.000 description 2
- 239000004033 plastic Substances 0.000 description 2
- 239000000047 product Substances 0.000 description 2
- 238000003756 stirring Methods 0.000 description 2
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 2
- 229920002554 vinyl polymer Polymers 0.000 description 2
- FSXLZUKMPRDBFO-UHFFFAOYSA-N (2-hydroxy-6-iodophenyl) 4-methylbenzenesulfonate Chemical compound C1=CC(C)=CC=C1S(=O)(=O)OC1=C(O)C=CC=C1I FSXLZUKMPRDBFO-UHFFFAOYSA-N 0.000 description 1
- 125000006527 (C1-C5) alkyl group Chemical group 0.000 description 1
- XEKTVXADUPBFOA-UHFFFAOYSA-N 1-bromo-2,3,4,5,6-pentafluorobenzene Chemical compound FC1=C(F)C(F)=C(Br)C(F)=C1F XEKTVXADUPBFOA-UHFFFAOYSA-N 0.000 description 1
- VMKOFRJSULQZRM-UHFFFAOYSA-N 1-bromooctane Chemical compound CCCCCCCCBr VMKOFRJSULQZRM-UHFFFAOYSA-N 0.000 description 1
- STMDPCBYJCIZOD-UHFFFAOYSA-N 2-(2,4-dinitroanilino)-4-methylpentanoic acid Chemical compound CC(C)CC(C(O)=O)NC1=CC=C([N+]([O-])=O)C=C1[N+]([O-])=O STMDPCBYJCIZOD-UHFFFAOYSA-N 0.000 description 1
- ZXABMDQSAABDMG-UHFFFAOYSA-N 3-ethenoxyprop-1-ene Chemical compound C=CCOC=C ZXABMDQSAABDMG-UHFFFAOYSA-N 0.000 description 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 1
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical group CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 1
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 1
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 1
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 1
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 description 1
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical class [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- DGIDDDIFEQSDJB-UHFFFAOYSA-J [Cl-].[Cl-].[Cl-].[Cl-].[Li+].[Li+].[Li+].[Li+] Chemical compound [Cl-].[Cl-].[Cl-].[Cl-].[Li+].[Li+].[Li+].[Li+] DGIDDDIFEQSDJB-UHFFFAOYSA-J 0.000 description 1
- ZBIKORITPGTTGI-UHFFFAOYSA-N [acetyloxy(phenyl)-$l^{3}-iodanyl] acetate Chemical compound CC(=O)OI(OC(C)=O)C1=CC=CC=C1 ZBIKORITPGTTGI-UHFFFAOYSA-N 0.000 description 1
- 239000003522 acrylic cement Substances 0.000 description 1
- 230000004913 activation Effects 0.000 description 1
- 238000013019 agitation Methods 0.000 description 1
- 229910001508 alkali metal halide Inorganic materials 0.000 description 1
- 150000008045 alkali metal halides Chemical class 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 230000000844 anti-bacterial effect Effects 0.000 description 1
- 239000004599 antimicrobial Substances 0.000 description 1
- 239000008346 aqueous phase Substances 0.000 description 1
- 239000012298 atmosphere Substances 0.000 description 1
- 239000003899 bactericide agent Substances 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 229910052796 boron Inorganic materials 0.000 description 1
- 239000001569 carbon dioxide Substances 0.000 description 1
- 229910002092 carbon dioxide Inorganic materials 0.000 description 1
- 150000001768 cations Chemical class 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 239000012141 concentrate Substances 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 229960002944 cyclofenil Drugs 0.000 description 1
- ZWAJLVLEBYIOTI-UHFFFAOYSA-N cyclohexene oxide Chemical compound C1CCCC2OC21 ZWAJLVLEBYIOTI-UHFFFAOYSA-N 0.000 description 1
- RSJLWBUYLGJOBD-UHFFFAOYSA-M diphenyliodanium;chloride Chemical compound [Cl-].C=1C=CC=CC=1[I+]C1=CC=CC=C1 RSJLWBUYLGJOBD-UHFFFAOYSA-M 0.000 description 1
- 229920001971 elastomer Polymers 0.000 description 1
- 238000005538 encapsulation Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 230000005284 excitation Effects 0.000 description 1
- 238000000605 extraction Methods 0.000 description 1
- 239000010408 film Substances 0.000 description 1
- 239000000706 filtrate Substances 0.000 description 1
- 239000012362 glacial acetic acid Substances 0.000 description 1
- 150000004820 halides Chemical class 0.000 description 1
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 1
- 150000002430 hydrocarbons Chemical group 0.000 description 1
- XMBWDFGMSWQBCA-UHFFFAOYSA-N hydrogen iodide Chemical compound I XMBWDFGMSWQBCA-UHFFFAOYSA-N 0.000 description 1
- 230000007062 hydrolysis Effects 0.000 description 1
- 238000006460 hydrolysis reaction Methods 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-M hydroxide Chemical compound [OH-] XLYOFNOQVPJJNP-UHFFFAOYSA-M 0.000 description 1
- 239000004615 ingredient Substances 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- IOEDDFFKYCBADJ-UHFFFAOYSA-M lithium;4-methylbenzenesulfonate Chemical compound [Li+].CC1=CC=C(S([O-])(=O)=O)C=C1 IOEDDFFKYCBADJ-UHFFFAOYSA-M 0.000 description 1
- 239000011777 magnesium Substances 0.000 description 1
- 229910052749 magnesium Inorganic materials 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- HZNFSZMIMUTCGG-UHFFFAOYSA-N n-(3-hydroxypyridin-4-yl)-2,2-dimethylpropanamide Chemical compound CC(C)(C)C(=O)NC1=CC=NC=C1O HZNFSZMIMUTCGG-UHFFFAOYSA-N 0.000 description 1
- 239000013307 optical fiber Substances 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 150000002902 organometallic compounds Chemical class 0.000 description 1
- 125000002524 organometallic group Chemical group 0.000 description 1
- 125000005375 organosiloxane group Chemical group 0.000 description 1
- 239000003973 paint Substances 0.000 description 1
- 239000003504 photosensitizing agent Substances 0.000 description 1
- 239000000049 pigment Substances 0.000 description 1
- 238000006116 polymerization reaction Methods 0.000 description 1
- 229910052700 potassium Inorganic materials 0.000 description 1
- 239000011591 potassium Substances 0.000 description 1
- JLKDVMWYMMLWTI-UHFFFAOYSA-M potassium iodate Chemical compound [K+].[O-]I(=O)=O JLKDVMWYMMLWTI-UHFFFAOYSA-M 0.000 description 1
- 239000001230 potassium iodate Substances 0.000 description 1
- 235000006666 potassium iodate Nutrition 0.000 description 1
- 229940093930 potassium iodate Drugs 0.000 description 1
- 238000000746 purification Methods 0.000 description 1
- 239000000376 reactant Substances 0.000 description 1
- 230000035484 reaction time Effects 0.000 description 1
- 229920002050 silicone resin Polymers 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- 159000000000 sodium salts Chemical class 0.000 description 1
- 239000011343 solid material Substances 0.000 description 1
- 125000000020 sulfo group Chemical group O=S(=O)([*])O[H] 0.000 description 1
- 238000003786 synthesis reaction Methods 0.000 description 1
- JRMUNVKIHCOMHV-UHFFFAOYSA-M tetrabutylammonium bromide Chemical compound [Br-].CCCC[N+](CCCC)(CCCC)CCCC JRMUNVKIHCOMHV-UHFFFAOYSA-M 0.000 description 1
- 239000004753 textile Substances 0.000 description 1
- 229910052718 tin Inorganic materials 0.000 description 1
- 230000001988 toxicity Effects 0.000 description 1
- 231100000419 toxicity Toxicity 0.000 description 1
- FAQYAMRNWDIXMY-UHFFFAOYSA-N trichloroborane Chemical compound ClB(Cl)Cl FAQYAMRNWDIXMY-UHFFFAOYSA-N 0.000 description 1
- 125000000026 trimethylsilyl group Chemical group [H]C([H])([H])[Si]([*])(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- 238000009281 ultraviolet germicidal irradiation Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/55—Boron-containing compounds
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F5/00—Compounds containing elements of Groups 3 or 13 of the Periodic Table
- C07F5/02—Boron compounds
- C07F5/027—Organoboranes and organoborohydrides
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D183/00—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers
- C09D183/04—Polysiloxanes
- C09D183/06—Polysiloxanes containing silicon bound to oxygen-containing groups
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/31504—Composite [nonstructural laminate]
- Y10T428/31652—Of asbestos
- Y10T428/31663—As siloxane, silicone or silane
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- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Life Sciences & Earth Sciences (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Health & Medical Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Wood Science & Technology (AREA)
- Paints Or Removers (AREA)
- Silicon Polymers (AREA)
- Processes Of Treating Macromolecular Substances (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Epoxy Resins (AREA)
Claims (9)
1. Kompositioner baserade pä en katijoniskt tvärbindbar polyorganosiloxan och en katalytiskt effektiv mängd av ett oniumborat av ett element ur grupperna 15-17 i det periodiska systemet (Chem. & Eng. News, voi 63, nr 5, 26, 4. februari 1985), kännetecknade av att katijondelen i nämnda oniumborat är vald bland: 20 1) oniumsalter med formeln I [(R')n-A-(R2)mr O) I f · · » I i i vilken formel : ‘ : 25 - A representerar ett element ur grupperna 15-17 säsom t.ex. I, S, Se, P eller N :**: - R1 representerar en C6-C2o-karbocyklisk eller heterocyklisk radikal varvid den ;';'. heterocykliska radikalen kan innehälla som heteroelement t.ex. kväve eller svavel - R2 representerar R1 eller en lineär eller föregrenad CrC3o-alkyl- eller -alkenylra-dikal, varvid nämnda radikaler R1 och R2 eventuellt är substituerade med t.ex. en 30 CrC25-alkoxigrupp, en CrC25-alkylgrupp, eller en nitro-, klor-, brom-, cyano-, karb-;' ’ oxi- eller merkaptogrupp . ‘ : - n är ett heltal mellan 1 och v+1 varvid v är valensen hos elementet A ' : - m är ett heltal frän 0 tili v-1 sä, att n+m=v+1 115772 16 2. oxoisotiokromaniumsalter med formeln rrS \3 5. vilken formel R3 representerar en CrC20-alkyl- eller cykloalkylradikal eller arylradikal, speciellt 2-etyl-4-oxoisotiokromanium- eller 2-dodekyl-4-oxoisotiokromaniumsulfoniumsaltet, och att den anjoniska boratenheten har formel: 10 [BXaRb]' i vilken formel: 15. a och b är heltal frän 0 till 4 varvid a+b=4 - symbolerna X representerar - en halogenatom (klor, fluor) sä, att a är mellan 0 och 3 ; · ; - en OH-grupp varvid a är mellan 0 och 2 : 20 : - symbolerna R är lika eller olika och representerar ' - en fenylradikal som är substituerad med ätminstone en elektronatraheran- de grupp säsom t.ex. CF3, N02 eller CN, eller ätminstone med tvä halogen-:; atomer (speciellt fluor) 25. en arylradikal med ätminstone tvä aromatiska ringar, säsom t.ex. en bifenyl eller naftyl, och som eventuellt är substituerade ätminstone med ett elektro- · ‘ natraherande element eller grupp, som speciellt är en halogenatom (företrä- desvis fluor), CF3, N02 eller CN. .: 30
2. Kompositioner enligt patentkrav 1, kännetecknade av att boratanjondelen : : : än ’’ [B(C6F5)4]' [B(C6H4CF3)4]- [(C6f5)2bf2]· [C6F5BF3]· [B(C6H3F2)4]- 1 1 5772 17
3. Kompositioner enligt patentkrav 1 eller 2, kännetecknade av att oniumkatjon-delen är: [(Φ)2Ι]+ [08Ηΐ7-0-φ-Ι-φ]+ 5 [012Η25-φ-Ι-φ]+ [(08Η17-0-φ)2Ι]+ [(Φ)3δ]+ [(φ)2-δ-φ-0-08Η17]+ [φ-8-φ-8-(φ)2]+ [(Οι2Η25-φ)2Ι]+
4. Kompositioner enligt nägot av patentkraven 1 till 3, kännetecknade av att 10 oniumboratet är: [(φ)2Ι]+,[Β(06Ρ5)4]· [(Οι2Η25-φ-Ι-φ)]+,[Β(06Ρ5)4Γ [(C8H! 7-0-φ)2Ι]+, [B(C6F5)4]· [(08η17-ο-φ-ι-φ)]+,[Β(06ρ5)4]· [(Φ)3δ]+ [B(C6F5)4]· 15 [(φ)28-φ-0-08Η 17]+, [B (C6H4C F3)4]' [(C12H25^)2ir,[B(C6F5)4r
5. Kompositioner enligt nägot av patentkraven 1 tili 4, kännetecknade av att nämnda organopolysiloxan har funktionella grupper säsom epoxi eller vinyleter.
6. Kompositioner enligt patentkrav 5, kännetecknade av att nämnda polyorga- . nosiloxaner är lineära eller väsentligen lineära ooh bestär av enheter enligt < < · ;·; formeln (II) ooh slutar med enheter enligt formeln (III) eller är cykliska ooh bestär * · *' : av enheter enligt formeln (II) » t * * I * * ·:·: 25 R' R' :v. I I : -(-Si-O-)- (II) Y-Si-O- (III) Y R' 30 :: : i vilka formler » I ; ’ - symbolerna R' är lika eller olika ooh representerar speciellt en lineär eller : : föregrenad CrCe-alkylradikal, som eventuellt är substituerad (t.ex. 3,3,3-trifluor- propyl), en C5-C8-ringalkylradikal, en arylradikal (speciellt fenyl), en substituerad 35 arylradikal (t.ex. diklorfenyl) sä, att ätminstone 60 mol-% av radikalerna R‘ är me- : ‘ tylradikaler; * : 1 ’ : - symbolerna Y är lika eller olika ooh representerar antingen gruppen R’ eller en katjoniskt tvärbindbar funktionell radikal, säsom t.ex. en epoxifunktionell eller vinyl-oxifunktionell grupp, varvid nämnda epoxid- eller vinyleterfunktionella grupperna är 115772 18 bundna till en atom i silikonkedjan medelst en tvävärd radikal innehällande 2-20 kolatomer; varvid ätminstone en av symbolerna Y representerar en katjonisk tvärbindbar 5 funktionell organisk radikal och företrädesvis mellan i och 10 funktionella organis-ka radikaler per molpolymer.
7. Kompositioner enligt patentkrav 6, kännetecknade av att viskositeten för nämnda polyorganosiloxan vid 25 °C är cirka 10-10000 mm2/s. 10
8. Förfarande för att göra artiklar ohäftbara till ytor, vid vilka de vanligtvis skulle häfta, kännetecknat av att 0,1-5 g/m2 av en komposition enligt nägot av patent-kraven 1 -7 appliceras pä ytan av artikeln som skall beläggas och nämnda komposition tvärbindes fotokemisk eller medelst en elektronsträle. 15
9. Förfarande enligt patentkrav 8, kännetecknat av att tvärbindningsätgärden genomförs med hjälp av UV-besträlning varvid väglängden är cirka 200-400 nanometer. * ' t * * » * t * » > » * » ' * ‘ > ' t
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| FR9203441A FR2688790B1 (fr) | 1992-03-23 | 1992-03-23 | Compositions a base de polyorganosiloxanes a groupements fonctionnels reticulables et leur utilisation pour la realisation de revetements anti-adhesifs. |
| FR9203441 | 1992-03-23 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| FI931254A0 FI931254A0 (fi) | 1993-03-22 |
| FI931254A FI931254A (fi) | 1993-09-24 |
| FI115772B true FI115772B (sv) | 2005-07-15 |
Family
ID=9427944
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| FI931254A FI115772B (sv) | 1992-03-23 | 1993-03-22 | Kompositioner baserade på polyorganosiloxaner och deras användning för framställning av icke vidhäftande beläggningar |
Country Status (9)
| Country | Link |
|---|---|
| US (1) | US5340898A (sv) |
| EP (1) | EP0562922B1 (sv) |
| JP (1) | JP2623426B2 (sv) |
| AU (1) | AU662963B2 (sv) |
| CA (1) | CA2092137C (sv) |
| DE (1) | DE69310797T2 (sv) |
| ES (1) | ES2102616T3 (sv) |
| FI (1) | FI115772B (sv) |
| FR (1) | FR2688790B1 (sv) |
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| EP2517052B1 (en) | 2009-12-21 | 2019-06-12 | Dow Silicones Corporation | Methods for fabricating flexible waveguides using alkyl-functional silsesquioxane resins |
| MX361011B (es) * | 2010-02-03 | 2018-11-26 | Infinity Pharmaceuticals Inc | Inhibidores de amida hidrolasa de ácido graso. |
| KR20120132624A (ko) | 2010-02-12 | 2012-12-06 | 다우 코닝 코포레이션 | 반도체 가공을 위한 임시 웨이퍼 접합 방법 |
| US20130203882A1 (en) | 2010-04-29 | 2013-08-08 | Huntsman International Llc | Curable Composition |
| WO2012027073A1 (en) | 2010-08-23 | 2012-03-01 | Dow Corning Corporation | Saccharide siloxanes stable in aqueous environments and methods for the preparation and use of such saccharide siloxanes |
| EP2444450A1 (de) | 2010-10-19 | 2012-04-25 | Hinterwaldner Consulting & Partner (Gbr) | Zusammensetzungen zur Herstellung abhäsiver Beschichtungen |
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| EP2445029A1 (en) | 2010-10-25 | 2012-04-25 | Nederlandse Organisatie voor toegepast -natuurwetenschappelijk onderzoek TNO | Multilayered protective layer, organic opto-electric device and method of manufacturing the same |
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| EP3194501B1 (en) | 2014-09-17 | 2024-07-10 | Dow Silicones Corporation | 3d printing method utilizing a photocurable silicone composition |
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|---|---|---|---|---|
| JPS5450596A (en) * | 1977-09-30 | 1979-04-20 | Hitachi Ltd | Epoxy resin composition |
| US4617238A (en) * | 1982-04-01 | 1986-10-14 | General Electric Company | Vinyloxy-functional organopolysiloxane compositions |
| US4640967A (en) * | 1982-05-06 | 1987-02-03 | General Electric Company | Ultraviolet radiation-curable silicone release compositions with epoxy and/or acrylic functionality |
| US4576999A (en) * | 1982-05-06 | 1986-03-18 | General Electric Company | Ultraviolet radiation-curable silicone release compositions with epoxy and/or acrylic functionality |
| JPH0774327B2 (ja) * | 1987-02-14 | 1995-08-09 | 日東電工株式会社 | 紫外線硬化型シリコーン系剥離剤 |
| JP2641260B2 (ja) * | 1988-07-26 | 1997-08-13 | キヤノン株式会社 | 光重合開始剤及び感光性組成物 |
| SE8901048D0 (sv) * | 1989-03-23 | 1989-03-23 | Becker Wilhelm Ab | Polymerisationsinitiator |
| FI900741A0 (fi) * | 1989-04-03 | 1990-02-14 | Gen Electric | Med ultraviolett straolning haerdbart epoxisilikon-/polyolsystem. |
| US5084586A (en) * | 1990-02-12 | 1992-01-28 | Minnesota Mining And Manufacturing Company | Novel initiators for cationic polymerization |
| JP2712093B2 (ja) * | 1990-06-29 | 1998-02-10 | 東芝シリコーン株式会社 | 紫外線硬化性シリコーン組成物 |
-
1992
- 1992-03-23 FR FR9203441A patent/FR2688790B1/fr not_active Expired - Fee Related
-
1993
- 1993-03-19 EP EP93400705A patent/EP0562922B1/fr not_active Expired - Lifetime
- 1993-03-19 ES ES93400705T patent/ES2102616T3/es not_active Expired - Lifetime
- 1993-03-19 DE DE69310797T patent/DE69310797T2/de not_active Expired - Lifetime
- 1993-03-22 CA CA002092137A patent/CA2092137C/fr not_active Expired - Fee Related
- 1993-03-22 FI FI931254A patent/FI115772B/sv not_active IP Right Cessation
- 1993-03-22 AU AU35389/93A patent/AU662963B2/en not_active Ceased
- 1993-03-23 US US08/035,603 patent/US5340898A/en not_active Expired - Lifetime
- 1993-03-23 JP JP5086938A patent/JP2623426B2/ja not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| ES2102616T3 (es) | 1997-08-01 |
| FR2688790B1 (fr) | 1994-05-13 |
| EP0562922B1 (fr) | 1997-05-21 |
| DE69310797D1 (de) | 1997-06-26 |
| FR2688790A1 (fr) | 1993-09-24 |
| AU3538993A (en) | 1993-09-30 |
| JPH0641433A (ja) | 1994-02-15 |
| CA2092137C (fr) | 2002-03-19 |
| FI931254A0 (fi) | 1993-03-22 |
| EP0562922A1 (fr) | 1993-09-29 |
| JP2623426B2 (ja) | 1997-06-25 |
| CA2092137A1 (fr) | 1993-09-24 |
| US5340898A (en) | 1994-08-23 |
| FI931254A (fi) | 1993-09-24 |
| DE69310797T2 (de) | 1997-12-04 |
| AU662963B2 (en) | 1995-09-21 |
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