[go: up one dir, main page]
More Web Proxy on the site http://driver.im/

ES2194584A1 - Monoacilalquilfosfinas organometalicas. - Google Patents

Monoacilalquilfosfinas organometalicas.

Info

Publication number
ES2194584A1
ES2194584A1 ES200101326A ES200101326A ES2194584A1 ES 2194584 A1 ES2194584 A1 ES 2194584A1 ES 200101326 A ES200101326 A ES 200101326A ES 200101326 A ES200101326 A ES 200101326A ES 2194584 A1 ES2194584 A1 ES 2194584A1
Authority
ES
Spain
Prior art keywords
unsubstituted
substituted
interrupted
c20alkyl
hydrogen
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
ES200101326A
Other languages
English (en)
Other versions
ES2194584B1 (es
Inventor
Jean-Pierre Wolf
Gebhard Hug
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
BASF Schweiz AG
Original Assignee
Ciba Spezialitaetenchemie Holding AG
Ciba SC Holding AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ciba Spezialitaetenchemie Holding AG, Ciba SC Holding AG filed Critical Ciba Spezialitaetenchemie Holding AG
Publication of ES2194584A1 publication Critical patent/ES2194584A1/es
Application granted granted Critical
Publication of ES2194584B1 publication Critical patent/ES2194584B1/es
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F9/00—Compounds containing elements of Groups 5 or 15 of the Periodic Table
    • C07F9/02—Phosphorus compounds
    • C07F9/28—Phosphorus compounds with one or more P—C bonds
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F9/00—Compounds containing elements of Groups 5 or 15 of the Periodic Table
    • C07F9/02—Phosphorus compounds
    • C07F9/28—Phosphorus compounds with one or more P—C bonds
    • C07F9/50—Organo-phosphines
    • C07F9/5036—Phosphines containing the structure -C(=X)-P or NC-P
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F9/00—Compounds containing elements of Groups 5 or 15 of the Periodic Table
    • C07F9/02—Phosphorus compounds
    • C07F9/28—Phosphorus compounds with one or more P—C bonds
    • C07F9/50—Organo-phosphines
    • C07F9/53—Organo-phosphine oxides; Organo-phosphine thioxides
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F9/00—Compounds containing elements of Groups 5 or 15 of the Periodic Table
    • C07F9/02—Phosphorus compounds
    • C07F9/28—Phosphorus compounds with one or more P—C bonds
    • C07F9/50—Organo-phosphines
    • C07F9/53—Organo-phosphine oxides; Organo-phosphine thioxides
    • C07F9/5337—Phosphine oxides or thioxides containing the structure -C(=X)-P(=X) or NC-P(=X) (X = O, S, Se)
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F9/00—Compounds containing elements of Groups 5 or 15 of the Periodic Table
    • C07F9/02—Phosphorus compounds
    • C07F9/547—Heterocyclic compounds, e.g. containing phosphorus as a ring hetero atom
    • C07F9/655—Heterocyclic compounds, e.g. containing phosphorus as a ring hetero atom having oxygen atoms, with or without sulfur, selenium, or tellurium atoms, as the only ring hetero atoms
    • C07F9/65502—Heterocyclic compounds, e.g. containing phosphorus as a ring hetero atom having oxygen atoms, with or without sulfur, selenium, or tellurium atoms, as the only ring hetero atoms the oxygen atom being part of a three-membered ring
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/49—Phosphorus-containing compounds
    • C08K5/51—Phosphorus bound to oxygen
    • C08K5/53—Phosphorus bound to oxygen bound to oxygen and to carbon only
    • C08K5/5397—Phosphine oxides
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D11/00—Inks
    • C09D11/02—Printing inks
    • C09D11/10—Printing inks based on artificial resins
    • C09D11/101—Inks specially adapted for printing processes involving curing by wave energy or particle radiation, e.g. with UV-curing following the printing
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • A—HUMAN NECESSITIES
    • A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61K—PREPARATIONS FOR MEDICAL, DENTAL OR TOILETRY PURPOSES
    • A61K6/00—Preparations for dentistry
    • A61K6/60—Preparations for dentistry comprising organic or organo-metallic additives
    • A61K6/62—Photochemical radical initiators
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0384—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the main chain of the photopolymer
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/26—Web or sheet containing structurally defined element or component, the element or component having a specified physical dimension
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/31504—Composite [nonstructural laminate]

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • Molecular Biology (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Polymers & Plastics (AREA)
  • Medicinal Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Inorganic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Wood Science & Technology (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Polymerisation Methods In General (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Materials For Photolithography (AREA)
  • Polymerization Catalysts (AREA)
  • Paints Or Removers (AREA)
  • Inks, Pencil-Leads, Or Crayons (AREA)
  • Adhesives Or Adhesive Processes (AREA)
  • Macromonomer-Based Addition Polymer (AREA)

Abstract

Monoacilalquilfosfinas organometálicas. Son compuestos correspondientes a las fórmulas I, II o III, en donde los radicales Ar, M, R6, Ax, Y1, Z1, y los radicales subordinados correspondientes se describen en la descripción y en las reivindicaciones. Se describen también procesos para la preparación de estos compuestos. Los compuestos I se usan como materiales de partida para la preparación de mono- o bisacilfosfinas, óxidos de mono- o bisacilfosfinas, o sulfuros de mono- bisacilfosfinas. Los compuestos II y III se usan como iniciadores de fotopolimerización de compuestos monoméricos no volátiles, y compuestos oligoméricos o poliméricos que tengan al menos un doble enlace etilénico insaturado.
ES200101326A 2000-06-08 2001-06-07 Monoacilalquilfosfinas organometalicas. Expired - Fee Related ES2194584B1 (es)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
CH11332000 2000-06-08
CH1133/00 2000-06-08

Publications (2)

Publication Number Publication Date
ES2194584A1 true ES2194584A1 (es) 2003-11-16
ES2194584B1 ES2194584B1 (es) 2005-03-16

Family

ID=4559286

Family Applications (1)

Application Number Title Priority Date Filing Date
ES200101326A Expired - Fee Related ES2194584B1 (es) 2000-06-08 2001-06-07 Monoacilalquilfosfinas organometalicas.

Country Status (15)

Country Link
US (3) US6737549B2 (es)
JP (2) JP4850353B2 (es)
KR (1) KR100829076B1 (es)
CN (1) CN1198831C (es)
BE (1) BE1014218A5 (es)
BR (1) BR0102319B1 (es)
CA (1) CA2349829A1 (es)
DE (1) DE10127171A1 (es)
ES (1) ES2194584B1 (es)
FR (1) FR2810041B1 (es)
GB (1) GB2365430B (es)
IT (1) ITMI20011201A1 (es)
MX (1) MXPA01005780A (es)
NL (1) NL1018251C2 (es)
TW (1) TWI268932B (es)

Families Citing this family (44)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2365430B (en) * 2000-06-08 2002-08-28 Ciba Sc Holding Ag Acylphosphine photoinitiators and intermediates
BR0113872A (pt) * 2000-09-14 2003-07-22 Ciba Sc Holding Ag Fotoiniciadores de óxido de acilfosfina em resinas de moldagem de metacrilato
US7148382B2 (en) 2001-08-21 2006-12-12 Ciba Specialty Chemicals Corporation Bathochromic mono- and bis-acylphosphine oxides and sulfides and their use as photoinitiators
CN1589276A (zh) * 2001-11-20 2005-03-02 西巴特殊化学品控股有限公司 酰基膦及其衍生物的多聚体
EP2009676B8 (en) 2002-05-08 2012-11-21 Phoseon Technology, Inc. A semiconductor materials inspection system
CN1324037C (zh) * 2002-06-11 2007-07-04 西巴特殊化学品控股有限公司 单酰基和二酰基氧化膦的多聚体形式
EP1628778B1 (en) * 2003-05-23 2007-04-18 Ciba SC Holding AG Strongly adherent surface coatings
EP1678442B8 (en) 2003-10-31 2013-06-26 Phoseon Technology, Inc. Led light module and manufacturing method
EP1735844B1 (en) 2004-03-18 2019-06-19 Phoseon Technology, Inc. Use of a high-density light emitting diode array comprising micro-reflectors for curing applications
US9281001B2 (en) 2004-11-08 2016-03-08 Phoseon Technology, Inc. Methods and systems relating to light sources for use in industrial processes
JP5148283B2 (ja) * 2004-11-23 2013-02-20 チバ ホールディング インコーポレーテッド アシルホスファン及びその誘導体の製造方法
US20060160917A1 (en) * 2004-12-21 2006-07-20 Seiko Epson Corporation Ink composition
GB2422678B (en) * 2005-01-25 2009-03-11 Photocentric Ltd Method of making a photopolymer plate
US8115213B2 (en) 2007-02-08 2012-02-14 Phoseon Technology, Inc. Semiconductor light sources, systems, and methods
EP2107347B1 (en) * 2008-04-04 2016-08-31 Sensirion AG Flow detector with a housing
DE202008009068U1 (de) * 2008-04-07 2008-09-18 Sächsische Walzengravur GmbH Tiefdruck- oder Prägeform als Sleeve oder Zylinder
DE102008029195A1 (de) * 2008-06-19 2009-12-24 Koenig & Bauer Aktiengesellschaft Druckplatte zum Aufspannen auf einem Plattenzylinder einer Rotationsdruckmaschine
US8653737B2 (en) 2009-04-14 2014-02-18 Phoseon Technology, Inc. Controller for semiconductor lighting device
US8678612B2 (en) 2009-04-14 2014-03-25 Phoseon Technology, Inc. Modular light source
US8465172B2 (en) 2009-12-17 2013-06-18 Phoseon Technology, Inc. Lighting module with diffractive optical element
US8669697B2 (en) 2010-03-11 2014-03-11 Phoseon Technology, Inc. Cooling large arrays with high heat flux densities
US8591078B2 (en) 2010-06-03 2013-11-26 Phoseon Technology, Inc. Microchannel cooler for light emitting diode light fixtures
RU2600053C2 (ru) * 2010-06-30 2016-10-20 ДСМ АйПи ЭССЕТС Б.В. D1479 устойчивый жидкий бис(ацил)фосфиновый фотоинициатор и его использование в радиационно-отверждаемых композициях
US9357592B2 (en) 2010-11-18 2016-05-31 Phoseon Technology, Inc. Light source temperature monitor and control
GB201021603D0 (en) * 2010-12-21 2011-02-02 Fujifilm Imaging Colorants Ltd Inks & printing process
US8872137B2 (en) 2011-09-15 2014-10-28 Phoseon Technology, Inc. Dual elliptical reflector with a co-located foci for curing optical fibers
US9126432B2 (en) 2011-09-20 2015-09-08 Phoseon Technology, Inc. Differential Ultraviolet curing using external optical elements
CN103858042B (zh) 2011-10-12 2019-05-28 佛森技术公司 用于固化光纤的多光聚集和具有同位焦点的透镜组合
US8823279B2 (en) 2011-10-27 2014-09-02 Phoseon Technology, Inc. Smart FET circuit
US8931928B2 (en) 2011-11-01 2015-01-13 Phoseon Technology, Inc. Removable window frame for lighting module
US8851715B2 (en) 2012-01-13 2014-10-07 Phoseon Technology, Inc. Lamp ventilation system
US8888336B2 (en) 2012-02-29 2014-11-18 Phoseon Technology, Inc. Air deflectors for heat management in a lighting module
US8678622B2 (en) 2012-04-27 2014-03-25 Phoseon Technology, Inc. Wrap-around window for lighting module
DE102012212429A1 (de) 2012-07-16 2014-01-16 Voco Gmbh Dentalhandgerät, Verfahren und Verwendung desselben zum Aushärten lichthärtbaren Materials
CN105284797A (zh) * 2014-07-14 2016-02-03 国家电网公司 一种微胶囊型缓释驱鸟合剂的制备方法
CN110177678B (zh) 2017-02-06 2021-08-27 惠普发展公司，有限责任合伙企业 包含金属双(二硫醇烯)配合物的熔合剂
WO2018144054A1 (en) 2017-02-06 2018-08-09 Hewlett-Packard Development Company, L.P. 3d printing
US11383433B2 (en) 2017-04-17 2022-07-12 Hewlett-Packard Development Company, L.P. Fusing agent(s)
EP3409680B1 (en) * 2017-05-30 2021-01-06 IGM Group B.V. Synthesis of bis(acyl)phosphines by activation of unreactive metal phosphides
TWI782066B (zh) 2017-08-03 2022-11-01 德商漢高股份有限及兩合公司 可固化的聚矽氧光學透明黏著劑及其用途
JP2020531594A (ja) * 2017-08-24 2020-11-05 スージョウ・レインボー・マテリアルズ・カンパニー・リミテッドＳｕｚｈｏｕ Ｒａｉｎｂｏｗ Ｍａｔｅｒｉａｌｓ Ｃｏ．， Ｌｔｄ． シリコーン高分子光開始剤およびその使用
KR20200100610A (ko) 2017-12-27 2020-08-26 헨켈 아이피 앤드 홀딩 게엠베하 광학적으로 투명한 감압성 접착제 및 그의 용도
KR102693603B1 (ko) * 2018-10-01 2024-08-09 다우 글로벌 테크놀로지스 엘엘씨 유기 규소 화합물, 이의 제조 방법 및 그 사용
EP3686252A1 (en) * 2019-01-24 2020-07-29 Agfa-Gevaert Nv Radiation curable inkjet ink for manufacturing printed circuit boards

Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0040721A2 (de) * 1980-05-27 1981-12-02 BASF Aktiengesellschaft Acylphosphinverbindungen und ihre Verwendung
US4737593A (en) * 1984-11-27 1988-04-12 Fabrik Pharmazeutischer Praparate Bisacylphosphine oxides, the preparation and use thereof
US5218009A (en) * 1989-08-04 1993-06-08 Ciba-Geigy Corporation Mono- and di-acylphosphine oxides
EP0615980A2 (de) * 1993-03-18 1994-09-21 Ciba-Geigy Ag Härtung von Bisacylphosphinoxid-Photoinitiatoren enthaltenden Zusammensetzungen
ES2059261A1 (es) * 1992-10-08 1994-11-01 Ciba Geigy Ag Alquil-bisacilfosfinoxidos.
GB2292740A (en) * 1994-09-02 1996-03-06 Ciba Geigy Ag Alkoxyphenyl-substituted bisacylphosphine oxides
GB2310855A (en) * 1996-03-04 1997-09-10 Ciba Geigy Ag Alkylphenylbisacylphosphine oxides and photoinitiator mixtures
WO2000032612A1 (en) * 1998-11-30 2000-06-08 Ciba Specialty Chemicals Holding Inc. Process for preparing acylphosphines and derivatives

Family Cites Families (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2909992A1 (de) * 1979-03-14 1980-10-02 Basf Ag Photopolymerisierbare aufzeichnungsmassen, insbesondere zur herstellung von druckplatten und reliefformen
DE2830927A1 (de) * 1978-07-14 1980-01-31 Basf Ag Acylphosphinoxidverbindungen und ihre verwendung
DE2909994A1 (de) * 1979-03-14 1980-10-02 Basf Ag Acylphosphinoxidverbindungen, ihre herstellung und verwendung
DE3034697A1 (de) * 1980-09-15 1982-05-06 Basf Ag, 6700 Ludwigshafen Acylphosphinsulfidverbindungen, ihre herstellung und verwendung
DE3139984A1 (de) 1981-10-08 1983-04-28 Basf Ag, 6700 Ludwigshafen Verfahren zur herstellung von acylphosphinoxiden
EP0736540A3 (de) * 1989-08-04 1997-06-18 Ciba Geigy Mono- und Diacylphosphinoxide
KR0168316B1 (ko) * 1989-08-04 1999-03-30 시바 스페셜티 케미칼스 홀딩 인코포레이티드 모노-및 디-아실포스핀 옥사이드
US5368985A (en) 1991-01-14 1994-11-29 Ciba-Geigy Corporation Bisacylphosphine sulfides
EP0495752B1 (de) * 1991-01-14 1995-03-01 Ciba-Geigy Ag Bisacylphosphinsulfide
EP0495751A1 (de) 1991-01-14 1992-07-22 Ciba-Geigy Ag Bisacylphosphine
GB9104050D0 (en) * 1991-02-27 1991-04-17 Ciba Geigy Ag Compounds
RU2091385C1 (ru) * 1991-09-23 1997-09-27 Циба-Гейги АГ Бисацилфосфиноксиды, состав и способ нанесения покрытий
US5721292A (en) 1994-09-08 1998-02-24 Ciba Specialty Chemicals Corporation Acylphosphine oxides
US5744511A (en) * 1995-04-19 1998-04-28 Tokuyama Corporation Visible ray polymerization initiator and visible ray polymerizable composition
SG53043A1 (en) * 1996-08-28 1998-09-28 Ciba Geigy Ag Molecular complex compounds as photoinitiators
JPH11199610A (ja) * 1998-01-16 1999-07-27 Showa Denko Kk 光硬化性組成物及び組成物中のビスアシルホスフィンオキサイド系化合物の安定化方法
DE19907957A1 (de) 1998-02-27 1999-09-02 Ciba Geigy Ag Pigmentierte photohärtbare Zusammensetzung
DE19812859A1 (de) * 1998-03-24 1999-09-30 Basf Ag Photoinitiatorgemische
DE60006210T2 (de) 1999-12-08 2004-07-15 Ciba Specialty Chemicals Holding Inc. Neues Photoinitiatorsystem aus Phosphinoxidverbindungen und wenig gefärbte härtbare Zusammensetzungen
JP2001200007A (ja) * 2000-01-19 2001-07-24 Shin Etsu Chem Co Ltd 光硬化性樹脂組成物及び光ファイバー用被覆材
GB2360283B (en) * 2000-02-08 2002-08-21 Ciba Sc Holding Ag Monoacylarylphosphines and acylphosphine oxides and sulphides
GB2365430B (en) * 2000-06-08 2002-08-28 Ciba Sc Holding Ag Acylphosphine photoinitiators and intermediates

Patent Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0040721A2 (de) * 1980-05-27 1981-12-02 BASF Aktiengesellschaft Acylphosphinverbindungen und ihre Verwendung
US4737593A (en) * 1984-11-27 1988-04-12 Fabrik Pharmazeutischer Praparate Bisacylphosphine oxides, the preparation and use thereof
US5218009A (en) * 1989-08-04 1993-06-08 Ciba-Geigy Corporation Mono- and di-acylphosphine oxides
ES2059261A1 (es) * 1992-10-08 1994-11-01 Ciba Geigy Ag Alquil-bisacilfosfinoxidos.
EP0615980A2 (de) * 1993-03-18 1994-09-21 Ciba-Geigy Ag Härtung von Bisacylphosphinoxid-Photoinitiatoren enthaltenden Zusammensetzungen
GB2292740A (en) * 1994-09-02 1996-03-06 Ciba Geigy Ag Alkoxyphenyl-substituted bisacylphosphine oxides
GB2310855A (en) * 1996-03-04 1997-09-10 Ciba Geigy Ag Alkylphenylbisacylphosphine oxides and photoinitiator mixtures
WO2000032612A1 (en) * 1998-11-30 2000-06-08 Ciba Specialty Chemicals Holding Inc. Process for preparing acylphosphines and derivatives

Also Published As

Publication number Publication date
CN1329005A (zh) 2002-01-02
KR100829076B1 (ko) 2008-05-14
BR0102319A (pt) 2002-05-28
FR2810041A1 (fr) 2001-12-14
NL1018251A1 (nl) 2001-12-14
GB2365430A (en) 2002-02-20
JP2002069085A (ja) 2002-03-08
MXPA01005780A (es) 2008-02-26
US6737549B2 (en) 2004-05-18
DE10127171A1 (de) 2001-12-13
KR20010111021A (ko) 2001-12-15
GB2365430B (en) 2002-08-28
ES2194584B1 (es) 2005-03-16
US6969733B2 (en) 2005-11-29
BE1014218A5 (fr) 2003-06-03
ITMI20011201A1 (it) 2002-12-07
US7026017B2 (en) 2006-04-11
US20030130370A1 (en) 2003-07-10
TWI268932B (en) 2006-12-21
BR0102319B1 (pt) 2012-05-29
US20030139485A1 (en) 2003-07-24
GB0112580D0 (en) 2001-07-18
US20020026049A1 (en) 2002-02-28
NL1018251C2 (nl) 2002-02-18
CN1198831C (zh) 2005-04-27
JP2011251965A (ja) 2011-12-15
CA2349829A1 (en) 2001-12-08
JP4850353B2 (ja) 2012-01-11
FR2810041B1 (fr) 2009-04-17

Similar Documents

Publication Publication Date Title
ES2194584A1 (es) Monoacilalquilfosfinas organometalicas.
ES2195706A1 (es) Monoacilarilfosfinas organometalicas.
TW328086B (en) Biphenylamides, compositions comprising them and the preparation and use thereof
NZ511739A (en) New esters derived from substituted phenyl-cyclohexyl compounds
PL315558A1 (en) Water-soluble azole-type antimycotic agents
CA2184891A1 (en) Phosphonic diester derivative
NZ503912A (en) Piperidinylaminomethyl trifluoromethyl cyclic ether compounds and their use as substance P antagonists
RS97004A (en) Benzoxazine derivatives as 5-ht6 modulators and uses thereof
MY140749A (en) Novel piperidine compound
TW336222B (en) Novel depeptide p-amidinobenzylamides with N-terminal sulfonyl or aminosulfonyl radicals
MXPA02012569A (es) Ftalidas substituidas novedosas, un procedimiento para su preparacion y las composiciones farmaceuticas que contienen a las mismas.
CA2264065A1 (en) Acylaminoalkenylene-amide derivatives as nk1 and nk2 antagonists
DE60011916D1 (de) Heteroaryloxypropanolamine als beta3-adrenergischer rezeptor-agonisten
TW429253B (en) Novel pyrazole compounds
EA200200807A1 (ru) Аминокислотные соединения и их применение в качестве ингибиторов nep, ace и ece
CA2337586A1 (en) Alkylation process and novel hydroxyphenylbenztriazoles
MY130817A (en) Herbicides
ZA976637B (en) The preparation of 3-pyrroline-2-carboxylic acid derivatives
HRP20020347B1 (en) Phenyl-and pyridyl-tetrahydro-pyridines having tnf inhibiting activity
DK0970052T3 (da) Fremgangsmåde til fremstilling af 5-aminomethyl-2-chlorpyridiner
ES2131015A1 (es) Nuevos derivados de 2-(3h)-oxazolona, procedimientos para su preparacion y su empleo en composiciones farmaceuticas.
CZ211099A3 (cs) Difenylalkyl-tetrahydropyridiny, postup jejich výroby a farmaceutické prostředky, které je obsahují
CA2245926A1 (en) 7-phenyl-1,4-diazepane compounds, process for their preparation, and pharmaceutical compositions containing them
TW332203B (en) Derivatives of α-halocarbonyl compounds and preparation thereof
NZ180968A (en) 3-imino-1-phenylbenz-2-2,4-thiazepines

Legal Events

Date Code Title Description
EC2A Search report published

Date of ref document: 20031116

Kind code of ref document: A1

FG2A Definitive protection

Ref document number: 2194584B1

Country of ref document: ES

FD1A Patent lapsed

Effective date: 20100315