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DE3775076D1 - Verfahren zur herstellung eines kohlenstoffilmes. - Google Patents

Verfahren zur herstellung eines kohlenstoffilmes.

Info

Publication number
DE3775076D1
DE3775076D1 DE8787101271T DE3775076T DE3775076D1 DE 3775076 D1 DE3775076 D1 DE 3775076D1 DE 8787101271 T DE8787101271 T DE 8787101271T DE 3775076 T DE3775076 T DE 3775076T DE 3775076 D1 DE3775076 D1 DE 3775076D1
Authority
DE
Germany
Prior art keywords
producing
carbon film
carbon
film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE8787101271T
Other languages
English (en)
Inventor
Misuzu Watanabe
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Meidensha Electric Manufacturing Co Ltd
Original Assignee
Meidensha Electric Manufacturing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP1956686A external-priority patent/JPH079059B2/ja
Priority claimed from JP61019569A external-priority patent/JPH0742570B2/ja
Priority claimed from JP61019567A external-priority patent/JPS62180054A/ja
Priority claimed from JP61019570A external-priority patent/JPS62180057A/ja
Priority claimed from JP61019568A external-priority patent/JPS62180055A/ja
Application filed by Meidensha Electric Manufacturing Co Ltd filed Critical Meidensha Electric Manufacturing Co Ltd
Application granted granted Critical
Publication of DE3775076D1 publication Critical patent/DE3775076D1/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/0021—Reactive sputtering or evaporation
    • C23C14/0036—Reactive sputtering
    • C23C14/0057—Reactive sputtering using reactive gases other than O2, H2O, N2, NH3 or CH4
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/0605—Carbon

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Carbon And Carbon Compounds (AREA)
  • Physical Vapour Deposition (AREA)
  • Chemical Vapour Deposition (AREA)
DE8787101271T 1986-01-31 1987-01-30 Verfahren zur herstellung eines kohlenstoffilmes. Expired - Fee Related DE3775076D1 (de)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
JP1956686A JPH079059B2 (ja) 1986-01-31 1986-01-31 炭素薄膜の製造方法
JP61019569A JPH0742570B2 (ja) 1986-01-31 1986-01-31 炭素薄膜の製造方法
JP61019567A JPS62180054A (ja) 1986-01-31 1986-01-31 炭素薄膜の製造方法
JP61019570A JPS62180057A (ja) 1986-01-31 1986-01-31 炭素薄膜の製造方法
JP61019568A JPS62180055A (ja) 1986-01-31 1986-01-31 炭素薄膜の製造方法

Publications (1)

Publication Number Publication Date
DE3775076D1 true DE3775076D1 (de) 1992-01-23

Family

ID=27520149

Family Applications (1)

Application Number Title Priority Date Filing Date
DE8787101271T Expired - Fee Related DE3775076D1 (de) 1986-01-31 1987-01-30 Verfahren zur herstellung eines kohlenstoffilmes.

Country Status (6)

Country Link
US (1) US5073241A (de)
EP (1) EP0231894B1 (de)
KR (1) KR940002750B1 (de)
CA (1) CA1309057C (de)
DE (1) DE3775076D1 (de)
DK (1) DK168337B1 (de)

Families Citing this family (38)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5275850A (en) * 1988-04-20 1994-01-04 Hitachi, Ltd. Process for producing a magnetic disk having a metal containing hard carbon coating by plasma chemical vapor deposition under a negative self bias
DE3821614A1 (de) * 1988-06-27 1989-12-28 Licentia Gmbh Deckschicht aus amorphem kohlenstoff auf einem substrat, verfahren zur herstellung der deckschicht und verwendung der deckschicht
US5266409A (en) * 1989-04-28 1993-11-30 Digital Equipment Corporation Hydrogenated carbon compositions
US5045165A (en) * 1990-02-01 1991-09-03 Komag, Inc. Method for sputtering a hydrogen-doped carbon protective film on a magnetic disk
US5232570A (en) * 1991-06-28 1993-08-03 Digital Equipment Corporation Nitrogen-containing materials for wear protection and friction reduction
US5281851A (en) * 1992-10-02 1994-01-25 Hewlett-Packard Company Integrated circuit packaging with reinforced leads
JPH06279185A (ja) * 1993-03-25 1994-10-04 Canon Inc ダイヤモンド結晶およびダイヤモンド結晶膜の形成方法
TW366367B (en) * 1995-01-26 1999-08-11 Ibm Sputter deposition of hydrogenated amorphous carbon film
RU2095464C1 (ru) * 1996-01-12 1997-11-10 Акционерное общество закрытого типа "Тетра" Биокарбон, способ его получения и устройство для его осуществления
US5827408A (en) * 1996-07-26 1998-10-27 Applied Materials, Inc Method and apparatus for improving the conformality of sputter deposited films
US6063246A (en) * 1997-05-23 2000-05-16 University Of Houston Method for depositing a carbon film on a membrane
US6835279B2 (en) * 1997-07-30 2004-12-28 Hitachi Kokusai Electric Inc. Plasma generation apparatus
US6352430B1 (en) 1998-10-23 2002-03-05 Goodrich Corporation Method and apparatus for cooling a CVI/CVD furnace
US6440220B1 (en) * 1998-10-23 2002-08-27 Goodrich Corporation Method and apparatus for inhibiting infiltration of a reactive gas into porous refractory insulation
US6162298A (en) * 1998-10-28 2000-12-19 The B. F. Goodrich Company Sealed reactant gas inlet for a CVI/CVD furnace
US6964731B1 (en) 1998-12-21 2005-11-15 Cardinal Cg Company Soil-resistant coating for glass surfaces
US6974629B1 (en) 1999-08-06 2005-12-13 Cardinal Cg Company Low-emissivity, soil-resistant coating for glass surfaces
US6660365B1 (en) 1998-12-21 2003-12-09 Cardinal Cg Company Soil-resistant coating for glass surfaces
EP1063318B1 (de) 1999-06-04 2004-08-25 Goodrich Corporation Suzeptordeckel sowohl für Gasphaseninfiltration bzw. -Beschichtung als auch Wärmebehandlung
US6639196B1 (en) 1999-06-04 2003-10-28 Goodrich Corporation Method and apparatus for cooling a CVI/CVD furnace
US6383298B1 (en) 1999-06-04 2002-05-07 Goodrich Corporation Method and apparatus for pressure measurement in a CVI/CVD furnace
BR0105474A (pt) * 2001-09-26 2003-09-23 Fundacao De Amparo A Pesquisa Processo de deposição de filme de carbono amorfo hidrogenado, filme de carbono amorfo hidrogenado e artigo revestido com filme de carbono amorfo hidrogenado
KR20030064942A (ko) * 2002-01-29 2003-08-06 오승준 스크래치 방지막을 가지는 조리 기구 및 그 제조방법
CA2550331A1 (en) 2003-12-22 2005-07-14 Cardinal Cg Compagny Graded photocatalytic coatings
US7604865B2 (en) 2004-07-12 2009-10-20 Cardinal Cg Company Low-maintenance coatings
US7923114B2 (en) 2004-12-03 2011-04-12 Cardinal Cg Company Hydrophilic coatings, methods for depositing hydrophilic coatings, and improved deposition technology for thin films
US8092660B2 (en) 2004-12-03 2012-01-10 Cardinal Cg Company Methods and equipment for depositing hydrophilic coatings, and deposition technologies for thin films
DE102005057833B4 (de) * 2005-01-12 2016-11-17 Frato Gmbh Aromabehältnis oder Aromafolie aus Aluminium
US20090226718A1 (en) * 2005-07-04 2009-09-10 Masataka Hasegawa Carbon film
US7989094B2 (en) * 2006-04-19 2011-08-02 Cardinal Cg Company Opposed functional coatings having comparable single surface reflectances
US20080011599A1 (en) 2006-07-12 2008-01-17 Brabender Dennis M Sputtering apparatus including novel target mounting and/or control
WO2009036284A1 (en) 2007-09-14 2009-03-19 Cardinal Cg Company Low-maintenance coatings, and methods for producing low-maintenance coatings
EP2279283A1 (de) * 2008-03-27 2011-02-02 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Verfahren zur herstellung eines mehrkomponentigen, polymer- und metallhaltigen schichtsystems, vorrichtung und beschichteter gegenstand
CN102102171A (zh) * 2011-01-28 2011-06-22 南通扬子碳素股份有限公司 表面沉积非晶碳薄膜降低石墨电极消耗的方法
US9763287B2 (en) * 2011-11-30 2017-09-12 Michael R. Knox Single mode microwave device for producing exfoliated graphite
WO2013190141A1 (de) * 2012-06-22 2013-12-27 Von Ardenne Anlagentechnik Gmbh Verfahren und vorrichtung zur vorbehandlung eines beschichteten oder unbeschichteten substrats
WO2018093985A1 (en) 2016-11-17 2018-05-24 Cardinal Cg Company Static-dissipative coating technology
KR20200102484A (ko) * 2017-12-27 2020-08-31 가부시키가이샤 알박 스퍼터링 방법 및 스퍼터링 장치

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
SU411037A1 (ru) * 1971-10-28 1974-08-05 В. М. Гол ЯНОВ , А. П. Демидов Способ получения искусственных алмазов
US4365015A (en) * 1979-08-20 1982-12-21 Canon Kabushiki Kaisha Photosensitive member for electrophotography composed of a photoconductive amorphous silicon
US4414085A (en) * 1981-10-08 1983-11-08 Wickersham Charles E Method of depositing a high-emissivity layer
US4486286A (en) * 1982-09-28 1984-12-04 Nerken Research Corp. Method of depositing a carbon film on a substrate and products obtained thereby
CA1235087A (en) * 1983-11-28 1988-04-12 Akio Hiraki Diamond-like thin film and method for making the same
CA1232228A (en) * 1984-03-13 1988-02-02 Tatsuro Miyasato Coating film and method and apparatus for producing the same
US4565711A (en) * 1984-06-29 1986-01-21 Wedtech Corp. Method of and apparatus for the coating of quartz crucibles with protective layers

Also Published As

Publication number Publication date
EP0231894A1 (de) 1987-08-12
KR940002750B1 (ko) 1994-04-02
DK53087D0 (da) 1987-02-02
DK53087A (da) 1987-08-01
EP0231894B1 (de) 1991-12-11
KR870007298A (ko) 1987-08-18
DK168337B1 (da) 1994-03-14
CA1309057C (en) 1992-10-20
US5073241A (en) 1991-12-17

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee