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EP2200070A4 - Illuminating optical apparatus, and exposure method and apparatus - Google Patents

Illuminating optical apparatus, and exposure method and apparatus

Info

Publication number
EP2200070A4
EP2200070A4 EP08837855A EP08837855A EP2200070A4 EP 2200070 A4 EP2200070 A4 EP 2200070A4 EP 08837855 A EP08837855 A EP 08837855A EP 08837855 A EP08837855 A EP 08837855A EP 2200070 A4 EP2200070 A4 EP 2200070A4
Authority
EP
European Patent Office
Prior art keywords
exposure method
illuminating optical
optical apparatus
illuminating
exposure
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
EP08837855A
Other languages
German (de)
French (fr)
Other versions
EP2200070A1 (en
Inventor
Hirohisa Tanaka
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Publication of EP2200070A1 publication Critical patent/EP2200070A1/en
Publication of EP2200070A4 publication Critical patent/EP2200070A4/en
Withdrawn legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70141—Illumination system adjustment, e.g. adjustments during exposure or alignment during assembly of illumination system
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F21—LIGHTING
    • F21V—FUNCTIONAL FEATURES OR DETAILS OF LIGHTING DEVICES OR SYSTEMS THEREOF; STRUCTURAL COMBINATIONS OF LIGHTING DEVICES WITH OTHER ARTICLES, NOT OTHERWISE PROVIDED FOR
    • F21V9/00—Elements for modifying spectral properties, polarisation or intensity of the light emitted, e.g. filters
    • F21V9/14—Elements for modifying spectral properties, polarisation or intensity of the light emitted, e.g. filters for producing polarised light
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • G03F7/70566—Polarisation control

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Engineering & Computer Science (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Computer Hardware Design (AREA)
  • Manufacturing & Machinery (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Polarising Elements (AREA)
  • Microscoopes, Condenser (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
EP08837855A 2007-10-12 2008-10-07 Illuminating optical apparatus, and exposure method and apparatus Withdrawn EP2200070A4 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2007267256 2007-10-12
PCT/JP2008/068206 WO2009048051A1 (en) 2007-10-12 2008-10-07 Illuminating optical apparatus, and exposure method and apparatus

Publications (2)

Publication Number Publication Date
EP2200070A1 EP2200070A1 (en) 2010-06-23
EP2200070A4 true EP2200070A4 (en) 2012-11-21

Family

ID=40549195

Family Applications (1)

Application Number Title Priority Date Filing Date
EP08837855A Withdrawn EP2200070A4 (en) 2007-10-12 2008-10-07 Illuminating optical apparatus, and exposure method and apparatus

Country Status (6)

Country Link
US (2) US8300213B2 (en)
EP (1) EP2200070A4 (en)
JP (1) JPWO2009048051A1 (en)
KR (1) KR20100085974A (en)
TW (1) TW200928607A (en)
WO (1) WO2009048051A1 (en)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4958562B2 (en) * 2004-01-16 2012-06-20 カール・ツァイス・エスエムティー・ゲーエムベーハー Polarization modulation optical element
US20070019179A1 (en) * 2004-01-16 2007-01-25 Damian Fiolka Polarization-modulating optical element
US8270077B2 (en) * 2004-01-16 2012-09-18 Carl Zeiss Smt Gmbh Polarization-modulating optical element
KR20100085974A (en) * 2007-10-12 2010-07-29 가부시키가이샤 니콘 Illuminating optical apparatus, and exposure method and apparatus
CN101526755B (en) * 2009-04-21 2011-01-05 清华大学 193-nanometre immersed lithography illuminating system
JP2012083383A (en) * 2010-10-06 2012-04-26 V Technology Co Ltd Exposure device
JP6858206B2 (en) * 2017-02-17 2021-04-14 富士フイルム株式会社 Liquid crystal display device
DE102018218064B4 (en) * 2018-10-22 2024-01-18 Carl Zeiss Smt Gmbh Optical system, especially for microlithography

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2005036619A1 (en) * 2003-10-09 2005-04-21 Nikon Corporation Illumination optical device, and exposure device and method
US20060055834A1 (en) * 2002-12-03 2006-03-16 Nikon Corporation Illumination optical system, exposure apparatus, and exposure method

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6063751A (en) * 1983-09-19 1985-04-12 Olympus Optical Co Ltd Photoelectro-magnetic pickup device
AU2747999A (en) 1998-03-26 1999-10-18 Nikon Corporation Projection exposure method and system
JP4666157B2 (en) * 2003-07-10 2011-04-06 株式会社ニコン Artificial quartz member, exposure apparatus, and method of manufacturing exposure apparatus
TWI366219B (en) * 2004-02-06 2012-06-11 Nikon Corp Polarization changing device, optical illumination apparatus, light-exposure apparatus and light-exposure method
US7345740B2 (en) * 2004-12-28 2008-03-18 Asml Netherlands B.V. Polarized radiation in lithographic apparatus and device manufacturing method
TWI453796B (en) * 2005-01-21 2014-09-21 尼康股份有限公司 Polarizing change unit and fabricating method of device
JP2007263897A (en) * 2006-03-29 2007-10-11 Nikon Corp Calibration method and device for polarization meter, the polarization meter and exposure device equipped with the polarization meter, and measuring method of phase delay amount and wavelength plate
KR20100085974A (en) * 2007-10-12 2010-07-29 가부시키가이샤 니콘 Illuminating optical apparatus, and exposure method and apparatus

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20060055834A1 (en) * 2002-12-03 2006-03-16 Nikon Corporation Illumination optical system, exposure apparatus, and exposure method
WO2005036619A1 (en) * 2003-10-09 2005-04-21 Nikon Corporation Illumination optical device, and exposure device and method

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
See also references of WO2009048051A1 *

Also Published As

Publication number Publication date
US20090128796A1 (en) 2009-05-21
US20130114058A1 (en) 2013-05-09
WO2009048051A1 (en) 2009-04-16
TW200928607A (en) 2009-07-01
EP2200070A1 (en) 2010-06-23
US8300213B2 (en) 2012-10-30
JPWO2009048051A1 (en) 2011-02-17
KR20100085974A (en) 2010-07-29

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Legal Events

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