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DK9886A - NAPHTHALENDER DERIVATIVES AND MANUFACTURING THEREOF - Google Patents

NAPHTHALENDER DERIVATIVES AND MANUFACTURING THEREOF Download PDF

Info

Publication number
DK9886A
DK9886A DK9886A DK9886A DK9886A DK 9886 A DK9886 A DK 9886A DK 9886 A DK9886 A DK 9886A DK 9886 A DK9886 A DK 9886A DK 9886 A DK9886 A DK 9886A
Authority
DK
Denmark
Prior art keywords
naphthalender
derivatives
manufacturing
naphthalender derivatives
Prior art date
Application number
DK9886A
Other languages
Danish (da)
Other versions
DK9886D0 (en
Inventor
Tameo Iwasaki
Kohki Takashima
Original Assignee
Tanabe Seiyaku Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tanabe Seiyaku Co filed Critical Tanabe Seiyaku Co
Publication of DK9886D0 publication Critical patent/DK9886D0/en
Publication of DK9886A publication Critical patent/DK9886A/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/48—Ion implantation

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Inorganic Compounds Of Heavy Metals (AREA)
  • Acyclic And Carbocyclic Compounds In Medicinal Compositions (AREA)
DK9886A 1985-01-11 1986-01-09 NAPHTHALENDER DERIVATIVES AND MANUFACTURING THEREOF DK9886A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP306085A JPS61163264A (en) 1985-01-11 1985-01-11 Formation of oxide film of platinum group metal

Publications (2)

Publication Number Publication Date
DK9886D0 DK9886D0 (en) 1986-01-09
DK9886A true DK9886A (en) 1986-07-11

Family

ID=11546779

Family Applications (1)

Application Number Title Priority Date Filing Date
DK9886A DK9886A (en) 1985-01-11 1986-01-09 NAPHTHALENDER DERIVATIVES AND MANUFACTURING THEREOF

Country Status (5)

Country Link
JP (1) JPS61163264A (en)
DD (1) DD261786A5 (en)
DE (1) DE3600575C2 (en)
DK (1) DK9886A (en)
SU (2) SU1581217A3 (en)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3855230T2 (en) * 1987-08-28 1996-10-31 Sumitomo Electric Industries Method of manufacturing a superconducting article
KR0172772B1 (en) * 1995-05-17 1999-03-30 김주용 Method of forming ruo2 film of semiconductor equipment
JP2009107773A (en) * 2007-10-30 2009-05-21 Mitsubishi Electric Corp Printer device
RU2551655C1 (en) * 2014-05-15 2015-05-27 Федеральное государственное бюджетное учреждение науки Новосибирский институт органической химии им. Н.Н. Ворожцова Сибирского отделения Российской академии наук (НИОХ СО РАН) Method for producing (3-hydroxypropyl)naphthols

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5331971A (en) * 1976-09-06 1978-03-25 Nippon Telegr & Teleph Corp <Ntt> Forming method of metal oxide film or semiconductor oxide film

Also Published As

Publication number Publication date
DK9886D0 (en) 1986-01-09
SU1577697A3 (en) 1990-07-07
JPS61163264A (en) 1986-07-23
DE3600575C2 (en) 1987-03-19
SU1581217A3 (en) 1990-07-23
DE3600575A1 (en) 1986-07-17
DD261786A5 (en) 1988-11-09

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Legal Events

Date Code Title Description
AHS Application shelved for other reasons than non-payment