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EP2791739B1 - Stosssicheres lager für uhr - Google Patents

Stosssicheres lager für uhr Download PDF

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Publication number
EP2791739B1
EP2791739B1 EP12806345.0A EP12806345A EP2791739B1 EP 2791739 B1 EP2791739 B1 EP 2791739B1 EP 12806345 A EP12806345 A EP 12806345A EP 2791739 B1 EP2791739 B1 EP 2791739B1
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EP
European Patent Office
Prior art keywords
blind hole
elastic structure
single crystal
wafer
mask
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Active
Application number
EP12806345.0A
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English (en)
French (fr)
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EP2791739A1 (de
Inventor
M. Thierry HESSLER
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Swatch Group Research and Development SA
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Swatch Group Research and Development SA
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Priority to EP12806345.0A priority Critical patent/EP2791739B1/de
Publication of EP2791739A1 publication Critical patent/EP2791739A1/de
Application granted granted Critical
Publication of EP2791739B1 publication Critical patent/EP2791739B1/de
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    • G—PHYSICS
    • G04—HOROLOGY
    • G04B—MECHANICALLY-DRIVEN CLOCKS OR WATCHES; MECHANICAL PARTS OF CLOCKS OR WATCHES IN GENERAL; TIME PIECES USING THE POSITION OF THE SUN, MOON OR STARS
    • G04B31/00—Bearings; Point suspensions or counter-point suspensions; Pivot bearings; Single parts therefor
    • G04B31/02—Shock-damping bearings
    • G—PHYSICS
    • G04—HOROLOGY
    • G04B—MECHANICALLY-DRIVEN CLOCKS OR WATCHES; MECHANICAL PARTS OF CLOCKS OR WATCHES IN GENERAL; TIME PIECES USING THE POSITION OF THE SUN, MOON OR STARS
    • G04B31/00—Bearings; Point suspensions or counter-point suspensions; Pivot bearings; Single parts therefor
    • G04B31/004—Bearings; Point suspensions or counter-point suspensions; Pivot bearings; Single parts therefor characterised by the material used
    • G—PHYSICS
    • G04—HOROLOGY
    • G04B—MECHANICALLY-DRIVEN CLOCKS OR WATCHES; MECHANICAL PARTS OF CLOCKS OR WATCHES IN GENERAL; TIME PIECES USING THE POSITION OF THE SUN, MOON OR STARS
    • G04B31/00—Bearings; Point suspensions or counter-point suspensions; Pivot bearings; Single parts therefor
    • G04B31/004—Bearings; Point suspensions or counter-point suspensions; Pivot bearings; Single parts therefor characterised by the material used
    • G04B31/016—Plastic bearings
    • G—PHYSICS
    • G04—HOROLOGY
    • G04B—MECHANICALLY-DRIVEN CLOCKS OR WATCHES; MECHANICAL PARTS OF CLOCKS OR WATCHES IN GENERAL; TIME PIECES USING THE POSITION OF THE SUN, MOON OR STARS
    • G04B31/00—Bearings; Point suspensions or counter-point suspensions; Pivot bearings; Single parts therefor
    • G04B31/06—Manufacture or mounting processes

Definitions

  • the present invention relates to the field of anti-shock bearings (bearings with a shock-absorbing device) for a timepiece and their manufacturing processes.
  • the invention relates to an anti-shock bearing intended to receive a pivot of the axis of the balance of a mechanical watch movement.
  • the document CH 700 496 discloses a shockproof bearing constituted by monocrystalline silicon and comprising a central portion and elastic radial arms connecting this central portion to a peripheral annular portion.
  • the central portion includes a flared hole in the form of a four-sided pyramid.
  • a four-sided hole bottom is not optimal for the support of a pivot.
  • this document provides an anisotropic wet etching. To do this, it is mentioned that the silicon substrate must be properly oriented to be able to machine this pyramidal hole.
  • this document proposes to use another machining technique, namely the deep reactive ion etching (DRIE, of English). Deep Reactive Ion Etching ').
  • DRIE deep reactive ion etching
  • the latter technique requires complex and expensive installations that are different from those used for wet anisotropic etching.
  • the cost of manufacturing anti-shock bearings according to the teaching of this document is relatively high.
  • the use of two different techniques in different facilities for machining silicon parts does not come from a propensity of the authors of the document CH 700 496 to unnecessarily complicate the process of manufacturing the anti-shock bearings in silicon. In fact, this results from a need arising from the properties of monocrystalline silicon. Indeed, the orientation of the silicon substrate suitable for obtaining the flared pyramidal hole does not allow to obtain an elastic structure with arms having substantially vertical side walls, or the peripheral annular portion.
  • the present inventor has found that silicon does not allow the machining of a structure with walls substantially vertical and having a curvature by chemical etching in an acid bath.
  • silicon does not allow the machining of a structure with walls substantially vertical and having a curvature by chemical etching in an acid bath.
  • to obtain openings in a monocrystalline silicon wafer with vertical walls only specific orientations of the silicon crystal in this wafer are possible (not compatible with the orientation to obtain pyramidal holes).
  • the possible directions for such vertical walls are limited and these vertical walls are formed only of flat surfaces.
  • the document WO 2009/060074 discloses anti-shock bearings comprising a monolithic piece of silicon and a pierced stone associated therewith.
  • This monolithic piece defines an elastic structure and a counter-pivot stone. It is made in a silicon wafer using the well-known methods of photolithography and etching.
  • the monolithic parts may be made of silicon or of another preferably monocrystalline material that can be easily machined by photolithography and chemical etching techniques. No example other than silicon is given.
  • silicon as mentioned above, if it is possible to obtain slots or openings with vertical walls, the designs are limited. In particular, all the designs shown in the figures of this document can not be obtained by a chemical etching of a silicon crystal wafer.
  • the object of the present invention is to solve the problem of complex and expensive machining of monocrystalline crystal monobloc pieces, and to provide a shockproof bearing, formed by a one-piece piece defining an elastic structure and a central part in which a hole is machined. intended to receive a pivot of a rotating mobile, which can be machined industrially at relatively low cost while being of high quality.
  • Another object of the invention is to provide a shockproof bearing of the type described above which has a blind hole whose shape is advantageous for ensuring proper centering of the axis of the rotating mobile pivoted in the blind hole and to minimize the friction.
  • the invention also aims to provide a shockproof bearing that is aesthetic and has a particular recognizable appearance.
  • the subject of the present invention is an anti-shock bearing for a timepiece comprising an elastic structure and a central part carried by this elastic structure, this central part having a blind hole intended to receive a pivot of a rotating mobile of the timepiece.
  • the elastic structure and the central portion are formed by a single piece made of monocrystalline quartz and the blind hole has three oblique facets together defining a truncated or truncated trigonal pyramid.
  • the one-piece piece is a perforated plate whose axis perpendicular to its two main faces is almost parallel to the optical axis of the single-crystal quartz.
  • the present invention also relates to two main modes of implementation of a method of manufacturing a shockproof bearing whose elastic structure and a central part, carried by this elastic structure and having a blind hole, are made of monocrystalline quartz.
  • the manufacturing method according to the invention makes it possible to obtain a high quality transparent shockproof bearing by a relatively inexpensive process which only requires machining in chemical baths.
  • this method allows machining a blind hole for the bearing whose bottom is defined at least partially by a trigonal pyramid against which faces abuts the pivot of a rotating wheel.
  • Such a hole blind allows to ensure a better centering of the rotating axis of the mobile and also to minimize friction.
  • a transparent bearing also has a technical advantage in that it makes it possible to better check the presence of oil in the hole.
  • This shockproof bearing is arranged in a bridge or plate 4 of a timepiece and consists of a plate 6 of monocrystalline quartz (this plate defining a pellet or a disc) and a base 8 which has a housing for the wafer 6.
  • This wafer comprises an elastic structure 10, formed by the substantially circular slots 12 machined in this wafer, and a central portion 14 carried by this elastic structure and having a blind hole 16 for receiving a pivot of a mobile rotating (not shown) of the watch movement.
  • the substantially arcuate slots define between them spiral elastic arms connecting the central portion to the peripheral region of the wafer 6.
  • This elastic structure and this central portion are formed by a single piece consisting of monocrystalline quartz.
  • an elastic structure at the periphery of the central portion 14, the latter can undergo displacements in the plane of the wafer 6 and also, to a certain extent, vertically.
  • a slot between the elastic structure 10 and the bottom of the housing of the base 8 is preferably provided.
  • Bearing 2 defines a suspended shock bearing.
  • the base includes an opening for the passage of the axis of a mobile rotating and serves as a stop in the event of an axial and / or violent vertical impact. Note that the stop may be arranged in various ways and that, in a variant, the wafer 6 is directly arranged in the bridge or plate 4 without intermediate element.
  • the elastic structure may have many variations in the design in the plane of the wafer 6. It is sufficient that the central portion 14 is elastically connected to the peripheral portion of the base 8. However, the arrangement of spiral arms nested types of the type shown in Figure 2 is advantageous because it increases the length of the resilient arms relative to a configuration with radial arms. To do this, the selection of a quartz wafer is remarkable because such a design can be obtained by a method of chemical etching in a bath, a process which will be explained later.
  • the blind hole 16, machined in the lower face of the central portion 14, has three oblique facets 40A, 40B, 40C together defining at least partially a trigonal pyramid (see Figure 5 ).
  • each of the three facets defines an angle of about 40 ° with the central axis Z of the blind hole, that is to say that the median line 42 of each of these facets defines an angle of about 40.degree. ° with the central axis of the blind hole.
  • the bottom of the blind hole, especially when the diameter of the hole becomes larger, may have other facets (see Figure 6 ). These different facets come from the chemical attack of the quartz provided in the manufacturing process according to the invention described below.
  • the blind hole also has a substantially vertical side wall in its initial part (see FIG. Figure 7 ).
  • the three facets do not extend to the outer face of the one-piece piece where the blind hole opens and the side surface of the blind hole between the outer face and the three facets has one or more steeper slopes than that of these three facets.
  • the slope or slopes defined by the lateral surface of the blind hole is / are less than twenty degrees (20 °) relative to the central axis of this blind hole.
  • the wafer 6 made of monocrystalline quartz is selected so that the Z axis, perpendicular to its two main faces, is approximately the optical axis of the single-crystal quartz.
  • the Figure 3 shows schematically a quartz crystal 18 and a slice 6A which is cut in this crystal quartz to manufacture a plate in which is then machined the plate 6 according to the invention.
  • the speed at which the hole is formed along its central axis is less than the machining speed, according to the direction of this axis of the elastic structure so that it is possible to simultaneously obtain the blind hole and the elastic structure by a chemical attack only from the first face.
  • the machined elastic structure has a design with curved slots and / or openings whose edges have at least partially curved lines; which makes it possible to optimize this elastic structure as explained previously.
  • the normal to the two main faces of the quartz wafer has an angle of about two degrees (2 °) with the optical axis (birefringence axis) of the crystal structure of the single crystal quartz.
  • the quartz etching bath contains in particular fluoridic acid (HF). It also contains ammonium fluoride (NH 4 F).
  • a photosensitive layer 22, respectively 28 is deposited on a metal layer 20, respectively 26, for example a chromium-gold layer (Cr-Au). Each photosensitive layer is then selectively illuminated and developed to obtain apertures corresponding to the intended mask.
  • the photosensitive layer 22 has openings 24A for the elastic structure and an opening 25 for the blind hole; while the photosensitive layer 28 only has openings 24B for the elastic structure 10.
  • the wafer 6A is immersed in a chemical bath suitable for etching the metal layers 20 and 26 so as to define the two corresponding masks (same references as the metal layers) for the subsequent localized attack of the quartz.
  • the wafer 6A provided with its two masks is immersed in a chemical bath selected to perform a strongly anisotropic etching of the monocrystalline quartz by favoring an attack substantially along the optical axis Z.
  • a perforated wafer 6 is obtained with circular slots 12 with substantially vertical walls.
  • a blind hole 16A whose bottom has inclined facets as previously discussed (the symmetrical V profile in the section of the Figure 4B is schematic, since in a cross section, we do not cross generally two facets of the pyramid at the same inclination).
  • the bottom of the hole is formed only by a trigonal pyramid.
  • the wafer 6 has a thickness of about 200 microns and the diameter of the blind hole is 100 or 120 microns.
  • FIGS. Figures 8A and 8B A preferred variant of this second embodiment of the method of the invention is shown diagrammatically in FIGS. Figures 8A and 8B .
  • this preferred embodiment it is provided, before step C), to form a second mask on the second face of the monocrystalline quartz wafer, this second mask being structured by photolithography so as to define the contour of the elastic structure on this second face.
  • This variant allows an attack on both sides of the wafer 36A as shown in FIG. Figure 8A .
  • FIG. 8A is schematically represented a section of a monocrystalline quartz plate 36A as it is after step C) of the method according to the variant described here and after illumination and development of the photosensitive layer 23 to obtain the opening 25A in this layer making it possible to make the hole 25 ( Figure 8B ) in the initial mask 21A so as to obtain the final mask 21.
  • This final mask makes it possible to machine the blind hole 16B in the terminal phase of the machining of the elastic structure 10 to obtain the perforated plate 36 shown in FIG. Figure 8B .
  • the second mask 27 has been structured using the photosensitive layer 29. engrave the masks 21 A and 27, the photosensitive layers 23 and 29 are respectively structured by photolithography and then respectively have openings 24A and 24B corresponding to the elastic structure 10 provided.
  • the wafer 36A Before etching the opening 25 in the mask 21A, that is to say before step D) of the method described here, the wafer 36A is introduced into a chemical bath of anisotropic etching of the quartz for a first phase or period. After removing the wafer from the bath, the elastic structure is partially machined as shown in FIG. Figure 8A . Grooves 32 and 33 are obtained on both sides of the wafer 36A.
  • the photosensitive layer 23, having served for the partial structuring of the first initial mask 21 A to define the elastic structure, is illuminated to produce a hole 25A in this photosensitive layer. corresponding to the planned blind hole ( Figure 8A ). It should be noted that the development of the photosensitive layer 23 to obtain the hole 25A can take place before or after the step C).
  • the structuring of the first mask is thus carried out here in two phases in a chemical etching bath selected to attack the metal layer deposited on the monocrystalline quartz wafer and forming this first mask.
  • the second embodiment of the method according to the invention makes it possible to determine two different time periods for the machining of the elastic structure and the machining of the blind hole in an anisotropic etching bath of the monocrystalline quartz. This makes it possible to optimize the etching time for the elastic structure and for the blind hole.
  • the monocrystalline quartz wafer has a thickness of 300 microns and the diameter of the blind hole is about 200 microns.
  • the first phase or etching period of the elastic structure lasts for example about two hours (2h) and the second phase or etching period of this elastic structure and the blind hole also lasts example about two hours.
  • the depth of the blind hole is for example between 100 and 150 microns.
  • the blind hole 16B has in its initial part a substantially vertical wall 44.
  • the pivot 50 of the axis of the mobile inserted in the blind hole is preferably configured so that the bearing points of this pivot against the bottom of the blind hole are located in areas 46 of the three facets of the main trigonal pyramid which present substantially an angle of 40 ° with the axis of rotation Z of the pivot 50.

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Micromachines (AREA)
  • Sliding-Contact Bearings (AREA)

Claims (12)

  1. Herstellungsverfahren eines stoßsicheren Lagers, das eine elastische Struktur (10) und einen von dieser elastischen Struktur getragenen zentralen Teil (14) aufweist, wobei dieser zentrale Teil ein Blindloch (16; 16A; 16B) zur Aufnahme eines Zapfens eines Drehteils der Uhr aufweist, wobei die elastische Struktur und der zentrale Teil von einem einzigen Einblockteil (6) gebildet sind, wobei dieses Verfahren durch die folgenden Schritte gekennzeichnet ist:
    A) Herstellen einer Platte aus monokristallinem Quarz (6A), deren zwei Hauptflächen beziehungsweise erste und zweite Fläche etwa senkrecht zur optischen Achse (Z) der Kristallstruktur des monokristallinen Quarzes ausgerichtet sind,
    B) Bilden einer ersten Maske (20) auf der ersten Fläche der Platte aus mono-kristallinem Quarz, wobei diese erste Maske durch Photolithographie derart strukturiert ist, dass auf der ersten Fläche die Konturen der elastischen Struktur und des Blindlochs festgelegt werden,
    C) Bearbeiten der elastischen Struktur und des Blindlochs in der Platte aus mono- kristallinem Quarz durch Einführen dieser Platte in ein chemisches Gravurbad, das für eine anisotrope Ätzung des monokristallinen Quarzes bei starker Bevorzugung einer Ätzung gemäß der optischen Achse geeignet ist, wobei die erste Maske ausgewählt ist, um der Ätzung des chemischen Gravurbads zu widerstehen.
  2. Herstellungsverfahren eines stoßsicheren Lagers, das eine elastische Struktur (10) und einen von dieser elastischen Struktur getragenen zentralen Teil (14) aufweist, wobei dieser zentrale Teil ein Blindloch (16; 16A; 16B) zur Aufnahme eines Zapfens eines Drehteils der Uhr aufweist, wobei die elastische Struktur und der zentrale Teil von einem einzigen Einblockteil (36) gebildet sind, wobei dieses Verfahren von den folgenden Schritten gekennzeichnet ist:
    A) Herstellen einer Platte aus monokristallinem Quarz (36A), deren zwei Hauptflächen beziehungsweise erste und zweite Fläche etwa senkrecht zur optischen Achse (Z) der Kristallstruktur des monokristallinen Quarzes ausgerichtet sind,
    B) Bilden einer ersten Ausgangsmaske (21A) auf der erste Fläche der Platte aus monokristallinem Quarz, wobei diese erste Ausgangsmaske durch Photo-lithographie derart strukturiert ist, dass auf der ersten Fläche die Kontur der elastischen Struktur, aber nicht die Kontur des Blindlochs festgelegt wird,
    C) teilweises Bearbeiten der von der ersten Ausgangsmaske festgelegten elastischen Struktur in der Platte aus monokristallinem Quarz durch Einführen dieser Platte in ein chemisches Gravurbad, das für eine anisotrope Ätzung des monokristallinen Quarzes bei starker Bevorzugung einer Ätzung gemäß der optischen Achse geeignet ist, wobei die erste Ausgangsmaske ausgewählt ist, um der Ätzung des chemischen Gravurbads zu widerstehen,
    D) Strukturieren der ersten Ausgangsmaske derart, dass die Kontur des Blindlochs festgelegt wird und eine erste Endmaske (21) erhalten wird,
    E) Endbearbeiten der elastischen Struktur und gleichzeitiges Bearbeiten des Blindlochs in der Platte aus monokristallinem Quarz durch erneutes Einführen dieser Platte in das chemische Gravurbad.
  3. Verfahren nach Anspruch 2, dadurch gekennzeichnet, dass zwischen den Schritten B) und C) eine auf die erste Ausgangsmaske zwecks Strukturierung dieser ersten Ausgangsmaske aufgetragene lichtempfindliche Schicht (23) beleuchtet wird, um in der Folge in dieser lichtempfindlichen Schicht ein Loch (25A) zu realisieren, das dem Blindloch entspricht.
  4. Verfahren nach einem der Ansprüche 1 bis 3, dadurch gekennzeichnet, dass vor dem Schritt C) die Bildung einer zweiten Maske (26; 27) auf der zweiten Fläche der Platte aus monokristallinem Quarz (6A; 36A) vorgesehen ist, wobei diese zweite Maske durch Photolithographie derart strukturiert wird, dass die Kontur der elastischen Struktur auf dieser zweiten Fläche festgelegt wird.
  5. Verfahren nach einem der vorangehenden Ansprüche, dadurch gekennzeichnet, dass die bearbeitete elastische Struktur ein Design mit gekrümmten Schlitzen und/oder Öffnungen aufweist, deren Ränder mindestens teilweise gekrümmte Linien festlegen.
  6. Verfahren nach einem der vorangehenden Ansprüche, dadurch gekennzeichnet, dass das Blindloch drei schräge Facetten (40A; 40B; 40C) aufweist, die gemeinsam eine dreieckige abgestumpfte oder nicht abgestumpfte Pyramide definieren.
  7. Stoßsicheres Lager für Uhr, das eine elastische Struktur (10) und einen von dieser elastischen Struktur getragenen zentralen Teil (14) aufweist, wobei der zentrale Teil ein Blindloch (16; 16A; 16B) zur Aufnahme eines Zapfens eines Drehteils der Uhr aufweist, wobei die elastische Struktur und der zentrale Teil von einem einzigen Einblockteil (6; 36) gebildet sind, dadurch gekennzeichnet, dass das Einblockteil aus mono-kristallinem Quarz gebildet ist und dass das Blindloch drei schräge Facetten (40A; 40B; 40C) aufweist, die gemeinsam eine dreieckige abgestumpfte oder nicht abgestumpfte Pyramide bilden.
  8. Stoßsicheres Lager nach Anspruch 7, dadurch gekennzeichnet, dass jede der drei Facetten einen Winkel von zirka vierzig Grad (40°) mit der zentralen Achse des Blindlochs bildet.
  9. Stoßsicheres Lager nach Anspruch 7 oder 8, dadurch gekennzeichnet, dass sich die drei Facetten nicht bis zur äußeren Fläche des Einblockteils verlängern, wo das Blindloch ausmündet, und dass die seitliche Oberfläche des Blindlochs zwischen der äußeren Fläche und den drei Facetten eine Schräge oder Schrägen aufweist, die steiler sind als die dieser drei Facetten.
  10. Stoßsicheres Lager nach Anspruch 9, dadurch gekennzeichnet, dass die von der seitlichen Oberfläche des Blindlochs definierte(n) Schräge oder Schrägen relativ zur zentralen Achse dieses Blindlochs kleiner als zwanzig Grad (20°) ist/sind.
  11. Stoßsicheres Lager nach einem der Ansprüche 7 bis 10, dadurch gekennzeichnet, dass das Einblockteil eine durchbrochene Platte ist, deren in Bezug zu ihren zwei Hauptflächen senkrechte Achse (Z) ungefähr die optische Achse des monokristallinen Quarzes ist.
  12. Stoßsicheres Lager nach Anspruch 11, dadurch gekennzeichnet, dass die elastische Struktur ein Design mit gekrümmten Schlitzen und/oder Öffnungen aufweist, deren Ränder mindestens teilweise gekrümmte Linien festlegen und deren Wände etwa vertikal sind.
EP12806345.0A 2011-12-12 2012-12-07 Stosssicheres lager für uhr Active EP2791739B1 (de)

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Application Number Priority Date Filing Date Title
EP12806345.0A EP2791739B1 (de) 2011-12-12 2012-12-07 Stosssicheres lager für uhr

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
EP11193058 2011-12-12
EP12806345.0A EP2791739B1 (de) 2011-12-12 2012-12-07 Stosssicheres lager für uhr
PCT/EP2012/005050 WO2013087173A1 (fr) 2011-12-12 2012-12-07 Palier antichoc pour piece d'horlogerie

Publications (2)

Publication Number Publication Date
EP2791739A1 EP2791739A1 (de) 2014-10-22
EP2791739B1 true EP2791739B1 (de) 2016-03-09

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Country Link
US (1) US9292005B2 (de)
EP (1) EP2791739B1 (de)
JP (1) JP5848461B2 (de)
CN (1) CN103988133B (de)
CH (1) CH705861A2 (de)
HK (1) HK1200927A1 (de)
RU (1) RU2603236C2 (de)
WO (1) WO2013087173A1 (de)

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EP3495894B1 (de) * 2017-12-05 2023-01-04 Rolex Sa Verfahren zur herstellung einer uhrkomponente
EP3671368B1 (de) 2018-12-20 2022-11-23 The Swatch Group Research and Development Ltd Lager, insbesondere zur stossdämpfung, und drehteil eines uhrwerks
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EP3929667A1 (de) * 2020-06-26 2021-12-29 ETA SA Manufacture Horlogère Suisse Mobiles drehsystem eines uhrwerks

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CN1841244A (zh) * 2005-03-31 2006-10-04 蒙特雷布勒盖股份有限公司 摆轮枢轴的减震器装置以及安装有该装置的手表机芯
JP4442521B2 (ja) * 2005-06-29 2010-03-31 セイコーエプソン株式会社 圧電振動片および圧電デバイス
CH700496B1 (fr) 2007-02-16 2010-09-15 Patek Philippe Sa Geneve Palier antichoc pour pièce d'horlogerie.
EP1986059A1 (de) * 2007-04-26 2008-10-29 ETA SA Manufacture Horlogère Suisse Schwenkenvorrichtung einer Welle in einer Uhr
CH704739B1 (fr) * 2007-07-12 2012-10-15 Manuf Et Fabrique De Montres Et Chronometres Ulysse Nardin Le Locle S A Palier amortisseur de chocs pour pièce d'horlogerie.
CH705112B1 (fr) 2007-11-07 2012-12-31 Manuf Et Fabrique De Montres Et Chronometres Ulysse Nardin Le Locle Sa Palier amortisseur de chocs pour pièce d'horlogerie.
WO2009143492A1 (en) * 2008-05-23 2009-11-26 Statek Corporation Piezoelectric resonator
JP5455115B2 (ja) * 2009-10-07 2014-03-26 セイコーインスツル株式会社 時計用軸受、ムーブメントおよび携帯用時計
JP5657106B2 (ja) * 2010-06-22 2015-01-21 ザ・スウォッチ・グループ・リサーチ・アンド・ディベロップメント・リミテッド 時計の衝撃吸収軸受

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RU2603236C2 (ru) 2016-11-27
CN103988133B (zh) 2017-03-01
CH705861A2 (fr) 2013-06-14
WO2013087173A1 (fr) 2013-06-20
CN103988133A (zh) 2014-08-13
US20140341005A1 (en) 2014-11-20
HK1200927A1 (en) 2015-08-14
JP5848461B2 (ja) 2016-01-27
EP2791739A1 (de) 2014-10-22
RU2014128595A (ru) 2016-02-10
US9292005B2 (en) 2016-03-22
JP2015505961A (ja) 2015-02-26

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