DE602004011343D1 - Chipbefestigung - Google Patents
ChipbefestigungInfo
- Publication number
- DE602004011343D1 DE602004011343D1 DE602004011343T DE602004011343T DE602004011343D1 DE 602004011343 D1 DE602004011343 D1 DE 602004011343D1 DE 602004011343 T DE602004011343 T DE 602004011343T DE 602004011343 T DE602004011343 T DE 602004011343T DE 602004011343 D1 DE602004011343 D1 DE 602004011343D1
- Authority
- DE
- Germany
- Prior art keywords
- adhesive layer
- carrier tape
- die
- singulated
- cured
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 239000012790 adhesive layer Substances 0.000 abstract 7
- 239000000758 substrate Substances 0.000 abstract 2
- 230000032798 delamination Effects 0.000 abstract 1
Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
- H01L24/80—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/6835—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
- H01L21/6836—Wafer tapes, e.g. grinding or dicing support tapes
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/77—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate
- H01L21/78—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices
- H01L21/7806—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices involving the separation of the active layers from a substrate
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
- H01L24/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L24/26—Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
- H01L24/27—Manufacturing methods
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
- H01L24/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L24/26—Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
- H01L24/28—Structure, shape, material or disposition of the layer connectors prior to the connecting process
- H01L24/29—Structure, shape, material or disposition of the layer connectors prior to the connecting process of an individual layer connector
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
- H01L24/80—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
- H01L24/83—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a layer connector
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2221/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof covered by H01L21/00
- H01L2221/67—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere
- H01L2221/683—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L2221/68304—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
- H01L2221/68327—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support used during dicing or grinding
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/26—Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
- H01L2224/27—Manufacturing methods
- H01L2224/274—Manufacturing methods by blanket deposition of the material of the layer connector
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/80—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
- H01L2224/83—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a layer connector
- H01L2224/8319—Arrangement of the layer connectors prior to mounting
- H01L2224/83191—Arrangement of the layer connectors prior to mounting wherein the layer connectors are disposed only on the semiconductor or solid-state body
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/80—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
- H01L2224/83—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a layer connector
- H01L2224/838—Bonding techniques
- H01L2224/8385—Bonding techniques using a polymer adhesive, e.g. an adhesive based on silicone, epoxy, polyimide, polyester
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01005—Boron [B]
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01006—Carbon [C]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01033—Arsenic [As]
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01078—Platinum [Pt]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01082—Lead [Pb]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/06—Polymers
- H01L2924/078—Adhesive characteristics other than chemical
- H01L2924/07802—Adhesive characteristics other than chemical not being an ohmic electrical conductor
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/10—Details of semiconductor or other solid state devices to be connected
- H01L2924/11—Device type
- H01L2924/12—Passive devices, e.g. 2 terminal devices
- H01L2924/1204—Optical Diode
- H01L2924/12042—LASER
Landscapes
- Engineering & Computer Science (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Dicing (AREA)
- Die Bonding (AREA)
- Laser Beam Processing (AREA)
- Light Receiving Elements (AREA)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GB0315623A GB2404280B (en) | 2003-07-03 | 2003-07-03 | Die bonding |
GB0315623 | 2003-07-03 | ||
PCT/EP2004/007161 WO2005004226A1 (en) | 2003-07-03 | 2004-07-01 | Die bonding |
Publications (2)
Publication Number | Publication Date |
---|---|
DE602004011343D1 true DE602004011343D1 (de) | 2008-03-06 |
DE602004011343T2 DE602004011343T2 (de) | 2008-12-24 |
Family
ID=27741543
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE602004011343T Expired - Lifetime DE602004011343T2 (de) | 2003-07-03 | 2004-07-01 | Chipbefestigung |
Country Status (11)
Country | Link |
---|---|
US (1) | US7989320B2 (de) |
EP (1) | EP1642332B1 (de) |
JP (1) | JP4625804B2 (de) |
KR (1) | KR101167894B1 (de) |
CN (1) | CN1816908B (de) |
AT (1) | ATE384335T1 (de) |
DE (1) | DE602004011343T2 (de) |
GB (1) | GB2404280B (de) |
MY (1) | MY141475A (de) |
TW (1) | TWI245376B (de) |
WO (1) | WO2005004226A1 (de) |
Families Citing this family (27)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4659300B2 (ja) | 2000-09-13 | 2011-03-30 | 浜松ホトニクス株式会社 | レーザ加工方法及び半導体チップの製造方法 |
US6676878B2 (en) | 2001-01-31 | 2004-01-13 | Electro Scientific Industries, Inc. | Laser segmented cutting |
ES2356817T3 (es) * | 2002-03-12 | 2011-04-13 | Hamamatsu Photonics K.K. | Método de corte de un objeto procesado. |
ES2639733T3 (es) | 2002-03-12 | 2017-10-30 | Hamamatsu Photonics K.K. | Método de división de sustrato |
TWI326626B (en) | 2002-03-12 | 2010-07-01 | Hamamatsu Photonics Kk | Laser processing method |
TWI520269B (zh) | 2002-12-03 | 2016-02-01 | Hamamatsu Photonics Kk | Cutting method of semiconductor substrate |
EP1609559B1 (de) | 2003-03-12 | 2007-08-08 | Hamamatsu Photonics K. K. | Laserstrahlbearbeitungsverfahren |
JP4532358B2 (ja) * | 2005-06-15 | 2010-08-25 | 株式会社ディスコ | 半導体チップの製造方法 |
DE102005048153B4 (de) | 2005-10-06 | 2010-08-05 | Infineon Technologies Ag | Verfahren zur Herstellung eines Halbleiterbauteils mit Halbleiterchip und Klebstofffolie |
DE102005048826B3 (de) * | 2005-10-10 | 2007-04-12 | Infineon Technologies Ag | Halbleiterbauteil mit Halbleiterchip und Klebstofffolie und Verfahren zur Herstellung des Halbleiterchips und Halbleiterbauteils |
DE102005050127B3 (de) | 2005-10-18 | 2007-05-16 | Infineon Technologies Ag | Verfahren zum Aufbringen einer Struktur aus Fügematerial auf die Rückseiten von Halbleiterchips |
JP2008235398A (ja) * | 2007-03-19 | 2008-10-02 | Disco Abrasive Syst Ltd | デバイスの製造方法 |
GB2458475B (en) * | 2008-03-18 | 2011-10-26 | Xsil Technology Ltd | Processing of multilayer semiconductor wafers |
JP2009231779A (ja) * | 2008-03-25 | 2009-10-08 | Lintec Corp | 半導体装置の製造方法 |
US20100167471A1 (en) | 2008-12-30 | 2010-07-01 | Stmicroelectronics Asia Pacific Pte. Ltd. | Reducing warpage for fan-out wafer level packaging |
US20110156239A1 (en) * | 2009-12-29 | 2011-06-30 | Stmicroelectronics Asia Pacific Pte Ltd. | Method for manufacturing a fan-out embedded panel level package |
US8502367B2 (en) | 2010-09-29 | 2013-08-06 | Stmicroelectronics Pte Ltd. | Wafer-level packaging method using composite material as a base |
US20160133486A1 (en) | 2014-11-07 | 2016-05-12 | International Business Machines Corporation | Double Layer Release Temporary Bond and Debond Processes and Systems |
US10475764B2 (en) * | 2014-12-26 | 2019-11-12 | Taiwan Semiconductor Manufacturing Company, Ltd. | Die bonder and methods of using the same |
WO2016175653A2 (en) * | 2015-04-28 | 2016-11-03 | Nederlandse Organisatie Voor Toegepast-Natuurwetenschappelijk Onderzoek Tno | Apparatus and method for soldering chips |
KR102194727B1 (ko) | 2015-04-29 | 2020-12-23 | 삼성전기주식회사 | 인덕터 |
KR101797728B1 (ko) | 2016-03-11 | 2017-11-16 | 삼성디스플레이 주식회사 | 디스플레이 장치 |
US10269756B2 (en) * | 2017-04-21 | 2019-04-23 | Invensas Bonding Technologies, Inc. | Die processing |
US10607861B2 (en) | 2017-11-28 | 2020-03-31 | Nxp B.V. | Die separation using adhesive-layer laser scribing |
US10727219B2 (en) | 2018-02-15 | 2020-07-28 | Invensas Bonding Technologies, Inc. | Techniques for processing devices |
US11742314B2 (en) | 2020-03-31 | 2023-08-29 | Adeia Semiconductor Bonding Technologies Inc. | Reliable hybrid bonded apparatus |
CN113784513A (zh) * | 2021-08-10 | 2021-12-10 | 信维通信(江苏)有限公司 | 一种线路板成型方法 |
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BE756807A (fr) * | 1969-09-29 | 1971-03-29 | Motorola Inc | Procede pour la gravure non preferentielle du silicium par un melange gazeux, et melange gazeux pour cette gravure |
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JPH07135441A (ja) * | 1994-06-02 | 1995-05-23 | Sanyo Electric Co Ltd | 弾性表面波素子の製造方法 |
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JPH1140523A (ja) * | 1997-07-22 | 1999-02-12 | Mitsubishi Electric Corp | 基板切断装置および基板切断方法 |
KR100283415B1 (ko) * | 1998-07-29 | 2001-06-01 | 구자홍 | 레이저를이용한투명매질의가공방법및장치 |
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JP4409014B2 (ja) | 1999-11-30 | 2010-02-03 | リンテック株式会社 | 半導体装置の製造方法 |
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JP2002184720A (ja) * | 2000-12-15 | 2002-06-28 | Murata Mfg Co Ltd | デバイスの製造方法 |
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JP3544362B2 (ja) | 2001-03-21 | 2004-07-21 | リンテック株式会社 | 半導体チップの製造方法 |
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JP3612317B2 (ja) * | 2001-11-30 | 2005-01-19 | 株式会社東芝 | 半導体装置の製造方法 |
JP2003173988A (ja) | 2001-12-04 | 2003-06-20 | Furukawa Electric Co Ltd:The | 半導体ウェハのダイシング方法 |
KR101037142B1 (ko) * | 2002-04-19 | 2011-05-26 | 일렉트로 사이언티픽 인더스트리즈, 아이엔씨 | 펄스 레이저를 이용한 기판의 프로그램 제어 다이싱 |
GB2399311B (en) * | 2003-03-04 | 2005-06-15 | Xsil Technology Ltd | Laser machining using an active assist gas |
JP2004273895A (ja) * | 2003-03-11 | 2004-09-30 | Disco Abrasive Syst Ltd | 半導体ウエーハの分割方法 |
JP4231349B2 (ja) * | 2003-07-02 | 2009-02-25 | 株式会社ディスコ | レーザー加工方法およびレーザー加工装置 |
-
2003
- 2003-07-03 GB GB0315623A patent/GB2404280B/en not_active Expired - Lifetime
-
2004
- 2004-06-30 TW TW093119635A patent/TWI245376B/zh not_active IP Right Cessation
- 2004-07-01 DE DE602004011343T patent/DE602004011343T2/de not_active Expired - Lifetime
- 2004-07-01 WO PCT/EP2004/007161 patent/WO2005004226A1/en active IP Right Grant
- 2004-07-01 MY MYPI20042629A patent/MY141475A/en unknown
- 2004-07-01 CN CN2004800188867A patent/CN1816908B/zh not_active Expired - Fee Related
- 2004-07-01 KR KR1020067000162A patent/KR101167894B1/ko not_active IP Right Cessation
- 2004-07-01 US US10/561,883 patent/US7989320B2/en not_active Expired - Fee Related
- 2004-07-01 EP EP04740528A patent/EP1642332B1/de not_active Expired - Lifetime
- 2004-07-01 JP JP2006516088A patent/JP4625804B2/ja not_active Expired - Fee Related
- 2004-07-01 AT AT04740528T patent/ATE384335T1/de active
Also Published As
Publication number | Publication date |
---|---|
EP1642332A1 (de) | 2006-04-05 |
KR20060023196A (ko) | 2006-03-13 |
JP2009514185A (ja) | 2009-04-02 |
CN1816908B (zh) | 2010-06-16 |
ATE384335T1 (de) | 2008-02-15 |
CN1816908A (zh) | 2006-08-09 |
TWI245376B (en) | 2005-12-11 |
MY141475A (en) | 2010-04-30 |
WO2005004226B1 (en) | 2005-03-03 |
DE602004011343T2 (de) | 2008-12-24 |
US7989320B2 (en) | 2011-08-02 |
KR101167894B1 (ko) | 2012-07-30 |
GB2404280B (en) | 2006-09-27 |
JP4625804B2 (ja) | 2011-02-02 |
GB0315623D0 (en) | 2003-08-13 |
GB2404280A (en) | 2005-01-26 |
US20070224733A1 (en) | 2007-09-27 |
WO2005004226A1 (en) | 2005-01-13 |
EP1642332B1 (de) | 2008-01-16 |
TW200504948A (en) | 2005-02-01 |
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