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EP0622682B1 - Composition à base de résine photosensible - Google Patents

Composition à base de résine photosensible Download PDF

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Publication number
EP0622682B1
EP0622682B1 EP94302204A EP94302204A EP0622682B1 EP 0622682 B1 EP0622682 B1 EP 0622682B1 EP 94302204 A EP94302204 A EP 94302204A EP 94302204 A EP94302204 A EP 94302204A EP 0622682 B1 EP0622682 B1 EP 0622682B1
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EP
European Patent Office
Prior art keywords
group
resin composition
photosensitive resin
compound
composition according
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EP94302204A
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German (de)
English (en)
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EP0622682A1 (fr
Inventor
Hideo Hagiwara
Makoto Kaji
Yasunori Kojima
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Resonac Corp
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Hitachi Chemical Co Ltd
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/12—Nitrogen compound containing

Definitions

  • This invention relates to a photosensitive resin composition, more specifically to a photosensitive resin composition having an excellent film property, heat-resistance, adhesivity and image-formability which does not require complex steps for preparation and does not cause contamination with chlorides.
  • inorganic materials have conventionally been used for interlaminar insulation. Recently, organic materials having an excellent heat-resistance such as a polyimide resin have been put to use as materials for interlaminar insulation because of properties thereof.
  • a process for forming a pattern in a semiconductor integrated circuit or forming a pattern of a circuit on a print substrate comprises complex and various steps such as formation of a resist material film on the substrate surface; exposure of required portion to light; removal of unnecessary portion by etching or so; and washing of the base surface. Therefore, development of heat-resistant photosensitive materials have been desired, which enables the required portion of the resist material to be used as insulating materials even after the pattern is formed by exposure to light and development.
  • heat-resistant photosensitive materials comprising, for example, a photosensitive polyimide or a cyclized polybutadiene as a base polymer have been proposed.
  • the photosensitive polyimide has attracted attentions since it has an excellent heat-resistance and impurities can easily be removed.
  • a photosensitive polyimide for example, a photosensitive polyimide precursor (a polyamic acid ester) in which a photosensitive group is introduced into the polyimide precursor by an ester bond is proposed in Japanese Patent Publication No. 30207/1980.
  • This material which requires the use of an acid chloride group in synthesis of the photosensitive polyimide precursor has a disadvantage that a finally obtained photosensitive resin composition is easily contaminated with the chloride.
  • thermal cure of the polyamic acid ester to obtain the objective polyimide requires a high temperature, and therefore, the polyamic acid ester cannot be used when an element which cannot be heated at a high temperature is used.
  • a photosensitive resin composition which mainly comprises a mixture of a polyamic acid, an amine having a photoactive functional group and an azide compound as a photosensitizer is proposed in Japanese Provisional Patent Publication No. 168942/1982.
  • the photosensitive resin composition has a disadvantage that a thick film thereof cannot be formed.
  • Japanese Provisional Patent Publication No. 95697/1979 proposes a photosensitive resin composition which mainly comprises a mixture of a polyamic acid and a polymerizable unsaturated compound having a photoactive functional group.
  • This photosensitive resin composition has a disadvantage that it has a lower resolving power as compared with a photosensitive resin composition which uses a photosensitive group-containing polyamic acid in which the photosensitive group is directly bound with the polyamic acid.
  • European Patent Application No. 0425142A discloses photosensitive compositions comprising photobases which generate amines on exposure to light and polymers which are soluble in alkaline solution.
  • the disclosed polymers are those containing at least one of a carboxyl group and a phenolic hydroxyl group, as well as novolak resins.
  • European Patent Application No. 0555749 relates to a radiation sensitive composition
  • a radiation sensitive composition comprising a photobase generator compound, a resin binder and a material capable of cross-liking in the presence of base.
  • Preferred resin binders include compounds capable of imparting aqueous developability to the composition, for example resins containing polar functional groups such as hydroxyl and carboxylate. Homo- and co-polymers of N-hydroxyphenyl maleimides may be used.
  • nitrobenzylcarbamates such as o-nitrobenzyl N-cyclohexylcarbamate.
  • the present invention is to overcome the above described problems of the prior art, and it is an object of the present invention to provide a photosensitive resin composition having an excellent film property, heat-resistance, adhesion and image-formability which does not require complex steps for preparation and does not cause contamination with chlorides.
  • the present invention relates to a positive type photosensitive resin composition which comprises an alkali-soluble polymer (A) having at least one carboxyl group, and a compound (B) which forms an amine compound with irradiation of light; characterised in that said alkali-soluble polymer (A) is EITHER
  • the alkali-soluble polymer (A) of the present invention may be a polymer having recurring units represented by the formula (I): wherein R 1 represents a tetravalent aromatic ring group which may have a substituent, R 2 represents a divalent aromatic ring group which may have a substituent; R 3 and R 4 are in the ortho-position of one of two carbonyl groups, respectively, and each independently represents a hydrogen atom or a carboxyl group, provided that at least one is a carboxyl group.
  • the tetravalent aromatic ring group of R 1 may include, for example, the following groups: wherein A represents and the divalent aromatic ring group of R 2 may include, for example, the following groups: wherein B has the same meaning as A.
  • the above aromatic rings may have a substituent such as an alkyl group having 1 to 6 carbon atoms and an alkoxy group having 1 to 6 carbon atoms.
  • R 3 and R 4 exist at the ortho-position relative to one of the carbonyl groups bonded to R 1 , and at least one of which is a carboxyl group and the other is a hydrogen atom or a carboxyl group.
  • the polyamic acid resin preferably has a number average molecular weight of 3,000 to 200,000, more preferably 5,000 to 100,000, most preferably 7,000 to 50,000.
  • the mechanical property is lowered. If the number average molecular weight is too high, the resolution is lowered.
  • the polyamic acid resin having the recurring units represented by the formula (I) can be prepared by reacting, for example, a tetracarboxylic dianhydride as an acidic component and a diamine as an amine component in an organic solvent.
  • the aromatic ring represented by R 1 and R 2 in the formula (I) represents an acidic component residue as for R 1 and an amine component residue as for R 2 .
  • tetracarboxylic dianhydride for example, pyrromellitic dianhydride, 3,3',4,4'-benzophenonetetracarboxylic dianhydride, 3,3',4,4'-biphenyltetracarboxylic dianhydride, 1,2,5,6-naphthalenetetracarboxylic dianhydride, 2,3,6,7-naphthalenetetracarboxylic dianhydride, 2,3,5,6-pyridinetetracarboxylic dianhydride, 1,4,5,8-naphthalenetetracarboxylic dianhydride, 3,4,9,10-perylene-tetracarboxylic dianhydride, 4,4'-sulfonyldiphthalic dianhydride, m-terphenyl-3,3",4,4"-tetracarboxylic dianhydride, p-terphenyl-3,3",4,4"-tetracarboxylic dianhydride, 4,4
  • the above tetracarboxylic dianhydride can be used singly or in combination.
  • the compound of the formula (III) may preferably be used in an amount of 1 to 30 mole %, more preferably 2 to 10 mole % based on the total acid components, and the compounds of the formulae (IV) may preferably be used in an amount of 5 to 50 mole %, more preferably 5 to 20 mole % based on the same.
  • the aromatic tetracarboxylic dianhydride is most preferred.
  • the benzene ring of the tetracarboxylic dianhydride may be substituted by a substituent such as an alkyl group.
  • an aliphatic tetracarboxylic dianhydride may be used to such an extent that the heat-resistance and the mechanical property are not lowered.
  • an aromatic diamino compound such as p-phenylenediamine, m-phenylenediamine, p-xylylenediamine, m-xylylenediamine, 1,5-diaminonaphthalene, 3,3'-dimethylbenzidine, 3,3'-dimethoxybenzidine, 4,4'- (or 3,4'-, 3,3'-, 2,4'- or 2,2'-)diaminodiphenylmethane, 4,4'- (or 3,4'-, 3,3'-, 2,4'-or 2,2'-)diaminodiphenyl ether, 4,4'- (or 3,4'-, 3,3'-, 2,4'- or 2,2'-)diaminodiphenylsulfone, 4,4'- (or 3,4'-, 3,3'-, 2,4'- or 2,2'-)diaminodiphenylsulfone, 4,4'- (or 3,4'-, 3,3
  • an aliphatic diamino compound represented by the formula (V): wherein R 9 and R 10 represent a divalent hydrocarbon group; R 11 and R 12 represent a monovalent hydrocarbon group; R 9 and R 10 , R 11 and R 12 each may be the same or different; and t represents an integer of 1 or more, may be used in combination with the above diamine compounds.
  • the above aliphatic diamino compound may preferably be used in an amount of 1 to 30 mole %, more preferably 2 to 10 mole % based on the total amount of diamine compounds.
  • a hydroxyl group-containing diamine such as 3,3'-hydroxybenzidine, 3,4'-diamino-3',4-dihydroxybiphenyl, 3,3'-dihydroxy-4,4'-diaminodiphenyl oxide, 3,3'-dihydroxy-4,4'-diaminodiphenylsulfone, 2,2-bis(3-amino-4-hydroxyphenyl)propane, 1,1,1,3,3,3-hexafluoro-2,2-bis-(3-amino-4-hydroxyphenyl)propane, bis-(3-hydroxy-4-aminophenyl)methane, 3,3'-dihydroxy-4,4'-diaminobenzophenone, 1,1-bis-(3-hydroxy-4-aminophenyl)ethane, 2,2-bis-(3-hydroxy-4-aminophenyl)propane, 1,1,1,3,3,3-hexafluoro-2,2-bis-
  • the diamine may be used singly or in combination.
  • a polar solvent which completely dissolves the forming polyamidic acid resin is generally preferred, and there may be mentioned, for example, N-methyl-2-pyrrolidone, N,N-dimethylacetamide, N,N-dimethylformamide, dimethylsulfoxide, tetramethylurea, hexamethylphosphoric triamide and ⁇ -butyrolactone.
  • ketones, esters, lactones, ethers, halogenated hydrocarbons and hydrocarbons for example, acetone, methyl ethyl ketone, methyl isobutyl ketone, cyclohexanone, methyl acetate, ethyl acetate, butyl acetate, diethyl oxalate, dimethyl malonate, ⁇ -butyrolactone, diethyl ether, ethyleneglycol dimethyl ether, diethyleneglycol dimethyl ether, tetrahydrofurane, dichloromethane, 1,2-dichloroethane, 1,4-dichloroethane, trichloroethane, chlorobenzene, o-dichlorobenzene, hexane, heptane, octane, benzene, toluene and xylene can also be used.
  • acetone methyl ethyl ketone,
  • the organic solvent may be used singly or in combination.
  • the compound (B) of the present invention which forms an amine compound with irradiation of light is not particularly limited, and a compound represented by the formula (II): wherein R 5 represents an aromatic ring group; R 6 represents a monovalent organic group; X represents a hydrogen atom or a monovalent substituent, Y represents a monovalent organic group; m represents an integer of 1 through 5, and when m is 2 or more, a plural number of X's may be the same or different, can preferably be used.
  • the aromatic ring represented by R 5 is not particularly limited, and benzene (phenylene), naphthalene and anthracene rings are preferred.
  • the monovalent organic group represented by R 6 is not particularly limited, and a hydrogen atom and an alkyl group having 1 to 6 carbon atoms, preferably 1 to 3 carbon atoms are preferred.
  • the monovalent substituent represented by X is not particularly limited, and an alkyl group having 1 to 10 carbon atoms, an alkoxyl group having 1 to 10 carbon atoms, a halogen atom, a nitro group and a cyano group are preferred.
  • the monovalent organic group represented by Y is not particularly limited, and an alkyl group having 1 to 10 carbon atoms, preferably 1 to 4 carbon atoms, a cycloalkyl group having 3 to 8 carbon atoms, preferably 3 to 6 carbon atoms, an aralkyl group having 7 to 17 carbon atoms, preferably 7 to 12 carbon atoms, and a hydroxyalkyl group having 1 to 10 carbon atoms, preferably 1 to 6 carbon atoms, are possible alternatives for Y.
  • a process for preparation of the compound (B) represented by the formula (II) is not particularly limited, and can be carried out, for example, when the aromatic ring of R 5 in the formula (II) is a benzene ring, by reacting a benzylalcohol derivative and an isocyanate compound as shown by the formula (VI): wherein R 6 , X, Y and m have the same meaning as in the formula (II).
  • a catalyst may be used if-necessary.
  • the compound represented by the formula (II) may include, for example, the following compounds:
  • R 5 is R 6 is -CH 3
  • X is -OCH 3
  • m is 2
  • Y is -CH 2 CH 2 OH or a cyclohexyl group.
  • the compound (B) may preferably be used in the range of 1 to 250 % by weight, more preferably in the range of 50 to 170 % by weight based on the polymer (A).
  • a coupling agent or a surfactant may be added to the photosensitive resin composition of the present invention in order to improve the adhesions to the substrate, if necessary.
  • the photosensitive resin composition of the present invention contains the above described various components.
  • the solid content of a coating solution containing said composition is preferably 5 to 50 % by weight, more preferably 10 to 30 % by weight, and the viscosity of the coating solution is preferably 1 to 300 poise, more preferably 30 to 200 poise.
  • the order for mixing these components and the method for mixing these components are not particularly limited, and the composition may be applied to a substrate such as a copper-clad laminate and a silicon wafer by a dipping method, a spraying method, a screen printing method and a spinner coating method, and dried to form a film.
  • a dry film having a sandwich structure may be previously prepared by coating a flexible substrate, for example, a polyester film, with the photosensitive resin composition; drying it to laminate thereon; and then covering the laminate with a cover sheet made of polyethylene or so, and a film can be prepared on the substrate to be covered by peeling the cover sheet of the dry film.
  • the cover sheet may not necessarily be used.
  • an amine compound originating from the component (B) By irradiating active rays on the film through a mask having required pattern, an amine compound originating from the component (B) generates at the portion of irradiation (exposed portion).
  • the irradiated portion becomes water-soluble in the presence of the amine compound, whereas the non-irradiated portion (non-exposed portion) remains water-insoluble.
  • a film can be formed similarly by irradiating ionizing radiation such as en electronic ray and a radiation.
  • the irradiated portion which is made water-soluble in the presence of the amine compound can be removed, and the non-irradiated portion which remains insoluble remains so that the required resin pattern can be obtained.
  • water can usually be used as above.
  • an organic solvent a mixed solvent of a water-soluble organic solvent and water and/or an alkali aqueous solution can be used.
  • the organic solvent may include, for example, N-methylpyrrolidone, N-acetyl-2-pyrrolidone, N,N-dimethylformamide, N,N-dimethylacetamide, dimethylsulfoxide, hexamethylenephosphoric triamide, ⁇ -butyrolactone, an alcohol such as methanol, ethanol and isopropanol, an aromatic hydrocarbon compound such as toluene and xylene, a ketone such as acetone, methyl ethyl ketone and methyl isobutyl ketone, an ester such as ethyl acetate and methyl propionate, and an ether such as tetrahydrofurane and dioxane.
  • N-methylpyrrolidone N-acetyl-2-pyrrolidone
  • N,N-dimethylformamide N,N-dimethylacetamide
  • dimethylsulfoxide hexamethylenephosphoric triamide
  • the alkali aqueous solution is a solution of a basic compound dissolved in water.
  • a basic compound for example, a hydroxide, a carbonate, a hydrogencarbonate, a silicate, a phosphate, a pyrophosphate, an acetate and an amine of an alkaline metal or a quaternary ammonium can be used.
  • lithium hydroxide sodium hydroxide, potassium hydroxide, ammonium hydroxide, trimethylbenzylammonium hydroxide, tetramethylammonium hydroxide, sodium carbonate, potassium carbonate, sodium hydrogencarbonate, sodium silicate, sodium phosphate, sodium pyrophosphate, sodium acetate, monoethanolamine, diethanolamine and triethanolamine.
  • the amount of the basic compound based on the amount of water is preferably such an amount that the sufficient difference in the solubility or in the dissolution rate is caused between the irradiated portion and the non-irradiated portion.
  • pattern can be converted to a surface protective film or an interlaminar insulating film of a semiconductor, a multi-layer printed-wiring board and a high density packaging substrate each having a heat resistance by preliminarily drying at 50 to 250 °C, and then heating, i.e., post-curing at 300 to 400 °C.
  • the photosensitive resin composition of the present invention is remarkably useful mainly in the above mentioned field of fine processing.
  • DDE diaminodiphenyl ether
  • NMP N-methyl-2-pyrrolidone
  • 1-(2-Nitrophenyl)ethyl-N-cyclohexylcarbamate in an amount of 3 g and 0.5 g of polyethyleneglycol were added to 10 g of the above synthesized polyamic acid resin solution (PA-1), and dissolved therein while stirring, followed by filtration with a 5 ⁇ m filter to have a photosensitive resin composition.
  • PA-1 polyamic acid resin solution
  • a silicon wafer was spin-coated with the above prepared photosensitive resin composition, and prebaked at 100 °C for 300 seconds to have a uniform film having a thickness of 5 ⁇ m. Then, the film was irradiated with an ultrahigh pressure mercury lamp (20 mW/cm 2 ) for 100 seconds through a mask. The film was then dipped in water to carry out a development, rinsed with water, and dried so that a positive type clear relief pattern having a high resolution was obtained. The relief pattern was thermally cured at 100 °C for 30 minutes, at 200 °C for 60 minutes, and then at 350 °C for 60 minutes to have a polyimide, without changes in the pattern.
  • a coating film with a thickness of 20 ⁇ m was formed on another silicon wafer and the film was cured by the above conditions without forming any pattern.
  • the cured film was peeled off from the wafer, it could be found that a tough polyimide film could be obtained.
  • a weight decrease-initiating temperature under heating of the film was 400 °C or higher whereby it can be found that the film is also excellent in heat resistance.
  • PA-2 polyamic acid resin solution having the solid content of 25 % was obtained in the same manner as in Example 1 except for changing 6-FDA to 4,4'-oxydiphthalic acid (ODPA) and reacting them with equivalent amounts.
  • PA-2 polyamic acid resin solution
  • a silicon wafer was spin-coated with the thus prepared photosensitive resin composition, and prebaked at 100 °C for 300 seconds to have a uniform film having a thickness of 5 ⁇ m. Then, the film was irradiated with an ultrahigh pressure mercury lamp (20 mW/cm 2 ) for 100 seconds through a mask. The film was then dipped in water to carry out a development, rinsed with water, and dried so that a positive type clear relief pattern having a high resolution was obtained. The relief pattern was thermally cured at 100 °C for 30 minutes, at 200 °C for 60 minutes, and then at 350 °C for 60 minutes to have a polyimide, without changes in the pattern.
  • a coating film with a thickness of 20 ⁇ m was formed on another silicon wafer and the film was cured by the above conditions without forming any pattern.
  • the cured film was peeled off, it could be found that a tough polyimide film could be obtained.
  • a weight decrease-initiating temperature under heating of the film was 400 °C or higher whereby it can be found that the film is also excellent in heat resistance.
  • PA-3 polyamic acid resin solution having the solid content of 25 % was obtained in the same manner as in Example 1 except for changing DDE to m-phenylenediamine (hereinafter abbreviated to as "MPD”) and 6-FDA to pyrromellitic acid dianhydride (PMDA) and reacting them with equivalent amounts.
  • MPD m-phenylenediamine
  • PMDA pyrromellitic acid dianhydride
  • PA-3 polyamic acid resin solution
  • a silicon wafer was spin-coated with the thus prepared photosensitive resin composition, and prebaked at 100 °C for 300 seconds to have a uniform film having a thickness of 5 ⁇ m. Then, the film was irradiated with an ultrahigh pressure mercury lamp (20 mW/cm 2 ) for 100 seconds through a mask. The film was then dipped in water to carry out a development, rinsed with water, and dried so that a positive type clear relief pattern having a high resolution was obtained. The relief pattern was thermally cured at 100 °C for 30 minutes, at 200 °C for 60 minutes, and then at 350 °C for 60 minutes to have a polyimide, without changes in the pattern.
  • a coating film with a thickness of 20 ⁇ m was formed on another silicon wafer and the film was cured by the above conditions without forming any pattern.
  • the cured film was peeled off, it could be found that a tough polyimide film could be obtained.
  • a weight decrease-initiating temperature under heating of the film was 400 °C or higher whereby it can be found that the film is also excellent in heat resistance.
  • PA-4 polyamic acid resin solution having the solid content of 25 % was obtained in the same manner as in Example 1 except for changing DDE to 4,4'-diaminodiphenylsulfone (hereinafter abbreviated to as "p-DDS”) and 6-FDA to 3,3',4,4'-biphenyltatracarboxylic acid dianhydride (s-BPDA) and reacting them with equivalent amounts.
  • p-DDS 4,4'-diaminodiphenylsulfone
  • 6-FDA 3,3',4,4'-biphenyltatracarboxylic acid dianhydride
  • PA-4 polyamic acid resin solution
  • a silicon wafer was spin-coated with the thus prepared photosensitive resin composition, and prebaked at 100 °C for 300 seconds to have a uniform film having a thickness of 5 ⁇ m. Then, the film was irradiated with an ultrahigh pressure mercury lamp (20 mW/cm 2 ) for 100 seconds through a mask. The film was then dipped in water to carry out a development, rinsed with water, and dried so that a positive type clear relief pattern having a high resolution was obtained. The relief pattern was thermally cured at 100 °C for 30 minutes, at 200 °C for 60 minutes, and then at 350 °C for 60 minutes to have a polyimide, without changes in the pattern.
  • a coating film with a thickness of 20 ⁇ m was formed on another silicon wafer and the film was cured by the above conditions without forming any pattern.
  • the cured film was peeled off, it could be found that a tough polyimide film could be obtained.
  • a weight decrease-initiating temperature under heating of the film was 400 °C or higher whereby it can be found that the film is also excellent in heat resistance.
  • the photosensitive resin composition of the present invention can easily be prepared without complex steps and contamination with ionic impurities. Also, it hardly affects the environment since water can be used as a developer. Furthermore, the photosensitive resin composition of the present invention has a high image-forming ability, film property and heat-resistance.

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  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Macromolecular Compounds Obtained By Forming Nitrogen-Containing Linkages In General (AREA)
  • Materials For Photolithography (AREA)

Claims (12)

  1. Composition de résine photosensible de type positif qui comprend un polymère soluble dans les alcalis (A) ayant au moins un groupe carboxyle, et un composé (B) qui forme un composé amine avec l'irradiation par la lumière ; caractérisé en ce que ledit polymère soluble dans les alcalis (A) est SOIT
    (a) une résine d'acide polyamique ayant des motifs répétés représentée par la formule (I) :
    Figure 00340001
    où R1 représente un groupe cyclique aromatique tétravalent qui peut avoir un substituant, R2 représente un groupe cyclique aromatique divalent qui peut avoir un substituant ; R3 et R4 sont en position ortho de l'un des deux groupes carbonyle, respectivement, et chacun indépendamment représente un atome d'hydrogène ou un groupe carboxyle, à condition qu'au moins l'un des groupes est un groupe carboxyle,
    SOIT
    (b) un produit de réaction d'au moins un dianhydride tétracarboxylique alicyclique choisi dans le groupe constitué de :
    Figure 00340002
    et un composé diamino aliphatique représenté par la formule :
    Figure 00350001
       où R9 et R10 représentent un groupe hydrocarbure divalent ; R11 et R12 représentent un groupe hydrocarbure monovalent ; R9 et R10, R11 et R12 peuvent être chacun identiques ou différents ; et t représente un nombre entier qui est 1 ou plus.
  2. Composition de résine photosensible selon la revendication 1, où le polymère (A) soluble dans les alcalis a un poids moléculaire moyen en nombre de 3 000 à 200 000.
  3. Composition de résine photosensible selon la revendication 1, où la résine d'acide polyamique est un produit de réaction d'un dianhydride tétracarboxylique et d'une diamine.
  4. Composition de résine photosensible selon la revendication 3, le dianhydride tétracarboxylique comprend, comme faisant partie du composant acide, un dianhydride tétracarboxylique aromatique représenté par la formule :
    Figure 00350002
       où R7 et R8 peuvent être identiques ou différents et représentent un groupe hydrocarbure monovalent ; et s représente 0 ou un entier qui est 1 ou plus,
    ou un de ses composés hydrogénés.
  5. Composition de résine photosensible selon la revendication 3, où la diamine est un composé diamine contenant un groupe hydroxyle.
  6. Composition de résine photosensible selon la revendication 1, où le composé (B) est un composé représenté par la formule :
    Figure 00360001
       où R5 représente un groupe cyclique aromatique ; R6 représente un groupe organique monovalent ; X représente un atome d'hydrogène ou un substituant monovalent, Y représente un groupe organique monovalent ; m représente un nombre entier de 1 à 5, et quand m représente 2 ou plus, les groupes X peuvent être identiques ou différents.
  7. Composition de résine photosensible selon la revendication 6, où R5 est un cycle benzène, naphtalène ou anthracène.
  8. Composition de résine photosensible selon la revendication 6, où R6 est un atome d'hydrogène ou un groupe alkyle ayant 1 à 6 atomes de carbone ; X est un groupe alkyle ayant 1 à 10 atomes de carbone, un groupe alcoxyle ayant 1 à 10 atomes de carbone, un atome d'halogène, un groupe nitro ou un groupe cyano ; et Y est un groupe alkyle ayant 1 à 10 atomes de carbone, un groupe cycloalkyle ayant 3 à 8 atomes de carbone, un groupe aralkyle ayant 7 à 17 atomes de carbone ou un groupe hydroxyalkyle ayant 1 à 10 atomes de carbone.
  9. Composition de résine photosensible selon la revendication 6, où le composé (B) est un composé choisi dans le groupe constitué de :
    Figure 00370001
    Figure 00370002
    Figure 00370003
    Figure 00370004
    Figure 00370005
    Figure 00370006
  10. Composition de résine photosensible selon la revendication 1, qui comprend 1 à 250% en poids du composé (B) par rapport au polymère (A).
  11. Composition de résine photosensible selon la revendication 3, où l'anhydride d'acide tétracarboxylique est au moins un composé choisi dans le groupe constitué des dianhydride pyrromellitique, dianhydride 3,3',4,4'-biphényltétracarboxylique et anhydride 4,4'-oxydiphtalique.
  12. Composition de résine photosensible selon la revendication 3, où la diamine est au moins un composé choisi dans le groupe constitué des m-phénylènediamine, 4,4'-diaminodiphényléther, 3,4'-diaminodiphényléther, 4,4'-diaminodiphénylsulfone et 3,4'-diaminodiphénylsulfone.
EP94302204A 1993-04-28 1994-03-28 Composition à base de résine photosensible Expired - Lifetime EP0622682B1 (fr)

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CN1930522B (zh) * 2004-03-12 2013-06-12 东丽株式会社 正型感光性树脂组合物、使用该组合物的浮雕图形以及固体成象元件
EP1637927A1 (fr) 2004-09-02 2006-03-22 Fuji Photo Film Co., Ltd. Composition pour réserve de type positif et procédé de formation de motifs employant ladite composition
JP4580841B2 (ja) 2005-08-16 2010-11-17 富士フイルム株式会社 ポジ型レジスト組成物及びそれを用いたパターン形成方法
JP4905786B2 (ja) 2007-02-14 2012-03-28 富士フイルム株式会社 レジスト組成物及びそれを用いたパターン形成方法
US7592118B2 (en) 2007-03-27 2009-09-22 Fujifilm Corporation Positive resist composition and pattern forming method using the same
US8182975B2 (en) 2007-03-28 2012-05-22 Fujifilm Corporation Positive resist composition and pattern forming method using the same
JP5039622B2 (ja) 2007-03-30 2012-10-03 富士フイルム株式会社 ポジ型レジスト組成物及びこれを用いたパターン形成方法
JP4982228B2 (ja) 2007-03-30 2012-07-25 富士フイルム株式会社 ポジ型レジスト組成物及びこれを用いたパターン形成方法
WO2009022561A1 (fr) 2007-08-10 2009-02-19 Fujifilm Corporation Composition de résist positive et procédé pour la formation de motif à l'aide de la composition de résist positive
JP4911469B2 (ja) 2007-09-28 2012-04-04 富士フイルム株式会社 レジスト組成物及びこれを用いたパターン形成方法
JP5397017B2 (ja) * 2009-05-25 2014-01-22 株式会社リコー ポリアミド酸及びポリイミド
TWI600966B (zh) 2014-02-21 2017-10-01 東京威力科創股份有限公司 光敏化學增幅型光阻材料及使用該光阻材料之圖案形成方法、半導體器件、光微影用光罩，以及奈米壓印用模板
JP6512994B2 (ja) 2015-08-20 2019-05-15 国立大学法人大阪大学 化学増幅型レジスト材料
JP6774814B2 (ja) 2015-08-20 2020-10-28 国立大学法人大阪大学 化学増幅型レジスト材料及びパターン形成方法
JP6809843B2 (ja) 2015-08-20 2021-01-06 国立大学法人大阪大学 パターン形成方法
JP2017054116A (ja) 2015-09-10 2017-03-16 Jsr株式会社 レジストパターン形成方法
JP6507958B2 (ja) 2015-09-10 2019-05-08 Jsr株式会社 化学増幅型レジスト材料及びレジストパターン形成方法
US9989849B2 (en) 2015-11-09 2018-06-05 Jsr Corporation Chemically amplified resist material and resist pattern-forming method
US10018911B2 (en) 2015-11-09 2018-07-10 Jsr Corporation Chemically amplified resist material and resist pattern-forming method

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KR100246113B1 (ko) 2000-06-01
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US6197475B1 (en) 2001-03-06
EP0622682A1 (fr) 1994-11-02

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