EP1220739B1 - Verfahren und einrichtung zum vereinzeln von scheibenförmigen substraten - Google Patents
Verfahren und einrichtung zum vereinzeln von scheibenförmigen substraten Download PDFInfo
- Publication number
- EP1220739B1 EP1220739B1 EP00972741A EP00972741A EP1220739B1 EP 1220739 B1 EP1220739 B1 EP 1220739B1 EP 00972741 A EP00972741 A EP 00972741A EP 00972741 A EP00972741 A EP 00972741A EP 1220739 B1 EP1220739 B1 EP 1220739B1
- Authority
- EP
- European Patent Office
- Prior art keywords
- plate
- substrate
- baseplate
- substrates
- gripper
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
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Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B28—WORKING CEMENT, CLAY, OR STONE
- B28D—WORKING STONE OR STONE-LIKE MATERIALS
- B28D5/00—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor
- B28D5/0058—Accessories specially adapted for use with machines for fine working of gems, jewels, crystals, e.g. of semiconductor material
- B28D5/0082—Accessories specially adapted for use with machines for fine working of gems, jewels, crystals, e.g. of semiconductor material for supporting, holding, feeding, conveying or discharging work
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B28—WORKING CEMENT, CLAY, OR STONE
- B28D—WORKING STONE OR STONE-LIKE MATERIALS
- B28D5/00—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor
- B28D5/0058—Accessories specially adapted for use with machines for fine working of gems, jewels, crystals, e.g. of semiconductor material
- B28D5/0082—Accessories specially adapted for use with machines for fine working of gems, jewels, crystals, e.g. of semiconductor material for supporting, holding, feeding, conveying or discharging work
- B28D5/0094—Accessories specially adapted for use with machines for fine working of gems, jewels, crystals, e.g. of semiconductor material for supporting, holding, feeding, conveying or discharging work the supporting or holding device being of the vacuum type
Definitions
- the present invention relates to a method and a device for separating and detaching thin, fracture-sensitive disc-shaped substrates consisting of a preferably fixed on a base plate by means of gluing held substrate block have been cut, according to the The preamble of claim 1 or that of claim 8 (see e.g. JP-A-11-054462).
- disc-shaped substrates as they are For example, be used for solar cells, one uses Substrate blocks or columns of, for example, silicon, in thin Slices are sawed.
- the substrate block or the Substrate column adhered to a base plate and thereby there fixed. After sawing sticks each disc-shaped Substrate on its underside still on the glue line or Sides on the base plate, whose top is usually off Glass exists and has been sawn with.
- the object of the present invention is to provide a method or to provide a device of the type mentioned, with or with such thin fragile ones disc-shaped substrates automatically and thereby damage-free individually from the sawn substrate block of the adhesive seam can be removed.
- a preferred embodiment of the oscillating Movement results in accordance with the features of claim 2 or those of claim 11. In this way, a oscillating pivoting movement around the adhesive seam or Glue line, causing a fatigue break this adhesive seam leads. In addition, this results in a minimum limited application of force to the disk-shaped substrate even.
- a preferred embodiment of the gripper device results by the features of claim 12.
- adjacent disc-shaped substrates also isolated and as a result, can be detached from the base plate, if they are due to moisture, which is process-related Reasons is unavoidable, and / or in a tilted state at least partially adhere to each other.
- the device 10 shown in the drawing serves for Separation and detachment of thin, fracture-sensitive disc-shaped substrates 11, which consist of a on a Base plate 12 fixedly held substrate block 13 cut have been.
- a substrate block is, for example, an off Polycrystalline silicon produced silicon block, the For example, with the help of a two-component adhesive on a Glass pane part of the base plate 12 is glued.
- aid parallel cutting wires is under supply of liquid Cutting the silicon block in individual, eg. As Cut silicon wafers serving solar wafers. This Cutting or sawing the substrate block 13 into individual thin disk-shaped substrates or wafers will be up in the a steel plate part resting glass plate part of Base plate 12 made in it.
- the single ones disc-shaped substrates 11 are particularly in the field of Adhesive seam 15 in one of the width of the saw cut 14th appropriate distance from each other. Due to the Use of the liquid cutting agent, for example, it is possible that individual adjacent disk-shaped substrates 11 in parallel or oblique position to each other adhere to each other.
- the disk-shaped substrates 11 have semiconductor wafers a thickness of about 0.7 to 0.8 mm and as a solar wafer one Thickness in the range of 0.2 to 0.3 mm, as well Substrate thicknesses in the range of 0.15 mm are possible.
- the device 10 With the device 10 according to the invention, it is such thin disk-shaped substrates 11 from the adjacent to dissect disc-shaped substrate and from the Base plate 12 unbroken in an automatic way and also otherwise undamaged to replace in a simple manner and the further storage and / or processing.
- the device 10 has a gripper device 20, which in Direction of the double arrow B oscillating back and forth is driven swivel and on the one hand the peeling the disc-shaped substrates 11 of the base plate 12 and on the other hand, the removal and continuation of the disc-shaped Substrates 11 is used.
- the gripper device 20 is for this purpose and for biasing in the direction of arrow C1 on a Gripper holder 30 attached.
- the gripper device 20 has a gripper plate 21, from the gripper arms 22 in a matrix-like arrangement perpendicular protrude.
- a matrix-like arrangement of the gripper arms 22 results, for example, in a modification shown in FIG. 1 from Fig. 3.
- the gripper arms 22 are above the gripper plate 21, whose areal dimension approximately the flat dimension of disc-shaped substrates 11 corresponds, arranged such that they are partially or pointwise essentially about the entire outer surface 16 to be grasped disc-shaped substrate 11 are distributed.
- the gripper arms 22 have at their the gripper plate 21 facing away from free Ends sucker 23, which, as will be shown, with a Vacuum device 50 are connected.
- the gripper plate 21 is at its base plate 12 facing away from the upper end and at her the gripper arms 22 facing away from back with a arcuate slider 24 connected in a receptacle 32nd a holder 31 of the gripper holder 30 in the direction of Double Arrows B kept kept.
- the rear end 26 of the Slider 24 has a link opening 25 in the an eccentric 33 is immersed, which has a Eccentric axis 34 mounted on a holder 31 projecting Mounted flange 35 and a motor, not shown is driven in rotation. Due to the rotational movement of Eccentric 33, the slider 24 in the direction of Double arrow B oscillating curved back and forth, whereby the gripper plate 21 with the gripper arms 22nd is oscillated.
- the orientation of the holder 31 is such that the imaginary extension of his Central axis 36, the adhesive seam 15 intersects. In this way is using the eccentric 33, 34, the gripper plate 21st oscillating around the adhesive seam 15 between disk-shaped Substrate 11 and base plate 12 is pivoted.
- the holder 31 is fixed to a holder plate 37, the relative to a support web 38 according to double arrow C linear is movable.
- the support web 38 is at a distance arranged bolt 39 fixedly connected to the holder plate 37th penetrate axially movable and at its end a Investment disc 41 own. Between the contact washer 41 and the underside of the holding plate 37 are compression springs 40th arranged.
- the support web 38 is not shown in Way in the direction of arrow C1 upwardly movable or raised, which stroke movement connected to the holder 31 Holder plate 37, as will be shown, follow or can not follow.
- the support web 38 is provided with a laterally projecting angle 42 connected to the down protruding end a movement detection sensor 43 is mounted, the one area between holder plate 37 and contact washer 41 of the bolt 39 opposite.
- a Spray nozzle 45 is fixedly arranged, which in not shown Way is connected to a fluid pressure vessel and whose slot-like nozzle opening 46 in the region of Saw cut 14 between two adjacent disk-shaped Substrates 11 is directed.
- the base plate 12 with the cut substrate block 13 in the direction of Arrows A and thus in the direction of the oscillating swivel Gripper device 20 movable toward.
- the process or the process of separating and detaching of thin, fragile disc-shaped substrates 11 from one another or from one on the base plate 12 sticking fixedly held substrate block 13, which in the disc-shaped substrates 11 has been cut, runs as follows.
- the base plate 12 is in the direction of arrow A so far moves until the positioning sensor 27 the correct position for Docking of the foremost disc-shaped substrate 11 to the Gripper device 20 has detected, this Positioning sensor 27 in a lower region near the Adhesive seam 15 is provided.
- the Spray nozzle device 45 is applied, so that over the Slot mouth 46 a liquid flat stream in the Saw cut 14 between the foremost and the afterwards following disk-shaped substrate 11 is brought, wherein the liquid jet causes a possible sticking of the subsequent disk-shaped substrate 11 dissolved is, and / or that the disc-shaped to be taken Substrate (vertical) sets up.
- With connecting the Vacuum device 50 will be the foremost one to take disc-shaped substrate 11 of the gripper arms 22nd attached suckers 23 detected.
- the eccentric 33, 34 in operation set resulting in an oscillating pivoting movement of the Gripper device 20 results.
- Has the oscillation oscillation a small amplitude in the range between 2 and 6 °, preferably of 3 ° at a frequency range of about 5 to 10 Hz.
- This oscillation oscillation is applied to that of the Gripper device 20 grasped disk-shaped substrate 11th transfer.
- the oscillation oscillation of the disk-shaped Substrate 11 takes place until cracks in the adhesive seam 15 between the disc-shaped substrate 11 and the Base plate 12 as far as the damage-free Lifting the disc-shaped substrate 11 allow.
- the support web 38 of Gripper holder 30 slightly upwards in the direction of arrow C1 moves, wherein the holder plate 37, with the Gripper device 20 is firmly connected, in its position remains.
- the Compressive springs 40 acted upon in the direction of arrow C1 and the Movement of the spring coils and / or the contact washer 41st is detected by the motion detection sensor 43.
- the isolated and detached disc-shaped substrate 11 can then in a manner not shown a memory or a be fed to further processing.
- Gripper arms 22 and their suckers 23 in a certain way wired. All suckers 23 are constantly with a Vacuum generator 51, for example. In the form of an ejector, connected. In addition to the n suckers 23 associated n ejector nozzles 51, n transducers 52 are provided with which to be evaluated can, if and which suckers 23 a corresponding surface of the associated disc-shaped substrate 11 have taken. This allows conclusions to be drawn as to whether the relevant disc-shaped substrate 11 in total or only fragmentary is available. This leaves, for example, a good / bad sorting to.
- the suckers 23 are in two (or more) format dependent circles 53, 54 summarized and corresponding connected.
- disk-shaped substrates 11 different outer surface or format 16 ', 16' ', 16 '' ', 16' '' 'handled and recorded. It is possible, this format-dependent circles differentiated with Apply vacuum so that it is also possible To detect fragments of disc-shaped substrates and to remove.
- the gripper device with only one and possibly larger suction cups to equip.
Landscapes
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Processing Of Stones Or Stones Resemblance Materials (AREA)
- Manipulator (AREA)
- Manufacturing Of Magnetic Record Carriers (AREA)
- Sheets, Magazines, And Separation Thereof (AREA)
- Diaphragms For Electromechanical Transducers (AREA)
Description
- Figur 1
- in schematischer teilweiser aufgebrochener und geschnittener Seitenansicht eine Einrichtung zum Vereinzeln und Ablösen scheibenförmiger Substrate aus einem geschnittenen Substratblock gemäß einem bevorzugten Ausführungsbeispiel vorliegender Erfindung,
- Figur 2
- eine Teildraufsicht gemäß Pfeil II der Fig. 1,
- Figur 3
- eine Stirnansicht der Greifervorrichtung mit Saugermatrix gemäß Pfeil III der Fig. 2, gemäß einer Variante, und
- Figur 4
- in schematischer Darstellung eine Schaltungsanordnung für die Saugermatrix nach Fig. 3.
Claims (19)
- Verfahren zum Vereinzeln und Ablösen von dünnen, bruchempfindlichen scheibenförmigen Substraten, die aus einem auf einer Basisplatte vorzugsweise mittels Klebung fixiert gehaltenen Substratblock geschnitten worden sind, bei dem das scheibenförmige Substrat an einer oder mehreren beabstandeten Stellen seiner frei liegenden Außenfläche ergriffen und oszillierend bewegt wird, dadurch gekennzeichnet, dass das scheibenförmige Substrat um eine in seiner Auflage auf der Basisplatte befindlichen zur Auflagefläche etwa parallelen Achse oszillierend verschwenkt und während seiner oszillierenden Bewegung in eine Richtung weg von der Basisplatte vorgespannt gehalten wird.
- Verfahren nach Anspruch 1, dadurch gekennzeichnet, dass jeweils benachbarte scheibenförmige Substrate, vorzugsweise in deren der Basisplatte zugewandtem Bereich, mittels eines Druckstrahls vereinzelt werden.
- Verfahren nach Anspruch 2, dadurch gekennzeichnet, dass das Vereinzeln benachbarter scheibenförmiger Substrate zwischen dem zu ergreifenden scheibenförmigen Substrat und dem nachfolgenden durchgeführt wird.
- Verfahren nach Anspruch 2 oder 3, dadurch gekennzeichnet, dass in den Schnittspalt zwischen zwei benachbarten scheibenförmigen Substraten ein Flüssigkeitsflachstrahl gerichtet wird.
- Verfahren nach mindestens einem der vorhergehenden Ansprüche, dadurch gekennzeichnet, dass das scheibenförmige Substrat in einer formatabhängigen Matrix saugend ergriffen wird.
- Verfahren nach mindestens einem der Ansprüche 2 bis 5, dadurch gekennzeichnet, dass das Vereinzeln benachbarter scheibenförmiger Substrate und das saugende Ergreifen des betreffenden Substrats zeitlich gemeinsam erfolgt.
- Verfahren nach mindestens einem der vorhergehenden Ansprüche, dadurch gekennzeichnet, dass die mit dem geschnittenen Substratblock versehene Basisplatte zum Ergreifen des jeweiligen scheibenförmigen Substrats schrittweise verfahren wird.
- Einrichtung (10) zum Vereinzeln und Ablösen von dünnen, bruchempfindlichen scheibenförmigen Substraten (11), die aus einem auf einer Basisplatte (12) vorzugsweise mittels Klebung fixiert gehaltenen Substratblock (13) geschnitten worden sind, mit einer Greifervorrichtung (20), mittels der das scheibenförmige Substrat (11) an benachbarten Stellen seiner freiliegenden Außenfläche (16) ergreifbar ist und die oszillierend bewegbar antreibbar ist, dadurch gekennzeichnet, dass mehrere Greiferarme (22) von einer Greiferplatte (21) der Greifervorrichtung (20) starr abstehen, dass die Greiferplatte (21) um eine Achse (15) oszillierend verschwenkbar ist, die etwa parallel zur Außenfläche (16) des ergriffenen scheibenförmigen Substrats (11) und im Auflagebereich des scheibenförmigen Substrats (11) auf der Basisplatte (12) verläuft, und dass die Greiferplatte (21) einen in einer Ausnehmung (32) geführten bogenförmigen Schieber (24) aufweist, der von einem rotierend angetriebenen Exzenter (33, 34) hin- und herbewegbar ist.
- Einrichtung nach Anspruch 8, dadurch gekennzeichnet, dass die Greifervorrichtung (20) mit einer Greiferhalterung (30) derart verbunden ist, dass die Greifervorrichtung (20) in eine das scheibenförmige Substrat (11) von der Basisplatte (12) abhebenden Richtung vorgespannt ist.
- Einrichtung nach Anspruch 9, dadurch gekennzeichnet, dass die Greiferhalterung (30) ein mit einem Hubantrieb verbundenes Zugelement (38) und eine gegenüber dem Zugelement (38) federnd relativ bewegbare Halteplatte (37) aufweist, an der die Greifervorrichtung (20) gehalten ist.
- Einrichtung nach den Ansprüche 8 und 10, dadurch gekennzeichnet, dass an der relativ bewegbaren Halteplatte (37) ein Hebelarm (31) befestigt ist, der die Ausnehmung (32) zur Führung des bogenförmigen Schiebers (24) der Greifervorrichtung (20) aufweist.
- Einrichtung nach mindestens einem der Ansprüche 9 bis 11, dadurch gekennzeichnet, dass an der Greiferhalterung (30) ein Sensor (43) zum Erfassen der Relativbewegung zwischen Zugelement (38) und Halteplatte (37) vorgesehen ist.
- Einrichtung nach mindestens einem der Ansprüche 8 bis 12, dadurch gekennzeichnet, dass eine Druckstrahldüse (45) vorgesehen ist, die an einer Seite der Basisplatte (12) nahe der Auflage (15) der scheibenförmigen Substrate (11) auf der Basisplatte (12) und zwischen zwei benachbarten scheibenförmigen Substrate (11) gerichtet angeordnet ist, wobei die Druckstrahldüse (45) und die Basisplatte (12) relativ zueinander längs des Substratblockes (13) verfahrbar sind.
- Einrichtung nach Anspruch 13, dadurch gekennzeichnet, dass die Druckstrahldüse (45) einen schlitzförmigen Austritt (46) aufweist.
- Einrichtung nach mindestens einem der Ansprüche 8 bis 14, dadurch gekennzeichnet, dass die Greiferarme (22) der Greifervorrichtung (20) mit Saugern (23) versehen sind, die in einer Matrix angeordnet und formatabhängig ansteuerbar sind.
- Einrichtung nach Anspruch 15, dadurch gekennzeichnet, dass die Saugermatrix in mehrere Schaltkreise unterteilt ist.
- Einrichtung nach Anspruch 15 oder 16, dadurch gekennzeichnet, dass jedem Sauger (23) ein Vakuumerzeuger (51) und ein Wandler (52) zum Erfassen des anliegenden Vakuums zugeordnet ist.
- Einrichtung nach mindestens einem der Ansprüche 8 bis 17, dadurch gekennzeichnet, dass die Druckstrahldüse (45) ortsfest und die Basisplatte (12) zur Greifervorrichtung (20) hin schrittweise verfahrbar ist.
- Einrichtung nach mindestens einem der Ansprüche 8 bis 18, dadurch gekennzeichnet, dass im Bereich der Greifervorrichtung (20) ein Positionierungssensor (27) für den Substratblock (13) vorgesehen ist.
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE19950068 | 1999-10-16 | ||
DE19950068A DE19950068B4 (de) | 1999-10-16 | 1999-10-16 | Verfahren und Vorrichtung zum Vereinzeln und Ablösen von Substratscheiben |
PCT/EP2000/010036 WO2001028745A1 (de) | 1999-10-16 | 2000-10-12 | Verfahren und einrichtung zum vereinzeln von scheibenförmigen substraten |
Publications (2)
Publication Number | Publication Date |
---|---|
EP1220739A1 EP1220739A1 (de) | 2002-07-10 |
EP1220739B1 true EP1220739B1 (de) | 2005-04-27 |
Family
ID=7925995
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
EP00972741A Expired - Lifetime EP1220739B1 (de) | 1999-10-16 | 2000-10-12 | Verfahren und einrichtung zum vereinzeln von scheibenförmigen substraten |
Country Status (9)
Country | Link |
---|---|
EP (1) | EP1220739B1 (de) |
JP (1) | JP4731077B2 (de) |
CN (1) | CN1160177C (de) |
AT (1) | ATE294056T1 (de) |
AU (1) | AU777067B2 (de) |
CA (1) | CA2388730A1 (de) |
DE (2) | DE19950068B4 (de) |
ES (1) | ES2240189T3 (de) |
WO (1) | WO2001028745A1 (de) |
Families Citing this family (32)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE10108369A1 (de) * | 2001-02-21 | 2002-08-29 | B L E Lab Equipment Gmbh | Verfahren und Vorrichtung zum Ablösen eines Halbleiterwafers von einem Träger |
WO2005053925A1 (ja) * | 2003-12-04 | 2005-06-16 | Mitsuboshi Diamond Industrial Co., Ltd. | 基板加工方法、基板加工装置および基板搬送方法、基板搬送機構 |
DE102004060040B3 (de) * | 2004-12-14 | 2006-06-14 | Richter, Uwe, Dr. | Vorrichtung zum Vereinzeln und Sortieren scheibenförmiger Substrate |
DE102005016519B3 (de) * | 2005-04-08 | 2007-03-01 | Rena Sondermaschinen Gmbh | Vorrichtung zum Ablösen, Vereinzeln und Transportieren von in einer Halteeinrichtung sequenziell angeordneten Substraten |
DE102005016518B3 (de) * | 2005-04-08 | 2006-11-02 | Rena Sondermaschinen Gmbh | Vorrichtung zum Ablösen und Vereinzeln von Substraten, insbesondere Wafern hergestellt aus Substratblöcken |
DE102005023618B3 (de) * | 2005-05-21 | 2006-12-07 | Aci-Ecotec Gmbh & Co.Kg | Einrichtung zum Vereinzeln von Silizium-Wafern von einem Stapel |
DE102005028112A1 (de) * | 2005-06-13 | 2006-12-21 | Schmid Technology Systems Gmbh | Verfahren zur Positionierung und Lageerhaltung von Substraten, insbesondere von dünnen Siliziumwafern nach dem Drahtsägen zu deren Vereinzelung |
DE102006021647A1 (de) | 2005-11-09 | 2007-11-15 | Coenen, Wolfgang, Dipl.-Ing. | Verfahren zur Vereinzelung von scheibenförmigen Substraten unter Nutzung von Adhäsionskräften |
WO2008003502A1 (de) * | 2006-07-06 | 2008-01-10 | Rena Sondermaschinen Gmbh | Vorrichtung und verfahren zum vereinzeln und transportieren von substraten |
DE502006001352D1 (de) * | 2006-12-15 | 2008-09-25 | Rena Sondermaschinen Gmbh | Vorrichtung und Verfahren zum Vereinzeln und Transportieren von Substraten |
DE102006059809B4 (de) * | 2006-12-15 | 2008-08-21 | Rena Sondermaschinen Gmbh | Vorrichtung und Verfahren zum Vereinzeln und Transportieren von Substraten |
EP2122676B1 (de) | 2006-12-19 | 2013-02-27 | REC Wafer Pte. Ltd. | Verfahren und einrichtung zur trennung von siliziumwafern |
DE102007020864A1 (de) * | 2007-05-02 | 2008-11-06 | Scolomatic Gmbh | Flächengreifereinheit |
DE102007021512A1 (de) | 2007-05-04 | 2008-11-13 | Rena Sondermaschinen Gmbh | Vorrichtung und Verfahren zur Vereinzelung |
DE502007002047D1 (de) | 2007-05-04 | 2009-12-31 | Rena Sondermaschinen Gmbh | Vorrichtung und Verfahren zur Vereinzelung |
GB2465591B (en) * | 2008-11-21 | 2011-12-07 | Coreflow Ltd | Method and device for separating sliced wafers |
KR101066978B1 (ko) * | 2009-03-16 | 2011-09-23 | 주식회사 에스에프에이 | 태양전지용 웨이퍼의 분리 및 이송 장치 |
KR101127655B1 (ko) * | 2010-04-16 | 2012-07-16 | 금오공과대학교 산학협력단 | 워터젯을 이용한 태양전지용 실리콘 웨이퍼 박판 분리장치 및 이를 이용한 분리 방법 |
CN101950778A (zh) * | 2010-09-02 | 2011-01-19 | 董维来 | 太阳能硅片湿法自动分片方法 |
DE102010045098A1 (de) | 2010-09-13 | 2012-03-15 | Rena Gmbh | Vorrichtung und Verfahren zum Vereinzeln und Transportieren von Substraten |
CN102126616A (zh) * | 2010-12-16 | 2011-07-20 | 尹青 | 一种行走吸盘上下片台 |
JP2013004627A (ja) * | 2011-06-14 | 2013-01-07 | Shinryo Corp | ウエハの分離装置 |
CN102633118A (zh) * | 2012-04-25 | 2012-08-15 | 佛山市科利得机械有限公司 | 一种瓷砖自动分拣装置 |
JP5849201B2 (ja) * | 2013-05-28 | 2016-01-27 | パナソニックIpマネジメント株式会社 | 切り残し部除去装置 |
JP6450637B2 (ja) * | 2015-04-21 | 2019-01-09 | 株式会社ディスコ | リフトオフ方法及び超音波ホーン |
CN104986380B (zh) * | 2015-05-20 | 2017-07-18 | 杭州厚达自动化系统有限公司 | 厅门装箱机构 |
JP6682907B2 (ja) * | 2016-02-26 | 2020-04-15 | 三星ダイヤモンド工業株式会社 | 脆性基板の分断方法 |
CN106345926B (zh) * | 2016-11-01 | 2018-02-13 | 浙江大成智能装备股份有限公司 | 一种铝片冲压成型自动化上下料的自动分张机构 |
CN107082277B (zh) * | 2017-06-08 | 2023-10-27 | 江苏四达重工有限公司 | 一种缓存送料装置 |
CN111566784B (zh) * | 2018-01-09 | 2024-03-26 | 东京毅力科创株式会社 | 清洗装置、清洗方法以及计算机存储介质 |
CN109264416A (zh) * | 2018-09-20 | 2019-01-25 | 上海西重所重型机械成套有限公司 | 金属板板垛分板装置 |
CN111099368B (zh) * | 2020-01-13 | 2020-12-29 | 卢荣芳 | 一种建筑基材转运工序的恒量运输装置 |
Family Cites Families (16)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3729206A (en) * | 1971-10-21 | 1973-04-24 | Ibm | Vacuum holding apparatus |
US4252497A (en) * | 1977-08-22 | 1981-02-24 | Heico Inc. | Article handling system |
US4420909B2 (en) * | 1981-11-10 | 1997-06-10 | Silicon Technology | Wafering system |
DE3338897A1 (de) * | 1983-10-27 | 1985-05-09 | Messwandler-Bau Gmbh, 8600 Bamberg | Blechhubeinrichtung zum schichten von eisenkernen aus einzelblechen |
JPS6165750A (ja) * | 1984-09-04 | 1986-04-04 | Osaka Titanium Seizo Kk | ウエハ−の枚葉取出し装置 |
DE3609549A1 (de) * | 1986-03-21 | 1987-10-01 | Mabeg Maschinenbau Gmbh Nachf | Trennvorrichtung |
JPH02139148A (ja) * | 1988-11-14 | 1990-05-29 | Nippon Seiko Kk | 真空吸着テーブル |
JPH0851140A (ja) * | 1994-08-05 | 1996-02-20 | Dowa Mining Co Ltd | 積層薄板体の2枚取り防止装置及び防止方法 |
US5950643A (en) * | 1995-09-06 | 1999-09-14 | Miyazaki; Takeshiro | Wafer processing system |
CH691169A5 (fr) * | 1996-04-16 | 2001-05-15 | Hct Shaping Systems Sa | Dispositif pour la mise en élément de stockage de tranches obtenues par découpage d'un bloc. |
KR100471936B1 (ko) * | 1996-06-04 | 2005-09-09 | 미쓰비시 마테리알 가부시키가이샤 | 웨이퍼의세정·박리방법및장치 |
JPH1022238A (ja) * | 1996-06-29 | 1998-01-23 | Komatsu Electron Metals Co Ltd | 半導体ウェハのエアーブロー装置 |
JP3209116B2 (ja) * | 1996-10-11 | 2001-09-17 | 株式会社東京精密 | スライスベース剥離装置 |
JP3870496B2 (ja) * | 1997-08-04 | 2007-01-17 | 株式会社東京精密 | スライスベース剥離装置 |
JP4022672B2 (ja) * | 1998-03-04 | 2007-12-19 | 株式会社東京精密 | スライスベース剥離装置 |
DE19900671C2 (de) * | 1999-01-11 | 2002-04-25 | Fraunhofer Ges Forschung | Verfahren und Vorrichtung zum Vereinzeln von scheibenförmigen Substraten, insbesondere zur Waferherstellung |
-
1999
- 1999-10-16 DE DE19950068A patent/DE19950068B4/de not_active Expired - Fee Related
-
2000
- 2000-10-12 EP EP00972741A patent/EP1220739B1/de not_active Expired - Lifetime
- 2000-10-12 ES ES00972741T patent/ES2240189T3/es not_active Expired - Lifetime
- 2000-10-12 CN CNB008143714A patent/CN1160177C/zh not_active Expired - Fee Related
- 2000-10-12 WO PCT/EP2000/010036 patent/WO2001028745A1/de active IP Right Grant
- 2000-10-12 AT AT00972741T patent/ATE294056T1/de not_active IP Right Cessation
- 2000-10-12 CA CA002388730A patent/CA2388730A1/en not_active Abandoned
- 2000-10-12 JP JP2001531562A patent/JP4731077B2/ja not_active Expired - Fee Related
- 2000-10-12 DE DE50010186T patent/DE50010186D1/de not_active Expired - Lifetime
- 2000-10-12 AU AU11368/01A patent/AU777067B2/en not_active Ceased
Also Published As
Publication number | Publication date |
---|---|
CN1379708A (zh) | 2002-11-13 |
ATE294056T1 (de) | 2005-05-15 |
AU777067B2 (en) | 2004-09-30 |
JP4731077B2 (ja) | 2011-07-20 |
DE19950068B4 (de) | 2006-03-02 |
DE19950068A1 (de) | 2001-04-26 |
DE50010186D1 (de) | 2005-06-02 |
AU1136801A (en) | 2001-04-30 |
EP1220739A1 (de) | 2002-07-10 |
CN1160177C (zh) | 2004-08-04 |
ES2240189T3 (es) | 2005-10-16 |
JP2003512196A (ja) | 2003-04-02 |
CA2388730A1 (en) | 2001-04-26 |
WO2001028745A1 (de) | 2001-04-26 |
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